CN103900493B - Micro-nano structure morphology measuring device and method based on digital scanning white light interference - Google Patents
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Abstract
本发明一种基于数字扫描白光干涉的微纳结构形貌测量装置及方法，利用由数字微镜阵列、成像单元、半透半反镜、白光光源、干涉显微物镜、待测物体、工件台、控制单元、光谱仪、光纤、光纤耦合单元组成的装置，将扩束准直白光通过半透半反镜将白光分别投射到待测物体表面和干涉显微镜内部的参考镜表面并反射光发生干涉，再经过半透半反镜，获得干涉光强并经成像单元成像到数字微镜阵列表面；逐一控制数字微镜阵列的像素对应微镜偏转角度，使不同像素对应干涉光强逐一进入光纤耦合单元，光谱仪获得干涉光强对应的光谱信息传入控制单元并对干涉光强对应的光谱分布进行相位解析，求得待测物体表面相对高度。本发明结构简化，测量精度高、抗干扰能力强。
The present invention is a micro-nano structure profile measurement device and method based on digital scanning white light interference, which utilizes a digital micromirror array, an imaging unit, a half-transparent mirror, a white light source, an interference microscope objective lens, an object to be measured, and a workpiece table , a control unit, a spectrometer, an optical fiber, and an optical fiber coupling unit. The expanded collimated white light is projected onto the surface of the object to be measured and the surface of the reference mirror inside the interference microscope through a half-mirror, and the reflected light interferes. Then through the half mirror, the interference light intensity is obtained and imaged to the surface of the digital micromirror array through the imaging unit; the pixels of the digital micromirror array are controlled one by one to correspond to the micromirror deflection angle, so that the interference light intensity corresponding to different pixels enters the fiber coupling unit one by one , the spectrometer obtains the spectral information corresponding to the interference light intensity and transmits it to the control unit and performs phase analysis on the spectral distribution corresponding to the interference light intensity to obtain the relative height of the surface of the object to be measured. The invention has simplified structure, high measurement precision and strong anti-interference ability.
Description
技术领域technical field
本发明属于光学精密检测技术领域，涉及一种光学非接触测量方法，特别是一种基于白光频域分析的微纳结构表面貌的测量装置及方法。The invention belongs to the technical field of optical precision detection, and relates to an optical non-contact measurement method, in particular to a measurement device and method for micro-nano structure surface appearance based on white light frequency domain analysis.
背景技术Background technique
随着MEMS等微纳器件的广泛应用，为保证器件性能，对微纳结构形貌测量技术提出了很高的要求。现有微结构形貌测量技术中，白光干涉技术凭借其测量范围大、精度高等优点成为主流技术。然而，现有的基于白光干涉原理对微纳结构形貌进行测量的技术，大多通过z向移动工件台或干涉显微镜等方式，对待测物体进行z向上的扫描，通过判断扫描过程中光强最大值，实现对待测物体相对高度的检测。现有测量方法精度受z向驱动机构定位精度影响较大，并且以光强作为探测对象，存在易受外界环境杂散光以及待测物体表面折射率变化影响等问题。With the wide application of micro-nano devices such as MEMS, in order to ensure the performance of the device, high requirements are put forward for the micro-nano structure shape measurement technology. Among the existing microstructure shape measurement technologies, white light interferometry has become the mainstream technology due to its advantages of large measurement range and high precision. However, most of the existing technologies for measuring the morphology of micro-nano structures based on the principle of white light interference scan the object to be measured in the z-direction by moving the workpiece stage or interference microscope in the z-direction, and judge the maximum light intensity during the scanning process. value to realize the detection of the relative height of the object to be measured. The accuracy of the existing measurement method is greatly affected by the positioning accuracy of the z-direction drive mechanism, and the light intensity is used as the detection object, which is easily affected by the stray light of the external environment and the change of the refractive index of the surface of the object to be measured.
发明内容Contents of the invention
(一)要解决技术的问题(1) To solve technical problems
本发明的目的在于对解决现有白光干涉测量技术存在的问题，提供一种无需进行z向扫描，并具有高抗干扰能力及高测量精度的基于白光干涉原理的微纳结构形貌测量装置及方法。The purpose of the present invention is to solve the problems existing in the existing white light interferometry technology, and to provide a micro-nano structure shape measurement device based on the principle of white light interferometry that does not need to scan in the z direction and has high anti-interference ability and high measurement accuracy. method.
(二)技术方案(2) Technical solution
为实现本发明的目的，本发明第一方面，提供一种基于数字扫描白光干涉的微纳结构形貌测量装置，该装置包括：数字微镜阵列、成像单元、半透半反镜、白光光源、干涉显微物镜、待测物体、工件台、控制单元、光谱仪、光纤、光纤耦合单元；其中：数字微镜阵列、成像单元、半透半反镜、干涉显微物镜及待测物体依序位于微纳结构形貌测量装置的光轴上；数字微镜阵列位于成像单元和光纤耦合单元之间，数字微镜阵列的表面与光纤耦合单元的光轴之间具有一角度，且成像单元的成像面与光纤耦合单元的耦合面相互垂直；半透半反镜的半透半反面与干涉显微物镜的光轴之间具有一角度；白光光源输出的平行光束与干涉显微物镜的光轴垂直；待测物体设于干涉显微物镜的成像面上；待测物体位于工件台上；控制单元的数据端与光谱仪的数据端连接；光纤的两端分别连接光纤耦合单元的输出端和光谱仪的数据端连接；光纤耦合单元的耦合面位于数字微镜阵列的输出光束上；光源发出的白光经扩束准直后，通过半透半反镜投射到干涉显微物镜上，干涉显微镜将白光分别投射到待测物体表面和干涉显微镜内部的参考镜表面，使待测物体表面及参考镜表面的反射光发生干涉，再次经过半透半反镜，获得干涉光强并经成像单元后成像至数字微镜阵列的表面；逐一控制数字微镜阵列像素对应微镜偏转角度，使不同像素对应的干涉光强逐一进入光纤耦合单元，光谱仪接收并获得干涉光强对应的光谱信息，并传入控制单元进行光谱分布相位解析，实现对数字微镜阵列上每一像素点对应待测物体表面相对高度的检测。In order to achieve the purpose of the present invention, the first aspect of the present invention provides a micro-nano structure shape measurement device based on digital scanning white light interference, which includes: a digital micromirror array, an imaging unit, a half-transparent mirror, a white light source , interference microscope objective lens, object to be measured, workpiece table, control unit, spectrometer, optical fiber, fiber coupling unit; among them: digital micromirror array, imaging unit, half-transparent mirror, interference microscope objective lens and object to be measured in order Located on the optical axis of the micro-nano structure profile measurement device; the digital micromirror array is located between the imaging unit and the fiber coupling unit, and there is an angle between the surface of the digital micromirror array and the optical axis of the fiber coupling unit, and the imaging unit The imaging surface and the coupling surface of the fiber coupling unit are perpendicular to each other; there is an angle between the semi-transparent half-mirror and the optical axis of the interference microscope objective lens; the parallel beam output by the white light source and the optical axis of the interference microscope objective lens Vertical; the object to be measured is set on the imaging surface of the interference microscope objective lens; the object to be measured is located on the workpiece table; the data end of the control unit is connected to the data end of the spectrometer; the two ends of the optical fiber are respectively connected to the output end of the fiber coupling unit and the spectrometer The data end connection; the coupling surface of the fiber coupling unit is located on the output beam of the digital micromirror array; the white light emitted by the light source is projected onto the interference microscope objective lens through a half-transparent mirror after beam expansion and collimation, and the interference microscope converts the white light They are projected onto the surface of the object to be measured and the surface of the reference mirror inside the interference microscope, so that the reflected light on the surface of the object to be measured and the surface of the reference mirror interferes, and then pass through the half-transparent mirror again to obtain the interference light intensity and image it to the The surface of the digital micromirror array; control the deflection angle of the micromirror corresponding to the pixels of the digital micromirror array one by one, so that the interference light intensity corresponding to different pixels enters the fiber coupling unit one by one, and the spectrometer receives and obtains the spectral information corresponding to the interference light intensity, and transmits it to the control The unit performs spectral distribution phase analysis to detect the relative height of each pixel on the digital micromirror array corresponding to the surface of the object to be measured.
为实现本发明的目的，本发明第二方面，提供一种基于数字扫描白光干涉的微纳结构形貌测量方法所采取的技术方案是：光源发出的白光经扩束准直后，通过半透半反镜投射到干涉显微物镜上，干涉显微镜将白光分别投射到待测物体表面和干涉显微镜内部的参考镜表面，使待测物体表面及参考镜表面的反射光发生干涉，再次经过半透半反镜，获得干涉光强并经成像单元后成像至数字微镜阵列的表面；逐一控制数字微镜阵列的像素对应微镜偏转角度，使不同像素对应的干涉光强逐一进入光纤耦合单元，光谱仪获得干涉光强对应的光谱信息，传入控制单元并对干涉光强对应的光谱分布进行相位解析，实现对数字微镜阵列上每一像素点对应待测物体表面相对高度的检测。In order to achieve the purpose of the present invention, the second aspect of the present invention provides a technical solution for measuring the shape of micro-nano structures based on digital scanning white light interference. The half-mirror is projected onto the objective lens of the interference microscope, and the interference microscope projects white light onto the surface of the object to be measured and the surface of the reference mirror inside the interference microscope, so that the reflected light on the surface of the object to be measured and the surface of the reference mirror interferes and passes through the semi-transparent light again. The half mirror obtains the interference light intensity and images it to the surface of the digital micromirror array through the imaging unit; controls the micromirror deflection angles corresponding to the pixels of the digital micromirror array one by one, so that the interference light intensity corresponding to different pixels enters the fiber coupling unit one by one, The spectrometer obtains the spectral information corresponding to the interference light intensity, transmits it to the control unit and performs phase analysis on the spectral distribution corresponding to the interference light intensity, and realizes the detection of the relative height of each pixel on the digital micromirror array corresponding to the surface of the object to be measured.
优选实施例，所述控制数字微镜阵列各个微镜偏转角度是控制数字微镜阵列的某一像素对应微镜的偏转角度，使投影在数字微镜阵列上的干涉光强进入光纤耦合单元。In a preferred embodiment, the control of the deflection angle of each micromirror of the digital micromirror array is to control the deflection angle of the micromirror corresponding to a certain pixel of the digital micromirror array, so that the interference light intensity projected on the digital micromirror array enters the fiber coupling unit.
优选实施例，所述基于数字扫描白光干涉的微纳结构形貌测量方法，还包括：利用工件台带动待测物体做x、y方向平面运动，对待测物体不同区域进行检测，通过数据拼接实现大尺寸待测物体表面高度测量。In a preferred embodiment, the method for measuring the topography of micro-nano structures based on digital scanning white light interference further includes: using the workpiece table to drive the object to be measured to move in a plane in the x and y directions, to detect different areas of the object to be measured, and to realize the measurement by data splicing Surface height measurement of large-sized objects to be measured.
优选实施例，所述光谱分布相位解析是使用相移法、傅里叶变换法、小波变换法中的一种。In a preferred embodiment, the spectral distribution phase analysis uses one of the phase shift method, Fourier transform method, and wavelet transform method.
优选实施例，使用所述光谱分布进行相位解析获得物体高度的步骤包括：所述光谱分布的波长为λ值，其对应相位值为φ，对2π/λ、φ进行一次项拟合，获得相位值关系，φ＝2πk/λ，拟合参数k即为该光谱分布对应待测物体的高度。In a preferred embodiment, the step of using the spectral distribution to perform phase analysis to obtain the height of the object includes: the wavelength of the spectral distribution is λ value, and its corresponding phase value is φ, and a term fitting is performed on 2π/λ and φ to obtain the phase Value relationship, φ=2πk/λ, the fitting parameter k is the height of the object to be measured corresponding to the spectral distribution.
优选实施例，放置待测物体的工件台在二维平面内通过电动或手动方式任意自由移动。In a preferred embodiment, the workpiece stage on which the object to be measured is placed can move freely in a two-dimensional plane by electric or manual means.
优选实施例，所述数字微镜阵列可通过控制单元8进行控制，控制单元可直接控制数字微镜阵列上每个像素单元对应微镜的偏转角度。In a preferred embodiment, the digital micromirror array can be controlled by the control unit 8, and the control unit can directly control the deflection angle of each pixel unit on the digital micromirror array corresponding to the micromirror.
优选实施例，所述一次项拟合采用最小二乘法优化算法、B样条优化算法、拟牛顿优化算法中的一种。In a preferred embodiment, the first-order fitting adopts one of the least squares optimization algorithm, B-spline optimization algorithm, and quasi-Newton optimization algorithm.
(三)有益效果(3) Beneficial effects
本发明通过对白光干涉光强的光谱信息进行分析实现对待测物体高度的检测，减小了外界杂散光等对测量精度的影响，提高了检测系统抗干扰能力。并且，该方法无需z向扫描，即可完成对待测物体高度的检测，简化了系统结构，提高了测量速度，消除了z向定位误差对测量精度的影响。The invention realizes the detection of the height of the object to be measured by analyzing the spectral information of the white light interference light intensity, reduces the influence of external stray light and the like on the measurement accuracy, and improves the anti-interference ability of the detection system. Moreover, the method can complete the detection of the height of the object to be measured without z-direction scanning, simplifies the system structure, improves the measurement speed, and eliminates the influence of the z-direction positioning error on the measurement accuracy.
附图说明Description of drawings
图1为本发明基于数字扫描白光干涉的微纳结构形貌测量装置的结构示意图；Fig. 1 is the structure schematic diagram of the micro-nano structure topography measuring device based on the digital scanning white light interference of the present invention;
图2为干涉光强的光谱分布示意图。Fig. 2 is a schematic diagram of the spectral distribution of interference light intensity.
具体实施方式detailed description
为使本发明的目的、技术方案和优点更加清楚明白，以下结合具体实施例，并参照附图，对本发明进一步详细说明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
如附图1所示为本发明基于数字扫描白光干涉的微纳结构形貌测量装置结构示意图，数字微镜阵列(DMD)1、成像单元2、半透半反镜3、白光光源4、干涉显微物镜5、待测物体6、工件台7、控制单元8、光谱仪9、光纤10、光纤耦合单元11；数字微镜阵列1、成像单元2、半透半反镜3、干涉显微物镜5及待测物体6依序位于微纳结构形貌测量装置的光轴上；数字微镜阵列1位于成像单元2和光纤耦合单元11之间，数字微镜阵列1的表面与光纤耦合单元11的光轴之间具有33°±5°角度，且成像单元2的成像面与光纤耦合单元11的耦合面相互垂直；半透半反镜3的半透半反面与干涉显微物镜5的光轴之间具有45°角度；白光光源4输出的平行光束与干涉显微物镜5的光轴垂直；待测物体6设于干涉显微物镜5的成像面上；待测物体6位于工件台7上；控制单元8的数据端与光谱仪9的数据端连接；光纤10的两端分别连接光纤耦合单元11的输出端和光谱仪9的数据端连接；光纤耦合单元11的耦合面位于数字微镜阵列1的输出光束上。As shown in accompanying drawing 1, it is a schematic structural diagram of a micro-nano structure profile measuring device based on digital scanning white light interference of the present invention, a digital micromirror array (DMD) 1, an imaging unit 2, a half mirror 3, a white light source 4, an interference Microscopic objective lens 5, object to be measured 6, workpiece table 7, control unit 8, spectrometer 9, optical fiber 10, optical fiber coupling unit 11; digital micromirror array 1, imaging unit 2, half-transparent mirror 3, interference microscope objective lens 5 and the object to be measured 6 are sequentially located on the optical axis of the micro-nano structure topography measurement device; the digital micromirror array 1 is located between the imaging unit 2 and the fiber coupling unit 11, and the surface of the digital micromirror array 1 is connected to the fiber coupling unit 11 There is an angle of 33°±5° between the optical axes of the optical axes, and the imaging surface of the imaging unit 2 is perpendicular to the coupling surface of the fiber coupling unit 11; There is an angle of 45° between the axes; the parallel light beam output by the white light source 4 is perpendicular to the optical axis of the interference microscope objective lens 5; the object to be measured 6 is set on the imaging surface of the interference microscope objective lens 5; Above; the data end of the control unit 8 is connected to the data end of the spectrometer 9; the two ends of the optical fiber 10 are respectively connected to the output end of the fiber coupling unit 11 and the data end of the spectrometer 9; the coupling surface of the fiber coupling unit 11 is located at the digital micromirror array 1 on the output beam.
利用图1示出的基于数字扫描白光干涉的微纳结构形貌测量装置，实现微纳结构形貌测量方法包括步骤如下：白光光源4发出的光经扩束准直后，通过半透半反镜3投射到干涉显微物镜5上，由干涉显微物镜5将入射光分为两束，一束成像到待测物体6的表面，另一束成像到干涉显微物镜5的内部参考镜表面。这两束光分别经待测物体6的表面以及参考镜表面反射后发生干涉，再次经过半透半反镜3后，获得干涉光强；由成像单元2将干涉光强成像到数字微镜阵列1的表面，通过控制单元8对数字微镜阵列1上某一像素对应的微镜的偏转角度进行控制，使该微镜表面的干涉光强进入光纤耦合单元11，并由光纤10传输至光谱仪9，光谱仪9获得该干涉光强对应的光谱信息，并传入控制单元8并对干涉光强对应的光谱分布进行相位解析，从而获得待测物体表面相对高度。Using the micro-nano structure profile measurement device based on digital scanning white light interference shown in FIG. 1, the method of realizing the micro-nano structure profile measurement method includes the following steps: After the light emitted by the white light source 4 is collimated by beam expansion, it passes through the semi-transparent and semi-reflective The mirror 3 is projected onto the interference microscope objective lens 5, and the incident light is divided into two beams by the interference microscope objective lens 5, one beam is imaged to the surface of the object 6 to be measured, and the other beam is imaged to the internal reference mirror of the interference microscope objective lens 5 surface. The two beams of light are respectively reflected by the surface of the object to be measured 6 and the surface of the reference mirror to interfere, and then pass through the half-mirror 3 again to obtain the interference light intensity; the imaging unit 2 images the interference light intensity to the digital micromirror array 1, the deflection angle of the micromirror corresponding to a certain pixel on the digital micromirror array 1 is controlled by the control unit 8, so that the interference light intensity on the surface of the micromirror enters the optical fiber coupling unit 11, and is transmitted to the spectrometer by the optical fiber 10 9. The spectrometer 9 obtains the spectral information corresponding to the interference light intensity, and transmits it to the control unit 8 to perform phase analysis on the spectral distribution corresponding to the interference light intensity, so as to obtain the relative height of the surface of the object to be measured.
令此时数字微镜阵列1上某一像素点干涉光强对应的待测物体6的表面与干涉显微镜5的内部参考镜之间的光程差为d，此时光谱仪9获得的信号I(λ)可以表示为：Make the optical path difference between the surface of the object to be measured 6 corresponding to the interference light intensity of a certain pixel point on the digital micromirror array 1 and the internal reference mirror of the interference microscope 5 be d, and the signal I ( λ) can be expressed as:
其中λ为波长，I0(λ)为背景光谱分布，M(λ)为不同波长调制度，光谱分布如所示。Where λ is the wavelength, I 0 (λ) is the background spectral distribution, M(λ) is the modulation degree of different wavelengths, and the spectral distribution is as shown.
此时，利用傅里叶变换得到光谱分布的相位分布φ(λ)表示为：At this time, the phase distribution φ(λ) of the spectral distribution obtained by Fourier transform is expressed as:
此时，设光谱分布的波长为λ，其对应相位值为φ，对2π/λ、φ进行一次项拟合，求得φ(λ)与2π/λ之间的函数对应关系表示为：At this time, assuming that the wavelength of the spectral distribution is λ, and its corresponding phase value is φ, a one-time fitting is performed on 2π/λ and φ, and the functional correspondence between φ(λ) and 2π/λ is obtained as follows:
对比表达式(2)、(3)，此时获得的一次项表达式中的一次项拟合系数k，即为待测物体6的表面与干涉显微镜5的内部参考镜之间的光程差为d即为该光谱分布对应待测物体高度。Comparing expressions (2) and (3), the linear fitting coefficient k in the linear expression obtained at this time is the optical path difference between the surface of the object to be measured 6 and the internal reference mirror of the interference microscope 5 d is the spectral distribution corresponding to the height of the object to be measured.
对数字微镜阵列1上每个像素点进行控制，使其微镜对应干涉光逐一进入光纤耦合单元11并被光谱仪接收，获得每个数字微镜阵列1像素点上干涉光强对应的待测物体表面与干涉显微镜5的内部参考镜之间的光程差，进而完成对待测物体6的表面形貌的检测。Each pixel point on the digital micromirror array 1 is controlled so that the interference light corresponding to the micromirror enters the fiber coupling unit 11 one by one and is received by the spectrometer, and the measured value corresponding to the interference light intensity on each pixel point of the digital micromirror array is obtained. The optical path difference between the object surface and the internal reference mirror of the interference microscope 5 is used to complete the detection of the surface topography of the object 6 to be measured.
利用工件台7带动待测物体6在xy平面内移动，采用上述方法，分别对待测物体6的不同区域进行测量，通过数据拼接手段实现大尺寸物体表面高度测量。The workpiece table 7 is used to drive the object 6 to be measured to move in the xy plane, and the above method is used to measure different areas of the object 6 to be measured, and the surface height of the large-sized object is measured by means of data splicing.
如图2为干涉光强的光谱分布示意图，图示出待测物体6表面和干涉显微镜5内部的参考镜表面的反射光发生干涉，生成干涉光强，通过对光谱仪9获得的干涉光强进行光谱分布相位解析，进而得到数字微镜阵列1当前偏转微镜上的干涉光强携带的待测物体6的表面某点的高度信息。Figure 2 is a schematic diagram of the spectral distribution of the interference light intensity, which shows that the reflected light on the surface of the object to be measured 6 and the surface of the reference mirror inside the interference microscope 5 interferes to generate the interference light intensity, and the interference light intensity obtained by the spectrometer 9 is carried out The phase analysis of the spectral distribution further obtains the height information of a certain point on the surface of the object to be measured 6 carried by the interference light intensity on the current deflecting micromirror of the digital micromirror array 1 .
本发明未详细阐述的内容为本领域技术人员的公知常识。The content not elaborated in the present invention is common knowledge of those skilled in the art.
以上所述仅为本发明的具体实施实例，并不用于限制本发明。凡在本发明的精神和原则之内所做的任何修改，等同替换或者改进等，均应包含在本发明的保护范围以内。The above descriptions are only specific implementation examples of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement or improvement made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106705856B (en) * | 2015-07-31 | 2019-05-14 | 南京理工大学 | Near-infrared displacement sensing apparatus and micro-displacement measuring method based on broadband light spectral domain Microscopic inteferometry |
| JP6725988B2 (en) * | 2016-01-26 | 2020-07-22 | 大塚電子株式会社 | Thickness measuring device and thickness measuring method |
| CN106197310A (en) * | 2016-06-29 | 2016-12-07 | 中国科学院光电技术研究所 | Modulation degree-based wide-spectrum micro-nano structure three-dimensional morphology detection method |
| CN106247976B (en) * | 2016-07-12 | 2020-04-10 | 北京理工大学 | Auxiliary device and method for measuring three-dimensional morphology of surface of large-dip-angle micro-nano structure |
| CN106289380B (en) * | 2016-10-19 | 2019-06-25 | 北醒（北京）光子科技有限公司 | A kind of new type superthin coaxial light source detection system |
| CN106643558A (en) * | 2017-03-06 | 2017-05-10 | 中国科学院光电技术研究所 | Wide spectrum interference morphology detection method based on phase longitudinal splicing |
| CN106643559B (en) * | 2017-03-06 | 2019-04-02 | 中国科学院光电技术研究所 | White light microscopic interference morphology reconstruction method based on mixed interference fringes |
| CN106931911A (en) * | 2017-04-01 | 2017-07-07 | 浙江协同光电科技有限公司 | The confocal line scanning device of white-light spectrum |
| EP3396306B1 (en) * | 2017-04-26 | 2019-11-27 | Mitutoyo Corporation | Method and system for calculating a height map of a surface of an object from an image stack in scanning optical 2.5d profiling of the surface by an optical system |
| CN107228632B (en) * | 2017-05-18 | 2019-12-10 | 广东工业大学 | A device and method for displacement field tomography measurement based on windowed Fourier transform |
| CN107728304B (en) * | 2017-10-24 | 2019-12-06 | 佛山科学技术学院 | A multi-focus frequency-domain OCT adaptive focusing device and method thereof |
| CN108121172B (en) * | 2017-12-13 | 2019-09-10 | 中国科学院光电技术研究所 | A multilayer film absolute gap measurement device and method based on white light interference information matching |
| CN109115723A (en) * | 2018-09-30 | 2019-01-01 | 深圳市太赫兹科技创新研究院 | Optical coherence tomography and imaging method based on digital micromirror device |
| CN109901344A (en) * | 2019-04-01 | 2019-06-18 | 合刃科技（武汉）有限公司 | Annular coaxial light-source generation device, NI Vision Builder for Automated Inspection and application method |
| CN110285771A (en) * | 2019-05-15 | 2019-09-27 | 淮阴师范学院 | Embedded 3D shape measurement module based on white light interference |
| CN110715616B (en) * | 2019-10-14 | 2021-09-07 | 中国科学院光电技术研究所 | A structured light micro-nano three-dimensional topography measurement method based on focusing evaluation algorithm |
| CN111121661B (en) * | 2019-12-17 | 2021-09-17 | 南京理工大学 | Narrow-band non-monochromatic light n +1 amplitude phase shift test algorithm for smooth surface topography measurement |
| CN111256616B (en) * | 2020-03-30 | 2024-08-20 | 阳宇春 | Metering level 3D ultra-depth-of-field microscopic system and detection method |
| CN114964033B (en) * | 2022-02-14 | 2023-07-18 | 上海大学 | A Method for Measuring Metasurface Topography Distribution Using Wavelength Phase Shifting |
| CN114593690B (en) * | 2022-03-22 | 2024-01-30 | 深圳市鹰眼在线电子科技有限公司 | Novel white light interferometer structure |
| CN115574735B (en) * | 2022-09-21 | 2025-04-29 | 广东海洋大学 | A device and method for measuring the side profile of a conical workpiece |
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| US8072610B1 (en) * | 2008-07-01 | 2011-12-06 | Bruker Nano, Inc. | Polarization mirau interference microscope |
| CN101320222A (en) * | 2008-07-02 | 2008-12-10 | 中国科学院光电技术研究所 | Step-by-step maskless digital exposure device based on digital micromirror array |
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