CN102878935B - Device and method for measuring optical off-plane displacement field based on shearing speckle interference - Google Patents
Device and method for measuring optical off-plane displacement field based on shearing speckle interference Download PDFInfo
- Publication number
- CN102878935B CN102878935B CN201210360788.8A CN201210360788A CN102878935B CN 102878935 B CN102878935 B CN 102878935B CN 201210360788 A CN201210360788 A CN 201210360788A CN 102878935 B CN102878935 B CN 102878935B
- Authority
- CN
- China
- Prior art keywords
- half mirror
- plane displacement
- shearing
- mirror
- phase shift
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000006073 displacement reaction Methods 0.000 title claims abstract description 69
- 238000010008 shearing Methods 0.000 title claims abstract description 52
- 230000003287 optical effect Effects 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000010363 phase shift Effects 0.000 claims abstract description 39
- 239000000919 ceramic Substances 0.000 claims abstract description 14
- 238000010586 diagram Methods 0.000 claims description 17
- 230000010354 integration Effects 0.000 claims description 12
- 238000005305 interferometry Methods 0.000 claims description 9
- 238000005259 measurement Methods 0.000 abstract description 26
- 230000002349 favourable effect Effects 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 13
- 238000001514 detection method Methods 0.000 description 7
- 238000002955 isolation Methods 0.000 description 5
- 238000000691 measurement method Methods 0.000 description 4
- 238000004556 laser interferometry Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000012625 in-situ measurement Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a device for measuring an optical off-plane displacement field based on shearing speckle interference. The device comprises a camera with a lens, a diaphragm adjustment device and a focus adjustment device, a first semi-transparent and semi-reflection mirror, a second semi-transparent and semi-reflection mirror, a third semi-transparent and semi-reflection mirror, a first reflector, a second reflector, a third reflector, a piezoelectric ceramic device, a voltage controller and a computer. Furthermore, the invention also discloses a method for measuring the optical off-plane displacement field based on the shearing speckle interference. The method comprises the following steps of: 1, debugging a test device; 2, before a tested sample is deformed, acquiring a phase shift graph; 3, after the tested sample is deformed, acquiring another phase shift graph; 4, measuring an off-plane displacement gradient field; and 5, measuring an off-plane displacement field. By the device for measuring the optical off-plane displacement field, the surface of the tested sample is lossless; the full field can be measured; the resolution is high; a measurement result is stable; and the device is favorable for site measurement.
Description
Technical Field
The invention relates to an out-of-plane displacement measurement technology, in particular to an optical out-of-plane displacement field measurement device and method based on shearing speckle interference.
Background
Conventionally, a large part of the off-plane displacement measurement in the industrial field adopts the conventional contact measurement technology represented by the displacement meter. However, most of these measurement techniques are single-point detection, and it is difficult to obtain the deformation distribution of the full field, and even if a fast scanning method is adopted, the detection time is relatively long due to the point-by-point measurement, and it is difficult to achieve the state synchronization of a plurality of detection points. In addition, the contact measurement hinders the deformation of the surface of the sample to a certain extent, and the surface of the sample is easily damaged, so that the traditional contact measurement technology cannot be accepted in more and more new material detection fields. The non-contact triangulation techniques such as structured light projection are limited to high-precision measurement due to relatively complex calibration and limited precision, and the common laser electronic speckle interference off-plane displacement measurement technique is difficult to apply to detection in the industrial field due to higher vibration isolation and environmental requirements.
Disclosure of Invention
The technical problem is as follows: the technical problem to be solved by the invention is as follows: when the measuring device is used for measuring the optical off-plane displacement field, the surface of a measured sample can be lossless, the full-field measurement is realized, the resolution ratio is high, the measurement result is stable, and the field measurement is convenient.
The technical scheme is as follows: in order to solve the technical problems, the invention adopts the following technical scheme:
an optical off-plane displacement field measuring device based on shearing speckle interference comprises a camera provided with a lens, an aperture adjusting device and a focusing adjusting device, a first half-transmitting half-reflecting mirror, a second half-transmitting half-reflecting mirror, a third half-transmitting half-reflecting mirror, a first reflecting mirror, a second reflecting mirror, a third reflecting mirror, a piezoelectric ceramic, a voltage controller and a computer; wherein,
the first side surface of the first half-transmitting half-reflecting mirror is opposite to the lens of the camera; the second side surface of the first half mirror is opposite to the fourth side surface of the second half mirror, the third side surface of the first half mirror is opposite to the first side surface of the third half mirror, the first side surface of the first half mirror and the third side surface of the first half mirror are two opposite side surfaces of the first half mirror, one end part of the reflecting surface of the first half mirror is positioned at the joint of the third side surface of the first half mirror and the second side surface of the first half mirror, and the other end part of the reflecting surface of the first half mirror is positioned at the joint of the first side surface of the first half mirror and the fourth side surface of the first half mirror;
the second side surface of the second half mirror is opposite to the second reflecting mirror, a second switch is arranged between the second reflecting mirror and the second half mirror, the first side surface of the second half mirror is opposite to the first reflecting mirror, and a first switch is arranged between the first reflecting mirror and the second half mirror; the fourth side surface of the second half mirror and the second side surface of the second half mirror are two opposite side surfaces of the second half mirror; one end part of the reflecting surface of the second half mirror is positioned at the joint of the third side surface of the second half mirror and the fourth side surface of the second half mirror, and the other end part of the reflecting surface of the second half mirror is positioned at the joint of the first side surface of the second half mirror and the second side surface of the second half mirror;
the third side of the third semi-transparent semi-reflecting mirror is opposite to the third reflecting mirror, the first side of the third semi-transparent semi-reflecting mirror and the third side of the third semi-transparent semi-reflecting mirror are two opposite sides of the third semi-transparent semi-reflecting mirror, one side of the third reflecting mirror, which is far away from the third semi-transparent semi-reflecting mirror, is provided with a piezoelectric ceramic, the piezoelectric ceramic is connected with a voltage controller through a wire, the voltage controller is connected with a computer, and the camera is connected with the computer.
A measuring method of an optical out-of-plane displacement field measuring device based on shearing speckle interference comprises the following steps:
step 1, debugging a testing device: placing a tested sample to enable the tested sample to be aligned with the fourth side face of the first half-transmitting half-reflecting mirror, then illuminating the surface of the tested sample by laser, respectively switching to two shearing directions of an image in the x direction and the y direction, and calibrating the shearing amount of the two shearing directions in the x direction and the y direction, wherein the x direction is a horizontal direction, and the y direction is a vertical direction;
step 2, before the deformation of the tested sample, acquiring a phase shift diagram: before a tested sample deforms, switching to two shearing directions of an x direction and a y direction respectively, generating phase shift by using a voltage controller, and collecting a phase shift diagram;
step 3, acquiring a phase shift diagram after the measured sample is deformed: loading a measured sample to enable the measured sample to generate out-of-plane displacement, then respectively switching to two shearing directions of an x direction and a y direction, generating phase shift by using a voltage controller, and collecting a phase shift diagram;
step 4, measuring an out-of-plane displacement gradient field: according to the phase shift graphs collected in the step 2 and the step 3, an out-of-plane displacement gradient field along the x direction and the y direction is measured and calculated by using a phase shift algorithm;
step 5, measuring an out-of-plane displacement field: selecting an integration initial point from an off-plane displacement gradient field in the shearing direction along the x direction, integrating an off-plane displacement curve along the x direction, and then integrating along the y direction by taking each point on the curve as an integration initial value point so as to measure the off-plane displacement field; or selecting an integration initial point from the off-plane displacement gradient field along the y shearing direction, integrating an off-plane displacement curve along the y direction, and then integrating along the x direction by taking each point on the curve as an integration initial value point so as to measure the off-plane displacement field.
Has the advantages that: compared with the prior art, the invention has the following beneficial effects:
(1) the surface of the tested sample is not damaged. Compared with the traditional contact measurement technology represented by a displacement meter in the industrial field, the invention adopts the optical measurement technology, does not need to be in contact with the surface of the measured sample, and therefore, does not damage the surface of the measured sample and cannot prevent the deformation of the surface of the measured sample.
(2) And (4) measuring in a full field. The traditional method adopts single-point measurement, and the deformation distribution of the whole field is difficult to obtain. In the measuring process, the invention images the whole surface of the measured sample. The invention thus has the advantage of full-field measurement.
(3) High resolution and high precision. The laser interferometry has high accuracy and can reach the sensitivity of wavelength level, and the invention also well inherits the characteristic and has high resolution and accuracy.
(4) The measurement results are stable. The technology of electronic speckle interferometry for out-of-plane displacement, which also belongs to the laser interferometry method, is usually limited in a laboratory due to high requirements on vibration isolation and environment, and cannot be applied to industrial field in-situ measurement. The invention adopts the shearing speckle interference technology without reference light, greatly reduces the requirement on vibration isolation, and has more stable measurement result than the laser interference measurement technologies such as electronic speckle interference and the like.
(5) Convenient for on-site measurement. The measuring method has low requirement on measuring environment, is suitable for field measurement, and has wide application space in the future industrial detection field.
Drawings
FIG. 1 is a schematic view of the structure of the measuring device of the present invention.
Fig. 2 is a schematic position diagram of three half mirrors of the present invention.
The figure shows that: the camera 1, a first half mirror 2, a first side 201 of the first half mirror, a second side 202 of the first half mirror, a third side 203 of the first half mirror, a fourth side 204 of the first half mirror, a second half mirror 3, a first side 301 of the second half mirror, a second side 302 of the second half mirror, a third side 303 of the second half mirror, a fourth side 304 of the second half mirror, a third half mirror 4, a first side 401 of the third half mirror, a second side 402 of the third half mirror, a third side 403 of the third half mirror, a fourth side 404 of the third half mirror, a first reflector 5, a second reflector 6, a third reflector 7, a piezoelectric ceramic 8, a voltage controller 9, a computer 10, a first switch 11, a second switch 12, and a sample 13 to be measured.
Detailed Description
The technical scheme of the invention is explained in detail in the following with the accompanying drawings.
As shown in fig. 1 and 2, the optical off-plane displacement field measuring device based on shearing speckle interference of the present invention includes a camera 1 provided with a lens, an aperture adjusting device and a focus adjusting device, a first half mirror 2, a second half mirror 3, a third half mirror 4, a first reflecting mirror 5, a second reflecting mirror 6, a third reflecting mirror 7, a piezoelectric ceramic 8, a voltage controller 9 and a computer 10. The first side 201 of the first half mirror is opposite to the lens of the camera 1. The second side 202 of the first half mirror is opposite the fourth side 304 of the second half mirror. The third side 203 of the first half mirror is opposite to the first side 401 of the third half mirror. The first side 201 of the first half mirror and the third side 203 of the first half mirror are two opposite sides of the first half mirror 2. The second side 202 of the first half mirror and the fourth side 204 of the first half mirror are two opposite sides of the first half mirror 2. One end of the reflecting surface of the first half mirror 2 is located at a joint of the third side 203 of the first half mirror and the second side 202 of the first half mirror, and the other end of the reflecting surface of the first half mirror 2 is located at a joint of the first side 201 of the first half mirror and the fourth side 204 of the first half mirror. The second side 302 of the second half-mirror is opposite the second mirror 6. A second switch 12 is arranged between the second reflector 6 and the second half mirror 3. If the second switch 12 is in the on state, the light directed to the second mirror 6 and the light reflected via the second mirror 6 will not be affected. If the second switch 12 is in the off state, the light emitted to the second reflector 6 will be completely absorbed by the second switch 12, and no light will be reflected from the second reflector 6. The first side 301 of the second half mirror is opposite to the first mirror 5. A first switch 11 is arranged between the first reflector 5 and the second half-mirror 3. If the first switch 11 is in the on state, the light rays emitted to the first reflector 5 and the light rays reflected by the first reflector 5 will not be affected. If the first switch 11 is in the off state, the light emitted to the first reflector 5 will be completely absorbed by the first switch 11, and then there will be no light reflected from the first reflector 5. The first side 301 of the second half mirror and the third side 303 of the second half mirror are two opposite sides of the second half mirror 3, and the fourth side 304 of the second half mirror and the second side 302 of the second half mirror are two opposite sides of the second half mirror 3. One end of the reflecting surface of the second half mirror 3 is located at a joint of the third side 303 of the second half mirror and the fourth side 304 of the second half mirror, and the other end of the reflecting surface of the second half mirror 3 is located at a joint of the first side 301 of the second half mirror and the second side 302 of the second half mirror. The third side 403 of the third half mirror is opposite to the third mirror 7. The first side 401 of the third half mirror and the third side 403 of the third half mirror are two opposite sides of the third half mirror 4. The second side 402 of the third half mirror and the fourth side 404 of the third half mirror are opposite sides of the third half mirror 4. And a piezoelectric ceramic 8 is arranged on one surface of the third reflector 7 departing from the third half-transmitting and half-reflecting mirror 4. The piezoelectric ceramic 8 is connected with a voltage controller 9 through a lead, and the voltage controller 9 is connected with a computer 10. The output voltage of the voltage controller 9 is controlled by software installed in the computer 10, so that the thickness of the piezoelectric ceramic 8 is changed, the third reflector 7 is displaced from the plane, and the optical path of light reflected by the third reflector 7 is changed, thereby realizing phase shift. The camera 1 is connected to a computer 10. The camera 1 is controlled by software installed in the computer 10 so that the camera 1 can capture images and store the images in the computer 10.
Further, one end of the reflecting surface of the third half mirror 4 is located at a joint of the first side 401 of the third half mirror and the second side 402 of the third half mirror; the other end of the reflecting surface of the third half mirror 4 is located at the junction of the third side 403 of the third half mirror and the fourth side 404 of the third half mirror. Of course, as another alternative, one end of the reflecting surface of the third half mirror 4 is located at a junction of the third side 403 of the third half mirror and the second side 402 of the third half mirror; the other end of the reflecting surface of the third half mirror 4 is located at the junction of the first side 401 of the third half mirror and the fourth side 404 of the third half mirror.
Further, the first half mirror 2, the second half mirror 3 and the third half mirror 4 are all cubes, and have equal length, equal height and equal width. That is to say, the first half mirror 2, the second half mirror 3 and the third half mirror 4 have the same product specification, which is beneficial to the measurement.
The measuring method of the optical off-plane displacement field measuring device based on the shearing speckle interference comprises the following steps:
step 1, debugging a testing device: placing the measured sample 13 to align the measured sample 13 with the fourth side 204 of the first half mirror, then illuminating the surface of the measured sample 13 with laser, switching to two shearing directions of an image in the x direction and the y direction respectively, and calibrating the shearing amount of the two shearing directions in the x direction and the y direction, wherein the x direction is a horizontal direction, and the y direction is a vertical direction.
Step 2, before the deformation of the tested sample 13, acquiring a phase shift diagram: before the measured sample 13 is deformed, the two shearing directions of the x direction and the y direction are respectively switched, phase shift is generated by using the voltage controller 9, and a phase shift diagram is collected.
And 3, acquiring a phase shift diagram after the tested sample 13 is deformed: and loading the tested sample 13 to enable the tested sample 13 to generate out-of-plane displacement, then switching to two shearing directions of the x direction and the y direction respectively, generating phase shift by using the voltage controller 9, and acquiring a phase shift diagram.
In step 1, step 2 or step 3, switching to two shearing directions of the x direction and the y direction, respectively, may be performed by two methods. The first method is as follows: the first switch 11 is turned on, the second switch 12 is turned off, the first reflector 5 is rotated to make the image captured by the camera 1 cut in the x direction, and then the first switch 11 is turned off, the second switch 12 is turned on, and the second reflector 6 is rotated to make the image captured by the camera 1 cut in the y direction. The second method is as follows: turning on the first switch 11, turning off the second switch 12, and then rotating the first reflector 5 to make the shearing direction of the image along the y direction in the image collected by the camera 1; the first switch 11 is closed, the second switch 12 is opened, and then the second reflecting mirror 6 is rotated, so that the image captured by the camera 1 is cut along the x direction.
In step 2 and step 3, the method for generating phase shift by using the voltage controller 9 and acquiring the phase shift map is as follows: and a voltage control program is installed and operated in the computer 10, the output voltage of the voltage controller 9 is changed by using the voltage control program, so that the thickness of the piezoelectric ceramic 8 is changed, the third reflector 7 is displaced out of plane, the optical path of light reflected by the third reflector 7 is changed, so that phase shift is realized, a phase shift diagram is collected by using the camera 1, and the phase shift diagram is stored in the computer 10 connected with the camera 1. When purchasing the voltage controller 9, the merchant will provide the user with the optical disc for voltage control program.
Step 4, measuring an out-of-plane displacement gradient field: and (4) according to the phase shift graphs acquired in the step (2) and the step (3), measuring out the out-of-plane displacement gradient field along the x direction and the y direction by using a phase shift algorithm.
In step 4, the phase shift algorithm is prior art. For example, a phase shift algorithm is disclosed in an article entitled "experimental mechanics", 03 2001, and entitled "phase measurement method in optical interferometry".
Step 5, measuring an out-of-plane displacement field: selecting an integration initial point from an off-plane displacement gradient field in the shearing direction along the x direction, integrating an off-plane displacement curve along the x direction, and then integrating along the y direction by taking each point on the curve as an integration initial value point so as to measure the off-plane displacement field; or selecting an integration initial point from the off-plane displacement gradient field along the y shearing direction, integrating an off-plane displacement curve along the y direction, and then integrating along the x direction by taking each point on the curve as an integration initial value point so as to measure the off-plane displacement field.
The invention adopts two steps to measure the out-of-plane displacement field. Firstly, measuring an out-of-plane displacement gradient field by using a shearing speckle interference technology; and secondly, integrating the off-plane displacement gradient field obtained in the first step to calculate the off-plane displacement field. The first step in the two-step measurement of the out-of-plane displacement field uses the shearing speckle interference technology, and the method has the advantages of no damage, non-contact, full-field measurement and high measurement speed of an optical measurement method. The laser interferometry has high accuracy and can reach the sensitivity of wavelength level, and the invention also well inherits the characteristic and has very high sensitivity. The technology of electronic speckle interferometry for out-of-plane displacement is generally limited in a laboratory due to high requirements on vibration isolation and environment, and cannot be applied to in-situ measurement on an industrial site. The invention adopts the shearing speckle interference technology without reference light, greatly reduces the requirements on vibration isolation and environment, and has wide application space in the future industrial detection field.
The conventional shearing speckle interference technology can measure a gradient field of the sample surface out-of-plane displacement along a certain direction, however, the problem that an integral initial value cannot be determined is often encountered when the displacement field is calculated through a single displacement gradient field. In order to overcome the defect, the invention improves the classical michelson interference optical path, and adopts three half mirrors, namely a first half mirror 2, a second half mirror 3 and a third half mirror 4, and three reflecting mirrors, namely a first reflecting mirror 5, a second reflecting mirror 6 and a third reflecting mirror 7, to replace one half mirror and two reflecting mirrors in the classical michelson interference optical path. The light reflected by the surface of the tested sample 13 is split by the first half mirror 2, wherein one path of reflected light irradiates the third half mirror 4, is transmitted to the third reflector 7 through the third half mirror 4, is reflected to the third half mirror 4 through the third reflector 7, and is transmitted to the third half mirror 4 through the third half mirror 4 and the first half mirror 2 to enter the camera lens. When the first switch 11 is turned on and the second switch 12 is turned off, light reflected by the surface of the sample 13 to be measured is split by the first half mirror 2, wherein another path of transmitted light irradiates the second half mirror 3, is reflected by the second half mirror 3 to the first reflector 5, is reflected by the first reflector 5 to the second half mirror 3, is reflected by the second half mirror 3 to the first half mirror 2, and is reflected by the first half mirror 2 to enter the lens of the camera 1. When the first switch 11 is closed and the second switch 12 is opened, light reflected by the surface of the sample 13 to be measured is split by the first half mirror 2, wherein the other path of transmitted light irradiates the second half mirror 3, transmits to the second reflecting mirror 6 through the second half mirror 3, reflects to the second half mirror 3 through the second reflecting mirror 6, transmits to the first half mirror 2 through the second half mirror 3, and reflects into the lens of the camera 1 through the first half mirror 2. Whether the first switch 11 is open and the second switch 12 is closed, or the first switch 11 is closed and the second switch 12 is open, the optical path can be regarded as a classical michelson shearing optical path and can be used for measuring the out-of-plane displacement gradient field of the measured sample 13. The deflection directions of the first mirror 5 and the second mirror 6 are adjusted such that the shearing directions of the two sheared images are perpendicular to each other and in the x-direction and the y-direction of the image coordinates, respectively. And finally, according to the fifth step of the measuring method, selecting a seed point at will, and integrating the off-plane displacement gradient fields in the x direction and the y direction to obtain the off-plane displacement field of the sample.
Claims (8)
1. An optical off-plane displacement field measuring device based on shearing speckle interference comprises a camera (1) provided with a lens, an aperture adjusting device and a focusing adjusting device, and a computer (10), and is characterized by further comprising a first half mirror (2), a second half mirror (3), a third half mirror (4), a first reflecting mirror (5), a second reflecting mirror (6), a third reflecting mirror (7), a piezoelectric ceramic (8) and a voltage controller (9);
wherein, the first side surface (201) of the first half mirror is opposite to the lens of the camera (1); the second side face (202) of the first half mirror is opposite to the fourth side face (304) of the second half mirror, the third side face (203) of the first half mirror is opposite to the first side face (401) of the third half mirror, the first side face (201) of the first half mirror and the third side face (203) of the first half mirror are two opposite side faces of the first half mirror (2), one end part of the reflecting face of the first half mirror (2) is positioned at the joint of the third side face (203) of the first half mirror and the second side face (202) of the first half mirror, and the other end part of the reflecting face of the first half mirror (2) is positioned at the joint of the first side face (201) of the first half mirror and the fourth side face (204) of the first half mirror;
a second side surface (302) of the second half mirror is opposite to the second reflecting mirror (6), a second switch (12) is arranged between the second reflecting mirror (6) and the second half mirror (3), a first side surface (301) of the second half mirror is opposite to the first reflecting mirror (5), and a first switch (11) is arranged between the first reflecting mirror (5) and the second half mirror (3); the fourth side face (304) of the second half mirror and the second side face (302) of the second half mirror are two opposite side faces of the second half mirror (3); one end part of the reflecting surface of the second half mirror (3) is positioned at the joint of the third side surface (303) of the second half mirror and the fourth side surface (304) of the second half mirror, and the other end part of the reflecting surface of the second half mirror (3) is positioned at the joint of the first side surface (301) of the second half mirror and the second side surface (302) of the second half mirror;
the third side (403) of the third half mirror is opposite to the third reflector (7), the first side (401) of the third half mirror and the third side (403) of the third half mirror are two opposite sides of the third half mirror (4), one side of the third reflector (7) departing from the third half mirror (4) is provided with a piezoelectric ceramic (8), the piezoelectric ceramic (8) is connected with a voltage controller (9) through a lead, the voltage controller (9) is connected with a computer (10), and the camera (1) is connected with the computer (10).
2. The optical off-plane displacement field measuring device based on shearing speckle interferometry according to claim 1, wherein one end of the reflecting surface of the third half mirror (4) is located at the junction of the first side surface (401) of the third half mirror and the second side surface (402) of the third half mirror; the other end of the reflection surface of the third half mirror (4) is located at the joint of the third side surface (403) of the third half mirror and the fourth side surface (404) of the third half mirror.
3. The optical off-plane displacement field measuring device based on shearing speckle interferometry according to claim 1, wherein one end of the reflecting surface of the third half mirror (4) is located at the junction of the third side surface (403) of the third half mirror and the second side surface (402) of the third half mirror; the other end of the reflection surface of the third half mirror (4) is located at the joint of the first side surface (401) of the third half mirror and the fourth side surface (404) of the third half mirror.
4. The optical off-plane displacement field measuring device based on shearing speckle interference as claimed in claim 1, wherein the first half mirror (2), the second half mirror (3) and the third half mirror (4) are all cubic and have equal length, equal height and equal width.
5. A measuring method of the optical off-plane displacement field measuring device based on the shearing speckle interferometry according to claim 1, characterized by comprising the following steps:
step 1, debugging a testing device: placing a sample to be measured (13), aligning the sample to be measured (13) with the fourth side surface (204) of the first half mirror, then illuminating the surface of the sample to be measured (13) by laser, respectively switching to two shearing directions of an image in the x direction and the y direction, and calibrating the shearing amount of the two shearing directions in the x direction and the y direction, wherein the x direction is a horizontal direction, and the y direction is a vertical direction;
step 2, before the deformation of the tested sample (13), acquiring a phase shift diagram: before a tested sample (13) deforms, switching to two shearing directions of an x direction and a y direction respectively, generating phase shift by using a voltage controller (9), and acquiring a phase shift diagram;
and 3, acquiring a phase shift diagram after the tested sample (13) deforms: loading a measured sample (13), enabling the measured sample (13) to generate out-of-plane displacement, then respectively switching to two shearing directions of an x direction and a y direction, generating phase shift by using a voltage controller (9), and acquiring a phase shift diagram;
step 4, measuring an out-of-plane displacement gradient field: according to the phase shift graphs collected in the step 2 and the step 3, an out-of-plane displacement gradient field along the x direction and the y direction is measured and calculated by using a phase shift algorithm;
step 5, measuring an out-of-plane displacement field: selecting an integration initial point from an off-plane displacement gradient field in the shearing direction along the x direction, integrating an off-plane displacement curve along the x direction, and then integrating along the y direction by taking each point on the curve as an integration initial value point so as to measure the off-plane displacement field; or selecting an integration initial point from the off-plane displacement gradient field along the y shearing direction, integrating an off-plane displacement curve along the y direction, and then integrating along the x direction by taking each point on the curve as an integration initial value point so as to measure the off-plane displacement field.
6. The measuring method of the optical off-plane displacement field measuring device based on the shearing speckle interferometry according to claim 5, wherein in the step 1, the step 2 or the step 3, the method for switching to the two shearing directions of the x direction and the y direction respectively comprises the following steps: the first switch (11) is turned on, the second switch (12) is turned off, then the first reflector (5) is rotated, and the shearing direction of the image is along the x direction in the image collected by the camera (1); the first switch (11) is closed, the second switch (12) is opened, and then the second reflector (6) is rotated, so that the shearing direction of the image in the image acquired by the camera (1) is along the y direction.
7. The measuring method of the optical off-plane displacement field measuring device based on the shearing speckle interferometry according to claim 5, wherein in the step 1, the step 2 or the step 3, the method for switching to the two shearing directions of the x direction and the y direction respectively comprises the following steps: turning on a first switch (11), turning off a second switch (12), and then rotating a first reflector (5) to enable the shearing direction of the image to be along the y direction in the image collected by the camera (1); the first switch (11) is closed, the second switch (12) is opened, and then the second reflector (6) is rotated, so that the image is acquired by the camera (1), and the cutting direction of the image is along the x direction.
8. The measuring method of the optical off-plane displacement field measuring device based on the shearing speckle interferometry according to claim 5, wherein in the step 2 and the step 3, the method for generating the phase shift by using the voltage controller (9) and acquiring the phase shift map comprises the following steps: and a voltage control program is installed and operated on the computer (10), the output voltage of the voltage controller (9) is changed by using the voltage control program, so that the thickness of the piezoelectric ceramic (8) is changed, the third reflector (7) is displaced out of plane, the optical path of light reflected by the third reflector (7) is changed, phase shift is realized, a phase shift diagram is collected by using the camera (1), and the phase shift diagram is stored in the computer (10) connected with the camera (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210360788.8A CN102878935B (en) | 2012-09-25 | 2012-09-25 | Device and method for measuring optical off-plane displacement field based on shearing speckle interference |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210360788.8A CN102878935B (en) | 2012-09-25 | 2012-09-25 | Device and method for measuring optical off-plane displacement field based on shearing speckle interference |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102878935A CN102878935A (en) | 2013-01-16 |
| CN102878935B true CN102878935B (en) | 2014-12-10 |
Family
ID=47480358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210360788.8A Expired - Fee Related CN102878935B (en) | 2012-09-25 | 2012-09-25 | Device and method for measuring optical off-plane displacement field based on shearing speckle interference |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102878935B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104457581B (en) | 2014-08-28 | 2017-03-22 | 深圳奥比中光科技有限公司 | Overall Z-axis displacement measuring system |
| CN105758719B (en) * | 2016-04-26 | 2018-03-16 | 河海大学 | A kind of homogeneous strain optical measuring device and method based on bimirror reflection |
| CN106596277B (en) * | 2016-11-28 | 2020-06-30 | 上海大学 | High-flux membrane material mechanical testing device and method |
| CN109357615B (en) * | 2018-09-27 | 2020-12-01 | 北京信息科技大学 | Speckle interference and shearing speckle interference shared device |
| CN110132846A (en) * | 2019-06-27 | 2019-08-16 | 合肥工业大学 | Multi-direction speckle-shearing interferometry system and measurement method based on Mach once moral optical path |
| CN114235023B (en) * | 2021-11-18 | 2024-05-03 | 北京卫星制造厂有限公司 | Online calibration method and device for phase shifter |
| CN114018177B (en) * | 2021-11-18 | 2023-12-26 | 南昌航空大学 | Three-dimensional measurement method for mirror surface object based on speckle pattern |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2814330Y (en) * | 2005-04-08 | 2006-09-06 | 中国船舶重工集团公司第七一一研究所 | Shear speckle interferometer |
| CN102506716A (en) * | 2011-10-24 | 2012-06-20 | 河南科技大学 | Laser speckle measuring device and method for measuring in-plane displacement and out-of-plane displacement simultaneously |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6741357B2 (en) * | 2001-08-14 | 2004-05-25 | Seagate Technology Llc | Quadrature phase shift interferometer with unwrapping of phase |
| JP2003302205A (en) * | 2002-02-07 | 2003-10-24 | Nikon Corp | Shearing interference measuring method and shearing interferometer, method of manufacturing for projection optical system, and projection optical system, and projection exposure device |
-
2012
- 2012-09-25 CN CN201210360788.8A patent/CN102878935B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2814330Y (en) * | 2005-04-08 | 2006-09-06 | 中国船舶重工集团公司第七一一研究所 | Shear speckle interferometer |
| CN102506716A (en) * | 2011-10-24 | 2012-06-20 | 河南科技大学 | Laser speckle measuring device and method for measuring in-plane displacement and out-of-plane displacement simultaneously |
Non-Patent Citations (4)
| Title |
|---|
| M.H. Majles Ara等.Speckle interferometry methods for displacement and strain measurements using photorefractive crystal.《Optik - International Journal for Light and Electron Optics》.2007,第118卷(第9期),第445-451页. * |
| M.H. Majles Ara等.Speckle interferometry methods for displacement and strain measurements using photorefractive crystal.《Optik- International Journal for Light and Electron Optics》.2007,第118卷(第9期),第445-451页. * |
| 基于电子剪切散斑法的塑封材料的无损检测;米红林等;《包装工程》;20110331;第32卷(第5期);第29-31页，第48页 * |
| 米红林等.基于电子剪切散斑法的塑封材料的无损检测.《包装工程》.2011,第32卷(第5期),第29-31页，第48页. * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102878935A (en) | 2013-01-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102878935B (en) | Device and method for measuring optical off-plane displacement field based on shearing speckle interference | |
| Hu et al. | Microscopic fringe projection profilometry: A review | |
| US6721094B1 (en) | Long working distance interference microscope | |
| US4340306A (en) | Optical system for surface topography measurement | |
| CN106517086B (en) | A kind of large area high-resolution wide visual field on-line measurement device and its measurement method | |
| CN101893429B (en) | Super-precision surface measuring system based on polarization phase-shifting microscopy interference technology | |
| CN102425998B (en) | Full parameter detection apparatus of polished surface quality of optical element and detection method thereof | |
| CN102679894B (en) | Method for measuring central thickness of reflecting type differential confocal lens | |
| CN103528524B (en) | The method of acoplanarity displacement field distribution inside perspective measurement polymer matrix composites | |
| TWI436029B (en) | Three dimensional surface profilometer and microscopy, and the method using the same | |
| CN102679895B (en) | Method for measuring center thickness of reflective confocal lens | |
| JP5698863B2 (en) | Method and apparatus for measuring refractive index | |
| CN106152951A (en) | A kind of two-sided interference device measuring non-transparent film thickness distribution and method | |
| US20110261347A1 (en) | Method for interferometric detection of surfaces | |
| CN105300273B (en) | Dynamic Point Diffraction Interferometer with Adjustable Fringe Contrast | |
| CN104330039A (en) | High-numerical-aperture optical fiber point diffraction interference device used for three-coordinate measurement and method thereof | |
| JPH07508345A (en) | Method and apparatus for inspecting the surface of an object by interferometer | |
| CN101907445A (en) | Full-field detection device of heavy-calibre monolayer film thickness | |
| CN107421461B (en) | Method for measuring material electrostriction and distribution thereof based on digital holographic interference | |
| WO2020135891A1 (en) | Laser parallelism detector | |
| US11248899B2 (en) | Method and apparatus for deriving a topography of an object surface | |
| CN115541602B (en) | Product defect detection method | |
| CN101881607A (en) | Planar error detection system | |
| CN205581024U (en) | Optical element surface defect detecting device of transmission type synthetic aperture digital holographic art | |
| TWI434021B (en) | Non - contact optical composite measurement method and system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C53 | Correction of patent for invention or patent application | ||
| CB02 | Change of applicant information |
Address after: Center branch No. 3 ancient Tan Avenue in Gaochun County of Nanjing City, Jiangsu province 211300 Room 405 Applicant after: Southeast University Address before: 210096 Jiangsu city Nanjing Province four pailou No. 2 Applicant before: Southeast University |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141210 Termination date: 20170925 |