CN103808457B - Vacuum correction device and method under low temperature - Google Patents
Vacuum correction device and method under low temperature Download PDFInfo
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- CN103808457B CN103808457B CN201310724806.0A CN201310724806A CN103808457B CN 103808457 B CN103808457 B CN 103808457B CN 201310724806 A CN201310724806 A CN 201310724806A CN 103808457 B CN103808457 B CN 103808457B
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Abstract
The invention provides vacuum correction device and method under a kind of low temperature.Wherein, vacuum correction device under low temperature, comprise the first pipeline, calibration chamber and low temperature chamber, one end of described first pipeline is communicated with described calibration chamber, the other end stretches in described low temperature chamber for being connected by school vacuum meter, be provided with temperature control plate in described low temperature chamber, described low temperature chamber is outside equipped with refrigeration machine, and the refrigeration head of described refrigeration machine is connected with described temperature control plate heat transfer, described calibration chamber is connected with extract system by the second valve, and described calibration chamber is connected with standard vacuum gauge.Such scheme, the temperature in low temperature chamber is controlled by refrigeration machine and temperature control plate, to obtain by school vacuum meter calibration factor at desired temperatures, under corresponding temperature conditions, use this during the vacuum meter of school, to be used this calibration factor described by school vacuum meter to calibrate, and then improve by school vacuum meter accuracy, reduce the uncertainty of measurement.
Description
Technical field
The present invention relates to vacuum measurement technical field, particularly relate to vacuum correction device and method under a kind of low temperature.
Background technology
Vacuum meter is widely used in industrial every field, and the Research on Calibration Technology of vacuum meter is an important research direction in vacuumatic measuring field.Document " Li Zhenghai. the method for compound type vacuum standard calibration vacuum meter. vacuum and low temperature 3 (2), 1997 " a kind of typical calibration apparatus and method of adopting when describing current vacuum gauge calibration.Complex vacuum standard device have employed the method that the dynamic and stalic state combines, and the method for dynamic comparison, static comparison, static expanding three kinds of calibration vacuum meters is compounded on a vacuum standard, and the calibration range of this device is 10
-4pa ~ 10
5pa, uncertainty is less than 10%.
The weak point of this system be device when not considering cryogenic applications temperature on the impact of vacuum meter indicating value, the calibration of vacuum meter under the normal temperature of laboratory can only be realized.When the vacuum meter be calibrated uses in low temperature environment, larger uncertainty of measurement can be caused.
Summary of the invention
Provide hereinafter about brief overview of the present invention, to provide about the basic comprehension in some of the present invention.Should be appreciated that this general introduction is not summarize about exhaustive of the present invention.It is not that intention determines key of the present invention or pith, and nor is it intended to limit the scope of the present invention.Its object is only provide some concept in simplified form, in this, as the preorder in greater detail discussed after a while.
The invention provides vacuum correction device and method under a kind of low temperature, in order to solve existing vacuum meter use in low temperature environment time, the problem of larger uncertainty of measurement can be caused.
The invention provides vacuum correction device under a kind of low temperature, comprise the first pipeline, calibration chamber and low temperature chamber, one end of described first pipeline is communicated with described calibration chamber, the other end stretches in described low temperature chamber for being connected by school vacuum meter, temperature control plate is provided with in described low temperature chamber, described low temperature chamber is outside equipped with refrigeration machine, the refrigeration head of described refrigeration machine is connected with described temperature control plate heat transfer, and described calibration chamber is connected with extract system by the second valve, and described calibration chamber is connected with standard vacuum gauge.
The invention provides a kind of calibration factor acquisition methods adopting vacuum correction device under above-mentioned low temperature, comprise the following steps:
Step 1, by the described temperature control plate that is fixed on by school vacuum meter in described low temperature chamber, and to be connected described with described first pipeline by school vacuum meter;
Step 2, open described standard vacuum gauge, and after preset duration stablized by described standard vacuum gauge, by extract system, described calibration chamber and each pipeline of being connected with described calibration chamber are bled;
Step 3, be less than after predetermined vacuum level in described calibration chamber and each pipeline vacuum tightness of being connected with described calibration chamber, calibration gas is filled with to described calibration chamber, and after described calibration chamber pressure reaches predetermined value, by described refrigeration machine and described temperature control plate, after controlling described low temperature chamber to predetermined temperature, obtained the pressure P of described calibration chamber by described standard vacuum gauge
1, by the described pressure P being obtained described calibration chamber by school vacuum meter
2; And the calibration factor c under predetermined temperature according to following Relation acquisition:
Wherein, p is normal pressure, and T is described predetermined temperature, T
1for the ambient temperature residing for described standard vacuum gauge.
Such scheme provided by the invention, the temperature in low temperature chamber is controlled by refrigeration machine and temperature control plate, to obtain by school vacuum meter calibration factor at desired temperatures, under corresponding temperature conditions, use this during the vacuum meter of school, to be used this calibration factor described by school vacuum meter to calibrate, and then improve by school vacuum meter accuracy, reduce the uncertainty of measurement.
Accompanying drawing explanation
Below with reference to the accompanying drawings illustrate embodiments of the invention, above and other objects, features and advantages of the present invention can be understood more easily.Parts in accompanying drawing are just in order to illustrate principle of the present invention.In the accompanying drawings, same or similar technical characteristic or parts will adopt same or similar Reference numeral to represent.
The structural representation of vacuum correction device under the low temperature that Fig. 1 provides for the embodiment of the present invention.
Embodiment
With reference to the accompanying drawings embodiments of the invention are described.The element described in an accompanying drawing of the present invention or a kind of embodiment and feature can combine with the element shown in one or more other accompanying drawing or embodiment and feature.It should be noted that for purposes of clarity, accompanying drawing and eliminate expression and the description of unrelated to the invention, parts known to persons of ordinary skill in the art and process in illustrating.
The structural representation of vacuum correction device under the low temperature that Fig. 1 provides for the embodiment of the present invention.As shown in Figure 1, vacuum correction device under the low temperature that the embodiment of the present invention provides, comprise the first pipeline, calibration chamber 3 and low temperature chamber 5, one end of first pipeline is communicated with calibration chamber 3, the other end stretches in low temperature chamber 5 for being connected by school vacuum meter 6, be provided with temperature control plate 7 in low temperature chamber 5, low temperature chamber 5 is outside equipped with refrigeration machine 11, and the refrigeration head of refrigeration machine 11 is connected with temperature control plate 7 heat transfer, calibration chamber 3 is connected with extract system 9 by the second valve 10, and calibration chamber 3 is connected with standard vacuum gauge 8.
Wherein, calibration chamber 3 and low temperature chamber 5 are for having the parts of specific volume size.Low temperature chamber 5 as referred to herein refers to that the temperature of this its inner space at least can be reduced to subzero 50 degrees Celsius, and in general use, the temperature in low temperature chamber 5 can be reduced to subzero 130 degrees Celsius.Heat transfer connection as referred to herein refers to that refrigeration head and temperature control plate 7 can carry out heat interchange, in actual use, refrigeration head directly can contact to carry out heat interchange with temperature control plate 7, and refrigeration head also can contact to carry out heat interchange with temperature control plate 7 by flexible heat transfer band (such as but not limited to copper strips etc.).Extract system 9 system can adopt the turbomolecular pump of series connection and the array mode of mechanical pump.Refrigeration machine 11 can adopt sterlin refrigerator.
Such scheme provided by the invention, the temperature in low temperature chamber is controlled by refrigeration machine 11 and temperature control plate 7, to obtain by school vacuum meter 6 calibration factor at desired temperatures, under corresponding temperature conditions, use this during the vacuum meter 6 of school, to be used this calibration factor described by school vacuum meter 6 to calibrate, and then improve by school vacuum meter 6 accuracy, reduce the uncertainty of measurement.
Further, calibration chamber logical 3 is crossed micrometering valve 2 and is connected with air supply system 1.Air supply system 1 can be, but not limited to as gas cylinder, stores the calibration gas of certain pressure in gas cylinder.The kind of calibration gas is determined according to actual needs, such as but not limited to employing nitrogen.The calibration gas entered in calibration chamber is controlled accurately, to improve the precision of measurement by micrometering valve.
Further, micrometering valve 2 can be, but not limited to ultrahigh vacuum all-metal micrometering valve, and employing ultrahigh vacuum all-metal micrometering valve can improve the control accuracy to calibration gas.
Further, low temperature chamber 5 is formed by stacked the putting of reflection multilayer heat-insulation material.Adopt reflection multilayer heat-insulation material to make low temperature chamber, the insulating power of low temperature chamber 5 can be improved, prevent temperature leak and cause the problem of measurement accuracy difference to occur.
Further, temperature control plate 7 comprises copper plate, and copper plate is wound with electrical heating wire.Adopt copper plate can improve heat conducting efficiency, improve the efficiency to temperature change in low temperature chamber, in needs intensification be, improve the temperature of low temperature chamber to electrical heating wire energising.
Second valve 10 can be, but not limited to ultrahigh vacuum all-metal push-pull valve.
Further, the first pipeline is connected with the first valve 4, when changing by school vacuum meter, closes the first valve 4, being convenient to carry out replacement operation.
The embodiment of the present invention also provides a kind of calibration factor acquisition methods adopting vacuum correction device under the low temperature of above-described embodiment, comprises the following steps:
Step 1, by the described temperature control plate 7 that is fixed on by school vacuum meter 6 in described low temperature chamber 5, and to be connected described with described first pipeline by school vacuum meter 6.By clamp, tested vacuum meter 6 can be fixed on temperature control plate 7.
Step 2, open described standard vacuum gauge 8, and after preset duration stablized by described standard vacuum gauge 8, by extract system 9, described calibration chamber 3 and each pipeline of being connected with described calibration chamber 3 are bled.
In real work, being received in calibration chamber 3 by standard vacuum gauge 8, stablize preset duration, is 24 hours such as but not limited to scheduled duration.By stablizing standard vacuum gauge 3, measuring accuracy can be improved.Here standard vacuum gauge 3 be through national measurement unit carry out accurate calibration after vacuum meter.This standard vacuum gauge 3 can select capacitor thin film type vacuum meter.According to the difference of measuring amount, full scale can be selected to be three capacitor thin film type vacuum meters of 0.02Torr, 10Torr, 1000Torr.The accuracy of measurement of this capacitor thin film type vacuum meter is 0.05% of full scale.
Step 3, after described calibration chamber 3 and each pipeline vacuum tightness of being connected with described calibration chamber 3 are less than or equal to predetermined vacuum level, calibration gas is filled with to described calibration chamber 3, and after described calibration chamber 3 pressure reaches predetermined value, by described refrigeration machine 11 and described temperature control plate 7, after controlling described low temperature chamber 5 to predetermined temperature, obtained the pressure P of described calibration chamber by described standard vacuum gauge 8
1, by the described pressure P being obtained described calibration chamber by school vacuum meter 6
2; And the calibration factor c under predetermined temperature according to following Relation acquisition:
Wherein, p is normal pressure, and T is described predetermined temperature, T
1for the ambient temperature residing for described standard vacuum gauge.
Generalized case, the pressure of calibration chamber reaches 1 × 10
-3the Pa order of magnitude, the air pressure after 1 minute in calibration chamber reaches mobile equilibrium, now closes micrometering valve, starts refrigeration machine and temperature control plate, is adjusted to temperature required by the temperature in low temperature chamber.
Can repetitive measurement be passed through, obtain the calibration factor under different temperatures, when reality uses, the value that obtains by school vacuum meter 6 be multiplied by calibration factor, be then standard value, improve the precision of measurement by introducing calibration factor, reducing the uncertainty of measurement.
In actual use, predetermined vacuum level is less than or equal to 1 × 10
-6pa, to improve the accuracy of measurement.Predetermined temperature is between-130 DEG C to+20 DEG C.
Last it is noted that above embodiment is only in order to illustrate technical scheme of the present invention, be not intended to limit; Although with reference to previous embodiment to invention has been detailed description, those of ordinary skill in the art is to be understood that: it still can be modified to the technical scheme described in foregoing embodiments, or carries out equivalent replacement to wherein portion of techniques feature; And these amendments or replacement, do not make the essence of appropriate technical solution depart from the spirit and scope of various embodiments of the present invention technical scheme.
Claims (10)
1. vacuum correction device under a low temperature, it is characterized in that, comprise the first pipeline, calibration chamber and low temperature chamber, one end of described first pipeline is communicated with described calibration chamber, the other end stretches in described low temperature chamber for being connected by school vacuum meter, temperature control plate is provided with in described low temperature chamber, described low temperature chamber is outside equipped with refrigeration machine, the refrigeration head of described refrigeration machine is connected with described temperature control plate heat transfer, described calibration chamber is connected with extract system by the second valve, and described calibration chamber is connected with standard vacuum gauge.
2. vacuum correction device under low temperature according to claim 1, is characterized in that, described calibration chamber is connected with air supply system by micrometering valve.
3. vacuum correction device under low temperature according to claim 2, is characterized in that, described micrometering valve is ultrahigh vacuum all-metal micrometering valve.
4. vacuum correction device under the low temperature according to claim 1 or 2 or 3, is characterized in that, described low temperature chamber is formed by stacked the putting of reflection multilayer heat-insulation material.
5. vacuum correction device under the low temperature according to claim 1 or 2 or 3, it is characterized in that, described temperature control plate comprises copper plate, and described copper plate is wound with electrical heating wire.
6. vacuum correction device under the low temperature according to claim 1 or 2 or 3, is characterized in that, described second valve is ultrahigh vacuum all-metal push-pull valve.
7. vacuum correction device under the low temperature according to claim 1 or 2 or 3, is characterized in that, described first pipeline is connected with the first valve.
8. adopt a calibration factor acquisition methods for vacuum correction device under low temperature described in Claims 2 or 3, it is characterized in that, comprise the following steps:
Step 1, by the described temperature control plate that is fixed on by school vacuum meter in described low temperature chamber, and to be connected described with described first pipeline by school vacuum meter;
Step 2, open described standard vacuum gauge, and after preset duration stablized by described standard vacuum gauge, by extract system, described calibration chamber and each pipeline of being connected with described calibration chamber are bled;
Step 3, after described calibration chamber and each pipeline vacuum tightness of being connected with described calibration chamber are less than or equal to predetermined vacuum level, calibration gas is filled with to described calibration chamber, and after described calibration chamber pressure reaches predetermined value, by described refrigeration machine and described temperature control plate, after controlling described low temperature chamber to predetermined temperature, obtained the pressure P of described calibration chamber by described standard vacuum gauge
1, by the described pressure P being obtained described calibration chamber by school vacuum meter
2; And the calibration factor c under predetermined temperature according to following Relation acquisition:
Wherein, p is normal pressure, and T is described predetermined temperature, T
1for the ambient temperature residing for described standard vacuum gauge.
9. method according to claim 8, is characterized in that, described predetermined vacuum level is less than or equal to 1 × 10
-6pa.
10. method according to claim 8 or claim 9, it is characterized in that, described predetermined temperature is between-130 DEG C to+20 DEG C.
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CN108151961B (en) * | 2017-12-08 | 2020-02-07 | 兰州空间技术物理研究所 | Extreme high vacuum calibration device and method |
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