CN103733020A - 用于特征化对象并监视制造过程的方法与设备 - Google Patents

用于特征化对象并监视制造过程的方法与设备 Download PDF

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Publication number
CN103733020A
CN103733020A CN201280037171.0A CN201280037171A CN103733020A CN 103733020 A CN103733020 A CN 103733020A CN 201280037171 A CN201280037171 A CN 201280037171A CN 103733020 A CN103733020 A CN 103733020A
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China
Prior art keywords
composition
measurement
measurement point
depth
determining
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CN201280037171.0A
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English (en)
Chinese (zh)
Inventor
强纳森·D·哈德曼
席亚朗·约翰·派崔克·欧康纳
杰·威尔金斯
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Electro Scientific Industries Inc
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Electro Scientific Industries Inc
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Publication of CN103733020A publication Critical patent/CN103733020A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
CN201280037171.0A 2011-07-25 2012-07-25 用于特征化对象并监视制造过程的方法与设备 Pending CN103733020A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161511197P 2011-07-25 2011-07-25
US61/511,197 2011-07-25
PCT/US2012/048090 WO2013016399A2 (en) 2011-07-25 2012-07-25 Method and apparatus for characterizing objects and monitoring manufacturing processes

Publications (1)

Publication Number Publication Date
CN103733020A true CN103733020A (zh) 2014-04-16

Family

ID=47597925

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280037171.0A Pending CN103733020A (zh) 2011-07-25 2012-07-25 用于特征化对象并监视制造过程的方法与设备

Country Status (6)

Country Link
US (1) US9157876B2 (enExample)
JP (1) JP2014526148A (enExample)
KR (1) KR20140045991A (enExample)
CN (1) CN103733020A (enExample)
TW (1) TWI571633B (enExample)
WO (1) WO2013016399A2 (enExample)

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Also Published As

Publication number Publication date
WO2013016399A3 (en) 2013-04-25
TWI571633B (zh) 2017-02-21
US20130030717A1 (en) 2013-01-31
TW201305556A (zh) 2013-02-01
JP2014526148A (ja) 2014-10-02
US9157876B2 (en) 2015-10-13
KR20140045991A (ko) 2014-04-17
WO2013016399A2 (en) 2013-01-31

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Application publication date: 20140416