CN104821345A - 一种抗电势诱导衰减太阳能电池的制备方法 - Google Patents
一种抗电势诱导衰减太阳能电池的制备方法 Download PDFInfo
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- CN104821345A CN104821345A CN201510227045.7A CN201510227045A CN104821345A CN 104821345 A CN104821345 A CN 104821345A CN 201510227045 A CN201510227045 A CN 201510227045A CN 104821345 A CN104821345 A CN 104821345A
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- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000015556 catabolic process Effects 0.000 title abstract 2
- 238000006731 degradation reaction Methods 0.000 title abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 76
- 239000010703 silicon Substances 0.000 claims abstract description 76
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 76
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 55
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 32
- 230000003647 oxidation Effects 0.000 claims abstract description 30
- 239000011521 glass Substances 0.000 claims abstract description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 5
- 238000007650 screen-printing Methods 0.000 claims abstract description 4
- 238000001035 drying Methods 0.000 claims description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- 238000002360 preparation method Methods 0.000 claims description 22
- 238000010926 purge Methods 0.000 claims description 20
- 230000006698 induction Effects 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 13
- 238000000137 annealing Methods 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 238000009792 diffusion process Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 230000005855 radiation Effects 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 38
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 19
- 239000000377 silicon dioxide Substances 0.000 abstract description 19
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 230000003667 anti-reflective effect Effects 0.000 abstract description 2
- 238000002161 passivation Methods 0.000 abstract description 2
- HIVGXUNKSAJJDN-UHFFFAOYSA-N [Si].[P] Chemical compound [Si].[P] HIVGXUNKSAJJDN-UHFFFAOYSA-N 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 12
- 239000003595 mist Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910019213 POCl3 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
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- 238000005245 sintering Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1868—Passivation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Description
Claims (9)
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CN201510227045.7A CN104821345B (zh) | 2015-05-05 | 2015-05-05 | 一种抗电势诱导衰减太阳能电池的制备方法 |
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CN201510227045.7A CN104821345B (zh) | 2015-05-05 | 2015-05-05 | 一种抗电势诱导衰减太阳能电池的制备方法 |
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CN104821345A true CN104821345A (zh) | 2015-08-05 |
CN104821345B CN104821345B (zh) | 2017-04-12 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105118894A (zh) * | 2015-09-11 | 2015-12-02 | 国网天津市电力公司 | 抗pid晶体硅电池的制备方法 |
CN105483832A (zh) * | 2015-12-29 | 2016-04-13 | 辛煜 | 一种抗电势诱导衰减效应的晶硅表面氧化装置及其方法 |
CN105990468A (zh) * | 2015-02-11 | 2016-10-05 | 英利集团有限公司 | 硅片生产系统 |
CN109494281A (zh) * | 2018-12-03 | 2019-03-19 | 乐山新天源太阳能科技有限公司 | 太阳能电池抗pid装置 |
CN111969083A (zh) * | 2020-09-22 | 2020-11-20 | 浙江鸿禧能源股份有限公司 | 一种抗pid太阳能电池片的制备方法 |
CN114993028A (zh) * | 2022-06-17 | 2022-09-02 | 广东高景太阳能科技有限公司 | 一种硅片烘干处理方法及系统 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02303028A (ja) * | 1989-05-17 | 1990-12-17 | Fujitsu Ltd | 洗浄乾燥方法および洗浄乾燥装置 |
CN1441504A (zh) * | 2003-04-03 | 2003-09-10 | 上海交通大学 | 高效低成本大面积晶体硅太阳电池工艺 |
CN1719621A (zh) * | 2005-04-21 | 2006-01-11 | 南京中电光伏科技有限公司 | 一种硅太阳电池的结构与制作方法 |
CN101241952A (zh) * | 2007-02-07 | 2008-08-13 | 北京中科信电子装备有限公司 | 高效低成本薄片晶体硅太阳能电池片工艺 |
CN102646756A (zh) * | 2012-04-26 | 2012-08-22 | 深圳市科聚新材料有限公司 | I-iii-iv族化合物太阳能电池用二氧化硅阻隔层的制备方法 |
CN103872184A (zh) * | 2014-04-03 | 2014-06-18 | 苏州阿特斯阳光电力科技有限公司 | 一种抗pid晶体硅太阳能电池制作方法 |
CN103928535A (zh) * | 2014-04-25 | 2014-07-16 | 中利腾晖光伏科技有限公司 | 抗pid晶体硅电池及其制备方法 |
JP2014154675A (ja) * | 2013-02-07 | 2014-08-25 | Mitsubishi Electric Corp | 光電変換モジュールおよびその製造方法 |
CN104183670A (zh) * | 2014-09-05 | 2014-12-03 | 浙江晶科能源有限公司 | 一种太阳能电池钝化膜的制作方法 |
-
2015
- 2015-05-05 CN CN201510227045.7A patent/CN104821345B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02303028A (ja) * | 1989-05-17 | 1990-12-17 | Fujitsu Ltd | 洗浄乾燥方法および洗浄乾燥装置 |
CN1441504A (zh) * | 2003-04-03 | 2003-09-10 | 上海交通大学 | 高效低成本大面积晶体硅太阳电池工艺 |
CN1719621A (zh) * | 2005-04-21 | 2006-01-11 | 南京中电光伏科技有限公司 | 一种硅太阳电池的结构与制作方法 |
CN101241952A (zh) * | 2007-02-07 | 2008-08-13 | 北京中科信电子装备有限公司 | 高效低成本薄片晶体硅太阳能电池片工艺 |
CN102646756A (zh) * | 2012-04-26 | 2012-08-22 | 深圳市科聚新材料有限公司 | I-iii-iv族化合物太阳能电池用二氧化硅阻隔层的制备方法 |
JP2014154675A (ja) * | 2013-02-07 | 2014-08-25 | Mitsubishi Electric Corp | 光電変換モジュールおよびその製造方法 |
CN103872184A (zh) * | 2014-04-03 | 2014-06-18 | 苏州阿特斯阳光电力科技有限公司 | 一种抗pid晶体硅太阳能电池制作方法 |
CN103928535A (zh) * | 2014-04-25 | 2014-07-16 | 中利腾晖光伏科技有限公司 | 抗pid晶体硅电池及其制备方法 |
CN104183670A (zh) * | 2014-09-05 | 2014-12-03 | 浙江晶科能源有限公司 | 一种太阳能电池钝化膜的制作方法 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105990468A (zh) * | 2015-02-11 | 2016-10-05 | 英利集团有限公司 | 硅片生产系统 |
CN105118894A (zh) * | 2015-09-11 | 2015-12-02 | 国网天津市电力公司 | 抗pid晶体硅电池的制备方法 |
CN105483832A (zh) * | 2015-12-29 | 2016-04-13 | 辛煜 | 一种抗电势诱导衰减效应的晶硅表面氧化装置及其方法 |
CN105483832B (zh) * | 2015-12-29 | 2018-01-19 | 辛煜 | 一种抗电势诱导衰减效应的晶硅表面氧化装置及其方法 |
CN109494281A (zh) * | 2018-12-03 | 2019-03-19 | 乐山新天源太阳能科技有限公司 | 太阳能电池抗pid装置 |
CN109494281B (zh) * | 2018-12-03 | 2024-01-26 | 乐山新天源太阳能科技有限公司 | 太阳能电池抗pid装置 |
CN111969083A (zh) * | 2020-09-22 | 2020-11-20 | 浙江鸿禧能源股份有限公司 | 一种抗pid太阳能电池片的制备方法 |
CN114993028A (zh) * | 2022-06-17 | 2022-09-02 | 广东高景太阳能科技有限公司 | 一种硅片烘干处理方法及系统 |
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Address after: 528100, Sanshui District, Guangdong City, Foshan Industrial Park, No. C District, No. 69 Patentee after: GUANGDONG AIKO SOLAR ENERGY TECHNOLOGY Co.,Ltd. Address before: 528100, Sanshui District, Guangdong City, Foshan Industrial Park, No. C District, No. 69 Patentee before: GUANGDONG AIKO SOLAR ENERGY TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20180102 Address after: 528100, Sanshui District, Guangdong City, Foshan Industrial Park, No. C District, No. 69 Co-patentee after: ZHEJIANG AIKO SOLAR ENERGY TECHNOLOGY Co.,Ltd. Patentee after: GUANGDONG AIKO SOLAR ENERGY TECHNOLOGY Co.,Ltd. Address before: 528100, Sanshui District, Guangdong City, Foshan Industrial Park, No. C District, No. 69 Patentee before: GUANGDONG AIKO SOLAR ENERGY TECHNOLOGY Co.,Ltd. |