CN103608726B - 包含聚合物系留的纳米颗粒的光致抗蚀剂 - Google Patents

包含聚合物系留的纳米颗粒的光致抗蚀剂 Download PDF

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Publication number
CN103608726B
CN103608726B CN201280027990.7A CN201280027990A CN103608726B CN 103608726 B CN103608726 B CN 103608726B CN 201280027990 A CN201280027990 A CN 201280027990A CN 103608726 B CN103608726 B CN 103608726B
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China
Prior art keywords
photoresist
compositions
polymer
nanoparticles
composition
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Expired - Fee Related
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CN201280027990.7A
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English (en)
Chinese (zh)
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CN103608726A (zh
Inventor
D·H·雷丁杰
R·J·德沃埃
B·厄尔多甘-豪格
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
    • A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
    • A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
    • A61M2037/003—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles having a lumen
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
    • A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
    • A61M2037/0053—Methods for producing microneedles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/04—Force
    • F04C2270/042—Force radial
    • F04C2270/0421—Controlled or regulated

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Hematology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Anesthesiology (AREA)
  • Biomedical Technology (AREA)
  • Veterinary Medicine (AREA)
  • Medical Informatics (AREA)
  • Dermatology (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
CN201280027990.7A 2011-06-08 2012-05-23 包含聚合物系留的纳米颗粒的光致抗蚀剂 Expired - Fee Related CN103608726B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161494620P 2011-06-08 2011-06-08
US61/494,620 2011-06-08
PCT/US2012/039081 WO2012170204A1 (en) 2011-06-08 2012-05-23 Photoresists containing polymer-tethered nanoparticles

Publications (2)

Publication Number Publication Date
CN103608726A CN103608726A (zh) 2014-02-26
CN103608726B true CN103608726B (zh) 2016-11-09

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CN201280027990.7A Expired - Fee Related CN103608726B (zh) 2011-06-08 2012-05-23 包含聚合物系留的纳米颗粒的光致抗蚀剂

Country Status (5)

Country Link
US (1) US9104100B2 (enExample)
EP (1) EP2718766A1 (enExample)
JP (1) JP5995963B2 (enExample)
CN (1) CN103608726B (enExample)
WO (1) WO2012170204A1 (enExample)

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KR102581926B1 (ko) 2015-08-24 2023-09-22 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
KR102631400B1 (ko) 2015-10-22 2024-01-29 삼성전자주식회사 감광성 조성물, 이로부터 제조된 양자점-폴리머 복합체 패턴, 및 이를 포함하는 전자 소자
TWI557177B (zh) 2015-12-16 2016-11-11 財團法人工業技術研究院 低介電無溶劑型樹脂組成物及基板結構
KR102527764B1 (ko) 2015-12-17 2023-05-02 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
US12020174B2 (en) 2016-08-16 2024-06-25 Ebay Inc. Selecting next user prompt types in an intelligent online personal assistant multi-turn dialog
US11748978B2 (en) 2016-10-16 2023-09-05 Ebay Inc. Intelligent online personal assistant with offline visual search database
US11004131B2 (en) 2016-10-16 2021-05-11 Ebay Inc. Intelligent online personal assistant with multi-turn dialog based on visual search
US10860898B2 (en) 2016-10-16 2020-12-08 Ebay Inc. Image analysis and prediction based visual search
US10970768B2 (en) 2016-11-11 2021-04-06 Ebay Inc. Method, medium, and system for image text localization and comparison
JP7008075B2 (ja) * 2016-12-21 2022-01-25 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 金属酸化物ナノ粒子及び有機ポリマーを含むスピンオン材料の組成物
DE102017101823A1 (de) 2017-01-31 2018-08-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strukturiertes Komposit aus Matrixmaterial und Nanopartikeln
CN110325913B (zh) * 2017-03-29 2022-11-01 旭化成株式会社 感光性树脂组合物
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CN115734798A (zh) 2020-04-28 2023-03-03 提克纳有限责任公司 微针组件
CN117025224A (zh) * 2023-08-07 2023-11-10 安徽方兴光电新材料科技有限公司 一种膜材黄光蚀刻液及其应用

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Publication number Publication date
JP5995963B2 (ja) 2016-09-21
JP2014523540A (ja) 2014-09-11
US9104100B2 (en) 2015-08-11
CN103608726A (zh) 2014-02-26
WO2012170204A1 (en) 2012-12-13
US20140080061A1 (en) 2014-03-20
EP2718766A1 (en) 2014-04-16

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