CN103540987B - Al or Al alloys - Google Patents
Al or Al alloys Download PDFInfo
- Publication number
- CN103540987B CN103540987B CN201310424558.8A CN201310424558A CN103540987B CN 103540987 B CN103540987 B CN 103540987B CN 201310424558 A CN201310424558 A CN 201310424558A CN 103540987 B CN103540987 B CN 103540987B
- Authority
- CN
- China
- Prior art keywords
- hardness
- oxide film
- anode oxide
- alloys
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
The present invention relates to a kind of Al or Al alloys with anode oxide film, the anode oxide film has the different position of hardness in its thickness direction, and the difference of the hardness and the hardness at the minimum position of hardness at the maximum position of hardness therein is calculated as more than 5 with Vickers hardness.It is preferred that the hardness at the minimum position of the hardness of the Al or Al alloys is calculated as more than 300 with Vickers hardness.Additionally, it is preferred that below the Fe contents 500ppm of the anode oxide film of the Al or Al alloys.Even if Al the or Al alloys of the present invention are high rigidity, still with resistance to anti-thread breakage excellent anode oxide film.
Description
The application is application number：200880014768.7, the applying date：2008.04.18, denomination of invention：" Al or Al alloys "
Application divisional application.
Technical field
The invention belongs to the technical field of Al or Al alloys, especially belong to be related to CVD device, PVD devices, from
The component of the semiconductor of sub- injection device, sputter equipment, dry etching device etc. and the vacuum chamber of the manufacture device of liquid crystal and set
The technical field of Al or Al alloys used in the component in portion in the inner.
Background technology
In the semiconductor and liquid crystal of CVD device, PVD devices, ion implantation apparatus, sputter equipment, dry etching device etc.
Manufacture device vacuum chamber inside, be used as reacting gas, etching gas, clear due to containing the corrosive gas of halogen
Gas washing body is imported into, therefore it is required that it has the corrosion resistance (hereinafter also referred to resistance to gas corrosivity) for corrosive gas.
In addition, among above-mentioned vacuum chamber, because occurring the plasma of halogen family, the patience for plasma is (following more
Also referred to as plasma-resistance) also it is taken seriously (with reference to JP 2003-34894 publications, JP 2004-225113 publications
Deng).In recent years, as the component of such vacuum chamber, light weight and the excellent Al and Al alloys of heat conductivity are used.
However, Al and Al alloys do not have sufficient resistance to gas corrosivity and plasma-resistance, therefore propose there is various
For the surfaction technology for improving these characteristics, but still expect the further raising of these characteristics.
In the raising of plasma-resistance, the surface of Al and Al alloys is effectively set to form the anodic oxidation of high rigidity
Film.The abrasion that the anode oxide film of high rigidity is caused for the physical energy of plasma have patience, it is possible to increase resistant to plasma
Body (with reference to JP 2004-225113 publications etc.).
However, crackle easily occurs for the anode oxide film of high rigidity, if crackle occurs and insertion anode oxide film, exist
The problem of be, crackle (hereinafter also referred to through check) intrusion of the corrosive gas by the insertion, the Al and Al of base material are closed
Golden hair life corrosion.
Therefore, only form the anode oxide film of high rigidity on the surface of Al and Al alloys, that is, allow to improve resistance to grade from
Daughter, but still such problem points can be caused, i.e. through check easily occurs for anode oxide film, thus causes the Al of base material
Corrode with Al alloys.Therefore, a kind of anode oxide film is just desirably formed, it not only has high rigidity, but also with hardly possible
To occur the characteristic of through check (hereinafter also referred to resistance to anti-thread breakage).I.e. it is desired to one kind is formed under high rigidity, resistance to crackle
Property also excellent anode oxide film.
Particularly, if reducing the Fe in Al alloys in order to suppress the Fe pollutions of semiconductor wafer and liquid crystal glass base and containing
Amount, then the poor anodic oxide coating as Fe, the but because anodic oxide coating is hardened, resistance to anti-thread breakage difference, because
This expects its resistance to anti-thread breakage raising strongly.
Patent document 1：JP 2003-34894 publications
Patent document 2：JP 2004-225113 publications
The content of the invention
The present invention in view of such situation and do, its object is to there is provided a kind of Al or Al alloys, it has even in height
Resistance to anti-thread breakage also excellent anode oxide film under hardness.
The present inventors study with keen determination in order to reach above-mentioned purpose, and its result is until complete the present invention.According to the present invention
Above-mentioned purpose can be reached.
That is, the present invention of above-mentioned purpose can be so completed and reached, is to be related to the Al or Al described in following (1)~(3)
Alloy.
(1) it is a kind of Al or Al alloys with anode oxide film, the anode oxide film has hard in its thickness direction
The different position of degree, the hardness of the anode oxide film face side is higher than substrate side, and the hardness and hardness at hardness maximum position are most
The difference of the hardness at small position is calculated as less than more than 15 30 with Vickers hardness.
(2) Al the or Al alloys that described (1) is recorded, the hardness at the minimum position of its described hardness is calculated as 300 with Vickers hardness
More than.
(3) Al the or Al alloys that described (2) are recorded, below the Fe contents 500ppm of its anode oxide film.
Al the or Al alloys of the present invention have the resistance to anti-thread breakage still excellent anode oxide film under high rigidity.The anode
Even if oxide-film is high rigidity, resistance to anti-thread breakage also excellent (being difficult to occur through check), therefore, because the insertion of anode oxide film
The corrosion of the Al and Al alloys of base material caused by crackle generation is difficult to generation, and (that is, the resistance to corrosive reduction of gas is difficult to send out
It is raw).Therefore, even if improve the hardness of anode oxide film to improve plasma-resistance, the corrosive reduction of resistance to gas
Still it is difficult to occur.Therefore, the corrosive reduction of resistance to gas will not be caused, the raising of plasma-resistance is implemented.
Brief description of the drawings
Fig. 1 is whole crackles when representing that crackle locally occurs in anodic scale film surface (30mm × 30mm faces)
The figure of situation occurred.
Fig. 2 is to represent a part of crackle hair in the homogeneous generation of anodic scale film surface (30mm × 30mm faces) internal fissure
The figure of raw situation (the crackle situation occurred in 235 180 μm of μ m faces).
Embodiment
Al the or Al alloys of the present invention, it has been observed that be Al the or Al alloys with anode oxide film, wherein, the anode
Oxide-film has the different position of hardness, hardness and the minimum position of hardness at the maximum position of hardness therein in its thickness direction
The difference of hardness is calculated as more than 5 with Vickers hardness.Even if such anode oxide film is high rigidity, resistance to anti-thread breakage also excellent.Below
Illustrate its details.
When the anode oxide film of Al and Al alloys is high rigidity, crackle easily occurs for the anode oxide film.Moreover, the Al and
The hardness of the anode oxide film of Al alloys, if occurring crackle in the film, is held in thickness direction a period of time of the film with the crackle
Easily propagate, from the film surface transition to Al the and Al alloys of base material, the easy insertion of crackle.That is, through check easily occurs.
In contrast, when the hardness of the anode oxide film of Al and Al alloys is different on the thickness direction of the film, having in the film
Crackle occurs, and the propagation of the crackle can be also suppressed, it is difficult to reach the insertion of crackle.That is, through check is difficult to occur.
Therefore, if layeredly making its hardness of the anode oxide film of Al and Al alloys different on the thickness direction of the film, crackle
Propagation be inhibited, therefore, it is difficult to occur through check.But, if the hardness of the maximum layer of hardness and the minimum layer of hardness
Difference is less than 5 with Vickers, then the propagation of crackle is difficult to suppress, and easily occurs through check.If in contrast, the hardness
Difference is with Vickers more than 5, then the propagation of crackle is inhibited, it is difficult to occur through check.
The anode oxide film of the Al or Al alloys of the present invention, it has been observed that with the different portion of hardness in the thickness direction thereof
The difference of position, the hardness at the maximum position of hardness therein and the hardness at the minimum position of hardness is calculated as more than 5 with Vickers hardness.Therefore,
Even if the anode oxide film is high rigidity, crack propagation is also inhibited, resistance to anti-thread breakage excellent therefore, it is difficult to occur through check
It is different.
So the anode oxide film of the Al or Al alloys of the present invention, resistance to even if being high rigidity, it is also difficult to occur through check
It is anti-thread breakage excellent, therefore, because the corrosion of the Al and Al alloys of base material is difficult caused by the through check generation of anode oxide film
To occur (the resistance to corrosive reduction of gas is difficult to occur).Therefore, even if improving anodic oxygen in order to improve plasma-resistance
When changing the hardness of film, the resistance to corrosive reduction of gas is still difficult to occur.Therefore, according to Al the or Al alloys of the present invention, it will not recruit
The corrosive reduction of resistance to gas is caused, the raising of plasma-resistance is implemented.
The anode oxide film of the Al or Al alloys of the present invention, it has been observed that with the different portion of hardness in the thickness direction thereof
The difference of position, the hardness at the maximum position of hardness therein and the hardness at the minimum position of hardness is calculated as more than 5 with Vickers hardness, therefore should
Even if anode oxide film is high rigidity, crack propagation can be also suppressed, and therefore, through check is difficult to occur, resistance to anti-thread breakage excellent.
If real in contrast, when the hardness at hardness maximum position and the difference of hardness at the minimum position of hardness are less than 5 with Vickers
The movement equal with the situation of the hardness homogeneous (identical) on the thickness direction of anode oxide film, crack propagation can be shown in matter
It is difficult to suppress, therefore, through check easily occurs, resistance to anti-thread breakage difference.
In the present invention, the quantity at the different position of hardness is needed more than at 2 on the thickness direction of anode oxide film,
But if more than at 2, then the quantity at the position is not particularly limited.The maximum position stiffness of hand in children of hardness among these so-called positions
The minimum position of degree, refers to hardness highest position and the minimum position of hardness among these positions.
In the thickness direction of anode oxide film, the thickness of anode oxide film can change by spells, or can also
Change to continuity (obliquely).
Epithelial surfaces will not be traveled to by making the crackle of the inside generation in anode oxide film, so make the table of anode oxide film
The hardness in the face method smaller than the hardness of the inside of anode oxide film is effective.
In addition, in the present invention, from the viewpoint of the raising of plasma-resistance, in the thickness of the anode oxide film
The hardness at the minimum position of hardness among the different position of direction hardness, is preferably calculated as more than 300 with Vickers hardness.Such sun
The abrasion that pole oxide-film is brought for the physical energy of plasma have patience, and plasma-resistance is excellent.
The hardness of anode oxide film, can be controlled according to anodized condition.Specific hardness is according to base
The Al alloy species of material and the composition of anode oxidation treatment liquid and it is different, it is therefore desirable to suitable setting.
In order that the hardness of anode oxide film changes in the thickness direction of anode oxide film, using such as inferior method：
Make discontinuously or continuously the temperature change of anode oxidation treatment liquid in the way of anodized, and on the way interrupt anode
Oxidation processes, once treated object is taken out from anode oxidation treatment liquid, with other liquid composition and/or the different anode of temperature
Oxidation treatment liquid re-starts anodized, by these methods, can make hard on the thickness direction of anode oxide film
Degree change.
When the temperature of anode oxidation treatment liquid is low, the chemolysis of the anodic oxide coating in anodized is pressed down
Make and be hardened.
Fe contents in Al alloys are calculated as 0. number wt% (thousands of ppm) with marketing material.As base material, if using Fe
The content Al alloy lower than the Fe contents of the marketing material, the then anodic oxide coating as formed by anodized
In Fe contents tail off, the hardness thus, it is possible to improve anodic oxide coating.At this moment, on containing the Fe in anodic oxide coating
Which kind of degree is amount reach, if the viewpoint particularly also in relation with the Fe of the semiconductor wafer and liquid crystal glass base suppression polluted,
Preferably below 500ppm.
The hardness of anode oxide film can be determined by following methods.That is, cross-wise direction (make anode oxide film section and
Base material section turns into abradant surface) Al the and Al alloys with anode oxide film are embedded to resin, carry out #1200 or so grinding and
The plane in anode oxide film section is formed, in the anode oxide film section, is surveyed in JIS Z2244 (1998) method
It is fixed.
Further, for the firmness change of the thickness direction that determines anode oxide film, it has to relative to anode oxide film
Thickness and the impression for fully reducing Determination of Hardness, therefore, reducing the load of the pressure head for forming impression, specifically
For below 5gf.
When the size of impression can not be observed by the attached viewer of Determination of Hardness machine (light microscope etc.), separately
Observed with SEM and videomicroscopy (video microscope) etc., determine the size of impression.
Embodiment
Illustrate examples and comparative examples of the present invention below.Further, the present invention is not limited by the embodiment, can met
Implementation can also be suitably changed in the range of spirit of the invention, these are all contained in the scope of the technology of the present invention
It is interior.
It is main to use JIS6061 alloy (thicknesss of slab as the Al alloys of base material：3mm).The chemical composition of the Al alloys is shown
In table 1.Fe contents in the Al alloys are 0.4wt%.The Al alloys are represented in table 3~4 described later by symbol 6061.
In addition, in order that the Fe contents in anode oxide film are reduced, also using the Al alloy (plates that Fe contents are 0.02wt%
It is thick：3mm) as base material.The chemical composition of the Al alloys is shown in table 2.The Al alloys are in table 3 described later by symbol
Fe0.02 is represented.
30 × 30 × 3mm plate is extracted from above-mentioned Al alloys, anodized is carried out to the Al alloy sheets, the Al is closed
The surface of golden plate forms anode oxide film.At this moment, anodized condition (treatment fluid composition, treatment fluid temperature, electrolysis electricity
The thickness of pressure, the anode oxide film formed) for the anodized condition shown in table 3~4.In the case of the embodiment of table 3,
Anodized condition shown in the column of first layer one with table 3 carries out anodized and makes anode oxide film (first
Layer) formed after, with shown in the column of the second layer one of table 3 anodized condition carry out anodized and make anodic oxidation
Film (second layer) formation.A part is again so that the anodized condition shown in the note of table 3 carries out anodized and makes
Third layer formation (No.15 of table 3).In the case of the embodiment of table 4, between anodized, such as the column institute of temperature one of table 4
Show, the temperature of anode oxidation treatment liquid is increased on one side, while carrying out anodized.
For so making surface form the Al alloy sheets (hereinafter referred to as test film) of anode oxide film, according to following methods,
Fe assays, the measure of the hardness of anode oxide film in progress anode oxide film, the resistance to Fractured evaluation of anode oxide film
Experiment, plasma-resistance evaluation test.
(measure of the Fe contents in anode oxide film)
The degree that will not expose in the Al alloys of base material makes anodic oxide coating be dissolved in 100cc 7% aqueous hydrochloric acid solution
In.Then, according to the weight change determination meltage W (g) of the test film before and after the dissolving.On the other hand, after to the dissolving
Aqueous hydrochloric acid solution carries out icp analysis, tries to achieve the Fe concentration in hydrochloric acid water dissolving, is dissolved in aqueous hydrochloric acid solution 100cc
Fe weight WFe(g).According to the WFeWith foregoing W ratio (WFe/ W) try to achieve Fe contents (concentration) in anode oxide film.
(measure of the hardness of anode oxide film)
Test film is embedded to resin in cross-wise direction (making anode oxide film section and base material section turn into abradant surface), carried out
After grinding, for anode oxide film section, hardness is determined in JIS Z2244 (1998) method.In addition, by the anode oxide film
The optical microscope photograph in section confirms the thickness of anode oxide film.
(the resistance to anti-thread breakage evaluation test of anode oxide film)
Test film is arranged in test chamber, heated.At this moment, with 30 minutes from room temperature to 150 DEG C, in this
After 150 DEG C are kept for 60 minutes, 250 DEG C were warming up to 30 minutes from 150 DEG C, is kept for 1 hour in this 250 DEG C.Further, test chamber
Interior pressure is atmospheric pressure.
After heating herein, let cool to room temperature.Reached in test chamber after room temperature, take out test film.Then, it is aobvious by optics
Micro mirror (400 times) observes the entire surface (30 × 30mm faces) of the anodic scale film surface of the test film, tries to achieve split in the following manner
Line density.
When crackle locally occurs in anodic scale film surface (30 × 30mm faces), the crackle in 30 × 30mm faces is determined
Overall length (length of each crackle total) L (reference picture 1).Then, with the overall length L (mm) of the crackle divided by 30 × 30mm faces
Area S (900mm2), calculate crack density D (mm/mm2).That is, L/S=D (mm/mm are tried to achieve2)。
Crackle is when anodic scale film surface (30 × 30mm faces) equably occurs, in the face for determining 0.235 × 0.180mm
Crackle overall length L (reference picture 2).Then, with the overall length L (mm) divided by the area S in 0.235 × 0.180mm faces of the crackle, meter
Calculate crack density D (mm/mm2).That is, L/S=D (mm/mm are tried to achieve2).That is, L/S=D (mm/mm are tried to achieve2)。
Crack density D (the mm/mm so tried to achieve2) smaller, it is resistance to anti-thread breakage more excellent.That is, although above-mentioned crack density D be
The density for the crackle being identified on anodic oxide coating surface, but the crackle is that the crackle occurred inside anodic oxide coating is passed
Surface has been multicast to, the result is that be identified on anodic oxide coating surface, therefore it is through check (insertion anodic scale
The crackle of film) or close to this, therefore the generation of above-mentioned crack density D and through check degree (density) quite or into than
Example.Therefore, above-mentioned crack density D is smaller, and the degree (density) of the generation of through check is just smaller therefore resistance to anti-thread breakage more excellent
It is different.
According to the crack density D so tried to achieve, the resistance to anti-thread breakage of anode oxide film is judged in the following manner.
D≥100mm/mm2When：×, 100 ＞ D >=10mm/mm2When：△, 10 ＞ D >=1mm/mm2When：When zero, D ＜ 1：◎
(◎、○、△：It is qualified, ×：It is unqualified)
(plasma-resistance evaluation test)
The half of the anodic scale film surface (30 × 30mm faces) of test film is covered with fluororesin and plasma photograph is carried out
Penetrate.At this moment, plasma irradiating condition is, gas：BCl3, air pressure：2mTorr, gas flow：1000ccm, ICP：2000W,
Bias：100W, 120~150 DEG C of temperature, plasma irradiating time：6hr.
After above-mentioned plasma irradiating, mask is removed, plasma irradiating part point and non-irradiated part (plasma is determined
The part that is blanked when body irradiates) segment difference DP.Segment difference DPMeasure carry out in the following manner.That is, shone with crosscutting plasma
The mode for penetrating part and non-irradiated portion boundary portion is cut off after the test film after plasma irradiating, is turned into the section and is ground
Flour milling and be embedded to resin, after being ground, observed using light microscope, determine plasma irradiating part point and non-irradiated
The difference of partial position, i.e. segment difference DP.Further, segment difference DPIt is because in plasma irradiating, dividing in plasma irradiating part
Cause to wear away due to the physical energy of plasma and occur, so segment difference DPIn other words it can be made due to plasma irradiating
Into abrasion degree (abrasion loss).
The segment difference D so determinedP(abrasion loss brought by plasma irradiating) is smaller, resistance to anti-thread breakage more excellent.
In the column of sort sections one of the resistance to gas ions of table 3~4 described later, segment difference DPBe expressed as when >=10 ×, 10 ＞ segment differences DPWhen >=5
It is expressed as △, segment difference DPZero is expressed as during ＜ 5.
(determining and result of the test)
The measure of Fe contents in above-mentioned anode oxide film, the measure of the hardness of anode oxide film, anode oxide film it is resistance to
Anti-thread breakage evaluation test, the result of plasma-resistance evaluation test are shown in table 3~4.
The anode oxide film of the Al alloys of embodiments of the invention in table 3, removes a part of (No.15), by first
Layer and the second layer are constituted, the difference of the hardness of this first layer and the hardness of the second layer be calculated as more than 5 with Vickers hardness (No.2,6,7,
8、10、12、14).This part (No.15) is made up of first layer, the second layer and third layer, hardness maximum position (first layer) it is hard
The difference of the hardness of degree and the minimum position (second layer) of hardness is calculated as more than 5 with Vickers hardness.The anodic oxygen of the Al alloys of comparative example
Change film (No.5) in addition to a part, constituted by individual layer (only first layer), its hardness is homogeneous (No.1,3,4,9,11,13).
This part (No.5) its anode oxide film is made up of first layer and the second layer, but the hardness of this first layer and the hardness of the second layer
Difference with Vickers be less than 5.
The anode oxide film of the Al alloys of above-mentioned comparative example, crack density D is high, it is resistance to it is anti-thread breakage in × level (No.1,
3、4、9、11、13).It is resistance to anti-thread breakage to be in contrast, the anode oxide film of the Al alloys of above-described embodiment, crack density D is low
◎, zero or △ level, resistance to anti-thread breakage excellent (No.2,6,7,8,10,12,14,15).
In the anode oxide film of the Al alloys of above-described embodiment, the hardness at hardness minimum position (first layer or the second layer)
When being calculated as more than 300 with Vickers hardness, the abrasion loss D caused by plasma irradiatingPSmall, resistant to plasma is in zero water
Flat, plasma-resistance is excellent (No.6,7,8,10,12,14,15).
The anode oxide film of the Al alloys of the embodiments of the invention of table 4, at positions of 5 μm away from its surface (away from its surface
Enter 5 μm of position along the thickness direction of film) hardness, away from the position with 5 μm of the interface of base material (from its interface along the thickness of film
Direction enters 5 μm of position) hardness difference, more than 5 (No.1a, 2a) are calculated as with Vickers hardness.The anode oxide film crackle is close
Degree D is low, and the resistance to anti-thread breakage level in ◎ or zero is resistance to anti-thread breakage excellent.
In addition, the hardness at the minimum position of the hardness of the anode oxide film is calculated as more than 300 with Vickers hardness really.Therefore,
The abrasion loss D that the anode oxide film is caused by plasma irradiatingPSmall, resistant to plasma is in zero level, anti-plasma
Property excellent (No.1a, 2a).
[table 1] (wt%)
| Si | Fe | Cu | Mn | Mg | Cr | Zn | Ti | Al |
| 0.65 | 0.40 | 0.31 | 0.05 | 1.02 | 0.12 | 0.05 | 0.02 | Surplus |
[table 2] (wt%)
| Si | Fe | Cu | Mn | Mg | Cr | Zn | Ti | Al |
| 0.67 | 0.02 | 0.26 | 0.02 | 1.05 | 0.22 | 0.03 | 0.03 | Surplus |
[table 3]
Note 1：Epithelium is interrupted structure
Note 2：The hardness of epithelium is the value near each layer center
Note 3：The treatment fluid of No.15 third layer formation processing is that 160g/l sulfuric acid+3g/l oxalic acid treatment temperature is 15 DEG C,
Voltage is 40V, and the thickness of the third layer is 10 μm, and hardness is Hv375
[table 4]
Note 1：Epithelium is interrupted structure
Note 2:Epithelium hardness is value near 5 μm away from face side and the value near 5 μm away from substrate interface, and the difference is that epithelium is hard
The difference of degree
Further, in above-described embodiment and comparative example, although mainly using JIS6061 alloys as the Al alloys of base material,
But when using the Al alloys beyond it, it can also obtain and the above results identical result.In addition, in the above-described embodiments, with
Anodized condition shown in table 3~4 carries out anodized and forms anode oxide film, but with other anodes
Oxidation processes condition replaces, with this carries out anodized and when forming anode oxide film, anode oxide film is hard at its
Spending direction also has a different position of hardness, the hardness at the maximum position of hardness therein and the difference of the hardness at the minimum position of hardness with
When Vickers hardness is calculated as more than 5, crack density D is low, resistance to anti-thread breakage excellent, in addition, the hardness at hardness minimum position is hard with Vickers
When degree is calculated as more than 300, the abrasion loss D caused by plasma irradiatingPSmall, resistant to plasma is excellent.
With reference to specific mode, the present invention is described in detail, but it is also possible to does not depart from the spirit and model of the present invention
Enclose and make various changes and modifications, practitioner should understand.
Further, the application is based on Japanese patent application (Patent 2007-134503) filed in 21 days Mays in 2007, and its is whole
Body is cited by quoting.
In addition, the reference for the full content being wherein cited integrally is included.
Utilization possibility in industry
Al the or Al alloys of the present invention, even if being high rigidity, still with resistance to anti-thread breakage excellent anode oxide film.Because should
Anode oxide film is resistance to anti-thread breakage also excellent (through check is difficult to occur) under high rigidity, so, by anode oxide film
The corrosion of the Al and Al alloys of base material caused by through check generation is difficult to generation, and (that is, the reduction of resistance to gas attack is difficult to send out
It is raw).Therefore, even if improve the hardness of anode oxide film to improve plasma-resistance, and the reduction of gas attack
Also it is difficult to occur.Therefore, Al or Al alloys of the invention, will not cause the corrosive reduction of resistance to gas, and resistant to plasma can be achieved
The raising of body.Therefore, Al or Al alloys of the invention, can be applicable to resistance to gas corrosivity and plasma-resistance
The component of purposes, semiconductor such as CVD device, PVD devices, ion implantation apparatus, sputter equipment, dry etching device and
The component of the vacuum chamber of the manufacture device of liquid crystal, it will not cause the corrosive reduction of resistance to gas, for realizing anti-plasma
The raising of property is useful.
Claims (1)
1. a kind of Al or Al alloys, the resistance to anti-thread breakage excellent anode with the crackle for penetrating into anodic oxide coating surface
Oxide-film, it is characterised in that the anode oxide film is constituted by two layers, in the thickness direction thereof with the different position of hardness,
Wherein, 1st floor height of the hardness than substrate side of the 2nd layer of the anode oxide film face side, the 2nd layer of hardness with the 1st layer
Difference of hardness Fe contents in less than more than 15 30, also, the anode oxide film are calculated as below 500ppm with Vickers hardness,
Al the or Al alloys are used for the component of the vacuum chamber of the manufacture device of semiconductor and liquid crystal and located at its internal structure
Part,
Wherein, the crack density D ＜ 1mm/mm on anodic oxide coating surface are being penetrated into2When, it is evaluated as resistance to anti-thread breakage excellent.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007134503A JP4774014B2 (en) | 2007-05-21 | 2007-05-21 | Al or Al alloy |
| JP2007-134503 | 2007-05-21 | ||
| CN200880014768A CN101680103A (en) | 2007-05-21 | 2008-04-18 | al or al alloy |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200880014768A Division CN101680103A (en) | 2007-05-21 | 2008-04-18 | al or al alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103540987A CN103540987A (en) | 2014-01-29 |
| CN103540987B true CN103540987B (en) | 2017-09-22 |
Family
ID=40031648
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310424558.8A Expired - Fee Related CN103540987B (en) | 2007-05-21 | 2008-04-18 | Al or Al alloys |
| CN200880014768A Pending CN101680103A (en) | 2007-05-21 | 2008-04-18 | al or al alloy |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200880014768A Pending CN101680103A (en) | 2007-05-21 | 2008-04-18 | al or al alloy |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4774014B2 (en) |
| CN (2) | CN103540987B (en) |
| TW (1) | TW200925330A (en) |
| WO (1) | WO2008142932A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117677735A (en) * | 2021-09-06 | 2024-03-08 | 株式会社Uacj | Aluminum member for semiconductor manufacturing apparatus and method for manufacturing the same |
| CN117491375B (en) * | 2024-01-02 | 2024-03-22 | 中信戴卡股份有限公司 | Quantitative characterization and evaluation method for oxide film defect of aluminum alloy casting |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506536A (en) * | 1973-05-23 | 1975-01-23 | ||
| JPS5832977B2 (en) * | 1980-05-08 | 1983-07-16 | 東京アルミニウム工業株式会社 | pot |
| JPS59117675U (en) * | 1983-01-24 | 1984-08-08 | 旭可鍛鉄株式会社 | Structure of anodized film on aluminum or its alloy |
| JPH06330386A (en) * | 1993-05-20 | 1994-11-29 | Fujikura Ltd | Formation of hard anodic oxide film and aluminum alloy for forming the film |
| JP2935789B2 (en) * | 1993-06-23 | 1999-08-16 | 本田技研工業株式会社 | Method for forming colored film of aluminum or aluminum alloy |
| JPH08311692A (en) * | 1995-05-17 | 1996-11-26 | Kobe Steel Ltd | Parts for vacuum chamber and production thereof |
| JPH0953196A (en) * | 1995-08-15 | 1997-02-25 | Nikkoshi Prod Kk | Electrode material and its production |
| JPH09176892A (en) * | 1995-12-20 | 1997-07-08 | Ricoh Co Ltd | Anodization method and device therefor |
| JP3559920B2 (en) * | 1996-07-29 | 2004-09-02 | 東京エレクトロン株式会社 | Plasma processing equipment |
| JP3256480B2 (en) * | 1997-12-19 | 2002-02-12 | スカイアルミニウム株式会社 | High strength Al-Zn-Mg-Cu alloy alumite member excellent in heat crack resistance and method of manufacturing the same |
| JP4174888B2 (en) * | 1998-12-24 | 2008-11-05 | アイシン精機株式会社 | Anodized film |
| JP2002196603A (en) * | 2000-12-27 | 2002-07-12 | Ricoh Co Ltd | Thin fixing roll and method of manufacturing the same |
| JP3855663B2 (en) * | 2001-02-15 | 2006-12-13 | 日本軽金属株式会社 | Parts for surface treatment equipment with excellent withstand voltage characteristics |
| TWI223354B (en) * | 2002-05-28 | 2004-11-01 | Applied Materials Inc | Clean aluminum alloy for semiconductor processing equipment |
| JP2004241992A (en) * | 2003-02-05 | 2004-08-26 | Yazaki Corp | Power superimposed multiplex communication apparatus for vehicle |
| US7732056B2 (en) * | 2005-01-18 | 2010-06-08 | Applied Materials, Inc. | Corrosion-resistant aluminum component having multi-layer coating |
-
2007
- 2007-05-21 JP JP2007134503A patent/JP4774014B2/en not_active Expired - Fee Related
-
2008
- 2008-04-18 CN CN201310424558.8A patent/CN103540987B/en not_active Expired - Fee Related
- 2008-04-18 WO PCT/JP2008/057613 patent/WO2008142932A1/en active Application Filing
- 2008-04-18 CN CN200880014768A patent/CN101680103A/en active Pending
- 2008-05-19 TW TW97118387A patent/TW200925330A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008285742A (en) | 2008-11-27 |
| WO2008142932A1 (en) | 2008-11-27 |
| TW200925330A (en) | 2009-06-16 |
| CN101680103A (en) | 2010-03-24 |
| JP4774014B2 (en) | 2011-09-14 |
| CN103540987A (en) | 2014-01-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Jun et al. | Pitting corrosion of very clean type 304 stainless steel | |
| JP5454744B2 (en) | Stainless steel for fuel cell separator | |
| KR20090020496A (en) | Anodized aluminum alloy material having both durability and low polluting property | |
| US20090042084A1 (en) | Separator for fuel cell and method for manufacturing the same | |
| JP2012201950A (en) | METHOD FOR PRODUCING STAINLESS STEEL SHEET WITH FINELY ROUGHENED SURFACE AND THIN FILM Si SOLAR CELL | |
| CN103540987B (en) | Al or Al alloys | |
| JP5621186B2 (en) | Method for producing stainless steel for polymer electrolyte fuel cell separator | |
| Arwati et al. | Temperature effects on stainless steel 316L corrosion in the environment of sulphuric acid (H2SO4) | |
| JP6057033B1 (en) | Ferritic stainless steel material, separator, polymer electrolyte fuel cell, and separator manufacturing method | |
| JP5369083B2 (en) | Surface-treated aluminum member having high withstand voltage and method for producing the same | |
| TW200518376A (en) | Surface protection film structure of metal electrode plate for fuel battery and surface treatment method | |
| JP2015183239A (en) | Surface processing method for stainless steel and heat exchanger using the same | |
| CN103981523A (en) | Surface sand-blasting and acid-etching treatment method of super-hydrophilic Ti6Ai7Ni | |
| CN108051441A (en) | A kind of observation procedure of Fe-Ni-Cr alloy microstructure | |
| JP5082113B2 (en) | Carrier for holding object to be polished and method for manufacturing the same | |
| KR101487111B1 (en) | Method for producing electrically-conducting material with modified surface | |
| JP5850184B2 (en) | Titanium or titanium alloy for fuel cell separator having excellent conductivity and durability against carbon contact, fuel cell separator using the same, and fuel cell | |
| JP5937937B2 (en) | Aluminum anodized film | |
| AU2012273906B2 (en) | Permanent cathode and a method for treating the surface of a permanent cathode | |
| CN104562173A (en) | Surface treatment method for improving corrosion resistance of 316L stainless steel in primary loop water of pressurized water reactor | |
| JP2021026839A (en) | Manufacturing method of separator for fuel cell | |
| CN108866601A (en) | A kind of differential arc oxidation method of the Ti5111 alloy based on heat treatment | |
| JP4523234B2 (en) | Fuel cell separator | |
| JP2018188702A (en) | Removal method of oxide film on surface of metal material | |
| JP5426956B2 (en) | Manufacturing method of surface treatment member for semiconductor liquid crystal manufacturing apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170922 Termination date: 20210418 |