CN104422395B - Method for calibrating small-aperture diaphragm - Google Patents
Method for calibrating small-aperture diaphragm Download PDFInfo
- Publication number
- CN104422395B CN104422395B CN201310413279.1A CN201310413279A CN104422395B CN 104422395 B CN104422395 B CN 104422395B CN 201310413279 A CN201310413279 A CN 201310413279A CN 104422395 B CN104422395 B CN 104422395B
- Authority
- CN
- China
- Prior art keywords
- aperture
- light path
- laser
- main scale
- interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention provides a method for measuring the lighting diameter of a small-aperture diaphragm and the rotating angle of a driving lever. According to the method, a mach-zehnder interference system and a dual-optical wedge movement micrometer system are used for measuring the dimension of an image of the small-aperture diaphragm, so that the non-contact measurement on the diameter of the small-aperture diaphragm can be realized. The probability of man-made misreading can be reduced at an observation screen by adopting reticle design.
Description
Art
The present invention relates to a kind of optical meanss of aperture calibration, fixed aperture can be carried out with diameter measurement and to can
Iriss are adjusted to carry out the calibration of effective diameter.
Background technology
At present, the aperture used in optical laboratory in the optical path mostly be aperture diaphragm effect, that is, right
Light beam carries out aperture or angle limits.However, in specific experiment, for the restriction effect of aperture（I.e. aperture
Actual diameter）Lack accurate measurement.For fixed aperture, when high to aperture actual diameter precision prescribed, still
The nominal size that there is provided using manufacturer as full-size(d), but for iriss, especially continuously adjustabe changeable type
Diaphragm, the diameter of aperture just has no way of knowing.
Content of the invention
In order to solve the problems, such as aperture diameter measurement, the present invention provides a kind of measuring method, and the method not only can be real
The now diameter measurement to fixed aperture, and adjustable iriss can be calibrated, that is, to steel blade indent and diaphragm
Outer ring（Or driving lever）Interaction relation between the anglec of rotation carries out numerical measuring.
The technical solution adopted for the present invention to solve the technical problems is：When the diameter to fixed aperture measures,
Aperture to be measured is placed on the output light path of laser parallel light pipe, by the measurement to round spot on film viewing screen, you can know and treat
Survey the diameter of aperture.
When measuring to adjustable iriss actual effective diameter, aperture to be measured is placed in Mach-once special interference is
In any one arm united in four arms, between interference system output and film viewing screen, setting a pair of wedge moves micrometer system.When treating
When surveying the change of aperture actual diameter, be adjusted by micrometer system mobile to double wedges so that at film viewing screen gained
Interference pattern all return to state when aperture diameter to be measured does not change, root from fringe spacing or striped number
According to the micrometer relation of the mobile micrometer system of double wedges, aperture diameter knots modification to be measured just can be obtained, thus understanding aperture to be measured
Diaphragm actual diameter.
The invention has the beneficial effects as follows：No corresponding measurer, operation on Mechanical measurement is not only avoided to have high demands, diaphragm is deposited
The problems such as abrasion, and certainty of measurement is high, artificial subjectivity can introduce that error component is few, whole inventive principle is easily understood.
Brief description
The present invention is further described with reference to the accompanying drawings and examples.
Fig. 1 is the light path principle figure that fixed aperture is carried out with diameter measurement.
Fig. 2 is the diaphragm schematic diagram that adjustable iriss actual effective diameter is measured.
Fig. 3 is to move micrometer system structure principle chart for wedges double in Fig. 2.
Fig. 4 is vernier caliper type calibration apertured plate.
In Fig. 1:(1) laser instrument, (2) collimating and beam expanding system, (3) small filter, (4) aperture, (5) film viewing screen.
In Fig. 2:(1) laser instrument, (2) beam splitter, (3) total reflective mirror, (4) aperture, (5) light combination mirror, (6) double wedge move
Dynamic micrometer system, (7) film viewing screen.
In Fig. 4:(1) driving lever, (2) main ruler disk（Fixing）, (3) vernier cursor disk（Rotatably）.
Specific embodiment
In FIG, film viewing screen (5) is the graticle of mensurable pattern size.When laser instrument (1) is through collimating and beam expanding system
(2) after, the parallel circle beam sizes of output should be slightly greater than fixing aperture (4) diameter, then by imaging in sight
The circular light spot examining screen (5) measures, you can know fixing aperture (4) diameter.
In fig. 2, the special interference system of Mach-once has been collectively constituted by beam splitter (2), total reflective mirror (3) and light combination mirror (5).
Using laser instrument (1) as the input light source of interference system, the arbitrary neighborhood two-arm of interference system is placed one respectively to be measured
Same specification aperture (4), and the actual diameter requirement of two diaphragms (4) is consistent, that is, require two diaphragms (4) driving lever should be allocated to identical
Position.The mobile micrometer system (6) of double wedges and film viewing screen (7) are sequentially placed on interference system output light path.In film viewing screen (7)
On should have obvious interference pattern, by the graticle scale of film viewing screen (7), record interference pattern striped number and interval.Will
Driving lever is allocated at reference graduation（Choose at the scale of arbitrary known diaphragm diameter, generally acquiescence chooses diaphragm maximum gauge
Scale at）, adjust double wedges and move micrometer system, until observing the interferogram with first record on the viewing screen again
Till batten stricture of vagina number is the same with interval.Now, record the diameter knots modification measured by the mobile micrometer system of double wedges, according to
Datum diameter value diaphragm actual diameter.
In figure 3, the mobile micrometer system of double wedges is made up of by centrosymmetry mode two identical wedges.Foundation should
System micrometer formula：Δ y=Δ z δ understands, vertical axial small by obtaining to the big displacement Δ z measurement along optical axis direction
Displacement y, that is, by being converted into the change to vertical direction of principal axis stop imagery diameter to double wedges along optical axis direction movement.
In the diagram, apertured plate adopts the measurement thinking of slide gauge.Main ruler disk (2) is fixing, and vernier cursor disk (3) is
Rotatably.When to diaphragm driving lever rotation angle measurement, first determine driving lever position, that is, driving lever is in which two scale of main ruler disk
Line L1、L2Between, it is rotated further by vernier cursor disk and make vernier cursor disk zero graduation line and main ruler disk L1Alignment, now, searches out vernier cursor
The graduation mark aliging with graduation mark a certain in main ruler disk on disk.According to the measure equation of slide gauge, just understand the driving lever anglec of rotation
Degree.
Claims (2)
1. a kind of measuring system aperture calibrated using optical meanss is it is characterised in that interfered by Mach-once is special
System and double wedge move the optical measuring system that micrometer system collectively constitutes, including laser instrument (1), aperture to be measured
And constitute beam splitter (2), total reflective mirror (3), light combination mirror (5) and double wedge of the special interference system of Mach-once and move micrometer system (4)
System (6) and film viewing screen (7), the mobile micrometer system (6) of described double wedges presses centrosymmetry side by two identical wedges
Formula places composition, and that is, two wedge optical axises are located on same light path axis, but the corner position of wedge is perpendicular to optical axis direction
On the contrary, one is placed on the upside of light path, and another is placed on the downside of light path, and the position relationship of above-mentioned component is as follows：Start in measurement
Before make laser instrument (1) and beam splitter (2), total reflective mirror (3), aperture to be measured (4), light combination mirror (5), double wedge move micrometer system
System (6) and the optical axis alignment of film viewing screen (7), described laser instrument (1) outfan towards to beam splitter (2) so that by laser
The laser that device (1) exports can form two bundles via beam splitter (2) and be concerned with and the vertical laser of light path, two total reflective mirrors (3) point
It is not placed in this two bundles coherent laser light path, when the relevant laser of two bundles is intersected in light combination mirror (5) via total reflective mirror (3), closing
The outfan of Shu Jing (5) will form interference fringe, and two apertures (4) to be measured are respectively placed in the special interference system of Mach-once
Two optical interference circuits in, that is, be placed in the light path between total reflective mirror (3) and light combination mirror (5), by the input of the interference fringe of gained
To the front end face of the mobile micrometer system (6) of double wedges, the interference amplified from the rear end face output of the mobile micrometer system (6) of double wedges
Striped is on film viewing screen (7).
2. vernier caliper type diaphragm dish structure, the apertured plate affix to traditional aperture can measure the rotation of aperture driving lever
The arc-shaped vernier slide calliper rule of angle, is characterized in that：Aperture is additionally arranged the arc chi that one group of two scale differs on apertured plate,
It is made up of fixing main scale and rotatable secondary chi, and is completely disposed on apertured plate, be i.e. no matter main scale or any part knot of secondary chi
Structure is all not extend to the dead ahead of aperture clear aperture, thus leading to block light path, the zero graduation line of main scale and secondary chi
Can be aligned coincident with when unmeasured, secondary chi, against main scale, is placed in below main scale, that is, secondary chi is placed in the inner side of apertured plate, little
The initial position of hole diaphragm driving lever, position when that is, driving lever does not rotate, just overlap with the zero graduation line of main scale.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310413279.1A CN104422395B (en) | 2013-09-11 | 2013-09-11 | Method for calibrating small-aperture diaphragm |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310413279.1A CN104422395B (en) | 2013-09-11 | 2013-09-11 | Method for calibrating small-aperture diaphragm |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104422395A CN104422395A (en) | 2015-03-18 |
| CN104422395B true CN104422395B (en) | 2017-02-08 |
Family
ID=52972074
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310413279.1A Expired - Fee Related CN104422395B (en) | 2013-09-11 | 2013-09-11 | Method for calibrating small-aperture diaphragm |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104422395B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109668512A (en) * | 2018-12-21 | 2019-04-23 | 清华大学深圳研究生院 | The beam directing mechanisms and alignment methods for the laser displacement sensor being arranged symmetrically |
| CN112539697B (en) * | 2020-07-14 | 2022-12-09 | 深圳中科飞测科技股份有限公司 | Light-emitting device, light spot adjusting method thereof and detection equipment |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2030312U (en) * | 1988-06-09 | 1989-01-04 | 严松山 | Turning angle admeasuring apparatus |
| CN2379324Y (en) * | 1999-06-15 | 2000-05-24 | 李富饶 | Miniature appliance for measuring angle |
| CN201280008Y (en) * | 2008-07-19 | 2009-07-29 | 黄一品 | Multifunctional mapping tool |
| CN102962586A (en) * | 2012-12-12 | 2013-03-13 | 中科中涵激光设备（福建）股份有限公司 | Adjustment detecting method of double-optical wedge initial phase |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007022218A1 (en) * | 2007-05-11 | 2008-11-13 | Robert Bosch Gmbh | Lens arrangement for image processing and method for reducing image aberrations in this lens arrangement |
-
2013
- 2013-09-11 CN CN201310413279.1A patent/CN104422395B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2030312U (en) * | 1988-06-09 | 1989-01-04 | 严松山 | Turning angle admeasuring apparatus |
| CN2379324Y (en) * | 1999-06-15 | 2000-05-24 | 李富饶 | Miniature appliance for measuring angle |
| CN201280008Y (en) * | 2008-07-19 | 2009-07-29 | 黄一品 | Multifunctional mapping tool |
| CN102962586A (en) * | 2012-12-12 | 2013-03-13 | 中科中涵激光设备（福建）股份有限公司 | Adjustment detecting method of double-optical wedge initial phase |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104422395A (en) | 2015-03-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101509828B (en) | Differential confocal-low coherent interference combination refractivity and thickness measurement method and apparatus | |
| CN104215176B (en) | High accuracy optical interval measurement device and method | |
| CN107764203B (en) | Dual wavelength phase shift interference non-spherical measuring method and device based on part penalty method | |
| CN103454249A (en) | Method and device for detecting uniformity of optical glass based on white light interferometry | |
| CN103063608B (en) | Air refractive index measurement method and device based on dual-frequency orthogonal line polarized light interference | |
| CN103983214A (en) | Device for measuring four-freedom-degree kinematic errors of guide rail through non-diffraction light | |
| CN110455226B (en) | Calibration system and method for laser collimation transceiving integrated straightness measurement | |
| CN102878935B (en) | Device and method for measuring optical off-plane displacement field based on shearing speckle interference | |
| CN104315985A (en) | Interference measuring method for thickness of center of lens | |
| CN104422395B (en) | Method for calibrating small-aperture diaphragm | |
| CN102878933B (en) | Comparator based on white light interference positioning principle and detection method thereof | |
| JP2012088342A (en) | Refraction index distribution measuring method and refraction index distribution measuring device | |
| CN104792269B (en) | A kind of calculation method of the fiber end face height value insensitive to linear phase-shift error | |
| CN104075655A (en) | Fizeau synchronous phase-shifting interference test device adopting rotary radial grating | |
| CN109959342A (en) | The detection method and device of numerical aperture of objective | |
| CN103196834B (en) | With the interference of light gas detecting system of air-pressure balancing device | |
| CN209559128U (en) | Nanometer resolution displacement measuring device based on optical wedge interference | |
| CN203422066U (en) | Device for measuring infinitesimal based on optical diffraction | |
| CN100449260C (en) | Method for precision measuring space offset of telephotolens and eyepiece using interferometer | |
| CN107942339B (en) | Photon counting laser interference distance measuring method | |
| CN105928454B (en) | A kind of double optical fiber point-diffraction full filed low frequency heterodyne ineterferometers | |
| CN103792648A (en) | Optical system of interference microobjective | |
| CN109579781B (en) | High-precision large-working-distance auto-collimation three-dimensional absolute angle measuring device and method | |
| CN103791843A (en) | System capable of realizing precise measurement of off-axis parameters of off-axis reflector and method thereof | |
| CN105115940A (en) | Curve measuring method and device for refractive index of optical material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170208 Termination date: 20170911 |