CN105441951B - 一种金属抛光液及其制备方法 - Google Patents
一种金属抛光液及其制备方法 Download PDFInfo
- Publication number
- CN105441951B CN105441951B CN201510800830.7A CN201510800830A CN105441951B CN 105441951 B CN105441951 B CN 105441951B CN 201510800830 A CN201510800830 A CN 201510800830A CN 105441951 B CN105441951 B CN 105441951B
- Authority
- CN
- China
- Prior art keywords
- parts
- sodium
- metal
- polishing liquid
- deionized water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 65
- 239000007788 liquid Substances 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 90
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 35
- 239000008367 deionised water Substances 0.000 claims abstract description 33
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 33
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 31
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 31
- 239000011734 sodium Substances 0.000 claims abstract description 31
- 239000002202 Polyethylene glycol Substances 0.000 claims abstract description 22
- 229920001223 polyethylene glycol Polymers 0.000 claims abstract description 22
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000004202 carbamide Substances 0.000 claims abstract description 21
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 claims abstract description 21
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 claims abstract description 21
- 235000018417 cysteine Nutrition 0.000 claims abstract description 21
- -1 diamino-vinyl Chemical group 0.000 claims abstract description 21
- 239000003208 petroleum Substances 0.000 claims abstract description 21
- 229920006324 polyoxymethylene Polymers 0.000 claims abstract description 21
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims abstract description 21
- 229940048086 sodium pyrophosphate Drugs 0.000 claims abstract description 21
- 235000012424 soybean oil Nutrition 0.000 claims abstract description 21
- 239000003549 soybean oil Substances 0.000 claims abstract description 21
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims abstract description 21
- 235000019818 tetrasodium diphosphate Nutrition 0.000 claims abstract description 21
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims abstract description 21
- ZCJHFOLNXNSZJG-UHFFFAOYSA-N [Na].NS(O)(=O)=O Chemical compound [Na].NS(O)(=O)=O ZCJHFOLNXNSZJG-UHFFFAOYSA-N 0.000 claims abstract description 18
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000001768 carboxy methyl cellulose Substances 0.000 claims abstract description 14
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 claims abstract description 14
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 claims abstract description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 39
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 7
- 239000005543 nano-size silicon particle Substances 0.000 claims description 6
- 238000012986 modification Methods 0.000 claims description 5
- 230000004048 modification Effects 0.000 claims description 5
- 238000003756 stirring Methods 0.000 claims description 4
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 239000000376 reactant Substances 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 3
- XOGODJOZAUTXDH-UHFFFAOYSA-M (N-methylanilino)methanesulfonate Chemical compound CN(CS([O-])(=O)=O)c1ccccc1 XOGODJOZAUTXDH-UHFFFAOYSA-M 0.000 claims description 2
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 claims description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- PSDYQSWHANEKRV-UHFFFAOYSA-N [S]N Chemical compound [S]N PSDYQSWHANEKRV-UHFFFAOYSA-N 0.000 claims 1
- 150000001336 alkenes Chemical class 0.000 claims 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 9
- 239000000126 substance Substances 0.000 abstract description 9
- 239000012530 fluid Substances 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 5
- 238000004381 surface treatment Methods 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 238000012360 testing method Methods 0.000 description 7
- 210000004709 eyebrow Anatomy 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 3
- 230000001815 facial effect Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000011056 performance test Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000005282 brightening Methods 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510800830.7A CN105441951B (zh) | 2015-11-19 | 2015-11-19 | 一种金属抛光液及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510800830.7A CN105441951B (zh) | 2015-11-19 | 2015-11-19 | 一种金属抛光液及其制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105441951A CN105441951A (zh) | 2016-03-30 |
CN105441951B true CN105441951B (zh) | 2018-01-16 |
Family
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Family Applications (1)
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CN201510800830.7A Expired - Fee Related CN105441951B (zh) | 2015-11-19 | 2015-11-19 | 一种金属抛光液及其制备方法 |
Country Status (1)
Country | Link |
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CN (1) | CN105441951B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109604968A (zh) * | 2018-12-28 | 2019-04-12 | 临安泽诚金属制品有限公司 | 一种精密元件的高效成型工艺 |
CN111020591B (zh) * | 2019-12-09 | 2021-05-04 | 怀化学院 | 一种疏水性表面抛光的铝合金的制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102516879A (zh) * | 2011-12-12 | 2012-06-27 | 上海新安纳电子科技有限公司 | 一种抑制相变材料电化学腐蚀的抛光液 |
CN104046269A (zh) * | 2014-06-26 | 2014-09-17 | 青岛宝泰新能源科技有限公司 | 一种抗氧化的抛光液 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7148147B2 (en) * | 2003-03-06 | 2006-12-12 | J.G. Systems, Inc. | CMP composition containing organic nitro compounds |
-
2015
- 2015-11-19 CN CN201510800830.7A patent/CN105441951B/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102516879A (zh) * | 2011-12-12 | 2012-06-27 | 上海新安纳电子科技有限公司 | 一种抑制相变材料电化学腐蚀的抛光液 |
CN104046269A (zh) * | 2014-06-26 | 2014-09-17 | 青岛宝泰新能源科技有限公司 | 一种抗氧化的抛光液 |
Also Published As
Publication number | Publication date |
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CN105441951A (zh) | 2016-03-30 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20171115 Address after: Shuangfeng village Shuangfeng District Wenling City Zeguo town Taizhou City, Zhejiang Province, No. 128 317500 Applicant after: TAIZHOU ZHICHENG INDUSTRIAL DESIGN Co.,Ltd. Address before: Hu Suzhou high tech Zone of Jiangsu province 215000 City Industrial Park and off road No. 6 standard factory Applicant before: SUZHOU JIEDERUI PRECISION MACHINERY Co.,Ltd. |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Geng Changwen Inventor before: Yao Zhenhong |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180321 Address after: Pingshan Pingshan street Shenzhen city Guangdong province 518000 heart field community with rich industrial park nine building Patentee after: SHENZHEN DEYIDA ELECTRONIC TECHNOLOGY CO.,LTD. Address before: Shuangfeng village Shuangfeng District Wenling City Zeguo town Taizhou City, Zhejiang Province, No. 128 317500 Patentee before: TAIZHOU ZHICHENG INDUSTRIAL DESIGN Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180116 Termination date: 20211119 |