CN103608726B - 包含聚合物系留的纳米颗粒的光致抗蚀剂 - Google Patents

包含聚合物系留的纳米颗粒的光致抗蚀剂 Download PDF

Info

Publication number
CN103608726B
CN103608726B CN201280027990.7A CN201280027990A CN103608726B CN 103608726 B CN103608726 B CN 103608726B CN 201280027990 A CN201280027990 A CN 201280027990A CN 103608726 B CN103608726 B CN 103608726B
Authority
CN
China
Prior art keywords
photoresist
compositions
polymer
nanoparticles
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201280027990.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN103608726A (zh
Inventor
D·H·雷丁杰
R·J·德沃埃
B·厄尔多甘-豪格
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN103608726A publication Critical patent/CN103608726A/zh
Application granted granted Critical
Publication of CN103608726B publication Critical patent/CN103608726B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
    • A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
    • A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
    • A61M2037/003—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles having a lumen
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
    • A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
    • A61M2037/0053—Methods for producing microneedles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/04—Force
    • F04C2270/042—Force radial
    • F04C2270/0421—Controlled or regulated

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Hematology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Anesthesiology (AREA)
  • Biomedical Technology (AREA)
  • Veterinary Medicine (AREA)
  • Medical Informatics (AREA)
  • Dermatology (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
CN201280027990.7A 2011-06-08 2012-05-23 包含聚合物系留的纳米颗粒的光致抗蚀剂 Expired - Fee Related CN103608726B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161494620P 2011-06-08 2011-06-08
US61/494,620 2011-06-08
PCT/US2012/039081 WO2012170204A1 (en) 2011-06-08 2012-05-23 Photoresists containing polymer-tethered nanoparticles

Publications (2)

Publication Number Publication Date
CN103608726A CN103608726A (zh) 2014-02-26
CN103608726B true CN103608726B (zh) 2016-11-09

Family

ID=46201838

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280027990.7A Expired - Fee Related CN103608726B (zh) 2011-06-08 2012-05-23 包含聚合物系留的纳米颗粒的光致抗蚀剂

Country Status (5)

Country Link
US (1) US9104100B2 (https=)
EP (1) EP2718766A1 (https=)
JP (1) JP5995963B2 (https=)
CN (1) CN103608726B (https=)
WO (1) WO2012170204A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102581926B1 (ko) 2015-08-24 2023-09-22 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
KR102631400B1 (ko) 2015-10-22 2024-01-29 삼성전자주식회사 감광성 조성물, 이로부터 제조된 양자점-폴리머 복합체 패턴, 및 이를 포함하는 전자 소자
TWI557177B (zh) 2015-12-16 2016-11-11 財團法人工業技術研究院 低介電無溶劑型樹脂組成物及基板結構
KR102527764B1 (ko) 2015-12-17 2023-05-02 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
US12020174B2 (en) 2016-08-16 2024-06-25 Ebay Inc. Selecting next user prompt types in an intelligent online personal assistant multi-turn dialog
US11004131B2 (en) 2016-10-16 2021-05-11 Ebay Inc. Intelligent online personal assistant with multi-turn dialog based on visual search
US10860898B2 (en) 2016-10-16 2020-12-08 Ebay Inc. Image analysis and prediction based visual search
US11748978B2 (en) 2016-10-16 2023-09-05 Ebay Inc. Intelligent online personal assistant with offline visual search database
US10970768B2 (en) 2016-11-11 2021-04-06 Ebay Inc. Method, medium, and system for image text localization and comparison
KR102477802B1 (ko) * 2016-12-21 2022-12-15 메르크 파텐트 게엠베하 금속 산화물 나노입자 및 유기 중합체를 함유하는 스핀-온 물질의 조성물
DE102017101823A1 (de) 2017-01-31 2018-08-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strukturiertes Komposit aus Matrixmaterial und Nanopartikeln
MY194777A (en) * 2017-03-29 2022-12-15 Asahi Chemical Ind Photosensitive resin composition
EP3704545B1 (en) * 2017-10-31 2025-12-03 Lawrence Livermore National Security, LLC System and method for depth resolved parallel two-photon polymerization for scalable submicron additive manufacturing
BR112022022039A2 (pt) 2020-04-28 2022-12-13 Ticona Llc Conjunto de microagulhas
CN117025224A (zh) * 2023-08-07 2023-11-10 安徽方兴光电新材料科技有限公司 一种膜材黄光蚀刻液及其应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1303351A (zh) * 1998-07-30 2001-07-11 美国3M公司 生产透明金属氧化物胶体和陶瓷体的纳米金属氧化物粒子
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
CN1894611A (zh) * 2003-12-05 2007-01-10 3M创新有限公司 制造光子晶体和其中可控制的缺陷的方法
US20100035061A1 (en) * 2006-08-17 2010-02-11 The Regents Of The University Of California Cutomized lithographic particles

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
US5037579A (en) 1990-02-12 1991-08-06 Nalco Chemical Company Hydrothermal process for producing zirconia sol
US5258225A (en) * 1990-02-16 1993-11-02 General Electric Company Acrylic coated thermoplastic substrate
US5189136A (en) 1990-12-12 1993-02-23 The Regents Of The University Of California Conducting polymer formed of poly(2-methoxy,5-(2'-ethyl-hexyloxy)-p-phenylenevinylene)
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
TW268969B (https=) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
KR100215532B1 (ko) * 1994-04-11 1999-08-16 후지이 코오조 가교 수지 피복 실리카 미립자 및 그의 제조 방법
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
US6267913B1 (en) 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6608228B1 (en) 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5998495A (en) 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US5859251A (en) 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US6503231B1 (en) * 1998-06-10 2003-01-07 Georgia Tech Research Corporation Microneedle device for transport of molecules across tissue
JP2000007717A (ja) * 1998-06-19 2000-01-11 Takeda Chem Ind Ltd 紫外線硬化型樹脂組成物
US6100405A (en) 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
ATE433129T1 (de) 2000-06-15 2009-06-15 3M Innovative Properties Co Mikroherstellungsverfahren für organische optische bauteile
US6465670B2 (en) * 2000-08-01 2002-10-15 The Goodyear Tire & Rubber Company Preparation of surface modified silica
JP4463473B2 (ja) * 2000-12-15 2010-05-19 ジ・アリゾナ・ボード・オブ・リージェンツ 前駆体を含有するナノ粒子を用いた金属のパターニング方法
US6663820B2 (en) * 2001-03-14 2003-12-16 The Procter & Gamble Company Method of manufacturing microneedle structures using soft lithography and photolithography
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
EP1518889B1 (de) * 2003-09-29 2008-06-11 Robert Bosch Gmbh Härtbares Reaktionsharzsystem
US7189768B2 (en) 2003-11-25 2007-03-13 3M Innovative Properties Company Solution containing surface-modified nanoparticles
US7294449B1 (en) * 2003-12-31 2007-11-13 Kovio, Inc. Radiation patternable functional materials, methods of their use, and structures formed therefrom
TWI246929B (en) * 2004-07-16 2006-01-11 Ind Tech Res Inst Microneedle array device and its fabrication method
US8308960B2 (en) * 2005-12-14 2012-11-13 Silex Microsystems Ab Methods for making micro needles and applications thereof
KR100717514B1 (ko) * 2005-12-30 2007-05-11 제일모직주식회사 유기/무기 혼성 나노복합체 및 이를 이용한 열가소성나노복합재 수지 조성물
US7875415B2 (en) * 2005-12-30 2011-01-25 Intel Corporation Helical pixilated photoresist
WO2007112309A2 (en) 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
US20070276330A1 (en) * 2006-05-28 2007-11-29 Beck Patricia A Microneedles and methods of fabricating thereof
JP5568311B2 (ja) * 2006-12-06 2014-08-06 チバ ホールディング インコーポレーテッド 機能化ナノ粒子による表面特性の変更
US8193397B2 (en) 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
TWI368765B (en) 2007-06-13 2012-07-21 Chimei Innolux Corp Color photo-resist with gold nano-particles and color filters made thereby
US7652095B2 (en) * 2007-06-20 2010-01-26 3M Innovative Properties Company Pressure-sensitive adhesive containing aziridinyl silanes
KR100911889B1 (ko) * 2007-07-16 2009-08-11 한국전기연구원 유무기 하이브리드 감광성 수지 조성물 및 이의 경화체를이용한 액정표시소자
US20110003946A1 (en) * 2008-01-18 2011-01-06 Klaus-Volker Schuett Curable reaction resin system
CN102301277B (zh) 2008-12-05 2013-07-17 3M创新有限公司 使用非线性热聚合的三维制品
CN102858901B (zh) 2010-04-20 2015-10-21 3M创新有限公司 包含活性的表面改性的纳米粒子的压敏粘合剂
CN102959027B (zh) 2010-06-30 2015-08-19 3M创新有限公司 具有纳米粒子的压敏粘合剂的表面改性
KR20140015443A (ko) * 2011-03-09 2014-02-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 입자 크기가 큰 건식 실리카를 포함하는 반사 방지 필름
JP2014517856A (ja) 2011-04-22 2014-07-24 スリーエム イノベイティブ プロパティズ カンパニー 改善された多光子撮像解像方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1303351A (zh) * 1998-07-30 2001-07-11 美国3M公司 生产透明金属氧化物胶体和陶瓷体的纳米金属氧化物粒子
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
CN1894611A (zh) * 2003-12-05 2007-01-10 3M创新有限公司 制造光子晶体和其中可控制的缺陷的方法
CN101006373A (zh) * 2003-12-05 2007-07-25 3M创新有限公司 制造光子晶体的方法
US20100035061A1 (en) * 2006-08-17 2010-02-11 The Regents Of The University Of California Cutomized lithographic particles

Also Published As

Publication number Publication date
US9104100B2 (en) 2015-08-11
JP5995963B2 (ja) 2016-09-21
JP2014523540A (ja) 2014-09-11
WO2012170204A1 (en) 2012-12-13
EP2718766A1 (en) 2014-04-16
US20140080061A1 (en) 2014-03-20
CN103608726A (zh) 2014-02-26

Similar Documents

Publication Publication Date Title
CN103608726B (zh) 包含聚合物系留的纳米颗粒的光致抗蚀剂
JP4723248B2 (ja) 無機粒子を有する多光子反応性組成物および構造の製造方法
CN1288498C (zh) 多光子光敏化系统
CN100573322C (zh) 平面无机器件
US6852766B1 (en) Multiphoton photosensitization system
JP5059273B2 (ja) 多光子感光化方法
JP4880701B2 (ja) 多光子硬化反応性組成物を処理するための方法及び装置
EP2207820A1 (en) Highly functional multiphoton curable reactive species
KR20050055741A (ko) 다광자 감광화 시스템
KR20050048670A (ko) 다광자 감광화 방법
JP4689936B2 (ja) 構造を製作するか又は物品に構造を付加するための方法
US20140030655A1 (en) Enhanced Multi-Photon Imaging Resolution Method

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20161109

Termination date: 20190523

CF01 Termination of patent right due to non-payment of annual fee