CN105517990B - 低聚氨基酮及其作为光敏引发剂的用途 - Google Patents

低聚氨基酮及其作为光敏引发剂的用途 Download PDF

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Publication number
CN105517990B
CN105517990B CN201480044040.4A CN201480044040A CN105517990B CN 105517990 B CN105517990 B CN 105517990B CN 201480044040 A CN201480044040 A CN 201480044040A CN 105517990 B CN105517990 B CN 105517990B
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China
Prior art keywords
aminoketones
inks
curable
general formula
pigment
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CN201480044040.4A
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English (en)
Chinese (zh)
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CN105517990A (zh
Inventor
凯-乌伟·高德尔
于尔根·迪克尔
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Sun Chemical BV
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Sun Chemical Corp
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Priority to CN201811036239.9A priority Critical patent/CN109320429A/zh
Priority to CN201710276589.1A priority patent/CN107266328B/zh
Publication of CN105517990A publication Critical patent/CN105517990A/zh
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/22—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/52—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D11/107—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/20—Esters containing oxygen in addition to the carboxy oxygen
    • C08F222/205—Esters containing oxygen in addition to the carboxy oxygen the ester chains containing seven or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/22—Esters containing nitrogen
    • C08F222/225—Esters containing nitrogen the ester chains containing seven or more carbon atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Polymerisation Methods In General (AREA)
CN201480044040.4A 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途 Active CN105517990B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201811036239.9A CN109320429A (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途
CN201710276589.1A CN107266328B (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361864730P 2013-08-12 2013-08-12
US61/864,730 2013-08-12
PCT/US2014/045750 WO2015023371A1 (en) 2013-08-12 2014-07-08 Oligomeric aminoketones and their use as photoinitiators

Related Child Applications (2)

Application Number Title Priority Date Filing Date
CN201710276589.1A Division CN107266328B (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途
CN201811036239.9A Division CN109320429A (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途

Publications (2)

Publication Number Publication Date
CN105517990A CN105517990A (zh) 2016-04-20
CN105517990B true CN105517990B (zh) 2018-10-02

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CN201480044040.4A Active CN105517990B (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途
CN201811036239.9A Pending CN109320429A (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途
CN201710276589.1A Active CN107266328B (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途

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CN201811036239.9A Pending CN109320429A (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途
CN201710276589.1A Active CN107266328B (zh) 2013-08-12 2014-07-08 低聚氨基酮及其作为光敏引发剂的用途

Country Status (6)

Country Link
US (2) US9982150B2 (enExample)
EP (1) EP3033324B8 (enExample)
JP (2) JP6594873B2 (enExample)
CN (3) CN105517990B (enExample)
TW (2) TWI622575B (enExample)
WO (1) WO2015023371A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9938232B2 (en) * 2014-04-23 2018-04-10 Sun Chemical Corporation LED photoinitiators
JP6940688B2 (ja) 2017-08-30 2021-09-29 デンツプライ デトレイ ゲー．エム．ベー．ハー． 光開始剤修飾ポリ酸ポリマー
EP3449895A1 (en) * 2017-08-30 2019-03-06 Dentsply DeTrey GmbH Photoinitiator modified polyacidic polymer
CN109762397A (zh) * 2019-01-21 2019-05-17 长沙新宇高分子科技有限公司 一种含氨基酮光引发剂的uv光固化组合物
US11608445B2 (en) 2020-10-14 2023-03-21 Sun Chemical Corporation Oligomeric aminoketones and their use as photoinitiators
WO2023118482A1 (en) 2021-12-24 2023-06-29 Sun Chemical Corporation Amine synergists with uv-a absorption

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101243109A (zh) * 2005-08-05 2008-08-13 蓝宝迪有限公司 含低提取性和低挥发性共引发剂的可光聚合体系
CN101326250A (zh) * 2005-12-28 2008-12-17 富士胶片株式会社 墨液、滤色片及其制造方法以及显示装置
US20100143274A1 (en) * 2007-03-07 2010-06-10 Ciba Corporation Use of amines and amides for the stabilization of organic micronized uv absorbers

Family Cites Families (11)

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Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
JPH0771865B2 (ja) * 1987-08-07 1995-08-02 富士写真フイルム株式会社 記録材料
US5888481A (en) * 1995-09-29 1999-03-30 Alliedsignal Inc. Cinnamamides and their use as stabilizers
ATE553076T1 (de) * 2002-12-12 2012-04-15 Basf Se Aminosubstituierte hydroxyphenylbenzophenonderivate
DE102004041197A1 (de) 2004-08-26 2006-03-02 Degussa Ag Strahlungsempfindliche Masse
JP2009013314A (ja) * 2007-07-06 2009-01-22 Toyo Ink Mfg Co Ltd 光硬化型インキ
WO2011030089A1 (en) * 2009-09-08 2011-03-17 Sun Chemical B.V. A photoinitiator composition
CN103044581B (zh) * 2012-04-05 2014-10-29 常州强力电子新材料股份有限公司 一种大分子光引发剂及其制备方法和应用
CN103059168B (zh) * 2013-01-17 2014-09-17 长沙新宇高分子科技有限公司 一种二苯甲酮类光引发剂及其制备方法
EP3024858B1 (en) * 2013-07-23 2017-10-18 Allnex Belgium S.A. Polymeric photoinitiators
US9938232B2 (en) * 2014-04-23 2018-04-10 Sun Chemical Corporation LED photoinitiators

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101243109A (zh) * 2005-08-05 2008-08-13 蓝宝迪有限公司 含低提取性和低挥发性共引发剂的可光聚合体系
CN101326250A (zh) * 2005-12-28 2008-12-17 富士胶片株式会社 墨液、滤色片及其制造方法以及显示装置
US20100143274A1 (en) * 2007-03-07 2010-06-10 Ciba Corporation Use of amines and amides for the stabilization of organic micronized uv absorbers

Also Published As

Publication number Publication date
EP3033324B1 (en) 2024-03-13
CN107266328B (zh) 2019-11-19
EP3033324A4 (en) 2017-07-19
US20160160061A1 (en) 2016-06-09
JP2016532696A (ja) 2016-10-20
EP3033324A1 (en) 2016-06-22
US20180251648A1 (en) 2018-09-06
EP3033324B8 (en) 2024-04-17
US9982150B2 (en) 2018-05-29
JP6743237B2 (ja) 2020-08-19
CN105517990A (zh) 2016-04-20
US10563073B2 (en) 2020-02-18
CN107266328A (zh) 2017-10-20
TW201506003A (zh) 2015-02-16
TWI654166B (zh) 2019-03-21
TWI622575B (zh) 2018-05-01
JP6594873B2 (ja) 2019-10-23
TW201815744A (zh) 2018-05-01
WO2015023371A1 (en) 2015-02-19
JP2019142922A (ja) 2019-08-29
CN109320429A (zh) 2019-02-12

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