CN104377104B - 使用环境透射电子显微镜的方法以及环境透射电子显微镜 - Google Patents

使用环境透射电子显微镜的方法以及环境透射电子显微镜 Download PDF

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Publication number
CN104377104B
CN104377104B CN201410392945.2A CN201410392945A CN104377104B CN 104377104 B CN104377104 B CN 104377104B CN 201410392945 A CN201410392945 A CN 201410392945A CN 104377104 B CN104377104 B CN 104377104B
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gas
sample
electron microscope
transmission electron
electric field
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Chinese (zh)
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CN104377104A (zh
Inventor
P.C.蒂伊梅杰
S.J.P.科宁斯
A.亨斯特拉
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FEI Co
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FEI Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/263Contrast, resolution or power of penetration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/2602Details
    • H01J2237/2605Details operating at elevated pressures, e.g. atmosphere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/262Non-scanning techniques

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
CN201410392945.2A 2013-08-12 2014-08-12 使用环境透射电子显微镜的方法以及环境透射电子显微镜 Active CN104377104B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13180022.9A EP2838108A1 (en) 2013-08-12 2013-08-12 Method of using an environmental transmission electron microscope
EP13180022.9 2013-08-12

Publications (2)

Publication Number Publication Date
CN104377104A CN104377104A (zh) 2015-02-25
CN104377104B true CN104377104B (zh) 2018-04-13

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Country Status (4)

Country Link
US (1) US9570270B2 (https=)
EP (2) EP2838108A1 (https=)
JP (1) JP6192618B2 (https=)
CN (1) CN104377104B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9927939B2 (en) * 2014-08-13 2018-03-27 Samsung Display Co., Ltd. Touch panel and display apparatus including the same
US20210285899A1 (en) * 2017-06-26 2021-09-16 Gerasimos Daniel Danilatos Specimen control means for particle beam microscopy
CN110231354B (zh) * 2019-05-31 2020-09-08 武汉大学 一种非激光激发的四维透射电子显微镜装置及其使用方法
US11081314B2 (en) * 2019-10-01 2021-08-03 National Technology & Engineering Solutions Of Sandia, Llc Integrated transmission electron microscope
CN113241295A (zh) * 2021-04-28 2021-08-10 中国科学院大连化学物理研究所 一种用于环境透射电子显微镜的负压气氛控制系统
JP7585153B2 (ja) * 2021-07-13 2024-11-18 株式会社日立製作所 試料ホルダー及び電子顕微鏡
CN115116812B (zh) * 2022-08-29 2022-11-11 深圳市宗源伟业科技有限公司 一种高精度电子显微镜

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102637571A (zh) * 2011-02-14 2012-08-15 Fei公司 用于带电粒子显微术中的检测方法

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JPS59130365U (ja) * 1983-02-21 1984-09-01 日本電子株式会社 電子顕微鏡における試料通電装置
GB8604004D0 (en) * 1986-02-18 1986-03-26 Cambridge Instr Ltd Specimen chamber
WO1999030345A1 (en) 1997-12-08 1999-06-17 Philips Electron Optics B.V. Environmental sem with a magnetic field for improved secondary electron detection
AU748840B2 (en) 1997-12-08 2002-06-13 Fei Company Environmental SEM with multipole fields for improved secondary electron detection
US8872129B2 (en) * 2007-05-09 2014-10-28 Protochips, Inc. Microscopy support structures
JP2009129799A (ja) * 2007-11-27 2009-06-11 Hitachi Ltd 走査透過型電子顕微鏡
JP5226378B2 (ja) * 2008-04-28 2013-07-03 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡、及び試料観察方法
US8299432B2 (en) * 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
JP2011034895A (ja) * 2009-08-05 2011-02-17 Hitachi High-Technologies Corp 荷電粒子線装置及び試料汚染除去機構
DE112010005188B4 (de) * 2010-01-27 2016-04-07 Hitachi High-Technologies Corp. Vorrichtung zum Bestrahlen mit geladenen Teilchen
EP2555221B1 (en) 2011-08-03 2013-07-24 Fei Company Method of studying a sample in an ETEM

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102637571A (zh) * 2011-02-14 2012-08-15 Fei公司 用于带电粒子显微术中的检测方法

Also Published As

Publication number Publication date
JP2015037079A (ja) 2015-02-23
JP6192618B2 (ja) 2017-09-06
EP2838108A1 (en) 2015-02-18
CN104377104A (zh) 2015-02-25
EP2838109A1 (en) 2015-02-18
US9570270B2 (en) 2017-02-14
US20150041647A1 (en) 2015-02-12

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