CN104487897B - 液浸构件及曝光装置 - Google Patents

液浸构件及曝光装置 Download PDF

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Publication number
CN104487897B
CN104487897B CN201380038451.8A CN201380038451A CN104487897B CN 104487897 B CN104487897 B CN 104487897B CN 201380038451 A CN201380038451 A CN 201380038451A CN 104487897 B CN104487897 B CN 104487897B
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CN
China
Prior art keywords
liquid
component
substrate
liquid immersion
immersion member
Prior art date
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Application number
CN201380038451.8A
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English (en)
Chinese (zh)
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CN104487897A (zh
Inventor
佐藤真路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
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Nikon Corp
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Publication date
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Priority to CN201710675381.7A priority Critical patent/CN107422612B/zh
Publication of CN104487897A publication Critical patent/CN104487897A/zh
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Publication of CN104487897B publication Critical patent/CN104487897B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201380038451.8A 2012-07-20 2013-07-16 液浸构件及曝光装置 Active CN104487897B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710675381.7A CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261674078P 2012-07-20 2012-07-20
US61/674,078 2012-07-20
US201361790328P 2013-03-15 2013-03-15
US61/790,328 2013-03-15
PCT/JP2013/069959 WO2014014123A1 (en) 2012-07-20 2013-07-16 Liquid immersion member and exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201710675381.7A Division CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Publications (2)

Publication Number Publication Date
CN104487897A CN104487897A (zh) 2015-04-01
CN104487897B true CN104487897B (zh) 2017-08-29

Family

ID=48951526

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201380038451.8A Active CN104487897B (zh) 2012-07-20 2013-07-16 液浸构件及曝光装置
CN201710675381.7A Active CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201710675381.7A Active CN107422612B (zh) 2012-07-20 2013-07-16 液浸构件、曝光装置、液浸曝光装置、液浸曝光方法及元件制造方法

Country Status (8)

Country Link
US (3) US9823580B2 (enExample)
EP (1) EP2875405B1 (enExample)
JP (1) JP6406250B2 (enExample)
KR (1) KR102139033B1 (enExample)
CN (2) CN104487897B (enExample)
HK (1) HK1208914A1 (enExample)
TW (3) TWI617894B (enExample)
WO (1) WO2014014123A1 (enExample)

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US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
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US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
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US11156921B2 (en) 2017-12-15 2021-10-26 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
CN112286012A (zh) * 2020-10-29 2021-01-29 浙江启尔机电技术有限公司 一种浸液回收系统及采用该系统的浸液回收方法

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US8004651B2 (en) * 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
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US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8068209B2 (en) * 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
JP2009099939A (ja) * 2007-09-25 2009-05-07 Dainippon Screen Mfg Co Ltd アライメントマーク形成装置
US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) * 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US20100328637A1 (en) 2008-12-04 2010-12-30 Nikon Corporation Exposure apparatus, exposing method and device fabricating method
JP2010135794A (ja) 2008-12-04 2010-06-17 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
CN102714141B (zh) * 2010-01-08 2016-03-23 株式会社尼康 液浸构件、曝光装置、曝光方法及元件制造方法
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
US20150124230A1 (en) 2015-05-07
TWI661277B (zh) 2019-06-01
TW201925928A (zh) 2019-07-01
HK1206435A1 (en) 2016-01-08
JP6406250B2 (ja) 2018-10-17
CN107422612A (zh) 2017-12-01
CN104487897A (zh) 2015-04-01
EP2875405B1 (en) 2020-02-26
US9823580B2 (en) 2017-11-21
CN107422612B (zh) 2020-05-26
TWI617894B (zh) 2018-03-11
US10007189B2 (en) 2018-06-26
US20180314166A1 (en) 2018-11-01
HK1208914A1 (en) 2016-03-18
KR20150038075A (ko) 2015-04-08
TW201405256A (zh) 2014-02-01
TWI700557B (zh) 2020-08-01
EP2875405A1 (en) 2015-05-27
US20140022522A1 (en) 2014-01-23
KR102139033B1 (ko) 2020-08-11
TW201809910A (zh) 2018-03-16
US10739683B2 (en) 2020-08-11
WO2014014123A1 (en) 2014-01-23
JP2015528132A (ja) 2015-09-24

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