CN1037703C - 制造近似圆顶形的电介质冷光镜涂层的pcvd工艺和执行该工艺的设备 - Google Patents

制造近似圆顶形的电介质冷光镜涂层的pcvd工艺和执行该工艺的设备 Download PDF

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Publication number
CN1037703C
CN1037703C CN91101602A CN91101602A CN1037703C CN 1037703 C CN1037703 C CN 1037703C CN 91101602 A CN91101602 A CN 91101602A CN 91101602 A CN91101602 A CN 91101602A CN 1037703 C CN1037703 C CN 1037703C
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China
Prior art keywords
moving body
dome
coating
gas
substrate
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Expired - Fee Related
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CN91101602A
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English (en)
Chinese (zh)
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CN1055015A (zh
Inventor
海恩茨-沃纳·埃茨科恩
哈拉尔德·克吕梅尔
福尔克·帕凯
冈特·魏德曼
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Schott AG
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Schott Glaswerke AG
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Publication of CN1055015A publication Critical patent/CN1055015A/zh
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Publication of CN1037703C publication Critical patent/CN1037703C/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45517—Confinement of gases to vicinity of substrate
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CN91101602A 1990-03-16 1991-03-16 制造近似圆顶形的电介质冷光镜涂层的pcvd工艺和执行该工艺的设备 Expired - Fee Related CN1037703C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP4008405.1 1990-03-16
DE4008405A DE4008405C1 (US06811534-20041102-M00003.png) 1990-03-16 1990-03-16

Publications (2)

Publication Number Publication Date
CN1055015A CN1055015A (zh) 1991-10-02
CN1037703C true CN1037703C (zh) 1998-03-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN91101602A Expired - Fee Related CN1037703C (zh) 1990-03-16 1991-03-16 制造近似圆顶形的电介质冷光镜涂层的pcvd工艺和执行该工艺的设备

Country Status (6)

Country Link
US (1) US5154943A (US06811534-20041102-M00003.png)
EP (1) EP0446596B1 (US06811534-20041102-M00003.png)
JP (1) JP2628414B2 (US06811534-20041102-M00003.png)
CN (1) CN1037703C (US06811534-20041102-M00003.png)
CA (1) CA2038292C (US06811534-20041102-M00003.png)
DE (2) DE4008405C1 (US06811534-20041102-M00003.png)

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DE4120176C1 (US06811534-20041102-M00003.png) * 1991-06-19 1992-02-27 Schott Glaswerke, 6500 Mainz, De
DE4228853C2 (de) 1991-09-18 1993-10-21 Schott Glaswerke Optischer Wellenleiter mit einem planaren oder nur geringfügig gewölbten Substrat und Verfahren zu dessen Herstellung sowie Verwendung eines solchen
US5134963A (en) * 1991-10-28 1992-08-04 International Business Machines Corporation LPCVD reactor for high efficiency, high uniformity deposition
DE4137606C1 (US06811534-20041102-M00003.png) * 1991-11-15 1992-07-30 Schott Glaswerke, 6500 Mainz, De
JP2513976B2 (ja) * 1991-12-13 1996-07-10 エイ・ティ・アンド・ティ・コーポレーション 複数の球状部品の被覆方法
US5352487A (en) * 1992-08-31 1994-10-04 Gte Products Corporation Process for the formation of SiO2 films
DE4334572C2 (de) * 1992-10-26 1995-12-07 Schott Glaswerke Verfahren und Vorrichtung zur Beschichtung der Innenfläche stark gewölbter im wesentlichen kalottenförmiger Substrate mittels CVD
EP0595159B1 (de) * 1992-10-26 1997-12-29 Schott Glaswerke Verfahren und Vorrichtung zur Beschichtung der Innenfläche stark gewölbter im wesentlichen kalottenförmiger Substrate mittels CVD
JPH07333404A (ja) * 1994-02-15 1995-12-22 Dainippon Printing Co Ltd 光学機能性膜、光学機能性フィルム、防眩性反射防止フィルム、その製造方法、偏光板および液晶表示装置
EP0753082B1 (de) * 1994-03-29 1999-07-07 Schott Glas Pcvd-verfahren und vorrichtung zur beschichtung von gewölbten substraten
US5466906A (en) * 1994-04-08 1995-11-14 Ford Motor Company Process for coating automotive engine cylinders
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
DE19540414C1 (de) * 1995-10-30 1997-05-22 Fraunhofer Ges Forschung Kaltlichtreflektor
JP2000510910A (ja) * 1996-05-22 2000-08-22 テトラ ラバル ホールディングス アンド ファイナンス エス アー 容器の内面を処理する方法及び装置
DE19622550A1 (de) * 1996-06-05 1997-12-11 Schott Glaswerke Glasbehälter insbesondere zur Aufbewahrung pharmazeutischer oder diagnostischer Lösungen
DE19629877C1 (de) * 1996-07-24 1997-03-27 Schott Glaswerke CVD-Verfahren und Vorrichtung zur Innenbeschichtung von Hohlkörpern
DE19634795C2 (de) * 1996-08-29 1999-11-04 Schott Glas Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren
DE19740806C2 (de) * 1997-09-17 1999-10-07 Schott Glas Mikrotiterplatte aus Kunststoff
DE19754056C1 (de) * 1997-12-05 1999-04-08 Schott Glas Verfahren zum Beschichten von Elastomerkomponenten
US20020011215A1 (en) * 1997-12-12 2002-01-31 Goushu Tei Plasma treatment apparatus and method of manufacturing optical parts using the same
DE19801320B4 (de) 1998-01-16 2004-08-26 Schott Glas Befüllter und verschlossener Kunststoffbehälter und Verfahren zu seiner Herstellung
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US6629763B2 (en) * 2000-06-17 2003-10-07 Schott Glas Object which has optical layers
DE10112731A1 (de) * 2001-03-14 2002-10-02 Schott Glas Beschichtung von Substraten
US7171919B2 (en) * 2001-03-27 2007-02-06 Small Business Corporation Diamond film depositing apparatus using microwaves and plasma
DE10204363A1 (de) * 2002-02-02 2003-08-14 Schott Glas Interferenzbeschichtung zur Verbesserung des Energiehaushaltes von HID-Lampen
ATE322561T1 (de) * 2002-05-24 2006-04-15 Schott Ag Vorrichtung für cvd-beschichtungen
DE10242752B4 (de) * 2002-09-13 2005-01-13 Schott Glas Vorrichtung und Verfahren zum automatischen Beschicken einer Vielzahl von Bearbeitungsstationen sowie Beschichtungsanlage mit einer derartigen Vorrichtung
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Also Published As

Publication number Publication date
JPH04224681A (ja) 1992-08-13
CN1055015A (zh) 1991-10-02
DE59103456D1 (de) 1994-12-15
JP2628414B2 (ja) 1997-07-09
EP0446596A2 (de) 1991-09-18
EP0446596B1 (de) 1994-11-09
US5154943A (en) 1992-10-13
CA2038292C (en) 1995-04-18
EP0446596A3 (en) 1991-11-06
DE4008405C1 (US06811534-20041102-M00003.png) 1991-07-11

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