CN103900493A - Micro-nano structure and morphology measurement device and method based on digital scanning and white light interference - Google Patents
Micro-nano structure and morphology measurement device and method based on digital scanning and white light interference Download PDFInfo
- Publication number
- CN103900493A CN103900493A CN201410157861.0A CN201410157861A CN103900493A CN 103900493 A CN103900493 A CN 103900493A CN 201410157861 A CN201410157861 A CN 201410157861A CN 103900493 A CN103900493 A CN 103900493A
- Authority
- CN
- China
- Prior art keywords
- micro
- interference
- semi
- white light
- mirror array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
Abstract
The invention provides a micro-nano structure and morphology measurement device and method based on digital scanning and white light interference. The method includes the steps of projecting white light processed through beam expanding and collimation to the surface of an object to the measured and the surface of a reference mirror inside an interference microscope through semi-transparent and semi-reflective mirrors by means of a device composed of a digital micro mirror array, an imaging unit, the semi-transparent and semi-reflective mirrors, a white light source, an interference microscope objective, the object to be measured, a working table, a control unit, a spectrograph, optical fibers and an optical fiber coupling unit, enabling the white light to interfere with reflected light, obtaining the interference light intensities through the semi-transparent and semi-reflective mirrors, obtaining the surface of the digital micro mirror array through the imaging unit, controlling the micro mirror defection angles corresponding to pixels of the digital micro mirror array one by one so that the light intensities corresponding to different pixels can enter the optical fiber coupling unit one by one, transmitting spectral information obtained by a spectrograph and corresponding to the interference light intensities to the control unit, and conducting phase analysis on distribution of the spectrums corresponding to the interference light intensities to obtain the relative height of the surface of the object to be measured. The micro-nano structure and morphology measurement device and method have the advantages that the structure is simplified, the measurement accuracy is high, and the anti-interference capacity is high.
Description
Technical field
The invention belongs to optical precision detection technique field, relate to a kind of optical non-contact measurement method, particularly a kind of measurement mechanism and method of the micro-nano structure surface looks based on white light frequency-domain analysis.
Background technology
Along with the widespread use of the micro-nano devices such as MEMS, for guaranteeing device performance, micro-nano structure topography measurement technology is proposed to very high requirement.In existing microstructure appearance measuring technique, white light interference technique is large by means of its measurement range, precision advantages of higher becomes mainstream technology.But, the existing technology of micro-nano structure pattern being measured based on white light interference principle, mostly by z to modes such as travelling workpiece platform or interference microscopes, object under test is carried out to z scanning upwards, by judging light intensity maximal value in scanning process, realize the detection to object under test relative height.Existing measuring method precision is subject to z larger to driving mechanism location precision, and using light intensity as detected object, has the problem such as external environment parasitic light and object under test surface refractive index variable effect that is subject to.
Summary of the invention
(1) want the problem of technical solution
The object of the invention is to the problem existing solving existing white light interferometric technology, provide a kind of without carrying out z to scanning, and there is the micro-nano structure topography measurement device and method based on white light interference principle of high anti-jamming capacity and high measurement accuracy.
(2) technical scheme
For realizing object of the present invention, first aspect present invention, a kind of micro-nano structure topography measurement device based on digital scanning white light interference is provided, and this device comprises: digital micro-mirror array, image-generating unit, semi-transparent semi-reflecting lens, white light source, interference microcobjective, object under test, work stage, control module, spectrometer, optical fiber, optic fiber coupling unit; Wherein: digital micro-mirror array, image-generating unit, semi-transparent semi-reflecting lens, interference microcobjective and object under test are sequentially positioned on the optical axis of micro-nano structure topography measurement device; Digital micro-mirror array, between image-generating unit and optic fiber coupling unit, has an angle between the surface of digital micro-mirror array and the optical axis of optic fiber coupling unit, and the imaging surface of image-generating unit and the coupling surface of optic fiber coupling unit mutually vertical; Semi-transparent semi-reflecting of semi-transparent semi-reflecting lens and interfere between the optical axis of microcobjective and there is an angle; The parallel beam of white light source output is vertical with the optical axis of interference microcobjective; Object under test is located on the imaging surface of interfering microcobjective; Work stage is positioned on object under test; The data terminal of control module is connected with the data terminal of spectrometer; The two ends of optical fiber connect respectively the output terminal of optic fiber coupling unit and the data terminal of spectrometer is connected; The coupling surface of optic fiber coupling unit is positioned on the output beam of digital micro-mirror array; The white light that light source sends is after beam-expanding collimation, project and interfere on microcobjective by semi-transparent semi-reflecting lens, interference microscope projects white light respectively the reference mirror surface of object under test surface and interference microscope inside, the reflected light on object under test surface and reference mirror surface is interfered, again pass through semi-transparent semi-reflecting lens, obtain interference light intensity and after image-generating unit imaging to the surface of digital micro-mirror array; The corresponding micro mirror deflection angle of control figure micro mirror array pixel one by one, make interference light intensity corresponding to different pixels enter one by one optic fiber coupling unit, spectrometer receives and obtains the spectral information that interference light intensity is corresponding, and import control module into and carry out spectral distribution Phase-Resolved Analysis, realize the detection to the corresponding object under test of each pixel on digital micro mirror array surface relative height.
For realizing object of the present invention, second aspect present invention, the technical scheme that provides a kind of micro-nano structure topography measurement method based on digital scanning white light interference to take is: the white light that light source sends is after beam-expanding collimation, project and interfere on microcobjective by semi-transparent semi-reflecting lens, interference microscope projects white light respectively the reference mirror surface of object under test surface and interference microscope inside, the reflected light on object under test surface and reference mirror surface is interfered, again pass through semi-transparent semi-reflecting lens, obtain interference light intensity and after image-generating unit imaging to the surface of digital micro-mirror array, the corresponding micro mirror deflection angle of the pixel of control figure micro mirror array one by one, make interference light intensity corresponding to different pixels enter one by one optic fiber coupling unit, spectrometer obtains spectral information corresponding to interference light intensity, import control module into and spectral distribution corresponding to interference light intensity carried out to Phase-Resolved Analysis, realize the detection to the corresponding object under test of each pixel on digital micro mirror array surface relative height.
Preferred embodiment, each micro mirror deflection angle of described control figure micro mirror array is the deflection angle of the corresponding micro mirror of a certain pixel of control figure micro mirror array, makes the interference light intensity being projected on digital micro-mirror array enter optic fiber coupling unit.
Preferred embodiment, the described micro-nano structure topography measurement method based on digital scanning white light interference, also comprise: utilize work stage to drive object under test to do x, the motion of y direction plane, object under test zones of different is detected, splice and realize the measurement of large scale object under test surface elevation by data.
Preferred embodiment, described spectral distribution Phase-Resolved Analysis is the one using in phase-shift method, fourier transform method, Wavelet Transform.
Preferred embodiment, the step that uses described spectral distribution to obtain object height comprises: the wavelength of described spectral distribution is λ value, its corresponding phase value is φ, 2 π/λ, φ are carried out to an once matching, obtain phase value relation, φ=2 π k/ λ, fitting parameter k is the height of the corresponding object under test of this spectral distribution.
Preferred embodiment, the work stage of placing object under test moves freely arbitrarily by electronic or manual mode in two dimensional surface.
Preferred embodiment, described digital micro-mirror array can be controlled by control module 8, and control module is the deflection angle of the corresponding micro mirror of each pixel cell on control figure micro mirror array directly.
Preferred embodiment, a described once matching adopts least square method optimized algorithm, B batten optimized algorithm, intends the one in Newton optimization algorithm.
(3) beneficial effect
The present invention realizes detection to object height to be measured by the spectral information of white light interference light intensity is analyzed, and reduced the impact on measuring accuracy such as extraneous parasitic light, improved detection system antijamming capability.And the method to scanning, can complete the detection to object height to be measured without z, has simplified system architecture, has improved measuring speed, eliminate z impact on measuring accuracy to positioning error.
Accompanying drawing explanation
Fig. 1 is the structural representation that the present invention is based on the micro-nano structure topography measurement device of digital scanning white light interference;
Fig. 2 is the spectral distribution schematic diagram of interference light intensity.
Embodiment
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.
Be the micro-nano structure topography measurement apparatus structure schematic diagram that the present invention is based on digital scanning white light interference as shown in Figure 1, digital micro-mirror array (DMD) 1, image-generating unit 2, semi-transparent semi-reflecting lens 3, white light source 4, interference microcobjective 5, object under test 6, work stage 7, control module 8, spectrometer 9, optical fiber 10, optic fiber coupling unit 11; Digital micro-mirror array 1, image-generating unit 2, semi-transparent semi-reflecting lens 3, interference microcobjective 5 and object under test 6 are sequentially positioned on the optical axis of micro-nano structure topography measurement device; Digital micro-mirror array 1 is between image-generating unit 2 and optic fiber coupling unit 11, between the optical axis of the surface of digital micro-mirror array 1 and optic fiber coupling unit 11, there are 33 ° ± 5 ° angles, and the imaging surface of image-generating unit 2 is mutually vertical with the coupling surface of optic fiber coupling unit 11; Semi-transparent semi-reflecting of semi-transparent semi-reflecting lens 3 and interfere between the optical axis of microcobjective 5 and there is 45° angle degree; The parallel beam that white light source 4 is exported is vertical with the optical axis of interference microcobjective 5; Object under test 6 is located on the imaging surface of interfering microcobjective 5; Work stage 7 is positioned on object under test 6; The data terminal of control module 8 is connected with the data terminal of spectrometer 9; The output terminal that the two ends of optical fiber 10 connect respectively optic fiber coupling unit 11 is connected with the data terminal of spectrometer 9; The coupling surface of optic fiber coupling unit 11 is positioned on the output beam of digital micro-mirror array 1.
Utilize the micro-nano structure topography measurement device based on digital scanning white light interference shown in Fig. 1, realize micro-nano structure topography measurement method and comprise that step is as follows: the light that white light source 4 sends is after beam-expanding collimation, project and interfere on microcobjective 5 by semi-transparent semi-reflecting lens 3, by interfering microcobjective 5 that incident light is divided into two bundles, a branch of surface that is imaged onto object under test 6, another bundle is imaged onto the internal reference mirror surface of interfering microcobjective 5.This two-beam interferes respectively after the surface of object under test 6 and reference mirror surface reflection, again, after semi-transparent semi-reflecting lens 3, obtains interference light intensity; By image-generating unit 2, interference light intensity is imaged onto to the surface of digital micro-mirror array 1, by control module 8, the deflection angle of micro mirror corresponding to a certain pixel on digital micro mirror array 1 is controlled, make the interference light intensity on this micro mirror surface enter optic fiber coupling unit 11, and transfer to spectrometer 9 by optical fiber 10, spectrometer 9 obtains spectral information corresponding to this interference light intensity, and import control module 8 into and spectral distribution corresponding to interference light intensity carried out to Phase-Resolved Analysis, thereby obtain object under test surface relative height.
Making the optical path difference between the surface of object under test 6 and the internal reference mirror of interference microscope 5 that on digital micro-mirror array 1 now, a certain pixel interference light intensity is corresponding is d, and the signal I (λ) that now spectrometer 9 obtains can be expressed as:
Wherein λ is wavelength, I
0(λ) for background spectrum distributes, M (λ) is different wave length degree of modulation, and spectral distribution as shown.
Now, the PHASE DISTRIBUTION φ (λ) that utilizes Fourier transform to obtain spectral distribution is expressed as:
Now, the wavelength of establishing spectral distribution is λ, and its corresponding phase value is φ, and 2 π/λ, φ are carried out to an once matching, and the function corresponding relation of trying to achieve between φ (λ) and 2 π/λ is expressed as:
Contrast expression formula (2), (3), an once fitting coefficient k in the once expression formula now obtaining, the optical path difference being between the surface of object under test 6 and the internal reference mirror of interference microscope 5 is that d is the corresponding object under test height of this spectral distribution.
Each pixel on digital micro mirror array 1 is controlled, make the corresponding interference light of its micro mirror enter one by one optic fiber coupling unit 11 and be received by spectrometer, obtain the optical path difference between object under test surface and the internal reference mirror of interference microscope 5 that on each digital micro-mirror array 1 pixel, interference light intensity is corresponding, and then complete the detection of the surface topography to object under test 6.
Utilize work stage 7 to drive object under test 6 to move in xy plane, adopt said method, respectively the zones of different of object under test 6 is measured, realize large sized object surface elevation by data splicing means and measure.
As Fig. 2 spectral distribution schematic diagram that is interference light intensity, the reflected light that illustrates the reference mirror surface of object under test 6 surfaces and interference microscope 5 inside interferes, generate interference light intensity, carry out spectral distribution Phase-Resolved Analysis by the interference light intensity that spectrometer 9 is obtained, and then obtain the elevation information of the surface point of the object under test 6 that the interference light intensity on the current deflection micro mirror of digital micro-mirror array 1 carries.
The content that the present invention does not elaborate is those skilled in the art's common practise.
The foregoing is only specific embodiment of the invention example, be not limited to the present invention.All any modifications of making within the spirit and principles in the present invention, are equal to replacement or improvement etc., all should be included in protection scope of the present invention.
Claims (10)
1. the micro-nano structure topography measurement device based on digital scanning white light interference, this device comprises digital micro-mirror array, image-generating unit, semi-transparent semi-reflecting lens, white light source, interference microcobjective, object under test, work stage, control module, spectrometer, optical fiber, optic fiber coupling unit; Wherein: digital micro-mirror array, image-generating unit, semi-transparent semi-reflecting lens, interference microcobjective and object under test are sequentially positioned on the optical axis of micro-nano structure topography measurement device; Digital micro-mirror array, between image-generating unit and optic fiber coupling unit, has an angle between the surface of digital micro-mirror array and the optical axis of optic fiber coupling unit, and the imaging surface of image-generating unit and the coupling surface of optic fiber coupling unit mutually vertical; Semi-transparent semi-reflecting of semi-transparent semi-reflecting lens and interfere between the optical axis of microcobjective and there is an angle; The parallel beam of white light source output is vertical with the optical axis of interference microcobjective; Object under test is located on the imaging surface of interfering microcobjective; Work stage is positioned on object under test; The data terminal of control module is connected with the data terminal of spectrometer; The two ends of optical fiber connect respectively the output terminal of optic fiber coupling unit and the data terminal of spectrometer is connected; The coupling surface of optic fiber coupling unit is positioned on the output beam of digital micro-mirror array; The white light that light source sends is after beam-expanding collimation, project and interfere on microcobjective by semi-transparent semi-reflecting lens, interference microscope projects white light respectively the reference mirror surface of object under test surface and interference microscope inside, the reflected light on object under test surface and reference mirror surface is interfered, again pass through semi-transparent semi-reflecting lens, obtain interference light intensity and after image-generating unit imaging to the surface of digital micro-mirror array; The corresponding micro mirror deflection angle of control figure micro mirror array pixel one by one, make interference light intensity corresponding to different pixels enter one by one optic fiber coupling unit, spectrometer receives and obtains the spectral information that interference light intensity is corresponding, and import control module into and carry out spectral distribution Phase-Resolved Analysis, realize the detection to the corresponding object under test of each pixel on digital micro mirror array surface relative height.
2. the micro-nano structure topography measurement device based on digital scanning white light interference according to claim 1, is characterized in that: between described digital micro-mirror array surface and the cell optic axis of coupling fiber, have 33 ° ± 5 ° angles; Semi-transparent semi-reflecting of described semi-transparent semi-reflecting lens and interfere between the optical axis of microcobjective and there is 45° angle degree.
3. a micro-nano structure topography measurement method that uses profit to require the micro-nano structure topography measurement device based on digital scanning white light interference described in 1, it is characterized in that: the white light that light source sends is after beam-expanding collimation, project and interfere on microcobjective by semi-transparent semi-reflecting lens, interference microscope projects white light respectively the reference mirror surface of object under test surface and interference microscope inside, the reflected light on object under test surface and reference mirror surface is interfered, again pass through semi-transparent semi-reflecting lens, obtain interference light intensity and after image-generating unit imaging to the surface of digital micro-mirror array; The corresponding micro mirror deflection angle of the pixel of control figure micro mirror array one by one, make interference light intensity corresponding to different pixels enter one by one optic fiber coupling unit, spectrometer obtains spectral information corresponding to interference light intensity, import control module into and spectral distribution corresponding to interference light intensity carried out to Phase-Resolved Analysis, realize the detection to the corresponding object under test of each pixel on digital micro mirror array surface relative height.
4. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, it is characterized in that: each micro mirror deflection angle of described control figure micro mirror array is the deflection angle of the corresponding micro mirror of a certain pixel of control figure micro mirror array, makes the interference light intensity being projected on digital micro-mirror array enter optic fiber coupling unit.
5. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, it is characterized in that: also comprise: utilize work stage to drive object under test to do x, the motion of y direction plane, object under test zones of different is detected, splice and realize the measurement of large scale object under test surface elevation by data.
6. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, is characterized in that: described spectral distribution Phase-Resolved Analysis is the one using in phase-shift method, fourier transform method, Wavelet Transform.
7. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, it is characterized in that: the step that uses described spectral distribution to obtain object height comprises: the wavelength of described spectral distribution is λ value, its corresponding phase value is φ, 2 π/λ, φ are carried out to an once matching, obtain phase value relation, φ=2 π k/ λ, fitting parameter k is the height of the corresponding object under test of this spectral distribution.
8. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, is characterized in that: the work stage of placing object under test moves freely arbitrarily by electronic or manual mode in two dimensional surface.
9. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, it is characterized in that: described digital micro-mirror array is controlled by control module, control module is the deflection angle of the corresponding micro mirror of each pixel cell on control figure micro mirror array directly.
10. the micro-nano structure topography measurement method based on digital scanning white light interference according to claim 3, is characterized in that: a described once matching adopts least square method optimized algorithm, B batten optimized algorithm, intends the one in Newton optimization algorithm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410157861.0A CN103900493B (en) | 2014-04-18 | 2014-04-18 | Micro-nano structure topography measurement device and method based on digital scan white light interference |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410157861.0A CN103900493B (en) | 2014-04-18 | 2014-04-18 | Micro-nano structure topography measurement device and method based on digital scan white light interference |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103900493A true CN103900493A (en) | 2014-07-02 |
| CN103900493B CN103900493B (en) | 2016-09-28 |
Family
ID=50991963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410157861.0A Active CN103900493B (en) | 2014-04-18 | 2014-04-18 | Micro-nano structure topography measurement device and method based on digital scan white light interference |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103900493B (en) |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106197310A (en) * | 2016-06-29 | 2016-12-07 | 中国科学院光电技术研究所 | A kind of wide spectrum micro-nano structure three-dimensional appearance testing method based on modulation degree |
| CN106247976A (en) * | 2016-07-12 | 2016-12-21 | 北京理工大学 | The auxiliary device of a kind of high inclination-angle micro-nano structure surface measuring three-dimensional morphology and method |
| CN106289380A (en) * | 2016-10-19 | 2017-01-04 | 北醒（北京）光子科技有限公司 | A kind of new type superthin coaxial light source detection system |
| CN106643559A (en) * | 2017-03-06 | 2017-05-10 | 中国科学院光电技术研究所 | White light microscopic interference morphology reconstruction method based on mixing interference fringe |
| CN106643558A (en) * | 2017-03-06 | 2017-05-10 | 中国科学院光电技术研究所 | Method for detecting interference shape of broadband spectrum based on longitudinal phase splicing |
| CN106705856A (en) * | 2015-07-31 | 2017-05-24 | 南京理工大学 | Near-infrared displacement sensing device based no broadband spectral domain microscopic interferometry and micro displacement measurement method thereof |
| CN106931911A (en) * | 2017-04-01 | 2017-07-07 | 浙江协同光电科技有限公司 | The confocal line scanning device of white-light spectrum |
| CN107228632A (en) * | 2017-05-18 | 2017-10-03 | 广东工业大学 | A kind of displacement field laminar analysis measurement device and method based on adding window Fourier transformation |
| CN107728304A (en) * | 2017-10-24 | 2018-02-23 | 佛山科学技术学院 | A kind of multifocal frequency domain OCT self-adapting focusing devices and methods therefors |
| CN108121172A (en) * | 2017-12-13 | 2018-06-05 | 中国科学院光电技术研究所 | A kind of multilayer film absolute interstitial measuring device and method based on white light interference information matches |
| CN108801148A (en) * | 2017-04-26 | 2018-11-13 | 株式会社三丰 | Method and system for the height map for calculating body surface |
| CN109115723A (en) * | 2018-09-30 | 2019-01-01 | 深圳市太赫兹科技创新研究院 | Optical coherence tomography and imaging method based on digital micromirror device |
| CN109901344A (en) * | 2019-04-01 | 2019-06-18 | 合刃科技（武汉）有限公司 | Annular coaxial light-source generation device, NI Vision Builder for Automated Inspection and application method |
| CN110285771A (en) * | 2019-05-15 | 2019-09-27 | 淮阴师范学院 | Built-in three-dimension topography measurement module based on white light interference |
| CN110715616A (en) * | 2019-10-14 | 2020-01-21 | 中国科学院光电技术研究所 | Structured light micro-nano three-dimensional morphology measurement method based on focusing evaluation algorithm |
| CN111121661A (en) * | 2019-12-17 | 2020-05-08 | 南京理工大学 | Narrow-band non-monochromatic light n +1 amplitude phase shift test algorithm for smooth surface topography measurement |
| WO2021196419A1 (en) * | 2020-03-30 | 2021-10-07 | 孙亮 | Metering-level 3d super-depth-of-field microscopic system and measurement method |
| CN114593690A (en) * | 2022-03-22 | 2022-06-07 | 深圳市鹰眼在线电子科技有限公司 | Novel white light interferometer structure |
| CN114964033A (en) * | 2022-02-14 | 2022-08-30 | 上海大学 | Method for measuring super-surface topography distribution by using wavelength phase-shifting method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002228425A (en) * | 2001-02-02 | 2002-08-14 | Wakayama Univ | Real-time shape measuring method and device by ccd camera through use of dmd |
| CN101320222A (en) * | 2008-07-02 | 2008-12-10 | 中国科学院光电技术研究所 | Stepping type non-mask digital exposure device based on digital micro-lens array |
| CN101427911A (en) * | 2008-12-22 | 2009-05-13 | 浙江大学 | Method and system for detecting ultra-broadband optical spectrum of ultrahigh-resolution spectrum field OCT |
| US8072610B1 (en) * | 2008-07-01 | 2011-12-06 | Bruker Nano, Inc. | Polarization mirau interference microscope |
| CN102566340A (en) * | 2012-02-07 | 2012-07-11 | 中国科学院光电技术研究所 | A digital mask-free photoetching aligning deivce based on phase shift moire fringe |
-
2014
- 2014-04-18 CN CN201410157861.0A patent/CN103900493B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002228425A (en) * | 2001-02-02 | 2002-08-14 | Wakayama Univ | Real-time shape measuring method and device by ccd camera through use of dmd |
| US8072610B1 (en) * | 2008-07-01 | 2011-12-06 | Bruker Nano, Inc. | Polarization mirau interference microscope |
| CN101320222A (en) * | 2008-07-02 | 2008-12-10 | 中国科学院光电技术研究所 | Stepping type non-mask digital exposure device based on digital micro-lens array |
| CN101427911A (en) * | 2008-12-22 | 2009-05-13 | 浙江大学 | Method and system for detecting ultra-broadband optical spectrum of ultrahigh-resolution spectrum field OCT |
| CN102566340A (en) * | 2012-02-07 | 2012-07-11 | 中国科学院光电技术研究所 | A digital mask-free photoetching aligning deivce based on phase shift moire fringe |
Non-Patent Citations (1)
| Title |
|---|
| 李明: "MEMS器件深槽侧壁形貌测试方法研究", 《中国优秀硕士学位论文电子期刊网》 * |
Cited By (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106705856B (en) * | 2015-07-31 | 2019-05-14 | 南京理工大学 | Near-infrared displacement sensing apparatus and micro-displacement measuring method based on broadband light spectral domain Microscopic inteferometry |
| CN106705856A (en) * | 2015-07-31 | 2017-05-24 | 南京理工大学 | Near-infrared displacement sensing device based no broadband spectral domain microscopic interferometry and micro displacement measurement method thereof |
| CN106197310A (en) * | 2016-06-29 | 2016-12-07 | 中国科学院光电技术研究所 | A kind of wide spectrum micro-nano structure three-dimensional appearance testing method based on modulation degree |
| CN106247976A (en) * | 2016-07-12 | 2016-12-21 | 北京理工大学 | The auxiliary device of a kind of high inclination-angle micro-nano structure surface measuring three-dimensional morphology and method |
| CN106247976B (en) * | 2016-07-12 | 2020-04-10 | 北京理工大学 | Auxiliary device and method for measuring three-dimensional morphology of surface of large-dip-angle micro-nano structure |
| CN106289380A (en) * | 2016-10-19 | 2017-01-04 | 北醒（北京）光子科技有限公司 | A kind of new type superthin coaxial light source detection system |
| CN106289380B (en) * | 2016-10-19 | 2019-06-25 | 北醒（北京）光子科技有限公司 | A kind of new type superthin coaxial light source detection system |
| CN106643559A (en) * | 2017-03-06 | 2017-05-10 | 中国科学院光电技术研究所 | White light microscopic interference morphology reconstruction method based on mixing interference fringe |
| CN106643558A (en) * | 2017-03-06 | 2017-05-10 | 中国科学院光电技术研究所 | Method for detecting interference shape of broadband spectrum based on longitudinal phase splicing |
| CN106931911A (en) * | 2017-04-01 | 2017-07-07 | 浙江协同光电科技有限公司 | The confocal line scanning device of white-light spectrum |
| CN108801148A (en) * | 2017-04-26 | 2018-11-13 | 株式会社三丰 | Method and system for the height map for calculating body surface |
| CN107228632A (en) * | 2017-05-18 | 2017-10-03 | 广东工业大学 | A kind of displacement field laminar analysis measurement device and method based on adding window Fourier transformation |
| CN107228632B (en) * | 2017-05-18 | 2019-12-10 | 广东工业大学 | displacement field chromatographic measurement device and method based on windowed Fourier transform |
| CN107728304A (en) * | 2017-10-24 | 2018-02-23 | 佛山科学技术学院 | A kind of multifocal frequency domain OCT self-adapting focusing devices and methods therefors |
| CN107728304B (en) * | 2017-10-24 | 2019-12-06 | 佛山科学技术学院 | Multi-focus frequency domain OCT (optical coherence tomography) self-adaptive focusing device and method thereof |
| CN108121172A (en) * | 2017-12-13 | 2018-06-05 | 中国科学院光电技术研究所 | A kind of multilayer film absolute interstitial measuring device and method based on white light interference information matches |
| CN108121172B (en) * | 2017-12-13 | 2019-09-10 | 中国科学院光电技术研究所 | A kind of multilayer film absolute interstitial measuring device and method based on white light interference information matches |
| CN109115723A (en) * | 2018-09-30 | 2019-01-01 | 深圳市太赫兹科技创新研究院 | Optical coherence tomography and imaging method based on digital micromirror device |
| CN109901344A (en) * | 2019-04-01 | 2019-06-18 | 合刃科技（武汉）有限公司 | Annular coaxial light-source generation device, NI Vision Builder for Automated Inspection and application method |
| CN110285771A (en) * | 2019-05-15 | 2019-09-27 | 淮阴师范学院 | Built-in three-dimension topography measurement module based on white light interference |
| CN110715616A (en) * | 2019-10-14 | 2020-01-21 | 中国科学院光电技术研究所 | Structured light micro-nano three-dimensional morphology measurement method based on focusing evaluation algorithm |
| CN110715616B (en) * | 2019-10-14 | 2021-09-07 | 中国科学院光电技术研究所 | Structured light micro-nano three-dimensional morphology measurement method based on focusing evaluation algorithm |
| CN111121661A (en) * | 2019-12-17 | 2020-05-08 | 南京理工大学 | Narrow-band non-monochromatic light n +1 amplitude phase shift test algorithm for smooth surface topography measurement |
| CN111121661B (en) * | 2019-12-17 | 2021-09-17 | 南京理工大学 | Narrow-band non-monochromatic light n +1 amplitude phase shift test algorithm for smooth surface topography measurement |
| WO2021196419A1 (en) * | 2020-03-30 | 2021-10-07 | 孙亮 | Metering-level 3d super-depth-of-field microscopic system and measurement method |
| CN114964033A (en) * | 2022-02-14 | 2022-08-30 | 上海大学 | Method for measuring super-surface topography distribution by using wavelength phase-shifting method |
| CN114593690A (en) * | 2022-03-22 | 2022-06-07 | 深圳市鹰眼在线电子科技有限公司 | Novel white light interferometer structure |
| CN114593690B (en) * | 2022-03-22 | 2024-01-30 | 深圳市鹰眼在线电子科技有限公司 | Novel white light interferometer structure |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103900493B (en) | 2016-09-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103900493A (en) | Micro-nano structure and morphology measurement device and method based on digital scanning and white light interference | |
| CN102944312B (en) | Method for measuring partially coherent vortex light beam topological charge number | |
| US8405836B2 (en) | System and method for measuring an optical fiber | |
| CN102494623B (en) | Measuring method of non-contact measuring device of center to center distance of lens optical surfaces | |
| CN104792272B (en) | Optical interference device for online real-time thickness detection | |
| CN104296698A (en) | Method for measuring evenness of optical surface with ultrahigh precision | |
| CN103115585B (en) | Based on fluorescence interference microscopic measuring method and the device of stimulated radiation | |
| CN102425998B (en) | Full parameter detection apparatus of polished surface quality of optical element and detection method thereof | |
| CN103115582B (en) | Based on the Michelson fluorescence interference micro-measurement apparatus of stimulated radiation | |
| CN101819069B (en) | White light interferometer with fast zero-setting system | |
| CN201666783U (en) | White light interferometer with a quick zero-setting system | |
| EP2369293A1 (en) | White light interferometric microscope | |
| CN202975600U (en) | Measuring device of partially coherent vortex light beams | |
| CN104913732B (en) | The normal tracking mode non-spherical measuring method and system interfered based on recombination laser | |
| CN105333815B (en) | A kind of super online interferometer measuration system of lateral resolution surface three dimension based on the scanning of spectrum colour loose wire | |
| CN106568382B (en) | Overlength optical fiber grating inscribes on-line monitoring system and method | |
| CN104792798A (en) | Total internal reflection illumination technology-based subsurface damage measuring apparatus and method thereof | |
| CN114397092B (en) | Method and system for measuring super-surface phase | |
| CN104864822A (en) | Method and system for normal tracking aspheric measurement based on laser interference | |
| CN103115583B (en) | Based on the Mirau fluorescence interference micro-measurement apparatus of stimulated radiation | |
| CN103148800A (en) | Label-free three-dimensional microscope method based on light filed propagation and device | |
| CN105333816A (en) | Super lateral resolution surface three-dimensional online interference measuring system based on spectral dispersion full field | |
| CN108562241A (en) | The apparatus and method of digital hologram flexible measuring based on fiber optic bundle | |
| CN105466668A (en) | Wave aberration measurement instrument of point diffraction interference and detection method of wave aberration of optical system | |
| CN108507981B (en) | Silicon-based waveguide back reflection sensing device based on OFDR (optical frequency domain reflectometry) and measuring method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |