CN103226287B - Two-in-parallel parallel decoupling flexible microposition mechanism - Google Patents
Two-in-parallel parallel decoupling flexible microposition mechanism Download PDFInfo
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Abstract
The invention discloses a two-in-parallel parallel decoupling flexible microposition mechanism, which is based on piezoelectric ceramic driving, and is characterized in that: the product comprises a movable platform, four flexible branched chains, two piezoelectric ceramic drivers, one rigid bracing frame and one pedestal; the mechanism is used for supporting four flexible branched chains and forms a Chinese character Tian shaped structure together with the rigid bracing frame of the movable platform, and the movable is located in the center, and four flexible branched chains with rectangular designs are uniformly distributed outside the four rigid edges of the rigid bracing frame, and each flexible branched chain is composed of an internal double-four rod flexible mechanism and an external double-parallelogram flexible mechanism; two piezoelectric ceramic drivers have the same structures, and one is placed horizontally and the other is placed vertically; the pedestal has a square framework structure with a hollow central section, and a sidewall structure protruded upwards along the frame near four drift angles is provided, simultaneously four block shaped protrusions are extended from the bottom to the internal direction of the pedestal.
Description
Technical field
The invention belongs to the micro OS of mechanical field, be specially the flexible microposition of the parallel decoupling zero of a kind of two-in-parallel mechanism.This microposition mechanism, based on Piezoelectric Ceramic, has two degree of freedom, can realize two rectilinear translation actions, is mainly used in imprint lithography field.
Background technology
Nano imprint lithography is a kind of brand-new nano graph clone method, its advantage is fairly obvious, there is powerful competitive power, fundamentally show the bright prospects that nano-device is produced, be planned to the gordian technique of 32 nanometer nodes photoetching processes of future generation in the end of the year 2003 by international semiconductor blueprint mechanism.
Locating platform or worktable are the key components of conventional lithography system always.The existing precisely locating platform for etching system adopts air-flotation system more, driven by linear stepping motor, as it is raw to check an ancient unit of weight, precise positioning work table (the aviation Precision Manufacturing Technology of applying in X-ray lithography machine, 34 3 phases of volume in 1998,10～12) middle Luo Si pula nail (unit of length) litho machine and the Zhu Yu etc. introducing, litho machine ultra precise workbench research (electronics industry specialized equipment, 109 phases in 2004,25～27) the middle domestic first set air supporting precise positioning work table of introducing.The precision positioning mechanism actuating speed of ball bearing type curtain rail and the combining form of threaded screw rod driving mechanism is difficult to reach the rate request of etching system worktable, and range of application is restricted.And adopt stepper motor to drive by friction mechanism, drive the Precision Position Location System of worktable by spherical guide, be difficult to overcome motion intermittently, low speed jerking motion and vibration at high speed, mechanically stable Time Created is long, cannot reach the disadvantages such as high motion positions precision.Lee Deug Woo etc., be used for research (the Lee Deug Woo of the Automatic Alignment System of nano-imprint lithography process, Lee Chae Moon, Chee Dong Hwan.A study on auto alignment system of Nanoimprint Lithography (NIL) process.Proceedings of the1st International Conference on Positioning Technology Japan:Hamamatsu, 2004.97～101) the hemispheric air bearing marking press of introducing in utilizes draught damper controlled pressure, realize the depth of parallelism adjustment of wafer-supporting platform by hemispheric air bearing, cost is low, simple in structure, but adjusting precision has much room for improvement.In addition, adopt the novel precise positioning system of piezoelectric ceramics and linear electric motors combination flooding flowing mode, although effectively raise the positioning precision of nano impression equipment, reduce the system stability time, but in existing Embosser, the depth of parallelism adjustment of end-effector all adopts passive mode, the elastic deformation producing in moulding process by flexible material realizes the self-adaptation adjustment of wafer-supporting platform pose, limit the raising of impression precision and quality, such as B.J.Choi etc., the design of stepping flash imprint lithography locating platform, (B.J.Choi, S.V.Sreenivasan, S.Jonhson, M.Colburn, C.G.Wilson, Design of orientation stage for step and flash imprint lithography, Precision Engineering, 2001, 25 (3): 192-199.), Jae-Jong Lee etc., for the preparation of design and analysis (the Jae-Jong Lee of the nano-imprint lithography equipment of 100nm live width feature, Kee-Bong Choi, Gee-Hong Kim, Design and analysis of the single-step nanoimprinting lithography equipment for sub-100nm linewidth, Current Applied Physics2006, 6:1007 – 1011.) in just reported equipment and the correlation technique of this type.Also some researcher adopts the mode that passive adaptation, initiatively levelling and manual setting combine, as: the thin autumn of model etc., development (the China Mechanical Engineering of the high alignment precision nano impression of wide region model machine,, 16 volume supplementary issues, 64-67 in 2005), Yan Le etc., development (the China Mechanical Engineering of cold blocking photoetching process precise positioning work table, 2004,15 1 phases of volume, 75-78) middle this type of precise positioning work table design of reporting; Other researchers separately ward off new footpath, such as, Dong Xiaowen etc., design (the semiconductor optoelectronic of Bellows Cylinder Type UV Nanoimprint Lithography System, 2007,28 5 phases of volume, 676-684) the flexible detent mechanism of the middle gasbag-type of introducing, based on gas pressure intensity control reliability and dirigibility, can realize easily the space multiple degrees of freedom adjustment of locating platform.In addition, the development of global Ge great imprint lithography apparatus commercial undertaking aspect the development of nano impression positioning system is also obvious to all.2008, European informationization technology research committee successfully developed first generation bussiness class ultraviolet nanometer imprint lithography apparatus.In October in the same year, world-leading nano-imprinting apparatus supplier SUSS announces, the additional nano impression assembly of its manual litho machine just can repeat to large-area graphs the impression of sub-50 nm.
In sum, the existing precise positioning work table for nano-imprint lithography technique adopts self-adaptation to adjust structure more, and the elastic property based on material itself realizes the pose adjustment of plummer in moulding process.Although it is simple in structure, compact and with low cost that self-adaptation is adjusted exquisite system, its positioning precision, especially the adjustment precision of the depth of parallelism is lower, has limited the raising of machining precision and quality.Although and other precision positioning mechanism has been introduced active accommodation mechanism, but still adopt piezoelectric ceramics direct drive mode, it only has part degree of freedom to realize adjustment initiatively, and the method is also subject to compensating the restriction of parallelism error in moulding process.Therefore, adopt active accommodation Precision Position Location System to improve the positioning precision in moulding process, realizing effective parallelism error compensation is a new problem with challenge meaning.
Summary of the invention
For the deficiencies in the prior art, the technical matters that quasi-solution of the present invention is determined is that the flexible microposition of the parallel decoupling zero of a kind of two-in-parallel mechanism is provided.This detent mechanism, based on Piezoelectric Ceramic, has two degrees of freedom, can realize two rectilinear translation actions, and have the features such as high precision, compact conformation, error free accumulation, machinery-free friction and gapless.
The technical scheme that the present invention solve the technical problem is: design the flexible microposition of the parallel decoupling zero of a kind of two-in-parallel mechanism, based on Piezoelectric Ceramic, it is characterized in that this detent mechanism mainly comprises a moving platform, four flexible side chains, two piezoelectric ceramic actuators, a rigid cage and a base;
Described rigid cage is sphere of movements for the elephants shape structure, the midline position on four rigidity limits extends to inside and the rigid bracing beam for position, centre of support moving platform respectively, and the midline position outside on four rigidity limits is rigidly connected and is centered around four flexible side chains of described rigid cage outside; Described moving platform is square structure, is arranged on the center of described rigid cage, and four limits of moving platform are connected with described four rigidity limit midline positions of sphere of movements for the elephants shape rigid cage rigid bracing beam that extends to inside respectively; Described flexible side chain is rectangular configuration, and the structure of four flexible side chains is identical, is uniformly distributed in the outside of described rigid cage; Each flexible side chain in described four flexible side chains is rigidly connected on described base by bolt in the outer fix of four drift angles of described rigid cage.
Each flexible side chain is by interior, outer two parts form, inside is two four bar compliant mechanisms, outside is two parallelogram compliant mechanisms, described two four bar compliant mechanisms are positioned at the inside of described pair of parallelogram compliant mechanism and described moving platform institute enclosing region, described pair of parallelogram compliant mechanism and described moving platform are centered around the surrounding of described two four bar compliant mechanisms, wherein said two four bar compliant mechanisms are made up of three vertical beams and symmetrical two beam structures, left side is uniformly distributed two horizontal girds from the top down, right side is uniformly distributed two horizontal girds from the top down, described four horizontal gird physical dimensions are identical, on a left side for described each horizontal gird, the right two ends horizontally disposed single-freedom and flexible hinge that distributes respectively, on described two four bar compliant mechanisms, be total to identical eight the horizontally disposed single-freedom and flexible hinges of distributed architecture, described pair of parallelogram compliant mechanism is made up of a horizontal stiffness crossbeam and symmetrical two vertical beam structures, described horizontal stiffness crossbeam is positioned at the below of described two vertical beam structures, left side is uniformly distributed two vertical beams from left to right, right side is uniformly distributed two vertical beams from left to right, described four vertical beam physical dimensions are identical, upper at described each vertical beam, the lower two ends single-freedom and flexible hinge vertically arranging that distributes respectively, on described pair of parallelogram compliant mechanism, be total to identical eight the single-freedom and flexible hinges that vertically arrange of distributed architecture, described two four bar compliant mechanisms comprise three rigidity vertical beams that distribute from left to right, two flexible crossbeams that distribute from the top down between left rigidity vertical beam and middle rigidity vertical beam, two flexible crossbeams that distribute from the top down between right rigidity vertical beam and middle rigidity vertical beam, described middle rigidity vertical beam is positioned at the line of symmetry place of described two four bar compliant mechanisms, described two four bar compliant mechanisms are connected in the rigidity limit midline position of described rigid cage by described middle rigidity vertical beam, described two four bar compliant mechanisms are connected with described pair of parallelogram compliant mechanism with right rigidity vertical beam by described left rigidity vertical beam, described two four bar compliant mechanisms are symmetrical structure, the structure of the described middle rigidity vertical beam left and right sides is identical, on two flexible crossbeams that distribute from the top down between described left rigidity vertical beam and middle rigidity vertical beam, all have successively from left to right semicircle groove, described flexible crossbeam has first group of semicircle groove from left to right successively, second group of semicircle groove, described lower flexible crossbeam has the 3rd group of semicircle groove and the 4th group of semicircle groove from left to right successively, each group upper, lower two semicircle grooves are symmetrically distributed in the upper of flexible crossbeam, in lower both ends of the surface, the groove shapes of four groups of described semicircle grooves is consistent, and symmetrical up and down with respect to the center line of the flexible crossbeam in place separately, as a same reason, on two flexible crossbeams that distribute from the top down between described right rigidity vertical beam and middle rigidity vertical beam, all have successively from left to right semicircle groove, described flexible crossbeam has the 5th group of semicircle groove from left to right successively, the 6th group of semicircle groove, described lower flexible crossbeam has the 7th group of semicircle groove and the 8th group of semicircle groove from left to right successively, each group upper, lower two semicircle grooves are symmetrically distributed in the upper of flexible crossbeam, in lower both ends of the surface, the groove shapes of four groups of described semicircle grooves is consistent, and symmetrical up and down with respect to the center line of the flexible crossbeam in place separately, described pair of parallelogram compliant mechanism comprises the first flexible vertical beam distributing from left to right, the second flexible vertical beam, the 3rd flexible vertical beam, the 4th flexible vertical beam and be positioned at a rigid beam of described four flexible vertical beams below, described first, the second flexible vertical beam is positioned at the left side of described two four bar compliant mechanisms, the described the 3rd, the 4th flexible vertical beam is positioned at the right side of described two four bar compliant mechanisms, described first of the described two four bar compliant mechanisms left sides that are positioned at, the second flexible vertical beam and described the 3rd of the described two four bar compliant mechanism right sides that are positioned at, the 4th flexible vertical beam is also about the symmetrical distribution of middle rigidity vertical beam of described two four bar compliant mechanisms, described first, the 4th flexible vertical beam upper end is rigidly connected on described base by screw thread, described second, the 3rd flexible vertical beam upper end is connected with left rigidity vertical beam and the right rigidity vertical beam of described two four bar compliant mechanisms respectively, four described flexible vertical beam lower end are all connected on described rigid beam, on described four flexible vertical beams, all have successively from the top down semicircle groove, described the first flexible vertical beam has the 9th group of semicircle groove from top to bottom successively, the tenth group of semicircle groove, described the second flexible vertical beam has the 11 group of semicircle groove from top to bottom successively, the 12 group of semicircle groove, a left side for each group, right two semicircle grooves are symmetrically distributed in a left side for flexible vertical beam, in right both ends of the surface, the groove shapes of four groups of described semicircle grooves is consistent, and with respect to the symmetrical distribution of center line of the flexible vertical beam in place separately, as a same reason, described the 3rd flexible vertical beam has the 13 group of semicircle groove from top to bottom successively, the 14 group of semicircle groove, described the 4th flexible vertical beam has the 15 group of semicircle groove from top to bottom successively, the 16 group of semicircle groove, left and right two semicircle grooves of each group are symmetrically distributed in the left and right both ends of the surface of flexible vertical beam, and the groove shapes of four groups of described semicircle grooves is consistent, and with respect to the symmetrical distribution of center line of the flexible vertical beam in place separately,
Respectively be positioned at below described moving platform and the flexible side chain in left side on described piezoelectric ceramic actuator is installed, be positioned at the piezoelectric ceramic actuator horizontal positioned on the flexible side chain in described moving platform below, right end (working end) withstands on the first flexible vertical beam of described pair of parallelogram compliant mechanism, the piezoelectric ceramic actuator being positioned on the flexible side chain in described moving platform left side is vertically placed, lower end (working end) withstands on the first flexible vertical beam of described pair of parallelogram compliant mechanism, the contact position of the first flexible vertical beam of described two piezoelectric ceramic actuators and described pair of parallelogram compliant mechanism is end face center outside described the first flexible vertical beam, the non-operative end of described two piezoelectric ceramic actuators is all threaded connection rigidity and is fixed on described base,
Described base is square-shaped frame shelf structure, middle part hollow out, near the side wall construction that has part to raise up along frame four drift angles, extend four block-like protrusions in described four top corner portion towards described base internal direction, described block-like protrusions is wider near described base frame portion size, narrower towards described base internal direction extension size, have tapped through hole in described size narrower part, in addition, in near protruding sidewall described drift angle, be positioned on the sidewall of upper left-hand position and have a tapped through hole, on the left of being positioned at, on the sidewall of lower position, have a tapped through hole, when installation, base by thread is rigidly secured to the below of described flexible side chain, its four frames are corresponding one by one with four flexible side chains, and ensure that each edge center line aligns with each flexible row side chain line of symmetry, described two piezoelectric ceramic actuators are threaded connection between described base side wall and described pair of parallelogram compliant mechanism.
Compared with prior art, flexible microposition of the present invention mechanism tool has the following advantages:
1. adopt flexible parallel connection structure, there is the advantages such as high precision, compact conformation, error free accumulation.
2. the elastic deformation based on single-freedom and flexible hinge, the hinge corner producing variation and executor tail end work space are all very small, can effectively eliminate the shortcomings such as parallel institution unintentional nonlinearity.
3. there is two degrees of freedom, can realize two rectilinear translation actions, and resolution is high, rapid dynamic response speed, can be used as the auxiliary positioning platform of nano-imprint lithography location, micro-nano operating system, adopt piezoelectric ceramic actuator to promote to drive link, can realize active accommodation, microfeed and the precision positioning of moving platform.
Brief description of the drawings
Fig. 1 is the one-piece construction schematic diagram of the flexible microposition a kind of embodiment of mechanism of the parallel decoupling zero of two-in-parallel of the present invention;
Fig. 2 is the flexible body structural representation of the flexible microposition a kind of embodiment of mechanism of the parallel decoupling zero of two-in-parallel of the present invention;
Fig. 3 is the flexible branched structure schematic diagram of the flexible microposition a kind of embodiment of mechanism of the parallel decoupling zero of two-in-parallel of the present invention;
Fig. 4 is the rigid base structural representation of the flexible microposition a kind of embodiment of mechanism of the parallel decoupling zero of two-in-parallel of the present invention;
Fig. 5 is the section shape structural representation of flexible body structure shown in the flexible microposition a kind of embodiment Fig. 2 of mechanism of the parallel decoupling zero of two-in-parallel of the present invention.
Embodiment
Below in conjunction with embodiment and accompanying drawing thereof, technical solution of the present invention is described in further details.
The flexible microposition of the parallel decoupling zero of the two-in-parallel mechanism of the present invention's design (is called for short detent mechanism, referring to Fig. 1-5), based on Piezoelectric Ceramic, it is characterized in that, it comprises a moving platform, four flexible side chains, two piezoelectric ceramic actuators, a rigid cage and a base, described moving platform is positioned at rigid cage center, and rigid cage is sphere of movements for the elephants shape structure, for supporting four flexible side chains and connected moving platform thereof, described four flexible side chains are rectangular design, structure is identical, and be evenly distributed on the outside on four rigidity limits of rigid cage, each flexible side chain is by interior, outer two parts form, inside is two four bar compliant mechanisms, outside is two parallelogram compliant mechanisms, described two four bar compliant mechanisms are positioned at the inside of described pair of parallelogram compliant mechanism and described moving platform institute enclosing region, described pair of parallelogram compliant mechanism and described moving platform are centered around the surrounding of described two four bar compliant mechanisms, wherein said two four bar compliant mechanisms are made up of three vertical beams and symmetrical two beam structures, left side is uniformly distributed two horizontal girds from the top down, right side is uniformly distributed two horizontal girds from the top down, described four horizontal gird physical dimensions are identical, on a left side for described each horizontal gird, the right two ends horizontally disposed single-freedom and flexible hinge that distributes respectively, on described two four bar compliant mechanisms, be total to identical eight the horizontally disposed single-freedom and flexible hinges of distributed architecture, described pair of parallelogram compliant mechanism is made up of a horizontal stiffness crossbeam and symmetrical two vertical beam structures, described horizontal stiffness crossbeam is positioned at the below of described two vertical beam structures, left side is uniformly distributed two vertical beams from left to right, right side is uniformly distributed two vertical beams from left to right, described four vertical beam physical dimensions are identical, upper at described each vertical beam, the lower two ends single-freedom and flexible hinge vertically arranging that distributes respectively, on described pair of parallelogram compliant mechanism, be total to identical eight the single-freedom and flexible hinges that vertically arrange of distributed architecture, described single-freedom and flexible hinge arrangement is identical, described two piezoelectric ceramic actuator structures are identical, and a horizontal positioned is arranged between near the sidewall left side of described pair of parallelogram compliant mechanism and the described base drift angle of described rigid cage downside, another is vertically placed, and is arranged between near the sidewall described pair of parallelogram compliant mechanism upside and the described base drift angle in described rigid cage left side, described base is square-shaped frame shelf structure, middle part hollow out, near the side wall construction that has part to raise up along frame four drift angles, extend four block-like protrusions in described four top corner portion towards described base internal direction, described block-like protrusions is wider near described base frame portion size, narrower towards described base internal direction extension size, have tapped through hole in described size narrower part, in addition, in near protruding sidewall described drift angle, be positioned on the sidewall of upper left-hand position and have a tapped through hole, on the left of being positioned at, on the sidewall of lower position, have a tapped through hole.
Specifically, the detent mechanism of the present invention design, based on Piezoelectric Ceramic, is characterized in that this detent mechanism mainly comprises the flexible side chain of a moving platform 1, four 2, two piezoelectric ceramic actuators 3 and 5, a rigid cage 4 and a base 6.
Described rigid cage 4 is sphere of movements for the elephants shape structure (referring to Fig. 1,2,5), the midline position on four rigidity limits extends and rigid bracing beam to inside respectively, the midline position outside that is used for 1, four rigidity limit of moving platform of position, centre of support is rigidly connected and is centered around four flexible side chains 2 of described rigid cage 4 outsides; Described moving platform 1 is square structure, is arranged on the center of described rigid cage 4, and four limits of moving platform 1 are connected with described 4 four rigidity limit midline positions of sphere of movements for the elephants shape rigid cage rigid bracing beam that extends to inside respectively; Described flexible side chain 2 is rectangular configuration, and the structure of four flexible side chains 2 is identical, is uniformly distributed in the outside of described rigid cage 4; Each flexible side chain in described four flexible side chains 2 is rigidly connected on described base 6 by four double-screw bolts 8 in the outer fix of four drift angles of described rigid cage 4.
Each flexible side chain 2 forms by inside and outside two parts, and inside is two four bar compliant mechanisms 25, and outside is that two parallelogram compliant mechanism 26(are referring to Fig. 2 and Fig. 3), described two four bar compliant mechanisms 25 comprise three rigidity vertical beams that distribute from left to right, be left rigidity vertical beam 271, middle rigidity vertical beam 272 and right rigidity vertical beam 273, between left rigidity vertical beam 271 and middle rigidity vertical beam 272, be distributed with flexible crossbeam 274 and lower flexible crossbeam 275, equally, between right rigidity vertical beam 273 and middle rigidity vertical beam 272, be also distributed with upper and lower two flexible crossbeams 276 and 277, described middle rigidity vertical beam 272 is positioned at the line of symmetry place of described two four bar compliant mechanisms 25, described two four bar compliant mechanisms 25 are connected in the rigidity limit midline position of described rigid cage 4 by described middle rigidity vertical beam 272, described two four bar compliant mechanisms 25 are connected with described pair of parallelogram compliant mechanism 26 with right rigidity vertical beam 273 by described left rigidity vertical beam 271, described two four bar compliant mechanisms 25 are symmetrical structure, the structure of the left and right sides of described middle rigidity vertical beam 272 is identical, described is upper, on lower two flexible crossbeams 274 and 275, all have successively from left to right semicircle groove, described flexible crossbeam 274 has first group of semicircle groove 251 and second group of semicircle groove 252 from left to right successively, described lower flexible crossbeam 275 has the 3rd group of semicircle groove 253 and the 4th group of semicircle groove 254 from left to right successively, each group upper, lower two semicircle grooves are symmetrically distributed in the upper of described flexible crossbeam, in lower both ends of the surface, the groove shapes of four groups of described semicircle grooves is consistent with structure, and symmetrical up and down with respect to the center line of the flexible crossbeam in place separately, as a same reason, what between described right rigidity vertical beam 273 and middle rigidity vertical beam 272, distribute from the top down is upper, on lower two flexible crossbeams 276 and 277, all have successively from left to right semicircle groove, described flexible crossbeam 276 has the 5th group of semicircle groove 255 from left to right successively, the 6th group of semicircle groove 256, described lower flexible crossbeam 277 has the 7th group of semicircle groove 257 and the 8th group of semicircle groove 258 from left to right successively, each group upper, lower two semicircle grooves are symmetrically distributed in the upper of flexible crossbeam, in lower both ends of the surface, the groove shapes of four groups of described semicircle grooves is consistent, and symmetrical up and down with respect to the center line of the flexible crossbeam in place separately, described pair of parallelogram compliant mechanism 26 comprises the first flexible vertical beam 261 distributing from left to right, the second flexible vertical beam 262, the 3rd flexible vertical beam 263, the 4th flexible vertical beam 264 and be positioned at a rigid beam 265 of described four flexible vertical beams below, described first, the second flexible vertical beam 261, 262 are positioned at the left side of described two four bar compliant mechanisms 25, the described the 3rd, the 4th flexible vertical beam 263, 264 are positioned at the right side of described two four bar compliant mechanisms 25, described first, the second flexible vertical beam 261, 262 and the described the 3rd, the 4th flexible vertical beam 263, 264 is also about the middle rigidity vertical beam 272 symmetrical distributions of described two four bar compliant mechanisms 25, described first, the 4th flexible vertical beam 261, 264 upper end are rigidly connected on described base 6 by screw thread, described second, the 3rd flexible vertical beam 262, 263 upper end are connected with left rigidity vertical beam 271 and the right rigidity vertical beam 273 of described two four bar compliant mechanisms 25 respectively, four described flexible vertical beams 261, 262, 263, 264 lower end are all connected on described rigid beam 265, on described four flexible vertical beams, all have successively from the top down semicircle groove, described the first flexible vertical beam 261 has the 9th group of semicircle groove 2611 from top to bottom successively, the tenth group of semicircle groove 2612, described the second flexible vertical beam 262 has the 11 group of semicircle groove 2621 from top to bottom successively, the 12 group of semicircle groove 2622, a left side for each group, right two semicircle grooves are symmetrically distributed in a left side for flexible vertical beam, in right both ends of the surface, the groove shapes of four groups of described semicircle grooves is consistent, and with respect to the symmetrical distribution of center line of the flexible vertical beam in place separately, as a same reason, described the 3rd flexible vertical beam 263 has the 13 group of semicircle groove 2631 from top to bottom successively, the 14 group of semicircle groove 2632, described the 4th flexible vertical beam 264 has the 15 group of semicircle groove 2641 from top to bottom successively, the 16 group of semicircle groove 2642, left and right two semicircle grooves of each group are symmetrically distributed in the left and right both ends of the surface of flexible vertical beam, the groove shapes of four groups of described semicircle grooves is consistent, and with respect to the symmetrical distribution of center line of the flexible vertical beam in place separately.
Two piezoelectric ceramic actuators of the present invention be arranged on respectively below described moving platform 1 and the outside of the flexible side chain 2 in left side and described base 6 between, be positioned at lower piezoelectric ceramic driver 5 horizontal positioned on the flexible side chain 2 in described moving platform 1 below, right end (working end) withstands on the first flexible vertical beam 261 of described pair of parallelogram compliant mechanism 26, the left piezoelectric ceramic actuator 3 being positioned on the flexible side chain 2 in described moving platform 1 left side is vertically placed, lower end (working end) withstands on the first flexible vertical beam 261 of described pair of parallelogram compliant mechanism 26, the contact position of the first flexible vertical beam 261 of described two piezoelectric ceramic actuators 3 and described pair of parallelogram compliant mechanism 26 is the center of described the first flexible vertical beam 261 outside end faces, the non-operative end of described left piezoelectric ceramic actuator 3 and lower piezoelectric ceramic driver 5 is fixed on described base 6 by two double-screw bolt 7 rigidity respectively,
Described base 6 is square-shaped frame shelf structures (referring to Fig. 1 and Fig. 4) of a middle part hollow out, near the side wall construction that has part to raise up along frame four drift angles of square frame; Extend four block-like protrusions in described four top corner portion towards described base internal direction, described block-like protrusions is wider near described base 6 frame portion sizes, size towards described base internal direction extension is narrower, and in described size narrower part, have respectively or respectively a tapped through hole, i.e. tapped through hole 61,62,63 and 64; In addition, near the protruding sidewall described drift angle, be positioned on the sidewall of upper left-hand position and have a tapped through hole 65, be positioned on the protruding sidewall of left side lower position and have a tapped through hole 66; When installation, base 6 is rigidly secured to the below of described flexible side chain 2 by four double-screw bolts 8, and its four frames are corresponding one by one with four flexible side chains 2, and ensures that each edge center line aligns with each flexible row side chain 2 line of symmetries.Described in being connected in by two screws 7, described left piezoelectric ceramic actuator 3 and lower piezoelectric ceramic driver 5 have between base 6 sidewalls and described pair of parallelogram compliant mechanism 26 of tapped through hole 65,66.
The further feature of detent mechanism of the present invention is that a described moving platform 1, four flexible side chains 2 are with a rigid cage 4 and be connected and adopt the disposable acquisition of overall processing mode (referring to Fig. 5).This will be conducive to improve the precision of microposition mechanism itself, and significantly cuts down finished cost.
One of main application of detent mechanism of the present invention is the auxiliary positioning platform as nano-imprint lithography equipment, realizes microfeed and precision positioning in nano impression process.But do not get rid of detent mechanism of the present invention be applied to similar techniques require other positioning systems in.
Detent mechanism of the present invention can be realized the active accommodation of x, two translational degree of freedom of y.For its working method is described, first set x axle, y axle is positioned at surface level, the initial point that the center that makes moving platform 1 is coordinate system, the direction of getting the lower edge place that is parallel to moving platform 1 is x direction of principal axis, and edge is y axle perpendicular to the direction at this limit and mistake moving platform 1 center.
The course of work of detent mechanism of the present invention is as follows:
Only drive the lower piezoelectric ceramic driver 5 of the horizontal positioned parallel with x axle that its length is increased, and another left piezoelectric ceramic actuator 3 does not drive, be positioned at so on moving platform 1, eight single-freedom and flexible hinges in two parallelogram flexible structures 26 on the flexible side chain 2 of lower both sides (2611, 2612, 2621, 2622, 2631, 2632, 2641 and 2642) there is elastic deformation, drive moving platform 1 to realize the axial translation along x by the middle rigidity vertical beam 272 of two four bar compliant mechanisms 25, drag simultaneously and be positioned at moving platform 1 left side, eight single-freedom and flexible hinges in two four bar flexible structures 25 on the flexible side chain 2 of right both sides (251, 252, 253, 254, 255, 256, 257 and 258) there is elastic deformation.
Only drive the left piezoelectric ceramic actuator 3 of vertically placing that its length is increased, and lower piezoelectric ceramic driver 5 does not drive, be positioned at so moving platform 1 left side, eight single-freedom and flexible hinges in two parallelogram flexible structures 26 on the flexible side chain 2 of right both sides (2611, 2612, 2621, 2622, 2631, 2632, 2641 and 2642) there is elastic deformation, drive moving platform 1 to realize the axial translation along y by the middle rigidity vertical beam 272 of two four bar compliant mechanisms 25, drag simultaneously and be positioned on moving platform 1, eight single-freedom and flexible hinges in two four bar flexible structures 25 on the flexible side chain 2 of lower both sides (251, 252, 253, 254, 255, 256, 257 and 258) there is elastic deformation.
The present invention does not address part and is applicable to prior art.
It should be added that, the installation position word of the parts such as " upper and lower ", " forward and backward ", " left and right " described in description scheme of the present invention according to shown in embodiment accompanying drawing or custom, only there is relativity, or to be only in order narrating conveniently, not represent uniqueness and the indispensability of this installation site.
Claims (3)
1. the flexible microposition of the parallel decoupling zero of a two-in-parallel mechanism, based on Piezoelectric Ceramic, is characterized in that this detent mechanism mainly comprises a moving platform, four flexible side chains, two piezoelectric ceramic actuators, a rigid cage and a base;
Described rigid cage is sphere of movements for the elephants shape structure, the midline position on four rigidity limits extends to inside and the rigid bracing beam for position, centre of support moving platform respectively, and the midline position outside on four rigidity limits is rigidly connected and is centered around four flexible side chains of described rigid cage outside; Described moving platform is square structure, is arranged on the center of described rigid cage, and four limits of moving platform are connected with described four rigidity limit midline positions of sphere of movements for the elephants shape rigid cage rigid bracing beam that extends to inside respectively; Described flexible side chain is rectangular configuration, and the structure of four flexible side chains is identical, is uniformly distributed in the outside of described rigid cage; Each flexible side chain in described four flexible side chains is rigidly connected on described base in the outer fix of four drift angles of described rigid cage;
Each flexible side chain forms by inside and outside two parts, inside is two four bar compliant mechanisms, outside is two parallelogram compliant mechanisms, described two four bar compliant mechanisms are positioned at the inside of described pair of parallelogram compliant mechanism and described moving platform institute enclosing region, and described pair of parallelogram compliant mechanism and described moving platform are centered around the surrounding of described two four bar compliant mechanisms, wherein, described two four bar compliant mechanisms are made up of three rigidity vertical beams and symmetrical two groups of horizontal flexibility beam structures, and described two groups of horizontal flexibility beam structures left and right is two horizontal flexibility crossbeams, is uniformly distributed from the top down, described four horizontal flexibility beam structure sizes are identical, and a horizontally disposed single-freedom and flexible hinge distributes respectively at the left and right two ends of described each horizontal flexibility crossbeam, three rigidity vertical beams of described two four bar compliant mechanisms distribute from left to right, between left side rigidity vertical beam and middle rigidity vertical beam, two horizontal flexibility crossbeams from the top down distribute respectively between right side rigidity vertical beam and middle rigidity vertical beam, described middle rigidity vertical beam is positioned at the line of symmetry place of described two four bar compliant mechanisms, described two four bar compliant mechanisms are connected in the rigidity limit midline position of described rigid cage by described middle rigidity vertical beam, described two four bar compliant mechanisms are connected with described pair of parallelogram compliant mechanism with right side rigidity vertical beam by described left side rigidity vertical beam, the structure of the described middle rigidity vertical beam left and right sides is identical, on two horizontal flexibility crossbeams that distribute from the top down between described left side rigidity vertical beam and middle rigidity vertical beam, all have successively from left to right two groups of semicircle grooves, each group upper, lower two semicircle grooves are symmetrically distributed in the upper of horizontal flexibility crossbeam, in lower both ends of the surface, the groove shapes of four groups of semicircle grooves is consistent, and symmetrical up and down with respect to the center line of place horizontal flexibility crossbeam separately, equally, on two horizontal flexibility crossbeams that distribute from the top down, all have successively from left to right two groups of semicircle grooves between described right side rigidity vertical beam and middle rigidity vertical beam, its structure is identical with two groups of semicircle groove structures in middle rigidity vertical beam left side,
Described pair of parallelogram compliant mechanism is made up of a horizontal stiffness crossbeam and symmetrical two groups of flexible vertical beam structures, described horizontal stiffness crossbeam is positioned at the below of described two groups of flexible vertical beam structures, described two groups of flexible vertical beams are identical four the flexible vertical beams of physical dimension, described four flexible vertical beams are from left to right evenly distributed on the described horizontal stiffness crossbeam left and right sides, and four flexible vertical beams are from left to right followed successively by first, second, third, fourth flexible vertical beam, distribute the respectively single-freedom and flexible hinge of an identical vertical setting of structure of the upper/lower terminal of described each flexible vertical beam, two groups of flexible vertical beams of described pair of parallelogram compliant mechanism are distributed in the both sides of described two four bar compliant mechanisms, the symmetrical distribution of middle rigidity vertical beam of described two four bar compliant mechanisms, first of described two groups of four flexible vertical beams, the 4th flexible vertical beam upper end by screw thread be rigidly connected with described base on, described second, the 3rd flexible vertical beam upper end is connected with left side rigidity vertical beam and the right side rigidity vertical beam of described two four bar compliant mechanisms respectively, four described flexible vertical beam lower end are all connected on described horizontal stiffness crossbeam, on described four soft Ah property's vertical beams, all have successively from the top down two groups of semicircle grooves, a left side for each group, right two semicircle grooves are symmetrically distributed in a left side for flexible vertical beam, in right both ends of the surface, the groove shapes of eight groups of semicircle grooves is consistent, and with respect to the symmetrical distribution of center line of the flexible vertical beam in place separately,
Described two piezoelectric ceramic actuators are arranged on respectively on the flexible side chain below described moving platform and on the flexible side chain in left side, be positioned at the piezoelectric ceramic actuator horizontal positioned on the flexible side chain in moving platform below, working end, right side withstands on the first flexible vertical beam of described pair of parallelogram compliant mechanism; The piezoelectric ceramic actuator being positioned on the flexible side chain in described moving platform left side is vertically placed, working end, bottom withstands on the first flexible vertical beam of described pair of parallelogram compliant mechanism, the contact position of the first flexible vertical beam of described two piezoelectric ceramic actuators and described pair of parallelogram compliant mechanism is end face center outside described the first flexible vertical beam, and the non-operative end of described two piezoelectric ceramic actuators is all threaded connection rigidity and is fixed on described base;
Described base is square-shaped frame shelf structure, middle part hollow out, near the side wall construction that has part to raise up along frame four drift angles, extend four block-like protrusions in described four top corner portion towards described base internal direction, described block-like protrusions is wider near described base frame portion size, narrower towards described base internal direction extension size, have tapped through hole in described size narrower part, in addition, in near protruding sidewall described drift angle, be positioned on the sidewall of upper left-hand position and have a tapped through hole, on the left of being positioned at, on the sidewall of lower position, have a tapped through hole, when installation, base by thread is rigidly secured to the below of described flexible side chain, its four frames are corresponding one by one with four flexible side chains, and ensure that each edge center line aligns with each flexible row side chain line of symmetry, described two piezoelectric ceramic actuators are threaded connection between described base side wall and described pair of parallelogram compliant mechanism.
2. the flexible microposition of the parallel decoupling zero of two-in-parallel according to claim 1 mechanism, is characterized in that a described moving platform, four flexible side chains with a rigid cage and is connected the disposable acquisition of the overall processing mode of employing.
3. the flexible microposition of the parallel decoupling zero of two-in-parallel claimed in claim 1 mechanism, for doing the auxiliary positioning platform of nano-imprint lithography equipment.
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| CN105904443B (en) * | 2016-06-17 | 2018-07-20 | 华南理工大学 | A kind of two-freedom compliant parallel mechanism of mobile decoupling |
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| JPS63244205A (en) * | 1987-03-31 | 1988-10-11 | Toshiba Corp | Positioning device |
| CN101710229B (en) * | 2009-12-07 | 2011-12-28 | 天津大学 | Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system |
| CN101738855B (en) * | 2009-12-23 | 2012-08-29 | 天津大学 | Flexible micro-positioning stage with two degrees of freedom |
| CN101750885B (en) * | 2010-01-06 | 2011-12-14 | 天津大学 | Two-degree of freedom precise positioning work table |
| CN102360160B (en) * | 2011-07-29 | 2012-11-07 | 河北工业大学 | 2R1T three degree of freedom space flexible precision positioning platform |
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| CN106597814A (en) * | 2017-01-11 | 2017-04-26 | 深圳市大川光电设备有限公司 | Multifunctional exposure platform |
| CN106597814B (en) * | 2017-01-11 | 2018-02-23 | 深圳市大川光电设备有限公司 | Multi-functional exposure stage |
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