CN109581756A - Exposure apparatus and spacer manufacturing method - Google Patents
Exposure apparatus and spacer manufacturing method Download PDFInfo
- Publication number
- CN109581756A CN109581756A CN201811581610.XA CN201811581610A CN109581756A CN 109581756 A CN109581756 A CN 109581756A CN 201811581610 A CN201811581610 A CN 201811581610A CN 109581756 A CN109581756 A CN 109581756A
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- China
- Prior art keywords
- exposure
- working position
- light shield
- light
- opaque area
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000006850 spacer group Chemical group 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 230000003287 optical effect Effects 0.000 claims description 55
- 239000000463 material Substances 0.000 claims description 34
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 230000007723 transport mechanism Effects 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- 230000007246 mechanism Effects 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 52
- 230000000903 blocking effect Effects 0.000 description 13
- 239000004973 liquid crystal related substance Substances 0.000 description 13
- 239000011159 matrix material Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- FGRBYDKOBBBPOI-UHFFFAOYSA-N 10,10-dioxo-2-[4-(N-phenylanilino)phenyl]thioxanthen-9-one Chemical compound O=C1c2ccccc2S(=O)(=O)c2ccc(cc12)-c1ccc(cc1)N(c1ccccc1)c1ccccc1 FGRBYDKOBBBPOI-UHFFFAOYSA-N 0.000 description 1
- TVEXGJYMHHTVKP-UHFFFAOYSA-N 6-oxabicyclo[3.2.1]oct-3-en-7-one Chemical compound C1C2C(=O)OC1C=CC2 TVEXGJYMHHTVKP-UHFFFAOYSA-N 0.000 description 1
- 206010015150 Erythema Diseases 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 244000154870 Viola adunca Species 0.000 description 1
- 235000005811 Viola adunca Nutrition 0.000 description 1
- 235000013487 Viola odorata Nutrition 0.000 description 1
- 235000002254 Viola papilionacea Nutrition 0.000 description 1
- 238000001720 action spectrum Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 231100000321 erythema Toxicity 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention is suitable for the display technical field, and provides an exposure device and a manufacturing method of a spacer, wherein the exposure device comprises a first working position, a second working position, a light shield component, a first exposure light source component and a second exposure light source component, the light shield component comprises a first light shield and a second light shield, the first light shield is provided with a plurality of first opaque regions, the first opaque regions comprise a main opaque region and an auxiliary opaque region, the second light shield is provided with a plurality of second opaque regions corresponding to the main opaque regions, the first light shield and the first exposure light source component are arranged at the first working position, the second light shield and the second exposure light source component are arranged at the second working position, the energy irradiated from the first exposure light source component to the first light shield is larger than the energy irradiated from the second exposure component to the second light shield, the required height difference can be easily obtained by adjusting the exposed energy, and the exposure device is suitable for manufacturing structures with various height differences, and a new photomask is not required to be manufactured for obtaining different light transmittance, so that the production cost is reduced.
Description
Technical field
The invention belongs to field of display technology, in particular to the production method of a kind of exposure device and spacer.
Background technique
Liquid crystal display panel (LCD, Liquid Crystal Display) is the important component of liquid crystal display,
Generally include colored filter (Color Filter, the CF) substrate being oppositely arranged and thin film transistor (TFT) (Thin Film
Transistor, TFT) array substrate, and liquid crystal (Liquid Crystal, LC) the layer structure being configured between the two substrates
At.
The production of CF (Color filter) substrate is divided into black matrix" (BM), red color resistance, green color blocking, blue color
Resistance, public electrode and photoresist spacer (Photo Spacer, PS), wherein PS plays the effect of supporting case thickness.When high temperature causes
When LC volume increases, liquid crystal cell is easy to appear gravity unevenness；When low temperature causes LC volume contraction, liquid crystal cell is easy to appear very
It is empty.Therefore, it designs in liquid crystal cell there are two types of PS: one is the primary divider (Main-PS) for maintaining box thickness under normal circumstances, one
Kind it is when being squeezed by external force or auxiliary spacer (Sub-PS) that when liquid crystal is by cold events just plays a supporting role.Both
There are differences in height between PS, and using gray-level mask (Gray Tone) or halftone mask (Half Tone), technology controlling and process is not
Same light transit dose obtains photoresist layer exposure removal different-thickness.But the method technology difficulty is larger, and for set light
Cover, difference in height when exposure between two kinds of PS always keep certain value.When height difference design is different, different light is needed replacing
Cover forms new light transit dose, to cause light shield both costly and inefficient.
Summary of the invention
The purpose of the present invention is to provide a kind of exposure devices, it is intended to solve to utilize gray-level mask and halftone mask process
Low efficiency, light shield technical problem at high cost when making the spacer of different height.
The invention is realized in this way a kind of exposure device, is exposed for treating exposure structure, including the first work
Position, the second working position, light shield component, the first exposure light source component and the second exposure light source component；
The light shield component includes the first light shield and the second light shield, and first light shield has at least one first opaque
Area, the first opaque area include the opaque area of spaced master and auxiliary opaque area；Second light shield has at least
One the second opaque area, the second opaque area correspond to the opaque area of the master, and the auxiliary opaque area corresponds to described
The position other than the described second opaque area on two light shields；
First working position and the second working position are arranged independently of each other, are respectively used to place the structure to be exposed；Institute
It states the first working position to be oppositely arranged with first light shield, second working position is oppositely arranged with second light shield；
First light shield and the first exposure light source component are oppositely arranged, second light shield and the second exposure light source component
It is oppositely arranged；
The energy of the ultraviolet light of first light shield and the structure to be exposed is exposed to from the first exposure light source component
Amount is greater than the energy that the ultraviolet light of second light shield and the structure to be exposed is exposed to from second exposure components.
In one embodiment, the first exposure light source component includes the first UV LED, for issuing wavelength
Ultraviolet light in 275nm~320 nanometer exposes to first light shield；
The second exposure light source component includes the second UV LED, is received for issuing wavelength in 320nm~420
The ultraviolet light of rice, exposes to second light shield.
In one embodiment, the first exposure light source component includes UV LED and the first optical filter, described
First optical filter allows the ultraviolet light of first wavelength range to pass through；
The second exposure light source component includes the UV LED and the second optical filter；Second optical filter
The ultraviolet light of second wave length range is allowed to pass through；
First optical filter and the second optical filter are different, so as to be less than by the energy of the ultraviolet light of the second optical filter logical
Cross the energy of the ultraviolet light of first optical filter.
In one embodiment, the light beam that the UV LED issues includes 275~420 nanometers of ultraviolet light, institute
Stating first wavelength range is 275 nanometers~420 nanometers, and the second wave length range is 320 nanometers~420 nanometers.
In one embodiment, the first wavelength range is 275nm~320 nanometer.
In one embodiment, first optical filter includes silicon nitride, and second optical filter includes silicon nitride, and described
Hydrogen content of the hydrogen content of the silicon nitride of one optical filter less than the second optical filter.
In one embodiment, first optical filter is long wave ultraviolet edge filter, and second optical filter is medium wave
Ultraviolet cut-off filter.
Another object of the present invention is to provide a kind of exposure devices, are exposed for treating exposure structure, including the
One working position, the second working position, light shield component, the first exposure light source component, the second exposure light source component and transmission mechanism；
The light shield component includes the first light shield and the second light shield, and first light shield has at least one first opaque
Area, the first opaque area include the opaque area of spaced master and auxiliary opaque area；Second light shield has at least
One the second opaque area, the second opaque area correspond to the opaque area of the master, and the auxiliary opaque area corresponds to described
The position other than the described second opaque area on two light shields；
First working position and the second working position are arranged independently of each other, are respectively used to place the structure to be exposed；Institute
It states the first working position to be oppositely arranged with first light shield, second working position is oppositely arranged with second light shield；
First light shield and the first exposure light source component are oppositely arranged, second light shield and the second exposure light source component
It is oppositely arranged；
The energy of the ultraviolet light of first light shield and the structure to be exposed is exposed to from the first exposure light source component
Amount is greater than the energy that the ultraviolet light of second light shield and the structure to be exposed is exposed to from second exposure components；
The transmission mechanism is for driving the structure to be exposed to reach the second working position, or warp through first working position
Second working position reaches the first working position.
Another object of the present invention is to provide a kind of production method of spacer, comprising:
One layer of photosensitive material layer is formed, the photosensitive material layer is made to enter above-mentioned described exposure device,
Single exposure is respectively carried out under first working position and the second working position；
The corresponding opaque area of master forms primary divider, and the corresponding auxiliary opaque area forms auxiliary spacer.
In one embodiment, the photosensitive material layer is driven by transport mechanism and reaches second through first working position
Working position or the photosensitive material layer are driven by transport mechanism reaches the first working position through second working position；
Time for exposure of the photosensitive material layer in first working position and the exposure in second working position
Time is identical or different.
Exposure device provided by the invention is exposed for treating exposure structure, including the first working position, second station
Position, light shield component, the first exposure light source component and the second exposure light source component, light shield include the first light shield and the second light shield, the
One light shield has at least one first opaque area, and the first opaque area includes main opaque area and multiple auxiliary opaque
Area, the second light shield have at least one second opaque area, and the second opaque area corresponds to the opaque area of the master, auxiliary impermeable
Position on corresponding second light shield in light area other than the second opaque area, the first light shield and the first exposure light source component are oppositely arranged simultaneously
Set on the first working position, the second light shield and the second exposure light source component are oppositely arranged and are set to the second working position, from described first
The energy that exposure light source component exposes to the ultraviolet light of first light shield and structure to be exposed is greater than from the second exposure group
Part exposes to the energy of the ultraviolet light of second light shield and structure to be exposed, therefore, first light shield and the first exposure light source
The cooperation of component and the cooperation of the second light shield and the second exposure light source can form three kinds of regions, by the energy of adjustment exposure
Three kinds of different depth of exposure can be formed, and then can be used for etching and form the different structure of three kinds of height, it can also be by
The energy of exposure is adjusted to be readily available required difference in height, exposure device of the invention is suitable for forming a variety of differences in height
Structure improve production efficiency without making new light shield to obtain different light transmittances, reduce production cost.
Detailed description of the invention
Fig. 1 is the structural schematic diagram for the exposure device that one embodiment of the invention provides；
Fig. 2 is the structural schematic diagram of light shield component in the exposure device of one embodiment of the invention offer；
Fig. 3 is the exposure schematic diagram of the first working position in the production method for the spacer that one embodiment of the invention provides；
Fig. 4 is the exposure schematic diagram of the second working position in the production method for the spacer that one embodiment of the invention provides；
Fig. 5 be another embodiment of the present invention provides spacer production method in the second working position exposure schematic diagram；
Fig. 6 be another embodiment of the present invention provides spacer production method in the first working position exposure schematic diagram；
The structural schematic diagram for the color membrane substrates in display panel that Fig. 7 one embodiment of the invention provides.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that described herein, specific examples are only used to explain the present invention, not
For limiting the present invention.
It should be noted that when component is referred to as " being fixed on " or " being set to " another component, it can directly or
It connects on another component.When a component is known as " being connected to " another component, it be can be directly or indirectly
It is connected on another component.The orientation or positional relationship of the instructions such as term " on ", "lower", "left", "right" is based on attached drawing
Shown in orientation or positional relationship, be merely for convenience of describing, rather than the device or element of indication or suggestion meaning must have
There is specific orientation, be constructed and operated in a specific orientation, therefore should not be understood as the limitation to this patent.Term " first ",
" second " is used merely to facilitate description purpose, is not understood to indicate or imply relative importance or implicitly indicates technical characteristic
Quantity.The meaning of " plurality " is two or more, unless otherwise specifically defined.
In order to illustrate technical solutions according to the invention, it is described in detail below in conjunction with specific accompanying drawings and embodiments.
As shown in Figure 1, the present invention provides a kind of exposure device 10, it is exposed for treating exposure structure, including first
Working position 101, the second working position 102, light shield component 20, the first exposure light source component 103 and the second exposure light source component 104.
As shown in Fig. 2, light shield component 20 includes the first light shield 21 and the second light shield 22, the first light shield 21 has at least one
First opaque area 212, the first opaque area 212 include at least one spaced opaque area 213 of master and at least one
Auxiliary opaque area 214, the second light shield 22 have at least one second opaque area 222, corresponding first light in the second opaque area 222
The opaque area 213 of master of cover 21, auxiliary opaque area 214 are the energy other than the second opaque area 222 on corresponding second light shield 22
The position of enough light transmissions.
The first working position 101 and the second working position 102 in the exposure device 10 are respectively used to place structure to be exposed.The
One light shield 21 and the first exposure light source component 103 be oppositely arranged and be set to the first working position 101 top, with to lower section wait expose
Photo structure carries out single exposure, and the second light shield 22 and the second exposure light source component 104 are oppositely arranged and are set to the second working position 102
Top, single exposure is carried out with the structure to be exposed to lower section, the first working position 101 and the second working position 102 are mutually indepedent
Setting, so that the exposure process respectively carried out is independent of each other.
In a particular application, the first working position 101 and the second working position 102 can be two boards, racks etc. and arbitrarily may be used
In the form of by structural bearing to be exposed and fixation, this is not specifically limited.
First light shield 21 and the second light shield 22 are used alone, for respectively carrying out single exposure to same structure to be exposed.Cause
This, the part in corresponding main opaque area 213 is blocked in double exposure, and the part in corresponding auxiliary opaque area 214 carries out one
Secondary exposure, corresponding other parts are exposed twice.
The energy for exposing to the ultraviolet light of the first light shield 21 from the first exposure light source component 103 is greater than from the second exposure components
The energy of the ultraviolet light of the second light shield 22 is exposed to, the exposure energy of the first working position 101 is greater than the second working position 102 as a result,
Exposure energy, the pattern of corresponding first light shield 21 and the second light shield 22 can form different depth of exposure, such as full exposure,
Half-exposure and unexposed.As a result, using first light shield 21 and the second light shield 22 and by the first exposure light source component of adjustment
103 and second the energy of exposure light source component 104 can form three kinds of different depth of exposure, can be used to etch formation three
The different structure of kind height can also be readily available required difference in height by the energy of adjustment exposure.
Exposure device provided in an embodiment of the present invention can be used for being formed the spacer in display panel with different height,
Certainly the other structures that can be also used for being formed any desired different height, if the photoresist pattern of different height is for etching it
His metal layer etc..
In one embodiment, the first exposure light source component 103 and the second exposure light source component 104 can be directly transmitting not
The light source of the ultraviolet light of co-wavelength range.Specifically, the first exposure light source component 103 includes for emitting 275nm~320 nanometer
Ultraviolet light the first UV LED, the second exposure light source component 104 include for launch wavelength in 320nm~420
Second UV LED of the ultraviolet light of nanometer.The quantity of first UV LED and the second UV LED
It can be one or more.
In one embodiment, may include a ultraviolet source in the exposure device 10, by the selection to wavelength come
Obtain the exposure light source of different wavelength range or different-energy.The ultraviolet source can be such as UV LED,
It include ultraviolet light of the wavelength between 270~420 nanometers in the light beam of sending.Certainly, the light which issues
Beam may also comprise a part of blue violet light and other visible lights that wavelength is more than 420 nanometers, for exposure device 10, the present invention
In only consider ultraviolet light between 270~420 nanometers.
First optical filter 11 allows the ultraviolet light of first wavelength range to pass through, and the second optical filter 12 allows second wave length range
Ultraviolet light pass through, incorporated by reference to reference Fig. 3 to Fig. 6.
In one embodiment, first wavelength range is 275~420 nanometers, including long wave ultraviolet light (UVA light) and medium wave purple
The mixed light of outer light (UVB light), second wave length range are 320~420 nanometers, are long wave ultraviolet light (UVA light), i.e., the second work
The ultraviolet light that position 102 uses when exposing is only a part of the ultraviolet light used when exposing on the first working position 101, therefore, the
Energy on two working positions 102 for the ultraviolet light of exposure is relatively small.
First optical filter 11 and the second optical filter 12 can be deposited in transparent substrates by silicon nitride material to be formed, but is contained
Hydrogen amount is different.First optical filter 11 can be greater than or equal to 350 DEG C and be less than or equal to 450 DEG C and pressure and be greater than in temperature
Or be equal to 4.0Torr and be less than or equal under conditions of 6.0Torr, according to silane (SiH4), ammonia (NH3), nitrogen (N2) and argon (Ar)
The ratio between flow be vapor-deposited to be formed for 0.3:7:3:1, the second optical filter 12 can be greater than or equal to 350 DEG C in temperature and be less than
Or be equal to 450 DEG C and pressure and be greater than or equal to 4.0Torr and be less than or equal under conditions of 6.0Torr, according to silane
(SiH4), ammonia (NH3), nitrogen (N2) and the ratio between the flow of argon (Ar) be vapor-deposited to be formed for 1.0:7:3:1, thus the first optical filter
11 hydrogen content is lower than the hydrogen content of the second optical filter 12, and more N-H (nitrogen-hydrogen) key is logical in ultraviolet light in the second optical filter 12
Out-of-date to absorb energy, the part ultraviolet light for belonging to the wavelength region of UVB wave is absorbed to cannot pass through the second optical filter
12。
The thickness of first optical filter 11 and the second optical filter 12 can be between 300~1000 nanometers, for example, first filters
The thickness of device 11 and the second optical filter 12 is equal, is 850 nanometers.
In one embodiment, the first optical filter 11 can be hafnium oxide material (HfO2), ultraviolet light will not be significantly absorbed,
UVA and UVB light is allowed to pass through；Second optical filter 12 is set as intermediate erythemal action spectrum optical filter, the intermediate erythema effect light
Spectrum filter device can significantly reduce UVB light by allowing UVA light more more than UVB light by that (can be equivalent to second wave length model
It encloses for UVA light, and first wavelength range is the mixed light of UVA light and UVB light), to make through the ultraviolet of the second optical filter 12
Light energy is relatively low.
In one embodiment, first wavelength range be 275~320 nanometers, be UVB light, second wave length range be 320~
420 nanometers, be UVA light, therefore, relatively small through the energy of the ultraviolet light of the second optical filter 12.
For example, the first optical filter 11 is the long wave ultraviolet cut-off filter for preventing wavelength from passing through in 320~420 nanometers of UVA light
Mating plate, the second optical filter 12 are the medium wave ultraviolet cut-off filter for preventing wavelength from passing through in 275~320 nanometers of UVB light.
In one embodiment, transport mechanism can be equipped in exposure device 10, for driving structure to be exposed such as substrate, material
Bed of material etc. is mobile.In one embodiment, structure to be exposed can be sent to the second work by the first working position 101 by transmission mechanism
Position 102, can also be sent to the first working position 101 by the second working position 102.
The present invention also provides a kind of production methods of spacer, using above-mentioned described exposure device 10.Spacer is used for
In liquid crystal display panel, it is supported between first substrate and the second substrate to maintain box thick.It include below spacer to make
It is illustrated for the specific steps of first substrate.
In the present embodiment, first substrate is color membrane substrates.
Specifically, Fig. 7 is please referred to, the first substrate base layer 9 is provided, which is transparent material, such as glass
Glass, transparent plastic etc..First substrate base layer 9 includes the external zones of viewing area and non-display area.Lead in the first substrate base layer 9
One layer of black resin material of deposition is crossed, and black matrix" 8 is formed in viewing area by one of optical cover process, black matrix" 8 limits
Make multiple subpixel areas.Certain black matrix" 8 can also be formed simultaneously in external zones, with no restriction to this.
Color blocking layer 7 is made on black matrix" 8 and the first substrate base layer 9, is specially sequentially depositing and is patterned red color
Resistance layer, green color blocking layer and blue color blocking layer respectively obtain regularly arranged red color resistance block 71 in subpixel area, green
Color color blocking block 72 and blue color blocking block 73.
Layer of transparent conductive film is deposited on black matrix" 8 and color blocking layer 7, such as ITO (Indium tin oxide, oxygen
Change indium tin), as common electrode layer 6.Common electrode layer 6 with a thickness of 40~150nm.
Then, spacer is made in common electrode layer 6.
Specifically, one layer of photosensitive material layer 3 is deposited in common electrode layer 6, and the first substrate base layer 9 is sent into and is exposed
Device.First substrate base layer 9 is under the drive of transport mechanism, and photosensitive material layer 3 is in the first working position 101 and the second work
Carry out single exposure respectively under position 102, herein it is corresponding be defined as exposing for the first time and second of exposure (here " first time " and
" for the second time " not restriction sequence).Corresponding first lining in the opaque area 213 of master and auxiliary opaque area 214 on first light shield 21
Black matrix" 8 on underlayment 9 is arranged.In corresponding first opaque area 212, the second opaque area 222 on second light shield 22
Main opaque area 213, the black matrix" 8 also corresponded in a substrate base layer 9 are arranged.
In one embodiment, the first substrate base layer 9 is driven to be moved to the second work by the first working position 101 using transport mechanism
Make position 102, the gross energy of the ultraviolet light in first wavelength range is greater than the gross energy of the ultraviolet light of second wave length range.When first
Substrate base layer 9 is after the first working position 101 is by the ultraviolet light of first wavelength range, as shown in figure 3, corresponding first light transmission
The part photosensitive material floor 3 in area 211 is exposed completely, obtains full exposure region 31, corresponding first opaque area 212 (including
Main opaque area 213 and auxiliary opaque area 214) 3 floor of part photosensitive material floor be not irradiated to, be unexposed area 33.
When the first substrate base layer 9 continues through the second working position 102, as shown in figure 4, the ultraviolet lighting of second wave length range is mapped to
On the part photosensitive material layer 3 not being exposed when the first working position 101.It is total due to the ultraviolet light in first wavelength range
Energy is greater than the gross energy of the ultraviolet light of second wave length range, in the identical time for exposure, the part sense of corresponding second transparent area 221
Photopolymer resin material layer 3 is by Partial exposure, that is, to correspond to auxiliary opaque area 214 without being exposed in first time exposure
Part photosensitive material layer 3 obtains Partial exposure area by Partial exposure.
After above-mentioned double exposure, is developed and etched.The photosensitive material layer 3 that the embodiment of the present invention uses is positive
Property photoresist, therefore, the part photosensitive material layer 3 not being exposed is retained, and corresponding main opaque area 213 forms master
Spacer 41, corresponding auxiliary opaque area 214 form auxiliary spacer 42.Since auxiliary spacer 42 is by 3 part of photosensitive material layer
It is obtained after exposure, therefore, the height of auxiliary spacer 42 is less than the height of primary divider 41.
In one embodiment, as it can be seen in figures 5 and 6, transport mechanism can drive the first substrate base layer material first to reach second
Working position 102, then the first working position 101 is moved to by the second working position 102.Second optical filter 12 allows second wave length range
Ultraviolet light passes through, and the second light shield 22 is equipped with the second transparent area 221 and the second opaque area 222.First optical filter 11 allows the
The ultraviolet light of one wave-length coverage passes through, and the first light shield 21 is equipped with the first transparent area 211 and the first opaque area 212, and first is not
Transparent area 212 divides for the opaque area 213 of spaced master and auxiliary opaque area 214, corresponding second light in the opaque area 213 of the master
The second opaque area 222 on cover 22.
Since the gross energy of the ultraviolet light in first wavelength range is greater than the gross energy of the ultraviolet light of second wave length range, such as
It is corresponding after the first substrate base layer 9 first passes around ultraviolet light of second working position 102 by second wave length range shown in Fig. 5
The part photosensitive material layer 3 of second transparent area 221 obtains half-exposure area 32 ', corresponding second opaque area by Partial exposure
222 part photosensitive material layer 3 is not irradiated to, and is unexposed area 33 '.As shown in fig. 6, when the first substrate base layer 9 after
When continuing by the first working position 101, the ultraviolet light of first wavelength range is irradiated to by the first transparent area 211 in the second working position
It on the part photosensitive material layer 3 not being exposed when 102 and exposes the part completely, becomes full exposure region 31 '.?
That is, by auxiliary opaque area 214 when passing through the first working position 101 by the half-exposure area 32 ' of Partial exposure in the second working position 102
It blocks, still the state of holding part exposure.
After above-mentioned double exposure, is developed and etched.The part photosensitive material layer 3 therefore, not being exposed
To retain, corresponding main opaque area 213 forms primary divider 41, and the half-exposure area 32 ' in corresponding auxiliary opaque area 21 forms auxiliary
Parting 42.The height of auxiliary spacer 42 is less than the height of primary divider 41.
The quantity in the opaque area 213 of master and auxiliary opaque area 214 that the first opaque area 212 includes can be according to being obtained
The quantity of the primary divider 41 and auxiliary spacer 42 that arrive is arranged, as required primary divider 41 and auxiliary spacer 42 in display panel
When quantity is 1:2, the first opaque area 212 may include the opaque area 213 of a master and two auxiliary opaque areas 214.
In one embodiment, residence time phase of first substrate base layer 9 in the first working position 101 and the second working position 102
Deng, the first time for exposure and second of time for exposure are equal, a degree of exposure can be carried out to photosensitive material layer 3,
To obtain the lower auxiliary spacer 42 for the height of primary divider 41.
In one embodiment, can also adjust the first substrate base layer 9 second of the second working position 102 exposure when
Between, to change the Partial exposure degree of the photosensitive material floor 3 in corresponding auxiliary opaque area 214, so as to adjust auxiliary interval
The height of object 42, and then change the difference of the height of primary divider 41 and auxiliary spacer 42, to be suitable for different size and technique
Display panel production requirement.
First substrate base layer 9 of the embodiment of the present invention is moved in exposure device 10 by the drive of transport mechanism, is exposed
Include the first working position 101 and the second working position 102 in device 10, improves circulation efficiency.First optical filter 11, the first light shield
21, the setting position of the second optical filter 12 and the second light shield 22 can be kept fixed, and without frequently adjusting and replacing repeatedly, be reduced
Operating Complexity, it is only necessary to the first substrate base layer 9 in residence time of the first working position 101 and the second working position 102 point
It does not adjust or the first optical filter 11 that replacement cost is relatively low and the second optical filter 12 can be obtained between the master of different height
Parting 41 and auxiliary spacer 42, thus, the difference in height of primary divider 41 and auxiliary spacer 42 can be according to actual requirement easily
It obtains, without production, new, expensive light shield, meets different product requirement, reduce the cost of light shield.
In the production method of spacer provided in an embodiment of the present invention, primary divider 41 is formed by unexposed area 33, therefore,
The height of primary divider 41 is determined that the production method of spacer of the invention can be to auxiliary by the thickness of photosensitive material layer 3
The height of spacer 42 is adjusted.In one embodiment, the height of obtained primary divider 41 is 4~7 microns, auxiliary interval
The height of object 42 is 4~7 microns, and the difference of primary divider 41 and the height of auxiliary spacer 42 is 0.1~2 micron.
It is then also possible to make one layer of both alignment layers 5 on common electrode layer 6, primary divider 41 and auxiliary spacer 42.By
This, completing for first substrate namely color membrane substrates is shown in Figure 7.
It is used, should not be identified as to this it is understood that above step is only described the solution of the present invention implementation
Any restrictions of invention.In other embodiments, any not influence the step of present invention is implemented and sequentially apply.For example,
In other embodiments, in the production of first substrate, the production of color blocking layer 7 can not be included, black matrix" 8 can also not included
Production, color blocking layer 7 and black matrix" 8 are all set in the second substrate.The step of spacer is made by photosensitive material layer 3
It can also be implemented in the production of the second substrate, this has no effect on implementation of the invention.
On the basis of the production method of above-mentioned described spacer, the present invention also provides a kind of display panels, including by
The spacer obtained made by the production method of above-mentioned described spacer.
The display panel includes first substrate and the second substrate, and first substrate can be color membrane substrates, and the second substrate can be with
For array substrate, first substrate includes the first substrate base layer, the black matrix" 8 in substrate base layer, is set to 8 and of black matrix"
Colored color blocking layer 7 in substrate base layer, the common electrode layer 6 in 7 layers of colored color blocking and black matrix" 8, spacer setting
It is shown in Figure 7 to maintain the box between first substrate and the second substrate thick in common electrode layer 6.
Array substrate includes the second substrate base layer, and grid and scan line in substrate base layer are set to grid and scanning
Gate insulating layer on line, the active layer on gate insulating layer, the source electrode being formed on active layer and gate insulating layer, leakage
Pole and data line, and the passivation layer, flatness layer and the pixel electrode layer that are formed on source electrode, drain electrode and data line, pixel electrode
Layer include multiple corresponding red color resistance blocks 71, green color blocking block 72 and blue color blocking block 73 pixel electrode, pixel electrode via
It is connected through the via hole of passivation layer and flatness layer and drain electrode.
Liquid crystal layer is equipped between first substrate and the second substrate, which is liquid crystal display panel.
Spacer includes primary divider and auxiliary spacer, and in one embodiment, the height of primary divider 41 is 4~7 microns,
The height of auxiliary spacer 42 is 4~7 microns, and the difference of primary divider 41 and the height of auxiliary spacer 42 is 0.1~2 micron.
On the basis of above-mentioned described display panel, the present invention also provides a kind of display devices, including above-mentioned described
Display panel can also include the backlight module set on array substrate side, become a kind of liquid crystal display device.
The foregoing is merely alternative embodiments of the invention, are not intended to limit the invention, all in essence of the invention
Made any modifications, equivalent replacements, and improvements etc., should all be included in the protection scope of the present invention within mind and principle.
Claims (10)
1. a kind of exposure device is exposed for treating exposure structure, which is characterized in that including the first working position, the second work
Make position, light shield component, the first exposure light source component and the second exposure light source component；
The light shield component includes the first light shield and the second light shield, and first light shield has at least one first opaque area,
The first opaque area includes the opaque area of spaced master and auxiliary opaque area；Second light shield has at least one
Second opaque area, the second opaque area correspond to the opaque area of the master, and the auxiliary opaque area corresponds to second light
The position other than the described second opaque area on cover；
First working position and the second working position are arranged independently of each other, are respectively used to place the structure to be exposed；Described
One working position is oppositely arranged with first light shield, and second working position is oppositely arranged with second light shield；
First light shield and the first exposure light source component are oppositely arranged, and second light shield and the second exposure light source component are opposite
Setting；
The energy for exposing to the ultraviolet light of first light shield and the structure to be exposed from the first exposure light source component is big
In the energy for the ultraviolet light for exposing to second light shield and the structure to be exposed from second exposure components.
2. exposure device as described in claim 1, which is characterized in that
The first exposure light source component includes the first UV LED, for issuing wavelength in 275nm~320 nanometer
Ultraviolet light exposes to first light shield；
The second exposure light source component includes the second UV LED, for issuing wavelength in 320nm~420 nanometer
Ultraviolet light exposes to second light shield.
3. exposure device as described in claim 1, which is characterized in that
The first exposure light source component includes UV LED and the first optical filter, and first optical filter allows first
The ultraviolet light of wave-length coverage passes through；
The second exposure light source component includes the UV LED and the second optical filter；Second optical filter allows
The ultraviolet light of second wave length range passes through；
First optical filter and the second optical filter are different, pass through institute so as to be less than by the energy of the ultraviolet light of the second optical filter
State the energy of the ultraviolet light of the first optical filter.
4. exposure device as claimed in claim 3, which is characterized in that the light beam that the UV LED issues includes
275~420 nanometers of ultraviolet light, the first wavelength range are 275 nanometers~420 nanometers, and the second wave length range is 320
Nanometer~420 nanometers.
5. exposure device as claimed in claim 4, which is characterized in that the first wavelength range is 275nm~320 nanometer.
6. exposure device as claimed in claim 4, which is characterized in that first optical filter includes silicon nitride, and described second
Optical filter includes silicon nitride, the hydrogen content of the hydrogen content of the silicon nitride of first optical filter less than the second optical filter.
7. exposure device as claimed in claim 5, which is characterized in that first optical filter is long wave ultraviolet light cutoff filter
Piece, second optical filter are medium wave ultraviolet cut-off filter.
8. a kind of exposure device is exposed for treating exposure structure, which is characterized in that including the first working position, the second work
Make position, light shield component, the first exposure light source component, the second exposure light source component and transmission mechanism；
The light shield component includes the first light shield and the second light shield, and first light shield has at least one first opaque area,
The first opaque area includes the opaque area of spaced master and auxiliary opaque area；Second light shield has at least one
Second opaque area, the second opaque area correspond to the opaque area of the master, and the auxiliary opaque area corresponds to second light
The position other than the described second opaque area on cover；
First working position and the second working position are arranged independently of each other, are respectively used to place the structure to be exposed；Described
One working position is oppositely arranged with first light shield, and second working position is oppositely arranged with second light shield；
First light shield and the first exposure light source component are oppositely arranged, and second light shield and the second exposure light source component are opposite
Setting；
The energy for exposing to the ultraviolet light of first light shield and the structure to be exposed from the first exposure light source component is big
In the energy for the ultraviolet light for exposing to second light shield and the structure to be exposed from second exposure components；
The transmission mechanism is used to that the structure to be exposed to be driven to reach the second working position through first working position, or described in warp
Second working position reaches the first working position.
9. a kind of production method of spacer characterized by comprising
One layer of photosensitive material layer is formed, enters the photosensitive material layer described in any one of any one of claims 1 to 88
Exposure device respectively carries out single exposure under first working position and the second working position；
After developed and etching, the corresponding opaque area of master forms primary divider, and the corresponding auxiliary opaque area forms auxiliary
Parting.
10. the production method of spacer as claimed in claim 9, which is characterized in that the photosensitive material layer is by transmitting
Mechanism, which drives, reaches the second working position or the photosensitive material layer by transport mechanism drive through institute through first working position
It states the second working position and reaches the first working position；
Time for exposure of the photosensitive material layer in first working position and the time for exposure in second working position
It is identical or different.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811581610.XA CN109581756A (en) | 2018-12-24 | 2018-12-24 | Exposure apparatus and spacer manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811581610.XA CN109581756A (en) | 2018-12-24 | 2018-12-24 | Exposure apparatus and spacer manufacturing method |
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| CN109581756A true CN109581756A (en) | 2019-04-05 |
Family
ID=65930895
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| CN201811581610.XA Pending CN109581756A (en) | 2018-12-24 | 2018-12-24 | Exposure apparatus and spacer manufacturing method |
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