CN103926057A - Laser damage resistance testing system - Google Patents
Laser damage resistance testing system Download PDFInfo
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- CN103926057A CN103926057A CN201310563713.4A CN201310563713A CN103926057A CN 103926057 A CN103926057 A CN 103926057A CN 201310563713 A CN201310563713 A CN 201310563713A CN 103926057 A CN103926057 A CN 103926057A
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Abstract
The invention provides a laser damage resistance testing system which comprises a pulse laser, a first light barrier, a first polaroid, a first half wave plate, a first electronic control rotating table, a second light barrier, a second polaroid, an indicating light source, an electronic control zoom system, a first 45-degree partial reflecting mirror, a CCD facula analysis meter, a second 45-degree partial reflecting mirror, an energy meter, a photoelectric detector, a sample room, a monitoring camera, a third light barrier and a control system. Lasers are focused in the sample room, focused faculae can be adjusted continually through the control system, damage strength is formed, video real-time monitoring is available in the sample room so that a tester can monitor a threshold value point when a sample is damaged, the size of the faculae at the position of the sample is monitored in real time by the CCD facula analysis meter, a three-dimensional strength distribution diagram of the faculae is given, pulse energy is monitored in real time by the energy meter, the pulse width of the lasers is detected by the photoelectric detector in real time, real-time peak value power density is provided after detection data are processed through software, and the damage threshold value of the sample is detected accurately.
Description
Technical field:
The present invention relates to a kind of laser test system, the anti-system for testing damage of especially a kind of laser.
Background technology:
In the last few years, due to the great development of laser instrument, it was applied to increasing field gradually, and wherein high-power laser instrument is especially widely used.In laser instrument; because the high-energy of light beam often can cause the element of internal system; as destroyed in optical elements such as resonator mirror, lens, spectroscopes; owing to conventionally can having a large amount of optical device in Optical Maser System; generation and running that wherein each element can laser have close ties, in the time that wherein damage occurs any one parts, can cause laser beam quality to decline; output power declines, and even causes laser instrument not turn round.In some applications, as laser marking welding scanning etc., in the time that the output power of laser instrument is excessive, can be produced the sample of processing and be destroyed, therefore also need the damage from laser situation of workpiece to monitor, to determine that suitable power bracket carries out highly-efficient processing.In prior art, have several method for damage from laser, as transmission beam method, it sees through light by measurement, judges the degree of impairment on sample surface; Scattering method, it in the scattered light of sample surfaces generation, judges the degree of impairment on sample surface by Ear Mucosa Treated by He Ne Laser Irradiation; Photo-thermal method, the structure and the performance that produce sample due to laser action change, and by measuring its Photothermal Signals, judge the damage of sample.
In existing anti-damage proving installation, conventionally all by print surface is applied to certain power, judge whether it forms damage, but power can not change conventionally, judgment mode is single, causes the anti-degree of impairment of sample effectively accurately not judge.
Summary of the invention:
In order to realize accurate judgment threshold and anti-degree of impairment, the present invention proposes the anti-damage system of a kind of laser, it adopts power adjusting section, changes the power that incides sample.By electric control zooming system, and energy meter photodetector etc., measure in real time.Realize the anti-degree of impairment to sample threshold value, and the accurate judgement of damage threshold.
The technical solution adopted in the present invention is as follows:
The anti-system for testing damage of a kind of laser, it comprises: pulsed laser 1, the first light barrier 2, the first polaroid the 3, the 1 wave plate 4, the first automatically controlled universal stage 5, the second light barrier 6, the second polaroid 7, instruction light source 8, the 9, the 1 ° of partially reflecting mirror 10 of electric control zooming system, the 11, the 2 45 ° of partially reflecting mirror 12 of CCD hot spot analyser, energy meter 13, photodetector 14, setting-out chamber 15, monitoring camera 16, the 3rd light barrier 17, control system 18;
Annexation between each parts is:
Along optical axis direction, arrange successively with lower component: pulsed laser 1, the first polaroid 3,1/2 wave plate 4, the second polaroid 7, the 10, the 2 45 ° of partially reflecting mirror 12 of the 9, the 1 ° of partially reflecting mirror of electric control zooming system, setting-out chamber 15, monitoring camera 16, the 3rd light barrier 17;
The first automatically controlled universal stage 5 is controlled the anglec of rotation of the one 1/2 wave plate 4;
The first light barrier 2 and the second light barrier 6 lay respectively at a side of the first polaroid 3 and the second polaroid 7;
After inciding the second polaroid 7, the light that instruction light source 8 sends is reflected to electric control zooming system 9;
Incided on CCD hot spot analyser 11 by the one 45 ° of light that partially reflecting mirror 10 reflects;
Incided on energy meter 13 by the 2 45 ° of light that partially reflecting mirror 12 reflects;
Photodetector 14 is surveyed the pulse width of detection laser;
Monitoring camera 16 is monitored sample chamber;
Control system 18 is connected with automatically controlled universal stage 5, instruction light source 8, electric control zooming system 9, CCD hot spot analyser 11, energy meter 13, photodetector 14 and monitoring camera 16, to controlling with upper-part.
Brief description of the drawings:
Fig. 1: the anti-system for testing damage structural drawing of laser
In figure: 1. automatically controlled universal stage 6. second light barrier 7. second polaroids 8. of pulsed laser 2. first light barrier 3. first polaroid 4.1/2 wave plate 5. are indicated the 2 45 ° of partially reflecting mirror of the one 45 ° of partially reflecting mirror 11.CCD hot spot analyser 12. of light source 9. electric control zooming system 10. 13. energy meter 14. photodetector 15. setting-out chamber 16. monitoring cameras 17. the 3rd light barrier 18. control system
Embodiment:
Embodiment 1:
The anti-system for testing damage of laser comprises: pulsed laser 1, the first light barrier 2, the first polaroid the 3, the 1 wave plate 4, the first automatically controlled universal stage 5, the second light barrier 6, the second polaroid 7, instruction light source 8, the 9, the 1 ° of partially reflecting mirror 10 of electric control zooming system, the 11, the 2 45 ° of partially reflecting mirror 12 of CCD hot spot analyser, energy meter 13, photodetector 14, setting-out chamber 15, monitoring camera 16, the 3rd light barrier 17, control system 18.
Annexation between each parts is:
Along optical axis direction, arrange successively with lower component: pulsed laser 1, the first polaroid 3,1/2 wave plate 4, the second polaroid 7, the 10, the 2 45 ° of partially reflecting mirror 12 of the 9, the 1 ° of partially reflecting mirror of electric control zooming system, setting-out chamber 15, monitoring camera 16, the 3rd light barrier 17;
The first automatically controlled universal stage 5 is controlled the anglec of rotation of the one 1/2 wave plate 4;
The first light barrier 2 and the second light barrier 6 lay respectively at a side of the first polaroid 3 and the second polaroid 7;
After the light that sends of instruction light source 8 incides the second polaroid 7 and is reflected, with the transmission of laser same light path, until indicative function is played in setting-out chamber 15;
Incided on CCD hot spot analyser 11 by the one 45 ° of light that partially reflecting mirror 10 reflects;
Incided on energy meter 13 by the 2 45 ° of light that partially reflecting mirror 12 reflects;
Photodetector 14 is surveyed the pulse width of detection laser;
Monitoring camera 16 is monitored the sample in sample chamber;
Control system 18 is connected with pulsed laser 1, automatically controlled universal stage 5, instruction light source 8, electric control zooming system 9, CCD hot spot analyser 11, energy meter 13, photodetector 14 and monitoring camera 16 respectively, to controlling with upper-part.
Laser instrument is pulsed mode, polarization or unpolarized mode are exported, if it is inclined to one side by 3 of the first polaroids that Output of laser is nonpolarized light, produce polarized light, if be output as polarized light laser energy to produce less loss identical with the first polaroid 3 directions by the first polaroid 3, the second polaroids 7.
When the one 1/2 wave plate 4 optical axises are when identical with polaroid direction, laser is lossless passes through the second polaroid 7;
When the one 1/2 wave plate 4 optical axises are when vertical with polaroid direction, laser produces total reflection at the first polaroid 3 places, and laser is all reflected into the first light barrier 2;
In the time that the one 1/2 wave plate 4 optical axises fall between, laser sees through the energy of the second polaroid 7 and follows Bu Lvsi law;
The one 1/2 wave plate 4 is positioned on automatically controlled universal stage 5, and control system 18 is controlled automatically controlled universal stage 5, and the one 1/2 wave plate 4 is produced along rotating freely within the scope of 90 ° of laser incident directions, realizes the ascending or descending adjusting of laser-transmitting energy;
Light beam is after the second polaroid 7, and laser focuses at sample chamber place by zoom system, pancreatic system,
Incided on CCD hot spot analyser 11 by the one 45 ° of light that partially reflecting mirror 10 reflects, the one 45 ° of partially reflecting mirror 10 is d1 with the distance of CCD hot spot analyser 11, with the distance of setting-out chamber 15 be d2, meet d1d2, the spot size that CCD hot spot analyser 11 records is 15 places, setting-out chamber and acts on the spot size at sample place;
Incided on energy meter 13 by the 2 45 ° of light that partially reflecting mirror 12 reflects, in real time monitoring with measure laser and be incident to the energy size at sample place;
Control system 18 regulates continuously to focal beam spot, to produce the energy intensity of enough breakdown strengths;
Sample placement location three-dimensional is adjustable, and monitoring camera is monitored in real time to sample chamber, and transmits realtime graphic to control system, the threshold point while monitoring sample destruction for tester.
User can be according to actual needs, by electric control zooming system, hot spot is made as and specifies size, CCD hot spot analyser is monitored sample place spot size in real time, can give the three-dimensional intensity distribution figure of glossing up, energy meter is monitored pulse energy in real time, the pulse width of the real-time detection laser of photodetector, all detection data provide real-time peak power density after software is processed, and accurately survey the damage threshold of sample.
Embodiment 2:
Other structures are identical with embodiment 1, this anti-system for testing damage also comprises the 2 1/2 wave plate 19, and the second automatically controlled universal stage 20, between pulsed laser and electric control zooming system, has two 1/2 wave plates and two polaroids, along optical axis direction, its distribution mode is:
Pulsed laser, the 2 1/2 wave plate 19, the first polaroid the 3, the 1 wave plate 4 second polaroids 7, electric control zooming system 9 successively optical axis direction arrange, miscellaneous part with and arrange identical with the 1st embodiment.The second automatically controlled universal stage 20 is controlled the anglec of rotation of the 2 1/2 wave plate 19.
This structure can effectively be finely tuned the output power of laser instrument, realizes and makes the laser power density of final hot spot reach respectively about 0-100MW/cm
2, 0-200MW/cm
2, 0-300MW/cm
2, 0-400MW/cm
2, 0-500MW/cm
2five gears are adjustable continuously.
Claims (4)
1. the anti-system for testing damage of laser, is characterized in that, this system comprises:
Pulsed laser 1, the first light barrier 2, the first polaroid the 3, the 1 wave plate 4, the first automatically controlled universal stage 5, the second light barrier 6, the second polaroid 7, instruction light source 8, the 9, the 1 ° of partially reflecting mirror 10 of electric control zooming system, the 11, the 2 45 ° of partially reflecting mirror 12 of CCD hot spot analyser, energy meter 13, photodetector 14, setting-out chamber 15, monitoring camera 16, the 3rd light barrier 17, control system 18; Annexation between each parts is:
Along optical axis direction, arrange successively with lower component: pulsed laser 1, the first polaroid 3,1/2 wave plate 4, the second polaroid 7, the 10, the 2 45 ° of partially reflecting mirror 12 of the 9, the 1 ° of partially reflecting mirror of electric control zooming system, setting-out chamber 15, monitoring camera 16, the 3rd light barrier 17;
The first automatically controlled universal stage 5 is controlled the anglec of rotation of the one 1/2 wave plate 4;
The first light barrier 2 and the second light barrier 6 lay respectively at a side of the first polaroid 3 and the second polaroid 7;
After inciding the second polaroid 7, the light that instruction light source 8 sends is reflected to electric control zooming system 9;
Incided on CCD hot spot analyser 11 by the one 45 ° of light that partially reflecting mirror 10 reflects;
Incided on energy meter 13 by the 2 45 ° of light that partially reflecting mirror 12 reflects;
Photodetector 14 is surveyed the pulse width of detection laser;
Monitoring camera 16 is monitored sample chamber;
Control system 18 is connected with pulsed laser 1, automatically controlled universal stage 5, instruction light source 8, electric control zooming system 9, CCD hot spot analyser 11, energy meter 13, photodetector 14 and monitoring camera 16 respectively, to controlling with upper-part.
2. the anti-system for testing damage of a kind of laser according to claim 1, it is characterized in that: this system also comprises the 2 1/2 wave plate 19, and the second automatically controlled universal stage 20, before described the 2 1/2 wave plate 19 is arranged at described the first polaroid 3, the second automatically controlled universal stage 20 is controlled the anglec of rotation of the 2 1/2 wave plate 19.
3. the anti-system for testing damage of a kind of laser according to claim 1 and 2, is characterized in that: establishing the one 45 ° of partially reflecting mirror 10 is d1 with the distance of CCD hot spot analyser 11, with the distance of setting-out chamber 15 be d2, d1d2.
4. the anti-damage method of testing of laser, its right to use requires the anti-system for testing damage of laser described in 1-3 any one, it is characterized in that, and the method comprises:
The laser of laser instrument output is by the first polaroid 3, and by the one 1/2 wave plate 4, inciding, the second polaroid 7, the second polaroids 7 are identical with the first polaroid 3 directions afterwards;
When the one 1/2 wave plate 4 optical axises are when identical with polaroid direction, laser is lossless passes through the second polaroid 7;
When the one 1/2 wave plate 4 optical axises are when vertical with polaroid direction, laser produces total reflection at the first polaroid 3 places, and laser is all reflected into the first light barrier 2;
In the time that the one 1/2 wave plate 4 optical axises fall between, laser sees through the energy of the second polaroid 7 and follows Bu Lvsi law:
The one 1/2 wave plate 4 is positioned on automatically controlled universal stage 5, and control system 18 is controlled automatically controlled universal stage 5, and the one 1/2 wave plate 4 is produced along rotating freely within the scope of 90 ° of laser incident directions, realizes the ascending or descending adjusting of laser-transmitting energy;
Light beam is after the second polaroid 7, and laser focuses at sample chamber place by zoom system, pancreatic system, and control system 18 regulates continuously to focal beam spot, to produce the energy intensity of enough breakdown strengths;
Sample placement location three-dimensional is adjustable, and monitoring camera is monitored in real time to sample chamber, and transmits realtime graphic to control system, the threshold point while monitoring sample destruction for tester.
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| CN201310563713.4A CN103926057A (en) | 2013-11-14 | 2013-11-14 | Laser damage resistance testing system |
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| CN201310563713.4A CN103926057A (en) | 2013-11-14 | 2013-11-14 | Laser damage resistance testing system |
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Cited By (15)
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| CN105973897A (en) * | 2016-06-14 | 2016-09-28 | 中国工程物理研究院激光聚变研究中心 | Measuring device and method for geometric size distribution of needle damage loci of KDP crystal |
| CN106872415A (en) * | 2017-01-23 | 2017-06-20 | 中国科学院上海光学精密机械研究所 | With reference to the measurement apparatus and measuring method of the multi-wavelength sample optical limiting properties of micro-imaging |
| CN107271403A (en) * | 2016-04-07 | 2017-10-20 | 南京理工大学 | A kind of optical thin film LIDT test devices and method of testing based on light scattering |
| CN108318800A (en) * | 2017-12-30 | 2018-07-24 | 北京工业大学 | A kind of GaN base semiconductor laser chip detection device and method |
| CN109115466A (en) * | 2018-08-01 | 2019-01-01 | 苏州帕沃激光科技有限公司 | A kind of measurement method and its measuring device of laser beam quality factor M 2 |
| CN110487726A (en) * | 2019-09-17 | 2019-11-22 | 上海理工大学 | Fixed-point type laser damage threshold evaluation system |
| CN111504612A (en) * | 2020-04-30 | 2020-08-07 | 中国科学院空天信息创新研究院 | Testing arrangement of many light sources laser damage threshold value |
| CN112630983A (en) * | 2020-12-24 | 2021-04-09 | 中国工程物理研究院激光聚变研究中心 | Laser system, laser-induced damage testing system and method |
| CN112730433A (en) * | 2020-12-25 | 2021-04-30 | 中国工程物理研究院激光聚变研究中心 | Laser damage testing system and method |
| CN113203473A (en) * | 2021-04-19 | 2021-08-03 | 上海飞博激光科技有限公司 | Myriawatt-level laser power meter protection device and laser power test system |
| CN113484246A (en) * | 2021-07-06 | 2021-10-08 | 南开大学 | High-energy laser damage vacuum experiment system capable of measuring damage threshold |
| CN114440800A (en) * | 2022-01-24 | 2022-05-06 | 山东大学 | Method for accurately measuring effective area of light spot in laser damage threshold test |
| CN114486813A (en) * | 2021-12-31 | 2022-05-13 | 中国科学院空天信息创新研究院 | Device and method for testing laser damage threshold values in different polarization states |
| CN115266650A (en) * | 2022-09-30 | 2022-11-01 | 安徽创谱仪器科技有限公司 | Spectrophotometer system |
| CN118090161A (en) * | 2024-03-27 | 2024-05-28 | 中国航天三江集团有限公司 | Grating diffraction efficiency and tolerance testing device and method |
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| CN107271403A (en) * | 2016-04-07 | 2017-10-20 | 南京理工大学 | A kind of optical thin film LIDT test devices and method of testing based on light scattering |
| CN105973897B (en) * | 2016-06-14 | 2018-08-28 | 中国工程物理研究院激光聚变研究中心 | The measurement method of the needle-shaped impaired loci geometric dimension distribution of KDP crystal |
| CN105973897A (en) * | 2016-06-14 | 2016-09-28 | 中国工程物理研究院激光聚变研究中心 | Measuring device and method for geometric size distribution of needle damage loci of KDP crystal |
| CN106872415A (en) * | 2017-01-23 | 2017-06-20 | 中国科学院上海光学精密机械研究所 | With reference to the measurement apparatus and measuring method of the multi-wavelength sample optical limiting properties of micro-imaging |
| CN108318800A (en) * | 2017-12-30 | 2018-07-24 | 北京工业大学 | A kind of GaN base semiconductor laser chip detection device and method |
| CN108318800B (en) * | 2017-12-30 | 2020-06-26 | 北京工业大学 | GaN-based semiconductor laser chip detection device and method |
| CN109115466A (en) * | 2018-08-01 | 2019-01-01 | 苏州帕沃激光科技有限公司 | A kind of measurement method and its measuring device of laser beam quality factor M 2 |
| CN109115466B (en) * | 2018-08-01 | 2020-06-05 | 苏州帕沃激光科技有限公司 | Method and device for measuring laser beam quality factor M2 |
| CN110487726B (en) * | 2019-09-17 | 2021-11-19 | 上海理工大学 | Fixed-point laser damage threshold evaluation system |
| CN110487726A (en) * | 2019-09-17 | 2019-11-22 | 上海理工大学 | Fixed-point type laser damage threshold evaluation system |
| CN111504612B (en) * | 2020-04-30 | 2022-03-25 | 中国科学院空天信息创新研究院 | Testing arrangement of many light sources laser damage threshold value |
| CN111504612A (en) * | 2020-04-30 | 2020-08-07 | 中国科学院空天信息创新研究院 | Testing arrangement of many light sources laser damage threshold value |
| CN112630983A (en) * | 2020-12-24 | 2021-04-09 | 中国工程物理研究院激光聚变研究中心 | Laser system, laser-induced damage testing system and method |
| CN112730433A (en) * | 2020-12-25 | 2021-04-30 | 中国工程物理研究院激光聚变研究中心 | Laser damage testing system and method |
| CN113203473A (en) * | 2021-04-19 | 2021-08-03 | 上海飞博激光科技有限公司 | Myriawatt-level laser power meter protection device and laser power test system |
| CN113203473B (en) * | 2021-04-19 | 2022-06-21 | 上海飞博激光科技有限公司 | Myriawatt-level laser power meter protection device and laser power test system |
| CN113484246A (en) * | 2021-07-06 | 2021-10-08 | 南开大学 | High-energy laser damage vacuum experiment system capable of measuring damage threshold |
| CN114486813A (en) * | 2021-12-31 | 2022-05-13 | 中国科学院空天信息创新研究院 | Device and method for testing laser damage threshold values in different polarization states |
| CN114486813B (en) * | 2021-12-31 | 2023-08-04 | 中国科学院空天信息创新研究院 | Device and method for testing laser damage threshold values of different polarization states |
| CN114440800A (en) * | 2022-01-24 | 2022-05-06 | 山东大学 | Method for accurately measuring effective area of light spot in laser damage threshold test |
| CN115266650A (en) * | 2022-09-30 | 2022-11-01 | 安徽创谱仪器科技有限公司 | Spectrophotometer system |
| CN118090161A (en) * | 2024-03-27 | 2024-05-28 | 中国航天三江集团有限公司 | Grating diffraction efficiency and tolerance testing device and method |
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Application publication date: 20140716 |