CN104069984B - 间歇涂敷装置以及涂膜形成系统 - Google Patents

间歇涂敷装置以及涂膜形成系统 Download PDF

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Publication number
CN104069984B
CN104069984B CN201410108277.6A CN201410108277A CN104069984B CN 104069984 B CN104069984 B CN 104069984B CN 201410108277 A CN201410108277 A CN 201410108277A CN 104069984 B CN104069984 B CN 104069984B
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CN
China
Prior art keywords
nozzle
coating liquid
valve
coating
intermittent application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201410108277.6A
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English (en)
Chinese (zh)
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CN104069984A (zh
Inventor
早川允规
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Publication of CN104069984A publication Critical patent/CN104069984A/zh
Application granted granted Critical
Publication of CN104069984B publication Critical patent/CN104069984B/zh
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1023Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to velocity of target, e.g. to web advancement rate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1039Recovery of excess liquid or other fluent material; Controlling means therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Coating Apparatus (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Inert Electrodes (AREA)
CN201410108277.6A 2013-03-27 2014-03-21 间歇涂敷装置以及涂膜形成系统 Active CN104069984B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013066322A JP6152287B2 (ja) 2013-03-27 2013-03-27 間欠塗工装置および塗膜形成システム
JP2013-066322 2013-03-27

Publications (2)

Publication Number Publication Date
CN104069984A CN104069984A (zh) 2014-10-01
CN104069984B true CN104069984B (zh) 2017-03-01

Family

ID=51591817

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410108277.6A Active CN104069984B (zh) 2013-03-27 2014-03-21 间歇涂敷装置以及涂膜形成系统

Country Status (4)

Country Link
JP (1) JP6152287B2 (ko)
KR (1) KR101671055B1 (ko)
CN (1) CN104069984B (ko)
TW (1) TWI520785B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6661401B2 (ja) * 2016-02-22 2020-03-11 株式会社Screenホールディングス 膜・電極接合体の製造装置
JP2020028863A (ja) * 2018-08-23 2020-02-27 東芝機械株式会社 間欠塗工方法および間欠塗工装置
JP7152930B2 (ja) * 2018-10-11 2022-10-13 株式会社Subaru シール材吐出ノズルおよびシール材吐出装置
CN112317258A (zh) * 2020-10-28 2021-02-05 江苏沙钢集团有限公司 一种涂油机的油滴滴落回收利用系统和方法
CN112871588A (zh) * 2021-01-11 2021-06-01 佛山市格锐特机械设备有限公司 一种电路板用感光干膜涂布生产线及其工艺流程

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2159414Y (zh) * 1993-07-23 1994-03-23 黄雨成 供水装置
CN1950156A (zh) * 2004-05-07 2007-04-18 富士胶片株式会社 涂敷装置以及涂敷方法
TWM420363U (en) * 2011-08-31 2012-01-11 Ching Huei Prec Co Ltd Intermittent ink supply system for slit coating head

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4938994A (en) * 1987-11-23 1990-07-03 Epicor Technology, Inc. Method and apparatus for patch coating printed circuit boards
JP4366757B2 (ja) * 1999-05-27 2009-11-18 東レ株式会社 塗布装置、塗布方法ならびにプラズマディスプレイまたはディスプレイ用部材の製造方法
JP2001149840A (ja) * 1999-11-24 2001-06-05 Sony Corp 塗布方法及び塗布装置
JP4419303B2 (ja) * 2000-09-27 2010-02-24 東レ株式会社 塗布装置および塗布方法、ならびにカラーフィルター製造装置および製造方法
JP4575103B2 (ja) * 2004-09-30 2010-11-04 大日本印刷株式会社 電極板の製造方法および製造装置
JP2008075537A (ja) * 2006-09-21 2008-04-03 Toray Ind Inc 脈動吸収装置、それを用いた塗布方法および塗布装置並びに液晶ディスプレイ用部材の製造方法
JP5083524B2 (ja) * 2007-08-21 2012-11-28 凸版印刷株式会社 ウェブ塗布装置
JP5565031B2 (ja) * 2010-03-29 2014-08-06 凸版印刷株式会社 両面間欠塗布装置
JP5757777B2 (ja) * 2011-04-15 2015-07-29 パナソニック株式会社 基板塗布方法及び基板塗布装置並びに同方法を用いた有機エレクトロルミネッセント素子の製造方法
CN202725432U (zh) * 2012-04-18 2013-02-13 嘉兴市博源涂布科技有限公司 一种间断涂布装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2159414Y (zh) * 1993-07-23 1994-03-23 黄雨成 供水装置
CN1950156A (zh) * 2004-05-07 2007-04-18 富士胶片株式会社 涂敷装置以及涂敷方法
TWM420363U (en) * 2011-08-31 2012-01-11 Ching Huei Prec Co Ltd Intermittent ink supply system for slit coating head

Also Published As

Publication number Publication date
TWI520785B (zh) 2016-02-11
KR101671055B1 (ko) 2016-10-31
TW201436872A (zh) 2014-10-01
CN104069984A (zh) 2014-10-01
KR20140118735A (ko) 2014-10-08
JP6152287B2 (ja) 2017-06-21
JP2014188447A (ja) 2014-10-06

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SE01 Entry into force of request for substantive examination
C53 Correction of patent of invention or patent application
CB02 Change of applicant information

Address after: Kyoto City, Kyoto Prefecture, Japan

Applicant after: DAINIPPON SCREEN MFG

Address before: Kyoto City, Kyoto Prefecture, Japan

Applicant before: Dainippon Screen Mfg. Co., Ltd.

COR Change of bibliographic data

Free format text: CORRECT: APPLICANT; FROM: DAINIPPON SCREEN MFG. CO., LTD. TO: SCREEN GROUP CO., LTD.

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