CN104697465A - Aberration-free absolute inspection method of ellipsoidal surface - Google Patents
Aberration-free absolute inspection method of ellipsoidal surface Download PDFInfo
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Abstract
The invention discloses an aberration-free absolute inspection method of an ellipsoidal surface. The method comprises the steps of firstly, performing aberration-free zero detection on the confocal position of the ellipsoidal surface by use of a spherical wave interferometer and a spherical reflector to obtain detection results W1 and W2, secondly, performing twice detection on the cat eye position of the spherical reflector to obtain detection results W3and W4, and finally, calculating the absolute surface shape error inspection result T of ellipsoidal surface according to the formula T=(W1-W2+2W3-2W4)/4. According to the aberration-free absolute inspection method, the system error of the spherical wave interferometer and the surface shape error of the spherical reflector are completely separated out by use of four inspection positions and the absolute inspection result of the ellipsoidal surface is obtained; the method has the advantages of simple operations and high accuracy.
Description
Technical field
The invention belongs to technical field of optical detection, be specifically related to a kind of absolute method of inspection of aberrationless of ellipsoid.
Background technology
Wavefront interferometer is commonly used in the inspection of optical surface profile error.The plane camera lens of the usual outfit standard of wavefront interferometer or sphere camera lens, send plane test waves or Spherical Test ripple, and can carry out zero check to optical flat or sphere, even tested surface shape does not have error, will obtain the interferogram of zero striped.For aspherical detection, then need to utilize custom-designed compensator, the plane sent by interferometer or Spherical Test wave conversion are the aspherical wavefront mated with tested aspheric surface.The secondary asphericals such as ellipsoid, hyperboloid and parabola then can utilize the character of its a pair conjugate focus (such as paraboloidal focus and infinity point), realize aberrationless zero check.But said method is all relative measurements, the face shape error recorded is is benchmark with the reference surface on interferometer camera lens, and namely measuring accuracy is limited to the precision of camera lens reference surface all the time.Face shape error for optical element in deep ultraviolet or extreme ultraviolet photolithographic object lens is measured, and accuracy requirement reaches Subnano-class, far away higher than the precision of interferometer camera lens commercially produced product, and therefore must by interferometer camera lens reference surface error separate out.
In order to make interferometry precision not by camera lens reference surface error effect, more high-precision surperficial calibration reference face can be utilized before measuring, then deducted in measurement data.The shortcoming of this method is obvious, and one is that calibration procedure is very strict, harsh to environmental requirement, and not easy to operate, poor real; More high-precision surface is often difficult to realize in addition.People propose the absolute method of inspection for this reason, isolate reference surface error, and do not need to calibrate in advance while measurement.
The multiposition method of average can be adopted during usual optical surface profile inspection, tested surface shape is turned round 360 °/N at equal intervals around its optical axis, measure respectively in this N number of position, measurement result is averaged all error components that will isolate in face shape error except revolution symmetrical components and kN θ order harmonic component.This method is applicable to all zero checks, comprises plane, sphere and aspheric compensation tests etc., and shortcoming is that the error component of revolution symmetry cannot be separated.In order to isolate revolution symmetrical components, introduce the panning mode of tested surface, i.e. translation rotary process, is applicable to plane and sphere, but the out of focus of plane (power) component cannot obtain.For aspheric surface, because translation can introduce off-axis aberration, therefore translation rotary process is inapplicable.But for plane, can examine mutually in conjunction with three planes on the basis of the multiposition method of average, obtain all error components except kN θ order harmonic component.
Three location methods of optical spherical surface are definitely checked, and are to utilize confocal position and opal position, wherein confocal position have two measuring positions, and corresponding tested sphere turns round 180 ° of front and back around optical axis respectively.Measurement data on three positions can be divided completely from going out reference surface error through simple mathematical operation.
Opal position is not had, so cannot directly apply three location methods during aspheric surface compensation tests.One method produces aspherical wavefront and spherical wave by computer-generated hologram before double wave (CGH) respectively when testing and calibrate, and the difference of both hypothesis can be ignored.First produce Convergent Laser Beam with two CGH, three location methods are carried out to a sphere and definitely checks, obtain the systematic error of interferometer; Produce diverging spherical wavefront with two CGH again to test same sphere, isolate the pattern error of CGH; Finally produce non-spherical wavefront with two CGH and zero check is carried out to tested aspheric surface, obtain its face shape error.In the method, the difference of the aspherical wavefront that two CGH produces and spherical wave can affect measuring accuracy, and two CGH is as holographic compensator, and cost of manufacture is high, is suitable only for specific aspheric surface.
Summary of the invention
The technical problem to be solved in the present invention overcomes the deficiencies in the prior art, provides a kind of absolute method of inspection of aberrationless operating simple and easy, that precision is high ellipsoid.
For solving the problems of the technologies described above, the present invention by the following technical solutions:
The absolute method of inspection of aberrationless of ellipsoid, comprises the following steps:
S1: measure: utilize spherical waves interfere instrument and spherical reflector to carry out aberrationless zero check and opal location test to ellipsoid, specifically perform step by step by following;
S11: described spherical waves interfere instrument sends Spherical Test ripple to ellipsoid, and the centre of sphere of Spherical Test ripple overlaps with the over focus f1 of ellipsoid, described spherical reflector is placed between spherical waves interfere instrument and ellipsoid, and spherical reflector is towards ellipsoid, the center of curvature of spherical reflector overlaps with the perifocus f2 of ellipsoid, carry out aberrationless zero check and record first group of data, and deposit is W1;
S12: described ellipsoid is turned round 180 ° around optical axis, all the other test conditions remain unchanged, and carry out aberrationless zero check and record second group of data, and deposit is W2;
S13: described ellipsoid is got back to original position around optical axis revolution-180 °, described spherical reflector moves to its center of curvature, the summit of spherical reflector is overlapped with the focus f2 of ellipsoid, carries out opal location test and record the 3rd group of data, and deposit is W3;
S14: overturn described spherical reflector by spherical reflector towards spherical waves interfere instrument, and moving sphere catoptron, make its summit overlap with the centre of sphere of Spherical Test ripple, carries out opal location test and record the 4th group of data, and deposit is W4;
S2: the absolute assay T:T=of face shape error (W1-W2+2W3-2W4)/4 calculating described ellipsoid.
Further improvement as technique scheme:
In described step S1, ellipsoid meets aberrationless zero check condition, ellipsoid, spherical waves interfere instrument and spherical reflector optical axis coincidence.
In described step S13 and step S14, spherical reflector is in opal check position, and after incident ray is reflected by spherical reflector, return along about centrosymmetric position, interference pattern presents opal pattern.
The fixture of described ellipsoid is provided with following adjustment degree of freedom: along the one-movement-freedom-degree of optical axis Z-direction, two-dimension translational degree of freedom in the plane of vertical optical axis Z, the pitch freedom that is axle center with the transverse axis X of vertical optical axis Z, to be orthogonal to the beat degree of freedom that the orthogonal axes Y of optical axis Z and transverse axis X is axle center; The fixture of described spherical reflector is provided with following adjustment degree of freedom: along the one-movement-freedom-degree of optical axis Z-direction, two-dimension translational degree of freedom in the plane of vertical optical axis Z.
Compared with prior art, the invention has the advantages that:
The absolute method of inspection of aberrationless of ellipsoid of the present invention, first by spherical waves interfere instrument and spherical reflector, aberrationless zero check and opal location test are carried out respectively to ellipsoid, the face shape error of spherical waves interfere instrument system error and spherical reflector is isolated completely by four check positions, obtain the absolute assay of ellipsoid, there is the advantage that operation is simple and easy and precision is high.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the aberrationless zero check of the present invention first group of data W1.
Fig. 2 is the schematic diagram of the aberrationless zero check of the present invention second group of data W2.
Fig. 3 is the schematic diagram of the opal location test of the present invention the 3rd group of data W3.
Fig. 4 is the schematic diagram of the opal location test of the present invention the 4th group of data W4.
Opal interference pattern when Fig. 5 is opal position measurement in the present invention.
Fig. 6 is the schematic diagram of aberrationless zero check ellipsoid in the present invention being replaced to bi-curved first group of data W5.
Fig. 7 is the schematic diagram of aberrationless zero check ellipsoid in the present invention being replaced to bi-curved second group of data W6.
Fig. 8 is the schematic diagram of opal location test ellipsoid in the present invention being replaced to bi-curved 3rd group of data W7.
Fig. 9 is the schematic diagram of opal location test ellipsoid in the present invention being replaced to bi-curved 4th group of data W8.
In figure, each label represents: 1, ellipsoid; 2, spherical waves interfere instrument; 3, spherical reflector; 4, the centre of sphere of Spherical Test ripple; 5, the center of curvature; 7, hyperboloid.
Embodiment
Fig. 1 to Fig. 5 shows a kind of embodiment of the absolute method of inspection of aberrationless of ellipsoid of the present invention, and the method comprises the following steps:
S1: measure: utilize spherical waves interfere instrument 2 and spherical reflector 3 pairs of ellipsoids 1 to carry out aberrationless zero check and opal location test, concrete by following execution step by step:
S11: spherical waves interfere instrument 2 sends Spherical Test ripple to ellipsoid 1, and the centre of sphere 4 of Spherical Test ripple overlaps with the over focus f1 of ellipsoid 1, spherical reflector 3 is placed between spherical waves interfere instrument 2 and ellipsoid 1, and spherical reflector 3 is towards ellipsoid 1, the center of curvature 5 of spherical reflector 3 overlaps with the perifocus f2 of ellipsoid 1, carry out aberrationless zero check and record first group of data, and deposit is W1, W1 (x, y)=TS (x, y)+2T (x, y)+RS (x, y), wherein TS (x, y) be the reference surface error of sphere camera lens of spherical waves interfere instrument 2, T (x, y) be the face shape error of tested ellipsoid 1, RS (x, y) be the face shape error (lower with) of spherical reflector 3,
S12: ellipsoid 1 is turned round 180 ° around optical axis, all the other test conditions remain unchanged, and carry out aberrationless zero check and record second group of data, and deposit is W2, W2 (x, y)=TS (x, y)+2T (-x ,-y)+RS (x, y);
S13: ellipsoid 1 is got back to original position around optical axis revolution-180 °, spherical reflector 3 moves to its center of curvature 5, the summit of spherical reflector 3 is overlapped with the focus f2 of ellipsoid 1, carry out opal location test and record the 3rd group of data, and deposit is W3, the reflection of opal position makes test beams turn back to spherical waves interfere instrument 2 along around the axisymmetric direction of light, W3 (x, y)=1/2L (x, y)-1/2L (-x,-y)-1/2n [TS (x, y)-TS (-x,-y)]-1/2 [TS (x, y)+TS (-x,-y)]+[T (x, y)+T (-x,-y)], wherein L (x, y) be the sphere camera lens of sphericity interferometer 2 introduce except reference planes 21 error through wavefront error,
S14: turnover sphere catoptron 3 by spherical reflector 3 towards spherical waves interfere instrument 2, and moving sphere catoptron 3, make its summit overlap with the centre of sphere 4 of Spherical Test ripple, carry out opal location test and record the 4th group of data, and deposit is W4, W4 (x, y)=1/2L (x, y)-1/2L (-x,-y)-1/2n [TS (x, y)-TS (-x ,-y)]-1/2 [TS (x, y)+TS (-x ,-y)];
S2: the absolute assay T:T=of face shape error (W1-W2+2W3-2W4)/4 calculating ellipsoid 1.
In the present embodiment, the vertex curvature radius of tested ellipsoid 1 is R=478.56mm, and clear aperture is D=330mm, secondry constants K=-0.2645, calculate the major semi-axis a=650.6594mm of ellipsoid 1, minor semi-axis b=558.0140mm, the spacing c=334.6313mm of bifocal; As shown in Figures 1 to 4, wherein f/#< (the a+c)/D of the sphere camera lens of spherical waves interfere instrument 2, selects f/1.5 sphere camera lens here to the absolute method of inspection principle of aberrationless of this ellipsoid 1; Spherical reflector 3 R/#< (a-c)/D, R/# are the radius-of-curvature of spherical reflector 3 and the ratio of bore, the present embodiment selects diameter to be the quartz glass ball of 38mm.
In the present embodiment, the fixture of ellipsoid 1 is provided with following adjustment degree of freedom: along the one-movement-freedom-degree of optical axis Z-direction, two-dimension translational degree of freedom in the plane of vertical optical axis Z, the pitch freedom that is axle center with the transverse axis X of vertical optical axis Z, to be orthogonal to the beat degree of freedom that the orthogonal axes Y of optical axis Z and transverse axis X is axle center; The fixture of spherical reflector 3 is provided with following adjustment degree of freedom: the two-dimension translational degree of freedom in the one-movement-freedom-degree along optical axis Z-direction, the plane at vertical optical axis.
In step S11, spherical waves interfere instrument 2 and spherical reflector 3 pairs of ellipsoids 1 are utilized to carry out aberrationless zero check, the centre of sphere 4 of the Spherical Test ripple that spherical waves interfere instrument 2 sends overlaps with a focus f1 of ellipsoid 1, and the distance that now centre of sphere 4 of Spherical Test ripple arrives the summit of ellipsoid 1 is (a+c)=985.291mm; The center of curvature 5 of spherical reflector 3 overlaps with another focus f2 of ellipsoid 1, and the distance that now center of curvature 5 of spherical reflector 3 arrives the summit of ellipsoid 1 is (a-c)=316.028mm; Data measured deposit is W1.
In step S13, ellipsoid 1 is got back to original position around optical axis revolution-180 °, spherical reflector 3 moves to its center of curvature 5, the summit of spherical reflector 3 is overlapped with the focus f2 of ellipsoid 1, now the summit of spherical reflector 3 is (a-c)=316.028mm to the distance on the summit of ellipsoid 1, spherical reflector 3 is in opal check position, after incident ray is reflected by spherical reflector 3, return along about centrosymmetric position, interference pattern presents opal pattern, as shown in Figure 5, data measured deposit is W3.
In step S14, overturn by spherical reflector about 3 and move to its summit is overlapped with the centre of sphere 4 of Spherical Test ripple, can observe opal interference pattern as shown in Figure 5 equally, data measured deposit is W4.
In the present embodiment, in step S1, ellipsoid 1 meets aberrationless zero check condition, ellipsoid 1, spherical waves interfere instrument 2 and spherical reflector 3 optical axis coincidence, guarantees to measure accurately.
In the present embodiment, in step S13 and step S14, spherical reflector 3 is in opal check position, and incident ray returns along about centrosymmetric position after being reflected by spherical reflector 3, and interference pattern presents opal pattern, as shown in Figure 5.
The absolute method of inspection of aberrationless of the ellipsoid of the present embodiment, utilize confocal position and opal position, wherein confocal position there are two measuring positions, correspondence is turned round 180 ° of front and back by ellipsoid 1 around optical axis respectively, You Liangge measuring position, opal position, namely spherical reflector 3 overlaps with the over focus f1 of ellipsoid 1 and overlaps with the centre of sphere 4 of Spherical Test ripple, measurement data on four positions can be divided completely from going out reference surface error through simple mathematical operation, the face shape error of spherical waves interfere instrument 2 systematic error and spherical reflector 3 is isolated completely by four check positions, obtain the absolute assay of ellipsoid 1, there is the advantage that operation is simple and easy and precision is high.
Except the present embodiment, can also adopt said method detecting optical hyperboloid or other there is the optical surface profile of a pair finite conjugate focus or the aberrationless zero check of optical system, only the ellipsoid 1 in said method need be replaced with optical surface or other optical surface profile; Fig. 6 to Fig. 9 is the schematic diagram that the method for the present embodiment is definitely checked for the bi-curved aberrationless of optics, specifically comprises the following steps:
The first step: measure: utilize spherical waves interfere instrument 2 and spherical reflector 3 pairs of hyperboloids 7 to carry out aberrationless zero check and opal location test, specifically perform step by step by following;
(1): spherical waves interfere instrument 2 sends Spherical Test ripple to hyperboloid 7, and the centre of sphere 4 of Spherical Test ripple overlaps with the over focus f3 of hyperboloid 7, spherical reflector 3 is placed between spherical waves interfere instrument 2 and hyperboloid 7, and spherical reflector 3 is towards hyperboloid 7, the center of curvature 5 of spherical reflector 3 overlaps with the perifocus f4 of hyperboloid 7, carry out aberrationless zero check and record first group of data, and deposit is W5, W5 (x, y)=TS (x, y)+2T (x, y)+RS (x, y), wherein TS (x, y) be the reference surface error of sphere camera lens of spherical waves interfere instrument 2, T (x, y) be the face shape error of tested hyperboloid 7, RS (x, y) be the face shape error (lower with) of spherical reflector 3,
(2): hyperboloid 7 is turned round 180 ° around optical axis, all the other test conditions remain unchanged, and carry out aberrationless zero check and record second group of data, and deposit is W6, W6 (x, y)=TS (x, y)+2T (-x ,-y)+RS (x, y);
(3): hyperboloid 7 is got back to original position around optical axis revolution-180 °, spherical reflector 3 moves to its center of curvature 5, the summit of spherical reflector 3 is overlapped with the perifocus f4 of hyperboloid 7, carry out opal location test and record the 3rd group of data, and deposit is W7, the reflection of opal position makes test beams turn back to spherical waves interfere 2 along the direction around optical axis Z symmetry, W7 (x, y)=1/2L (x, y)-1/2L (-x,-y)-1/2n [TS (x, y)-TS (-x,-y)]-1/2 [TS (x, y)+TS (-x,-y)]+[T (x, y)+T (-x,-y)], wherein L (x, y) be the sphere camera lens of sphericity interferometer 2 introduce except reference planes 21 error through wavefront error,
(4): turnover sphere catoptron 3 by spherical reflector 3 towards spherical waves interfere instrument 2, and moving sphere catoptron 3, its summit is overlapped with the centre of sphere 4 of Spherical Test ripple, carry out opal location test and record the 4th group of data, and deposit is W8, W8 (x, y)=1/2L (x, y)-1/2L (-x,-y)-1/2n [TS (x, y)-TS (-x ,-y)]-1/2 [TS (x, y)+TS (-x ,-y)];
Second step: the absolute assay T:T=of face shape error (W5-W6+2W7-2W8)/4 calculating hyperboloid 7.
Although the present invention discloses as above with preferred embodiment, but and be not used to limit the present invention.Any those of ordinary skill in the art, when not departing from technical solution of the present invention scope, can utilize the technology contents of above-mentioned announcement to make many possible variations and modification to technical solution of the present invention, or being revised as the Equivalent embodiments of equivalent variations.Therefore, every content not departing from technical solution of the present invention, according to the technology of the present invention essence to any simple modification made for any of the above embodiments, equivalent variations and modification, all should drop in the scope of technical solution of the present invention protection.
Claims (4)
1. the absolute method of inspection of the aberrationless of ellipsoid, is characterized in that, comprise the following steps:
S1: measure: utilize spherical waves interfere instrument (2) and spherical reflector (3) to carry out aberrationless zero check and opal location test to ellipsoid (1), specifically perform step by step by following;
S11: described spherical waves interfere instrument (2) sends Spherical Test ripple to ellipsoid (1), and the centre of sphere of Spherical Test ripple (4) overlaps with the over focus f1 of ellipsoid (1), described spherical reflector (3) is placed between spherical waves interfere instrument (2) and ellipsoid (1), and spherical reflector (3) is towards ellipsoid (1), the center of curvature (5) of spherical reflector (3) overlaps with the perifocus f2 of ellipsoid (1), carry out aberrationless zero check and record first group of data, and deposit is W1;
S12: described ellipsoid (1) is turned round 180 ° around optical axis, and all the other test conditions remain unchanged, carries out aberrationless zero check and records second group of data, and deposit is W2;
S13: described ellipsoid (1) is got back to original position around optical axis revolution-180 °, described spherical reflector (3) is mobile to its center of curvature (5), the summit of spherical reflector (3) is overlapped with the focus f2 of ellipsoid (1), carry out opal location test and record the 3rd group of data, and deposit is W3;
S14: overturn described spherical reflector (3) by spherical reflector (3) towards spherical waves interfere instrument (2), and moving sphere catoptron (3), its summit is overlapped with the centre of sphere (4) of Spherical Test ripple, carry out opal location test and record the 4th group of data, and deposit is W4;
S2: the absolute assay T:T=of face shape error (W1-W2+2W3-2W4)/4 calculating described ellipsoid (1).
2. the absolute method of inspection of the aberrationless of ellipsoid according to claim 1, it is characterized in that, in described step S1, ellipsoid (1) meets aberrationless zero check condition, ellipsoid (1), spherical waves interfere instrument (2) and spherical reflector (3) optical axis coincidence.
3. the absolute method of inspection of the aberrationless of ellipsoid according to claim 1, it is characterized in that, in described step S13 and step S14, spherical reflector (3) is in opal check position, incident ray is by after spherical reflector (3) reflection, return along about centrosymmetric position, interference pattern presents opal pattern.
4. the absolute method of inspection of the aberrationless of ellipsoid according to any one of claim 1 to 3, it is characterized in that, the fixture of described ellipsoid (1) is provided with following adjustment degree of freedom: along the one-movement-freedom-degree in optical axis (Z) direction, two-dimension translational degree of freedom in the plane of vertical optical axis (Z), the pitch freedom that is axle center with the transverse axis of vertical optical axis (Z) (X), to be orthogonal to the beat degree of freedom that the orthogonal axes (Y) of optical axis (Z) and transverse axis (X) is axle center; The fixture of described spherical reflector (3) is provided with following adjustment degree of freedom: along the one-movement-freedom-degree in optical axis (Z) direction, two-dimension translational degree of freedom in the plane of vertical optical axis.
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| CN106596057B (en) * | 2016-11-14 | 2019-06-18 | 北京空间机电研究所 | A kind of face shape method of inspection of large caliber reflecting mirror component |
| CN106767392B (en) * | 2017-01-11 | 2019-07-09 | 哈尔滨工业大学 | Bifocus exempts from the ellipsoidal mirror lighting device of positioning |
| CN106767392A (en) * | 2017-01-11 | 2017-05-31 | 哈尔滨工业大学 | Bifocus exempts from the ellipsoidal mirror lighting device of positioning |
| CN106643556A (en) * | 2017-01-17 | 2017-05-10 | 哈尔滨工业大学 | Ellipsoid reflector surface shape detection device and ellipsoid reflector surface shape detection method |
| CN110966957A (en) * | 2019-11-22 | 2020-04-07 | 南京理工大学 | Absolute inspection method for synchronous measurement of multiple spherical standard lenses |
| CN113804410A (en) * | 2020-05-29 | 2021-12-17 | 上海微电子装备（集团）股份有限公司 | Ellipsoidal optical axis detection method and ellipsoidal optical axis detection device |
| CN113804410B (en) * | 2020-05-29 | 2023-02-10 | 上海微电子装备（集团）股份有限公司 | Ellipsoidal optical axis detection method and ellipsoidal optical axis detection device |
| CN112902875A (en) * | 2021-03-31 | 2021-06-04 | 中国科学院长春光学精密机械与物理研究所 | Aspheric reflector curvature radius detection device and method |
| CN112902875B (en) * | 2021-03-31 | 2022-02-11 | 中国科学院长春光学精密机械与物理研究所 | Aspheric reflector curvature radius detection device and method |
| CN114076573A (en) * | 2021-11-10 | 2022-02-22 | 中国科学院长春光学精密机械与物理研究所 | Equivalent element, preparation method of equivalent element and detection precision checking method |
| CN114076573B (en) * | 2021-11-10 | 2022-10-28 | 中国科学院长春光学精密机械与物理研究所 | Equivalent element, preparation method of equivalent element and detection precision checking method |
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