CN103116250A - Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform - Google Patents
Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform Download PDFInfo
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- CN103116250A CN103116250A CN2013100487431A CN201310048743A CN103116250A CN 103116250 A CN103116250 A CN 103116250A CN 2013100487431 A CN2013100487431 A CN 2013100487431A CN 201310048743 A CN201310048743 A CN 201310048743A CN 103116250 A CN103116250 A CN 103116250A
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Abstract
The invention discloses a masking platform system with laser interferometer measurement and a six-freedom-degree coarse movement platform, and the masking platform system is mainly applied to a mask aligner system. The masking platform system comprises the coarse movement platform, a fine movement platform and a rack, wherein the coarse movement platform comprises a coarse movement platform body, a drive device and a gravitational equilibrium component of the coarse movement platform, is arranged outside the fine movement platform and surrounds the fine movement platform. The masking platform system further comprises a laser interferometer measurement component which is used for measuring position feedback between a fine movement platform body and a measurement rack, consists of a laser source, a light path component, a laser interferometer and the measurement rack and can be used for performing measurement of six freedom degrees on the movement part of the masking platform system in real time. The masking platform system is simple and compact in structure; the movement part of the masking platform system is light, so that load is reduced, and speed, acceleration and control band width increase; and the movement precision of the masking platform system is greatly improved with the cooperation of the laser interferometer measurement system.
Description
Technical field
The present invention relates to the mask aligner mask platform system, this system is mainly used in the semiconductor lithography machine, belongs to the semiconductor manufacturing equipment field.
Background technology
In the production run of integrated circuit (IC) chip, the exposure transfer printing (photoetching) of the design configuration of chip on the silicon chip surface photoresist is one of most important operation wherein, and this operation equipment used is called litho machine (exposure machine).The resolution of litho machine and exposure efficiency affect characteristic line breadth (resolution) and the throughput rate of integrated circuit (IC) chip greatly.And as kinematic accuracy and the work efficiency of the mask platform system of litho machine critical system, determined to a great extent again resolution and the exposure efficiency of litho machine.
The advanced scanning projecting photoetching machine ultimate principle is: from the deep UV (ultraviolet light) of light source see through mask on mask platform, lens combination with a part of pattern imaging on mask on certain Chip of silicon chip.For carrying out the exposure of a chip on silicon chip, mask platform and silicon wafer stage need carry out respectively accelerated motion, and reach simultaneously the speed of the desired 4:1 of scan exposure when moving to the exposure reference position.After this, silicon wafer stage moves to the scanning motion direction with uniform speed, mask platform with the speed that is four times in the silicon wafer stage sweep velocity to doing scanning motion with the opposite direction of silicon wafer stage scanning motion, it is split hair synchronous that both motions require to reach, and the whole pattern imagings on mask are on the certain chip (Chip) of silicon chip the most at last.After a chip end of scan, mask platform and silicon wafer stage carry out respectively retarded motion, and simultaneously silicon wafer stage carries out step motion, and the chip that the next one will be exposed moves to the projection objective below.After this, mask platform is accelerated, scans, is slowed down to the direction opposite with last scan direction of motion, and silicon wafer stage according to direction acceleration, scanning, the deceleration of planning, is completed the exposure of a chip in the synchronous scanning process.So constantly repeat, mask platform comes and goes the rectilinear motion that accelerates, scans, slows down, and silicon wafer stage carries out stepping and scanning motion according to the track of planning, completes the exposure of whole silicon chip.
According to the motion requirement to mask platform, mask platform mainly provides and comes and goes the function that the ultraprecise high-speed straight-line moves along the direction of scanning.Its stroke should satisfy 4 times of chip length and add the distance of acceleration and deceleration; Its sweep velocity should be 4 times of silicon wafer stage sweep velocity, and high acceleration also accordingly can be higher than the high acceleration of silicon wafer stage.According to the technical indicator of Typical Foreign litho machine commodity, the type that the stroke of mask platform surpasses 100mm(to be had reaches 200mm), sweep velocity reaches 1000mm/s, and high acceleration reaches 20m/s
2, i.e. 2g.Improve sweep velocity and the acceleration (silicon wafer stage also synchronously improves) of mask platform, can effectively improve the throughput rate of litho machine.
Of paramount importancely be, mask platform must be able to realize and being synchronized with the movement of the superhigh precision of silicon wafer stage scanning motion, and for the 45nm litho machine, its synchronization accuracy requires MA(moving average deviation) less than 2.25nm, MSD(moves standard deviation) less than 5.4nm.Wherein, the alignment precision of MA major effect exposure, MSD major effect exposure resolution ratio.
In order to satisfy the large stroke of mask platform and high speed, high-precision harsh requirement, traditional common drives structure that adopts thick smart fold layer of mask platform system.The mask platform system is comprised of coarse motion platform and the moving platform of stack essence thereon.Wherein, the coarse motion platform adopts the two-sided driving system of the high speed and large stroke of left linear electric motors and right linear electric motors composition to drive, the air-float guide rail supporting; The moving platform of essence is driven by the voice coil motor of directions X and the voice coil motor of Y-direction, mask platform is carried out the fine setting of real-time high-precision, satisfies the requirement of its kinematic accuracy.This lamination drives structure is when motion, and the bilateral drive structure of the reciprocating bottom linear electric motors of single-degree-of-freedom adopts the air-float guide rail supporting, complex structure, assembly precision requires high, thereby has limited the kinematic accuracy of mask platform, has hindered the raising of its acceleration.
Summary of the invention
In order to improve the acceleration of mask aligner mask platform, speed and bearing accuracy, and then the raising of throughput rate, alignment precision and the resolution of promotion litho machine, reduce the assembly precision requirement, the invention provides a kind of mask table system with six degree of freedom coarse motion platform with laser interferometer measurement.
Technical scheme of the present invention is as follows:
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement, this system comprises essence moving platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body and drive unit, it is characterized in that: described coarse motion platform stage body is arranged on the outside of the moving platform of essence, in the middle of the moving platform of essence is enclosed in; Described drive unit comprises large stroke driver module and little stroke driver module two parts, large stroke driver module is comprised of two groups of directions X linear electric motors that are arranged symmetrically in coarse motion platform stage body both sides about X-direction, little stroke driver module is comprised of four groups of two-freedom linear electric motors that drive simultaneously Y-direction and Z direction, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body both sides about X-direction in twos, and are positioned at large stroke driver module below;
described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, described two coarse motion platform gravitational equilibrium arrangement of components are above coarse motion platform stage body, be arranged symmetrically in coarse motion platform stage body both sides along X-direction, each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board and two coarse motion platform gravitational equilibrium permanent magnets, the permanent magnet array of coarse motion platform gravitational equilibrium magnetic conductive board and directions X linear electric motors links together, coarse motion platform gravitational equilibrium permanent magnet is arranged in coarse motion platform stage body upper surface, side along X-direction is arranged symmetrically with about Y direction, and leave the gap with coarse motion platform gravitational equilibrium magnetic conductive board,
This system also includes the laser interferometer measurement assembly, described laser interferometer measurement assembly comprises LASER Light Source, optical path component, laser interferometer and measurement bay, be used for measuring position feedback between the moving platform stage body of essence and measurement bay, described laser interferometer comprises a twin shaft laser interferometer and two four axle laser interferometer; Described optical path component comprises laser beam splitter, curved smooth device and catoptron; Described LASER Light Source is fixed on measurement bay, and described laser beam splitter and curved smooth device are fixed on measurement bay; Described catoptron comprises the first plane mirror, the second plane mirror and 45 ° of catoptrons;
The laser that sends from a LASER Light Source passes through laser beam splitter, light splitting ratio in laser beam splitter is divided into orthogonal two bundle laser, wherein beam of laser arrives described twin shaft laser interferometer through curved smooth device, and another Shu Jiguang directly injects one of them four axle laser interferometer; The laser that the another one LASER Light Source is sent is directly injected another four axles laser interferometer through a curved smooth device; Described twin shaft laser interferometer is arranged in mask table system along central axis one end of Y direction, and is fixed on measurement bay; Below described two four axle laser interferometer are arranged symmetrically in coarse motion platform stage body along Y direction, and be fixed on measurement bay;
Be divided into a branch of measurement light and a branch of reference light that is parallel to each other from described twin shaft laser interferometer light out, measure light and return to the twin shaft laser interferometer after being fixed on the first plane mirror reflection on the moving platform of essence, reference light returns to the twin shaft laser interferometer after being fixed on the second plane mirror reflection on measurement bay;
Be divided into from each four axle laser interferometer light out the measurement light that four bundles are parallel to each other, this four bundle is measured light and is divided into laterally zygomorphic two rows, two bundles that are positioned at a top row are measured light and are returned to four axle laser interferometer after through the corresponding offside reflection of the moving platform stage bodies of essence, two bundles that are positioned at a following row measure light through one be fixed on 45 ° of catoptrons on measurement bay with two-beam bending 90 degree after the moving platform stage body of directive essence bottom surface this four axles laser interferometer of backspace again.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention is characterized in that: it is characterized in that: described each directions X linear electric motors are comprised of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are comprised of one group of permanent magnet array and one group of coil array, and share one group of permanent magnet array along two two-freedom linear electric motors of directions X homonymy; Two groups of permanent magnet arrays of directions X linear electric motors and four groups of permanent magnet arrays of two-freedom linear electric motors all are fixed on surface level on frame; Two groups of coil arrays of directions X linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on coarse motion platform stage body respectively.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention is characterized in that: it is characterized in that: the moving platform of described essence comprises the moving platform stage body of essence, Lorentz motor and the moving platform gravity compensation assembly of essence; Described Lorentz motor comprises three kinds of Lorentz motors, every kind of Lorentz motor is symmetrically distributed in the moving platform stage body of essence along the two sides of Y direction, wherein, the driving direction of the first Lorentz motor is along X-direction, be arranged symmetrically with about X-axis, at least two of every sides drive the moving platform stage body of essence and move along directions X with around the Z axis sense of rotation; The driving direction of the second Lorentz motor is along Y direction and move the platform barycenter by essence, every side at least one, the smart platform stage body that moves of driving moves along Y-direction; On four angles that are positioned at the moving platform stage body of essence of the third Lorentz motor, be arranged symmetrically with about X-axis simultaneously, two of every sides, its driving direction is along Z-direction, drives the moving platform stage body of essence along the Z direction, move around X-axis sense of rotation and Y-axis sense of rotation.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention is characterized in that: the moving platform stage body of described essence is square structure, and minute surface all is processed in its four lateral surfaces and bottom surface, is used for making the laser interferometer reflector laser.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention, it is characterized in that: the moving platform gravity compensation assembly of described essence comprises the moving platform gravity compensation of four essences unit, the moving platform gravity compensation of each essence unit is comprised of the moving platform gravitational equilibrium magnetic conductive board of an essence and the moving platform gravitational equilibrium permanent magnet of essence, the moving platform gravity compensation of described four essences unit is distributed in respectively on four angles of the moving platform stage body of essence, and wherein four moving platform gravitational equilibrium magnetic conductive boards of essence are separately fixed at coarse motion platform stage body) on; Four moving platform gravitational equilibrium permanent magnets of essence are separately fixed on the moving platform stage body of essence, and corresponding with the position of the moving platform gravitational equilibrium magnetic conductive board of essence, leave the gap simultaneously and between the moving platform gravitational equilibrium magnetic conductive board of essence.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention is characterized in that: described coarse motion platform stage body is thin-wall case, is made by thyrite.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention is characterized in that: the moving platform stage body of described essence is thin-wall case, is made by thyrite.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention is characterized in that: the one-dimensional array that the coil array of the coil array of described two groups of directions X linear electric motors and four groups of two-freedom linear electric motors all is comprised of the iron-core-free square coil; The permanent magnet array of described two groups of directions X linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention, have the following advantages and the high-lighting effect: 1. compare with the traditional masks platform that adopts the air-float guide rail supporting, mask platform of the present invention adopts magnetic suspension bearing, simplified system architecture, vibration and the noise of having avoided air supporting to introduce, and can satisfy the required condition of high vacuum degree environment of extreme ultraviolet photolithographic, and the attractive force balance of magnetic levitation system mask platform and appendicular most gravity thereof.2. compare with the bilateral driving junction structure of traditional single-degree-of-freedom coarse motion platform, the structure of six degree of freedom coarse motion platform of the present invention, increased the flexibility of mover in the system, the matching requirements of system had both been reduced, also improve response speed, acceleration and the motion positions precision of mask platform, thereby improved throughput rate, alignment precision and the resolution of litho machine.3. laser interferometer measurement the measuring precision and measuring speed all higher than traditional measurement means, can adapt to high response speed, high acceleration and the high motion positions precision of mask platform, have greatly improved throughput rate, alignment precision and the resolution of litho machine at last.
Scheme attached explanation
Fig. 1 is the mask table system structural representation with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention.
Fig. 2 is the structural representation of looking up of the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention.
Fig. 3 is twin shaft laser interferometer structural representation of the present invention.
Fig. 4 is four axle laser interferometer structural representations of the present invention.
Fig. 5 is the structural representation of coarse motion platform gravitational equilibrium assembly of the present invention and the moving platform gravitational equilibrium assembly of essence.
Fig. 6 is the structural representation after the mask table system directions X linear electric motors with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention remove the first permanent magnet array.
Fig. 7 is the structural representation after the coil of the mask table system two-freedom linear electric motors with six degree of freedom coarse motion platform with laser interferometer measurement of the present invention removes side the 3rd permanent magnet array.
Fig. 8 a and Fig. 8 b are respectively the large coil one-dimensional array of the iron-core-free square coil that the present invention adopts and the schematic three dimensional views of small coil one-dimensional array.
Fig. 9 is the schematic diagram with directions X line motor permanent magnet array magnetizing direction in the mask table system with six degree of freedom coarse motion platform of laser interferometer measurement of the present invention.
Figure 10 is the schematic diagram with two-freedom line motor permanent magnet array magnetizing direction in the mask table system with six degree of freedom coarse motion platform of laser interferometer measurement of the present invention.
In figure: the moving platform stage body of 1-essence; 2-coarse motion platform stage body; 3-the first directions X linear electric motors; 4-the second directions X linear electric motors; 5-the first two-freedom linear electric motors; 6-the second two-freedom linear electric motors; 7-the 3rd two-freedom linear electric motors; 8-the 4th two-freedom linear electric motors; The 9-pedestal; The 10-measurement bay; 11-coarse motion platform gravitational equilibrium magnetic conductive board; 12-coarse motion platform gravitational equilibrium permanent magnet; The first coil array of 13-; The second largest coil array of 14-; 15-the first small coil array; 16-the second small coil array; 17-the 3rd small coil array; 18-the 4th small coil array; 21-the first permanent magnet array; 22-the second permanent magnet array; 23-the 3rd permanent magnet array; The moving platform gravitational equilibrium magnetic conductive board of 31-essence; The moving platform gravitational equilibrium permanent magnet of 32-essence; 41-twin shaft laser interferometer; 42-the one or four axle laser interferometer; 43-the two or four axle laser interferometer; 44-the first plane mirror; 45-the second plane mirror; 46-45 ° of catoptron; 47-45 ° of mount pad; The 48-laser beam splitter; The 49-LASER Light Source; The curved smooth device of 50-.
Embodiment
Below in conjunction with accompanying drawing, concrete structure of the present invention, mechanism and the course of work are further described.
The mask table system with six degree of freedom coarse motion platform with laser interferometer measurement provided by the invention, as shown in Figure 1, this system comprises coarse motion platform, the moving platform of essence and frame, and the coarse motion platform contains a coarse motion platform stage body 2, drive unit and two coarse motion platform gravitational equilibrium assemblies; Coarse motion platform stage body 2 is enclosed within the outside of the moving platform of essence, is thin-wall case, is made by the thyrite sintering; Described drive unit comprises large stroke driver module and little stroke driver module two parts, as shown in Figure 6 and Figure 7.large stroke driver module is comprised of two groups of the first directions X linear electric motors 3 and second directions X linear electric motors 4 that are arranged symmetrically in coarse motion platform stage body 2 both sides about directions X, is responsible for driving mask platform coarse motion platform and does large stroke linear reciprocating motion on directions X, little stroke driver module is the first two-freedom linear electric motors 5 that drive simultaneously Y-direction and Z direction by four groups, the second two-freedom linear electric motors 6, the 3rd two-freedom linear electric motors 7 and the 4th two-freedom linear electric motors 8 form, these four groups of two-freedom linear electric motors are to be arranged symmetrically in twos coarse motion platform stage body 2 both sides about directions X, and be positioned at below large stroke driver module, described four groups of two-freedom linear electric motors are responsible for regulating mask platform coarse motion platform in the little travel displacement of Y-axis and Z-direction, and around X-axis, the rotation among a small circle of the anglec of rotation of the three degree of freedom that Y-axis and Z axis rotate, employing can make the directions X linear electric motors that the thrust of directions X only is provided based on the control algolithm that d-q decomposes, and the thrust of Y and Z direction is close to zero, Y and Z direction linear electric motors only produce the thrust of Y-direction and Z direction, and the thrust of directions X is close to zero,
Two coarse motion platform gravitational equilibrium assemblies are arranged symmetrically in coarse motion platform stage body both sides about X-direction, and each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board 11 and two coarse motion platform gravitational equilibrium permanent magnets 12.Each coarse motion platform gravitational equilibrium magnetic conductive board 11 links together with the stationary part of the directions X linear electric motors of the same side, two coarse motion platform gravitational equilibrium permanent magnets 12 are arranged on respectively coarse motion platform stage body 2 along on side two angles of X-direction, and keep certain gap with coarse motion platform gravitational equilibrium magnetic conductive board 11;
This system also includes the laser interferometer measurement assembly, and described laser interferometer measurement assembly comprises LASER Light Source 49, optical path component, laser interferometer and measurement bay 10, is used for measuring position feedback between the moving platform stage body 1 of essence and measurement bay 10.Laser interferometer of the present invention comprises a twin shaft laser interferometer 41 and two four axle laser interferometer, is respectively the one or four axle laser interferometer 42 and the two or four axle laser interferometer 43.Optical path component comprises laser beam splitter 48, curved smooth device 50 and catoptron.LASER Light Source 49 is to be fixed on measurement bay 10, and laser beam splitter 48 and curved smooth device 50 also are separately fixed on measurement bay 10; Described catoptron comprises the first plane mirror 44, the second plane mirror 45 and 45 ° of catoptrons.The moving platform stage body 1 of essence is square structure, and minute surface all is processed in its four lateral surfaces and bottom surface, is used for making the laser interferometer reflector laser;
The laser that is sent by a LASER Light Source 49, through a laser beam splitter 48, ratio in laser beam splitter 48 is divided into orthogonal two bundles, arrive described twin shaft laser interferometer 41, injecting the one or four axle laser interferometer 42 by laser beam splitter 48 another Shu Jiguang out through a curved smooth device 50, and another LASER Light Source 49 is sent laser through curved smooth device 50 arrival the two or four axle laser interferometer 43; Twin shaft laser interferometer 41 is arranged in mask table system along central axis one end of Y direction, is fixed on measurement bay 10; Simultaneously, the one or four axle laser interferometer 42 and the two or four axle laser interferometer 43 are arranged symmetrically in coarse motion platform stage body 2 belows along Y direction, also are fixed on relevant position on measurement bay 10;
From twin shaft laser interferometer 41 light out, be divided into a branch of measurement light and a branch of reference light that are parallel to each other, as shown in Figure 3, measure light and be reflected back laser interferometer through the first plane mirror 44 that is fixed on the moving platform stage body 1 of essence, reference light is reflected back laser interferometer through the second plane mirror 45 that is fixed on measurement bay 10; In the present embodiment, what measure photo measure is that the moving platform stage body 1 of essence is with respect to the relative displacement along Y-direction of measurement bay 10, reference light is the second plane mirror 45 of measurement and the distance between twin shaft laser interferometer 41, this value is fixed value, the moving platform stage body 1 of essence that hence one can see that is with respect to the absolute displacement along Y-direction of measurement bay 10, the measured value of up and down two-beam is done difference, measures along the angle of X-axis rotation; Simultaneously, can reduce the measuring error that the vibration of measuring frame brings by reference light.
and from described each four axle laser interferometer out light be divided into respectively the measurement light that four bundles are parallel to each other, this four bundle is measured light and has been divided into, two rows of lower symmetry, in the present embodiment, as shown in Figure 4, for the one or four axle laser interferometer 42, two bundles that are positioned at a top row are measured light, mirror surface through the corresponding side of the moving platform stage body 1 of essence, be reflected back the one or four axle laser interferometer 42, and two bundles that are positioned at a following row are measured light, need the backward upper directive essence of two-beam bending 90 degree to be moved the mirror surface of the bottom surface of platform stage body 1 through 45 ° of catoptrons 46 that are fixed on measurement bay 10, be reflected back in the one or four axle laser interferometer 42 along former road again, for the two or four axle laser interferometer 43, principle of work is identical.
According to the installation site of two four axle laser interferometer, all measure along X-direction.So, top row's measurement light of these two four axle laser interferometer carries out along the measurement of X-direction displacement the moving platform of essence; And following row's measurement light carries out along the measurement of Z-direction displacement the moving platform of essence; Two rows are measured the measured value of light and are done difference, measure along the angle of Y-axis rotation; Above a row the two bundles measured values of measuring light do difference, measure along the angle of Z axis rotation;
Each directions X linear electric motors forms by first permanent magnet array 21, second permanent magnet array 22 and one group of large coil array; Each two-freedom linear electric motors is comprised of the 3rd permanent magnet array 23 and one group of small coil array, and shares one group of the 3rd permanent magnet array 23 along two two-freedom linear electric motors of directions X homonymy; The 3rd permanent magnet array 23 of described all directions X linear electric motors first permanent magnet arrays 21 and the second permanent magnet array 22 and all two-freedom linear electric motors all is fixed on surface level on the litho machine frame; Described all large coil arrays and small coil array are separately fixed on coarse motion platform stage body 2;
The one-dimensional array that the large coil array of the directions X linear electric motors of coarse motion of the present invention and the small coil array of two-freedom linear electric motors all are comprised of the iron-core-free square coil (as shown in Figure 8) that adopts the concentric coiling of copper cash, the support of coil adopt nonferromagnetic parts (as aluminium alloy) to make;
The first permanent magnet array 21 of the directions X linear electric motors of coarse motion of the present invention and the second permanent magnet array 22 are bonding one group of one dimension halbach type permanent magnet arrays that adopt the rectangular parallelepiped rare-earth permanent magnet to arrange and form on the square thin yoke of a block length, in the first permanent magnet array 21 and the second permanent magnet array 22, the volume of the magnetizing direction permanent magnet parallel with array direction less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 6, " N " in figure, the N utmost point and the S utmost point of " S " expression permanent magnet, the magnetizing direction of permanent magnet is perpendicular to paper at this moment.The 3rd permanent magnet array 23 of described two-freedom linear electric motors is also bonding one group of plane halbach type permanent magnet array that adopts the rectangular parallelepiped rare-earth permanent magnet to arrange and form on the square thin yoke of a block length, and in the 3rd permanent magnet array 23, the volume of the magnetizing direction permanent magnet parallel with array direction is also less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 9).
The moving platform of essence is six-freedom micro displacement worktable, comprises the moving platform stage body 1 of essence, Lorentz motor and the moving platform gravity compensation assembly of essence; Described Lorentz motor comprises three kinds of Lorentz motors, every kind of Lorentz motor is symmetrically distributed in the moving platform stage body 1 of essence along the two sides of Y direction, wherein, the driving direction of the first Lorentz motor is along X-direction, be arranged symmetrically with about X-axis, at least two of every sides drive the moving platform stage body 1 of essence and move along directions X with around the Z axis sense of rotation; The driving direction of the second Lorentz motor is along Y direction and move the platform barycenter by essence, every side at least one, the smart platform stage body 1 that moves of driving moves along Y-direction; On four angles that are positioned at the moving platform stage body of essence of the third Lorentz motor, be arranged symmetrically with about X-axis simultaneously, two of every sides, its driving direction is along Z-direction, drives the moving platform stage body of essence along the Z direction, move around X-axis sense of rotation and Y-axis sense of rotation;
the moving platform gravity compensation assembly of essence comprises the four groups of moving platform gravity compensation of essence unit, as shown in Figure 5, the moving platform gravity compensation of each essence unit is comprised of the moving platform gravitational equilibrium magnetic conductive board 31 of an essence and the moving platform gravitational equilibrium permanent magnet 32 of essence, the moving platform gravity compensation cell distribution of described four groups of essences is on four angles of the moving platform stage body 1 of essence, wherein the moving platform gravitational equilibrium magnetic conductive board 31 of all essences is fixed on coarse motion platform stage body 2, the moving platform gravitational equilibrium permanent magnet 32 of all essences is fixed on the position of the moving platform gravitational equilibrium magnetic conductive board 31 of each essence corresponding on the moving platform stage body 1 of essence, and has certain gap with the moving platform gravitational equilibrium magnetic conductive board of essence, the moving platform stage body 1 of essence is thin-wall case, made by thyrite,
Mask table system of the present invention is the unloading phase that its working stage being divided into, normal work stage and stop phase, three phases altogether.The unloading phase principle of work as follows: before system's electrifying startup, the attractive force of gravity balance device is less than the gravity of mask stage coarse motion platform and the moving platform of essence, and mask stage stops at a little more than on the fixedly station on the litho machine frame of the second permanent magnet array 22 upper surfaces.After system's electrifying startup, 4 thrusts that the two-freedom linear electric motors provide the Z direction to make progress, promote coarse motion platform mover and partly move upward to the working position, then regulate on the one hand coarse motion platform mover part along the position of Z-direction in the mask stage course of work, and around the rotation of X-direction with around the attitude of these two degree of freedom of rotation of Y-direction, coordinating on the other hand gravity balance device balance coarse motion platform mover part is also mask stage and appendicular gravity thereof, makes the moving platform of coarse motion platform mover part and essence be in all the time suspended state.Meanwhile, 4 two-freedom linear electric motors provide the thrust of Y-direction, adjust the moving platform of coarse motion platform mover part and essence along the translation of Y-axis with around the attitude of two degree of freedom of rotation of Z axis, make the moving Delta of coarse motion platform mover part and essence to the desired position of work and attitude, and regulate in real time aforementioned five degree of freedom in the whole course of work, satisfy system to the positioning requirements of these five degree of freedom.Then, 2 directions X linear electric motors adopt bilateral type of drive, and driving coarse motion platform mover part is also that coarse motion platform mover part and the moving platform of essence carry out acceleration, deceleration and at the uniform velocity to-and-fro movement along directions X, reaches the operating rate of system requirements, the work the unloading phase of completing.
After this, system enters normal work stage, and drive unit is finely tuned speed and the attitude of coarse motion platform mover part and the moving platform of essence in directions X linear electric motors perform regions, satisfies system to its speed and the requirement of position, simultaneously the energy dissipation of bucking-out system.When coarse motion platform mover part and the moving platform of essence move to+latter end of directions X stroke, directions X linear electric motors deceleration work is to stopping, then oppositely accelerate again, make the moving platform of coarse motion platform mover part and essence move to the latter end of the trip to-directions X, directions X linear electric motors deceleration work circulates and so forth to stopping.
At stop phase, when coarse motion platform mover part and the static station of the moving platform low-speed motion of essence top, then all drive units coordinate to slow down and are parked on static station.
Mask table system of the present invention adopts magnetic suspension bearing, does not need air-flotation system, has simplified system architecture, vibration and the noise of having avoided air supporting to introduce, and can satisfy the required condition of high vacuum degree environment of extreme ultraviolet photolithographic.
On the other hand, compare with traditional thick smart fold layer structure, mask table system of the present invention provides a kind of coarse motion platform structure with six-freedom motion function, both guaranteed the thrust of scanning motion and improved kinematic accuracy, the high precision matching requirements of coarse motion platform have been reduced again, under the condition that does not change kinematic accuracy, greatly simplified the accuracy requirement of parts design and manufacturing, improved throughput rate, alignment precision and the resolution of litho machine.
Claims (8)
1. with the mask table system with six degree of freedom coarse motion platform of laser interferometer measurement, this system comprises essence moving platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body (2) and drive unit, it is characterized in that: described coarse motion platform stage body (2) is arranged on the outside of the moving platform of essence, in the middle of the moving platform of essence is enclosed in; Described drive unit comprises large stroke driver module and little stroke driver module two parts, large stroke driver module is comprised of two groups of directions X linear electric motors that are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction, little stroke driver module is comprised of four groups of two-freedom linear electric motors that drive simultaneously Y-direction and Z direction, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction in twos, and are positioned at large stroke driver module below;
described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, described two coarse motion platform gravitational equilibrium arrangement of components are in coarse motion platform stage body (2) top, be arranged symmetrically in coarse motion platform stage body (2) both sides along X-direction, each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board (11) and two coarse motion platform gravitational equilibrium permanent magnets (12), coarse motion platform gravitational equilibrium magnetic conductive board (11) links together with the permanent magnet array of directions X linear electric motors, coarse motion platform gravitational equilibrium permanent magnet (12) is arranged in coarse motion platform stage body (2) upper surface, side along X-direction is arranged symmetrically with about Y direction, and leave the gap with coarse motion platform gravitational equilibrium magnetic conductive board (11),
Described mask table system also includes the laser interferometer measurement assembly, described laser interferometer measurement assembly comprises two LASER Light Source (49), optical path component, laser interferometer and measurement bay (10), and described laser interferometer comprises a twin shaft laser interferometer (41) and two four axle laser interferometer (9); Described optical path component comprises laser beam splitter (48), curved smooth device (50) and catoptron; Described LASER Light Source (49) is fixed on measurement bay (10), and described laser beam splitter (48) and curved smooth device (50) are fixed on measurement bay (10); Described catoptron comprises the first plane mirror (44), the second plane mirror (45) and 45 ° of catoptrons;
The laser that sends from a LASER Light Source (49) passes through laser beam splitter (48), light splitting ratio in laser beam splitter (48) is divided into orthogonal two bundle laser, wherein beam of laser arrives described twin shaft laser interferometer (41) through curved smooth device (50), and another Shu Jiguang directly injects one of them four axle laser interferometer; The laser that another one LASER Light Source (49) is sent is directly injected another four axles laser interferometer through a curved smooth device (50); Described twin shaft laser interferometer (41) is arranged in mask table system along central axis one end of Y direction, and is fixed on measurement bay (10); Below described two four axle laser interferometer are arranged symmetrically in coarse motion platform stage body (2) along Y direction, and be fixed on measurement bay (10);
Be divided into a branch of measurement light and a branch of reference light that is parallel to each other from described twin shaft laser interferometer (41) light out, measure light and return to the twin shaft laser interferometer after being fixed on the first plane mirror (44) reflection on the moving platform of essence, reference light returns to the twin shaft laser interferometer after being fixed on the second plane mirror (45) reflection on measurement bay (10);
Be divided into from each four axle laser interferometer light out the measurement light that four bundles are parallel to each other, this four bundle is measured light and is divided into laterally zygomorphic two rows, two bundles that are positioned at a top row are measured light and are returned to four axle laser interferometer after through the corresponding offside reflection of the moving platform stage bodies (1) of essence, two bundles that are positioned at a following row measure light through one be fixed on 45 ° of catoptrons (46) on measurement bay (10) with two-beam bending 90 degree after the moving platform stage body (1) of directives essence bottom surface this four axles laser interferometer of backspace again.
2. according to the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement claimed in claim 1, it is characterized in that: described each directions X linear electric motors are comprised of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are comprised of one group of permanent magnet array and one group of coil array, and share one group of permanent magnet array along two two-freedom linear electric motors of directions X homonymy; Two groups of permanent magnet arrays of directions X linear electric motors and four groups of permanent magnet arrays of two-freedom linear electric motors all are fixed on surface level on frame; Two groups of coil arrays of directions X linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on coarse motion platform stage body (2) respectively.
3. according to the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement claimed in claim 1, it is characterized in that: the moving platform of described essence comprises the moving platform stage body (1) of essence, Lorentz motor and the moving platform gravity compensation assembly of essence; Described Lorentz motor comprises three kinds of Lorentz motors, every kind of Lorentz motor is symmetrically distributed in the moving platform stage body (1) of essence along the two sides of Y direction, wherein, the driving direction of the first Lorentz motor is along X-direction, be arranged symmetrically with about X-axis, at least two of every sides drive the moving platform stage body (1) of essence and move along directions X with around the Z axis sense of rotation; The driving direction of the second Lorentz motor is along Y direction and move the platform barycenter by essence, every side at least one, the smart platform stage body (1) that moves of driving moves along Y-direction; On four angles that are positioned at the moving platform stage body of essence of the third Lorentz motor, be arranged symmetrically with about X-axis simultaneously, two of every sides, its driving direction is along Z-direction, drives the moving platform stage body of essence along the Z direction, move around X-axis sense of rotation and Y-axis sense of rotation.
4. according to the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement claimed in claim 3, it is characterized in that: the moving platform stage body (1) of described essence is square structure, minute surface all is processed in its four lateral surfaces and bottom surface, is used for making the laser interferometer reflector laser.
5. according to the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement claimed in claim 3, it is characterized in that: the moving platform gravity compensation assembly of described essence comprises the moving platform gravity compensation of four essences unit, the moving platform gravity compensation of each essence unit is comprised of the moving platform gravitational equilibrium magnetic conductive board (31) of an essence and the moving platform gravitational equilibrium permanent magnet (32) of essence, the moving platform gravity compensation of described four essences unit is distributed in respectively on four angles of the moving platform stage body (1) of essence, wherein four moving platform gravitational equilibrium magnetic conductive boards (31) of essence are separately fixed on coarse motion platform stage body (2), four moving platform gravitational equilibrium permanent magnets (32) of essence are separately fixed on the moving platform stage body (1) of essence, and corresponding with the position of the moving platform gravitational equilibrium magnetic conductive board (31) of essence, leave the gap simultaneously and between the moving platform gravitational equilibrium magnetic conductive board of essence.
6. according to the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement claimed in claim 1, it is characterized in that: described coarse motion platform stage body (2) is thin-wall case, is made by thyrite.
7. according to the described mask table system with six degree of freedom coarse motion platform with laser interferometer measurement of claim 3 or 4, it is characterized in that: the moving platform stage body (1) of described essence is thin-wall case, is made by thyrite.
8. according to the mask table system with six degree of freedom coarse motion platform with laser interferometer measurement claimed in claim 2, it is characterized in that: the one-dimensional array that the coil array of the coil array of described two groups of directions X linear electric motors and four groups of two-freedom linear electric motors all is comprised of the iron-core-free square coil; The permanent magnet array of described two groups of directions X linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
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Effective date of registration: 20151103 Address after: 100084 Beijing, Haidian District, 100084 box office box office, Tsinghua University, Patentee after: Tsinghua University Patentee after: U-PRECISION TECH CO., LTD. Address before: 100084 Beijing, Haidian District, 100084 box office box office, Tsinghua University, Patentee before: Tsinghua University |