CN206164747U - Measurement device for X ray framing camera exposure time - Google Patents
Measurement device for X ray framing camera exposure time Download PDFInfo
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- CN206164747U CN206164747U CN201621235121.5U CN201621235121U CN206164747U CN 206164747 U CN206164747 U CN 206164747U CN 201621235121 U CN201621235121 U CN 201621235121U CN 206164747 U CN206164747 U CN 206164747U
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- beamlet
- framing camera
- ray framing
- sequence
- ray
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Abstract
The utility model provides a measurement device for X ray framing camera exposure time, the device includes cuts apart delayer, etalon and vacuum cavity along light path direction series arrangement's laser instrument, light beam. The laser beam of laser instrument output is cut apart the delayer by the light beam and is split into the sequence beamlet I that waits space interval, equal time intervals, and normal incidence to etalon again changes that a series of optical path differences with the etalon are the same, the sequence beamlet II of light intensity taper into, and sequence beamlet II sees through the glass window of terminal surface before the vacuum cavity, shine the microstrip line negative pole of X ray framing camera on, the image that is made public after the gating forms images, acquisition exposure time. This measuring device has smallly, and is efficient, and the X ray framing camera that exposure time is less than 10ps can accurate be markd to measuring result advantage of easily seeing directly perceived, provides the basis for the diagnosis test data's of X ray framing camera processing and the check -up of theoretical procedure.
Description
Technical field
The utility model belongs to technical field of optical precision measurement, and in particular to a kind of X-ray framing camera time for exposure
Measurement apparatus.
Background technology
X-ray framing camera can provide several luminescence of plasma area images of two-dimensional space, time width a few nanoseconds,
Thus become one of most important diagnostic tool in the researchs such as laser inertial confinement fusion experiment.Light a fire what is tackled key problems in laser-produced fusion
On road, with the raising and the upgrading of target practice device of laser energy, fusion lights a fire experiments to diagnosing the requirement of precise treatment
More and more higher.Time for exposure, its measurement became diagnosis precise treatment with demarcation as the most important performance indications of X-ray framing camera
Important content.
In recent years, X-ray framing camera quickly grows, and its time resolution is lifted to 30ps very from original 100ps or so
To 5ps.In the past, the measurement of X-ray framing camera time for exposure typically adopts brief pulse UV laser large spot uniform irradiation X
Ray framing camera micro-strip line cathode, after collection dynamic gating image, according to the halfwidth of gain curve the time for exposure is read.When
Within the X ray framing camera time for exposure is rocked as 50ps for 100ps or so, trigger, this method is feasible.By
Determining that its triggering is rocked in the circuit theory of the gate pulse power supply of current X rays framing camera cannot be better than 50ps.And for
Time for exposure even reaches the X ray framing cameras of 5ps less than 50ps, if trigger is rocked more than 30ps, when laser irradiation
When on the micro-strip line cathode of X ray framing cameras, gate pulse may not also be reached or passed through, therefore the measurement side
The success rate that method adopts dynamic gating image is extremely low, can only lean on repeatedly attempt and take a chance.Generally, this method can only measure exposure
X-ray framing camera of the time more than 50ps, and measurement efficiency is extremely low.
The content of the invention
Technical problem to be solved in the utility model is to provide a kind of measurement dress of X-ray framing camera time for exposure
Put.
The measurement apparatus of X-ray framing camera time for exposure of the present utility model, are characterized in, including suitable along optical path direction
The laser instrument of sequence arrangement, light beam split delayer, etalon and vacuum cavity；The laser beam of described laser instrument output is irradiated to
On light beam segmentation delayer, the sequence beamlet I that delayer such as is divided at spatial separation, the constant duration is split by light beam；Sequence
To etalon, sequence beamlet I changes into a series of optical path difference phases with etalon to the normal incidence of row beamlet I Jing after etalon
The sequence beamlet II that same, light intensity gradually weakens, sequence beamlet II enters true through the glass window of vacuum cavity front end face
Cavity body, is irradiated on the micro-strip line cathode of X-ray framing camera；The rear end face of described vacuum cavity and X-ray framing phase
The front end face of machine is tightly connected by the vacuum sealing face with sealing ring；
The wavelength of the laser beam of described laser instrument output for X-ray framing camera response wave length, the pulsewidth of laser beam
Less than or equal to the 1/10 of the X-ray framing camera time for exposure, the spot diameter of laser beam is more than or equal to X-ray framing camera 5
The width of micro-strip line cathode；
The optical path difference of described etalon is more than or equal to 2 times of X-ray framing camera time for exposure；
The intensity of the beamlet of described sequence beamlet I is consistent, and the width of the beamlet of sequence beamlet I is less than or equal to
The 1/12 of the microstrip line Cathode width of X-ray framing camera；The space length of the adjacent beamlet of described sequence beamlet I is little
In the 1/7 of X-ray framing camera microstrip line Cathode width, the time interval of adjacent beamlet is less than or equal to X-ray framing camera
The 1/2 of time for exposure.
Described light beam segmentation delayer is transmitted light component.The optical element of described transmitted light component
It is shaped as cuboid or cylinder.Described transmitted light component is successively superimposed for transmissive optical element, and side to light is to wait light
The notch cuttype of path difference, the side to light coating transmitance identical transmission film of each optical element.
Described light beam segmentation delayer is reflective optic component.The optical element of described reflective optic component
Side to light is plane, cylinder or sphere.Described reflective optic component is successively superimposed for reflection type optical element, and side to light is
The notch cuttype of tilted-putted aplanatism difference, the side to light coating reflectivity identical reflectance coating of each optical element.
The measurement apparatus of X-ray framing camera time for exposure of the present utility model have small volume, efficiency high, measurement result
The advantage being intuitively clear to, can be less than the X-ray framing camera of 10ps the precision calibration time for exposure, be examining for X-ray framing camera
The process of disconnected test data and the verification of theoretical procedures provide foundation.
Description of the drawings
Fig. 1 is the structural representation of the measurement apparatus of X-ray framing camera time for exposure of the present utility model（Transmission-type）；
Fig. 2 is the light beam segmentation delayer knot in the measurement apparatus of X-ray framing camera time for exposure of the present utility model
Structure schematic diagram（Transmission-type notch cuttype）；
Fig. 3 be the X-ray framing camera time for exposure of the present utility model measurement apparatus in sequence beamlet I normal incidences arrive
The schematic diagram of sequence beamlet II is converted into after etalon；
Fig. 4 be the X-ray framing camera time for exposure of the present utility model measurement apparatus in sequence beamlet II along X-ray
The arrangement mode schematic diagram of framing camera micro-strip line cathode；
Fig. 5 is the structural representation of the measurement apparatus of X-ray framing camera time for exposure of the present utility model（It is reflective）；
Fig. 6 is the light beam segmentation delayer knot in the measurement apparatus of X-ray framing camera time for exposure of the present utility model
Structure schematic diagram（Reflective notch cuttype）；
In figure, 1. the light beam of laser instrument 2. splits the vacuum cavity 5.X ray framing cameras of 3. etalon of delayer 4..
Specific embodiment
Describe the utility model in detail with reference to the accompanying drawings and examples.
Embodiment 1
As shown in figure 1, the measurement apparatus of X-ray framing camera time for exposure of the present utility model, including along optical path direction
Tactic laser instrument 1, light beam segmentation delayer 2, etalon 3 and vacuum cavity 4；The laser beam of the output of the laser instrument 1
It is irradiated on light beam segmentation delayer 2, spatial separation, the sequence of constant duration is divided into etc. by light beam segmentation delayer 2
Light beam I；To etalon 3, sequence beamlet I changes into a series of and etalon 3 to the normal incidence of sequence beamlet I Jing after etalon 3
Optical path difference is identical, the sequence beamlet II that light intensity gradually weakens, glass of the sequence beamlet II through the front end face of vacuum cavity 4
Window, into vacuum cavity 4, and is irradiated on the micro-strip line cathode of X-ray framing camera 5；The rear end face of the vacuum cavity 4
It is tightly connected by the vacuum sealing face with sealing ring with the front end face of X-ray framing camera 5.
The wavelength of the laser beam of the described output of laser instrument 1 is 248nm, pulsewidth is 500fs, and spot diameter is 10mm.
As shown in Fig. 2 described light beam segmentation delayer 2 is transmitted light component, by the transmitted light of cuboid
Element is successively superimposed, and side to light is the notch cuttype of aplanatism difference, and the side to light coating transmitance identical of each optical element is saturating
Penetrate film.
The laser beam that laser instrument 1 is produced is irradiated to the side to light that light beam splits delayer 2.Light beam segmentation delayer 2 will swash
Light beam is divided into consistent, the single beam width of intensity and is less than or equal to the 1/12 of X-ray framing camera microstrip line Cathode width, adjacent sub-light
Sequence beamlet I of the space length of beam less than or equal to the 1/7 of X-ray framing camera microstrip line Cathode width.As shown in figure 3,
The normal incidence of sequence beamlet I obtains a series of sequence that, light intensity identical with the optical path difference of etalon 3 gradually weaken to after etalon 3
Row beamlet II, subsequently into vacuum cavity 4, so as to form as shown in Figure 4 on the micro-strip line cathode of X-ray framing camera 5
Etc. spatial separation, constant duration, equicohesive sequence delays hot spot.According to the gate pulse power supply of X-ray framing camera 5
The difference of inherent delay time and optical path delayed time, during the trigger delay of the gate pulse power supply that X-ray framing camera 5 is set
Between, then in gate pulse during the microstrip line cathode transport, X rays framing camera can be to certain of the outgoing of etalon 3
Sequence beamlet II enters Mobile state gated imaging and records, by be recorded number of spots, hot spot time interval and hot spot into
The strength distribution of picture, obtains the time for exposure of X-ray framing camera 5.
Design light beam splits the optical path difference of the transmissive optical element of delayer 2, and the single beam width for making sequence beamlet I is
0.5mm, the space length of adjacent beamlet is 0.8mm, and the time interval of adjacent beamlet is 2.5ps.The light of design standard tool 3
Path difference is 20ps.The normal incidence of sequence beamlet I of time interval 2.5ps, will be from the multigroup quilt of the outgoing of etalon 3 to after etalon 3
Postpone the sequence beamlet II of 20ps successively, the time interval of the adjacent beamlet in every group of sequence beamlet II keeps 2.5ps
It is constant.Sequence beamlet II is transversely arranged for the micro-strip line cathode of 6mm along the width of X-ray framing camera 5, calculates X-ray point
The gate pulse power supply inherent delay time of width camera 5 and the difference of optical path delayed time, arrange the choosing of X-ray framing camera 5
The trigger delay time of pulse current source, then the gate pulse of X-ray framing camera 5 always can be with a certain group of sequence beamlet II
Micro-strip line cathode is synchronously arrived at, so as to be obtained the exposure of 7 time intervals 2.5ps after the gated imaging of X-ray framing camera 5
Point, according to the maximum intensity fitting of 7 exposure points technical chart is obtained, and the halfwidth of technical chart is the time for exposure, therefore X is penetrated
The time for exposure of line framing camera 5 is 5ps.The number of spots that is exposed is more, beam time interval is less, then certainty of measurement is got over
It is high.Because the time interval for being split the sequence beamlet after delayer 2 is split by light beam is equal, according to the power of exposure point
Can directly read the time for exposure is about 2.5ps × 2=5ps.There is certain error in the mode of directly reading.
The cuboid of the transmissive optical element of light beam segmentation delayer 2 can be replaced cylinder.
Embodiment 2
As shown in figure 5, the measurement apparatus of X-ray framing camera time for exposure of the present utility model, including along optical path direction
Tactic laser instrument 1, light beam segmentation delayer 2, etalon 3 and vacuum cavity 4；The laser beam of the output of the laser instrument 1
It is irradiated on light beam segmentation delayer 2, spatial separation, the sequence of constant duration is divided into etc. by light beam segmentation delayer 2
Light beam I；To etalon 3, sequence beamlet I changes into a series of and etalon 3 to the normal incidence of sequence beamlet I Jing after etalon 3
Optical path difference is identical, the sequence beamlet II that light intensity gradually weakens, glass of the sequence beamlet II through the front end face of vacuum cavity 4
Window, into vacuum cavity 4, and is irradiated on the micro-strip line cathode of X-ray framing camera 5；The rear end face of the vacuum cavity 4
It is tightly connected by the vacuum sealing face with sealing ring with the front end face of X-ray framing camera 5.
The wavelength of the laser beam of the described output of laser instrument 1 is 248nm, pulsewidth is 500fs, and spot diameter is 10mm.
As shown in fig. 6, described light beam segmentation delayer 2 is reflective optic component, by the optics that side to light is plane
Element is successively superimposed, and side to light is the notch cuttype of aplanatism difference, and the side to light coating reflectivity identical of each optical element is anti-
Penetrate film.
The laser beam that laser instrument 1 is produced is irradiated to the side to light that light beam splits delayer 2.Light beam segmentation delayer 2 will swash
Light beam is divided into consistent, the single beam width of intensity and is less than or equal to the 1/12 of X-ray framing camera microstrip line Cathode width, adjacent sub-light
Sequence beamlet I of the space length of beam less than or equal to the 1/7 of X-ray framing camera microstrip line Cathode width.As shown in figure 3,
The normal incidence of sequence beamlet I obtains a series of sequence that, light intensity identical with the optical path difference of etalon 3 gradually weaken to after etalon 3
Row beamlet II, subsequently into vacuum cavity 4, so as to form as shown in Figure 4 on the micro-strip line cathode of X-ray framing camera 5
Etc. spatial separation, constant duration, equicohesive sequence delays hot spot.According to the gate pulse power supply of X-ray framing camera 5
The difference of inherent delay time and optical path delayed time, during the trigger delay of the gate pulse power supply that X-ray framing camera 5 is set
Between, then in gate pulse during the microstrip line cathode transport, X rays framing camera can be to certain of the outgoing of etalon 3
Sequence beamlet II enters Mobile state gated imaging and records, by be recorded number of spots, hot spot time interval and hot spot into
The strength distribution of picture, obtains the time for exposure of X-ray framing camera 5.
Design light beam splits the optical path difference of the reflection type optical element of delayer 2, and the single beam width for making sequence beamlet I is
0.5mm, the space length of adjacent beamlet is 0.8mm, and the time interval of adjacent beamlet is 2.5ps.The light of design standard tool 3
Path difference is 20ps.The normal incidence of sequence beamlet I of time interval 2.5ps, will be from the multigroup quilt of the outgoing of etalon 3 to after etalon 3
Postpone the sequence beamlet II of 20ps successively, the time interval of the adjacent beamlet in every group of sequence beamlet II keeps 2.5ps
It is constant.Sequence beamlet II is transversely arranged for the micro-strip line cathode of 6mm along the width of X-ray framing camera 5, calculates X-ray point
The gate pulse power supply inherent delay time of width camera 5 and the difference of optical path delayed time, arrange the choosing of X-ray framing camera 5
The trigger delay time of pulse current source, then the gate pulse of X-ray framing camera 5 always can be with a certain group of sequence beamlet II
Micro-strip line cathode is synchronously arrived at, so as to be obtained the exposure of 7 time intervals 2.5ps after the gated imaging of X-ray framing camera 5
Point, according to the maximum intensity fitting of 7 exposure points technical chart is obtained, and the halfwidth of technical chart is the time for exposure, therefore X is penetrated
The time for exposure of line framing camera 5 is 5ps.The number of spots that is exposed is more, beam time interval is less, then certainty of measurement is got over
It is high.Because the time interval for being split the sequence beamlet after delayer 2 is split by light beam is equal, according to the power of exposure point
Can directly read the time for exposure is about 2.5ps × 2=5ps.There is certain error in the mode of directly reading.
The side to light of the reflection type optical element of light beam segmentation delayer 2 can be replaced with the cylinder of focusing effect by plane
Or sphere.
The utility model is not limited to above-mentioned specific embodiment, and person of ordinary skill in the field visualizes from above-mentioned
Send out, without performing creative labour, done a variety of conversion, all fall within protection domain of the present utility model.
Claims (7)
1. a kind of measurement apparatus of X-ray framing camera time for exposure, it is characterised in that include tactic along optical path direction
Laser instrument（1）, light beam segmentation delayer（2）, etalon（3）And vacuum cavity（4）；Described laser instrument（1）The laser of output
Beam is irradiated to light beam segmentation delayer（2）On, delayer is split by light beam（2）Spatial separation, the constant duration such as it is divided into
Sequence beamlet I；The normal incidence of sequence beamlet I is to etalon（3）, Jing etalons（3）Afterwards sequence beamlet I changes into a series of
With etalon（3）Optical path difference is identical, the sequence beamlet II that light intensity gradually weakens, sequence beamlet II passes through vacuum cavity
（4）The glass window of front end face, into vacuum cavity（4）, it is irradiated to X-ray framing camera（5）Micro-strip line cathode on；It is described
Vacuum cavity（4）Rear end face and X-ray framing camera（5）Front end face connected by the sealing of vacuum sealing face with sealing ring
Connect；
Described laser instrument（1）The wavelength of the laser beam of output is X-ray framing camera（5）Response wave length, the arteries and veins of laser beam
Width is less than or equal to X-ray framing camera（4）The 1/10 of time for exposure, the spot diameter of laser beam is more than or equal to X-ray framing phase
The width of the micro-strip line cathode of machine 5；
Described etalon（3）Optical path difference more than or equal to 2 times of the X-ray framing camera time for exposure；
The intensity of the beamlet of described sequence beamlet I is consistent, and the width of the beamlet of sequence beamlet I is penetrated less than or equal to X
Line framing camera（5）Microstrip line Cathode width 1/12；The space length of the adjacent beamlet of described sequence beamlet I is little
In the 1/7 of X-ray framing camera microstrip line Cathode width, the time interval of adjacent beamlet is less than or equal to X-ray framing camera
The 1/2 of time for exposure.
2. measurement apparatus of X-ray framing camera time for exposure according to claim 1, it is characterised in that：Described light
Beam splits delayer（2）For transmitted light component.
3. measurement apparatus of X-ray framing camera time for exposure according to claim 2, it is characterised in that：Described is saturating
The optical element for penetrating formula optical module is shaped as cuboid or cylinder.
4. measurement apparatus of X-ray framing camera time for exposure according to claim 2, it is characterised in that：Described is saturating
Penetrate formula optical module to be successively superimposed for transmissive optical element, side to light is the notch cuttype of aplanatism difference, each optical element
Side to light coats transmitance identical transmission film.
5. measurement apparatus of X-ray framing camera time for exposure according to claim 1, it is characterised in that：Described light
Beam splits delayer（2）For reflective optic component.
6. measurement apparatus of X-ray framing camera time for exposure according to claim 5, it is characterised in that：Described is anti-
The side to light for penetrating the optical element of formula optical module is plane, cylinder or sphere.
7. measurement apparatus of X-ray framing camera time for exposure according to claim 5, it is characterised in that：Described is anti-
Penetrate formula optical module to be successively superimposed for reflection type optical element, side to light is the notch cuttype of tilted-putted aplanatism difference, each
The side to light coating reflectivity identical reflectance coating of optical element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621235121.5U CN206164747U (en) | 2016-11-18 | 2016-11-18 | Measurement device for X ray framing camera exposure time |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621235121.5U CN206164747U (en) | 2016-11-18 | 2016-11-18 | Measurement device for X ray framing camera exposure time |
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| Publication Number | Publication Date |
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| CN206164747U true CN206164747U (en) | 2017-05-10 |
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ID=58660536
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621235121.5U Withdrawn - After Issue CN206164747U (en) | 2016-11-18 | 2016-11-18 | Measurement device for X ray framing camera exposure time |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106454334A (en) * | 2016-11-18 | 2017-02-22 | 中国工程物理研究院激光聚变研究中心 | Device for measuring exposure time of X-ray framing camera |
| CN108900834A (en) * | 2018-07-25 | 2018-11-27 | 南京富锐光电科技有限公司 | A kind of high speed camera time for exposure and lose frame measuring device and method |
| CN113251941A (en) * | 2021-06-17 | 2021-08-13 | 中国矿业大学(北京) | Ultrafast digital speckle system based on pulse laser and experimental method |
-
2016
- 2016-11-18 CN CN201621235121.5U patent/CN206164747U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106454334A (en) * | 2016-11-18 | 2017-02-22 | 中国工程物理研究院激光聚变研究中心 | Device for measuring exposure time of X-ray framing camera |
| CN108900834A (en) * | 2018-07-25 | 2018-11-27 | 南京富锐光电科技有限公司 | A kind of high speed camera time for exposure and lose frame measuring device and method |
| CN113251941A (en) * | 2021-06-17 | 2021-08-13 | 中国矿业大学(北京) | Ultrafast digital speckle system based on pulse laser and experimental method |
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Granted publication date: 20170510 Effective date of abandoning: 20180629 |