CN105388699B - 评价用掩模、评价方法、曝光装置以及物品的制造方法 - Google Patents
评价用掩模、评价方法、曝光装置以及物品的制造方法 Download PDFInfo
- Publication number
- CN105388699B CN105388699B CN201510522421.5A CN201510522421A CN105388699B CN 105388699 B CN105388699 B CN 105388699B CN 201510522421 A CN201510522421 A CN 201510522421A CN 105388699 B CN105388699 B CN 105388699B
- Authority
- CN
- China
- Prior art keywords
- pattern
- evaluation
- mask
- exposure device
- performance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000011156 evaluation Methods 0.000 title claims abstract description 94
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 description 31
- 238000011161 development Methods 0.000 description 16
- 238000003384 imaging method Methods 0.000 description 11
- 230000006870 function Effects 0.000 description 7
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 201000009310 astigmatism Diseases 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000004522 Pentaglottis sempervirens Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014173007A JP6415186B2 (ja) | 2014-08-27 | 2014-08-27 | 評価用マスク、評価方法、露光装置及び物品の製造方法 |
| JP2014-173007 | 2014-08-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105388699A CN105388699A (zh) | 2016-03-09 |
| CN105388699B true CN105388699B (zh) | 2019-11-01 |
Family
ID=55421123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510522421.5A Active CN105388699B (zh) | 2014-08-27 | 2015-08-24 | 评价用掩模、评价方法、曝光装置以及物品的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6415186B2 (https=) |
| KR (1) | KR101952990B1 (https=) |
| CN (1) | CN105388699B (https=) |
| TW (1) | TWI597562B (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102713425B1 (ko) * | 2016-08-31 | 2024-10-04 | 에스케이하이닉스 주식회사 | 노광 공정의 디스토션 제어방법 |
| KR102767662B1 (ko) * | 2020-06-10 | 2025-02-18 | 삼성디스플레이 주식회사 | 개구율 계측 장치 및 이를 포함하는 표시 장치의 열화 보상 시스템 |
| CN117406546B (zh) * | 2023-12-14 | 2024-04-12 | 合肥晶合集成电路股份有限公司 | 一种掩模版及其图形修正方法 |
| WO2026002488A1 (en) * | 2024-06-27 | 2026-01-02 | Asml Netherlands B.V. | Method of performing a qualification action on an exposure apparatus |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002015992A (ja) * | 2000-04-25 | 2002-01-18 | Nikon Corp | リソグラフィ・プロセス及びリソグラフィ・システムの評価方法、基板処理装置の調整方法、リソグラフィ・システム、露光方法及び装置、並びに感光材料の状態の測定方法 |
| JP2003007591A (ja) * | 2001-06-21 | 2003-01-10 | Nikon Corp | 荷電粒子線光学系の収差評価方法、荷電粒子線装置調整方法、荷電粒子線露光方法、非点収差評価方法及び評価用パターン |
| JP2003142367A (ja) * | 2001-10-31 | 2003-05-16 | Sony Corp | 評価用マスク及びマスク評価方法 |
| JP2003318083A (ja) * | 2002-04-22 | 2003-11-07 | Nikon Corp | 光学特性計測方法、光学系の調整方法、露光方法及び装置、並びにデバイス製造方法 |
| JP4051240B2 (ja) * | 2002-07-31 | 2008-02-20 | 富士通株式会社 | 試験用フォトマスク、フレア評価方法、及びフレア補正方法 |
| JP4005870B2 (ja) * | 2002-08-02 | 2007-11-14 | 株式会社東芝 | マスク、マスクの作成方法、および半導体装置の製造方法 |
| JP5164409B2 (ja) * | 2006-09-28 | 2013-03-21 | 富士フイルム株式会社 | 光硬化性組成物、カラーフィルター及びその製造方法、並びに、固体撮像素子 |
| DE102008019341B4 (de) * | 2008-04-15 | 2020-09-24 | Carl Zeiss Smt Gmbh | Verfahren zur Analyse von Masken für die Photolithographie |
| JP2012047937A (ja) * | 2010-08-26 | 2012-03-08 | Nsk Technology Co Ltd | 露光評価用マスクおよび露光評価方法 |
| JP2012078552A (ja) * | 2010-10-01 | 2012-04-19 | Toppan Printing Co Ltd | フォトマスク作製方法 |
| JP5497693B2 (ja) * | 2011-06-10 | 2014-05-21 | Ｈｏｙａ株式会社 | フォトマスク基板、フォトマスク基板の製造方法、フォトマスクの製造方法、及びパターン転写方法 |
-
2014
- 2014-08-27 JP JP2014173007A patent/JP6415186B2/ja active Active
-
2015
- 2015-06-22 TW TW104119998A patent/TWI597562B/zh active
- 2015-08-19 KR KR1020150116433A patent/KR101952990B1/ko not_active Expired - Fee Related
- 2015-08-24 CN CN201510522421.5A patent/CN105388699B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6415186B2 (ja) | 2018-10-31 |
| CN105388699A (zh) | 2016-03-09 |
| KR20160025457A (ko) | 2016-03-08 |
| TW201608330A (zh) | 2016-03-01 |
| JP2016048299A (ja) | 2016-04-07 |
| KR101952990B1 (ko) | 2019-02-27 |
| TWI597562B (zh) | 2017-09-01 |
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