CN103561839B - 用于材料供应设备的过滤器 - Google Patents

用于材料供应设备的过滤器 Download PDF

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Publication number
CN103561839B
CN103561839B CN201280024335.6A CN201280024335A CN103561839B CN 103561839 B CN103561839 B CN 103561839B CN 201280024335 A CN201280024335 A CN 201280024335A CN 103561839 B CN103561839 B CN 103561839B
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China
Prior art keywords
filter
hole
target
flat surfaces
cross
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CN201280024335.6A
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English (en)
Chinese (zh)
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CN103561839A (zh
Inventor
I·V·福缅科夫
W·N·帕特洛
G·O·瓦斯恩冦
W·奥尔德姆
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ASML Netherlands BV
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ASML Netherlands BV
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Filtering Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201280024335.6A 2011-05-20 2012-03-20 用于材料供应设备的过滤器 Active CN103561839B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/112,784 US9029813B2 (en) 2011-05-20 2011-05-20 Filter for material supply apparatus of an extreme ultraviolet light source
US13/112,784 2011-05-20
PCT/US2012/029838 WO2012161860A1 (en) 2011-05-20 2012-03-20 Filter for material supply apparatus

Publications (2)

Publication Number Publication Date
CN103561839A CN103561839A (zh) 2014-02-05
CN103561839B true CN103561839B (zh) 2017-03-01

Family

ID=47174252

Family Applications (1)

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CN201280024335.6A Active CN103561839B (zh) 2011-05-20 2012-03-20 用于材料供应设备的过滤器

Country Status (7)

Country Link
US (2) US9029813B2 (cg-RX-API-DMAC7.html)
EP (1) EP2709743A4 (cg-RX-API-DMAC7.html)
JP (1) JP6117188B2 (cg-RX-API-DMAC7.html)
KR (1) KR101899418B1 (cg-RX-API-DMAC7.html)
CN (1) CN103561839B (cg-RX-API-DMAC7.html)
TW (1) TWI587903B (cg-RX-API-DMAC7.html)
WO (1) WO2012161860A1 (cg-RX-API-DMAC7.html)

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US9029813B2 (en) 2011-05-20 2015-05-12 Asml Netherlands B.V. Filter for material supply apparatus of an extreme ultraviolet light source
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WO2014189055A1 (ja) 2013-05-21 2014-11-27 ギガフォトン株式会社 極端紫外光生成装置
US10143074B2 (en) 2013-08-01 2018-11-27 Gigaphoton Inc. Filter and target supply apparatus
WO2015040674A1 (ja) 2013-09-17 2015-03-26 ギガフォトン株式会社 ターゲット供給装置およびｅｕｖ光生成装置
WO2015087454A1 (ja) * 2013-12-13 2015-06-18 ギガフォトン株式会社 ターゲット供給装置
US9611163B2 (en) * 2014-03-05 2017-04-04 Owens-Brockway Glass Container Inc. Process and apparatus for refining molten glass
JP6421196B2 (ja) * 2014-11-05 2018-11-07 ギガフォトン株式会社 ターゲット生成装置およびフィルタ構造体の製造方法
CN104493127B (zh) * 2014-12-18 2017-12-19 绍兴柯桥恒松针纺有限公司 一种压铸铝合金液的过滤装置
WO2016121040A1 (ja) * 2015-01-28 2016-08-04 ギガフォトン株式会社 ターゲット供給装置、その処理装置および処理方法
WO2017102261A1 (en) * 2015-12-17 2017-06-22 Asml Netherlands B.V. Nozzle and droplet generator for euv source
CN105771354B (zh) * 2016-03-04 2018-05-01 绍兴南燕染整有限公司 一种印染水液颗粒过滤装置
JP6237825B2 (ja) * 2016-05-27 2017-11-29 ウシオ電機株式会社 高温プラズマ原料供給装置および極端紫外光光源装置
CN106334365B (zh) * 2016-10-08 2018-03-09 黄正集 一种水能制氢用水体初步过滤除杂装置
US10499485B2 (en) 2017-06-20 2019-12-03 Asml Netherlands B.V. Supply system for an extreme ultraviolet light source
JP7078706B2 (ja) 2017-07-06 2022-05-31 インテグリス・インコーポレーテッド 炭化ケイ素フィルター膜および使用方法
US10437162B2 (en) * 2017-09-21 2019-10-08 Asml Netherlands B.V. Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system
US10331035B2 (en) * 2017-11-08 2019-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Light source for lithography exposure process
US11404256B2 (en) 2018-02-09 2022-08-02 Hamamatsu Photonics K.K. Sample support, ionization method, and mass spectrometry method
WO2019155759A1 (ja) * 2018-02-09 2019-08-15 浜松ホトニクス株式会社 試料支持体、試料のイオン化方法、及び質量分析方法
NL2024077A (en) 2018-10-25 2020-05-13 Asml Netherlands Bv Target material supply apparatus and method
NL2024324A (en) * 2018-12-31 2020-07-10 Asml Netherlands Bv Apparatus for controlling introduction of euv target material into an euv chamber
US11963285B2 (en) * 2019-03-15 2024-04-16 Asml Netherlands B.V. Target material control in an EUV light source
WO2021121852A1 (en) * 2019-12-17 2021-06-24 Asml Netherlands B.V. Target material tank for extreme ultraviolet light source
JP7491737B2 (ja) * 2020-05-21 2024-05-28 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
JP2022006351A (ja) * 2020-06-24 2022-01-13 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
CN112138452A (zh) * 2020-10-14 2020-12-29 杭州师范大学钱江学院 一种中药渣药液分离器及其分离方法
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CN116264753B (zh) * 2021-12-15 2025-09-12 北京锐德康科技有限公司 用于重频激光打靶的靶片及可装卸靶盘
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Also Published As

Publication number Publication date
WO2012161860A1 (en) 2012-11-29
EP2709743A1 (en) 2014-03-26
JP2014522302A (ja) 2014-09-04
KR101899418B1 (ko) 2018-10-04
US20120292527A1 (en) 2012-11-22
TWI587903B (zh) 2017-06-21
CN103561839A (zh) 2014-02-05
TW201304850A (zh) 2013-02-01
JP6117188B2 (ja) 2017-04-19
US20150209701A1 (en) 2015-07-30
US9029813B2 (en) 2015-05-12
KR20140036223A (ko) 2014-03-25
EP2709743A4 (en) 2015-05-27
US9669334B2 (en) 2017-06-06

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