CN105733507B - 一种壳核包覆型氧化铈-氧化硅复合磨粒的制备方法 - Google Patents
一种壳核包覆型氧化铈-氧化硅复合磨粒的制备方法 Download PDFInfo
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- CN105733507B CN105733507B CN201610138467.1A CN201610138467A CN105733507B CN 105733507 B CN105733507 B CN 105733507B CN 201610138467 A CN201610138467 A CN 201610138467A CN 105733507 B CN105733507 B CN 105733507B
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- 239000002245 particle Substances 0.000 title claims abstract description 56
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- IMQUYRYMPIKEFP-UHFFFAOYSA-N cerium(3+) oxosilicon(2+) oxygen(2-) Chemical compound [O-2].[Ce+3].[Si+2]=O IMQUYRYMPIKEFP-UHFFFAOYSA-N 0.000 title claims description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 112
- 239000000725 suspension Substances 0.000 claims abstract description 75
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 52
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 46
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 46
- 239000010703 silicon Substances 0.000 claims abstract description 46
- 239000000243 solution Substances 0.000 claims abstract description 44
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 39
- 230000003647 oxidation Effects 0.000 claims abstract description 38
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 35
- 238000005498 polishing Methods 0.000 claims abstract description 30
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 30
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000011259 mixed solution Substances 0.000 claims abstract description 18
- 238000003475 lamination Methods 0.000 claims abstract description 16
- 239000013049 sediment Substances 0.000 claims abstract description 15
- 239000003921 oil Substances 0.000 claims abstract description 12
- 238000010992 reflux Methods 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 230000032683 aging Effects 0.000 claims abstract description 3
- 150000000703 Cerium Chemical class 0.000 claims abstract 2
- 238000013019 agitation Methods 0.000 claims description 58
- 230000009471 action Effects 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 28
- 239000008367 deionised water Substances 0.000 claims description 14
- 229910021641 deionized water Inorganic materials 0.000 claims description 14
- QQZMWMKOWKGPQY-UHFFFAOYSA-N cerium(3+);trinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O QQZMWMKOWKGPQY-UHFFFAOYSA-N 0.000 claims description 11
- 238000003756 stirring Methods 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- -1 Cerium ion Chemical class 0.000 claims description 8
- 238000001354 calcination Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 5
- 230000005070 ripening Effects 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 2
- 229920002472 Starch Polymers 0.000 claims 1
- 238000002242 deionisation method Methods 0.000 claims 1
- 230000001934 delay Effects 0.000 claims 1
- 235000019698 starch Nutrition 0.000 claims 1
- 239000008107 starch Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 22
- 229910000420 cerium oxide Inorganic materials 0.000 abstract description 14
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 abstract description 14
- 230000000694 effects Effects 0.000 abstract description 10
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 abstract description 4
- 238000005253 cladding Methods 0.000 abstract description 4
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 3
- 230000001376 precipitating effect Effects 0.000 abstract description 3
- 229960001866 silicon dioxide Drugs 0.000 description 22
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 230000004992 fission Effects 0.000 description 15
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 12
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 12
- 229910052814 silicon oxide Inorganic materials 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 9
- 239000006061 abrasive grain Substances 0.000 description 8
- 239000003643 water by type Substances 0.000 description 8
- 238000009826 distribution Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052681 coesite Inorganic materials 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 239000000428 dust Substances 0.000 description 6
- 239000012530 fluid Substances 0.000 description 6
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 6
- 229910052682 stishovite Inorganic materials 0.000 description 6
- 229910052905 tridymite Inorganic materials 0.000 description 6
- 238000001291 vacuum drying Methods 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 238000002955 isolation Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011859 microparticle Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 241000790917 Dioxys <bee> Species 0.000 description 2
- 229910003978 SiClx Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229940044927 ceric oxide Drugs 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
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- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
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CN201610138467.1A CN105733507B (zh) | 2016-03-11 | 2016-03-11 | 一种壳核包覆型氧化铈-氧化硅复合磨粒的制备方法 |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107129762A (zh) * | 2017-05-12 | 2017-09-05 | 江南大学 | 一种碳化硅化学机械抛光用的抛光液及其制备方法 |
EP3632848A4 (en) * | 2017-06-01 | 2021-03-31 | JGC Catalysts and Chemicals Ltd. | DISPERSION OF COMPOSITE FINE PARTICLES BASED ON CERIUM OXIDE, ITS PRODUCTION PROCESS, AND DISPERSION OF ABRASIVE POLISHING GRAINS INCLUDING A DISPERSION OF COMPOSITE FINE PARTICLES BASED ON CERIUM OXIDE |
CN108569718A (zh) * | 2018-06-13 | 2018-09-25 | 四川大学 | 纳米二氧化铈包覆纳米球形二氧化硅复合颗粒的制备方法 |
CN109762520B (zh) * | 2019-01-21 | 2021-01-05 | 武汉理工大学 | 一种氧化铈包覆型超硬磨料的制备方法 |
CN111171788A (zh) * | 2020-01-02 | 2020-05-19 | 长江存储科技有限责任公司 | 研磨微粒及其制造方法、研磨剂 |
CN114591687A (zh) * | 2022-03-18 | 2022-06-07 | 深圳市瑞来稀土材料有限公司 | 一种用于半导体晶圆抛光处理的稀土抛光粉及其制备方法 |
CN115216273A (zh) * | 2022-06-23 | 2022-10-21 | 长江存储科技有限责任公司 | 研磨颗粒及其制备方法、抛光液、清洗系统 |
CN116144323A (zh) * | 2022-12-15 | 2023-05-23 | 上海应用技术大学 | 具有介孔核壳结构的铜cmp用复合微球及其制备方法、化学机械抛光液及其应用 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1760132A (zh) * | 2005-08-17 | 2006-04-19 | 江苏工业学院 | 纳米氧化铈的制备方法及其在砷化镓晶片化学机械抛光中的用途 |
CN101475792A (zh) * | 2009-01-20 | 2009-07-08 | 江苏工业学院 | 一种包覆型氧化铈/氧化硅复合磨料的制备方法 |
CN101475791A (zh) * | 2009-01-20 | 2009-07-08 | 江苏工业学院 | 氧化铈/氧化硅复合磨料的制备方法和用途 |
CN101671538A (zh) * | 2009-09-22 | 2010-03-17 | 中国科学院上海微系统与信息技术研究所 | 一种氧化硅/氧化铈复合磨粒的制备方法 |
CN101818047A (zh) * | 2010-02-08 | 2010-09-01 | 中国科学院上海微系统与信息技术研究所 | 氧化硅-氧化铈核壳复合磨料颗粒及其制备和应用 |
CN103666372A (zh) * | 2012-09-11 | 2014-03-26 | 上海华明高技术(集团)有限公司 | 氧化硅为内核的氧化铈复合磨料及其制备方法 |
CN104745146A (zh) * | 2015-03-23 | 2015-07-01 | 江苏天恒纳米科技股份有限公司 | 含铈掺杂二氧化硅纳米复合磨粒溶胶、抛光液及其制备方法 |
CN105331332A (zh) * | 2015-12-04 | 2016-02-17 | 太仓市建兴石英玻璃厂 | 一种光学石英玻璃抛光用纳米复合磨料的制备方法 |
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2016
- 2016-03-11 CN CN201610138467.1A patent/CN105733507B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1760132A (zh) * | 2005-08-17 | 2006-04-19 | 江苏工业学院 | 纳米氧化铈的制备方法及其在砷化镓晶片化学机械抛光中的用途 |
CN101475792A (zh) * | 2009-01-20 | 2009-07-08 | 江苏工业学院 | 一种包覆型氧化铈/氧化硅复合磨料的制备方法 |
CN101475791A (zh) * | 2009-01-20 | 2009-07-08 | 江苏工业学院 | 氧化铈/氧化硅复合磨料的制备方法和用途 |
CN101671538A (zh) * | 2009-09-22 | 2010-03-17 | 中国科学院上海微系统与信息技术研究所 | 一种氧化硅/氧化铈复合磨粒的制备方法 |
CN101818047A (zh) * | 2010-02-08 | 2010-09-01 | 中国科学院上海微系统与信息技术研究所 | 氧化硅-氧化铈核壳复合磨料颗粒及其制备和应用 |
CN103666372A (zh) * | 2012-09-11 | 2014-03-26 | 上海华明高技术(集团)有限公司 | 氧化硅为内核的氧化铈复合磨料及其制备方法 |
CN104745146A (zh) * | 2015-03-23 | 2015-07-01 | 江苏天恒纳米科技股份有限公司 | 含铈掺杂二氧化硅纳米复合磨粒溶胶、抛光液及其制备方法 |
CN105331332A (zh) * | 2015-12-04 | 2016-02-17 | 太仓市建兴石英玻璃厂 | 一种光学石英玻璃抛光用纳米复合磨料的制备方法 |
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