CN104125718B - 垂直型基板剥离装置 - Google Patents
垂直型基板剥离装置 Download PDFInfo
- Publication number
- CN104125718B CN104125718B CN201310300816.1A CN201310300816A CN104125718B CN 104125718 B CN104125718 B CN 104125718B CN 201310300816 A CN201310300816 A CN 201310300816A CN 104125718 B CN104125718 B CN 104125718B
- Authority
- CN
- China
- Prior art keywords
- substrate
- stripping
- framework
- sides
- vertical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/12—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means capable of producing different kinds of discharge, e.g. either jet or spray
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2013-0046623 | 2013-04-26 | ||
KR1020130046623A KR101342616B1 (ko) | 2013-04-26 | 2013-04-26 | 수직형 기판 박리 시스템 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104125718A CN104125718A (zh) | 2014-10-29 |
CN104125718B true CN104125718B (zh) | 2017-05-03 |
Family
ID=49988558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310300816.1A Active CN104125718B (zh) | 2013-04-26 | 2013-07-17 | 垂直型基板剥离装置 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101342616B1 (ko) |
CN (1) | CN104125718B (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101615125B1 (ko) * | 2014-08-13 | 2016-04-25 | 제이엔케이히터(주) | 페이스트 정량 토출장치 |
CN108162598B (zh) * | 2017-12-26 | 2024-04-26 | 广东正业科技股份有限公司 | 一种喷印机及其喷头位置调整装置 |
CN108315749A (zh) * | 2018-03-16 | 2018-07-24 | 合肥汇通控股股份有限公司 | 一种金属材料处理系统 |
KR102172665B1 (ko) * | 2019-03-22 | 2020-11-03 | 주식회사 티케이씨 | 기판의 비접촉식 수직 처리시스템의 지그 이송장치 |
KR102150614B1 (ko) * | 2019-03-22 | 2020-09-02 | 주식회사 티케이씨 | 지그 검사장치를 갖는 기판의 비접촉식 수직 처리시스템 |
KR102172662B1 (ko) * | 2019-03-22 | 2020-11-03 | 주식회사 티케이씨 | 기판의 비접촉식 수직 처리시스템 |
KR102410120B1 (ko) * | 2020-09-14 | 2022-06-21 | 주식회사 티케이씨 | 얼룩현상을 개선한 기판의 수직처리시스템 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW391151B (en) * | 1996-12-03 | 2000-05-21 | Tokyo Kakoki Kk | Transmission processing unit |
CN1576961A (zh) * | 2003-07-18 | 2005-02-09 | 芝浦机械电子株式会社 | 基板的处理装置和处理方法 |
CN1962962A (zh) * | 2005-11-08 | 2007-05-16 | 上村工业株式会社 | 电镀槽 |
CN101441987A (zh) * | 2007-11-20 | 2009-05-27 | 细美事有限公司 | 基板清洗装置和方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2689097B2 (ja) * | 1995-04-20 | 1997-12-10 | 東京化工機株式会社 | プリント配線基板の搬送装置 |
JP4257897B2 (ja) * | 2003-05-23 | 2009-04-22 | 株式会社ケミトロン | メッキ装置 |
KR20110010965A (ko) * | 2009-07-27 | 2011-02-08 | 삼성전기주식회사 | 수직이송 지그 및 이를 이용한 습식에칭 설비 |
-
2013
- 2013-04-26 KR KR1020130046623A patent/KR101342616B1/ko active IP Right Grant
- 2013-07-17 CN CN201310300816.1A patent/CN104125718B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW391151B (en) * | 1996-12-03 | 2000-05-21 | Tokyo Kakoki Kk | Transmission processing unit |
CN1576961A (zh) * | 2003-07-18 | 2005-02-09 | 芝浦机械电子株式会社 | 基板的处理装置和处理方法 |
CN1962962A (zh) * | 2005-11-08 | 2007-05-16 | 上村工业株式会社 | 电镀槽 |
CN101441987A (zh) * | 2007-11-20 | 2009-05-27 | 细美事有限公司 | 基板清洗装置和方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101342616B1 (ko) | 2013-12-20 |
CN104125718A (zh) | 2014-10-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104125718B (zh) | 垂直型基板剥离装置 | |
CN1290707C (zh) | 液滴喷头的擦拭单元以及具备该单元的装置 | |
TWI250136B (en) | Glass plate surface etching method, glass plate etching apparatus, glass plate for flat panel display, and flat panel display | |
JP2003133691A (ja) | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 | |
JP5498886B2 (ja) | ドライフィルムレジストの薄膜化処理方法 | |
TW200422431A (en) | Surface treatment method, surface treatment device, surface treated plate, photoelectric device, electronic machine | |
JP4099489B2 (ja) | レジスト回収装置 | |
CN1534111A (zh) | 由废印刷电路板及含铜废液中回收铜金属的方法及其装置 | |
CN101545132A (zh) | 金属板电解蚀刻出图文的方法及其装置 | |
CN105314624B (zh) | 一种石墨烯的制备装置及其制备工艺 | |
CN101255012A (zh) | Tft lcd玻璃基板的蚀刻装置及其蚀刻方法 | |
CN1541050A (zh) | 图案形成方法及器件的制造方法、电光学装置和电子仪器 | |
KR101932629B1 (ko) | 유기 발광 다이오드의 마스크 세정조 내부의 이물질 제거 장치 및 제거 방법 | |
CN105297014A (zh) | 湿制程系统 | |
CN101051190A (zh) | 光致抗蚀剂剥离装置、再循环光致抗蚀剂剥离剂的方法 | |
CN211989907U (zh) | 一种蚀刻天线加工用水洗装置 | |
CN102909953A (zh) | 一种pcb打印机 | |
CN1780530A (zh) | 配线图案的形成方法、设备制造方法、设备及电光学装置 | |
CN110600396B (zh) | 用于移除遮罩清洁槽中的杂质的循环设备及方法 | |
CN110911307B (zh) | 处理装置、处理系统以及处理方法 | |
KR20140059480A (ko) | 엘씨디 유리기판 세정장치 | |
CN202022988U (zh) | Hdi线路板的微孔镀铜装置 | |
CN114150316A (zh) | 一种精密蚀刻模组及精密蚀刻装置及其装置的蚀刻工艺 | |
KR100823583B1 (ko) | 습식처리장치 | |
CN204982050U (zh) | 一种碱性蚀刻液氨气回收装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |