CN104730871A - Different-space different-size substrate alignment method - Google Patents
Different-space different-size substrate alignment method Download PDFInfo
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- CN104730871A CN104730871A CN201310699737.2A CN201310699737A CN104730871A CN 104730871 A CN104730871 A CN 104730871A CN 201310699737 A CN201310699737 A CN 201310699737A CN 104730871 A CN104730871 A CN 104730871A
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Abstract
The invention relates to a different-space different-size substrate alignment method, which comprises: capturing actual local images of two substrates with different sizes; comparing the particular labels of the two substrates within the standard local character regions, and acquiring the particular labels of the two substrates within the actual local character regions; respectively establishing actual coordinate systems of the two substrates so as to synthesize an alignment assembly coordinate system; comparing the coordinate values of the particular labels of the two substrates within the two actual coordinate systems so as to acquire a first group of offsets, and comparing the sizes of the two substrates so as to obtain the size difference; using the first group of the offsets and the size difference to correct the coordinate value of the particular label of one of the two substrates; comparing the coordinate values of the particular labels of the two substrates so as to acquire a second group of offsets; and moving the substrate to the position compensated by the second group of the offsets.
Description
Technical field
The invention relates to a kind of base material alignment method, the different sized substrate alignment method in especially a kind of different space, it is applicable to the contraposition with two substrates of the different size of specific markers or given configuration under different waiting space.
Background technology
The technology of typical doubling plate contraposition is applied as the accurate contraposition of glass light shield, and in addition, the scope of application doubling plate technique of counterpoint is very extensive, as the fields such as semiconductor industry, flat-panel screens industry, printed circuit board (PCB) industry are all its application.And the accurate contraposition of light shield is the gordian technique of all kinds of exposure machines of above-mentioned electronic industry, if its gordian technique can be grasped to reduce manufacturing cost, then greatest benefiting will be had to raising international competitiveness.
No. US7946669, U.S. Patent Bulletin discloses a kind of plug-type alignment device, mainly by two charge coupled cells (Charge Coupled Device; CCD) insert among doubling plate simultaneously, capture the image of upper and lower alignment mark respectively, then carry out contraposition.Two charge coupled cells must first correct in single coordinate space, and therefore this alignment device belongs to the space contraposition of single coordinate space capture.
No. TWI288365, Taiwan Patent bulletin discloses a kind of alignment device reaching the doubling plate of high-accuracy contraposition demand, mainly two charge coupled cells are all positioned over above doubling plate, capture the synthetic image of two groups of non-overlapping upper and lower alignment marks simultaneously, then carry out accurate contraposition via after spatial operation.Two charge coupled cells also must first correct in single coordinate space, and therefore this alignment device also belongs to the space contraposition of single coordinate space capture.
Prior art is all alignment mark is synthesized overlapping mark image to carry out single coordinate space calculating contraposition, and only can carry out in the base material of same size.
But, in some high-tech industry in process, often because of the singularity of material, assist utilizing video vision and carry out fitting, combine or combine the puzzlement that the contraposition object that often can suffer from different size cannot carry out image contraposition in same image acquisition unit.Such as, in contact panel industry, because contact panel has the lamination coating technique of various and different size, the alignment mark of eclipsed form therefore sometimes cannot be used to design.
Therefore, needs are just had to provide a kind of different space different sized substrate alignment method, to solve aforesaid problem.
Summary of the invention
A kind of alignment method is the object of the present invention is to provide to be applicable to the contraposition with two substrates of the different size of specific markers or given configuration under different waiting space.
For reaching above-mentioned purpose, the invention provides the different sized substrate alignment method in a kind of different space, comprise the following steps: two image acquisition units after two image acquisition units after utilizing the correction in the first waiting space and the correction in the second waiting space, capture at least two actual topographies of two substrates of the different size in this first and second waiting space respectively; Specific markers in the standard local characteristic region of this two substrate of difference comparison or given configuration, and the specific markers obtained at least two actual local characteristic region of this two substrate or given configuration; Set up the actual coordinate system of this two substrate respectively, to synthesize a pair hyte dress coordinate system; The specific markers of two substrates in this two actual coordinates system of comparison or the coordinate figure of given configuration are to obtain first group of side-play amount, and the size of this two substrate of comparison is to obtain size residual quantity; Utilize this first group of side-play amount and this size residual quantity, revise the wherein specific markers of a substrate or the coordinate figure of given configuration of this two substrate; The revised specific markers of wherein this substrate of two substrates in this two actual coordinates system of comparison or the coordinate figure of given configuration and the specific markers of wherein another substrate of this two substrate or the coordinate figure of given configuration, to obtain second group of side-play amount; Wherein this substrate of two substrates is moved to the position that this second group of side-play amount compensates; Utilize one first predetermined amount of movement, make wherein this substrate of two substrates move in a pair assembling space by this first waiting space; And utilize one second predetermined amount of movement, wherein another substrate of two substrates is moved in this contraposition assembling space by this second waiting space.
The different sized substrate alignment method in above-mentioned different space, also comprises the following step:
The locus of two image acquisition units of precorrection in one first waiting space and two image acquisition units in one second waiting space.
The different sized substrate alignment method in above-mentioned different space, also comprises the following step:
Utilize two image acquisition units after two image acquisition units after the correction in this first waiting space and the correction in this second waiting space, the specific markers in the standard local characteristic region of two substrates of predefine different size or given configuration.
The different sized substrate alignment method in above-mentioned different space, also comprises the following step:
Confirm whether this second group of side-play amount is less than the desired value for reaching.
The different sized substrate alignment method in above-mentioned different space, also comprises the following step:
Make this two substrate in contraposition assembling space, complete stacking contraposition assembling.
The different sized substrate alignment method in above-mentioned different space, wherein the step of the locus of two image acquisition units of precorrection in one first waiting space and two image acquisition units in one second waiting space comprises the following step:
By superimposed for two correcting sheets, make the specific markers of those correcting sheets overlapping;
Those correcting sheets after superimposed are arranged at above first and second image acquisition unit in this first waiting space, this first and second image acquisition unit mobile with the specific markers at first cornerwise two ends of the dotted line circle zone of those correcting sheets after superimposed in this first waiting space of acquisition, so to correct the position of this first and second image acquisition unit in this first waiting space;
Those correcting sheets after superimposed are arranged at below the 3rd and the 4th image acquisition unit in this second waiting space, mobile 3rd and the 4th image acquisition unit with the specific markers at second cornerwise two ends of the dotted line circle zone of those correcting sheets after superimposed in this second waiting space of acquisition, so to correct the position of the 3rd and the 4th image acquisition unit in this second waiting space; And
This first to fourth image acquisition unit after correction will be fixed motionless.
The different sized substrate alignment method in above-mentioned different space, wherein this two substrate wherein this substrate be specifically marked as cross shape marks, and wherein another substrate of this two substrate be specifically marked as the tubular mark of cross.
The different sized substrate alignment method in above-mentioned different space, wherein the given configuration of wherein this substrate of this two substrate is right angle corner, and the given configuration of wherein another substrate of this two substrate is right angle corner.
The different sized substrate alignment method in above-mentioned different space, wherein this second group of side-play amount in order to compensate those image acquisition units in this first and second waiting space vision difference needed for X, Y direction displacement and the anglec of rotation.
Alignment method of the present invention is applicable to the contraposition with two substrates of the different size of specific markers or given configuration under different waiting space.When this two substrate is positioned at different waiting space, utilize the specific markers (or given configuration) in the actual local characteristic region of this two substrate, to carry out the coordinate figure of the coordinate (or given configuration) of the specific markers of this two substrate of calculated for subsequent.Revise the coordinate figure of the specific markers (or given configuration) of a wherein substrate of this two substrate, make two substrates of this different size be modeled to two substrates of same size.Then, the different sized substrate contraposition drift correction of carrying out under different space compensates, and continuous carry out rear technique (such as: laminating or assembling), do not need the complicated transformational relation setting up image coordinate system and contraposition coordinate system, therefore effectively can reduce a large amount of mathematical computations and reduce equipment adjusting machine time, and increasing the elasticity of contraposition attaching process.
More obviously, hereafter can will coordinate appended accompanying drawing, be described in detail below to allow above and other object of the present invention, feature and advantage.
Accompanying drawing explanation
Fig. 1 a and 1b is the process flow diagram of the alignment method for the different sized substrate in different space of one embodiment of the invention;
Fig. 2 a is the floor map of two correcting sheets of one embodiment of the invention;
Fig. 2 b is two correcting sheets of one embodiment of the invention and the schematic perspective view of four image acquisition units;
Fig. 3 is the schematic perspective view of the alignment device for the different sized substrate in different space of one embodiment of the invention, the specific markers (or given configuration) in the standard local characteristic region of two substrates of its display different size;
Fig. 4 a is the floor map of the first standard topography of one embodiment of the invention;
Fig. 4 b is the floor map of the second standard topography of one embodiment of the invention;
Fig. 5 is the schematic perspective view of the alignment device for the different sized substrate in different space of one embodiment of the invention, and it shows at least two actual topographies of two substrates of different waiting space;
Fig. 6 a is the floor map of the first actual topography of one embodiment of the invention;
Fig. 6 b is the floor map of the second actual topography of one embodiment of the invention;
Fig. 7 a is the floor map of the contraposition assembling coordinate system of one embodiment of the invention, its display specific markers coordinate figure (X1, Y1), (X2, Y2) and specific markers coordinate figure (X3, Y3), (X4, Y4);
Fig. 7 b is the floor map of the contraposition assembling coordinate system of one embodiment of the invention, its display given configuration coordinate figure (X1, Y1), (X2, Y2) and given configuration coordinate figure (X3, Y3), (X4, Y4);
Fig. 8 a is the floor map of the contraposition assembling coordinate system of one embodiment of the invention, its display specific markers coordinate figure is modified to (X1 ', Y1 '), (X2 ', Y2 ') and specific markers coordinate figure (X3, Y3), (X4, Y4);
Fig. 8 b is the floor map of the contraposition assembling coordinate system of one embodiment of the invention, its display given configuration coordinate figure is modified to (X1 ', Y1 '), (X2 ', Y2 ') and given configuration coordinate figure (X3, Y3), (X4, Y4);
Fig. 9 is the schematic perspective view of the alignment device for the different sized substrate in different space of one embodiment of the invention, and wherein this substrate of two substrates is moved to the position that this second group of side-play amount compensates by its display;
Figure 10 is the schematic perspective view of the alignment device for the different sized substrate in different space of one embodiment of the invention, and it shows two substrates and moves in contraposition assembling space by respective waiting space; And
Figure 11 is the schematic perspective view of the alignment device for the different sized substrate in different space of one embodiment of the invention, and it shows this two substrate in contraposition assembling space, completes stacking contraposition assembling.
Wherein, Reference numeral:
11 correcting sheet 12 correcting sheets
20 first substrate 20 ' first substrates
21 contact panels
22a specific markers 22a ' specific markers
The specific outer 22b ' given configuration of 22b
30 second substrate 30 ' second substrates
31 liquid crystal panel 31 ' liquid crystal panels
32a specific markers 32a ' specific markers
32b given configuration 32b ' given configuration
40 3 axle travel mechanism 60 plummers
70 universal stages
100 first waiting space, waiting spaces 200 second
300 contraposition assembling spaces
510 first standard topography 511 first standard local characteristic region
520 first standard topography 521 first standard local characteristic region
810 second standard local Figure 81 1 second standard local characteristic region
820 second standard local Figure 82 1 second standard local characteristic region
The 910 first actual local characteristic region of actual topography 911 first
The 920 first actual local characteristic region of actual topography 921 first
The 930 second actual local characteristic region of actual topography 931 second
The 940 second actual local characteristic region of actual topography 941 second
CCD1 image acquisition unit CCD2 image acquisition unit
CCD3 image acquisition unit CCD4 image acquisition unit
S01 ~ S13 step
(X1, Y1), (X2, Y2) centre coordinate value (X1 ', Y1 '), (X2 ', Y2 ') centre coordinate value
(X3, Y3), (X4, Y4) centre coordinate value
The predetermined amount of movement of △ X1 ' first predetermined amount of movement △ X2 ' second
△ X3, △ Y3, △ θ 3 second groups of predetermined amount of movements of side-play amount △ Z
Embodiment
In order to above-mentioned and other object of the present invention, feature, advantage can be become apparent, hereafter especially exemplified by present pre-ferred embodiments, and appended accompanying drawing will be coordinated, be described in detail below.Moreover, the direction term that the present invention mentions, such as " on ", D score, "front", "rear", "left", "right", " interior ", " outward " or " side " etc., be only the direction with reference to attached drawings.Therefore, the direction term of use is in order to illustrate and to understand the present invention, and is not used to limit the present invention.
Fig. 1 a and 1b is the process flow diagram of the alignment method for the different sized substrate in different space of one embodiment of the invention.This alignment method comprises the following step: the locus of step (S01), precorrection two image acquisition units in the first waiting space and two image acquisition units in the second waiting space; Step (S02), utilize two image acquisition units after two image acquisition units after the correction in this first waiting space and the correction in this second waiting space, the specific markers (or given configuration) in the standard local characteristic region of two substrates of predefine different size; Step (S03), utilize in one first waiting space correction after two image acquisition units and two image acquisition units after correction in one second waiting space, capture at least two actual topographies of two substrates in this first and second waiting space respectively; Specific markers (or given configuration) in the standard local characteristic region of step (S04), respectively this two substrate of comparison, and obtain the specific markers (or given configuration) at least two actual local characteristic region of this two substrate; Step (S05), set up the actual coordinate system of this two substrate respectively, to synthesize a pair hyte dress coordinate system; The coordinate figure of the specific markers (or given configuration) of two substrates in step (S06), this two actual coordinates system of comparison is to obtain first group of side-play amount, and the size of this two substrate of comparison is to obtain size residual quantity; Step (S07), utilize this first group of side-play amount and size residual quantity, revise the coordinate figure of the specific markers (or given configuration) of a wherein substrate of this two substrate; (S08) coordinate figure of the revised specific markers of wherein this substrate (or given configuration) of two substrates, in this two actual coordinates system of comparison and specific markers (or given configuration) coordinate figure of wherein another substrate of this two substrate, to obtain second group of side-play amount; Step (S09), wherein this substrate of two substrates moved to the position that this second group of side-play amount compensate; Step (S10), confirm whether this second group of side-play amount is less than the desired value for reaching; Step (S11), utilize one first predetermined amount of movement, make wherein this substrate of two substrates move in a pair assembling space by this first waiting space; Step (S12), utilize one second predetermined amount of movement, make wherein another substrate of two substrates move in this contraposition assembling space by this second waiting space; And step (S13), make this two substrate complete in contraposition assembling space stacking contraposition assembling.The present invention is by the implementation detail and the principle thereof that hereafter utilize the 1 to 11 figure to describe above steps one by one in detail.
Please refer to Fig. 1 a, 2a and 2b, in step (S01), the locus of two image acquisition units of precorrection in the first waiting space and two image acquisition units in the second waiting space.In the present embodiment, with the correcting sheet 11,12 after superimposed, the locus of precorrection two image acquisition unit CCD1, CCD2 in the first waiting space 100 and two image acquisition unit CCD3, CCD4 in the second waiting space 200.Citing, please refer to 2a figure, by two correcting sheets 11,12 superimposed, makes the specific markers of those correcting sheets 11,12 overlapping.Those correcting sheets 11,12 can be transparency carrier, capture specific markers image to facilitate those image acquisition units CCD1, CCD2, CCD3, CCD4.Those correcting sheets 11,12 comprise a dotted line circle zone, and it is modeled as undersized first substrate, and such as this dotted line circle zone is rectangle, and it has the first diagonal line.Those correcting sheets 11,12 comprise a solid line circle zone, and it is modeled as large-sized second substrate, and such as this solid line circle zone is rectangle, and it has the second diagonal line.This second diagonal line is greater than this first diagonal line.Those correcting sheets 11,12 after superimposed are arranged at above this two image acquisition unit CCD1, the CCD2 in the first waiting space 100, mobile this two image acquisition unit CCD1, CCD2 with the specific markers 22a at first cornerwise two ends of the dotted line circle zone of the correcting sheet 11,12 after superimposed in this first waiting space 100 of acquisition, so to correct this two image acquisition unit CCD1, CCD2 position in this first waiting space 100.Then, correcting sheet 11,12 after superimposed is arranged at below two image acquisition unit CCD3, CCD4 in the second waiting space 200, mobile this two image acquisition unit CCD3, CCD4 with the specific markers 32a at second cornerwise two ends of the dotted line circle zone of the correcting sheet 11,12 after superimposed in this second waiting space 200 of acquisition, so to correct this two image acquisition unit CCD3, CCD4 position in this second waiting space 200.Those image acquisition units CCD1, CCD2, CCD3, CCD4 after correction will be fixed motionless.
Please refer to Fig. 1 a, 3,4a and 4b, in step (S02), utilize two image acquisition units after two image acquisition units after the correction in the first waiting space and the correction in the second waiting space, the specific markers (or given configuration) in the standard local characteristic region of two substrates of predefine different size.In the present embodiment, one group of three axle travel mechanism 40 is utilized one first substrate 20 to be fixed in this first waiting space 100 (but do not limit be fixed on this) in the mode of vacuum slot or jaw in advance.This three axles travel mechanism 40 moves this first substrate 20 to a pair assembling spaces 300 in order to utilize one first predetermined amount of movement.Moreover pre-set at least one group of plummer 60 and a transfer mechanism, this second substrate 30 in order to carry a second substrate 30, and to be fixed on the transfer mechanism in this second waiting space 200 by this plummer 60 (but do not limit be fixed on this).This transfer mechanism can be a universal stage 70, in order to utilize one second predetermined amount of movement and along X/Y planar horizontal this plummer 60 in rotary moving and second substrate 30 to this contraposition assembling space 300.In other application, this transfer mechanism also can be a slippage platform, in order to move this plummer 60 and second substrate 30 along X/Y planar linear to this contraposition assembling space 300.
In the present embodiment; this first substrate 20 such as can be selected from: form wherein a slice individual layer circuit substrate of a multilayer board, the wherein a slice glass substrate forming a liquid crystal panel module, a display outer frame, a contact panel or a liquid crystal panel, a glass light shield or a wafer, a chemical test paper or a diaphragm, but be not limited to this.This first substrate 20 is for a contact panel 21, and this contact panel 21 has several specific markers 22a (such as cross shape marks) or given configuration 22b (such as right angle corner).Moreover this second substrate 30 can be selected from another element with the corresponding assembly of this first substrate 20 above-mentioned.This second substrate 30 is for a liquid crystal panel 31, the size of this liquid crystal panel 31 is greater than the size of this contact panel 21, and this liquid crystal panel 31 has several specific markers 32a (the tubular mark of such as cross) or given configuration 32b (such as right angle corner).This second substrate 30 (liquid crystal panel) can be assembled into the semi-manufacture of a touch control display jointly with this first substrate 20 (such as contact panel 20 ').
This two image acquisition unit CCD1, CCD2 can be charge coupled cell (CCD) or complementary metal oxide semiconductor (CMOS) (CMOS) type image acquisition unit.In the present embodiment, utilize those image acquisition units CCD1, CCD2 of charge coupled cell (CCD) type to capture the first standard topography 510,520 of this first substrate 20.Such as, those image acquisition units CCD1, CCD2 after correction have been separately positioned on below the diagonal line end positions corresponding to this first substrate 20, to capture the first standard topography 510,520 of this first substrate 20.Then, the image processor being sent to a near-end or far-end (does not illustrate by this first standard topography 510,520, such as computer), and by the specific markers 22a (or given configuration 22b) of this image processor in each this first standard topography 510,520 respectively in predefine one first standard local characteristic region 511,521, and store its character shape data.
Meanwhile, this two image acquisition unit CCD3, CCD4 also can be charge coupled cell (CCD) or complementary metal oxide semiconductor (CMOS) (CMOS) type image acquisition unit.In the present embodiment, utilize those image acquisition units CCD3, CCD4 of charge coupled cell (CCD) type to capture the second standard topography 810,820 of this second substrate 30.Such as, those image acquisition units CCD3, CCD4 after correction are set in advance in above the diagonal line end positions corresponding to this second substrate 30 respectively, to capture the second standard topography 810,820 of this second substrate 30.Then, this the second standard topography 810,820 will be sent to same image processor, and by the specific markers 32a (or given configuration 32b) of this image processor in each this second standard topography 810,820 respectively in predefine second standard local characteristic region 811,821, and store its character shape data.
Step (S01) and step (S02) namely need to complete in advance before formally starting to assemble, namely its object is the locus of first precorrection four image acquisition units CCD1, CCD2, CCD3, CCD4, and the character shape data of specific markers 32a (or given configuration 32b) in the specific markers 22a (or given configuration 22b) stored in the first standard local characteristic region 511,521 and the second standard local characteristic region 811,821, as the reference data of image comparison later when formally carrying out contraposition for following step (S03).
Please refer to Fig. 1 a, 5,6a and 6b, in step (S03), utilize two image acquisition units after two image acquisition units after the correction in the first waiting space and the correction in the second waiting space, capture at least two actual topographies of two substrates in this first and second waiting space respectively.In the present embodiment, a slice is treated that first substrate 20 ' (such as the contact panel 31 ') sticking of contraposition or clamping to be placed on below this three axles travel mechanism 40 and to be arranged in this first waiting space 100.Meanwhile, separately a slice is treated that the second substrate 30 ' (such as liquid crystal panel 31 ') of contraposition is placed on the plummer 60 of the universal stage 70 in this second waiting space 200.This first waiting space 100 and this second waiting space 200 at a distance of a segment distance, and separately have this contraposition assembling space 300 between the two.
Then, utilize this two image acquisition unit CCD1, CCD2 to capture two the first actual topographies 910,920 of this first substrate 20 ', such as when formally assembling, using and being same as this two image acquisition unit CCD1, CCD2 that step (S02) uses to capture two the first actual topographies 910,920 that this treats the first substrate 20 ' of contraposition.
Simultaneously, also utilize this two image acquisition unit CCD3, CCD4 to capture two the second actual topographies 930,940 of this second substrate 30 ', such as when formally assembling, using and being same as this two image acquisition unit CCD3, CCD4 that step (S02) uses to capture two the second actual topographies 930,940 that this treats the second substrate 30 ' of contraposition.
Referring again to Fig. 1 a, 4a and 4b, 6a and 6b, in step (S04), specific markers (or given configuration) in the standard local characteristic region of this two substrate of difference comparison, and obtain the specific markers (or given configuration) at least two actual local characteristic region of this two substrate.In the present embodiment, this two first actual topography 910, 920 will be sent to same image processor (such as computer), and make respectively this first actual topography 910 by this image processor, 920 with this standard local characteristic region 511, the specific markers 22a of 521 or the character shape data of given configuration 22b are compared, to obtain this first actual topography 910, this the first standard local characteristic region 511 is matched with in 920, two first actual local characteristic region 911 of 521, the specific markers 22a ' (such as cross shape marks) of 921 or given configuration 22b ' (such as right angle corner), and it is for subsequent use to store its character shape data.
Simultaneously, this two second actual topography 930, 940 will be sent to same image processor, and make respectively this second actual topography 930 by this image processor, 940 with this second standard local characteristic region 811, the character shape data of the specific markers 32a (or given configuration 32b) of 821 is compared, to obtain this second actual topography 930, this the second standard local characteristic region 811 is matched with in 940, the two second actual local characteristic region 931 of 821, the specific markers 32a ' (the tubular mark of such as cross) of 941 or given configuration 32b ' (such as right angle corner), and it is for subsequent use to store its character shape data.
Please refer to Fig. 1 a, 7a and 7b, in step (S05), set up the actual coordinate system of this two substrate respectively, to synthesize a pair hyte dress coordinate system.Referring again to Fig. 6 a and 7a, in the present embodiment, same image processor (such as computer) can be utilized to carry out computing, to obtain the centre coordinate value (X1 of the specific markers 22a ' of respectively this first actual local characteristic region 911,921, Y1), (X2, Y2) (that is first square virtual stain position), to set up the first actual coordinate system of this first substrate 20 '.Referring again to Fig. 6 a and 7b, in another embodiment, same image processor (such as computer) can be utilized to carry out computing, to obtain the centre coordinate value (X1 of the given configuration 22b ' of respectively this first actual local characteristic region 911,921, Y1), (X2, Y2) (that is first square virtual stain position), to set up the first actual coordinate system of this first substrate 20 '.The first actual coordinate system of this first substrate 20 ' is set up by two groups of coordinate figures (X1, Y1) and (X2, Y2).
Simultaneously, referring again to Fig. 6 b and 7a, in the present embodiment, the present invention also can utilize same image processor (such as computer) to carry out computing, to obtain the centre coordinate value (X3 of the specific markers 32a ' of respectively this second actual local characteristic region 931,941, Y3), (X4, Y4) (that is the virtual stain position of triangle), to set up the second actual coordinate system of this second substrate 30 '.Finally, by this first and second actual coordinates integration hyte dress coordinate system in a pair.Referring again to Fig. 6 b and 7b, in another embodiment, same image processor (such as computer) can be utilized to carry out computing, to obtain the centre coordinate value (X3 of the given configuration 32b ' of respectively this first actual local characteristic region 911,921, Y3), (X4, Y4) (that is the virtual stain position of triangle), to set up the first actual coordinate system of this second substrate 30 '.The second actual coordinate system of this second substrate 30 ' is set up by two groups of coordinate figures (X3, Y3) and (X4, Y4).Finally, by this first and second actual coordinates integration hyte dress coordinate system in a pair.
Please refer to Fig. 1 a, 7a and 7b, in step (S06), specific markers (or given configuration) coordinate figure of two substrates in this two actual coordinates system of comparison is to obtain first group of side-play amount, and the size of this two substrate of comparison is to obtain size residual quantity.In the present embodiment, as specific markers (or given configuration) coordinate figure (X1 of the first substrate 20 ' of this first actual coordinate system of comparison, Y1), (X2, and specific markers (or given configuration) coordinate figure (X3 of the second substrate 30 ' of this second actual coordinate system Y2), Y3), (X4, Y4) time, required X, first group of side-play amount △ X1, △ Y1 of Y direction displacement and the θ anglec of rotation, △ θ 1 can be obtained, in order to compensate the vision difference of those image acquisition units in this first and second waiting space.
Please refer to Fig. 1 b, 6a, 6b, 8a and 8b, in step (S07), utilize this first group of side-play amount and this size residual quantity, revise specific markers (or given configuration) coordinate figure of a wherein substrate of this two substrate.In the present embodiment, same image processor (such as computer) can be utilized to carry out computing, utilize this first group of side-play amount and this size residual quantity, by respectively this first actual local characteristic region 911 of first substrate 20 ', centre coordinate value (the X1 of the specific markers 22a ' (or given configuration 22b ') of 921, Y1), (X2, Y2) be modified to (X1 ', Y1 '), (X2 ', Y2 ') (that is second square virtual stain position), so make the specific markers 22a ' (or given configuration 22b ') of the first substrate 20 ' in this contraposition assembling coordinate system revise rear center coordinate figure (X1 ', Y1 '), (X2 ', Y2 ') close to this second substrate 30 ' specific markers 32a ' (or given configuration 32b ') centre coordinate value (X1 ', Y1 '), (X2 ', Y2 ') (that is second square virtual stain position).
Referring again to Fig. 1 b, 8a and 8b, in step (S08), specific markers (or given configuration) coordinate figure of wherein this substrate revised specific markers (or given configuration) coordinate figure of two substrates in this two actual coordinates system of comparison and wherein another substrate of this two substrate, to obtain second group of side-play amount.In the present embodiment, when the first substrate 20 ' of this first actual coordinate system of comparison the revised centre coordinate value of specific markers (or given configuration) (X1 ', Y1 '), (X2 ', Y2 ') and specific markers (or given configuration) centre coordinate value (X3 of second substrate 30 ' of this second actual coordinate system, Y3), (X4, Y4) time, required X can be obtained, second group of side-play amount △ X3 of Y direction displacement and the anglec of rotation, △ Y3, △ θ 3, in order to compensate the vision difference of those image acquisition units in this first and second waiting space.
Referring again to Fig. 1 b and 9, in step (S09), wherein this substrate of two substrates is moved to the position that this second group of side-play amount compensates.In the present embodiment, according to second group of side-play amount that step (S08) obtains, this first substrate 20 ' moved to this three axles travel mechanism 40 position that this second group of side-play amount compensate.Second group of side-play amount △ X3 of indication of the present invention, △ Y3, △ θ 3 does not comprise this first substrate 20 ' and moves to the first predetermined amount of movement △ X1 ' of the X-direction needed for this contraposition assembling space 300 by this first waiting space 100 and this second substrate 30 ' moves to the second predetermined amount of movement △ X2 ' of the X-direction needed for this contraposition assembling space 300 by this second waiting space 200, namely the first actual coordinate system of this first substrate 20 ' and the second actual coordinate system difference value in the X-axis direction of this second substrate 30 ' are actually △ X3+ △ X1 '+△ X2 ', but this first substrate 20 ' moves to this contraposition assembling space 300 by this first actual coordinate system in the X-axis direction need use this side-play amount △ X3+ △ X1 '.
In step (S10), confirm whether this second group of side-play amount is less than the desired value for reaching.In the present embodiment, if be not less than the desired value for reaching, then get back to step (S08); Otherwise, be less than the desired value for reaching if having, then enter next step (S11).
Please refer to Fig. 1 b and 10, in step (S11), utilize one first predetermined amount of movement, wherein this substrate of two substrates is moved in a pair assembling space by this first waiting space.In the present embodiment, utilize this three axles travel mechanism 40 to move this first substrate 20 ', it makes this first substrate 20 ' move to a correct position to be assembled in this contraposition assembling space 300 according to this first predetermined amount of movement △ X1 '.
Referring again to Fig. 1 b and 10, in step (S12), utilize one second predetermined amount of movement, wherein another substrate of two substrates is moved in this contraposition assembling space by this second waiting space.In the present embodiment, this universal stage 70 can be utilized along X/Y planar horizontal this plummer 60 in rotary moving and second substrate 30 ' in this contraposition assembling space 300, it makes this second substrate 30 ' move to another correct position to be assembled in this contraposition assembling space 300 (such as position immediately below the Z axis of this first substrate 20 ' or directly over) place according to this second predetermined amount of movement △ X2 ', with etc. to be assembled.
Referring again to Fig. 1 b and 11, in step (S13), make this two substrate in contraposition assembling space, complete stacking contraposition assembling.In the present embodiment, this three axles travel mechanism 40 can be utilized to make this first substrate 20 ' move a predetermined amount of movement △ Z (such as moving a preset distance vertically downward) along Z axis, assemble until complete stacking contraposition with the second substrate 30 ' on the plummer 60 in this contraposition assembling space 300.So, the contraposition assembling operation of this first substrate 20 ' and second substrate 30 ' can be completed.
Alignment method of the present invention is applicable to the contraposition with two substrates of mark or unmarked different size under different waiting space.When this two substrate is positioned at different waiting space, utilize the specific markers (or given configuration) in the actual local characteristic region of this two substrate, to carry out the coordinate figure of the coordinate (or given configuration) of the specific markers of this two substrate of calculated for subsequent.Revise the coordinate figure of the specific markers (or given configuration) of a wherein substrate of this two substrate, make two substrates of this different size be modeled to two substrates of same size.Then, the different sized substrate contraposition drift correction of carrying out under different space compensates, and continuous carry out rear technique (such as: laminating or assembling), do not need the complicated transformational relation setting up image coordinate system and contraposition coordinate system, therefore effectively can reduce a large amount of mathematical computations and reduce equipment adjusting machine time, and increasing the elasticity of contraposition attaching process.
With known method unlike, the alignment method of the different sized substrate in different space of the present invention provides a solution, really can solve the problem different sized substrate cannot being carried out accurate contraposition laminating in technique.The alignment method of the different sized substrate in different space of the present invention can be applicable in various high-tech industry, such as contact panel industry, in the lamination coating technique of its various and different size, the method can solve cannot carry out the situation of image contraposition by different sized substrate, the speed of production of lifting process and elasticity under different space.
In sum, being only embodiment or the embodiment of notebook invention for presenting adopted technological means of dealing with problems, being not used for limiting the scope of patent working of the present invention.Namely all and of the present invention patent claim contexts conform to, or change according to the equalization that the scope of the claims of the present invention does and modify, and are all the scope of the claims of the present invention and contain.
Claims (9)
1. the different sized substrate alignment method in different space, is characterized in that, comprise the following steps:
Utilize two image acquisition units after two image acquisition units after the correction in one first waiting space and the correction in one second waiting space, capture at least two actual topographies of two substrates of the different size in this first and second waiting space respectively;
Specific markers in the standard local characteristic region of this two substrate of difference comparison or given configuration, and the specific markers obtained at least two actual local characteristic region of this two substrate or given configuration;
Set up the actual coordinate system of this two substrate respectively, to synthesize a pair hyte dress coordinate system;
The specific markers of two substrates in this two actual coordinates system of comparison or the coordinate figure of given configuration are to obtain first group of side-play amount, and the size of this two substrate of comparison is to obtain size residual quantity;
Utilize this first group of side-play amount and this size residual quantity, revise the wherein specific markers of a substrate or the coordinate figure of given configuration of this two substrate;
The revised specific markers of wherein this substrate of two substrates in this two actual coordinates system of comparison or the coordinate figure of given configuration and the specific markers of wherein another substrate of this two substrate or the coordinate figure of given configuration, to obtain second group of side-play amount;
Wherein this substrate of two substrates is moved to the position that this second group of side-play amount compensates;
Utilize one first predetermined amount of movement, make wherein this substrate of two substrates move in a pair assembling space by this first waiting space; And
Utilize one second predetermined amount of movement, wherein another substrate of two substrates is moved in this contraposition assembling space by this second waiting space.
2. the different sized substrate alignment method in different space as claimed in claim 1, is characterized in that, also comprise the following step:
The locus of two image acquisition units of precorrection in one first waiting space and two image acquisition units in one second waiting space.
3. the different sized substrate alignment method in different space as claimed in claim 2, is characterized in that, also comprise the following step:
Utilize two image acquisition units after two image acquisition units after the correction in this first waiting space and the correction in this second waiting space, the specific markers in the standard local characteristic region of two substrates of predefine different size or given configuration.
4. the different sized substrate alignment method in different space as claimed in claim 3, is characterized in that, also comprise the following step:
Confirm whether this second group of side-play amount is less than the desired value for reaching.
5. the different sized substrate alignment method in different space as claimed in claim 4, is characterized in that, also comprise the following step:
Make this two substrate in contraposition assembling space, complete stacking contraposition assembling.
6. the different sized substrate alignment method in different space as claimed in claim 2, it is characterized in that, wherein the step of the locus of two image acquisition units of precorrection in one first waiting space and two image acquisition units in one second waiting space comprises the following step:
By superimposed for two correcting sheets, make the specific markers of those correcting sheets overlapping;
Those correcting sheets after superimposed are arranged at above first and second image acquisition unit in this first waiting space, this first and second image acquisition unit mobile with the specific markers at first cornerwise two ends of the dotted line circle zone of those correcting sheets after superimposed in this first waiting space of acquisition, so to correct the position of this first and second image acquisition unit in this first waiting space;
Those correcting sheets after superimposed are arranged at below the 3rd and the 4th image acquisition unit in this second waiting space, mobile 3rd and the 4th image acquisition unit with the specific markers at second cornerwise two ends of the dotted line circle zone of those correcting sheets after superimposed in this second waiting space of acquisition, so to correct the position of the 3rd and the 4th image acquisition unit in this second waiting space; And
This first to fourth image acquisition unit after correction will be fixed motionless.
7. the different sized substrate alignment method in different space as claimed in claim 1, is characterized in that, wherein this two substrate wherein this substrate be specifically marked as cross shape marks, and wherein another substrate of this two substrate be specifically marked as the tubular mark of cross.
8. the different sized substrate alignment method in different space as claimed in claim 1, is characterized in that, wherein the given configuration of wherein this substrate of this two substrate is right angle corner, and the given configuration of wherein another substrate of this two substrate is right angle corner.
9. the different sized substrate alignment method in different space as claimed in claim 1, it is characterized in that, wherein this second group of side-play amount in order to compensate those image acquisition units in this first and second waiting space vision difference needed for X, Y direction displacement and the anglec of rotation.
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