CN103900493B - Micro-nano structure topography measurement device and method based on digital scan white light interference - Google Patents
Micro-nano structure topography measurement device and method based on digital scan white light interference Download PDFInfo
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Abstract
A kind of micro-nano structure topography measurement device and method based on digital scan white light interference of the present invention, utilize by digital micromirror array, image-generating unit, semi-transparent semi-reflecting lens, white light source, interfere microcobjective, object under test, work stage, control unit, spectrogrph, optical fiber, the device of optic fiber coupling unit composition, white light is projected the reference mirror surface within object under test surface and interference microscope by semi-transparent semi-reflecting lens by beam-expanding collimation white light respectively and reflects light and interfere, again through semi-transparent semi-reflecting lens, obtain interference light intensity imaged cell imaging to digital micromirror array surface；Control the pixel correspondence micro mirror deflection angle of digital micromirror array one by one, different pixels correspondence interference light intensity is made to enter optic fiber coupling unit one by one, spectrogrph obtains the incoming control unit of spectral information corresponding to interference light intensity and the spectral distribution that interference light intensity is corresponding is carried out Phase-Resolved Analysis, tries to achieve object under test surface relative altitude.Present configuration simplifies, and certainty of measurement is high, capacity of resisting disturbance is strong.
Description
Technical field
The invention belongs to optical precision detection technique field, relate to a kind of optical non-contact measurement side
Method, the measurement apparatus of a kind of micro-nano structure surface looks based on white light frequency-domain analysis and side
Method.
Background technology
Along with the extensive application of the micro-nano devices such as MEMS, for ensureing device performance, to micro-nano structure
Topography proposes the highest requirement.In existing microstructure appearance measurement technology, white light is done
The technology that relates to is big by its measurement scope, precision advantages of higher becomes mainstream technology.But, existing
The technology measured micro-nano structure pattern based on white light interference theory, mostly by z to movement
The mode such as work stage or interference microscope, measuring targets carries out z scanning upwards, by judging
Light intensity maximum in scanning process, it is achieved the detection of measuring targets relative altitude.Existing measurement side
Method precision is relatively big to drive mechanism location precision by z, and using light intensity as detected object,
Exist easily by problems such as external environment veiling glare and object under test surface refractive index change are affected.
Summary of the invention
(1) problem of technology to be solved
It is an object of the invention to solving the problem that existing white light interferometric technology exists, it is provided that
A kind of without carrying out z to scanning, and have high anti-jamming capacity and high measurement accuracy based on white light
The micro-nano structure topography measurement device and method of principle of interference.
(2) technical scheme
For realizing the purpose of the present invention, first aspect present invention, it is provided that a kind of white based on digital scan
The micro-nano structure topography measurement device of the interference of light, this device includes: digital micromirror array, imaging list
Unit, semi-transparent semi-reflecting lens, white light source, interference microcobjective, object under test, work stage, control
Unit, spectrogrph, optical fiber, optic fiber coupling unit；Wherein: digital micromirror array, image-generating unit,
Semi-transparent semi-reflecting lens, interference microcobjective and object under test are sequentially positioned at micro-nano structure topography measurement device
Optical axis on；Digital micromirror array between image-generating unit and optic fiber coupling unit, digital micro-mirror
There is between surface and the optical axis of optic fiber coupling unit of array an angle, and the imaging of image-generating unit
Face is mutually perpendicular to the coupling surface of optic fiber coupling unit；Semi-transparent semi-reflecting of semi-transparent semi-reflecting lens and interference
There is between the optical axis of microcobjective an angle；The collimated light beam of white light source output is micro-with interference
The optical axis of object lens is vertical；Object under test is located on the imaging surface interfering microcobjective；Determinand position
In work stage；The data terminal of control unit is connected with the data terminal of spectrogrph；The two ends of optical fiber are divided
The data terminal of the outfan and spectrogrph that do not connect optic fiber coupling unit connects；Optic fiber coupling unit
Coupling surface is positioned on the output beam of digital micromirror array；The white light that light source sends is through beam-expanding collimation
After, being projected on interference microcobjective by semi-transparent semi-reflecting lens, white light is thrown by interference microscope respectively
Be mapped to the reference mirror surface within object under test surface and interference microscope, make object under test surface and
The reflection light on reference mirror surface interferes, and again passes by semi-transparent semi-reflecting lens, it is thus achieved that interference light intensity is also
After imaged unit, imaging is to the surface of digital micromirror array；Control digital micromirror array pixel one by one
Corresponding micro mirror deflection angle, it is single that the interference light intensity making different pixels corresponding enters optical fiber coupling one by one
Unit, spectrogrph receives and obtains the spectral information that interference light intensity is corresponding, and incoming control unit is carried out
Spectral distribution Phase-Resolved Analysis, it is achieved to pixel correspondence determinand body surface each on digital micromirror array
The detection of face relative altitude.
For realizing the purpose of the present invention, second aspect present invention, it is provided that a kind of white based on digital scan
The micro-nano structure topography measurement method of the interference of light is adopted the technical scheme that: the white light that light source sends
After beam-expanding collimation, projecting on interference microcobjective by semi-transparent semi-reflecting lens, interference microscope will
White light projects the reference mirror surface within object under test surface and interference microscope respectively, makes to be measured
The reflection light on body surface and reference mirror surface interferes, and again passes by semi-transparent semi-reflecting lens, it is thus achieved that
After interference light intensity imaged unit, imaging is to the surface of digital micromirror array；Control numeral one by one micro-
The pixel correspondence micro mirror deflection angle of lens array, the interference light intensity making different pixels corresponding enters one by one
Optic fiber coupling unit, spectrogrph obtains the spectral information that interference light intensity is corresponding, and incoming control unit is also
The spectral distribution that interference light intensity is corresponding is carried out Phase-Resolved Analysis, it is achieved to each on digital micromirror array
The detection of pixel correspondence object under test surface relative altitude.
Preferred embodiment, each micro mirror deflection angle of described control digital micromirror array is to control numeral
The deflection angle of a certain pixel correspondence micro mirror of micro mirror array, makes to be projected on digital micromirror array
Interference light intensity enters optic fiber coupling unit.
Preferred embodiment, described micro-nano structure topography measurement method based on digital scan white light interference,
Also include: utilize work stage to drive object under test to do the motion of x, y direction plane, measuring targets
Zones of different detects, and realizes large scale object under test apparent height by data splicing and measures.
Preferred embodiment, described spectral distribution Phase-Resolved Analysis be use phase shift method, fourier transform method,
One in Wavelet Transform.
Preferred embodiment, uses described spectral distribution to carry out Phase-Resolved Analysis and obtains the step of object height
Including: the wavelength of described spectral distribution is λ value, and its corresponding phase value is φ, to 2 π/λ, φ
Carrying out first order matching, it is thus achieved that phase value relation, φ=2 π k/ λ, fitting parameter k is this light
The height of Spectral structure correspondence object under test.
Preferred embodiment, the work stage placing object under test is passed through electric or hand in two dimensional surface
Mode arbitrarily moves freely.
Preferred embodiment, described digital micromirror array can be controlled by control unit 8, control
Unit can directly control the deflection angle of each pixel cell correspondence micro mirror on digital micromirror array.
Preferred embodiment, described first order matching uses method of least square optimized algorithm, B-spline excellent
Change algorithm, the one intended in Newton optimization algorithm.
(3) beneficial effect
The present invention is by being analyzed realizing measuring targets to the spectral information of white light interference light intensity
The detection of height, reduces the impact on certainty of measurement such as external stray light, improves detecting system
Capacity of resisting disturbance.Further, the method to scanning, can complete measuring targets height without z
Detection, simplifies system structure, improves measuring speed, eliminate z to position error to measurement
The impact of precision.
Accompanying drawing explanation
Fig. 1 is the knot of present invention micro-nano structure based on digital scan white light interference topography measurement device
Structure schematic diagram；
Fig. 2 is the spectral distribution schematic diagram of interference light intensity.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with specifically
Embodiment, and referring to the drawings, the present invention is described in more detail.
It is present invention micro-nano structure based on digital scan white light interference topography measurement as shown in Figure 1
Apparatus structure schematic diagram, digital micromirror array (DMD) 1, image-generating unit 2, semi-transparent semi-reflecting lens 3,
White light source 4, interference microcobjective 5, object under test 6, work stage 7, control unit 8, light
Spectrometer 9, optical fiber 10, optic fiber coupling unit 11；Digital micromirror array 1, image-generating unit 2, half
Semi-reflective mirror 3, interference microcobjective 5 and object under test 6 are sequentially positioned at micro-nano structure topography measurement thoroughly
On the optical axis of device；Digital micromirror array 1 between image-generating unit 2 and optic fiber coupling unit 11,
There are between surface and the optical axis of optic fiber coupling unit 11 of digital micromirror array 1 33 ° ± 5 ° angles
Degree, and the coupling surface of the imaging surface of image-generating unit 2 and optic fiber coupling unit 11 is mutually perpendicular to；Semi-transparent
Between semi-transparent semi-reflecting and the optical axis interfering microcobjective 5 of semi-reflective mirror 3, there is 45° angle degree；In vain
The collimated light beam of radiant 4 output is vertical with the optical axis interfering microcobjective 5；Object under test 6 sets
On the imaging surface interfering microcobjective 5；Object under test 6 is positioned in work stage 7；Control unit
The data terminal of 8 is connected with the data terminal of spectrogrph 9；The two ends of optical fiber 10 connect optical fiber coupling respectively
The outfan of unit 11 and the data terminal of spectrogrph 9 connect；The coupling surface of optic fiber coupling unit 11
It is positioned on the output beam of digital micromirror array 1.
Utilize the micro-nano structure topography measurement device based on digital scan white light interference shown in Fig. 1,
Realize light that micro-nano structure topography measurement method comprises the following steps that white light source 4 sends through expanding
After collimation, project on interference microcobjective 5 by semi-transparent semi-reflecting lens 3, by interfering microcobjective
Incident illumination is divided into two bundles, a branch of surface being imaged onto object under test 6 by 5, and another bundle is imaged onto dry
Relate to the internal reference mirror surface of microcobjective 5.This two-beam respectively through object under test 6 surface with
And interfere, after again passing by semi-transparent semi-reflecting lens 3 after the reflection of reference mirror surface, it is thus achieved that interfere light
By force；By image-generating unit 2, interference light intensity is imaged onto the surface of digital micromirror array 1, by controlling
The deflection angle of the micro mirror that unit 8 is corresponding to pixel a certain on digital micromirror array 1 is controlled,
The interference light intensity making this micro mirror surfaces enters optic fiber coupling unit 11, and is transmitted to light by optical fiber 10
Spectrometer 9, spectrogrph 9 obtains the spectral information that this interference light intensity is corresponding, and incoming control unit 8
And the spectral distribution that interference light intensity is corresponding is carried out Phase-Resolved Analysis, thus obtain object under test surface phase
To height.
Make the object under test 6 that on now digital micromirror array 1, a certain pixel interference light intensity is corresponding
Optical path difference between the internal reference mirror of surface and interference microscope 5 is d, and now spectrogrph 9 obtains
The signal I (λ) obtained can be expressed as:
Wherein λ is wavelength, I0(λ) being background spectrum distribution, M (λ) is different wave length modulation degree, light
Spectral structure is as shown.
Now, PHASE DISTRIBUTION φ (λ) utilizing Fourier transformation to obtain spectral distribution is expressed as:
Now, if the wavelength of spectral distribution is λ, its corresponding phase value is φ, to 2 π/λ, φ
Carrying out first order matching, the function corresponding relation tried to achieve between φ (λ) and 2 π/λ is expressed as:
Contrast expression formula (2), (3), the first order matching in the first order expression formula now obtained
Coefficient k, is the light between the surface of object under test 6 and the internal reference mirror of interference microscope 5
Path difference is that d is this spectral distribution correspondence object under test height.
Pixel each on digital micromirror array 1 is controlled so that it is micro mirror correspondence interfere light by
One enters optic fiber coupling unit 11 and is received by spectrogrph, it is thus achieved that each digital micromirror array 1 pixel
Between object under test surface and the internal reference mirror of interference microscope 5 that on point, interference light intensity is corresponding
Optical path difference, and then complete the detection of the surface topography of measuring targets 6.
Utilize work stage 7 to drive object under test 6 to move in x/y plane, use said method,
The zones of different of measuring targets 6 measures respectively, realizes large scale by data splicing means
Body surface elevation carrection.
Such as the spectral distribution schematic diagram that Fig. 2 is interference light intensity, it is illustrated that object under test 6 surface is with dry
The reflection light relating to the reference mirror surface within microscope 5 interferes, and generates interference light intensity, passes through
The interference light intensity obtaining spectrogrph 9 carries out spectral distribution Phase-Resolved Analysis, and then obtains digital micro-mirror
The height of the surface point of the object under test 6 that the interference light intensity on the current deflected micromirror of array 1 carries
Information.
The content that the present invention does not elaborates is the common knowledge of those skilled in the art.
The foregoing is only the present invention is embodied as example, is not limited to the present invention.All
Any amendment made within the spirit and principles in the present invention, equivalent or improvement etc., all should
Within being included in protection scope of the present invention.
Claims (8)
1. a micro-nano structure topography measurement device based on digital scan white light interference, this device
Including digital micromirror array, image-generating unit, semi-transparent semi-reflecting lens, white light source, interference microcobjective,
Object under test, work stage, control unit, spectrogrph, optical fiber, optic fiber coupling unit；Wherein:
Digital micromirror array, image-generating unit, semi-transparent semi-reflecting lens, interference microcobjective and object under test are sequentially
It is positioned on the optical axis of micro-nano structure topography measurement device；Digital micromirror array is positioned at image-generating unit and light
Between fine coupling unit, there are between digital micromirror array surface and optic fiber coupling unit optical axis 33 °
± 5 ° of angles, and the coupling surface of the imaging surface of image-generating unit and optic fiber coupling unit is mutually perpendicular to；
Between semi-transparent semi-reflecting and the optical axis interfering microcobjective of semi-transparent semi-reflecting lens, there is 45° angle degree；In vain
The collimated light beam of radiant output is vertical with the optical axis interfering microcobjective；Object under test is located at interference
On the imaging surface of microcobjective；Object under test is positioned in work stage；The data terminal of control unit and light
The data terminal of spectrometer connects；The two ends of optical fiber connect outfan and the spectrum of optic fiber coupling unit respectively
The data terminal of instrument；The coupling surface of optic fiber coupling unit is positioned on the output beam of digital micromirror array；
The white light that light source sends, after beam-expanding collimation, projects interference microcobjective by semi-transparent semi-reflecting lens
On, white light is projected the ginseng within object under test surface and interference microscope by interference microscope respectively
Examine mirror surface, make the reflection light on object under test surface and reference mirror surface interfere, again pass by
Semi-transparent semi-reflecting lens, it is thus achieved that after interference light intensity imaged unit, imaging is to the table of digital micromirror array
Face；Control digital micromirror array pixel correspondence micro mirror deflection angle one by one, make different pixels corresponding
Interference light intensity enters optic fiber coupling unit one by one, and spectrogrph receives and obtain the light that interference light intensity is corresponding
Spectrum information, and incoming control unit carries out spectral distribution Phase-Resolved Analysis, it is achieved to digital micromirror array
The detection of upper each pixel correspondence object under test surface relative altitude.
2. one kind uses profit to require micro-nano structure pattern based on digital scan white light interference survey described in 1
The micro-nano structure topography measurement method of amount device, it is characterised in that: the white light that light source sends is through expanding
After collimation, being projected on interference microcobjective by semi-transparent semi-reflecting lens, white light is divided by interference microscope
Do not project the reference mirror surface within object under test surface and interference microscope, make determinand body surface
The reflection light on face and reference mirror surface interferes, and again passes by semi-transparent semi-reflecting lens, it is thus achieved that interfere light
After strong and imaged unit, imaging is to the surface of digital micromirror array；Control digital micromirror array one by one
Pixel correspondence micro mirror deflection angle, the interference light intensity making different pixels corresponding enters optical fiber coupling one by one
Closing unit, spectrogrph obtains spectral information corresponding to interference light intensity, incoming control unit to interference
Spectral distribution corresponding to light intensity carries out Phase-Resolved Analysis, it is achieved to pixel each on digital micromirror array
The detection of corresponding object under test surface relative altitude.
Micro-nano structure topography measurement based on digital scan white light interference the most according to claim 2
The micro-nano structure topography measurement method of device, it is characterised in that: also include: utilize work stage to drive
Object under test does the motion of x, y direction plane, and measuring targets zones of different detects, and passes through
Data splicing realizes large scale object under test apparent height and measures.
Micro-nano structure topography measurement based on digital scan white light interference the most according to claim 2
The micro-nano structure topography measurement method of device, it is characterised in that: described spectral distribution Phase-Resolved Analysis is
Use the one in phase shift method, fourier transform method, Wavelet Transform.
Micro-nano structure topography measurement based on digital scan white light interference the most according to claim 2
The micro-nano structure topography measurement method of device, it is characterised in that: use described spectral distribution to carry out phase
Position resolves the step of acquisition object height and includes: the wavelength of described spectral distribution is λ value, and it is corresponding
Phase value is φ, and 2 π/λ and φ is carried out first order matching, it is thus achieved that phase value relation, φ=2 π
K/ λ, fitting parameter k are the height of this spectral distribution correspondence object under test.
Micro-nano structure topography measurement based on digital scan white light interference the most according to claim 2
The micro-nano structure topography measurement method of device, it is characterised in that: the work stage placing object under test exists
Arbitrarily moved freely by electric or hand mode in two dimensional surface.
Micro-nano structure topography measurement based on digital scan white light interference the most according to claim 2
The micro-nano structure topography measurement method of device, it is characterised in that: described digital micromirror array is by control
Unit processed is controlled, and control unit can directly control each pixel cell pair on digital micromirror array
Answer the deflection angle of micro mirror.
Micro-nano structure topography measurement based on digital scan white light interference the most according to claim 7
The micro-nano structure topography measurement method of device, it is characterised in that: described first order matching uses minimum
One in square law optimized algorithm, B-spline optimized algorithm, plan Newton optimization algorithm.
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