CN104942430A - Laser processing device and laser processing method - Google Patents

Laser processing device and laser processing method Download PDF

Info

Publication number
CN104942430A
CN104942430A CN201510141679.0A CN201510141679A CN104942430A CN 104942430 A CN104942430 A CN 104942430A CN 201510141679 A CN201510141679 A CN 201510141679A CN 104942430 A CN104942430 A CN 104942430A
Authority
CN
China
Prior art keywords
pulse
laser
physical quantity
processing
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201510141679.0A
Other languages
Chinese (zh)
Other versions
CN104942430B (en
Inventor
石原裕
山口友之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Publication of CN104942430A publication Critical patent/CN104942430A/en
Application granted granted Critical
Publication of CN104942430B publication Critical patent/CN104942430B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0626Energy control of the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067Dividing the beam into multiple beams, e.g. multifocusing
    • B23K26/0673Dividing the beam into multiple beams, e.g. multifocusing into independently operating sub-beams, e.g. beam multiplexing to provide laser beams for several stations

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laser Beam Processing (AREA)

Abstract

The invention provides a laser processing device and method capable of accurately determining good and bad of a laser pulse even if a frequency changes; a light beam scanner enables a pulse laser beam to enter a processed object, and a surface enter position changes; a light detector detects physical quantity of the laser pulse based on pulse energy; a path switcher can switch a laser beam path between a first path entering the processed object and a second path (does not enter the processed object); a controller controls the light beam scanner, so the pulse laser beam can enter a processed point position according to a processing order, and the physical quantity based on pulse energy can be detected, and a physical quantity allow scope can be determined according to the physical quantity; in a processing step, the controller allows at least part of the detected physical quantity in the allow scope to transmit in the first path, and the laser pulse exceeding the allow scope can transmit along the second path.

Description

Laser processing device and laser processing
The application advocates the priority of No. 2014-064974th, the Japanese patent application based on application on March 27th, 2014.The full content of this Japanese publication is by reference to being applied in this description.
Technical field
The present invention relates to a kind of pulse laser beam that makes in order incide the multiple processed point in the delimitation of workpiece surface and carry out laser processing device and the laser processing of Laser Processing.
Background technology
The technology using pulse laser beam to carry out perforate processing on wiring substrate is disclosed in following patent document 1.In the method disclosed in patent document 1, when the laser pulse with the pulse energy being less than feasible value incides wiring substrate, by the laser pulse incident extra to this position, can compensated pulse energy in shortage.
In the method disclosed in following patent document 2, the energy of the rising part of detection laser pulse.If testing result is in permissible range, then the further part of this laser pulse is made to incide workpiece and process.If testing result exceeds permissible range, then this laser pulse is not made to incide workpiece.Thereby, it is possible to prevent the bad laser pulse of energy shortage or energy surplus from inciding workpiece.
Patent document 1: Japan Patent No. 2858236 publication
Patent document 2: Japanese Unexamined Patent Publication 2009-148812 publication
In order to the permissible range of the energy of the rising part of the permissible range or laser pulse of determining the pulse energy of laser pulse exactly, need to carry out various evaluation test with different pulse energies.The deviation of pulse energy when also normally can work according to LASER Light Source determines the permissible range of pulse energy.Permissible range can be determined like a cork by the method.
Pulse energy depends on the repetition rate (hereinafter referred to as " frequency ") of pulse.Therefore, if frequency during Laser Processing produces deviation, then the deviation of pulse energy can become large.If the deviation of pulse energy becomes large, even if then LASER Light Source normally works, pulse energy also likely exceeds the permissible range determined at first.If with the permissible range determined at first for benchmark is to judge the good and bad of laser pulse, then the laser pulse exported in normal work sometimes can be judged as bad.
Summary of the invention
Even if the object of the present invention is to provide a kind of frequency change also can judge good and bad laser processing device and the laser processing of laser pulse exactly.
According to a kind of viewpoint of the present invention, provide a kind of laser processing device, it has:
LASER Light Source, exports pulse laser beam;
Objective table, keeps workpiece;
Optical beam scanner, makes the described pulse laser beam exported from described LASER Light Source incide described workpiece, and the incoming position on described workpiece surface is moved;
Photodetector, detects the physical quantity depending on pulse energy of each laser pulse of the described pulse laser beam exported from described LASER Light Source;
Path switch, switches the path of the described pulse laser beam exported from described LASER Light Source inciding between the 1st path of described workpiece and the 2nd path not inciding described workpiece; And
Control device, store position and the processing sequence of the multiple processed point on described workpiece surface, and control described optical beam scanner and described path switch according to the testing result of the position of described processed point, described processing sequence and described photodetector
Described control device performs the front preparatory process of processing, described optical beam scanner is controlled in preparatory process before described processing, the position of described processed point is incided according to described processing sequence to make described pulse laser beam, detected the described physical quantity depending on pulse energy of each laser pulse by described photodetector simultaneously, and the permissible range of described physical quantity is determined according to the distribution of described physical quantity
Before described processing after preparatory process, described control device make in the process of described workpiece the laser pulse of described physical quantity in described permissible range detected by described photodetector at least partially along described 1st propagated, make the laser pulse exceeding described permissible range along described 2nd propagated.
According to another viewpoint of the present invention, provide a kind of laser processing, it has following operation:
Control optical beam scanner, to make pulse laser beam incide the position of the processed point of regulation according to the processing sequence of regulation, measure the physical quantity depending on pulse energy of each laser pulse simultaneously;
The permissible range of described physical quantity is determined according to the distribution of the described physical quantity measured; And
Make pulse laser beam incide the position of the described processed point on workpiece according to described processing sequence, thus carry out Laser Processing,
Carry out in the operation of Laser Processing described, measure the described physical quantity of each laser pulse of described pulse laser beam, what make this laser pulse when measurement result is in described permissible range incides described workpiece at least partially, does not make this laser pulse incide described workpiece when measurement result exceeds described permissible range.
Owing in fact exporting pulse laser beam while control optical beam scanner, and measure and depend on the physical quantity of pulse energy, therefore, the deviation of pulse energy of deviation of frequency based on the pulse laser beam adding man-hour is embodied in the determination of permissible range.Therefore, it is possible to judge the good and bad of laser pulse exactly.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the laser processing device of embodiment.
Fig. 2 be represent triggering signal trg, incide the laser pulse Lp1 of path switch, the chart of the control signal con of the laser pulse Lp2 propagated in machining path, the laser pulse Lp3 propagated in collector path, controllability path switch and the sequential chart of detection signal det sent from photodetector to control device and an example of waveform.
Fig. 3 A is from LASER Light Source with sequential chart during constant frequency output laser pulse, and Fig. 3 B is with the histogram of judgement energy during constant frequency output laser pulse.
Fig. 4 A is the diagrammatic top view of workpiece, and Fig. 4 B is the sequential chart of the laser pulse in process, and Fig. 4 C is the histogram of the judgement energy of laser pulse in process.
Fig. 5 is the flow chart of the laser processing of embodiment.
Fig. 6 A is in step sl from the sequential chart of the laser pulse of LASER Light Source output, and Fig. 6 B is the histogram of the judgement energy of the laser pulse that the moment shown in Fig. 6 A exports.
Fig. 7 is the chart of the corresponding relation represented between the configuration pattern of processed point and permissible range.
In figure: 10-LASER Light Source, 11-illuminating optical system, 13-aperture, 15-path switch, 16-machining path, 17-collector path, 18-retroreflector, 20-optical beam scanner, 21-object lens, 23-objective table, 24-travel mechanism, 30-partially reflecting mirror, 31-beam dump, 32-photodetector, 40-workpiece, the processed point of 41-, 50-control device, 51-storage device, Lp1, Lp2, Lp3-laser pulse, con-control signal, det-detection signal, trg-triggering signal, R0-normal range (NR), R1-permissible range.
Detailed description of the invention
The schematic diagram of the laser processing device of embodiment shown in Fig. 1.The laser processing device of embodiment is such as carrying out the laser drill of perforate processing to wiring substrate.LASER Light Source 10 receives triggering signal trg from control device 50, thus exports pulse laser beam.LASER Light Source 10 such as uses carbon dioxide laser.
The pulse laser beam exported from LASER Light Source 10 incides illuminating optical system 11.Illuminating optical system 11 changes at least 1 in the beam divergence angle of pulse laser beam and beam diameter.Pulse laser beam through illuminating optical system 11 incides aperture 13.Illuminating optical system 11 has the function of the beam distribution homogenising made on aperture 13 position.Aperture 13 pairs of beam cross sections carry out shaping.
Pulse laser beam through aperture 13 incides path switch 15.Path switch 15 passes through the path of the switch pulse laser beam between machining path 16 and collector path 17 from control device 50 reception control signal con.Path switch 15 such as uses acousto-optic element (AOD).The path of the laser pulse Lp1 straight ahead be transfused to is equivalent to collector path 17, and the path of laser pulse diffraction is equivalent to machining path 16.
The laser pulse Lp2 propagated along machining path 16 is partial to by retroreflector 18, thus incides optical beam scanner 20.Optical beam scanner 20 controlled device 50 controls, and changes the direct of travel of pulse laser beam in the two-dimensional direction.Optical beam scanner 20 such as uses a pair galvanometer scanning galvanometer.
The pulse laser beam that have passed optical beam scanner 20 incides workpiece 40 through object lens 21.Object lens 21 such as use f θ lens.Workpiece 40 is such as carrying out the wiring substrate of perforate processing.Workpiece 40 is held in objective table 23.Objective table 23 passes through travel mechanism 24 along the moving in two dimensional directions parallel with the surface of workpiece 40.Travel mechanism 24 is controlled by control device 50.
By object lens 21, the opening portion reduced projection of aperture 13 is to workpiece 40 surface.Changed the direct of travel of pulse laser beam by optical beam scanner 20, the incoming position of pulse laser beam can be made thus to move on the surface at workpiece 40.
The laser pulse Lp3 propagated along collector path 17 incides partially reflecting mirror 30.The laser pulse of permeation parts speculum 30 incides beam dump 31.The laser pulse reflected by partially reflecting mirror 30 incides photodetector 32.Photodetector 32 such as uses the energy meter wavelength region of the pulse laser beam exported from LASER Light Source 10 to sensitivity.Detection signal det based on photodetector 32 is input to control device 50.
Control device 50 comprises storage device 51.The positional information of the multiple processed point of workpiece 40, processing sequence and the various information needed for control are stored in storage device 51.
The control signal con of triggering signal trg shown in Fig. 2, the laser pulse Lp1 inciding path switch 15, the laser pulse Lp2 propagated in machining path 16, the laser pulse Lp3 propagated in collector path 17, controllability path switch 15 and the sequential chart of detection signal det sent from photodetector 32 to control device 50 and waveform one routine.
At moment t1, if triggering signal trg rises, then laser pulse Lp1 rises at moment t2 a little later.In this moment, the outgoing route of path switch 15 switches to collector path 17.Therefore, the laser pulse Lp3 propagated in collector path 17 rises.
Photodetector 32 detects laser pulse Lp3, and detection signal det is sent to control device 50.The size of detection signal det and the power of laser pulse Lp3 substantially proportional.Control device 50, till moment t3 after a predetermined time from rising time t2, carries out integration to detection signal det.And integral result is stored in storage device 51.
At moment t4, control device 50 sends the control signal con switching to machining path 16 to path switch 15.The outgoing route of path switch 15 switches to machining path 16 by collector path 17, thus laser pulse Lp3 decline and laser pulse Lp2 rises.Because laser pulse Lp3 declines, thus the detection signal det of photodetector 32 also becomes 0.
At moment t5, control device 50 sends the control signal con switching to collector path 17 to path switch 15.The outgoing route of path switch 15 switches to collector path 17 by machining path 16, thus laser pulse Lp3 rise and laser pulse Lp2 declines.Because laser pulse Lp3 rises, thus the detection signal det of photodetector 32 also rises.
Decline at moment t6, triggering signal trg.Thus, laser pulse Lp1 and laser pulse Lp3 declines.Because laser pulse Lp3 declines, thus the detection signal det of photodetector 32 also declines.
The detection signal det of photodetector 32 is carried out from moment t2 to t3 the energy that principal value of integral (area with dash area Fig. 2) is equivalent to the rising part of laser pulse Lp1.If as processing with and the pulse width of laser pulse Lp2 that cuts from laser pulse Lp1 is constant, then the energy of the pulse energy of laser pulse Lp2 and the rising part of laser pulse Lp1 has dependency relation.Therefore, it is possible to judge that whether the pulse energy of laser pulse Lp2 is normal by the energy of the rising part of laser pulse Lp1.The energy of the rising part of laser pulse Lp1 is called " judgement energy ".Judge that energy is as the physical quantity depending on pulse energy.
Determine from the time of moment t2 to moment t3 according to the average rise time of laser pulse Lp1.As from the time of moment t2 to moment t3, the average time till the power of laser pulse Lp1 can be adopted to reach stable state, the power of laser pulse Lp2 also can be adopted to reach average time till 90% of steady state power.
As the physical quantity depending on pulse energy, the power of the rising part of laser pulse Lp1 also can be adopted to replace the energy of rising part.If adopted as the physical quantity depending on pulse energy by the only power of 1 on the time shaft in rising part, then inferred by power that the reliability of the pulse energy reduces.By being adopted as the physical quantity depending on pulse energy by the power at the multiple positions on the time shaft in rising part, the reliability being inferred the pulse energy by power can be improved.
Shown in Fig. 3 A from LASER Light Source 10 with sequential chart during constant frequency output laser pulse Lp1.
With the histogram of judgement energy during constant frequency output laser pulse Lp1 shown in Fig. 3 B.Transverse axis represents judgement energy, and the longitudinal axis represents the number of degrees.When LASER Light Source 10 normally works, judge that the distribution of energy is substantially according to normal distribution.If represent the mean value judging energy with m, represent standard deviation with σ, then the judgement energy (hereinafter referred to as normal range (NR) R0) within the scope of the σ of m ± 3 of the laser pulse Lp1 of the overwhelming majority.
The diagrammatic top view of workpiece 40 shown in Fig. 4 A.Delimit on workpiece 40 surface and have multiple processed point 41.By making laser pulse Lp2 incide processed point 41 (Fig. 1), carry out perforate processing.The processing sequence of processed point 41 is pre-determined.In Figure 4 A, an example of processing sequence is represented with arrow.As shown in Figure 4 A, non-constant from the distance till the processed point 41 that processed processed point 41 to the next one should be processed, but there is deviation.If the displacement of the incoming position of pulse laser beam is elongated, then the stabilization time of optical beam scanner 20 is also elongated.Therefore, in the process of workpiece 40, the frequency of pulse laser beam is also non-constant, but changes according to the displacement of the incoming position of pulse laser beam.
One example of the sequential chart shown in Fig. 4 B from the pulse laser beam of LASER Light Source 10 output is between processing period.As shown in Figure 4 B, there is deviation in the frequency of pulse laser beam.
The histogram of the judgement energy when frequency of pulse laser beam shown in Fig. 4 C exists deviation.Conveniently compare, the histogram of the judgement energy when frequency of pulse laser beam represented by dashed line is constant.Usually, frequency is depended on from the pulse energy of the pulse laser beam of LASER Light Source 10 output.Such as, in carbon dioxide laser, if frequency gets higher, then pulse energy has the tendency of decline.
In the deviation of the judgement energy when frequency exists deviation, the deviation of judgement energy when overlap has a frequency-invariant and the deviation of judgement energy caused because frequency there is deviation.Therefore, if frequency exists deviation, then judge that the deviation of energy increases.When frequency and non-constant time, even if LASER Light Source 10 normally works, also can occur to judge that energy exceeds the situation of normal range (NR) R0.
When carrying out only the laser pulse of judgement energy in normal range (NR) R0 being used for the control of Laser Processing, even if LASER Light Source 10 regular event, the laser pulse with the judgement energy exceeding normal range (NR) R0 also cannot be used for processing.Therefore, the utilization ratio of laser energy can reduce.In the embodiment below illustrated, can suppress under the condition of the normal work of LASER Light Source 10 because judging the reduction of the utilization ratio of the laser energy that the deviation of energy causes.
The flow chart of the laser processing of embodiment shown in Fig. 5.In step sl, control LASER Light Source 10 and optical beam scanner 20 according to the position of the processed point 41 (Fig. 4 A) of workpiece 40 and processing sequence, export pulse laser from LASER Light Source 10 thus.Now, path switch 15 maintains the state that outgoing route switches to collector path 17.Therefore, can not incident pulse laser beam on objective table 23.But, owing to control optical beam scanner 20, in the frequency of therefore pulse laser beam, embody the deviation of the stabilization time of optical beam scanner 20.
In step sl from the sequential chart of the laser pulse Lp1 of LASER Light Source 10 output shown in Fig. 6 A.Identical with the frequency of pulse laser beam between the processing period shown in Fig. 4 B, also there is deviation in the frequency of the pulse laser beam in step S1.Optical beam scanner 20 is controlled according to the position of the processed point 41 of reality and processing sequence, and the extent of deviation of the frequency of the pulse laser beam therefore in step S1 is identical with the extent of deviation of frequency of the pulse laser beam adding man-hour.
The testing result of photodetector 32 is input to control device 50.The judgement energy of each laser pulse Lp1 obtained by control device 50, and by the judgement stored energy obtained in storage device 51.
In step s 2, according to judging that the distribution of energy determines to judge the permissible range R1 of energy.
With reference to figure 6B, the defining method of the permissible range R1 judging energy is described.The histogram of energy is judged shown in Fig. 6 B.Conveniently compare, the distribution of the judgement energy during frequency-invariant of pulse laser beam represented by dashed line.Represent the mean value of the distribution of the judgement energy obtained in step sl with m1, represent standard deviation with σ 1.As an example, the higher limit of permissible range R1 is set to m1+3 σ 1, and lower limit is set to m1-3 σ 1.Owing to judging the deviation of energy, compared with normal range (NR) R0 during frequency-invariant, permissible range R1 when frequency exists deviation becomes wider.
In step S3 (Fig. 5), workpiece 40 is placed in objective table 23 (Fig. 1).In step s 4 which, make optical beam scanner 20 action, and till waiting until that the optical beam scanner 20 of pulse laser beam is stable.After optical beam scanner 20 is stable, in step s 5, export 1 laser pulse Lp1 from LASER Light Source 10.In the output start time of laser pulse Lp1, the outgoing route of path switch 15 switches to collector path 17.Therefore, the detection signal det based on the luminous intensity of photodetector 32 is input to control device 50.Control device 50 calculates judgement energy according to the detection signal det inputted from photodetector 32.
In step s 6, judge that energy is whether in permissible range R1.If judge, energy exceeds permissible range R1, then, after laser pulse Lp1 declines, turn back to step S5, export lower 1 laser pulse Lp1.If judge, energy is in permissible range R1, then enter step S7, by controllability path switch 15, cut laser pulse Lp2 (Fig. 2) from laser pulse Lp1, laser pulse LP2 is propagated along machining path 16.Laser pulse Lp2 incides workpiece 40 and carries out perforate processing.
In step s 8, judge whether the processing of all processed points 41 terminates.If also leave unprocessed processed point 41, then turn back to step S4, carry out the processing of next processed point 41.Man-hour is added to every 1 incident multiple laser pulse of processed point 41, can the processing of application cycle pattern or pulse mode processing.
In circulation pattern processing, after 1 incident 1 laser pulse of processed point 41, incoming position is made to move to lower 1 processed point 41.Be set to 1 circulation by the order of incident 1 laser pulse of all processed points 41, by repeatedly this circulation, the laser pulse of desired emitting times can be made to incide processed point 41.Add man-hour carrying out circulation pattern, in step s 8, if be repeated the circulation of desired number of times, be then judged to be process finishing.
In burst mode processing, after the laser pulse to the emitting times of 1 processed point 41 continuously desired by incidence, carry out the processing of the processed point 41 that the next one should be processed.Add man-hour carrying out burst mode, when on making once laser pulse and on once laser pulse incides identical processed point 41, without the need to making optical beam scanner 20 action in step s 4 which.
When the process finishing of all processed points 41, in step s 9, determine whether to leave the unprocessed workpiece 40 that the configuration pattern of processed point 41 is identical.If leave unprocessed workpiece 40, then turn back to step S3, the workpiece 40 should processed by the next one is placed in objective table 23.If there is no unprocessed workpiece 40, then terminate manufacturing procedure.
Process have from the workpiece 40 of the configuration pattern of the processed point 41 of workpiece 40 once processed different configuration pattern time, perform preparatory process before the processing of step S1 ~ step S2, redefine permissible range R1.
In above-described embodiment, even have the laser pulse Lp1 of the judgement energy exceeding the normal range (NR) R0 shown in Fig. 6 B, judge that the laser pulse of energy in permissible range R1 also can be used for processing.Therefore, it is possible to suppress the reduction of the utilization ratio of laser energy.Further, when LASER Light Source 10 job insecurity causes judging that energy exceeds permissible range R1, this laser pulse Lp1 is not used in processing.Therefore, it is possible to prevent the decline of the processing quality caused because of incident pulse energy shortage or too much laser pulse Lp2.
In above-described embodiment, before the processing starting the identical multiple workpieces 40 of the configuration pattern of processed point 41, operation before the processing of implementation step S1 ~ step S2 (Fig. 5), determines permissible range R1.Also the corresponding relation be associated with the configuration pattern of processed point 41 to determined permissible range R1 can be stored in storage device 51.
One example of this corresponding relation shown in Fig. 7.According to the configuration pattern of every 1 processed point 41, store lower limit and the higher limit of permissible range R1.When the configuration pattern of the processed point 41 of the workpiece 40 that the next one should be processed is stored in the correspondence table of Fig. 7, step S1 ~ step S2 (Fig. 2) can be omitted.In step s 6, as long as judge whether energy is being stored within the permissible range R1 in storage device 51.
Above, describe the present invention according to embodiment, but the present invention is not limited thereto.Such as, can carry out various change, improvement and combination etc., this is apparent to those skilled in the art.

Claims (7)

1. a laser processing device, it has:
LASER Light Source, exports pulse laser beam;
Objective table, keeps workpiece;
Optical beam scanner, makes the described pulse laser beam exported from described LASER Light Source incide described workpiece, and the incoming position on described workpiece surface is moved;
Photodetector, detects the physical quantity depending on pulse energy of each laser pulse of the described pulse laser beam exported from described LASER Light Source;
Path switch, switches the path of the described pulse laser beam exported from described LASER Light Source inciding between the 1st path of described workpiece and the 2nd path not inciding described workpiece; And
Control device, store position and the processing sequence of the multiple processed point on described workpiece surface, and control described optical beam scanner and described path switch according to the testing result of the position of described processed point, described processing sequence and described photodetector
Described control device performs the front preparatory process of processing, described optical beam scanner is controlled in preparatory process before described processing, the position of described processed point is incided according to described processing sequence to make described pulse laser beam, detected the described physical quantity depending on pulse energy of each laser pulse by described photodetector simultaneously, and the permissible range of described physical quantity is determined according to the distribution of described physical quantity
Before described processing after preparatory process, described control device make in the process of described workpiece the laser pulse of described physical quantity in described permissible range detected by described photodetector at least partially along described 1st propagated, make the laser pulse exceeding described permissible range along described 2nd propagated.
2. laser processing device according to claim 1, wherein,
Described control device determines higher limit and the lower limit of described permissible range according to the standard deviation of described physical quantity.
3. laser processing device according to claim 1 and 2, wherein,
Described control device the processed point of the workpiece that the next one should be processed configuration pattern from the configuration pattern of the processed point of workpiece once processed different time, before the processing carrying out the workpiece that the next one should be processed, perform preparatory process before described processing, redefine described permissible range.
4. laser processing device according to any one of claim 1 to 3, wherein,
Described physical quantity is the energy of the rising part of described laser pulse.
5. a laser processing, it has following operation:
Control optical beam scanner, to make pulse laser beam incide the position of the processed point of regulation according to the processing sequence of regulation, measure the physical quantity depending on pulse energy of each laser pulse simultaneously;
The permissible range of described physical quantity is determined according to the distribution of the described physical quantity measured; And
Make pulse laser beam incide the position of the described processed point on workpiece according to described processing sequence, thus carry out Laser Processing,
Carry out in the operation of Laser Processing described, measure the described physical quantity of each laser pulse of described pulse laser beam, what make this laser pulse when measurement result is in described permissible range incides described workpiece at least partially, does not make this laser pulse incide described workpiece when measurement result exceeds described permissible range.
6. laser processing according to claim 5, wherein,
Higher limit and the lower limit of described permissible range is determined according to the standard deviation of described physical quantity.
7. the laser processing according to claim 5 or 6, wherein,
Described physical quantity is the energy of the rising part of described laser pulse.
CN201510141679.0A 2014-03-27 2015-03-27 Laser processing device and laser processing Expired - Fee Related CN104942430B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014064974A JP6234296B2 (en) 2014-03-27 2014-03-27 Laser processing apparatus and laser processing method
JP2014-064974 2014-03-27

Publications (2)

Publication Number Publication Date
CN104942430A true CN104942430A (en) 2015-09-30
CN104942430B CN104942430B (en) 2017-06-27

Family

ID=54157781

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510141679.0A Expired - Fee Related CN104942430B (en) 2014-03-27 2015-03-27 Laser processing device and laser processing

Country Status (4)

Country Link
JP (1) JP6234296B2 (en)
KR (1) KR102002200B1 (en)
CN (1) CN104942430B (en)
TW (1) TWI577482B (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109323761A (en) * 2018-10-31 2019-02-12 中国科学院西安光学精密机械研究所 A kind of laser power on-line monitoring method and apparatus
CN109693035A (en) * 2017-10-24 2019-04-30 住友重机械工业株式会社 Control device, laser processing and the laser machine of laser machine
CN109759694A (en) * 2017-11-08 2019-05-17 住友重机械工业株式会社 Laser processing device
CN110035864A (en) * 2016-12-12 2019-07-19 住友重机械工业株式会社 Laser pulse cuts out device and laser processing
CN111707359A (en) * 2020-05-12 2020-09-25 固高科技(深圳)有限公司 Laser processing detection system and method
CN112108775A (en) * 2020-09-09 2020-12-22 湖南鼎一致远科技发展有限公司 Device and method for controlling lasers in parallel and laser marking machine
CN113385809A (en) * 2020-03-11 2021-09-14 住友重机械工业株式会社 Machining order determining device, laser machining device, and laser machining method
CN114799572A (en) * 2022-06-14 2022-07-29 广东宏石激光技术股份有限公司 Laser cutting machining method based on scanning path control energy distribution

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6732613B2 (en) 2016-09-07 2020-07-29 住友重機械工業株式会社 Laser light source and laser processing apparatus using the same
JP2022063595A (en) * 2020-10-12 2022-04-22 住友重機械工業株式会社 Control device of laser processing machine, laser processing machine, and laser processing method
TWI755109B (en) * 2020-10-23 2022-02-11 新代科技股份有限公司 Laser processing system and laser processing method thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1032306A (en) * 1987-10-03 1989-04-12 泰莱姆特电气公司 Utilize the method and apparatus of laser process material
EP1095726A1 (en) * 1999-01-14 2001-05-02 HITACHI VIA MECHANICS, Ltd. Laser beam machining and laser beam machine
CN1572049A (en) * 2001-10-16 2005-01-26 株式会社片冈制作所 Pulse oscillation solid-sate laser apparatus and laser machining apparatus
JP2006255744A (en) * 2005-03-16 2006-09-28 Sumitomo Heavy Ind Ltd Laser irradiation device and laser irradiation method
JP2008068288A (en) * 2006-09-14 2008-03-27 Sumitomo Heavy Ind Ltd Laser beam machining apparatus and laser beam machining method
JP2009006369A (en) * 2007-06-28 2009-01-15 Sumitomo Heavy Ind Ltd Laser beam machining apparatus and laser beam machining method
JP2009148812A (en) * 2007-12-21 2009-07-09 Sumitomo Heavy Ind Ltd Laser beam machining device and method
US20100331829A1 (en) * 2008-12-01 2010-12-30 Amo Development, Llc. System and method for multi-beam scanning
TW201350241A (en) * 2012-03-06 2013-12-16 Sumitomo Heavy Industries Laser processing apparatus and laser processing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2858236B2 (en) 1996-03-19 1999-02-17 住友重機械工業株式会社 Laser processing equipment
JP3356681B2 (en) * 1998-03-31 2002-12-16 住友重機械工業株式会社 Laser processing method and apparatus
JP4074485B2 (en) * 2002-06-28 2008-04-09 住友重機械工業株式会社 Laser processing method and apparatus
JP4221204B2 (en) * 2002-10-11 2009-02-12 日立ビアメカニクス株式会社 Printed circuit board processing machine
JP4937011B2 (en) * 2007-06-26 2012-05-23 住友重機械工業株式会社 Laser processing apparatus and laser processing method

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1032306A (en) * 1987-10-03 1989-04-12 泰莱姆特电气公司 Utilize the method and apparatus of laser process material
EP1095726A1 (en) * 1999-01-14 2001-05-02 HITACHI VIA MECHANICS, Ltd. Laser beam machining and laser beam machine
CN1572049A (en) * 2001-10-16 2005-01-26 株式会社片冈制作所 Pulse oscillation solid-sate laser apparatus and laser machining apparatus
JP2006255744A (en) * 2005-03-16 2006-09-28 Sumitomo Heavy Ind Ltd Laser irradiation device and laser irradiation method
JP2008068288A (en) * 2006-09-14 2008-03-27 Sumitomo Heavy Ind Ltd Laser beam machining apparatus and laser beam machining method
JP2009006369A (en) * 2007-06-28 2009-01-15 Sumitomo Heavy Ind Ltd Laser beam machining apparatus and laser beam machining method
JP2009148812A (en) * 2007-12-21 2009-07-09 Sumitomo Heavy Ind Ltd Laser beam machining device and method
US20100331829A1 (en) * 2008-12-01 2010-12-30 Amo Development, Llc. System and method for multi-beam scanning
TW201350241A (en) * 2012-03-06 2013-12-16 Sumitomo Heavy Industries Laser processing apparatus and laser processing method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110035864A (en) * 2016-12-12 2019-07-19 住友重机械工业株式会社 Laser pulse cuts out device and laser processing
CN109693035A (en) * 2017-10-24 2019-04-30 住友重机械工业株式会社 Control device, laser processing and the laser machine of laser machine
CN109759694A (en) * 2017-11-08 2019-05-17 住友重机械工业株式会社 Laser processing device
CN109323761A (en) * 2018-10-31 2019-02-12 中国科学院西安光学精密机械研究所 A kind of laser power on-line monitoring method and apparatus
CN109323761B (en) * 2018-10-31 2020-12-25 中国科学院西安光学精密机械研究所 Laser power online monitoring method and device
CN113385809A (en) * 2020-03-11 2021-09-14 住友重机械工业株式会社 Machining order determining device, laser machining device, and laser machining method
CN113385809B (en) * 2020-03-11 2022-09-27 住友重机械工业株式会社 Machining order determining device, laser machining device, and laser machining method
CN111707359A (en) * 2020-05-12 2020-09-25 固高科技(深圳)有限公司 Laser processing detection system and method
CN112108775A (en) * 2020-09-09 2020-12-22 湖南鼎一致远科技发展有限公司 Device and method for controlling lasers in parallel and laser marking machine
CN114799572A (en) * 2022-06-14 2022-07-29 广东宏石激光技术股份有限公司 Laser cutting machining method based on scanning path control energy distribution

Also Published As

Publication number Publication date
KR20150112814A (en) 2015-10-07
TWI577482B (en) 2017-04-11
KR102002200B1 (en) 2019-07-19
JP6234296B2 (en) 2017-11-22
JP2015186818A (en) 2015-10-29
CN104942430B (en) 2017-06-27
TW201540406A (en) 2015-11-01

Similar Documents

Publication Publication Date Title
CN104942430A (en) Laser processing device and laser processing method
US9444995B2 (en) System and method for controlling a tracking autofocus (TAF) sensor in a machine vision inspection system
JP6363660B2 (en) Laser processing apparatus and laser processing system
US12020518B2 (en) Vehicle inspection method, apparatus and system, and computer-readable storage medium
WO2015129907A1 (en) Distance measuring device and parallax calculation system
US9304085B2 (en) Laser scanning microscope system and method of setting laser-light intensity value
CN104972221B (en) A kind of laser process equipment and Laser Processing focus searching method
JP2010082663A (en) Laser beam machine
US9269058B2 (en) Laser machining method, laser machining apparatus, and laser machining program
EP2834034A1 (en) A method and a system for color marking of metals
US20190369214A1 (en) Laser positioning apparatus and laser positioning method
CN108367385A (en) Method for the reference focal position for determining laser beam
JP6535480B2 (en) Laser processing state determination method and apparatus
CN108195292B (en) Displacement measuring method
JPH08247741A (en) Curvature measuring device of surface
DE102016200188A1 (en) Laser device and laser beam detector for detecting light of a laser beam device
US11761764B2 (en) Method and laser tracking system for using laser level to track detector
JP2022527522A (en) Offset value compensation method
KR20160073785A (en) Laser processing system and laser processing method using the laser processing system
JP2017181263A (en) Defect detection device
CN109373933B (en) Device and method for detecting verticality of diffraction grating
JP2020527291A (en) Sensor system for direct calibration of high power density lasers used in direct metal laser melting
JP5266837B2 (en) Preceding vehicle recognition device and preceding vehicle recognition method
KR20210061540A (en) Multifunctional device comprising lidar and camera
US20240227069A9 (en) Method for monitoring a laser machining process on workpieces

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170627