CN103781738A - 光催化材料和包含这种材料的窗玻璃或者光电池 - Google Patents
光催化材料和包含这种材料的窗玻璃或者光电池 Download PDFInfo
- Publication number
- CN103781738A CN103781738A CN201280044525.4A CN201280044525A CN103781738A CN 103781738 A CN103781738 A CN 103781738A CN 201280044525 A CN201280044525 A CN 201280044525A CN 103781738 A CN103781738 A CN 103781738A
- Authority
- CN
- China
- Prior art keywords
- glass
- lower floor
- deposition
- dioxide
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 75
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 52
- 239000005357 flat glass Substances 0.000 title claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 78
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 238000000576 coating method Methods 0.000 claims abstract description 43
- 239000011521 glass Substances 0.000 claims abstract description 39
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 39
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 22
- 238000002485 combustion reaction Methods 0.000 claims abstract description 11
- 238000007146 photocatalysis Methods 0.000 claims description 41
- 229960001866 silicon dioxide Drugs 0.000 claims description 36
- 235000012239 silicon dioxide Nutrition 0.000 claims description 36
- 238000000151 deposition Methods 0.000 claims description 35
- 230000008021 deposition Effects 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 22
- 239000004408 titanium dioxide Substances 0.000 claims description 18
- 230000005540 biological transmission Effects 0.000 claims description 10
- 239000002241 glass-ceramic Substances 0.000 claims description 7
- 238000000137 annealing Methods 0.000 claims description 5
- 238000007667 floating Methods 0.000 claims description 3
- 230000008676 import Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000002425 crystallisation Methods 0.000 claims description 2
- 230000008025 crystallization Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 28
- 239000002243 precursor Substances 0.000 description 18
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000001294 propane Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 4
- 229960000907 methylthioninium chloride Drugs 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 238000000280 densification Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 238000004627 transmission electron microscopy Methods 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 208000034189 Sclerosis Diseases 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000009102 absorption Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052951 chalcopyrite Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910001448 ferrous ion Inorganic materials 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000005021 gait Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910021644 lanthanide ion Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- -1 siloxanes Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
- H01G9/2031—Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0238—Impregnation, coating or precipitation via the gaseous phase-sublimation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/024—Multiple impregnation or coating
- B01J37/0244—Coatings comprising several layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/349—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of flames, plasmas or lasers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/71—Photocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/77—Coatings having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Surface Treatment Of Glass (AREA)
- Catalysts (AREA)
- Laminated Bodies (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Photovoltaic Devices (AREA)
Abstract
本发明的主题是包含玻璃或者玻璃陶瓷片材的材料,该片材在它的面之一的至少一部分上被提供有沉积在基于二氧化硅的下层上的基于二氧化钛的光催化涂层,该基于二氧化硅的下层通过燃烧化学气相沉积进行沉积,其粗糙度Ra为4-30纳米,包括端值。
Description
本发明涉及包含被提供有光催化涂层的玻璃基材的材料的领域。
光催化涂层,特别地基于二氧化钛的光催化涂层因为被提供该涂层的基材提供自清洁和抗污性质而已知。两种性质是这些有利特征的来源。二氧化钛首先是光催化性的,即它在适合的辐射(通常紫外辐射)下能催化有机化合物的降解反应。这种光催化活性在该层内通过产生电子-空穴对而被引发。此外,当二氧化钛被这种相同类型辐射照射时,它具有极其明显的亲水性。这种高亲水性,有时描述为"超亲水性",允许在水径流(例如雨水径流)下除去无机污物。这种材料,特别地窗玻璃,被例如描述在申请EP-A-0850204中。
二氧化钛具有高折射指数,这引起高光反射因子(对于提供有光催化涂层的基材来说)。这构成在用于建筑物的窗玻璃领域,甚至特别地在光电池领域中的缺点,对于它们需要使朝向光电材料的透射最大化,并因此使日光辐射的所有吸收和反射减到最少。然而,存在需要提供具有光催化涂层的光电池,因为污物的沉积可以使光电池的效率降低约6%/月。这个数字显然地取决于电池的地理位置。
为了降低光反射因子,可以降低光催化涂层的厚度,但是这是以牺牲它们的光催化活性来实现的。
本发明的目的是提出基于二氧化钛的光催化材料,其同时结合了高光催化活性和低光反射因子。
为此目的,本发明一个主题是包含玻璃或者玻璃陶瓷片材的材料,该片材在它的面之一的至少一部分上被提供有沉积在基于二氧化硅的下层上的基于二氧化钛的光催化涂层,该基于二氧化硅的下层通过燃烧化学气相沉积进行沉积,其粗糙度Ra为4-30纳米,包括端值。
本发明的另一主题是用于获得根据本发明的材料的方法。这种优选的方法包含以下步骤:
- 使用燃烧化学气相沉积方法在玻璃或者玻璃陶瓷片材上沉积该基于二氧化硅的下层,然后
- 在所述基于二氧化硅的下层上沉积基于二氧化钛的光催化涂层,所述下层在沉积所述光催化涂层之前和/或在沉积所述光催化涂层期间经受至少300℃的温度。
已经证实,使用通过燃烧化学气相沉积获得的特别粗糙的基于二氧化硅的下层能够显著地降低该材料的光反射因子。
粗糙度Ra对应于该粗糙度轮廓的算术平均偏差。这种值通过原子力显微镜以非接触方式并且使用其曲率半径为15nm的硅探针(pointe en silicium)对1000nm边长的正方形进行测量。
该基材是玻璃或者玻璃陶瓷片材。该片材可以是平面或者弯曲的,并且可以具有任何类型尺寸,特别地大于1米的尺寸。该玻璃优选地是钠-钙-硅类型,但是还可以使用其它类型玻璃,如硼硅酸盐玻璃或者铝硅酸盐玻璃。该玻璃可以是明亮的或者极明亮的,或着色的,例如蓝色、绿色、琥珀色、青铜色或者灰色色调。该玻璃片材的厚度典型地为0.5-19毫米,特别地为2-12毫米,甚至4-8毫米。在光电池领域中,该玻璃优选是极明亮的;它优选地包含最多150ppm,甚至100ppm,甚至90ppm的氧化铁总重量含量,或者最多0.2,尤其0.1的氧化还原值(rédox),甚至零氧化还原值。术语"氧化还原值"理解为表示在亚铁离子氧化物的重量含量(用FeO形式表示)和氧化铁的总重量含量(用Fe2O3形式表示)之间的比率。
所述基于二氧化钛的光催化涂层优选地由二氧化钛,特别地以锐钛矿形式结晶的二氧化钛构成,其是最活性形式。锐钛矿相和金红石相的混合物也是可考虑的。所述二氧化钛可以是纯的或者掺杂的,例如用过渡金属(尤其W,Mo,V,Nb),镧系元素离子或者贵金属(如,例如,铂,钯),或用氮、碳或者氟原子掺杂。这些不同的掺杂形式使得可以提高所述材料的光催化活性,或者使二氧化钛的能带隙移动到接近于可见光区或者在这种区域内的波长。
该光催化涂层通常是在基材上沉积的堆叠体的最后层,换句话说该堆叠体的离基材最远的层。这是因为,使光催化涂层与大气和它的污染物接触是重要的。然而可以在光催化层上沉积非常薄的层,通常是不连续的或者多孔的层。例如,它可以是基于旨在提高该材料的光催化活性的贵金属的层。
该光催化涂层的厚度优选为1-20nm,特别地2-15nm,甚至3-10nm,包括端值。大的厚度允许提高该层的光催化活性但是以牺牲光反射为代价。在本文的全文中,所述厚度为物理厚度。
该基于二氧化硅的下层优选由二氧化硅制成,即由二氧化硅组成。理解的是,二氧化硅可以是纯的或者掺杂的,或者可以不是化学计量的。该二氧化硅可以,例如,用硼或者磷原子,或用碳或者氮原子进行掺杂。
该基于二氧化硅的下层优选与该基材接触地进行沉积。
基于二氧化硅的下层的粗糙度Ra有利地为5至25nm,包括端值,特别地8至20nm,或者10至15nm。
基于二氧化硅的下层的厚度优选为10至100nm,包括端值,特别地10至80nm,甚至15至50nm,甚至20至30nm。足够的厚度允许该下层充当对来源于基材的碱金属离子(当基材包含它们时,例如,如果基材是钠-钙-硅玻璃基材)的迁移的阻隔层。
该基于二氧化硅的下层优选为无孔的,特别地在通过显微镜技术,如透射电子显微术(MET)没有观察到孔隙的意义上来说。在沉积之前和/或在沉积该光催化涂层期间,使下层经受在根据本发明的优选方法中使用的至少300℃的温度的目的是使下层致密。
根据本发明的材料优选地具有至少85%,甚至88%,甚至90%或者91%的光透射因子(在ISO 9050: 2003标准的意义上)和/或最多10%,优选地9%或者8%的光反射因子(在ISO 9050:2003标准的意义上)。
该基于二氧化硅的下层通过燃烧化学气相沉积进行沉积。这种技术,还以它的英文缩写CCVD(对于“Combustion CVD”)所已知的,其在于使待沉积的层的至少一种前体(通常有机金属化合物,金属盐或者卤化物)在放置于该基材附近的火焰中反应或者分解。该方法通常在大气压下进行实施。该前体,纯的或者溶于溶剂中,在热量作用下分解并且沉积在该基材上。在连续方法中,火焰典型地由在该基材的整个宽度上延伸的固定线状燃烧器产生,该基材面对该燃烧器行进。该火焰由在燃料(典型地丙烷或者丁烷,和在这种情况下,溶剂优选是不可燃的,或当溶剂可燃时是该溶剂)和氧化剂(典型地空气,富氧空气或者氧)之间的反应产生。该二氧化硅前体典型地是硅的有机金属化合物或者有机盐,如硅烷或者硅氧烷。六甲基二硅氧烷(HDMSO)和原硅酸四乙酯(TEOS)是特别适合的。该二氧化硅前体还可以是含卤素化合物,如,例如SiCl4。该溶剂可以是可燃的,如有机溶剂,或者优选不燃的,典型地水。
该基材可以在该沉积之前和/或在该沉积期间,例如在300℃至600℃,特别地400℃至550℃的温度进行加热。
已经证实,这种方法使得可以,在下面列出的一定条件下,获得特别粗糙的二氧化硅层,特别地与其它技术如CVD相比较。不希望束缚于任一种科学理论,将显示的是,在下文中具体说明的一定条件下,前体在火焰内的分解形成二氧化硅的纳米颗粒,其然后在层上沉积形成堆集体,因此提供显著的粗糙度。该下层的随后加热允许使它致密并且使它附着在基材上,但是令人惊讶地不显著地降低它的粗糙度。二氧化硅基层的高粗糙度可以通过提高纳米颗粒的尺寸而获得。为此,可以实施至少一种以下调节:提高颗粒在火焰中的停留时间,降低燃料和氧化剂的流速,提高在燃烧器和基材之间的距离,提高该前体在该溶剂中的浓度,提高前体的流速。待赋予这些参数的精确值当然强烈地取决于使用的沉积装置,使得它们不能在这里绝对地进行具体说明。在下文中详细说明的示例性实施例具体说明了某些值。
在沉积所述光催化涂层之前和/或在沉积所述光催化涂层期间,该基于二氧化硅的下层优选经受至少400℃,甚至500℃的温度。
光催化涂层的沉积优选通过化学气相沉积进行实施。它还可以通过其它沉积技术,如,例如燃烧化学气相沉积进行实施。
化学气相沉积,通常以它的英文缩写CVD表示,是使用气态前体的热解方法,该前体在该基材的热量的作用下分解。在二氧化钛的情况下,该前体可以是,举例来说,四氯化钛,四异丙醇钛或者四正丁醇钛。
优选,该下层的沉积和该光催化涂层的沉积在用于通过漂浮方法(也称为“浮法”)制备玻璃的生产线上依次进行实施。在这种连续方法中,玻璃带通过将约1100℃的玻璃倾倒在容器(称为“浮厢”)内熔融锡浴上而获得。在这种容器出口,玻璃的温度为约500℃至600℃,和该玻璃带然后进入称为退火炉(étenderie)的容器中,在那里该玻璃以受控方式进行冷却以除去在玻璃中所有残余的机械应力。优选,在浮厢的出口和退火炉的进口之间,该下层的沉积和该光催化涂层的沉积依次进行实施。用于燃烧化学气相沉积的燃烧器和化学气相沉积喷嘴因此优选被安装在浮厢的出口和该退火炉的进口之间。典型地,当基于二氧化硅的下层在进行沉积时该玻璃的温度为480℃至600℃,特别地500℃至550℃,和当光催化涂层在进行沉积时,该玻璃的温度为430℃至550℃,特别地450℃至500℃。这样,在该沉积该光催化涂层之前和在沉积该光催化涂层期间该基于二氧化硅的下层自然地经受至少300℃的温度,并因此被致密化和连接到该基材,而不必提供另外的能量,例如通过将该基材放置在炉中。
本发明的另一主题是包含至少一种根据本发明的材料的窗玻璃或者光电池。
该可以是单层窗玻璃或者多层窗玻璃,特别地双层或者三层窗玻璃,在它窗玻璃可以包含多个玻璃片材(提供充气空间)的意义上来说。该窗玻璃还可以进行层压和/或淬火和/或硬化和/或弯曲。
根据本发明的材料的另一面,或者必要时,该多层窗玻璃的其它基材的面,可以用其它功能层或者用功能层堆叠体涂覆。它特别地可以是其它光催化层。它还可以是具有热功能的层或者堆叠体,特别地防晒或者低辐射层或者堆叠体,例如包含用电介质层保护的银层的堆叠体。它还可以是镜层,特别地基于银的镜层。它最后可以是旨在使窗玻璃不透明的漆或者瓷釉以由此制造正墙面板(panneau de parement de façade),被称为“拱肩玻璃(allège)”。该拱肩玻璃被设置在非不透明化的玻璃窗侧的墙面上并且允许获得完全玻璃化的并且从美学角度看是均匀的墙面。
在根据本发明的光电池中,根据本发明的材料优选地是电池的正面基材,即日光辐射最先通过的基材。该光催化涂层这时通常设置朝向外界,使得自清洁作用可以有效地得到显示。
对于作为光电池的应用,并且为了使电池的能量效率最大化,可以同时地或者替换地进行多种改善:
- 在与提供有根据本发明的涂层的面相对的面上,该玻璃片材可以有利地用至少一个薄的透明并导电的层涂覆,例如基于SnO2:F、SnO2:Sb、ZnO:Al或ZnO:Ga的层。这些层可以通过不同的沉积方法被沉积在该基材上,如化学气相在上沉积的(CVD)或者通过阴极溅射沉积,特别地磁场增强阴极溅射(磁控管溅射方法)。在CVD方法中,使卤化物或者有机金属前体蒸发并且通过载气输送直至热玻璃的表面,在那里它们在热量的作用下分解以形成薄层。CVD方法的优点是它可以在用于形成玻璃片材的工艺中实施,特别地当该工艺是浮法工艺时。因此在玻璃片材在锡浴上,在锡浴的出口或在玻璃退火炉中(即在玻璃片材进行退火以消除机械应力)时,可以沉积该层。
- 该用透明导电层涂覆的玻璃片材可以随后用基于无定形硅或者多晶硅、黄铜矿(特别地CIS–CuInSe2或者CIGS–CuInGaSe2类型)或者CdTe的半导体涂覆以形成光电池。在这种情况下,CVD方法的另一个优点在于获得更大的粗糙度,其产生光-俘获现象,其提高由该半导体所吸收的光子量。根据本发明存在粗糙基于二氧化硅的下层还有助于放大这种光俘获现象。
- 该玻璃片材的表面可以进行纹理化,例如具有图案(特别地金字塔状图案),如描述在申请WO03/046617、WO2006/134300、WO2006/134301或WO2007/015017中。这些纹理化通常使用轧制玻璃成型方法获得。
本发明借助于以下非限制性实施例得到更好理解,所述实施例通过附图1和2进行说明。
第一系列实施例
实施例1
在玻璃基材上通过燃烧化学气相沉积(CCVD)沉积具有30nm厚度的二氧化硅下层。为此,将通过丙烷(流速6 l/min)与空气(流速150 l/min)的燃烧获得的火焰设置在离待涂覆的表面15mm处。该基材以2m/min的速度在该火焰下方通过,而将HDMSO(六甲基二硅氧烷)前体以0.5 l/min的流速引入火焰中。
在沉积该下层之后,具有约10nm厚度的二氧化钛光催化涂层通过CVD技术被沉积在下层上。为此,被提供有下层的基材被加热至约530℃,和使溶于载气(氮气)中的二氧化钛的前体(四异丙醇钛)与该基材的表面接触。
实施例2
这种实施例如同实施例1进行实施,唯一区别是该二氧化硅下层由于第二次通过是更厚的(60nm)。在第二通过期间,丙烷的流速为10 l/min,空气的流速为250
l/min和前体的流速是1 l/min。在火焰和基材之间的距离为30mm。
对比实施例
在对比实施例1中,该光催化涂层如同在根据本发明的实施例1的情况一样地获得。相反地,该下层是通过CVD(而不通过CCVD)沉积的氧碳化硅层,因此是更少粗糙的。
在对比实施例2中,该下层是通过磁控管阴极溅射沉积的二氧化硅层,其也是更少粗糙的。该光催化涂层是与对比实施例1的情况相同。
附图1是通过实施例1的表面的原子力显微镜(AFM)获得的底片,原子力显微镜允许观察到由二氧化硅下层提供的高粗糙度。
附图2归集了四个实施例的透射谱。
以下表1总结了所述测试的结果。对于每个实施例,它指出以下量值:
- 粗糙度Ra,用nm计,
- 光催化活性Kb,用μg.1-1.min-1计,
- 光反射因子RL,光透射因子TL和能量传递因子TE,在ISO
9050: 2003标准的意义内,
- “TSQE”透射因子,其对应于该材料的透射谱和该非晶态硅的量子效率的曲线的卷积积分。这种因子允许评价该材料在用于所述使用非晶态硅的光电池的相应波长中的透射。
粗糙度Ra使用Nanoscope IIIa原子力显微镜(AFM)对具有1000nm边长的正方形以非接触方式并且使用其曲率半径为15nm的硅探针进行测量。
该光催化活性借助于在紫外辐射存在时亚甲基蓝的降解速率的测量进行评价。在密封池中使亚甲基蓝水溶液与经涂覆的基材(后者形成该池的底部)接触。在暴露于紫外辐射30分钟后,亚甲基蓝的浓度通过光透射测量进行评价。光催化活性的值(用Kb指示并且用μg.l-1.min-1计)对应于单位暴露时间亚甲基蓝浓度的降低。
实施例 | Ra (nm) | Kb (μg.l-1. min-1) | RL (%) | TL (%) | TE (%) | TSQE (%) |
1 | 10.4 | 41 | 9 | 89 | 84 | 88 |
2 | 12.0 | 42 | 8 | 90 | 85 | 89 |
对比1 | 1.5 | 40 | 12 | 86 | 81 | 85 |
对比2 | 0.6 | 38 | 12 | 86 | 81 | 84 |
表1。
第二系列实施例
实施例3
将具有20nm厚度的二氧化硅下层通过CCVD沉积在具有2mm厚度的明亮玻璃片材上。为此,在空气-丙烷火焰下进行六次通过,通过使用HDMSO前体在乙醇中的溶液进行制备。该丙烷和空气流速分别为8和160 l/min。前体在乙醇中的浓度为0.1mol/l,将前体溶液引入到火焰中的流速为2μl/min。在燃烧器和基材之间的距离为7mm和基材的行进速度为6m/h。在该沉积之前,基材在520℃温度下进行加热。
该光催化涂层与前述实施例的光催化涂层相似。
对比实施例3:
用于二氧化硅下层的沉积条件与实施例3的沉积条件不同在于在基材和燃烧器之间的距离为5mm,前体溶液的引入流速为1μl/min。
实施例 | Ra (nm) | RL (%) | TL (%) |
3 | 21.7 | 8 | 90 |
对比3 | 1.2 | 11 | 87 |
表2。
与根据本发明的实施例3的粗糙度相比,用于对比实施例3的沉积条件引起非常低的粗糙度。
这些结果证明:使用通过CCVD获得的粗糙下层允许显著地降低该材料的反射,直至实现裸露玻璃数量级的反射,甚至更低的反射。这由此引起高3至4个点的光透射和能量传递,而不会使光催化活性退化。
通过拉曼光谱测定法的分析显示对于所有的样品存在锐钛矿。
通过对侧面实施的透射电子显微术对该材料的观测显示二氧化硅层是致密的,并且无任何孔隙度。
Claims (15)
1.包含玻璃或者玻璃陶瓷片材的材料,该片材在它的面之一的至少一部分上被提供有沉积在基于二氧化硅的下层上的基于二氧化钛的光催化涂层,该基于二氧化硅的下层通过燃烧化学气相沉积进行沉积,其粗糙度Ra为4-30纳米,包括端值。
2.根据前述权利要求之一的材料,其中所述光催化涂层由二氧化钛,特别地以锐钛矿形式结晶的二氧化钛制成。
3.根据前述权利要求之一的材料,其中该基于二氧化硅的下层由二氧化硅制成。
4.根据前述权利要求之一的材料,其中该下层与该基材接触地进行沉积。
5.根据前述权利要求之一的材料,其中下层的粗糙度Ra为5-25nm,包括端值。
6.根据前述权利要求之一的材料,其中基于二氧化硅的下层的厚度为10-100nm,特别地10-80nm,包括端值。
7.根据前述权利要求之一的材料,其中该光催化涂层是在玻璃或玻璃陶瓷片材上沉积的堆叠体的最后层。
8.根据前述权利要求之一的材料,其中该光催化涂层的厚度为1-20nm,包括端值。
9.根据前述权利要求之一的材料,其具有至少80%,甚至90%的在ISO 9050: 2003标准的意义上的光透射因子和最多10%,甚至9%的在ISO 9050: 2003标准的意义上的光反射因子。
10.包含至少一种根据前述权利要求之一的材料的窗玻璃或者光电池。
11.用于获得根据权利要求1-9之一的材料的方法,包括以下步骤:
- 使用燃烧化学气相沉积方法在玻璃或者玻璃陶瓷片材上沉积基于二氧化硅的下层,然后
- 在所述基于二氧化硅的下层上沉积基于二氧化钛的光催化涂层,所述下层在沉积所述光催化涂层之前和/或在沉积所述光催化涂层期间经受至少300℃的温度。
12.根据前一权利要求的方法,其中光催化涂层的沉积通过化学气相沉积进行实施。
13.根据权利要求11或12的方法,其中该光催化涂层是在玻璃或玻璃陶瓷片材上沉积的堆叠体的最后层。
14.根据权利要求11-13之一的方法,其中该下层的沉积和该光催化涂层的沉积在通过漂浮方法制备玻璃的生产线上依次进行实施。
15.根据前一权利要求的方法,其中在浮厢的出口和退火炉的进口之间,该下层的沉积和该光催化涂层的沉积依次进行实施。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1158120A FR2979910B1 (fr) | 2011-09-13 | 2011-09-13 | Materiau photocatalytique et vitrage ou cellule photovoltaique comprenant ce materiau |
FR1158120 | 2011-09-13 | ||
PCT/FR2012/052035 WO2013038104A1 (fr) | 2011-09-13 | 2012-09-12 | Materiau photocatalytique et vitrage ou cellule photovoltaique comprenant ce materiau |
Publications (1)
Publication Number | Publication Date |
---|---|
CN103781738A true CN103781738A (zh) | 2014-05-07 |
Family
ID=47022957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201280044525.4A Pending CN103781738A (zh) | 2011-09-13 | 2012-09-12 | 光催化材料和包含这种材料的窗玻璃或者光电池 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20140338749A1 (zh) |
EP (1) | EP2755927A1 (zh) |
JP (1) | JP2014534143A (zh) |
KR (1) | KR20140063682A (zh) |
CN (1) | CN103781738A (zh) |
FR (1) | FR2979910B1 (zh) |
WO (1) | WO2013038104A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105669044A (zh) * | 2015-12-31 | 2016-06-15 | 株洲醴陵旗滨玻璃有限公司 | 一种在线易洁镀膜玻璃及其制备方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3431455A1 (fr) * | 2017-07-20 | 2019-01-23 | AGC Glass Europe | Verre à entretien facilité |
FR3083228B1 (fr) * | 2018-06-27 | 2020-06-26 | Saint-Gobain Glass France | Vitrage muni d'un empilement de couches minces agissant sur le rayonnement solaire et d'une couche barriere |
FR3105211B1 (fr) * | 2019-12-18 | 2021-12-31 | Saint Gobain | Vitrage photocatalytique comprenant une couche à base de nitrure de titane |
CN114551606A (zh) | 2021-09-16 | 2022-05-27 | 晶科能源(海宁)有限公司 | 一种太阳能电池、光伏组件 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6379776B1 (en) * | 1996-12-18 | 2002-04-30 | Nippon Sheet Glass Co., Ltd. | Nonfogging and stainproof glass articles |
CN1474881A (zh) * | 2000-09-20 | 2004-02-11 | ����ʥ��ಣ���� | 具有光催化涂层的底材 |
US20050175852A1 (en) * | 2002-03-19 | 2005-08-11 | Hiroki Okudera | Thin silica film and silica-titania composite film, and method for preparing them |
CN1662467A (zh) * | 2002-04-17 | 2005-08-31 | 法国圣戈班玻璃厂 | 具有自清洁涂层的基底 |
US20070113881A1 (en) * | 2005-11-22 | 2007-05-24 | Guardian Industries Corp. | Method of making solar cell with antireflective coating using combustion chemical vapor deposition (CCVD) and corresponding product |
US20090117273A1 (en) * | 2007-11-05 | 2009-05-07 | Guardian Industries Corp., | Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings |
US20100203287A1 (en) * | 2009-02-10 | 2010-08-12 | Ngimat Co. | Hypertransparent Nanostructured Superhydrophobic and Surface Modification Coatings |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2738813B1 (fr) | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
FR2832811B1 (fr) | 2001-11-28 | 2004-01-30 | Saint Gobain | Plaque transparente texturee a forte transmission de lumiere |
DE102005027799B4 (de) | 2005-06-16 | 2007-09-27 | Saint-Gobain Glass Deutschland Gmbh | Verfahren zum Herstellen einer transparenten Scheibe mit einer Oberflächenstruktur und Vorrichtung zum Durchführen des Verfahrens |
DE102005027737B4 (de) | 2005-06-16 | 2013-03-28 | Saint-Gobain Glass Deutschland Gmbh | Verwendung einer transparenten Scheibe mit einer dreidimensionalen Oberflächenstruktur als Deckscheibe für Bauelemente zur Nutzung des Sonnenlichts |
FR2889525A1 (fr) | 2005-08-04 | 2007-02-09 | Palumed Sa | Nouveaux derives de polyquinoleines et leur utilisation therapeutique. |
JP2011119626A (ja) * | 2009-12-07 | 2011-06-16 | Central Glass Co Ltd | 低反射膜で被覆してなる太陽電池パネル用カバーガラス及びその製法 |
-
2011
- 2011-09-13 FR FR1158120A patent/FR2979910B1/fr not_active Expired - Fee Related
-
2012
- 2012-09-12 EP EP12773023.2A patent/EP2755927A1/fr not_active Withdrawn
- 2012-09-12 CN CN201280044525.4A patent/CN103781738A/zh active Pending
- 2012-09-12 WO PCT/FR2012/052035 patent/WO2013038104A1/fr active Application Filing
- 2012-09-12 JP JP2014530293A patent/JP2014534143A/ja active Pending
- 2012-09-12 US US14/344,558 patent/US20140338749A1/en not_active Abandoned
- 2012-09-12 KR KR1020147006344A patent/KR20140063682A/ko not_active Application Discontinuation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6379776B1 (en) * | 1996-12-18 | 2002-04-30 | Nippon Sheet Glass Co., Ltd. | Nonfogging and stainproof glass articles |
CN1474881A (zh) * | 2000-09-20 | 2004-02-11 | ����ʥ��ಣ���� | 具有光催化涂层的底材 |
US20050175852A1 (en) * | 2002-03-19 | 2005-08-11 | Hiroki Okudera | Thin silica film and silica-titania composite film, and method for preparing them |
CN1662467A (zh) * | 2002-04-17 | 2005-08-31 | 法国圣戈班玻璃厂 | 具有自清洁涂层的基底 |
US20070113881A1 (en) * | 2005-11-22 | 2007-05-24 | Guardian Industries Corp. | Method of making solar cell with antireflective coating using combustion chemical vapor deposition (CCVD) and corresponding product |
US20090117273A1 (en) * | 2007-11-05 | 2009-05-07 | Guardian Industries Corp., | Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings |
US20100203287A1 (en) * | 2009-02-10 | 2010-08-12 | Ngimat Co. | Hypertransparent Nanostructured Superhydrophobic and Surface Modification Coatings |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105669044A (zh) * | 2015-12-31 | 2016-06-15 | 株洲醴陵旗滨玻璃有限公司 | 一种在线易洁镀膜玻璃及其制备方法 |
CN105669044B (zh) * | 2015-12-31 | 2018-05-29 | 株洲醴陵旗滨玻璃有限公司 | 一种在线易洁镀膜玻璃及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2755927A1 (fr) | 2014-07-23 |
US20140338749A1 (en) | 2014-11-20 |
WO2013038104A1 (fr) | 2013-03-21 |
FR2979910A1 (fr) | 2013-03-15 |
JP2014534143A (ja) | 2014-12-18 |
KR20140063682A (ko) | 2014-05-27 |
FR2979910B1 (fr) | 2014-01-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103003216B (zh) | 窗玻璃 | |
US8133599B2 (en) | Undercoating layers providing improved photoactive topcoat functionality | |
US7998586B2 (en) | Undercoating layers providing improved topcoat functionality | |
KR101567615B1 (ko) | 박막 광전지 애플리케이션용 투명 전도성 산화물 코팅 및 이의 제조 방법 | |
US20090104369A1 (en) | Method for producing functional glass surfaces by changing the composition of the original surface | |
CN103619772B (zh) | 用于制备包含多孔层的窗玻璃的方法 | |
US20130032202A1 (en) | Photocatalytic material and glass sheet or photovoltaic cell including said material | |
JP2004535922A (ja) | 光活性の被膜、被覆物品およびその製法 | |
US20100124642A1 (en) | Undercoating layers providing improved conductive topcoat functionality | |
CN103781738A (zh) | 光催化材料和包含这种材料的窗玻璃或者光电池 | |
Ghazzal et al. | Effect of compressive stress inducing a band gap narrowing on the photoinduced activities of sol–gel TiO2 films | |
RU2481364C2 (ru) | Промежуточные слои, обеспечивающие улучшенную функциональность верхнего слоя | |
JP2006521470A (ja) | チタニア被膜 | |
CN102922824A (zh) | 一种具有硅碳氧阻挡层薄膜的低辐射玻璃及其制备方法 | |
CN103370441B (zh) | 用于获得光催化材料的方法 | |
JP4935114B2 (ja) | 太陽電池用透明導電性基板およびその製造方法 | |
JP2018076187A (ja) | ガラス物品、および、その製造方法 | |
Greenberg | Thin films on float glass: the extraordinary possibilities | |
JP2005330172A (ja) | ガラス板およびその製造方法、低反射性透明ガラス板、低反射性透明導電基板およびその製造方法、ならびに、低反射性透明導電基板を用いた光電変換素子 | |
CN103459344B (zh) | 具有轻微粗糙层的玻璃基材 | |
JP2002348145A (ja) | 近赤外線遮断ガラス |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140507 |