CN103167792A - Aligning method and aligning system of unmarked different-space substrate assembly - Google Patents
Aligning method and aligning system of unmarked different-space substrate assembly Download PDFInfo
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Abstract
The invention provides an aligning method and an aligning system of unmarked different-space substrate assembly. The method includes the following steps: standard local feature regions of two substrates are predefined; at least two actual local images of the two substrates in different waiting space are respectively captured; the at least two actual local feature images are respectively compared to obtain at least two actual local feature regions of the two substrates; actual coordinate systems of the two substrates are respectively established; the actual coordinate systems of the two substrates are compared to obtain a group of offsets; utilization of the group of offsets and a reserved movement amount enable the two substrates to move to aligning assembly space from respective waiting space; and the two substrates are overlapped to be assembled in an alignment mode in the aligning assembly space.
Description
Technical field
The present invention relates to a kind of unmarked different space substrate mounting alignment method and system, particularly about a kind of substrate surface shape facility that directly utilizes as reference marker, to calculate respectively unmarked different space substrate mounting alignment method and the system of the two substrate motion compensation amounts be positioned at the different spaces system.
Background technology
All existing in technical fields such as liquid crystal display, semiconductor crystal wafer and printed circuit board (PCB)s at present makes a plurality of substrate precisions complete the demand of stacking assembling contraposition, so relevant dealer is the various contraposition equipment of research and development or the design of special alignment mark constantly, to accurately and fast assembling a plurality of substrates of contraposition.
For instance, please refer to shown in the 1st figure, this case applicant has disclosed a kind of alignment mark design and image processing method thereof of doubling plate contraposition kinetic control system in the patent of invention of No. the I288365th, first to file and the TaiWan, China got permission bulletin, a kind of existing doubling plate contraposition motion control method wherein is provided, be applicable to the accurate contraposition to one first laminate and one second laminate, and mainly comprise the following step:
(S1), two groups of contraposition marks 111,121 are provided, be arranged at respectively the same position of one first laminate 11 and the corresponding both sides of one second laminate 12;
(S2), by the two groups of contraposition marks 111 of two image-taking devices 13 acquisitions that are arranged at the first or second laminate 11,12 sides, two groups of synthetic images of 121;
(S3), utilize image processing method to calculate two groups of grid deviation amounts of these two groups of synthetic images, obtain these two groups of grid deviation amounts (△ X1, △ Y1), (△ X2, △ Y2);
(S4), calculate this two groups of grid deviation amounts, obtain position deviation amount △ X between described the first laminate 11 and described the second laminate 12, △ Y and amount of angular deviation △ θ; And
(S5), by a three-axis moving control module 14 above-mentioned position deviation amount of compensation and amount of angular deviation.
Above-mentioned doubling plate contraposition motion control method circular registration holes and cross, circle or square alignment mark come as the contraposition mark 111,121 between first and second laminate 11,12.Although the method can be completed the accurate contraposition of doubling plate automatically, fast, but easily cause to complete smoothly the contraposition operation because of image ghost image problem also, and registration holes and alignment mark must be designed respectively in advance, therefore can increase operation and cost on two substrates.Moreover, when described first and second laminate 11 of assembling, 12 limited space, wanting to arrange two image-taking devices 13 in limited same assembling space may affect the action that three-axis moving control module 14 moves described the second laminate 12, therefore makes above-mentioned doubling plate contraposition motion control method be not easy to implement in limited assembling space.
Therefore, still be necessary to provide a kind of substrate mounting alignment method of Improvement type, to solve the existing problem of prior art.
Summary of the invention
the first purpose of the present invention is to provide a kind of unmarked different space substrate mounting alignment method and system, it is when two substrates are positioned at two of different spaces system and wait for the space, namely directly utilize two cover image acquisition units to capture respectively in the existing surface shape features of two substrate specific localized areas of different waiting spaces as reference marker, to replace existing registration holes and alignment mark, and calculate for carrying out subsequent coordinates, the operation of position correction and assembling contraposition, therefore can make the substrate of wish assembling not need any special mark as the contraposition purposes of additional designs, can complete smoothly the front required motion compensation amount of substrate mounting of calculating, can not take simultaneously limited contraposition assembling space yet, thereby be conducive to reduce assembling contraposition cost, improve the elasticity that arranges of assembling aligning accuracy and increase contraposition equipment.
The second purpose of the present invention is to provide a kind of unmarked different space substrate mounting alignment method and system, it is directly to utilize the existing surface shape features of two substrate specific localized areas as reference marker, come special configuration registration holes and alignment mark owing to not needing to reserve respectively specific white space on two substrates, therefore can not take the space of two substrate surfaces, can not affect the size design of two substrates, simultaneously also can not affect the outward appearance of two substrates, thereby be conducive to simplify substrate design.
Another object of the present invention is to provide a kind of unmarked different space substrate mounting alignment method and system, its be at board when assembling the substrate of contraposition different size, can be at any time according to different substrate specifications immediately by image processing apparatus change set a certain regional area on two substrates existing surface shape features as reference marker, thereby be conducive to improve the operating and setting elasticity of assembling contraposition operation.
For reaching above-mentioned purpose, the invention provides a kind of unmarked different space substrate mounting alignment method, it comprises step:
(S01), before assembling, capture respectively in advance at least two standard topographies of a first substrate and a second substrate, and in the standard topography of this substrate respectively the local characteristic area of predefine one standard and store its character shape data respectively;
(S02), in when assembling, another group is treated that first and second substrate of contraposition is placed into respectively two different waiting spaces, and captures respectively at least two actual topographies of described two substrates;
(S03), the character shape data of the local characteristic area of standard that the actual topography of described two substrates is corresponding with it compares respectively, and is regional to obtain at least two actual local features that are matched with the local characteristic area of corresponding standard in each actual topography;
(S04), utilize respectively the centre coordinate in described actual local feature zone to set up respectively an actual coordinate system of described two substrates;
(S05), the actual coordinate system of described two substrates of comparison, moved to one group of side-play amount △ X, △ Y, the △ θ of required X, Y direction and the anglec of rotation of a pair of hyte dress space by its waiting space to obtain described first substrate; And
(S06), utilize this group side-play amount to make described first substrate move to one in described contraposition assembling space correctly to treat assembling position, make simultaneously described second substrate move to another in described contraposition assembling space according to a predetermined amount of movement and correctly treat assembling position.
In another embodiment of the present invention, after step (S06), separately comprise following step:
(S07), the actual topography of described two substrates of another acquisition and calculate its coordinate figure in described contraposition assembling space, correctly treat assembling position with what confirm whether described two substrates be arranged in respectively described contraposition assembling space, if enter step (S08); If not, behind the position of described two substrates of fine setting, then re-start step (S07); And
(S08), move described first substrate along Z axis in described contraposition assembling space, until described first and second substrate is completed the contraposition assembling in described contraposition assembling space.
In another embodiment of the present invention, in step (S06) afterwards, directly carry out following step:
(S08), move described first substrate along Z axis in described contraposition assembling space, until described first and second substrate is completed the contraposition assembling in described contraposition assembling space.
In another embodiment of the present invention, step (S04) is to utilize centroid method to obtain the centre coordinate of center in the actual local feature zone of each described substrate, to set up respectively the actual coordinate system of described two substrates.
In another embodiment of the present invention, step (S06) separately comprises one group of three axle travel mechanism, in order to move described first substrate along X, Y and θ axle.
In another embodiment of the present invention, described three axle travel mechanisms are separately in order to along the described first substrate of Z axis lifting moving.
In another embodiment of the present invention, step (S06) separately comprises at least one group of plummer and a rotating platform, described plummer is in order to carrying described second substrate, and described rotating platform is in order to along X/Y planar horizontal described second substrate in rotary moving to described contraposition assembling space.
In one embodiment of this invention; described first and second substrate can be selected from: consist of two individual layer circuit substrates of a multilayer board, two sheet glass substrates, a display outer frame and a liquid crystal panel module, a glass light shield and a wafer of a liquid crystal panel module, or a chemical test paper and a diaphragm.Described first and second substrate also can be exchanged mutually kind or upper-lower position.
On the other hand, for reaching above-mentioned purpose, the present invention separately provides a kind of unmarked different space substrate mounting alignment system, and it comprises:
At least one the first image acquisition unit is in order to capture in advance at least two standard topographies of a first substrate before assembling; And/or treat at least two actual topographies of the first substrate of contraposition in order to another that is placed into one first waiting space in when assembling acquisition;
At least one the second image acquisition unit is in order to capture in advance at least two standard topographies of a second substrate before assembling; And/or treat at least two actual topographies of the second substrate of contraposition in order to another that is placed into one second waiting space in when assembling acquisition;
One image processing apparatus, select in order to:
(1) the local characteristic area of predefine one standard and store its character shape data respectively in the standard topography of described two substrates;
(2) character shape data of the local characteristic area of standard that the actual topography of described two substrates is corresponding with it compares respectively, and is regional to obtain at least two actual local features that are matched with the local characteristic area of corresponding standard in each described actual topography;
(3) utilize respectively the centre coordinate in described actual local feature zone to set up an actual coordinate system of each substrate; Or
(4) the actual coordinate system of described two substrates of comparison moves to by described the first waiting space one group of side-play amount that a pair of hyte fills required X, Y direction and the anglec of rotation of space to obtain described first substrate;
One group of three axle travel mechanism utilizes this group side-play amount to make described first substrate move to one in described contraposition assembling space by described the first waiting space and correctly treats assembling position; And
One transfer mechanism is provided with at least one group of plummer on it, described transfer mechanism makes described second substrate move to another in described contraposition assembling space by described the second waiting space according to a predetermined amount of movement and correctly treats assembling position.
In another embodiment of the present invention, described three axle travel mechanisms are separately in order to along the described first substrate of Z axis lifting moving.
In another embodiment of the present invention, described second substrate is positioned at below or the top of the Z axis of described first substrate.
In another embodiment of the present invention, described transfer mechanism can be selected from a rotating platform or a slippage platform.
Description of drawings
Fig. 1 is the schematic diagram of existing doubling plate and alignment mark thereof.
Fig. 2 is the unmarked different space substrate mounting alignment method of preferred embodiment of the present invention and the process block diagram of system.
Fig. 3,3A and 3B are the schematic diagrames of the local characteristic area of standard of preferred embodiment of the present invention predefine two substrates in step (S01).
Fig. 4 is that preferred embodiment of the present invention captures respectively the schematic diagram at least two actual topographies of two substrates of different waiting spaces in step (S02).
Fig. 4 A and 4B are at least two actual local feature zones of two substrates were compared respectively and obtained in preferred embodiment of the present invention in step (S03) schematic diagrames.
Fig. 5 is that preferred embodiment of the present invention utilizes respectively this group side-play amount and another predetermined amount of movement to make two substrates move to schematic diagram in a pair of hyte dress space by separately waiting space in step (S06).
Fig. 6 is that preferred embodiment of the present invention makes two substrates complete the schematic diagram of stacking contraposition assembling in step (S08) in the contraposition assembling space.
Wherein:
11 first laminate 111 contraposition marks
12 second laminate 121 contraposition marks
13 image-taking device 14 three-axis moving control modules
20 first substrate 21 housing inner edges
22 inner edge corner 30 second substrates
31 sealing frame glue 32 frame glue corners
40 3 axle travel mechanism 51 first image acquisition units
The 510 first local characteristic areas of standard topography's 511 first standards
52 first image acquisition unit 520 first standard topographies
Local characteristic area 60 plummers of 521 first standards
70 rotating platform 81 second image acquisition units
The 810 second local characteristic areas of standard topography's 811 second standards
82 second image acquisition unit 820 second standard topographies
The local characteristic area of 821 second standards 910 first actual topographies
911 first actual local feature zone 920 first actual topographies
921 first actual local feature zone 930 second actual topographies
931 second actual local feature zone 940 second actual topographies
941 second 100 first waiting spaces, actual local feature zones
200 second waiting space 300 contraposition assembling spaces
S01 step 1 S02 step 2
S03 step 3 S04 step 4
S05 step 5 S06 step 6
S07 step 7 S08 step 8
X X-axis Y Y-axis
Z Z axis θ θ axle
△ X side-play amount △ Y side-play amount
△ Z amount of movement △ θ side-play amount.
Embodiment
For above-mentioned and other purpose of the present invention, feature, advantage can be become apparent, hereinafter will be especially exemplified by preferred embodiment of the present invention, and coordinate appended graphicly, be described in detail below.Moreover, the direction term that the present invention mentions, such as " on ", D score, 'fornt', 'back', " left side ", " right side ", " interior ", " outward " or " side " etc., be only the direction with reference to annexed drawings.Therefore, the direction term of use is in order to explanation and understands the present invention, but not in order to limit the present invention.
the invention provides a kind of unmarked different space substrate mounting alignment method and system, it is mainly when two substrates are positioned at two of different spaces system and wait for the space, namely directly utilize the existing surface shape features of two substrate specific localized areas respectively as reference marker, and calculate for carrying out subsequent coordinates, the operation of position correction and assembling contraposition, use and replace existing registration holes and cross, circular or square alignment mark, make two substrates of wish assembling not need any special mark (Fiducial Mark) as the contraposition purposes of additional designs, therefore application restric-tion of the present invention is on unmarked substrate.Any it will not be included in the range of application of the inventive method specially as the mark of doubling plate (or multi-layer sheet) assembling contraposition purposes if treat to comprise on the substrate of contraposition, in this close first chat bright.
Please refer to shown in Figure 2ly, the unmarked different space substrate mounting alignment method of preferred embodiment of the present invention mainly comprises the following step: (S01), the local characteristic area of standard of predefine two substrates; (S02), capture respectively at least two actual topographies at two substrates of different waiting spaces; (S03), compare respectively and obtain at least two actual local features zones of two substrates; (S04), set up respectively the actual coordinate system of two substrates; (S05), the comparison two substrates the actual coordinate system, to obtain one group of side-play amount; (S06), utilize respectively this group side-play amount and another predetermined amount of movement that two substrates are moved in a pair of hyte dress space by separately waiting space; (S07), confirm that the correspondence whether described two substrates have been arranged in respectively described contraposition assembling space correctly treats assembling position; And (S08), make two substrates complete stacking contraposition assembling in the contraposition assembling space.The present invention will be in hereinafter utilizing the 2nd to 6 figure to describe one by one implementation detail and the principle thereof of the above steps of preferred embodiment in detail.
Please refer to shown in Fig. 2,3,3A and 3B, the unmarked different space substrate mounting alignment method step (S01) of preferred embodiment of the present invention is: the local characteristic area of the standard of predefine two substrates.In this step, the present embodiment is to utilize in advance one group of three axle travel mechanism 40 in the mode of vacuum slot or jaw, described first substrate 20 to be fixed in described the first waiting space 100 (not being fixed in this but do not limit).Moreover, the present embodiment is to set in advance at least one group of plummer 60 and a transfer mechanism, and described plummer 60 is in order to carry described second substrate 30 and described second substrate 30 is fixed on transfer mechanism in described the second waiting space 200 (not being fixed in this but do not limit); With the present embodiment, described transfer mechanism is a rotating platform 70, in order to fill space 300 along X/Y planar horizontal described plummer 60 in rotary moving and second substrate 30 to a pair of hyte, on other are used, described transfer mechanism also can be a slippage platform, in order to move described plummer 60 and second substrate 30 along the X/Y planar linear to a pair of hyte dress space 300.
In the present embodiment; described first substrate 20 for example can be selected from: consist of wherein a slice individual layer circuit substrate of a multilayer board, wherein a slice glass substrate, a display outer frame or a liquid crystal panel module, a glass light shield or a wafer, a chemical test paper or a diaphragm of formation one liquid crystal panel module, but be not limited to this.Described first substrate 20 is take a display outer frame as example, and it has a metal outer frame and a glass shield, and described metal outer frame has a housing inner edge 21, and described housing inner edge 21 has several inner edge corners 22.Moreover described second substrate 30 can be selected from another assembly with above-mentioned first substrate 20 corresponding assembly.Described second substrate 30 is take a liquid crystal panel module as example, and it has to seal a sealing frame glue (sealant) 31 of a top glass substrate and a lower glass substrate, and described sealing frame glue 31 has several frame glue corners 32.Described second substrate 30 can be assembled into jointly with described first substrate 20 (display outer frame) semi-finished product of a liquid crystal display.
as Fig. 3, shown in 3A and 3B, the present embodiment utilizes the first image acquisition unit of at least one Charged Coupled Device (CCD) or complementary metal oxide semiconductors (CMOS) (CMOS) type to capture the first standard topography 510 of described first substrate 20,520 o'clock, for example use the first image acquisition unit 51 of two CCD types, 52, and it is set in advance respectively in the lower position corresponding to two inner edge corners 22 of the diagonal positions (or two ends, the same side) of described first substrate 20, in order to capture the first standard topography 510 of described first substrate 20,520.Then, described the first standard topography 510,520 will be sent to a near-end or long-range image processing apparatus (does not illustrate, computer for example), and by described image processing apparatus local characteristic area 511,521 (area image that for example comprises this inner edge corner 22) of predefine one first standard respectively in each described first standard topography 510,520, and store its character shape data.
Simultaneously, the present embodiment uses two CCD or cmos type the second image acquisition unit 81,82, and it is set in advance respectively at the place, top position corresponding to two frame glue corners 32 of the diagonal positions (or two ends, the same side) of described second substrate 30, in order to capture the second standard topography 810,820 of described second substrate 30.Then, described the second standard topography 810,820 will be sent to same image processing apparatus, and by described image processing apparatus local characteristic area 811,821 (area image that for example comprises this frame glue corner 32) of predefine one second standard respectively in each described second standard topography 810,820, and store its character shape data.
This step (S01) namely need be completed before formally beginning to assemble in advance, its purpose namely is first to store the local characteristic area 511 of the first standard, the local characteristic area 811 of the 521 and second standard, 821 character shape data, when formally assembling after following step (S02) as the reference data of image comparison.
Please refer to shown in Fig. 2,4,4A and 4B, the unmarked different space substrate mounting alignment method step (S02) of preferred embodiment of the present invention is: capture respectively at least two actual topographies at two substrates of different waiting spaces.In this step, the present embodiment is that a slice is treated that first substrate 20 stickings of contraposition or clamping are placed on described three axle travel mechanism 40 belows and are arranged in described the first waiting space 100.Simultaneously, separately a slice is treated that the second substrate 30 of contraposition is placed on the plummer 60 of the rotating platform 70 in described the second waiting space 200.Described the first waiting space 100 and the second waiting space 200 be at a distance of a segment distance, and separately have a pair of hyte dress space 300 between the two.
Then, the present embodiment is to utilize at least one identical CCD or cmos type the first image acquisition unit to capture the first actual topography 910,920 of described first substrate 20, for example when formally assembling, use the first image acquisition unit 51,52 that is same as two CCD types that step (S01) uses to capture the described at least two first actual topographies 910,920 that treat the first substrate 20 of contraposition.
Simultaneously, the present embodiment also utilizes at least one identical CCD or cmos type the second image acquisition unit to capture the second actual topography 930,940 of described second substrate 30, for example when formally assembling, use the second image acquisition unit 81,82 that is same as two CCD types that step (S01) uses to capture the described at least two second actual topographies 930,940 that treat the second substrate 30 of contraposition.
Please refer to shown in Fig. 2,4,4A and 4B, the unmarked different space substrate mounting alignment method step (S03) of preferred embodiment of the present invention is: at least two actual local features of comparing respectively and obtain two substrates are regional.In this step, the described first actual topography 910,920 will be sent to same image processing apparatus (for example computer), and by described image processing apparatus make each described first actual topography 910,920 and the local characteristic area 511 of described standard, 521 character shape data compare, be matched with described the first local characteristic area 511 of standard, 521 at least two first actual local feature zones 911,921 in the described first actual topography 910,920 to obtain, and it is standby to store its character shape data.
Simultaneously, the described second actual topography 930,940 will be sent to same image processing apparatus, and by described image processing apparatus make each described second actual topography 930,940 and described the second local characteristic area 811 of standard, 821 character shape data compare, be matched with described the second local characteristic area 811 of standard, 821 at least two second actual local feature zones 931,941 in the described second actual topography 930,940 to obtain, and it is standby to store its character shape data.
Please refer to shown in Fig. 2 and 4, the unmarked different space substrate mounting alignment method step (S04) of preferred embodiment of the present invention is: the actual coordinate system that sets up respectively two substrates.In this step, be preferably and utilize same image processing apparatus (for example computer) to carry out the computing of the centre of form (geometric center) method, with the centre coordinate of the geometric center position of obtaining each the described first actual local feature zone 911,921, to set up the first actual coordinate system of described first substrate 20.for example, use computer to obtain the centre coordinate (X1 of the geometric center position in first the first actual local feature zone 911 with centroid method calculating, Y1), and obtain the centre coordinate (X2 of the geometric center position in second the first actual local feature zone 921, Y2), and the rest may be inferred, each the first actual local feature of wish definition zone 911 wherein, during 921 centre coordinate, for example can be with described at least two first image acquisition units 51, the known coordinate positional value in 52 predetermined capture zone comes as benchmark, with each first actual local feature zone 911 of definition, 921 centre coordinate value.At last, described image processing apparatus can be set up by the centre coordinate (X1, Y1) of this two group and (X2, Y2) one first actual coordinate system of described first substrate 20 at least.
Simultaneously, the present invention also can utilize same image processing apparatus to carry out the computing of the centre of form (geometric center) method, with the centre coordinate of the geometric center position of obtaining each the described second actual local feature zone 931,941, to set up the second actual coordinate system of described second substrate 30.For example, use computer to obtain the centre coordinate (X3 of the geometric center position in two the second actual local feature zones 931,941 with centroid method calculating, Y3) reach (X4, Y4), and the rest may be inferred, and can come as benchmark with the known coordinate positional value in described at least two second image acquisition units 81,82 predetermined capture zone, with the centre coordinate value in each the second actual local feature of definition zone 931,941.At last, described image processing apparatus can be set up the second actual coordinate system of described second substrate 20.
Please refer to shown in Fig. 2 and 4, the unmarked different space substrate mounting alignment method step (S05) of preferred embodiment of the present invention is: the actual coordinate system of comparison two substrates, and to obtain one group of side-play amount.in this step, when the second actual coordinate system of the first actual coordinate system of the described first substrate 20 of described image processing apparatus comparison and described second substrate 30, can obtain described first substrate 20 and move to a pair of hyte dress required X in space 300 by described the first waiting space 100, one group of side-play amount △ X of Y direction and the anglec of rotation, △ Y, △ θ, the side-play amount △ X of indication of the present invention wherein, △ Y, △ θ deducts described second substrate 30 to be moved to a predetermined amount of movement (for example being △ X ') of the required X-direction of described contraposition assembling space 300 by described the second waiting space 200 in advance, namely the second difference value of actual coordinate system on X-direction of the first actual coordinate system of described first substrate 20 and described second substrate 30 is actually △ X+ △ X ', but moving to 300 of described contraposition assembling spaces by described the first actual coordinate system on X-direction, described first substrate 20 only need use described side-play amount △ X.
Please refer to shown in Fig. 2 and 5, the unmarked different space substrate mounting alignment method step (S06) of preferred embodiment of the present invention is: utilize respectively this group side-play amount and another predetermined amount of movement that two substrates are moved in a pair of hyte dress space by separately waiting space.In this step, the present embodiment is to utilize one group of three axle travel mechanism 40 in order to move described first substrate 20 along X, Y and θ axle, and it is to make described first substrate 20 move to one in described contraposition assembling space 300 according to described group of side-play amount △ X, △ Y, △ θ correctly to treat assembling position.Simultaneously, the present invention can utilize described rotating platform 70 along X/Y planar horizontal described plummer 60 in rotary moving and second substrate 30 to described contraposition assembling space 300, its be according to a predetermined amount of movement △ X ' make described second substrate 30 move to another in described contraposition assembling space 300 correctly treat assembling position (for example the position under the Z axis of described first substrate 20 or directly over) locate, to wait for assembling.
As shown in Fig. 2 and 5, in order to confirm the start correctness of step (S06), the present invention can select to comprise following step (S07) in case of necessity in addition after step (S06): confirm described two substrates whether respectively the correspondence of position in described contraposition assembling space correctly treat assembling position.In this step, the present embodiment is capture described first and second substrate 20,30 actual topography separately and utilize centroid method described above to calculate its coordinate figure with another two group image acquisition units (not illustrating) in described contraposition assembling space 300, with confirm described first and second substrate 20,30 whether respectively separately the correspondence of position in described contraposition assembling space 300 correctly treat assembling position, for example described second substrate 30 whether the position under the Z axis of described first substrate 20 or directly over.If enter step (S08); If not, after utilizing described three axle travel mechanisms 40 and rotating platform 70 to finely tune described first and second substrate 20,30 position, then re-start step (S07), until result is "Yes".It should be noted that, in order to require correctness, this confirmation step be can repeat secondary or more than, if but require detection efficiency or for fear of at described contraposition assembling space 300, any image acquisition unit being set, the present invention also can select to omit and not carry out this confirmation step, and directly carries out following step (S08).
Please refer to shown in Fig. 2 and 6, the unmarked different space substrate mounting alignment method step (S08) of preferred embodiment of the present invention is: make two substrates complete stacking contraposition assembling in the contraposition assembling space.In this step, the present embodiment can utilize described three axle travel mechanisms 40 to make described first substrate 20 move a predetermined amount of movement △ Z (for example a mobile preset distance) vertically downward along Z axis, until with described contraposition assembling space 300 in plummer 60 on second substrate 30 complete stacking contraposition assembling.So, can complete the contraposition assembling operation of described first substrate 20 and second substrate 30.
Moreover as shown in Fig. 3 to 6, in order to reach unmarked different space substrate mounting contraposition, the present invention separately provides a kind of unmarked different space substrate mounting alignment system, and it comprises:
At least one the first image acquisition unit 51,52 is in order to capture in advance at least two standard topographies 510,520 of a first substrate 20 before assembling; Ji ∕ or treat at least two actual topographies 910,920 of the first substrate 20 of contraposition in order to another that is placed into one first waiting space 100 in when assembling acquisition;
At least one the second image acquisition unit 81,82 is in order to capture in advance at least two standard topographies 810,820 of a second substrate 30 before assembling; Ji ∕ or treat at least two actual topographies 930,940 of the second substrate 30 of contraposition in order to another that is placed into one second waiting space 200 in when assembling acquisition;
One image processing apparatus (not illustrating, is for example computer), select in order to:
(1) the local characteristic area 511 of predefine one standard, 521 and 811,821 and store its character shape data respectively in described two substrates 20,30 standard topography 510,520 and 810,820;
(2) respectively described two substrates 20,30 actual topography 910,920 and 930,940 standard local characteristic areas 511 corresponding with it, 521 and 811,821 character shape data are compared, be matched with the local characteristic area 511 of corresponding standard, 521 and 811,821 at least two actual local feature zones 911,921 and 931,941 in each described actual topography 910,920 and 930,940 to obtain;
(3) utilize respectively the centre coordinate of described actual local feature zone 911,921 and 931,941 to set up each described substrate 20, an actual coordinate system of 30; Or
(4) described two substrates 20 of comparison, 30 actual coordinate system are moved to one group of side-play amount △ X, △ Y, the △ θ of required X, Y direction and the anglec of rotation of a pair of hyte dress space 300 to obtain described first substrate 20 by described the first waiting space 100;
One group of three axle travel mechanism 40 utilizes described group of side-play amount △ X, △ Y, △ θ to make described first substrate 20 move to one in described contraposition assembling space 300 by described the first waiting space 100 and correctly treats assembling position; And
One transfer mechanism, be provided with at least one group of plummer 60 on it, as described in described transfer mechanism makes according to a predetermined amount of movement (as △ X ') second substrate 30 by as described in the second waiting space 200 move to as described in another in contraposition assembling space 300 correctly treat assembling position.
With the present embodiment, described transfer mechanism is to be a rotating platform 70, in order to fill space 300 along X/Y planar horizontal described plummer 60 in rotary moving and second substrate 30 to a pair of hyte, on other are used, described transfer mechanism also can be a slippage platform, in order to move described plummer 60 and second substrate 30 along the X/Y planar linear to a pair of hyte dress space 300.
as mentioned above, use circular registration holes and cross compared to existing doubling plate contraposition motion control method, the next shortcoming that is derived as the contraposition mark between doubling plate of circular or square alignment mark, the present invention of Fig. 2 to 6 is when two substrates are positioned at two of different spaces system and wait for the space, namely directly utilize two cover image acquisition units to capture respectively in the existing surface shape features of two substrate specific localized areas of different waiting spaces and have registration holes and alignment mark as reference marker now to replace, and calculate for carrying out subsequent coordinates, the operation of position correction and assembling contraposition, therefore can make the substrate of wish assembling not need any special mark as the contraposition purposes of additional designs, can complete smoothly the front required motion compensation amount of substrate mounting of calculating, can not take simultaneously limited contraposition assembling space yet, thereby be conducive to reduce assembling contraposition cost, improve the elasticity that arranges of assembling aligning accuracy and increase contraposition equipment.
Moreover, the present invention directly utilizes the existing surface shape features of two substrate specific localized areas as reference marker, come special configuration registration holes and alignment mark owing to not needing to reserve respectively specific white space on two substrates, therefore can not take any space of two substrate surfaces, can not affect the size design of two substrates, simultaneously also can not affect the outward appearance of two substrates, thereby be conducive to simplify substrate design.
In addition, the present invention at board when assembling the substrate of contraposition different size, can be at any time according to different substrate specifications immediately by image processing apparatus change set a certain regional area on two substrates existing surface shape features as reference marker, thereby be conducive to improve the operating and setting elasticity of assembling contraposition operation.
Although the present invention discloses with preferred embodiment; so it is not intended to limiting the invention; any personage who has the knack of this skill; without departing from the spirit and scope of the present invention; when can do various changes and modification, so protection scope of the present invention is as the criterion when looking accompanying the claim person of defining.
Claims (10)
1. a unmarked different space substrate mounting alignment method, is characterized in that, comprises step:
(S01), before assembling, capture respectively in advance at least two standard topographies of a first substrate and a second substrate, and in the standard topography of each described substrate the local characteristic area of predefine one standard and store its character shape data respectively;
(S02), in when assembling, another group is treated that first and second substrate of contraposition is placed into respectively two different waiting spaces, and captures respectively at least two actual topographies of described two substrates;
(S03), the character shape data of the local characteristic area of standard that the actual topography of described two substrates is corresponding with it compares respectively, and is regional to obtain at least two actual local features that are matched with the local characteristic area of corresponding standard in each described actual topography;
(S04), utilize respectively the centre coordinate in described actual local feature zone to set up respectively an actual coordinate system of described two substrates;
(S05), the actual coordinate system of described two substrates of comparison, moved to one group of side-play amount △ X, △ Y, the △ θ of required X, Y direction and the anglec of rotation of a pair of hyte dress space by its waiting space to obtain described first substrate; And
(S06), utilize this group side-play amount to make described first substrate move to one in described contraposition assembling space correctly to treat assembling position, make simultaneously described second substrate move to another in described contraposition assembling space according to a predetermined amount of movement and correctly treat assembling position.
2. unmarked different space as claimed in claim 1 substrate mounting alignment method, is characterized in that, in step (S06) afterwards, separately comprises following step:
(S07), the actual topography of described two substrates of another acquisition and calculate its coordinate figure in described contraposition assembling space, with confirm described two substrates whether respectively the position correctly treat assembling position in described contraposition assembling space, if enter step (S08); If not, behind the position of described two substrates of fine setting, then re-start step (S07); And
(S08), move described first substrate along Z axis in described contraposition assembling space, until described first and second substrate is completed the contraposition assembling in described contraposition assembling space.
3. unmarked different space as claimed in claim 1 substrate mounting alignment method, is characterized in that, in step (S06) afterwards, directly carries out following step:
(S08), move described first substrate along Z axis in described contraposition assembling space, until described first and second substrate is completed the contraposition assembling in described contraposition assembling space.
4. unmarked different space as claimed in claim 1 substrate mounting alignment method, it is characterized in that, step (S04) is to utilize centroid method to obtain the centre coordinate of center in the actual local feature zone of each described substrate, to set up respectively the actual coordinate system of described two substrates.
5. unmarked different space as claimed in claim 1 substrate mounting alignment method, is characterized in that, step (S06) separately comprises one group of three axle travel mechanism in order to move described first substrate along X, Y and θ axle.
6. unmarked different space as claimed in claim 5 substrate mounting alignment method, is characterized in that, described three axle travel mechanisms are separately in order to along the described first substrate of Z axis lifting moving.
7. unmarked different space as claimed in claim 1 substrate mounting alignment method, it is characterized in that, step (S06) separately comprises at least one group of plummer and a rotating platform, described plummer is in order to carrying described second substrate, and described rotating platform is in order to along X/Y planar horizontal described second substrate in rotary moving to described contraposition assembling space.
8. unmarked different space as claimed in claim 1 substrate mounting alignment method; it is characterized in that; described first and second substrate is selected from: consist of two individual layer circuit substrates of a multilayer board, two sheet glass substrates, a display outer frame and a liquid crystal panel module, a glass light shield and a wafer of a liquid crystal panel module, or a chemical test paper and a diaphragm.
9. a unmarked different space substrate mounting alignment system, is characterized in that, comprises:
At least one the first image acquisition unit is in order to capture in advance at least two standard topographies of a first substrate before assembling; Ji ∕ or treat at least two actual topographies of the first substrate of contraposition in order to another that is placed into one first waiting space in when assembling acquisition;
At least one the second image acquisition unit is in order to capture in advance at least two standard topographies of a second substrate before assembling; Ji ∕ or treat at least two actual topographies of the second substrate of contraposition in order to another that is placed into one second waiting space in when assembling acquisition;
One image processing apparatus, select in order to:
(1) the local characteristic area of predefine one standard and store its character shape data respectively in the standard topography of described two substrates;
(2) character shape data of the local characteristic area of standard that the actual topography of described two substrates is corresponding with it compares respectively, and is regional to obtain at least two actual local features that are matched with the local characteristic area of corresponding standard in each described actual topography;
(3) utilize respectively the centre coordinate in described actual local feature zone to set up an actual coordinate system of each described substrate; Or
(4) the actual coordinate system of described two substrates of comparison moves to by described the first waiting space one group of side-play amount that a pair of hyte fills required X, Y direction and the anglec of rotation of space to obtain described first substrate;
One group of three axle travel mechanism utilizes this group side-play amount to make described first substrate move to one in described contraposition assembling space by described the first waiting space and correctly treats assembling position; And
One transfer mechanism is provided with at least one group of plummer on it, described transfer mechanism makes described second substrate move to another in described contraposition assembling space by described the second waiting space according to a predetermined amount of movement and correctly treats assembling position.
10. unmarked different space as claimed in claim 9 substrate mounting alignment system, is characterized in that, described three axle travel mechanisms are separately in order to along the described first substrate of Z axis lifting moving.
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| CN201110404751.6A CN103167792B (en) | 2011-12-08 | 2011-12-08 | Unmarked different space substrate mounting is to method for position and system |
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| CN104730871A (en) * | 2013-12-18 | 2015-06-24 | 财团法人金属工业研究发展中心 | Different-space different-size substrate alignment method |
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| CN106304618A (en) * | 2016-08-30 | 2017-01-04 | 张家港康得新光电材料有限公司 | Circuit board fit area and the alignment method of conductive adhesive layer |
| CN108215434A (en) * | 2017-12-29 | 2018-06-29 | 武汉华星光电半导体显示技术有限公司 | Abutted equipment and its alignment method |
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| CN103167792B (en) | 2016-06-08 |
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