CN105171593A - 耐候性化学机械抛光垫 - Google Patents

耐候性化学机械抛光垫 Download PDF

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CN105171593A
CN105171593A CN201510488969.2A CN201510488969A CN105171593A CN 105171593 A CN105171593 A CN 105171593A CN 201510488969 A CN201510488969 A CN 201510488969A CN 105171593 A CN105171593 A CN 105171593A
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polyfunctional isocyanate
weatherability
isocyanate
vulcabond
mechanical polishing
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CN105171593B (zh
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朱顺全
梅黎黎
李云峰
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Hubei Dinglong Chemical Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
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    • B24D13/147Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
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    • B24B37/00Lapping machines or devices; Accessories
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
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Abstract

本发明公开了一种耐候性化学机械抛光垫,解决了现有抛光垫存在的耐候性较差的问题,本发明抛光垫由上至下至少包括有抛光层、缓冲层和透明底垫,各层之间通过压敏胶或胶粘剂粘接,其特征在于,所述抛光层由耐候性聚氨酯预聚体、固化剂以及功能填料三者混合固化而成,所述耐候性聚氨酯预聚体由多元醇和耐候性多官能异氰酸酯反应而成,所述耐候性多官能异氰酸酯的分子结构中不含有苯环,或者分子结构中的异氰酸酯基团与苯环间接相联。本发明工艺简单、成本低、具有优异耐候性能。

Description

耐候性化学机械抛光垫
技术领域
本发明涉及化学机械平面化处理的抛光技术领域,具体的说是一种耐候性化学机械抛光垫。
背景技术
化学机械平面化处理,即化学机械抛光(CMP),是用于对半导体晶片,蓝宝石之类的基材进行平面化处理的常用技术。在常规的CMP中,晶片安装在支架装置上,并使晶片与CMP设备中的抛光垫接触。支架装置对晶片提供可控的压力,将晶片压在抛光垫上。外加驱动力使抛光垫相对于晶片做旋转运动。与此同时,在晶片和抛光垫之间提供一种化学组合物或其它抛光溶液。由此,通过抛光垫表面和浆液的化学作用和机械作用,使晶片的表面抛光变平。
聚氨酯抛光垫代表了在快速发展的电子产业以及越来越平民化的高科技材料中用于材料及基片平面化的市售易得的材料。需要进行平面化的材料基片包括金属片、硅晶片、蓝宝石、平板显示器、存储磁盘以及各种高质量的光学玻璃。
目前市场上常用的抛光垫抛光层,其在阳光(主要是紫外线)的辐射下,容易变色,影响外观,并易引起材料的老化和破坏,不利于材料的储存和使用,人们期望研究出一种具有优异耐侯性能的抛光垫。
发明内容
本发明的目的是为了解决上述技术问题,提供一种工艺简单、成本低、具有优异耐候性能的抛光垫。
本发明抛光层由上至下至少包括有抛光层、缓冲层和透明底垫,各层之间通过压敏胶或胶粘剂粘接,其特征在于,所述抛光层由耐候性聚氨酯预聚体、固化剂以及功能填料三者混合固化而成,所述耐候性聚氨酯预聚体由多元醇和多官能异氰酸酯反应而成,所述多官能异氰酸酯至少含有耐候性多官能异氰酸酯,所述耐候性多官能异氰酸酯为分子结构中不含有苯环,或者分子结构中的异氰酸根基团与苯环间接相联的多官能异氰酸酯。
所述分子结构中不含有苯环的多官能异氰酸酯为亚甲基双-4,4’-环己基异氰酸酯、环己基二异氰酸酯、异佛尔酮二异氰酸酯、己二异氰酸酯、亚丙基-1,2-二异氰酸酯、四亚甲基-1,4-二异氰酸酯、1,6-己二异氰酸酯、十二烷-1,12-二异氰酸酯、环丁烷-1,3-二异氰酸酯、环己烷-1,3-二异氰酸酯、环己烷-1,4-二异氰酸酯、1-异氰酸酯基-3,3,5-三甲基-5-异氰酸酯基甲基环己烷、甲基环己烯二异氰酸酯、己二异氰酸酯的三异氰酸酯、2,4,4-三甲基-1,6-己烷二异氰酸酯的三异氰酸酯、己二异氰酸酯的脉二酮、乙二异氰酸酯、2,2,4-三甲基己二异氰酸酯、2,2,4-三甲基己二异氰酸酯、二环己基甲烷二异氰酸酯或它们的混合物、衍生物、低聚体、或改性体中的至少一种;所述分子结构中的异氰酸酯基团与苯环间接相联的多官能异氰酸酯为苯二亚甲基二异氰酸酯、苯二亚乙基二异氰酸酯、苯二亚异丙基二异氰酸酯、四甲基苯二亚甲基二异氰酸酯以及以其他任意基团连接苯环和异氰酸酯基团的异氰酸酯或它们的混合物、衍生物、低聚体、或改性体中的至少一种。
所述多官能异氰酸酯还含有高强度多官能异氰酸酯,所述高强度多官能异氰酸酯为分子结构中异氰酸根基团与苯环直接相联的多官能异氰酸酯。
所述高强度多官能异氰酸酯为二苯甲烷二异氰酸酯、甲苯二异氰酸酯、多亚甲基多苯基多异氰酸酯、萘-1,5-二异氰酸酯、3,3’-二甲基-4,4’联苯二异氰酸酯、对苯二异氰酸酯、3,3’-二甲基-4,4’二苯基甲烷二异氰酸酯或它们的混合物、衍生物、低聚体、或改性体中的至少一种。
所述多官能异氰酸酯中耐候性多官能异氰酸酯和高强度多官能异氰酸酯的混合质量比为100:0~150。
所述耐候性聚氨酯预聚体的粘度范围1000-35000mPa·S。
所述耐候性聚氨酯预聚体、固化剂以及功能填料三者的混合质量比为100:(2.5-41):(0.15-5)。
所述多元醇与多官能异氰酸酯的混合质量比为1:(1.5-4)。
针对背景技术中存在的问题,发明人研究发现,抛光垫耐修性不好,主要是抛光层存在的问题,抛光层中材料的改进,能够解决上述问题,因此发明人对抛光层的材料进行了深入的研究,发现在将多元醇与多官能异氰酸酯反应时,通过使用一种特殊的多官能异氰酸酯能够使得到一种粘度范围1000-35000mPa·S的耐候性聚氨酯预聚体,用这种预聚体制备的材料耐候性是常规预聚体的2倍以上,可保证抛光层在长期使用或储存过程中不变色,老化慢,并能保持材料的性能稳定。
目前,用于制备聚氨酯预聚体时通常选用的异氰酸酯为分子结构中异氰酸根基团与苯环直接相连的多官能异氰酸酯,即高强度多官能异氰酸酯;而材料变色的原因主要是因为紫外线的直接辐射会导致芳香族聚氨酯材料当中与苯环直接相连的氨基甲酸酯基团的分解,生成苯胺,苯胺经进一步氧化会形成醌式结构的显色基团,若使用的异氰酸酯分子结构中不含苯环或者异氰酸根基团不直接与苯环相联而是通过基团如甲基、乙基等基团与苯环间接相联,就能有效防止苯环与异氰酸根基之间产生共振现象,使得异氰酸酯及其聚氨酯制品对光稳定,不变黄,因而具有优良的耐候性和色泽稳定性。
本发明的多官能异氰酸酯根据需要可以单独使用耐候性多官能异氰酸酯,也可向耐候性多官能异氰酸酯向掺入高强度多官能异氰酸酯,以提高抛光层的强度。
所述多元醇,可以是市购的聚醚型或聚酯型多元醇中的至少一种,优选聚醚型多元醇。所述聚醚型多元醇包括聚(氧基四亚甲基)二醇、聚(氧基亚丙基)二醇以及它们的混合物;所述聚酯型多元醇包括聚己二酸乙二酯二醇、聚己二酸丁二酯二醇、聚亚乙基己二酸丙二酯二醇、邻苯二甲酸酯-1,6-己二醇、聚(己二酸己二酯)二醇、聚邻苯二甲酸酯碳酸酯、聚(碳酸己二酯)二醇、1,6-己二醇的聚己内酯、源自二甘醇的聚丁二醇的聚己内酯、源自聚(氧基四亚甲基)二醇的聚己内酯及其混合物以及它们的混合物。
所述固化剂可以选用4,4'-二氨基-3,3'-二氯二苯甲烷、4,4’-亚甲基-双邻氯苯胺,二乙基甲苯二胺,聚环氧丙烷二对氨基苯甲酸酯;3,5-二甲硫基-2,4-甲苯二胺及其异构体、3,5-二乙基甲苯-2,4-二胺及其3,5-二乙基甲苯-2,6-二胺之类的异构体、4,4’-双-(仲丁基氨基)-二苯甲烷、4,4’-亚甲基二(3-氯-2,6-二乙基苯胺);1,4’-双-(仲丁基氨基)-苯、聚亚丁基氧化物-二-对氨基苯甲酸酯、N,N’-二烷基二氨基二苯基甲烷、间苯二胺、亚甲基-双2-氯苯胺,4,4’-亚甲基双-(2-氯苯胺),4,4’-亚甲基-双-(2,6-二乙基苯胺),4,4’-亚甲基双-(2,3-二氯苯胺),二对氨基苯甲酸-1,3-丙二酯;4,4’-二氨基-3,3’-二乙基-5,5’-二甲基二苯甲烷、2,2',3,3'-四氯二氨基二苯甲烷、二对氨基苯甲酸丙二醇酯,二甲硫基甲苯二胺;聚环氧丁烷二对氨基苯甲酸酯;聚环氧丙烷单对氨基苯甲酸酯;1,2-二(2-氨基苯硫基)乙烷;4,4’-亚甲基-二苯胺;二乙基甲苯二胺;5-叔丁基-2,4-甲苯二胺、3-叔丁基-2,6-甲苯二胺;5-叔戊基-2,4-甲苯二胺、3-叔戊基-2,6-甲苯二胺和氯代甲苯二胺以及它们的混合物,具体的为芳香族二胺类,优选为3.3'二氯-4.4'-二苯甲基烷二胺。
所述功能填料可以选用二氧化硅、氧化铈、二氧化钛、三氧化二铝、氧化铁、氧化锆、陶瓷、高分子微球等微细粒子中的至少一种,优选为高分子微球(简称功能填料)。
所述缓冲层和透明底垫的原料及制备方法同现有技术,在此不作详述。
有益效果:
1.采用分子结构中不含有苯环的多官能异氰酸酯能够有效防止苯环与异氰酸根基之间产生共振现象,或者采用分子结构中的异氰酸根基团与苯环间接相联的多官能异氰酸酯,在解决上述共振现象的基础上,还能满足抛光垫的强度要求,通过向耐候性多官能异氰酸酯中掺入高强度多官能异氰酸酯,提高抛光层耐候性的基础上还能进一步提高抛光垫的强度;具有上述特征的多官能异氰酸酯与多元醇进行反应以获得耐候性聚氨酯预聚体,制备抛光垫一方面可防止抛光垫在贮存或使用过程中受阳光(主要是紫外线)的辐射,容易变色,影响外观的问题发生;另一方面可防止产品的老化和破坏,提高强度、延长产品的贮存和使用期限,也提高了产品的连续生产能力和生产效率。
2.本发明抛光垫不改变现有常规生产工艺,不外加防老剂、紫外辐射吸收剂等一些防止产品的老化的助剂,通过使用特殊的功能原料制备耐候性聚氨酯预聚体,由此制备的抛光垫性能优异,具有广阔的市场应用前景。
具体实施方式
本发明抛光垫抛光层的制备方法如下:
实施例1
在40℃油浴条件下,将100g1,6-己二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将400g聚醚多元醇滴加到1,6-己二异氰酸酯中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A1,粘度22000mPa·S。
称取功能填料5g加入上述A1中,并混合均匀;然后加入53.4g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层1)。
实施例2
在40℃油浴条件下,将100g异佛尔酮二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将400g聚醚多元醇滴加到异佛尔酮二异氰酸酯中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A2,粘度35000mPa·S。
称取功能填料4g加入上述A2中,并混合均匀;然后加入13.4g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层2)。
实施例3
在40℃油浴条件下,将100g苯二亚甲基二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将400g聚醚多元醇滴加到苯二亚甲基二异氰酸酯中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A3,粘度28000mPa·S。
称取功能填料4.5g加入上述A3中,并混合均匀;然后加入35g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层3)。
实施例4
在60℃油浴条件下,将100g1,6-己二异氰酸酯和75g二苯甲烷二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将500g聚醚多元醇滴加到上述混合液中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A4,粘度12000mPa·S。
称取功能填料1g加入上述A4中,并混合均匀;然后加入107g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层4)。
实施例5
在40℃油浴条件下,将100g异佛尔酮二异氰酸酯和39g甲苯二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将500g聚醚多元醇滴加到上述混合液中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A5,粘度25000mPa·S。
称取功能填料3.2g加入上述A5中,并混合均匀;然后加入45g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层5)。
实施例6
在40℃油浴条件下,将100g苯二亚甲基二异氰酸酯和24g甲苯二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将300g聚醚多元醇滴加到上述混合液中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A6,粘度18000mPa·S。
称取功能填料21g加入上述A6中,并混合均匀;然后加入99g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层6)。
实施例7
在60℃油浴条件下,将100g1,6-己二异氰酸酯和150g二苯甲烷二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将600g聚醚多元醇滴加到上述混合液中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A7,粘度5000mPa·S。
称取功能填料17g加入上述A7中,并混合均匀;然后加入160g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层7)。
实施例8
在40℃油浴条件下,将100g异佛尔酮二异氰酸酯和78g甲苯二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将300g聚醚多元醇滴加到上述混合液中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A8,粘度6300mPa·S。
称取功能填料19g加入上述A8中,并混合均匀;然后加入160g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层8)。
实施例9
在40℃油浴条件下,将100g苯二亚甲基二异氰酸酯和93g甲苯二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将300g聚醚多元醇滴加到上述混合液中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体A9,粘度1000mPa·S。
称取功能填料14.8g加入上述A9中,并混合均匀;然后加入203g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称抛光层9)。
比较例1
在60℃油浴条件下,将100g二苯甲烷二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将200g聚醚多元醇滴加到二苯甲烷二异氰酸酯中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体B1,粘度4200mPa·S。
称取功能填料2.4g加入上述B1中,并混合均匀;然后加入53g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称比较抛光层1)。
比较例2
在40℃油浴条件下,将100g甲苯二异氰酸酯投入到三口瓶中,搅拌速度300转/分钟;然后将300g聚醚多元醇滴加到甲苯二异氰酸酯中,反应2小时后对反应物进行真空脱泡处理,即得耐候性聚氨酯预聚体B2,粘度3000mPa·S。
称取功能填料2g加入上述B2中,并混合均匀;然后加入72g固化剂并高速混合均匀,并将混合物浇注模具中,然后将产品放入90℃烘箱中熟化16小时,即得聚氨酯抛光垫抛光层(简称比较抛光层2)。
比较例1,2为市场上常用的抛光层的方法。
将抛光层实施例1-9及比较例1、2按照常规方法通过压敏胶或胶粘剂依次粘接缓冲层和透明底垫,即可得到实施例抛光垫1-9和比较例抛光垫1、2。
耐候性试验根据ASTMD2244-93“用于计算仪器测量得到的彩色坐标的颜色差别的标准测试方法”(“Standardtestmethodforcalculationofcolordifferencesfrominstrumentallymeasuredcolorcoordinates”)对抛光层进行评估。将抛光层置于QUV紫外线耐候试验机中,利用UVB紫外光辐射,使用颜色指南45/0BYKGardner单元测量每辐射200小时时各样品的颜色特征(L*、a*和b*参数)。颜色的变化(ΔE)用ASTMD2244计算。
将抛光层比较例1、2与本发明抛光层1-9的耐候性进行对比,对比结果见表一。
表一不同抛光层的颜色的变化(ΔE)
从表一,我们可以看出,采用耐候性聚氨酯预聚体制备的抛光垫抛光层耐候性(实施例1-3)比市场上常用预聚体制备的抛光垫抛光层(比较例1,2)耐候性要提高至少一倍,即使我们部分采用可耐候的原料(实施例4-9)来制备抛光层,其耐候性仍然可以提高30%。

Claims (8)

1.一种耐候性化学机械抛光垫,由上至下至少包括有抛光层、缓冲层和透明底垫,各层之间通过压敏胶或胶粘剂粘接,其特征在于,所述抛光层由耐候性聚氨酯预聚体、固化剂以及功能填料三者混合固化而成,所述耐候性聚氨酯预聚体由多元醇和多官能异氰酸酯反应而成,所述多官能异氰酸酯至少含有耐候性多官能异氰酸酯,所述耐候性多官能异氰酸酯为分子结构中不含有苯环,或者分子结构中的异氰酸酯基团与苯环间接相联的多官能异氰酸酯。
2.如权利要求1所述的耐候性化学机械抛光垫,其特征在于,所述分子结构中不含有苯环的多官能异氰酸酯为亚甲基双-4,4’-环己基异氰酸酯、环己基二异氰酸酯、异佛尔酮二异氰酸酯、己二异氰酸酯、亚丙基-1,2-二异氰酸酯、四亚甲基-1,4-二异氰酸酯、1,6-己二异氰酸酯、十二烷-1,12-二异氰酸酯、环丁烷-1,3-二异氰酸酯、环己烷-1,3-二异氰酸酯、环己烷-1,4-二异氰酸酯、1-异氰酸酯基-3,3,5-三甲基-5-异氰酸酯基甲基环己烷、甲基环己烯二异氰酸酯、己二异氰酸酯的三异氰酸酯、2,4,4-三甲基-1,6-己烷二异氰酸酯的三异氰酸酯、己二异氰酸酯的脉二酮、乙二异氰酸酯、2,2,4-三甲基己二异氰酸酯、2,2,4-三甲基己二异氰酸酯、二环己基甲烷二异氰酸酯或它们的混合物、衍生物、低聚体、或改性体中的至少一种;所述分子结构中的异氰酸酯基团与苯环间接相联的多官能异氰酸酯为苯二亚甲基二异氰酸酯、苯二亚乙基二异氰酸酯、苯二亚异丙基二异氰酸酯、四甲基苯二亚甲基二异氰酸酯以及以其他任意基团连接苯环和异氰酸酯基团的异氰酸酯或它们的混合物、衍生物、低聚体、或改性体中的至少一种。
3.如权利要求1或2所述的耐候性化学机械抛光垫,其特征在于,所述多官能异氰酸酯中还含有高强度多官能异氰酸酯,所述高强度多官能异氰酸酯为分子结构中异氰酸根基团与苯环直接相联的多官能异氰酸酯。
4.如权利要求3所述的耐候性化学机械抛光垫,其特征在于,所述高强度多官能异氰酸酯为二苯甲烷二异氰酸酯、甲苯二异氰酸酯、多亚甲基多苯基多异氰酸酯、萘-1,5-二异氰酸酯、3,3’-二甲基-4,4’联苯二异氰酸酯、对苯二异氰酸酯、3,3’-二甲基-4,4’二苯基甲烷二异氰酸酯或它们的混合物、衍生物、低聚体、或改性体中的至少一种。
5.如权利要求3或4所述的耐候性化学机械抛光垫,其特征在于,所述多官能异氰酸酯中耐候性多官能异氰酸酯和高强度多官能异氰酸酯的混合质量比为100:0~150。
6.如权利要求1-5任一项所述的耐候性化学机械抛光垫,其特征在于,所述耐候性聚氨酯预聚体的粘度范围1000-35000mPa·S。
7.如权利要求1所述的的耐候性化学机械抛光垫,其特征在于,所述耐候性聚氨酯预聚体、固化剂以及功能填料三者的混合质量比为100:(2.5-41):(0.15-5)。
8.如权利要求1所述的耐候性化学机械抛光垫,其特征在于,所述多元醇与多官能异氰酸酯的混合质量比为1:(1.5-4)。
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107163213A (zh) * 2017-05-31 2017-09-15 蓝思科技(长沙)有限公司 抛光垫、制备方法及其应用
CN107520742A (zh) * 2016-06-17 2017-12-29 陶氏环球技术有限责任公司 高移除率化学机械抛光垫和制造方法
TWI612084B (zh) * 2016-04-05 2018-01-21 Kpx化學股份有限公司 研磨墊的製造方法
CN108161713A (zh) * 2017-12-15 2018-06-15 湖北鼎龙控股股份有限公司 一种抛光垫及用于制备抛光垫的方法
CN108789135A (zh) * 2018-05-25 2018-11-13 湖北鼎龙控股股份有限公司 化学机械抛光垫
CN111203798A (zh) * 2018-11-06 2020-05-29 罗门哈斯电子材料Cmp控股股份有限公司 化学机械抛光垫和抛光方法
CN112094493A (zh) * 2020-08-14 2020-12-18 沈阳化工大学 一种纳米改性热塑性聚氨酯弹性体抛光材料及其制备方法
CN115157111A (zh) * 2022-07-13 2022-10-11 安徽禾臣新材料有限公司 一种玻璃加工用抛光垫及其制备方法
CN115284165A (zh) * 2022-07-12 2022-11-04 安徽禾臣新材料有限公司 一种多孔聚氨酯抛光垫及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1628138A (zh) * 2002-02-04 2005-06-15 株式会社Skc 具有高硬度和极好的耐磨性的聚氨酯弹性体用组合物
CN103862365A (zh) * 2014-01-21 2014-06-18 湖北鼎龙化学股份有限公司 聚氨酯材料抛光垫及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI222390B (en) 2001-11-13 2004-10-21 Toyo Boseki Polishing pad and its production method
US7097549B2 (en) 2001-12-20 2006-08-29 Ppg Industries Ohio, Inc. Polishing pad
JP3769581B1 (ja) * 2005-05-18 2006-04-26 東洋ゴム工業株式会社 研磨パッドおよびその製造方法
KR100949560B1 (ko) 2005-05-17 2010-03-25 도요 고무 고교 가부시키가이샤 연마 패드
JP4897238B2 (ja) 2005-05-17 2012-03-14 東洋ゴム工業株式会社 研磨パッド
JP5184448B2 (ja) * 2009-06-23 2013-04-17 富士紡ホールディングス株式会社 研磨パッド、その製造方法および研磨加工方法
US10092998B2 (en) * 2015-06-26 2018-10-09 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of making composite polishing layer for chemical mechanical polishing pad

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1628138A (zh) * 2002-02-04 2005-06-15 株式会社Skc 具有高硬度和极好的耐磨性的聚氨酯弹性体用组合物
CN103862365A (zh) * 2014-01-21 2014-06-18 湖北鼎龙化学股份有限公司 聚氨酯材料抛光垫及其制备方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI612084B (zh) * 2016-04-05 2018-01-21 Kpx化學股份有限公司 研磨墊的製造方法
CN107520742A (zh) * 2016-06-17 2017-12-29 陶氏环球技术有限责任公司 高移除率化学机械抛光垫和制造方法
CN107163213A (zh) * 2017-05-31 2017-09-15 蓝思科技(长沙)有限公司 抛光垫、制备方法及其应用
CN108161713A (zh) * 2017-12-15 2018-06-15 湖北鼎龙控股股份有限公司 一种抛光垫及用于制备抛光垫的方法
CN108161713B (zh) * 2017-12-15 2020-06-12 湖北鼎龙控股股份有限公司 一种抛光垫及用于制备抛光垫的方法
CN108789135A (zh) * 2018-05-25 2018-11-13 湖北鼎龙控股股份有限公司 化学机械抛光垫
CN111203798A (zh) * 2018-11-06 2020-05-29 罗门哈斯电子材料Cmp控股股份有限公司 化学机械抛光垫和抛光方法
CN112094493A (zh) * 2020-08-14 2020-12-18 沈阳化工大学 一种纳米改性热塑性聚氨酯弹性体抛光材料及其制备方法
CN115284165A (zh) * 2022-07-12 2022-11-04 安徽禾臣新材料有限公司 一种多孔聚氨酯抛光垫及其制备方法
CN115157111A (zh) * 2022-07-13 2022-10-11 安徽禾臣新材料有限公司 一种玻璃加工用抛光垫及其制备方法
CN115157111B (zh) * 2022-07-13 2024-03-15 安徽禾臣新材料有限公司 一种玻璃加工用抛光垫及其制备方法

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KR20170019331A (ko) 2017-02-21
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US10414025B2 (en) 2019-09-17
US20170043451A1 (en) 2017-02-16
KR101935098B1 (ko) 2019-01-03

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