CN105093408A - Silicon-based nanowire polarization beam splitter based on mode evolution principle - Google Patents
Silicon-based nanowire polarization beam splitter based on mode evolution principle Download PDFInfo
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- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/126—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind using polarisation effects
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Abstract
The invention discloses a silicon-based nanowire polarization beam splitter based on the mode evolution principle, and can be used for the fields of integrated optics and silicon-based photonics. A vertical hybrid plasma waveguide (3) and a horizontal hybrid plasma waveguide (4) are respectively arranged at the two sides of a tapered transitional waveguide (2), and distance to the tapered transitional waveguide (2) is maintained to be consistent. An input waveguide (1) is connected at the lower end of the tapered transitional waveguide (2). A first S-shaped waveguide (5) is connected at the upper end of the vertical hybrid plasma waveguide (3). A first output waveguide (7) is connected at the upper end of the first S-shaped waveguide (5). A second S-shaped waveguide (6) is connected at the upper end of the horizontal hybrid plasma waveguide (4). A second output waveguide (8) is connected at the upper end of the second S-shaped waveguide (6). The device has advantages of being high in polarization beam splitting efficiency, low in loss, high in manufacturing tolerance and high in work bandwidth, and can also be used for constructing an on-chip polarization diversity scheme so as to realize polarization independent transmission.
Description
Technical field
The present invention relates to integrated optics technique field, be specifically related to a kind of silica-based nanowire polarization beam apparatus based on schema evolution principle.
Background technology
Silicon integreted phontonics circuit technology based on silicon-on-insulator (Silicon-on-insulator, SOI) material platform receives the extensive concern of researchist in recent years.By high index-contrast and the CMOS compatibility of SOI material, numerous compact photonic device and system can by the manufactures of low cost mass, but the intrinsic high index-contrast characteristic of SOI material is strong polarization correlated by inevitably introducing, this greatly limits its application on sheet in optical communication.For this reason, on efficient sheet, polarization diversity scheme is suggested, and polarization beam apparatus and spinner are the parts that wherein two classes are important.At present, researchist has proposed multiple waveguiding structure and has come Design and manufacture compact, high performance polarization beam apparatus, comprising: directional coupler, multi-mode interference coupler, Mach-Zender interferometer, photonic crystal and array waveguide grating etc.Wherein, based on the directional coupler of Mode Coupling principle because its structure is simple, be easy to realize, become the first-selected structure of design polarization beam apparatus, but for ensureing the efficient work of directional coupler, the accurate phase-matching condition of demand fulfillment, have strict requirement to the size of waveguide accordingly, this proposes higher accuracy requirement to the manufacture of device; The bandwidth of operation of device is also limited simultaneously.For this reason, schema evolution principle is proposed for design polarization beam apparatus, but the device length obtained longer (having grown a magnitude than the structure based on Mode Coupling principle), so need to adopt new structure effectively to reduce its device length on the basis ensureing larger bandwidth of operation.
Recently, along with a kind of proposition of waveguiding structure-hybrid plasma waveguide of novelty, utilize it to be better than the polarization correlated by force of silica-based nanowire, the photonic device that structure is compacter can be designed.Hybrid plasma waveguide on ordinary silicon base nano-wire, deposits the thin low-index material of one deck successively, as SiO
2, and layer of metal material formed, and makes pattern that it can carry between Medium Wave Guide and metallic plasma waveguide, namely has the low loss characteristic of Medium Wave Guide and the polarization correlated by force of metallic plasma waveguide simultaneously.Accordingly, by means of advantages such as the excellent properties of hybrid plasma waveguide and the large bandwidth of schema evolution type structure, large manufacturing tolerances, consider that design is a kind of and there is the silica-based nanowire polarization beam apparatus based on schema evolution principle that size is little, work strip is roomy, polarization beam splitting efficiency is high seem very important.
Summary of the invention
Technical matters: in order to solve the deficiencies in the prior art, the invention provides a kind of silica-based nanowire polarization beam apparatus based on schema evolution principle, utilize two vertical and horizontal hybrid plasma waveguide forming types differentiation districts, there is polarization beam splitting efficiency high, work strip is roomy, overcomes the deficiencies in the prior art.
Technical scheme: a kind of silica-based nanowire polarization beam apparatus based on schema evolution principle of the present invention comprises input waveguide, tapered transitional waveguides, vertical hybrid plasma waveguide, horizontal hybrid plasma waveguide, the curved waveguide of a S, the curved waveguide of the 2nd S, the first output waveguide, the second output waveguide; Wherein vertical hybrid plasma waveguide and horizontal hybrid plasma waveguide lay respectively at the both sides of tapered transitional waveguides, and are consistent with the spacing of tapered transitional waveguides; Be connected with input waveguide in the lower end of tapered transitional waveguides, the upper end of vertical hybrid plasma waveguide connects the curved waveguide of a S, connects the first output waveguide in the upper end of the curved waveguide of a S; Connect the curved waveguide of the 2nd S in the upper end of horizontal hybrid plasma waveguide, connect the second output waveguide in the upper end of the curved waveguide of the 2nd S.
Tapering transition structure is adopted near the side of tapered transitional waveguides in vertical hybrid plasma waveguide and horizontal hybrid plasma waveguide, opposite side is common linear structure, and the most advanced and sophisticated minimum widith of tapered transitional waveguides, vertically hybrid plasma waveguide and horizontal hybrid plasma waveguide remains 80nm ~ 120nm.
In vertical hybrid plasma waveguide, the spacing of first medium waveguide and metal level is 40nm ~ 60nm, and the second medium waveguide in horizontal hybrid plasma waveguide and the spacing of metal cladding are 20nm ~ 30nm.
The transverse electric mode signal of input exports from the curved waveguide of the 2nd S be connected with horizontal hybrid plasma waveguide and the second output waveguide, and the transverse magnetic wave signal of input exports from the curved waveguide of a S be connected with vertical hybrid plasma waveguide and the first output waveguide.
Beneficial effect: compared with prior art, technical scheme of the present invention has following beneficial effect:
1, polarization beam splitting efficiency is high, work strip is roomy.Compared with the polarization beam apparatus designed with conventional silica-based nanowire, the present invention adopts polarization correlated stronger hybrid plasma waveguide, make in schema evolution district, being coupled between different polarization states signal and the horizontal hybrid plasma waveguide vertical with corresponding two of input more easily occurs, and the crosstalk of output terminal lower (there is larger difference between due to pattern).In addition, because coupled zone adopts schema evolution type structural design, make the change of this device to waveguide dimensions insensitive, and bandwidth of operation is larger.
2, coupling length is relatively short.Compared to silica-based nanowire, because schema evolution district have employed two vertical and horizontal hybrid plasma waveguiding structures, the effective refractive index difference of corresponding mixed mode is comparatively large, and coupling length is reduced, and is beneficial to the compact design that realizes device and intensive integrated.
3, easily manufactured.In schema evolution district, present invention employs tapered transitional waveguides structure, make pattern between different waveguide, be easier to coupling, the minimum widith at tapered transmission line tip remains 80nm ~ 120nm, this manufacture requirements that will relax device simultaneously.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is the cross-sectional view of schema evolution district waveguiding structure in the present invention;
Have in figure: input waveguide 1, tapered transitional waveguides 2, vertical hybrid plasma waveguide 3, horizontal hybrid plasma waveguide 4, the curved waveguide of a S the 5, the 2nd S curved waveguide 6, first output waveguide 7, second output waveguide 8, first medium waveguide 31, metal level 32, second medium waveguide 41, metal cladding 42, substrate 9, covering 10.
Embodiment
Below in conjunction with accompanying drawing the present invention done and further explain.
As shown in Figure 1, a kind of silica-based nanowire polarization beam apparatus based on schema evolution principle of the present invention comprises input waveguide 1, tapered transitional waveguides 2, vertical hybrid plasma waveguide 3, horizontal hybrid plasma waveguide 4, the curved waveguide of a S the 5, the 2nd S curved waveguide 6, first output waveguide 7, second output waveguide 8; Wherein vertical hybrid plasma waveguide 3 and horizontal hybrid plasma waveguide 4 lay respectively at the both sides of tapered transitional waveguides 2, and are consistent with the spacing of tapered transitional waveguides 2; Be connected with input waveguide 1 in the lower end of tapered transitional waveguides 2, the upper end of vertical hybrid plasma waveguide 3 connects the curved waveguide 5 of a S, connects the first output waveguide 7 in the upper end of the curved waveguide 5 of a S; Connect the curved waveguide 6 of the 2nd S in the upper end of horizontal hybrid plasma waveguide 4, connect the second output waveguide 8 in the upper end of the curved waveguide 6 of the 2nd S.
The transverse electric mode signal of input exports from the curved waveguide 6 of the 2nd S be connected with horizontal hybrid plasma waveguide 4 and the second output waveguide 8, and the transverse magnetic wave signal of input exports from the curved waveguide 5 of a S be connected with vertical hybrid plasma waveguide 3 and the first output waveguide 7.
Concrete, the transmission feature of light signal in the silica-based nanowire polarization beam apparatus of said structure is as follows: the incident optical signal comprising transverse electric mode (TE) and transverse magnetic wave (TM) enters from input waveguide 1, then tapered transitional waveguides 2 is entered, the light patterns of input starts in covering, to expand (because the width of waveguide core layer is more and more less, effectively cannot support waveguide mode) gradually; Be positioned at the vertical hybrid plasma waveguide 3 of tapered transitional waveguides 2 both sides, horizontal hybrid plasma waveguide 4 because of its mode polarization state just orthogonal (TM simultaneously, a TE), therefore in schema evolution district, the TE mould of input will be coupled to horizontal hybrid plasma waveguide 4 gradually, the TM mould of input will be coupled to vertical hybrid plasma waveguide 3 gradually, and contrary Mode Coupling behavior cannot produce because there is larger difference (mode orthogonality) between pattern.And then the curved waveguide 6 of the curved waveguide of a S the 5, the 2nd S is connected respectively at the end of vertical hybrid plasma waveguide 3, horizontal hybrid plasma waveguide 4, thus two different polarization states (TM with TE) are separated further, to improve polarization extinction ratio, and final from respective output port, namely the first output waveguide 7, second output waveguide 8 exports.Wherein, in order to better mate tapered transitional waveguides 2, the structure of vertical hybrid plasma waveguide 3, horizontal hybrid plasma waveguide 4 also adopts part conic transitional structure, and the spacing of they and tapered transitional waveguides 2 is remained unchanged.The separation inputting TE, TM polarization state can well be realized by this structure, with tradition based on Mode Coupling type directional coupler compared with device of the present invention based on schema evolution principle, thus there is larger bandwidth of operation, to the change of device size is insensitive, there is larger manufacturing tolerance simultaneously; The present invention develops district thus have less device size owing to have employed polarization correlated stronger hybrid plasma waveguide forming types compared with general schema evolution type waveguiding structure in addition, is easy to integrated with other compact device.
Fig. 2 is the cross-sectional view of silica-based nanowire polarization beam apparatus schema evolution district of the present invention waveguiding structure, the middle tapered transitional waveguides 2 for connecting input waveguide 1, right side is vertical hybrid plasma waveguide 3, comprise first medium waveguide 31 and metal level 32, left side is horizontal hybrid plasma waveguide 4, comprise second medium waveguide 41 and metal cladding 42, all waveguides are all carried out growing and being coated with top covering 10 on substrate 9.For hybrid plasma waveguide, the clad material that low-refraction is filled at the interval between its Medium Wave Guide and metal level (is generally SiO
2), and spacing is 40nm ~ 60nm (vertical hybrid plasma waveguide) and 20nm ~ 30nm (horizontal hybrid plasma waveguide).As can be seen from Figure 2, adopt this asymmetrical wave guide structure (vertical, horizontal hybrid plasma waveguide) and the device that designs thus, stronger polarization correlated because existing, signal for arbitrary input polarization (TE or TM) can only be coupled to specific waveguide end in transmitting procedure, and (TE is to horizontal hybrid plasma waveguide, TM is to vertical hybrid plasma waveguide), and other one end (because adopted asymmetrical wave guide structure clearly enhances the polarization correlated of overall device) cannot be coupled to, thus there is polarization beam splitting effective, extinction ratio is high, the advantages such as crosstalk is low.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (3)
1. the silica-based nanowire polarization beam apparatus based on schema evolution principle, it is characterized in that, this silica-based nanowire polarization beam apparatus comprises input waveguide (1), tapered transitional waveguides (2), vertical hybrid plasma waveguide (3), horizontal hybrid plasma waveguide (4), the curved waveguide of a S (5), the curved waveguide of the 2nd S (6), the first output waveguide (7), the second output waveguide (8); Wherein vertical hybrid plasma waveguide (3) and horizontal hybrid plasma waveguide (4) lay respectively at the both sides of tapered transitional waveguides (2), and are consistent with the spacing of tapered transitional waveguides (2); Input waveguide (1) is connected with in the lower end of tapered transitional waveguides (2), the upper end of vertical hybrid plasma waveguide (3) connects the curved waveguide of a S (5), connects the first output waveguide (7) in the upper end of the curved waveguide of a S (5); Connect the curved waveguide of the 2nd S (6) in the upper end of horizontal hybrid plasma waveguide (4), connect the second output waveguide (8) in the upper end of the curved waveguide of the 2nd S (6).
2. a kind of silica-based nanowire polarization beam apparatus based on schema evolution principle as claimed in claim 1, it is characterized in that, tapering transition structure is adopted near the side of tapered transitional waveguides (2) in vertical hybrid plasma waveguide (3) and horizontal hybrid plasma waveguide (4), opposite side is common linear structure, and the most advanced and sophisticated minimum widith of tapered transitional waveguides (2), vertically hybrid plasma waveguide (3) and horizontal hybrid plasma waveguide (4) remains 80nm ~ 120nm.
3. a kind of silica-based nanowire polarization beam apparatus based on schema evolution principle as claimed in claim 1, it is characterized in that, in vertical hybrid plasma waveguide (3), first medium waveguide (31) is 40nm ~ 60nm with the spacing of metal level (32), and the second medium waveguide (41) in horizontal hybrid plasma waveguide (4) is 20nm ~ 30nm with the spacing of metal cladding (42).
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Cited By (12)
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CN105467520A (en) * | 2015-12-15 | 2016-04-06 | 武汉邮电科学研究院 | Broadband polarization beam splitter/combiner based on gradient waveguide directional coupler |
CN105759355A (en) * | 2016-05-17 | 2016-07-13 | 东南大学 | On-chip integrated polarization beam splitter and polarization beam splitting method thereof |
CN106405733A (en) * | 2016-10-26 | 2017-02-15 | 浙江大学 | Polarization beam splitting-beam combining device |
EP3561561A1 (en) * | 2018-04-26 | 2019-10-30 | Huawei Technologies Co., Ltd. | Optical splitter including a trident structure |
CN110780381A (en) * | 2019-12-02 | 2020-02-11 | 中国科学院半导体研究所 | Polarization beam splitter with asymmetric three-waveguide structure and preparation method thereof |
CN111239896A (en) * | 2020-03-26 | 2020-06-05 | 北京爱杰光电科技有限公司 | Active polarization rotator realized based on mixed surface plasma groove waveguide |
CN111913251A (en) * | 2019-05-09 | 2020-11-10 | 南京邮电大学 | Hybrid plasmon waveguide capable of simultaneously supporting TE (transverse electric) mode and TM (transverse magnetic) mode |
CN112596156A (en) * | 2020-12-18 | 2021-04-02 | 海南师范大学 | GOI or SOI based beam splitting/combining waveguide and preparation method thereof |
CN112596282A (en) * | 2020-12-23 | 2021-04-02 | 东南大学 | Broadband adjustable splitting ratio polarization rotation beam splitter based on SOI |
CN112904477A (en) * | 2021-03-05 | 2021-06-04 | 东南大学 | Polarization insensitive optical power divider based on shallow etching multimode interference coupler |
CN113109902A (en) * | 2021-04-20 | 2021-07-13 | 中国科学院半导体研究所 | Lithium niobate thin film polarization concentrator on chip and preparation method thereof |
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CN110780381A (en) * | 2019-12-02 | 2020-02-11 | 中国科学院半导体研究所 | Polarization beam splitter with asymmetric three-waveguide structure and preparation method thereof |
CN111239896A (en) * | 2020-03-26 | 2020-06-05 | 北京爱杰光电科技有限公司 | Active polarization rotator realized based on mixed surface plasma groove waveguide |
CN112596156A (en) * | 2020-12-18 | 2021-04-02 | 海南师范大学 | GOI or SOI based beam splitting/combining waveguide and preparation method thereof |
CN112596282A (en) * | 2020-12-23 | 2021-04-02 | 东南大学 | Broadband adjustable splitting ratio polarization rotation beam splitter based on SOI |
CN112904477A (en) * | 2021-03-05 | 2021-06-04 | 东南大学 | Polarization insensitive optical power divider based on shallow etching multimode interference coupler |
CN112904477B (en) * | 2021-03-05 | 2022-05-10 | 东南大学 | Polarization insensitive optical power divider based on shallow etching multimode interference coupler |
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