CN104641299A - Exposure/rendering device, exposure/rendering system, program, and exposure/rendering method - Google Patents

Exposure/rendering device, exposure/rendering system, program, and exposure/rendering method Download PDF

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Publication number
CN104641299A
CN104641299A CN201380049191.4A CN201380049191A CN104641299A CN 104641299 A CN104641299 A CN 104641299A CN 201380049191 A CN201380049191 A CN 201380049191A CN 104641299 A CN104641299 A CN 104641299A
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China
Prior art keywords
exposure
job information
information
image
conditions
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Granted
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CN201380049191.4A
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Chinese (zh)
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CN104641299B (en
Inventor
尾崎幸久
佐藤淳一
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ADITECH ENGINEERING Co Ltd
Adtec Engineering Co Ltd
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ADITECH ENGINEERING Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)

Abstract

Provided is an exposure/rendering device that, when rendering an image at both surfaces of a substrate to be exposed, can prevent the rendering of images that do not correspond to each other at each surface. The present invention has: a first rendering means that renders an image to the first surface of a substrate to be exposed by means of exposing the first surface; and a recording means that records first job information (60A), in which exposure condition information and image information of the first surface are associated, second job information (60B), in which exposure condition information and image information of the second surface are associated, and correspondance information of the first job information (60A) and second job information (60B). When rendering the image of the second surface of the substrate to be exposed, to the first surface of which an image has been rendered by means of exposing the first surface under the exposure conditions indicated by the first job information (60A), the image indicated by the second job information (60B) is rendered to the second surface by exposing the second surface at the exposure conditions indicated by the second job information associated with the first job information (60A), used when rendering the image to the first surface, on the basis of the correspondance information.

Description

Exposure plotting device, exposure plotting system, program and exposure plotting method
Technical field
The present invention relates to exposure plotting device, exposure plotting system, program and exposure plotting method, especially relate to the exposure plotting device of the two sides rendering image being exposed substrate and exposure plotting system, the program performed by this exposure plotting device and exposure plotting system and to the exposure plotting method of two sides rendering image being exposed substrate.
Background technology
In the past, developed and a kind ofly at the substrate that is exposed as printing substrate, the light beam modulated based on image information to be exposed, and be exposed the exposure plotting device of substrate rendering image at this.And, in order to the two sides rendering image being exposed substrate, also develop and have following exposure plotting system: this exposure plotting device is set up in parallel 2, a side is used for the description of first surface, and the opposing party is used for the description of second contrary with first surface.In this exposure plotting system, by the exposure plotting device of first surface to after the first surface rendering image being exposed substrate, this is exposed the precalculated position that substrate is sent to the exposure plotting device of second, by this exposure plotting device to second rendering image being exposed substrate.
As the technology relevant to this exposure plotting system, Patent Document 1 discloses a kind of exposure plotting system, the exposure plotting device which raises use 2 to be exposed the first surface of substrate and second respectively rendering image time the throughput being exposed the transmission process of substrate.
Each exposure plotting device that this exposure plotting system has possesses delineation unit, and this delineation unit has: platform, and mounting is exposed substrate; Platform mobile member, makes platform linearly move; And beam flying component, be placed in the first surface scanning light beam being exposed substrate of platform.And each exposure plotting device possesses the upstream side unit of the upstream side being configured at delineation unit on the moving direction of platform and be configured at the downstream unit in downstream of delineation unit on the moving direction of platform.And each exposure plotting device possesses feeding component, this feeding component keeps being exposed substrate and making it move along the direction identical with the moving direction of platform and direction of transfer of upstream side unit, will be exposed on platform that substrate is sent in delineation unit.And each exposure plotting device possesses sends component, this is sent component and keeps being exposed substrate and making it move along direction of transfer on the platform in delineation unit, will be exposed substrate and pass out to downstream unit.
In each exposure plotting device, when when being exposed the first surface scanning light beam of substrate, platform being moved to side, downstream from the upstream side of direction of transfer, being sent to being exposed substrate the platform being positioned at upstream side, and send from the platform being positioned at downstream and be exposed substrate.
Prior art document
Patent documentation
Patent documentation 1: Japanese Unexamined Patent Publication 2002-341550 publication
Summary of the invention
The problem that invention will solve
Usually, when use exposure plotting device is when being exposed substrate rendering image, the job information of the processing requirements (operation) of conditions of exposure when operator specifies description to exposure plotting device input to the image and expression that are exposed substrate description.When with same conditions of exposure when multiple be exposed substrate describe same image continuously, in job information, represent a series of process in the lump.Further, exposure plotting device exposure plotting process of carrying out being exposed substrate based on the job information of input.
In the exposure plotting system disclosed in above-mentioned patent documentation 1, use 2 exposure plotting devices respectively and be exposed each one side rendering image of substrate, therefore operator is to the job information of the exposure plotting device input first surface of a side, and the exposure plotting device to the opposing party inputs the job information of second.Thus, because operator individually inputs job information to each exposure plotting device, therefore when operator inputs mistakenly, exist and may describe the such a problem of figure not corresponding each other each of being exposed substrate.
In addition, the substrate that is exposed sometimes exposure plotting process failure being become unacceptable product in the exposure plotting device of a side is removed.In this case, even if when the input of job information is correctly carried out, when the job information inputted to the exposure plotting device of the opposing party is not updated, also exists and may describe the such a problem of figure not corresponding each other each of being exposed substrate.
The present invention completes in view of the above problems, and object is to provide exposure plotting device, exposure plotting system, program and the exposure plotting method that can prevent from when being exposed the two sides rendering image of substrate describing the situation of not corresponding each other image at each.
For solving the technical scheme of problem
To achieve these goals, exposure plotting device of the present invention comprises: first describes component, by being exposed the first surface exposure of substrate to described first surface rendering image, means of storage, store the first job information, second job information and corresponding informance, described first job information will represent the image information of the image described to the described described first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, described corresponding informance represents the corresponding relation of described first job information and described second job information, and second describes component, to utilize described first describe component under the conditions of exposure represented by described first job information, the exposure of described first surface is depicted to described first surface the image represented by described first job information be exposed described second rendering image of substrate when, based on described corresponding informance, with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information, by described second exposure, thus by the image that represented by this second job information to described second description.
According to exposure plotting device of the present invention, describe component by first, will the first surface exposure of substrate be exposed, thus to described first surface rendering image.
At this, in the present invention, by means of storage, store and will represent the image information of the image described to the described described first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes the first corresponding job information, will represent the image information that is exposed second image described contrary with described first surface of substrate to described and represent that the conditions of exposure information of conditions of exposure establishes the second corresponding job information and represents the corresponding informance of corresponding relation of described first job information and described second job information.And, in the present invention, component is described by second, to utilize described first describe component under the conditions of exposure represented by described first job information, the exposure of described first surface is depicted to described first surface the image represented by described first job information be exposed described second rendering image of substrate when, based on described corresponding informance, with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information, by described second exposure, thus by the image that represented by this second job information to described second description.
Thus, according to exposure plotting device of the present invention, use and set up corresponding corresponding informance by being used for the first job information of first surface rendering image and the second job information be used for second rendering image, use and establish the second corresponding job information to second rendering image with to the first job information used during first surface rendering image, therefore, it is possible to prevent to when being exposed the two-sided rendering image of substrate in the situation of the not corresponding each other image of each description.
In addition, exposure plotting device involved in the present invention also can be, described means of storage comprises the first storage area storing described first job information and the second storage area storing described second job information, and described corresponding informance is stored in either party in described first storage area and described second storage area.Thereby, it is possible to select the job information corresponded to each other in each face simply.
On the other hand, to achieve these goals, exposure plotting system involved in the present invention has the first exposure plotting device and the second exposure plotting device, described first exposure plotting device comprises: the first means of storage, store the first job information, this first job information will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence, first describes component, is exposed by described first surface, thus described to described first surface by the image represented by this first job information under the conditions of exposure represented by described first job information, and transmission component, send the information represented describing described first job information used when component depicts image to described first surface by described first, described second exposure plotting device comprises: the second means of storage, store the second job information and corresponding informance, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, described corresponding informance represents the corresponding relation of described first job information and described second job information, receiving member, receives the information of described first job information of expression sent by described transmission component, determine component, establish corresponding described second job information based in described corresponding informance with described first job information represented by the information of described first job information of the expression received by described receiving member, decide the image and conditions of exposure described to described second, and second describes component, by described second exposure under the conditions of exposure determined by described decision component, thus by the image by described decision component decision to described second description.
According to exposure plotting system involved in the present invention, by the first means of storage of the first exposure plotting device, store and will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes the first corresponding job information.And, describe component by first of the first exposure plotting device, under the conditions of exposure represented by described first job information, described first surface is exposed, thus the image represented by this first job information is described to described first surface.And then, by the transmission component of the first exposure plotting device, send the information representing and utilize described first description component to described first job information used during described first surface rendering image.
On the other hand, in exposure plotting system involved in the present invention, by the second means of storage of the second exposure plotting device, store the second job information and corresponding informance, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, and described corresponding informance represents the corresponding relation of described first job information and described second job information.And, by the receiving member of the second exposure plotting device, receive the information representing described first job information sent by described transmission component.And, by the decision component of the second exposure plotting device, establish corresponding described second job information based in described corresponding informance with described first job information represented by the information of described first job information of the expression received by described receiving member, decide the image and conditions of exposure described to described second.And then, describe component by second of the second exposure plotting device, by described second exposure under the conditions of exposure determined by described decision component, thus by the image by described decision component decision to described second description.
Thus, according to exposure plotting system involved in the present invention, second exposure plotting device prestores sets up corresponding corresponding informance by being used for the first job information of first surface rendering image and the second job information be used for second rendering image, use this corresponding informance, determine and use to come to second rendering image with establishing the second corresponding job information to the first job information used during first surface rendering image, therefore, it is possible to prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each.
In addition, exposure plotting system involved in the present invention also can be, described corresponding informance is that the identifying information being used for identifying described first job information and the identifying information that is used for described second job information identified corresponding to this first job information are established corresponding information, represents that the information of described first job information is the described identifying information of described first job information.Thus, compared with itself situation of transmission first job information, the quantity of information of the information sent to the second exposure plotting device from the first exposure plotting device can be made to reduce.
In addition, exposure plotting system involved in the present invention also can be, the described transmission component of described first exposure plotting device, only when the description undertaken by described first description component normally terminates, sends the information representing described first job information.Thus, and not to be suitable for compared with situation of the present invention, can to prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each more effectively.
In addition, exposure plotting system involved in the present invention also can be, the described transmission component of described first exposure plotting device, when the description undertaken by described first description component terminates singularly, sends the error message representing and there occurs mistake.Thus, and not to be suitable for compared with situation of the present invention, can to prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each more effectively.
In addition, also can be that exposure plotting system involved in the present invention also possesses control device, and this control device comprises: the 3rd means of storage, store described first job information, described second job information and described corresponding informance, and second sends component, described first job information stored by described 3rd means of storage is sent to described first exposure plotting device, described second job information and described corresponding informance are sent to described second exposure plotting device, described first exposure plotting device also possesses the second receiving member receiving and send described first job information that component sends by described second, described first of described first exposure plotting device is described component and is used described first job information received by described second receiving member to come to described first surface rendering image, described second exposure plotting device also possesses the 3rd receiving member receiving described second job information and the described corresponding informance sent by described second transmission component, described second of described second exposure plotting device determines that component uses described second job information that received by described 3rd receiving member and described corresponding informance to decide image to described second description and conditions of exposure.Thus, by control device, can management system be overall on the whole.
In addition, exposure plotting system involved in the present invention also can be, what described control device also possessed the input accepting described first job information, the second job information and described corresponding informance accepts component, and described 3rd means of storage of described control device stores by described described first job information, the second job information and the described corresponding informance that accept component and accept.Thus, use the job information inputted by user, the image that can correspond to each other to each the description being exposed substrate.
On the other hand, to achieve these goals, exposure plotting system involved in the present invention has the first exposure plotting device and the second exposure plotting device, described first exposure plotting device comprises: the first means of storage, store and will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes the first corresponding job information, and store the corresponding informance of the corresponding relation representing described first job information and the second job information, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, first describes component, is exposed by described first surface, thus described to described first surface by the image represented by this first job information under the conditions of exposure represented by described first job information, and transmission component, be sent in described corresponding informance with describe by described first described first job information that component uses when described first surface depicts image and establish corresponding described second job information, described second exposure plotting device comprises: receiving member, receives described second job information sent by described transmission component, and second describes component, by described second exposure under the conditions of exposure represented by described second job information received by described receiving member, thus by the image represented by this second job information to described second description.
According to exposure plotting system involved in the present invention, by the first means of storage of the first exposure plotting device, store and will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes the first corresponding job information, and store the corresponding informance of the corresponding relation representing described first job information and the second job information, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding.And, describe component by first of the first exposure plotting device, under the conditions of exposure represented by described first job information, described first surface is exposed, thus the image represented by this first job information is described to described first surface.In addition, by the transmission component of the first exposure plotting device, be sent in described corresponding informance with describe by described first described first job information that component uses when described first surface depicts image and establish corresponding described second job information.
On the other hand, in exposure plotting system involved in the present invention, by the receiving member of the second exposure plotting device, receive described second job information sent by described transmission component.And, component is described by second of the second exposure plotting device, by described second exposure under the conditions of exposure represented by described second job information received by described receiving member, thus by the image represented by this second job information to described second description.
Thus, according to exposure plotting system of the present invention, first exposure plotting device stores sets up corresponding corresponding informance by being used for the first job information of first surface rendering image and the second job information be used for second rendering image, use this corresponding informance, by with establish the second corresponding job information to the first job information used during first surface rendering image and send to the second exposure plotting device, therefore, it is possible to prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each.
In addition, to achieve these goals, exposure plotting system of the present invention has the first exposure plotting device, control device and the second exposure plotting device, described first exposure plotting device comprises: the 4th means of storage, store the first job information, this first job information will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence; First describes component, is exposed by described first surface, thus described to described first surface by the image represented by this first job information under the conditions of exposure represented by described first job information; And the 3rd sends component, send the information representing the first job information that the description undertaken by described first description component uses, described control device comprises: the 5th means of storage, store described first job information, the second job information and represent the corresponding informance of corresponding relation of described first job information and described second job information, described second job information by represent to the described image information being exposed second image described contrary with described first surface of substrate with represent that the conditions of exposure information of conditions of exposure establishes corresponding; 4th receiving member, receives the information sending described first job information of expression that component sends by the described 3rd; And the 4th sends component, be sent in described corresponding informance and establish corresponding described second job information with described first job information represented by the information of described first job information of expression received by described 4th receiving member, described second exposure plotting device comprises: the 5th receiving member, receives the information representing and send described second job information that component sends by the described 4th; And second describes component, by described second exposure under the conditions of exposure represented by the information of described second job information of expression received by described 5th receiving member, thus by the image that represented by this second job information to described second description.
According to exposure plotting system involved in the present invention, by the 4th means of storage of the first exposure plotting device, store the first job information, this first job information will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence.And, describe component by first of the first exposure plotting device, under the conditions of exposure represented by described first job information, described first surface is exposed, thus the image represented by this first job information is described to described first surface.And, send component by the 3rd of the first exposure plotting device, send the information representing the first job information that the description undertaken by described first description component uses.
On the other hand, in exposure plotting system involved in the present invention, by the 5th means of storage of control device, store described first job information, the second job information and represent the corresponding informance of corresponding relation of described first job information and described second job information, described second job information by represent to the described image information being exposed second image described contrary with described first surface of substrate with represent that the conditions of exposure information of conditions of exposure establishes corresponding.And, by the 4th receiving member of control device, receive the information sending described first job information of expression that component sends by the described 3rd.In addition, send component by the 4th of control device, be sent in described corresponding informance and establish corresponding described second job information with described first job information represented by the information of described first job information of expression received by described 4th receiving member.
And then, in exposure plotting system involved in the present invention, by the 5th receiving member of the second exposure plotting device, receive the information representing and send described second job information that component sends by the described 4th, component is described by second of the second exposure plotting device, by described second exposure under the conditions of exposure represented by the information of described second job information of expression received by described 5th receiving member, thus by the image that represented by this second job information to described second description.
Thus, according to exposure plotting system of the present invention, control device stores sets up corresponding corresponding informance by being used for the first job information of first surface rendering image and the second job information be used for second rendering image, use this corresponding informance, by receive from the first exposure plotting device with establish the second corresponding job information to the first job information used during first surface rendering image and send to the second exposure plotting device, therefore new function can not be added to exposure plotting device, can prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each.
In addition, exposure plotting system involved in the present invention also can be, be exposed described in described conditions of exposure comprises the size of substrate, described in be exposed substrate the sheet number as exposure object, described be exposed substrate in order to determine image description region and arrange this mark in markd situation configuration pattern and described in be exposed in the photosensitive material kind of substrate at least one.Thereby, it is possible to carry out rendering image with the conditions of exposure being suitable for each that is exposed substrate.
On the other hand, to achieve these goals, program involved in the present invention is used for making computing machine describe component and second as first and describes component performance function, described first describes component under the conditions of exposure establishing represented by the first corresponding job information by the conditions of exposure information of the image information and expression conditions of exposure that represent the image described to the described first surface being exposed substrate, described first surface is exposed, thus the image that represented by described first job information is described to described first surface, described second describe component to depict to described first surface by described first surface being exposed under the conditions of exposure represented by described first job information the image represented by described first job information be exposed described second rendering image of substrate when, described second is exposed with in the corresponding informance of the corresponding relation of the second job information with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information in described first job information of expression, thus by the image that represented by this second job information to described second description, described second job information establishes corresponding to the described image information being exposed second image described contrary with described first surface of substrate with the conditions of exposure information of expression conditions of exposure by representing.
Therefore, according to program involved in the present invention, play a role in the same manner as exposure plotting device involved in the present invention and exposure plotting system due to computing machine can be made, therefore, in the same manner as this exposure plotting device and exposure plotting system, can prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each.
And then, to achieve these goals, exposure plotting method involved in the present invention comprises the steps: storing step, store the first job information, second job information and corresponding informance, described first job information will represent the image information of the image utilizing the first description component to describe to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence, described first describes component by being exposed by described first surface to described first surface rendering image, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, described corresponding informance represents the corresponding relation of described first job information and described second job information, and second describes step, to utilize described first describe component under the conditions of exposure represented by described first job information, the exposure of described first surface is depicted to described first surface the image represented by described first job information be exposed described second rendering image of substrate when, based on described corresponding informance, with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information, by described second exposure, thus by the image that represented by this second job information to described second description.
Therefore, according to exposure plotting method involved in the present invention, owing to can play a role in the same manner as exposure plotting device involved in the present invention and exposure plotting system, therefore, in the same manner as this exposure plotting device and exposure plotting system, can prevent to the situation describing image not corresponding each other when being exposed the two-sided rendering image of substrate at each.
Invention effect
According to the present invention, following effect can be played: can prevent to the situation describing image not corresponding each other when being exposed the two sides rendering image of substrate at each.
Accompanying drawing explanation
Fig. 1 is the approximate vertical view of the structure of the exposure plotting entire system represented involved by embodiment.
Fig. 2 is the stereographic map of the structure representing the first exposure plotting device involved by embodiment and the second exposure plotting device.
Fig. 3 A is the approximate vertical view of the exposure area of the photohead represented involved by embodiment and the Pareto diagram of photohead.
Fig. 3 B represents be exposed the approximate vertical view of image-region of the image that substrate is described by the photohead involved by embodiment.
Fig. 4 is the fragmentary perspective cross sectional view of the structure of the turning device represented involved by embodiment.
Fig. 5 is the block diagram of the structure of the electric system representing the first exposure plotting device involved by embodiment and the second exposure plotting device.
Fig. 6 is the block diagram of the structure of the electric system of the control device represented involved by embodiment.
Fig. 7 A is the schematic diagram of the example representing the first embodiment and the job information involved by the second embodiment.
Fig. 7 B is the schematic diagram of the example representing the first embodiment and the job information involved by the second embodiment.
Fig. 8 is the process flow diagram of the flow process of the process of the operation setting program represented involved by the first embodiment.
Fig. 9 is the structural drawing of the structure example of the operation input picture represented involved by the first embodiment.
Figure 10 is the schematic diagram of the explanation of exposure plotting process for illustration of the exposure plotting system involved by the first embodiment.
Figure 11 is the process flow diagram of the flow process of the process of the first Job execution handling procedure represented involved by the first embodiment.
Figure 12 is the process flow diagram of the flow process of the process of the second Job execution handling procedure represented involved by the first embodiment.
Figure 13 is the process flow diagram of the flow process of the process of the operation setting program represented involved by the second embodiment.
Figure 14 is the process flow diagram of the flow process of the process of the first Job execution handling procedure represented involved by the second embodiment.
Figure 15 is the process flow diagram of the flow process of the process of the operation selection handling procedure represented involved by the second embodiment.
Figure 16 is the process flow diagram of the flow process of the process of the second Job execution handling procedure represented involved by the second embodiment.
Figure 17 A is the schematic diagram of an example of the job information represented involved by the 3rd embodiment.
Figure 17 B is the schematic diagram of an example of the job information represented involved by the 3rd embodiment.
Figure 18 is the process flow diagram of the flow process of the process of the operation setting program represented involved by the 3rd embodiment.
Figure 19 is the schematic diagram of the explanation of exposure plotting process for the exposure plotting system involved by the 3rd embodiment.
Figure 20 is the process flow diagram of the flow process of the process of the second Job execution handling procedure represented involved by the 3rd embodiment.
Figure 21 is the structural drawing of the structure example of the operation selection picture represented involved by the 3rd embodiment.
Embodiment
[the first embodiment]
Below, utilize accompanying drawing to explain the exposure plotting device involved by embodiment.In addition, in each embodiment, enumerate and be applicable to be exposed substrate (described later be exposed substrate C) by beam exposure and the situation describing the exposure plotting system of the image of indication circuit pattern is that example is to illustrate the present invention.And, be exposed substrate C and print the flat panel substrate such as wiring substrate, glass substrate for plane display device.
As shown in Figure 1, the exposure plotting system 1 involved by present embodiment possesses the first exposure plotting device 2 exposed the first surface being exposed substrate C and the second exposure plotting device 3 exposed second face contrary with first surface being exposed substrate C.And exposure plotting system 1 possesses: turning device 4, be arranged between the first exposure plotting device 2 and the second exposure plotting device 3, and overturn being exposed the positive and negative of substrate C; And control device 5, control the exposure to the first surface and second being exposed substrate C.
In addition, first exposure plotting device 2 with between control device 5, the second exposure plotting device 3 is connected by wireline cable 8a respectively with between control device 5, control device 5 communicates via wireline cable 8a with between the first exposure plotting device 2 and the second exposure plotting device 3.Similarly, the first exposure plotting device 2 and the second exposure plotting device 3 are connected by wireline cable 8b, and above-mentioned each exposure plotting device communicates via wireline cable 8b.
Next, the structure of the first exposure plotting device 2 involved by present embodiment and the second exposure plotting device 3 is described.In addition, the first exposure plotting device 2 and the second exposure plotting device 3 have identical structure, are therefore described the first exposure plotting device 2 here, and omit the explanation for the second exposure plotting device 3.
As shown in Figure 2, the first exposure plotting device 2 involved by present embodiment possesses flat 10 for being fixedly exposed substrate C.And, the multiple inlet holes (omitting diagram) sucking air are provided with at the upper surface of platform 10.When being exposed substrate C in the upper surface mounting of platform 10, the air be exposed between substrate C and platform 10 is inhaled into via inlet hole, will be exposed substrate C vacuum suction thus in platform 10.
In addition, platform 10 is by supporting by the flat base station 12 that is arranged on the upper surface of the matrix 11 of table-like of the mode of movement.That is, the upper surface of matrix 11 is provided with 1 or many (being 2 in the present embodiment) guide rails 14.Base station 12 is supported for and freely can moves along guide rail 14, is undertaken driving by the driving mechanism (described later drive division 42) be made up of motor etc. and is moved.Platform 10 moves along guide rail 14 linkedly with the movement of base station 12.
In addition, below, the direction of platform 10 movement is defined as Y-direction, the direction orthogonal in surface level with this Y-direction is defined as X-direction, the direction orthogonal in vertical plane with Y-direction is defined as Z-direction.
The door body 15 of the gate to erect setting across the mode of 2 guide rails 14 is provided with at the upper surface of matrix 11.The substrate C that is exposed being placed in platform 10 moves in the mode of the peristome along guide rail 14 access door body 15.The exposure portion 16 exposed light beam towards this peristome is installed on the top of the peristome of door body 15.By this exposure portion 16, when platform 10 moves along guide rail 14 and is positioned at above-mentioned peristome, at the upper surface being exposed substrate C being placed in platform 10, light beam is exposed.
Exposure portion 16 involved by present embodiment is configured to comprise multiple (being 16 in the present embodiment) photohead 16a.Photohead 16a respectively in each exposure portion 16 in rectangular arrangement.And, the optical fiber 18 of drawing from light source cell 17 described later and the signal cable 20 of drawing from graphics processing unit 19 described later is connected with separately in exposure portion 16.
Photohead 16a has the digital micro-mirror device (DMD) of the spatial optical modulation element as reflection-type respectively.Photohead 16a based on the image information control DMD inputted from graphics processing unit 19, thus modulates the light beam from light source cell 17.First exposure plotting device 2 by being irradiated to being exposed substrate C by the light beam after this modulation, and carries out the exposure to being exposed substrate C.In addition, spatial optical modulation element is not defined as reflection-type, also can be the spatial optical modulation element of the light-transmission type of liquid crystal etc.
As shown in Figure 3A, the region exposed by photohead 16a and image-region P1 are the rectangular shapes that the limit of a side tilts with predetermined pitch angle relative to the moving direction (Y-direction) of platform 10.In addition, in figure 3 a, the part in the multiple photohead 16a involved by present embodiment is only shown.And, platform 10 is when the peristome of door body 15 moves, if exposed light beam being exposed substrate C by photohead 16a, then as shown in Figure 3 B, being exposed along with the movement of platform 10 substrate C forms banded exposure according to each photohead 16a completing region P2.The distance of the natural several times (being 1 times in the present embodiment) of the length on the long limit of each image-region P1 that staggers separately in X direction of the photohead 16a in rectangular arrangement configures.Further, exposed region P2 complete with adjacent exposure separately region P2 local formed overlappingly.
As shown in Figure 2, the door body 22 of the gate to erect setting across the mode of 2 guide rails 14 is also provided with at the upper surface of matrix 11.The substrate C that is exposed being placed in platform 10 moves in the mode of the peristome along guide rail 14 access door body 22.
One or more (being 3 in the present embodiment) photography portion 23 for photographing to peristome is installed on the top of the peristome of door body 22.Photography portion 23 is the CCD camera etc. being built-in with the extremely short flashlamp of the fluorescent lifetime of single.And on the top of the peristome of door body 22, in surface level, the direction (X-direction) vertical with the moving direction (Y-direction) of platform 10 is provided with track 23a, photography portion 23 is arranged respectively to guided by track 23a and can move.When platform 10 moves along guide rail 14 and is positioned at above-mentioned peristome, by this photography portion 23, the upper surface being exposed substrate C being placed in platform 10 is photographed.
As shown in Figures 1 and 2, the first exposure plotting device 2 possess by send into from outside be exposed substrate C be sent to the precalculated position of the first exposure plotting device 2 the first transport unit 6, will substrate C will be exposed be sent to from the first exposure plotting device 2 second transport unit 7 in the precalculated position of turning device 4.Similarly, the second exposure plotting device 3 possesses the first transport unit 6 being exposed substrate C and being sent to from turning device 4 precalculated position of the second exposure plotting device 3, the second transport unit 7 that will be exposed the outside of substrate C to the second exposure plotting device 3 and transmit.
The drive motor that first transport unit 6 and the second transport unit 7 have multiple rotating roller and this rotating roller is rotated.Above-mentioned multiple rotating roller is laid separately abreast, be provided with in one end of rotating roller accept by with or the sprocket wheel of revolving force that transmits of tinsel or pulley.As the unit of revolving force transmitting the drive motor making rotating roller rotate, except being with or except tinsel, the transmission method undertaken by the magnet of cylindrical shape can also being adopted.
In addition, as shown in Figure 2, first exposure plotting device 2 is possessed and is exposed what be sent to precalculated position by the first transport unit 6 substrate C to be sent to platform 10 automatic delivery hand (auto carrier hand, hereinafter referred to as AC hand) 24 from this precalculated position.AC hand 24 is formed as tabular, and be arranged to can in X direction and Z-direction move.The multiple inlet holes 25 sucking air are provided with at the lower surface of AC hand 24.When the lower surface of AC hand 24 moves to the position contacted with the upper surface being exposed substrate C, the air that AC hand 24 utilizes inlet hole 25 to suck AC hand 24 and be exposed between substrate C, makes to be exposed substrate C vacuum suction thus and carries out absorption maintenance in the lower surface of AC hand 24.And, be provided with at the lower surface of AC hand 24 and move pressing portion 26 freely along Z-direction, when AC hand 24 moves to the upper surface of platform 10 under absorption maintains the state being exposed substrate C, this pressing portion 26 will be exposed substrate C and releases downward and press on platform 10.
The AC hand 24 of the first exposure plotting device 2 carries out absorption and keeps to the unexposed substrate C that is exposed being sent to the first transport unit 6 and make it be moved upward, and is positioned in the upper surface of platform 10.And the AC hand of the first exposure plotting device 2 24 is carried out absorption maintenance by the substrate C that is exposed expose the first surface be positioned on the upper surface of platform 10 and made it be moved upward, thus make to be exposed substrate C and move to the second transport unit 7.What the first surface moving to the second transport unit 7 had exposed be exposed substrate C is sent by the outside of the second transport unit 7 to the first exposure plotting device 2.
Further, the AC hand 24 of the second exposure plotting device 3 carries out absorption and keeps to the substrate C that is exposed that the first surface being sent to the first transport unit 6 has exposed and be moved upward, and will be exposed substrate C and be positioned in the upper surface of platform 10.Further, the AC hand of the second exposure plotting device 3 24 is carried out absorption maintenance by the substrate C that is exposed completed the first surface be positioned on the upper surface of platform 10 and second exposure and is made it be moved upward, thus makes to be exposed substrate C and move to the second transport unit 7.Move to the substrate C that is exposed that the first surface of the second transport unit 7 and second exposure complete to be sent to the outside of exposure plotting system 1 by the second transport unit 7.
Next, the structure of the turning device 4 involved by present embodiment is described.
As shown in Figure 4, turning device 4 possesses and rotates freely the body side frame 30 that the earth's axis is supported in the tabular of rotation axis L.Body side frame 30 maintains the state backspin turnback being exposed substrate C in inside, thus makes the positive and negative upset being exposed substrate C.
In addition, as shown in Figure 4, the side of the side residing for the first exposure plotting device 2 in the side that body side frame 30 has is provided with the feeding mouth 31 that will be exposed the inside of substrate C to body side frame 30 and send into.And then, be provided with multiple rollers of being driven by motor 33 in the inside of body side frame 30 to 34.The substrate C that is exposed being contained in the inside of body side frame 30 transmits 34 by roller under the state of clamping.Be exposed substrate C is sent to body side frame 30 via feeding mouth 31 to 34 inside by roller, and by the rotation of body side frame 30 by positive and negative upset, transmitted to the outside of body side frame 30 via feeding mouth 31 34 by roller.In addition, when terminating to be exposed the sending of substrate C, body side frame 30 rotates 180 degree again in order to next is exposed substrate C and internally send into.
Next, the structure of the electric system of the first exposure plotting device 2 involved by present embodiment and the second exposure plotting device 3 is described.In addition, because the first exposure plotting device 2 and the second exposure plotting device 3 have the structure of identical electric system, at this, the first exposure plotting device 2 is described, omits the explanation for the second exposure plotting device 3.
As shown in Figure 5, be provided with the systems control division 40 be electrically connected with device each several part respectively at the first exposure plotting device 2, controlled each several part of the first exposure plotting device 2 by the overall Shangdi of this systems control division 40.And the first exposure plotting device 2 has job storage portion 41, platform drive division 42, display device 43, input media 44, photography drive division 46 and outside input and output portion 48.
Systems control division 40 has CPU (Central Processing Unit), RAM (Random AccessMemory), ROM (Read Only Memory) and HDD (Hard Disk Drive).And by above-mentioned CPU, systems control division 40 makes light beam penetrate from light source cell 17 with the mobile corresponding moment of platform 10, and by graphics processing unit 19, corresponding image information is exported.Systems control division 40 controls photohead 16a in the above described manner to the exposure of light beam being exposed substrate C.
Job storage portion 41 has RAM, nonvolatile memory, stores the job information to representing as the operation performing object.Operation in present embodiment is that same image is carried out exposure plotting with identical conditions by the first surface being exposed substrate C 1 or multi-disc, and also with identical conditions, same image is carried out the exposure-processed requirement carried out in the lump of exposure plotting in the second face that this is exposed substrate C.In addition, the details about job information are described below.In the present embodiment, the job information as the operation performing object stores with tabular form by job storage portion 41, but is not limited thereto, and also can store with queue (queue) form.
Platform drive division 42 has the driving mechanism be made up of motor or hydraulic pump etc., is driven platform 10 by the control of systems control division 40.
Display device 43 is the indication mechanisms such as the liquid crystal display being shown various information by the control of systems control division 40.
Input media 44 is operated by user and inputs the input mechanism of the touch sensor or action button etc. of various information.
Photography drive division 46 has the driving mechanism be made up of motor or hydraulic pump etc., is driven photography portion 23 by the control of systems control division 40.
Outside input and output portion 48 carries out the input and output of various information between the various signal conditioning packages comprising the second exposure plotting device 3 and control device 5 being connected to the first exposure plotting device 2.In addition, the outside input and output portion 48 of the second exposure plotting device 3 carries out the input and output of various information between the various signal conditioning packages comprising the first exposure plotting device 2 and control device 5 being connected to the second exposure plotting device 3.
Next, the structure of the electric system of the control device 5 of present embodiment is described.
As shown in Figure 6, control device 5 possesses the control part 50 controlled the exposure plotting process in exposure plotting system 1.And control device 5 possesses storage part 51, this storage part 51 has ROM and HDD etc. storing the program needed for exposure plotting process or the various data of being undertaken by control part 50.In addition, storage part 51 also storage operation information, operation setting program, the first Job execution handling procedure, the second Job execution handling procedure and the second embodiment operation select handling procedure.
In addition, control device 5 is possessed the control based on control part 50 and shows the display parts such as the liquid crystal display of various information 52 and operated by user and input the input part 53 such as keyboard or mouse of various information.And then control device 5 possesses communication interface 54, this communication interface 54 based on control part 50 control and carry out the transmission and reception of the various information to the first exposure plotting device 2 and the second exposure plotting device 3.
At this, the control device 5 involved by present embodiment operates the input of the information relevant to operation of carrying out by reason user.And control device 5, when having accepted the input of the information relevant to operation, generates and the first exposure plotting device 2 and the corresponding respectively job information of the second exposure plotting device 3 and send.First exposure plotting device 2 of present embodiment and the second exposure plotting device 3 are when receiving job information, the job information received is stored in job storage portion 41, and performs the exposure plotting process to being exposed substrate C according to the content of the operation stored.Now, the first exposure plotting device 2 involved by present embodiment, when storing multiple job information, according to the order receiving each job information, performs the operation represented by each job information.In addition, the second exposure plotting device 3 involved by present embodiment performs the operation corresponding with the operation performed by the first exposure plotting device 2 successively.
When generating job information, control device 5 generate respectively make the first exposure plotting device 2 to be exposed substrate C first surface rendering image job information 60A and make the second exposure plotting device 3 to the job information 60B of second rendering image being exposed substrate C, and be stored in storage part 51.Namely, even be exposed the relevant operation of substrate C to same, owing to carrying out exposure plotting process for first surface and second respectively by independent exposure plotting device, therefore separately generate the job information 60B of job information 60A and second of first surface and store.
As shown in figs. 7 a and 7b, as an example, operation identifying information 61, image information 61a, conditions of exposure information 62, counter-party information 63 are set up corresponding information with each operation by job information 60A, 60B respectively.In addition, operation identifying information 61 is the information for identifying respective operation.And image information 61a is the information of the image represented as rendered object.And conditions of exposure information 62 is the information representing conditions of exposure when exposing light beam in order to describe the image corresponding with being exposed substrate C.Conditions of exposure information 62 involved by present embodiment comprises the description sheet number information represented as the substrate size information being exposed the substrate size of substrate C (hereinafter referred to as " object substrate ") of rendered object and the description sheet number of expression object substrate.And, conditions of exposure information 62 involved by present embodiment comprises label information and represents the photosensitive material kind of information etc. of photosensitive material kind of object substrate, the configuration pattern of this mark this label information represents the mark of the description region be provided with for determining the image corresponding with object substrate during with coordinate.In addition, the configuration pattern being arranged at the mark of object substrate becomes mirror image at first surface and second place.But the information that conditions of exposure information 62 comprises is not limited to this, as long as the information that the information etc. of the translational speed of the information of the intensity of expression light beam, expression platform 10 uses when carrying out exposure plotting process, can be arbitrary information.And then counter-party information 63 is the information of the operation identifying information of the operation (hereinafter also referred to as " operation of the other side ") representing the object side corresponded to each other at first surface and the second face.
Operator, when wanting to make the first exposure plotting device 2 and the second exposure plotting device 3 perform operation, inputs job information 60A via input part 53 to control device 5, each information that 60B comprises.Accordingly, control device 5 generates the job information 60B of job information 60A and second of first surface based on each information and carrying out of input and is stored in the operation setting process of storage part 51.
Next, with reference to Fig. 8, the effect of the exposure plotting system 1 involved by present embodiment is described.In addition, Fig. 8 is the process flow diagram of the flow process of the process representing the operation setting program performed by the control part 50 of control device 5 when have input via input part 53 and performing instruction.This program is pre-stored within the presumptive area of the ROM of storage part 51.
First, in step S101, carry out being used in the operation that the input of the information relevant to the operation that user carries out is assisted and input the control that picture shows at display part 52.As shown in Figure 9, the operation input picture 70 involved by present embodiment has input and represents the first surface image input field 71 of the image recognition information of the image described to first surface and input second image input field 72 of the image recognition information representing the image described to second.Image recognition information is the URL (Uniform Resource Locator) etc. of the filename of the file comprising image information, the storage destination of expression image file.And operation input picture 70 has the substrate type input field 73 of input substrate kind of information, and this substrate type information represents the substrate type being exposed substrate C of the operation be applicable to as input object.And operation input picture 70 has the description sheet number input field 74 that sheet number information is described in input, and this description sheet number information table is shown as the description sheet number being exposed substrate C in the operation of object.And then operation input picture 70 has the end of input button 75 being used to specify and representing and input the information terminated.In addition, when inputting each information to each input field, also can show selection candidate at each input field by list display etc., and selecting any one in shown selection candidate via input part 53.User, utilizing after input part 53 have input the information corresponding with each input field, specifies end of input button 75.
Therefore, in following step S103, by standby to end of input button 75 is designated, thus the standby end of input to the information relevant to operation.
In following step S105, generate job information 60A, 60B based on each information inputted to each input field, and the job information 60A of generation, 60B are stored in storage part 51.Now, control part 50 using the image information of the image represented by the information being input to first surface image input field 71 as image information 61a, using being input to the information of description sheet number input field 74 as description sheet number information, will the information of second image input field 72 be input to as counter-party information 63.Then, control part 50 generates the job information 60A of first surface.And, in job information 60A, according to the information being input to substrate type input field 73, determine substrate size information, label information and photosensitive material kind of information.That is, in the exposure plotting system 1 involved by present embodiment, according to each substrate type being exposed substrate C, substrate size information, label information and photosensitive material kind of information are set up respectively and is stored in storage part 51 accordingly.And, in the exposure plotting system 1 involved by present embodiment, using the substrate size information corresponding with the substrate type represented by the information being input to substrate type input field 73, label information and photosensitive material kind of information as the substrate size information of job information 60A, label information and photosensitive material kind of information.
And, using the image information of the image represented by the information being input to second image input field 72 as image information 61a, to be input to describe sheet number input field 74 information as description sheet number information, the information being input to first surface image input field 71 is generated the job information 60B of second as counter-party information 63.And, in job information 60B, also in the same manner as job information 60A, determine and application substrate dimension information, label information and photosensitive material kind of information.
In following step S107, the job information 60A of the first surface process by above-mentioned steps S105 generated sends to the first exposure plotting device 2 via wireline cable 8a.To this, the job information 60A received is stored in self job storage portion 41 by the first exposure plotting device 2.
In following step S109, the job information 60B of second that the process by above-mentioned steps S105 is generated to after the second exposure plotting device 3 sends, terminates this operation setting program via wireline cable 8a.To this, the job information 60B received is stored in self job storage portion 41 by the second exposure plotting device 3.
Thus, in the exposure plotting system 1 involved by present embodiment, as shown in Figure 10, control device 5 generates the job information 60B of job information 60A and second of first surface based on the information inputted by user.Then, in the job information 60B of job information 60A and second of each self-corresponding first surface, using the operation identifying information that counter-party information 63 is given as the job information to correspondence, thus corresponding respectively job information 60A, 60B are set up correspondence each other.In addition, the respective operation identifying information 61 of job information 60A, 60B and counter-party information 63 are equivalent to the corresponding informance of the corresponding relation of the job information 60B of job information 60A and second representing first surface.
First exposure plotting device 2, when receiving job information 60A from control device 5 and store, operates according to predetermined user, carries out based on the job information 60A stored to the first Job execution process of first surface rendering image being exposed substrate C.
Next, with reference to Figure 11, the effect of the first exposure plotting device 2 when the first Job execution process of execution present embodiment is described.In addition, Figure 11 is the process flow diagram of the flow process of the process representing the first Job execution handling procedure now performed by the systems control division 40 of the first exposure plotting device 2.This program is pre-stored within the presumptive area of the ROM that systems control division 40 possesses.In addition, the moment performing this program is not limited to the moment operated according to predetermined user, also can be the moment receiving job information 60A.
First, in step s 200, the control job information 60A being stored in job storage portion 41 being shown in display device 43 is carried out.Now, when storing multiple job information 60A, systems control division 40 carries out the control shown with tabular form by each job information 60A.Sheet number by representing as the description sheet number information of job information 60A performing object is exposed the upstream side that substrate C is configured in the first transport unit 6 of the first exposure plotting device 2.Further, user via input media 44 to display job information 60A carry out selections specify, thus input represented by the job information 60A specified operation perform instruction.
In following step S201, the standby instruction of the execution to above-mentioned operation is transfused to, in following step S203, obtain image information from the job information 60A corresponding with the operation being instructed to perform (hereinafter referred to as " performing first surface operation ").In addition, in the present embodiment, when obtaining the image information of image of description, obtaining the image information (image information of job information 60A) in the job storage portion 41 being stored in self, but being not limited thereto.That is, also can be store above-mentioned image recognition information at job information 60A in advance, based on this image recognition information, obtain the image information of the image of description from the memory storage of control device 5 or outside.
In following step S205, determine to conditions of exposure when being exposed substrate C rendering image by performing the execution of first surface operation.Now, systems control division 40 decides conditions of exposure based on the substrate size information performed in the job information 60A of first surface operation, description sheet number information, label information and photosensitive material kind of information.In the present embodiment, first, systems control division 40 is photographed to being arranged at the above-mentioned mark being exposed substrate C by photography portion 23, measures the position of this mark according to the image obtained by photographing.And, systems control division 40 based on measurement to the position of mark decide the description region of rendering image.In addition, systems control division 40 makes the anamorphose as rendered object based on the size of description region determined or shape.And then the photosensitive material kind of systems control division 40 represented by above-mentioned photosensitive material kind of information, decides the intensity of light beam, the translational speed (or time shutter of light beam) etc. of platform 10 that expose.
In following step S207, according to the conditions of exposure determined, start be exposed exposure plotting process substrate C carrying out exposing also rendering image to light beam.In the exposure plotting process of present embodiment, the light beam modulated based on the image be out of shape is exposed by photohead 16a by systems control division 40, is depicted in by the image that this has been out of shape thus and is exposed on substrate C.
In following step S209, judge whether predetermined mistake occurs.Now, systems control division 40 the distortion owing to being exposed substrate C or locate bad, light source cell 17, graphics processing unit 19 and exposure portion 16 etc. carry out exposure plotting time the fault etc. at position of use and situation etc. that exposure plotting process is stopped in midway, be judged to there occurs mistake.To step S211 transfer in step S209 for certainly judging, by representing that the error message that there occurs mistake sends to control device 5, terminate this first Job execution handling procedure.To this, the control device 5 receiving error message carries out making error message be shown in the control of display part 52.In addition, error message also can send to the second exposure plotting device 3 by systems control division 40.To this, the second exposure plotting device 3 receiving error message carries out making error message be shown in the control of display device 43, or deducts 1 from the description sheet number of the job information 60B of the operation corresponding to the execution first surface operation made a mistake.
On the other hand, in step S209 for negative judgement, shift to step S213.
In step S213, judge whether the exposure plotting process to 1 is exposed substrate C completes.In step S213 for negative judgement, return above-mentioned steps S209, and when for certainly judging, shift to step S215.
In step S215, will represent that the information performing first surface operation sends to the second exposure plotting device 3.Now, the operation identifying information 61 performed in the job information 60A of first surface operation sends to the second exposure plotting device 3 by systems control division 40.In addition, in the present embodiment, send operation identifying information 61 from the first exposure plotting device 2 to the second exposure plotting device 3, but be not limited thereto.That is, as long as the information of transmission makes the second exposure plotting device 3 can determine to perform the information of first surface operation, therefore also can be such as job information 60A itself.
In following step S217, whether whole process that the operation of Predicated execution first surface comprises completes.Now, systems control division 40, when the exposure plotting process being exposed substrate C of the description sheet number represented by the description sheet number information for conditions of exposure information 62 completes, is judged to be that performing first surface operation completes.
In step S217 for negative judgement.Return above-mentioned steps S209, and when for certainly judging, terminate this first Job execution handling procedure.
The second exposure plotting device 3 involved by present embodiment is when receiving from the first exposure plotting device 2 the operation identifying information performing first surface operation, based on this operation identifying information and the job information 60B that receives from control device 5, carry out the second Job execution process to second rendering image being exposed substrate C.
Next, with reference to Figure 12, the effect of the second exposure plotting device 3 when the second Job execution process of execution involved by present embodiment be described.In addition, Figure 12 is the process flow diagram of the flow process of the process representing the second Job execution handling procedure now performed by the systems control division 40 of the second exposure plotting device 3.This program is pre-stored within the presumptive area of the ROM that systems control division 40 possesses.In addition, the moment performing this program is not limited to the moment receiving operation identifying information, also can be to have input the predetermined moment etc. performing instruction by user via input media 44.
First, in step S301, judge whether the job information 60B of the operation (hereinafter referred to as " performing second operation ") of expression second exists, and this operation of second is corresponding with the operation that the operation identifying information by the execution first surface operation received represents.Now, whether the job information 60B that as counter-party information 63 comprise the operation identifying information 61 that perform first surface operation of systems control division 40 determining storage in the job information 60B in job storage portion 41 exists.
In step S301 for certainly judging, shift to step S303.On the other hand, in step S301 for negative judgement, to step S311 transfer described later, the non-existent error message of operation represented as performing object being sent to control device 5, terminating originally first Job execution handling procedure.
In step S303, obtain in the job information 60B of execution second operation to the image information of image being exposed substrate C and describing.Now, systems control division 40 obtains the image information of the image represented as image information 61a in the job information 60B of execution second operation.In addition, in the present embodiment, in storage part 51 store image information of control device 5, the second exposure plotting device 3 obtains image information from control device 5, but being not limited thereto, also can be the storing mechanism store image information had at the second exposure plotting device 3.
In following step S305, namely performing in second operation as performing the operation of object, setting to conditions of exposure when being exposed substrate C rendering image.Now, systems control division 40 sets conditions of exposure based on the substrate size information in the job information 60B of execution second operation, description sheet number information, label information and photosensitive material kind of information.
As an example, as shown in Figure 10, in the first exposure plotting device 2, store the two-sided operation A of first surface, job information 60A, the 60B etc. of two-sided operation B that represent in the two-sided operation describing the image corresponding with first surface and second these both sides.And, in the second exposure plotting device 3, store the job information 60B of the two-sided operation A of second representing corresponding with the two-sided operation A of first surface, represent the job information 60B of the two-sided operation B of second corresponding with the two-sided operation B of first surface.When performing the two-sided operation B of first surface in this condition in the first exposure plotting device 2, in the second exposure plotting device 3, using the two-sided operation B of second corresponding with the two-sided operation B of first surface as performing object.
In following step S307, according to the conditions of exposure of setting, start beam exposure and the exposure plotting process of rendering image being exposed substrate C.
In following step S309, judge whether there occurs mistake in execution second operation.Now, the situation that systems control division 40 makes exposure plotting process stop in midway in the distortion owing to being exposed substrate C or the fault etc. of locating the position used when bad, light source cell 17, graphics processing unit 19 and exposure portion 16 etc. carry out exposure plotting is inferior, is judged to there occurs mistake.In step S309 for certainly judging, to step S311 transfer, the error message that there occurs mistake being sent to control device 5, terminate this second Job execution handling procedure in the operation represented in commission.On the other hand, in step S309 for negative judgement, shift to step S313.
In step S313, judge whether the exposure plotting process to being exposed substrate C completes.In step S313 for negative judgement, returning above-mentioned steps S309, when for certainly judging, shifting to step S315.
In following step S315, whether Predicated execution second operation completes.Now, systems control division 40, when the exposure plotting process being exposed substrate C of the description sheet number represented by the description sheet number information for conditions of exposure information 62 completes, is judged to be that execution second operation completes.In step S314 for negative judgement, shift to step S317.
In step S317, standby to receive for carry out in execution second operation the operation identifying information 61 of the description of the image of substrate C is exposed to next.
In following step S319, judge that whether the operation identifying information 61 received is identical with the operation identifying information 61 performing second operation.
In step S319 for certainly judging, shift to above-mentioned steps S309.On the other hand, in step S319 for negative judgement, to step S311 transfer, by representing that the error message receiving the operation identifying information 61 different from the operation identifying information 61 performing second operation sends to control device 5, terminate this first Job execution handling procedure.
On the other hand, in step S315 for certainly judging, terminate this first Job execution handling procedure.
In addition, in the present embodiment, in the step S215 of the first Job execution handling procedure, the first exposure plotting device 2 sends the operation identifying information 61 performing first surface operation to the second exposure plotting device 3, but is not limited thereto.That is, in this step S215, also can be the first exposure plotting device 2 sends counter-party information 63 from the job information 60A performing first surface operation to the second exposure plotting device 3.In this case, in the step S301 of the second Job execution handling procedure, using have the counter-party information 63 that receives as operation identifying information 61 job information 60B represented by operation be set to execution second operation.
[the second embodiment]
Below, accompanying drawing is utilized to explain the exposure plotting system 1 involved by the second embodiment.
In the above-described first embodiment, send to the second exposure plotting device 3 information representing and perform first surface operation from the first exposure plotting device 2, in the second exposure plotting device 3, select corresponding operation and perform.On the other hand, in this second embodiment, send the information representing and perform first surface operation from the first exposure plotting device 2 to control device 5, in control device 5, select corresponding operation, and the operation of selection is sent to the second exposure plotting device 3.
In addition, the structure of the exposure plotting system 1 involved by the second embodiment is identical with the exposure plotting system 1 involved by the first embodiment, therefore in this description will be omitted.
Next, with reference to Figure 13, the effect of the exposure plotting system 1 involved by present embodiment is described.In addition, Figure 13 is the process flow diagram of the flow process of the process representing the operation setting program performed by the control part 50 of the control device 5 of exposure plotting system 1 when have input via input part 53 and performing instruction.This program is pre-stored within the presumptive area of the ROM of storage part 51.
First, in step S401 to S405, carry out the process same with step S 101 to the S105 of the first embodiment.
In following step S407, the job information 60A of the first surface of generation is sent to the first exposure plotting device 2 via wireline cable 8a, terminates this operation setting program.The job information 60A of the first surface received is stored in job storage portion 41 by the first exposure plotting device 2.
First exposure plotting device 2, when storage operation information 60A, carries out the first Job execution process to the first surface rendering image being exposed substrate C based on job information 60A.
Next, with reference to Figure 14, the effect of the first exposure plotting device 2 when the first Job execution process of execution involved by present embodiment be described.In addition, Figure 14 is the process flow diagram of the flow process of the process representing the first Job execution handling procedure now performed by the systems control division 40 of the first exposure plotting device 2.This program is pre-stored within the presumptive area of the ROM that systems control division 40 possesses.In addition, the moment performing this program is not limited to receive job information 60A and the moment stored, and also can be have input the predetermined moment etc. performing instruction by user via input media 44.
In step S500 to S513, carry out the process same with the step S201 to S213 of the first embodiment.
In step S515, the operation identifying information of active job is sent to control device 5.Now, the operation identifying information 61 performed in the job information 60A of first surface operation sends to control device 5 by systems control division 40.
In step S517, carry out the process same with the step S217 of the first embodiment, terminate this first Job execution handling procedure.
Control device 5 involved by present embodiment, when receiving operation identifying information 61 from the first exposure plotting device 2, carries out selecting the operation of the operation of second corresponding with performing first surface operation to select to process with the job information 60B being stored in storage part 51 based on this operation identifying information 61.
Next, with reference to Figure 15, illustrate that the effect of the control device 5 when processing is selected in the operation performed involved by present embodiment.In addition, Figure 15 represents that the process flow diagram of the flow process of the process of handling procedure is selected in the operation now performed by the control part 50 of control device 5.This program is pre-stored within the presumptive area of the ROM of storage part 51.In addition, the moment performing this program is not limited to the moment receiving the operation identifying information 61 performing first surface operation, also can be to have input the predetermined moment etc. performing instruction by user via input part 53.
First, in step s 601, in the job information 60B of second being stored in storage part 51, the job information 60B of second corresponding with the job information 60A of the first surface of the operation identifying information with the execution first surface operation received is retrieved.Now, control part 50 retrieves the operation identifying information 61 that comprises and perform first surface operation as the job information 60B of counter-party information 63 from the job information 60B being stored in storage part 51.
In following step S603, the result of above-mentioned retrieval judges whether the job information 60B of second corresponding with the job information 60A of the first surface of the operation identifying information with the execution first surface operation received exists.
In step S603 for certainly judging, shift to step S605.On the other hand, in step S603 for negative judgement, to step S607 transfer, carry out representing that the corresponding non-existent error message of job information 60B of second is shown in the control of display part 52.
In step s 605, the job information 60B result as above-mentioned retrieval obtained sends to the second exposure plotting device 3 via wireline cable 8a.To this, the job information 60B of receive second is stored in job storage portion 41 by the second exposure plotting device 3.In addition, in the process of step S605, when the job information the 60B result as above-mentioned retrieval obtained is sent to second exposure plotting device 3, also only can send the operation identifying information 61 of this job information 60B.In this case, when the second exposure plotting device 3 performs the step S701 of the second Job execution handling procedure described later, obtain the image information of the image comprised as image information 61a in job information 60B, wherein this job information 60B comprises the operation identifying information 61 that receives as operation identifying information 661.
The second exposure plotting device 3 involved by present embodiment, when receiving the job information 60B of above-mentioned second from control device 5, based on the job information 60B received, carries out the second Job execution process to second rendering image being exposed substrate C.
Next, with reference to Figure 16, the effect of the second exposure plotting device 3 when the second Job execution process of execution involved by present embodiment be described.In addition, Figure 16 is the process flow diagram of the flow process of the process representing the second Job execution handling procedure now performed by the systems control division 40 of the second exposure plotting device 3.This program is pre-stored within the presumptive area of the ROM that systems control division 40 possesses.In addition, the moment performing this program is not limited to receive moment of the operation identifying information of the operation performing object, also can be have input the predetermined moment etc. performing instruction by user via input media 44.
First, in step s 701, the image information of the image comprised as image information 61a in the job information 60B received is obtained.
In following step S703 to S717, carry out the process same with the step S305 to S319 of the first embodiment.
[the 3rd embodiment]
Below, accompanying drawing is utilized to explain the 3rd exposure plotting system 1 involved by embodiment.
In above-mentioned first embodiment and the second embodiment, use the image representing that job information 60A, the 60B of two-sided operation correspond to each other to the first surface and second description that are exposed substrate C.On the other hand, in the third embodiment, even if when the one side operation and above-mentioned two-sided operation that represent the operation of either party in first surface and second mix, also to the image that the first surface and second description that are exposed substrate C correspond to each other.
In the same manner as the first embodiment, control device 5 by make the first exposure plotting device 2 to be exposed substrate C first surface rendering image job information 60A and make the second exposure plotting device 3 be stored in storage part 51 to the job information 60B of second rendering image being exposed substrate C.
As shown in Figure 17 A and Figure 17 B, operation identifying information 61, conditions of exposure information 62, counter-party information 63 are set up corresponding information according to each operation by job information 60A, 60B respectively.Wherein, when the operation as setting object is above-mentioned one side operation, counter-party information 63 becomes sky hurdle.In the example shown in Figure 17 A and Figure 17 B, the operation of operation identifying information C000001 and C000002 is one side operation respectively, and the counter-party information 63 of the operation of operation identifying information C000001 and C000002 becomes sky hurdle.
Operator, when wanting to make the first exposure plotting device 2 and the second exposure plotting device 3 perform operation, inputs job information 60A via input part 53 to control device 5, each information that 60B comprises.
Control device 5 using each information of input as first surface job information 60A, second job information 60B and be stored in storage part 51, thus carry out setting the operation setting process of operation.
Next, with reference to Figure 18, the effect of the exposure plotting system 1 involved by present embodiment is described.In addition, Figure 18 is the process flow diagram of the flow process of the process representing the operation setting program performed by the control part 50 of the control device 5 of exposure plotting system 1 when have input via input part 53 and performing instruction.This program is pre-stored within the presumptive area of the ROM of storage part 51.
First, in step S801 to S803, carry out the process same with the step S101 to S103 of the first embodiment.
In step S805, at least one party generated in job information 60A, 60B as each information inputted to each input field, and at least one party in the job information 60A of generation, 60B is stored in storage part 51.Now, when have input information to first surface image input field 71 and second these both sides of image input field 72, the operation of setting object is set to two-sided operation, generates the job information 60B of job information 60A and second of first surface and store in the same manner as the step S105 of the first embodiment.And, when only inputting information to the first surface image input field 71 in first surface image input field 71 and second image input field 72, the operation of setting object being set to one side operation, only generating the job information 60A of first surface and store.And then, when only inputting information to second image input field 72 in first surface image input field 71 and second image input field 72, the operation of setting object being set to one side operation, only generating the job information 60B of second and store.
In following step S807, judge that the operation setting object is whether as two-sided operation.In step S807 for certainly judging, to step S809 transfer, and when judging for negative, the operation being estimated as setting object is one side operation, to step S813 transfer described later.
In step S809 and S811, carry out the process same with the step S107 of the first embodiment and S109, terminate this operation setting program.
In step S813, judge that the operation setting object is whether as the one side operation of first surface.In step S813 for certainly judging, to step S815 transfer, carrying out the process same with the step S107 of the first embodiment, terminating this operation setting program.
On the other hand, in step S813 for negative judgement, to step S817 transfer, carry out the process same with the step S109 of the first embodiment, terminate this operation setting program.
As shown in figure 19, the job information 60A of first surface is sent to the first exposure plotting device 2, and be stored in the job storage portion 41 of the first exposure plotting device 2.Similarly, the job information 60B of second is sent to the second exposure plotting device 3, and be stored in the job storage portion 41 of the second exposure plotting device 3.Now, the state mixed with one side operation and two-sided operation stores.
First exposure plotting device 2, when storage operation information 60A, carries out the first Job execution process to the first surface rendering image being exposed substrate C based on job information 60A.
Originally the first exposure plotting device 2 involved by the 3rd embodiment carries out the first Job execution process same with the first embodiment.
Second exposure plotting device 3 is when receiving the operation identifying information 61 sent by the first Job execution process, based on this operation identifying information 61 and the job information 60B that receives from control device 5, carry out the second Job execution process to second rendering image being exposed substrate C.
Next, with reference to Figure 20, the effect of the second exposure plotting device 3 when the second Job execution process of execution involved by present embodiment be described.In addition, Figure 20 is the process flow diagram of the flow process of the process representing the second Job execution handling procedure now performed by the systems control division 40 of the second exposure plotting device 3.This program is pre-stored within the presumptive area of the ROM that systems control division 40 possesses.In addition, the moment performing this program is not limited to receive moment of the operation identifying information of the operation performing object, also can be receive this operation identifying information and have input the predetermined moment etc. performing instruction by user via input media 44.
First, in step S301 to S319, carry out the process same with the step S301 to S319 of the first embodiment.
Wherein, in this 3rd embodiment, in step S301 for negative judgement, shift to step S901.
In step S901, there is not the still operation corresponding with one side operation in the operation corresponding with two-sided operation and deposit in case, carrying out selecting picture to be shown in the control of display device 43 by being used for the operation of auxiliary user to the selection of the operation of execution object.
As shown in figure 21, operation is selected picture 76 to have and is selected the select button 77 of any one be stored in the one side operation in job storage portion 41 and the not select button 78 not selecting any one one side operation.User uses input media 44 to select certain select button 77 or not select button 78.
In following step S903, determine whether to have selected certain operation.Now, systems control division 40, when certain select button 77 is selected, is judged to have selected certain operation, when select button 78 is not selected, is judged to be that arbitrary operation is not all selected.
In step S903 for certainly judging, to above-mentioned steps S303 transfer, the job information 60B based on selected operation decides the image as rendered object, obtains the image information of this image.On the other hand, for shifting to above-mentioned steps S311 negative judges in step S903, by representing that the corresponding non-existent error message of operation sends to control device 5, terminate this second Job execution handling procedure.
Label declaration
1 exposure plotting system
2 first exposure plotting devices
3 second exposure plotting devices
4 turning devices
5 control device
10
16a photohead
40 systems control divisions
41 job storage portions
50 control parts
51 storage parts
60A first job information
60B second job information
C is exposed substrate

Claims (13)

1. an exposure plotting device, comprising:
First describes component, by being exposed the first surface exposure of substrate to described first surface rendering image;
Means of storage, store the first job information, second job information and corresponding informance, described first job information will represent the image information of the image described to the described described first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, described corresponding informance represents the corresponding relation of described first job information and described second job information, and
Second describes component, to utilize described first describe component under the conditions of exposure represented by described first job information, the exposure of described first surface is depicted to described first surface the image represented by described first job information be exposed described second rendering image of substrate when, based on described corresponding informance, with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information, by described second exposure, thus by the image that represented by this second job information to described second description.
2. exposure plotting device according to claim 1, wherein,
Described means of storage comprises the first storage area storing described first job information and the second storage area storing described second job information, and described corresponding informance is stored in either party in described first storage area and described second storage area.
3. an exposure plotting system, has the first exposure plotting device and the second exposure plotting device,
Described first exposure plotting device comprises:
First means of storage, stores the first job information, and this first job information will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence;
First describes component, is exposed by described first surface, described by the image represented thus by this first job information to described first surface under the conditions of exposure represented by described first job information; And
Send component, send the information represented describing described first job information used when component depicts image to described first surface by described first,
Described second exposure plotting device comprises:
Second means of storage, store the second job information and corresponding informance, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, and described corresponding informance represents the corresponding relation of described first job information and described second job information;
Receiving member, receives the information of described first job information of expression sent by described transmission component;
Determine component, establish corresponding described second job information based in described corresponding informance with described first job information represented by the information of described first job information of the expression received by described receiving member, decide the image and conditions of exposure described to described second; And
Second describes component, by described second exposure under the conditions of exposure determined by described decision component, thus by the image by described decision component decision to described second description.
4. exposure plotting system according to claim 3, wherein,
Described corresponding informance is that the identifying information being used for identifying described first job information and the identifying information that is used for described second job information identified corresponding to this first job information are established corresponding information,
Represent that the information of described first job information is the described identifying information of described first job information.
5. the exposure plotting system according to claim 3 or 4, wherein,
The described transmission component of described first exposure plotting device, only when the description undertaken by described first description component normally terminates, sends the information representing described first job information.
6. the exposure plotting system according to any one in claim 3 ~ 5, wherein,
The described transmission component of described first exposure plotting device, when the description undertaken by described first description component terminates singularly, sends the error message representing and there occurs mistake.
7. the exposure plotting system according to any one in claim 3 ~ 6, wherein,
Described exposure plotting system also possesses control device,
This control device comprises: the 3rd means of storage, stores described first job information, described second job information and described corresponding informance; And
Second sends component, described first job information stored is sent to described first exposure plotting device by described 3rd means of storage, described second job information and described corresponding informance is sent to described second exposure plotting device,
Described first exposure plotting device also possesses the second receiving member receiving and send described first job information that component sends by described second,
Described first of described first exposure plotting device is described component and is used described first job information received by described second receiving member to come to described first surface rendering image,
Described second exposure plotting device also possesses the 3rd receiving member receiving described second job information and the described corresponding informance sent by described second transmission component,
Described second of described second exposure plotting device determines that component uses described second job information that received by described 3rd receiving member and described corresponding informance to decide image to described second description and conditions of exposure.
8. exposure plotting system according to claim 7, wherein,
What described control device also possessed the input accepting described first job information, the second job information and described corresponding informance accepts component,
Described 3rd means of storage of described control device stores by described described first job information, the second job information and the described corresponding informance that accept component and accept.
9. an exposure plotting system, has the first exposure plotting device and the second exposure plotting device,
Described first exposure plotting device comprises:
First means of storage, store and will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes the first corresponding job information, and store the corresponding informance of the corresponding relation representing described first job information and the second job information, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding;
First describes component, is exposed by described first surface, described by the image represented thus by this first job information to described first surface under the conditions of exposure represented by described first job information; And
Send component, be sent in described corresponding informance with describe by described first described first job information that component uses when described first surface depicts image and establish corresponding described second job information,
Described second exposure plotting device comprises:
Receiving member, receives described second job information sent by described transmission component; And
Second describe component, by described second exposure under the conditions of exposure represented by described second job information received by described receiving member, thus by the image represented by this second job information to described second description.
10. an exposure plotting system, has the first exposure plotting device, control device and the second exposure plotting device,
Described first exposure plotting device comprises:
4th means of storage, stores the first job information, and this first job information will represent the image information of the image described to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence;
First describes component, is exposed by described first surface, described by the image represented thus by this first job information to described first surface under the conditions of exposure represented by described first job information; And
3rd sends component, sends the information representing the first job information that the description undertaken by described first description component uses,
Described control device comprises:
5th means of storage, store described first job information, the second job information and represent the corresponding informance of corresponding relation of described first job information and described second job information, described second job information by represent to the described image information being exposed second image described contrary with described first surface of substrate with represent that the conditions of exposure information of conditions of exposure establishes corresponding;
4th receiving member, receives the information sending described first job information of expression that component sends by the described 3rd; And
4th sends component, is sent in described corresponding informance and establishes corresponding described second job information with described first job information represented by the information of described first job information of expression received by described 4th receiving member,
Described second exposure plotting device comprises:
5th receiving member, receives the information representing and send described second job information that component sends by the described 4th; And
Second describes component, by described second exposure under the conditions of exposure represented by the information of described second job information of expression received by described 5th receiving member, thus by the image that represented by this second job information to described second description.
11. exposure plotting systems according to any one in claim 2 ~ 8, wherein,
Be exposed described in described conditions of exposure comprises the size of substrate, described in be exposed substrate the sheet number as exposure object, described be exposed substrate in order to determine image description region and arrange this mark in markd situation configuration pattern and described in be exposed in the photosensitive material kind of substrate at least one.
12. 1 kinds of programs, describe component and second for making computing machine as first and describe component performance function,
Described first describes component under the conditions of exposure establishing represented by the first corresponding job information by the conditions of exposure information of the image information and expression conditions of exposure that represent the image described to the described first surface being exposed substrate, described first surface is exposed, the image represented by described first job information is described thus to described first surface
Described second describe component to depict to described first surface by described first surface being exposed under the conditions of exposure represented by described first job information the image represented by described first job information be exposed described second rendering image of substrate when, described second is exposed with in the corresponding informance of the corresponding relation of the second job information with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information in described first job information of expression, thus by the image that represented by this second job information to described second description, described second job information establishes corresponding to the described image information being exposed second image described contrary with described first surface of substrate with the conditions of exposure information of expression conditions of exposure by representing.
13. 1 kinds of exposure plotting methods, comprise the steps:
Storing step, store the first job information, second job information and corresponding informance, described first job information will represent the image information of the image utilizing the first description component to describe to the first surface being exposed substrate and represent that the conditions of exposure information of conditions of exposure establishes correspondence, described first describes component by being exposed by described first surface to described first surface rendering image, described second job information is exposed the image information of second image described contrary with described first surface of substrate by representing to described and represents that the conditions of exposure information of conditions of exposure establishes corresponding, described corresponding informance represents the corresponding relation of described first job information and described second job information, and
Second describes step, to utilize described first describe component under the conditions of exposure represented by described first job information, the exposure of described first surface is depicted to described first surface the image represented by described first job information be exposed described second rendering image of substrate when, based on described corresponding informance, with under the conditions of exposure established to the first job information used during described first surface rendering image represented by corresponding described second job information, by described second exposure, thus by the image that represented by this second job information to described second description.
CN201380049191.4A 2012-09-27 2013-08-23 exposure plotting device, exposure plotting system, program and exposure plotting method Active CN104641299B (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1690863A (en) * 2004-04-23 2005-11-02 Asml荷兰有限公司 Device manufacturing method
CN101283312A (en) * 2005-10-07 2008-10-08 富士胶片株式会社 Digital exposure apparatus
JP2008292915A (en) * 2007-05-28 2008-12-04 Orc Mfg Co Ltd Exposure drawing device
JP2009223262A (en) * 2008-03-19 2009-10-01 Orc Mfg Co Ltd Exposure system and exposure method
WO2013145987A1 (en) * 2012-03-30 2013-10-03 富士フイルム株式会社 Exposure drawing device, recording medium in which program is recorded, and exposure drawing method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11307424A (en) * 1998-04-22 1999-11-05 Hitachi Ltd Method and device for manufacturing semiconductor and semiconductor device manufactured by the device
JP2001284231A (en) * 2000-03-31 2001-10-12 Canon Inc Exposure system and method of distributing error for processing on its pattern on occurrence of error
JP2002341550A (en) 2001-05-17 2002-11-27 Dainippon Screen Mfg Co Ltd Laser exposure device
JP4381009B2 (en) * 2003-03-12 2009-12-09 新光電気工業株式会社 Pattern drawing apparatus, pattern drawing method, and inspection apparatus
JP2005014012A (en) * 2003-06-24 2005-01-20 Pentax Corp Drawing aparatus and drawing method
JP2010181519A (en) * 2009-02-04 2010-08-19 Adtec Engineeng Co Ltd Exposure device
JP5961429B2 (en) * 2012-03-30 2016-08-02 株式会社アドテックエンジニアリング Exposure drawing apparatus and exposure drawing method
JP6198378B2 (en) * 2012-09-27 2017-09-20 株式会社アドテックエンジニアリング Exposure drawing apparatus, exposure drawing system, program, and exposure drawing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1690863A (en) * 2004-04-23 2005-11-02 Asml荷兰有限公司 Device manufacturing method
CN101283312A (en) * 2005-10-07 2008-10-08 富士胶片株式会社 Digital exposure apparatus
JP2008292915A (en) * 2007-05-28 2008-12-04 Orc Mfg Co Ltd Exposure drawing device
JP2009223262A (en) * 2008-03-19 2009-10-01 Orc Mfg Co Ltd Exposure system and exposure method
WO2013145987A1 (en) * 2012-03-30 2013-10-03 富士フイルム株式会社 Exposure drawing device, recording medium in which program is recorded, and exposure drawing method

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TWI603160B (en) 2017-10-21

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