CN104892035A - 一种超高纯石英陶瓷坩埚的制备方法 - Google Patents
一种超高纯石英陶瓷坩埚的制备方法 Download PDFInfo
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- CN104892035A CN104892035A CN201510277592.6A CN201510277592A CN104892035A CN 104892035 A CN104892035 A CN 104892035A CN 201510277592 A CN201510277592 A CN 201510277592A CN 104892035 A CN104892035 A CN 104892035A
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- crucible
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- silicon powder
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 53
- 239000010453 quartz Substances 0.000 title claims abstract description 49
- 238000002360 preparation method Methods 0.000 title claims abstract description 35
- 239000000919 ceramic Substances 0.000 title claims abstract description 31
- 238000001035 drying Methods 0.000 claims abstract description 14
- 230000001590 oxidative effect Effects 0.000 claims abstract description 10
- 230000001680 brushing effect Effects 0.000 claims abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 84
- 239000011863 silicon-based powder Substances 0.000 claims description 55
- 238000002156 mixing Methods 0.000 claims description 52
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 37
- 239000012498 ultrapure water Substances 0.000 claims description 37
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 28
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 239000010703 silicon Substances 0.000 claims description 20
- 239000002253 acid Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 14
- 238000003756 stirring Methods 0.000 claims description 14
- BSWXAWQTMPECAK-UHFFFAOYSA-N 6,6-diethyloctyl dihydrogen phosphate Chemical compound CCC(CC)(CC)CCCCCOP(O)(O)=O BSWXAWQTMPECAK-UHFFFAOYSA-N 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 11
- 229920002907 Guar gum Polymers 0.000 claims description 11
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 11
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 239000000194 fatty acid Substances 0.000 claims description 11
- 229930195729 fatty acid Natural products 0.000 claims description 11
- 150000004665 fatty acids Chemical class 0.000 claims description 11
- 239000000665 guar gum Substances 0.000 claims description 11
- 229960002154 guar gum Drugs 0.000 claims description 11
- 235000010417 guar gum Nutrition 0.000 claims description 11
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 claims description 11
- 229920001522 polyglycol ester Polymers 0.000 claims description 11
- -1 polypropylene glycerol Polymers 0.000 claims description 11
- 229920002545 silicone oil Polymers 0.000 claims description 11
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims description 9
- 239000006229 carbon black Substances 0.000 claims description 9
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 9
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 9
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 9
- 229920002554 vinyl polymer Polymers 0.000 claims description 9
- 238000001354 calcination Methods 0.000 claims description 8
- 239000002131 composite material Substances 0.000 claims description 8
- 238000001291 vacuum drying Methods 0.000 claims description 8
- 241000196324 Embryophyta Species 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- 238000007766 curtain coating Methods 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 238000007761 roller coating Methods 0.000 claims description 3
- JHUUPUMBZGWODW-UHFFFAOYSA-N 3,6-dihydro-1,2-dioxine Chemical compound C1OOCC=C1 JHUUPUMBZGWODW-UHFFFAOYSA-N 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 7
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 4
- 239000002002 slurry Substances 0.000 abstract description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 239000000654 additive Substances 0.000 abstract 1
- 239000008367 deionised water Substances 0.000 abstract 1
- 229910021641 deionized water Inorganic materials 0.000 abstract 1
- 230000002035 prolonged effect Effects 0.000 abstract 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 7
- 238000005266 casting Methods 0.000 description 6
- 206010013786 Dry skin Diseases 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000011712 cell development Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
种类 | 良率 |
普通坩埚 | 67.3% |
普通高纯坩埚 | 67.5% |
实施例1 | 72.0% |
实施例2 | 71.5% |
实施例3 | 73.5% |
实施例4 | 73.4% |
实施例5 | 73.6% |
类别 | 抗折强度/MPa | 抗压强度/MPa |
普通坩埚 | 27 | 42 |
普通高纯坩埚 | 32 | 54 |
实施例1 | 42.8 | 72 |
实施例2 | 44.5 | 71 |
实施例3 | 47 | 72.5 |
实施例4 | 47.3 | 73.1 |
实施例5 | 47.5 | 73.5 |
类别 | 体积密度/g/cm3 | 显气孔率/% |
普通坩埚 | 1.75 | 18 |
普通高纯坩埚 | 1.8 | 17.5 |
实施例1 | 2.1 | 11.5 |
实施例2 | 2.2 | 11.0 |
实施例3 | 2.3 | 10.2 |
实施例4 | 2.3 | 10.1 |
实施例5 | 2.4 | 10.1 |
Claims (9)
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CN201510277592.6A CN104892035B (zh) | 2015-05-27 | 2015-05-27 | 一种超高纯石英陶瓷坩埚的制备方法 |
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CN104892035A true CN104892035A (zh) | 2015-09-09 |
CN104892035B CN104892035B (zh) | 2016-12-28 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107337885A (zh) * | 2017-06-23 | 2017-11-10 | 石家庄优士科电子科技有限公司 | 多晶硅铸锭石英坩埚高纯石英砂涂层粘结剂及其制备方法 |
CN114230323A (zh) * | 2021-12-22 | 2022-03-25 | 东海县太阳光新能源有限公司 | 一种石英陶瓷坩埚的制作方法 |
CN118326498A (zh) * | 2024-06-11 | 2024-07-12 | 浙江美晶新材料股份有限公司 | 一种应用于单晶硅生产的多层复合石英坩埚及其制备方法 |
-
2015
- 2015-05-27 CN CN201510277592.6A patent/CN104892035B/zh active Active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107337885A (zh) * | 2017-06-23 | 2017-11-10 | 石家庄优士科电子科技有限公司 | 多晶硅铸锭石英坩埚高纯石英砂涂层粘结剂及其制备方法 |
CN107337885B (zh) * | 2017-06-23 | 2019-10-01 | 石家庄优士科电子科技有限公司 | 多晶硅铸锭石英坩埚高纯石英砂涂层粘结剂及其制备方法 |
CN114230323A (zh) * | 2021-12-22 | 2022-03-25 | 东海县太阳光新能源有限公司 | 一种石英陶瓷坩埚的制作方法 |
CN114230323B (zh) * | 2021-12-22 | 2022-11-18 | 东海县太阳光新能源有限公司 | 一种石英陶瓷坩埚的制作方法 |
CN118326498A (zh) * | 2024-06-11 | 2024-07-12 | 浙江美晶新材料股份有限公司 | 一种应用于单晶硅生产的多层复合石英坩埚及其制备方法 |
CN118326498B (zh) * | 2024-06-11 | 2024-08-16 | 浙江美晶新材料股份有限公司 | 一种应用于单晶硅生产的多层复合石英坩埚及其制备方法 |
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Effective date of registration: 20161012 Address after: 266000 Licang, Qingdao, No. nine East water road, No. 320, No. Applicant after: Gu Yukui Address before: Shinan District 266071 Shandong city of Qingdao province Xuzhou Road 2, building 15, unit seven, 702 households Applicant before: Sun Jian |
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Inventor after: Wang Xiang Inventor before: Sun Jian Inventor before: Xie Yan Inventor before: Mu Rongsheng |
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Effective date of registration: 20170825 Address after: 222300 Qilin Road, Donghai County Development Zone, Jiangsu, Lianyungang, 26 Patentee after: Sinoma Jiangsu Solar Energy New Materials Co.,Ltd. Address before: 266000 Licang, Qingdao, No. nine East water road, No. 320, No. Patentee before: Gu Yukui |
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