CN103871945B - 基板的剥离装置和剥离方法以及电子器件的制造方法 - Google Patents
基板的剥离装置和剥离方法以及电子器件的制造方法 Download PDFInfo
- Publication number
- CN103871945B CN103871945B CN201310698272.9A CN201310698272A CN103871945B CN 103871945 B CN103871945 B CN 103871945B CN 201310698272 A CN201310698272 A CN 201310698272A CN 103871945 B CN103871945 B CN 103871945B
- Authority
- CN
- China
- Prior art keywords
- mentioned
- stripping
- substrate
- plate
- adsorption plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/0004—Component parts, details or accessories; Auxiliary operations
- B29C63/0013—Removing old coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/50—Auxiliary process performed during handling process
- B65H2301/51—Modifying a characteristic of handled material
- B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
- B65H2301/5112—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface
- B65H2301/51122—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface peeling layer of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H29/00—Delivering or advancing articles from machines; Advancing articles to or into piles
- B65H29/54—Article strippers, e.g. for stripping from advancing elements
- B65H29/56—Article strippers, e.g. for stripping from advancing elements for stripping from elements or machines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012-275538 | 2012-12-18 | ||
JP2012275538A JP6016108B2 (ja) | 2012-12-18 | 2012-12-18 | 基板の剥離装置及び剥離方法並びに電子デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103871945A CN103871945A (zh) | 2014-06-18 |
CN103871945B true CN103871945B (zh) | 2017-04-12 |
Family
ID=50910350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310698272.9A Active CN103871945B (zh) | 2012-12-18 | 2013-12-18 | 基板的剥离装置和剥离方法以及电子器件的制造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6016108B2 (ja) |
KR (1) | KR102054699B1 (ja) |
CN (1) | CN103871945B (ja) |
TW (1) | TWI601682B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102165162B1 (ko) * | 2014-03-12 | 2020-10-14 | 삼성디스플레이 주식회사 | 기판 박리 장치 및 이를 이용한 소자 제조 방법 |
JP6547403B2 (ja) * | 2014-06-05 | 2019-07-24 | Agc株式会社 | 積層体の剥離装置及び剥離方法並びに電子デバイスの製造方法 |
JP6873986B2 (ja) | 2015-10-30 | 2021-05-19 | コーニング インコーポレイテッド | 第2基板に接合された第1基板を加工する方法 |
KR102073743B1 (ko) * | 2017-12-19 | 2020-02-05 | 성진세미텍주식회사 | 필름 분리장치 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0925888A1 (en) * | 1997-12-26 | 1999-06-30 | Canon Kabushiki Kaisha | Sample separating apparatus and method, and substrate manufacture method |
JP2000084844A (ja) * | 1998-09-17 | 2000-03-28 | Asahi Glass Co Ltd | 板状体の剥離方法及びその装置 |
CN1582221A (zh) * | 2001-04-10 | 2005-02-16 | 硅绝缘技术公司 | 基片层切割设备及相关方法 |
CN101333079A (zh) * | 2008-08-06 | 2008-12-31 | 友达光电股份有限公司 | 贴膜撕离装置及方法 |
CN102202994A (zh) * | 2009-08-31 | 2011-09-28 | 旭硝子株式会社 | 剥离装置 |
-
2012
- 2012-12-18 JP JP2012275538A patent/JP6016108B2/ja active Active
-
2013
- 2013-12-17 KR KR1020130156873A patent/KR102054699B1/ko active IP Right Grant
- 2013-12-18 CN CN201310698272.9A patent/CN103871945B/zh active Active
- 2013-12-18 TW TW102147011A patent/TWI601682B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0925888A1 (en) * | 1997-12-26 | 1999-06-30 | Canon Kabushiki Kaisha | Sample separating apparatus and method, and substrate manufacture method |
JP2000084844A (ja) * | 1998-09-17 | 2000-03-28 | Asahi Glass Co Ltd | 板状体の剥離方法及びその装置 |
CN1582221A (zh) * | 2001-04-10 | 2005-02-16 | 硅绝缘技术公司 | 基片层切割设备及相关方法 |
CN101333079A (zh) * | 2008-08-06 | 2008-12-31 | 友达光电股份有限公司 | 贴膜撕离装置及方法 |
CN102202994A (zh) * | 2009-08-31 | 2011-09-28 | 旭硝子株式会社 | 剥离装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20140079310A (ko) | 2014-06-26 |
KR102054699B1 (ko) | 2019-12-11 |
JP6016108B2 (ja) | 2016-10-26 |
TW201429854A (zh) | 2014-08-01 |
CN103871945A (zh) | 2014-06-18 |
TWI601682B (zh) | 2017-10-11 |
JP2014118276A (ja) | 2014-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan, Japan Patentee after: AGC Corporation Address before: Tokyo, Japan, Japan Patentee before: Asahi Glass Co., Ltd. |
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CP01 | Change in the name or title of a patent holder |