CN109581828A - Exposure device and exposure method - Google Patents
Exposure device and exposure method Download PDFInfo
- Publication number
- CN109581828A CN109581828A CN201910082883.8A CN201910082883A CN109581828A CN 109581828 A CN109581828 A CN 109581828A CN 201910082883 A CN201910082883 A CN 201910082883A CN 109581828 A CN109581828 A CN 109581828A
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- CN
- China
- Prior art keywords
- light shield
- substrate
- baseplate carrier
- carrier
- bearing frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a kind of exposure device and exposure method.The exposure device includes baseplate carrier and the light shield bearing frame above the baseplate carrier；The baseplate carrier is for carrying substrate to be exposed, the light shield bearing frame is for carrying light shield, the baseplate carrier is in the curved surface being recessed toward the direction far from the light shield bearing frame, when so that substrate being placed on the baseplate carrier, with deformation curvature identical with the light shield being placed in the light shield bearing frame, baseplate carrier by the way that curved surface is arranged generates deformation identical with light shield after substrate is placed on microscope carrier, so that exposure bias caused by compensating because of light shield deformation, promotes the homogeneity of exposure.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of exposure devices and exposure method.
Background technique
In field of display technology, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as display (Organic Light Emitting Diode, OLED) gradually replace CRT monitor, extensively
General is applied to LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or laptop screen etc..
Usual liquid crystal display panel is by color membrane substrates (CF, Color Filter), thin film transistor base plate (TFT, Thin
Film Transistor), the liquid crystal (LC, Liquid Crystal) that is sandwiched between color membrane substrates and thin film transistor base plate and
Sealing glue frame (Sealant) composition, moulding process generally comprises: leading portion array (Array) processing procedure (film, yellow light, etching and
Stripping), middle section is at box (Cell) processing procedure (TFT substrate is bonded with CF substrate) and back segment module group assembling processing procedure (driving IC and printing
Press fit of circuit boards).Wherein, leading portion Array processing procedure mainly forms TFT substrate, in order to control the movement of liquid crystal molecule；Middle section
Cell processing procedure mainly adds liquid crystal between TFT substrate and CF substrate；Back segment module group assembling processing procedure mainly drives IC pressing
With the integration of printed circuit board, and then drive liquid crystal molecule rotation, show image.
During the processing procedure of the flat-panel monitors such as the Array processing procedure of liquid crystal display, exposure manufacture process is often used.It is logical
The detailed process of normal exposure manufacture process is that light shield is first placed above the substrate for being coated with photoresist, then using exposure machine to substrate
It is exposed, specifically, exposure machine issues UV ultraviolet light by opening extra-high-pressure mercury vapour lamp, the image information on light shield is turned
It moves on to and is coated on the substrate surface of photoresist, the pattern based on light shield, photoresist has a part being exposed and is not exposed
Part.It recycles developer solution to develop photoresist, the part that photoresist is exposed can be removed, retain photoresist and do not exposed
The part of light, or the part that removal photoresist is not exposed, retain the part that photoresist is exposed, so that photoresist be made to be formed
Required figure.
Upgrading with market to display demand, the size of display panel is increasing, shows to meet large scale, base
Plate suqare and light shield area also increase with it, as shown in Figure 1, light shield 1 is the absorption by the light shield frame 2 of surrounding in exposure machine
Realize the fixation of position, thus with the increase of light shield area, light shield 1 can generate bigger deformation, the meeting in exposure process
Due to deformation generate refraction light and cause exposure homogeneity decline, specially in proximity printing machine, light exposure condition is constant
Under the premise of, light shield is bigger at a distance from substrate, and the critical size (CD) of figure is bigger on substrate, thus since 2 deformation of light shield is led
The central point of the light shield 2 of cause to substrate 3 distance be 2 edge of light shield point to substrate 3 distance difference, will cause substrate 3
Exposure it is uneven, adverse effect is generated to processing procedure.
Summary of the invention
The purpose of the present invention is to provide a kind of exposure devices, can compensate for the deformation of light shield, promote exposition uniformity.
The object of the invention is also to provide a kind of exposure methods, can compensate for the deformation of light shield, promote exposition uniformity.
To achieve the above object, it the present invention provides a kind of exposure device, including baseplate carrier and is set to the substrate and carries
Light shield bearing frame above platform；
The baseplate carrier is for carrying substrate to be exposed, and the light shield bearing frame is for carrying light shield, the substrate
Microscope carrier is in have when so that substrate being placed on the baseplate carrier toward the curved surface that the direction far from the light shield bearing frame is recessed
Deformation curvature identical with the light shield being placed in the light shield bearing frame.
The baseplate carrier is equipped with adsorption module, and the adsorption module can adsorb the substrate being placed on baseplate carrier,
So that the substrate is bonded with the baseplate carrier.
The baseplate carrier is rectangle, and the length of the baseplate carrier and the range of width are 700 to 1500mm.
The difference in height of the highest point of the minimum point and baseplate carrier edge at the baseplate carrier center is 4~10 μm.
The material of the baseplate carrier is aluminium alloy, ceramics or titanium alloy.
The present invention also provides a kind of exposure methods, include the following steps:
Step S1, a baseplate carrier and the light shield bearing frame above the baseplate carrier, the baseplate carrier are provided
In the curved surface being recessed toward the direction far from the light shield bearing frame；
Step S2, substrate and light shield are provided, light shield is placed on the light shield bearing frame, places base on the baseplate carrier
Plate, substrate have deformation curvature identical with the light shield being placed in the light shield bearing frame after being placed on the baseplate carrier；
Step S3, the substrate is exposed with the light shield.
The baseplate carrier is equipped with adsorption module, in step S2, after substrate is placed on baseplate carrier, and the adsorption module
The substrate, which can be adsorbed, is bonded the substrate with the baseplate carrier.
The baseplate carrier is rectangle, and the length of the baseplate carrier and the range of width are 700 to 1500mm.
The difference in height of the highest point of the minimum point and baseplate carrier edge at the baseplate carrier center is 4~10 μm.
The material of the baseplate carrier is aluminium alloy, ceramics or titanium alloy.
Beneficial effects of the present invention: the present invention provides a kind of exposure device, including baseplate carrier and is set to the substrate and carries
Light shield bearing frame above platform；The baseplate carrier is for carrying substrate to be exposed, and the light shield bearing frame is for carrying light
Cover, the baseplate carrier are in the curved surface being recessed toward the direction far from the light shield bearing frame, so that substrate is placed in the substrate and carries
When on platform, there is deformation curvature identical with the light shield being placed in the light shield bearing frame, by the baseplate carrier that curved surface is arranged
So that substrate generates deformation identical with light shield after being placed on microscope carrier, so that exposure bias caused by compensating because of light shield deformation, mentions
Rise the homogeneity of exposure.The present invention provides a kind of exposure method, can compensate for the deformation of light shield, promotes exposition uniformity.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the schematic diagram of existing exposure device；
Fig. 2 is the schematic diagram of exposure device of the invention；
Fig. 3 is the flow chart of exposure method of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 2, the present invention provides a kind of exposure device, including baseplate carrier 10 and it is set to above the baseplate carrier
Light shield bearing frame 20；
The baseplate carrier 10 is for carrying substrate 100 to be exposed, and the light shield bearing frame 20 is for carrying light shield
200, the baseplate carrier 10 is in the curved surface being recessed toward the direction far from the light shield bearing frame 20, so that substrate 100 is placed in institute
When stating on baseplate carrier 10, there is deformation curvature identical with the light shield 200 being placed in the light shield bearing frame 20.
It should be noted that the material of the light shield 200 is that hard quartz glass is set in the identical situation of area
After in light shield bearing frame 20, deformation curvature is fixed value, therefore, can be by the formation curvature of measurement light shield 200, to be arranged
The curvature of baseplate carrier 10, so that having when substrate 100 is placed on the baseplate carrier 10 and being placed in the light shield carrying
The identical deformation curvature of light shield 200 in frame 20.
Further, when substrate 100 has deformation curvature identical with light shield 200, substrate 100 and light shield 200 are always
Keeping parallelism state, so that the every bit on substrate 100 is correctly aligned with point corresponding on light shield 200, and substrate 100
On every bit it is all the same at a distance from point corresponding on light shield 200, and then the pattern on light shield correctly exposed in exposure
On light to the substrate 100, exposure bias caused by effectively avoiding because of 200 deformation of light shield promotes exposure homogeneity.
Preferably, in some embodiments of the invention, the shape of the light shield 200 and substrate 100 is rectangle.
It is highly preferred that the length of the light shield 200 is 960mm, width 800mm, with a thickness of 10mm, deformation quantity is 4 μm,
The edge highest point of the specific light shield 200 of deformation quantity and the difference in height of 200 center lowest part of light shield.
Specifically, the baseplate carrier 10 is equipped with adsorption module 30, and the adsorption module 30, which can adsorb, is placed in substrate
Substrate 100 on microscope carrier 10 so that the substrate 100 is bonded with the baseplate carrier 10 so that substrate 100 be placed in it is described
Corresponding deformation is generated when on baseplate carrier 10.
Preferably, the baseplate carrier 10 is rectangle, the length of the baseplate carrier 10 and the range of width be 700 to
1500mm。
Preferably, the difference in height of the highest point of the minimum point and 10 edge of baseplate carrier at 10 center of baseplate carrier is 4
~10 μm.
Optionally, the material of the baseplate carrier 10 is aluminium alloy, ceramics or titanium alloy.
Referring to Fig. 3, the present invention provides a kind of exposure method, include the following steps:
Step S1, a baseplate carrier 10 and the light shield bearing frame 20 above the baseplate carrier, the substrate are provided
Microscope carrier 10 is in the curved surface being recessed toward the direction far from the light shield bearing frame 20；
Step S2, substrate 100 and light shield 200 are provided, light shield 200 is placed on the light shield bearing frame 20, in the substrate
Substrate 100 is placed on microscope carrier 10, substrate 100 has after being placed on the baseplate carrier 10 and is placed in the light shield bearing frame 20
The identical deformation curvature of light shield 200；
Step S3, the substrate 100 is exposed with the light shield 200.
It should be noted that the material of the light shield 200 is that hard quartz glass is set in the identical situation of area
After in light shield bearing frame 20, deformation curvature is fixed value, therefore, can be by the formation curvature of measurement light shield 200, to be arranged
The curvature of baseplate carrier 10, so that having when substrate 100 is placed on the baseplate carrier 10 and being placed in the light shield carrying
The identical deformation curvature of light shield 200 in frame 20.
Further, when substrate 100 has deformation curvature identical with light shield 200, substrate 100 and light shield 200 are always
Keeping parallelism state, so that the every bit on substrate 100 is correctly aligned with point corresponding on light shield 200, and light shield 200
On every bit and the distance between corresponding points on substrate 100 it is all the same, and then the pattern on light shield correctly exposed in exposure
On light to the substrate 100, exposure bias caused by effectively avoiding because of 200 deformation of light shield promotes exposure homogeneity.
It is highly preferred that the length of the light shield 200 is 960mm, width 800mm, with a thickness of 10mm, deformation quantity is 4 μm,
The edge highest point of the specific light shield 200 of deformation quantity and the difference in height of 200 center lowest part of light shield.
Specifically, the baseplate carrier 10 is equipped with adsorption module 30, and the adsorption module 30, which can adsorb, is placed in substrate
Substrate 100 on microscope carrier 10 so that the substrate 100 is bonded with the baseplate carrier 10 so that substrate 100 be placed in it is described
Corresponding deformation is generated when on baseplate carrier 10.
Preferably, the baseplate carrier 10 is rectangle, the length of the baseplate carrier 10 and the range of width be 700 to
1500mm。
Preferably, the difference in height of the highest point of the minimum point and 10 edge of baseplate carrier at 10 center of baseplate carrier is 4
~10 μm.
Optionally, the material of the baseplate carrier 10 is aluminium alloy, ceramics or titanium alloy.
In conclusion the present invention provides a kind of exposure device, including baseplate carrier and above the baseplate carrier
Light shield bearing frame；The baseplate carrier is for carrying substrate to be exposed, and the light shield bearing frame is for carrying light shield, the base
Onboard, in the curved surface being recessed toward the direction far from the light shield bearing frame, when so that substrate being placed on the baseplate carrier, has
There is deformation curvature identical with the light shield being placed in the light shield bearing frame, the baseplate carrier by the way that curved surface is arranged sets substrate
Deformation identical with light shield is generated after on microscope carrier, so that exposure bias caused by compensating because of light shield deformation, promotes the equal of exposure
One property.The present invention provides a kind of exposure method, can compensate for the deformation of light shield, promotes exposition uniformity.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (10)
1. a kind of exposure device, which is characterized in that held including baseplate carrier (10) and the light shield above the baseplate carrier
It carries frame (20)；
The baseplate carrier (10) is for carrying substrate to be exposed (100), and the light shield bearing frame (20) is for carrying light shield
(200), the baseplate carrier (10) is in the curved surface being recessed toward the direction far from the light shield bearing frame (20), so that substrate
(100) when being placed on the baseplate carrier (10), have identical with the light shield (200) that is placed in the light shield bearing frame (20)
Deformation curvature.
2. exposure device as described in claim 1, which is characterized in that the baseplate carrier (10) is equipped with adsorption module
(30), the adsorption module (30) can adsorb the substrate (100) being placed on baseplate carrier (10), so that the substrate (100)
It is bonded with the baseplate carrier (10).
3. exposure device as described in claim 1, which is characterized in that the baseplate carrier (10) is rectangle, and the substrate carries
The length of platform (10) and the range of width are 700 to 1500mm.
4. exposure device as described in claim 1, which is characterized in that the minimum point and substrate at baseplate carrier (10) center
The difference in height of the highest point at microscope carrier (10) edge is 4~10 μm.
5. exposure device as described in claim 1, which is characterized in that the material of the baseplate carrier (10) is aluminium alloy, pottery
Porcelain or titanium alloy.
6. a kind of exposure method, which comprises the steps of:
Step S1, a baseplate carrier (10) and the light shield bearing frame (20) above the baseplate carrier, the substrate are provided
Microscope carrier (10) is in the curved surface being recessed toward the direction far from the light shield bearing frame (20)；
Step S2, substrate (100) and light shield (200) are provided, light shield (200) are placed on the light shield bearing frame (20), described
Substrate (100) are placed on baseplate carrier (10), substrate (100) has after being placed on the baseplate carrier (10) and is placed in the light
The identical deformation curvature of light shield (200) in cover bearing frame (20)；
Step S3, the substrate (100) is exposed with the light shield (200).
7. exposure method as claimed in claim 6, which is characterized in that the baseplate carrier (10) is equipped with adsorption module
(30), in step S2, after substrate (100) is placed on baseplate carrier (10), the adsorption module (30) can adsorb the substrate
(100) it is bonded the substrate (100) with the baseplate carrier (10).
8. exposure method as claimed in claim 6, which is characterized in that the baseplate carrier (10) is rectangle, and the substrate carries
The length of platform (10) and the range of width are 700 to 1500mm.
9. exposure method as claimed in claim 6, which is characterized in that the minimum point and substrate at baseplate carrier (10) center
The difference in height of the highest point at microscope carrier (10) edge is 4~10 μm.
10. exposure method as claimed in claim 6, which is characterized in that the material of the baseplate carrier (10) is aluminium alloy, pottery
Porcelain or titanium alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910082883.8A CN109581828A (en) | 2019-01-23 | 2019-01-23 | Exposure device and exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910082883.8A CN109581828A (en) | 2019-01-23 | 2019-01-23 | Exposure device and exposure method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109581828A true CN109581828A (en) | 2019-04-05 |
Family
ID=65917931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910082883.8A Pending CN109581828A (en) | 2019-01-23 | 2019-01-23 | Exposure device and exposure method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109581828A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110320761A (en) * | 2019-06-19 | 2019-10-11 | 京东方科技集团股份有限公司 | A kind of exposure sources and exposure system |
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|---|---|---|---|---|
| JPS641293A (en) * | 1987-06-24 | 1989-01-05 | Hitachi Ltd | Aligner |
| JPH04149555A (en) * | 1990-10-15 | 1992-05-22 | Hitachi Electron Eng Co Ltd | Large-sized substrate exposure device |
| CN101833246A (en) * | 2008-12-31 | 2010-09-15 | Asml控股股份有限公司 | Optically compensated unidirectional reticle bender |
| CN103885298A (en) * | 2014-03-06 | 2014-06-25 | 京东方科技集团股份有限公司 | Exposure device and exposure system |
| CN104991427A (en) * | 2015-08-12 | 2015-10-21 | 京东方科技集团股份有限公司 | Exposure device and method |
| CN106527054A (en) * | 2016-11-28 | 2017-03-22 | 京东方科技集团股份有限公司 | Exposure device and exposure method |
| CN106773557A (en) * | 2017-03-23 | 2017-05-31 | 合肥京东方光电科技有限公司 | Proximity printing device and its exposure method |
-
2019
- 2019-01-23 CN CN201910082883.8A patent/CN109581828A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS641293A (en) * | 1987-06-24 | 1989-01-05 | Hitachi Ltd | Aligner |
| JPH04149555A (en) * | 1990-10-15 | 1992-05-22 | Hitachi Electron Eng Co Ltd | Large-sized substrate exposure device |
| CN101833246A (en) * | 2008-12-31 | 2010-09-15 | Asml控股股份有限公司 | Optically compensated unidirectional reticle bender |
| CN103885298A (en) * | 2014-03-06 | 2014-06-25 | 京东方科技集团股份有限公司 | Exposure device and exposure system |
| CN104991427A (en) * | 2015-08-12 | 2015-10-21 | 京东方科技集团股份有限公司 | Exposure device and method |
| CN106527054A (en) * | 2016-11-28 | 2017-03-22 | 京东方科技集团股份有限公司 | Exposure device and exposure method |
| CN106773557A (en) * | 2017-03-23 | 2017-05-31 | 合肥京东方光电科技有限公司 | Proximity printing device and its exposure method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110320761A (en) * | 2019-06-19 | 2019-10-11 | 京东方科技集团股份有限公司 | A kind of exposure sources and exposure system |
| CN110320761B (en) * | 2019-06-19 | 2022-01-11 | 京东方科技集团股份有限公司 | Exposure equipment and exposure system |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190405 |