CN105489528A - 清洗装置 - Google Patents

清洗装置 Download PDF

Info

Publication number
CN105489528A
CN105489528A CN201510627118.1A CN201510627118A CN105489528A CN 105489528 A CN105489528 A CN 105489528A CN 201510627118 A CN201510627118 A CN 201510627118A CN 105489528 A CN105489528 A CN 105489528A
Authority
CN
China
Prior art keywords
chip
hopper
shell
carrying
cleaning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510627118.1A
Other languages
English (en)
Chinese (zh)
Inventor
福冈武臣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of CN105489528A publication Critical patent/CN105489528A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
CN201510627118.1A 2014-10-07 2015-09-28 清洗装置 Pending CN105489528A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014206145A JP2016073934A (ja) 2014-10-07 2014-10-07 洗浄装置
JP2014-206145 2014-10-07

Publications (1)

Publication Number Publication Date
CN105489528A true CN105489528A (zh) 2016-04-13

Family

ID=55676431

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510627118.1A Pending CN105489528A (zh) 2014-10-07 2015-09-28 清洗装置

Country Status (3)

Country Link
JP (1) JP2016073934A (ja)
CN (1) CN105489528A (ja)
TW (1) TW201620628A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107424896A (zh) * 2016-05-23 2017-12-01 Sti 有限公司 腔室清洁系统
CN112135935A (zh) * 2018-05-08 2020-12-25 青岛海尔洗衣机有限公司 超声波清洗装置
CN112427392A (zh) * 2020-12-08 2021-03-02 江西舜源电子科技有限公司 一种用于硅片清洗的花篮晃动装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106077000A (zh) * 2016-06-14 2016-11-09 成都中牧生物药业有限公司 基于提高清洁效果的试剂瓶清洁方法
CN106076995A (zh) * 2016-06-14 2016-11-09 成都中牧生物药业有限公司 便于彻底清洁试剂瓶的清洗方法
JP7049298B2 (ja) * 2019-09-27 2022-04-06 株式会社桜川ポンプ製作所 被洗浄物の洗浄装置及びこれを用いた被洗浄物の洗浄方法
CN112427401B (zh) * 2020-12-01 2022-03-15 莱芜成威电子材料有限公司 一种方便操作的超声波自动清洗器

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0889916A (ja) * 1994-09-27 1996-04-09 S N D:Kk 簡易型超音波洗浄器
JP2002045802A (ja) * 2000-08-08 2002-02-12 Tdk Corp チップ型電子部品分離洗浄乾燥装置
CN1445825A (zh) * 2002-03-14 2003-10-01 旺宏电子股份有限公司 单片式芯片清洗装置
CN200981070Y (zh) * 2006-11-10 2007-11-28 吴永清 芯片清洗机

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0889916A (ja) * 1994-09-27 1996-04-09 S N D:Kk 簡易型超音波洗浄器
JP2002045802A (ja) * 2000-08-08 2002-02-12 Tdk Corp チップ型電子部品分離洗浄乾燥装置
CN1445825A (zh) * 2002-03-14 2003-10-01 旺宏电子股份有限公司 单片式芯片清洗装置
CN200981070Y (zh) * 2006-11-10 2007-11-28 吴永清 芯片清洗机

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107424896A (zh) * 2016-05-23 2017-12-01 Sti 有限公司 腔室清洁系统
CN107424896B (zh) * 2016-05-23 2019-12-10 Sti 有限公司 腔室清洁系统
CN112135935A (zh) * 2018-05-08 2020-12-25 青岛海尔洗衣机有限公司 超声波清洗装置
CN112427392A (zh) * 2020-12-08 2021-03-02 江西舜源电子科技有限公司 一种用于硅片清洗的花篮晃动装置

Also Published As

Publication number Publication date
JP2016073934A (ja) 2016-05-12
TW201620628A (zh) 2016-06-16

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Application publication date: 20160413

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