CN106931890B - The precision measurement system and its measurement method of Micro and nano manipulation platform displacement and rotation angle - Google Patents
The precision measurement system and its measurement method of Micro and nano manipulation platform displacement and rotation angle Download PDFInfo
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- CN106931890B CN106931890B CN201710243559.0A CN201710243559A CN106931890B CN 106931890 B CN106931890 B CN 106931890B CN 201710243559 A CN201710243559 A CN 201710243559A CN 106931890 B CN106931890 B CN 106931890B
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- laser interferometer
- right angle
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
Abstract
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, disclose the precision measurement system of a kind of Micro and nano manipulation platform displacement and rotation angle, Micro and nano manipulation platform includes platform base and displacement platform, the measuring system includes: first laser interferometer and second laser interferometer on first axle, and the third laser interferometer in the second axis vertical with first axle；And it is located on displacement platform and is configured to criss-cross optical module, the optical module includes the first right angle optic portion, so that the incident ray of first laser interferometer transmitting is parallel with emergent ray, second right angle optic portion, so that the transmitting of second laser interferometer incident ray is parallel with emergent ray and third right angle optic portion so that the incident ray that third laser interferometer emits is parallel with emergent ray.The present invention also provides a kind of Micro and nano manipulation platform displacement and the measurement methods of rotation angle.Measuring system and its measurement method provided by the invention can be realized the multivariant measurement in space and measurement accuracy is high.
Description
Technical field
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, more particularly to a kind of Micro and nano manipulation platform position
The precision measurement system and its measurement method of shifting and rotation angle.
Background technique
With the development and application of Micro and nano manipulation technology, multiple degrees of freedom especially realizes that the Micro and nano manipulation of rotary freedom is flat
Platform is increasingly paid close attention to, and angular displacement and the accurate measurement of displacement of the lines are an important factor for influencing its development.
Laser interferometer because high resolution, it is non-contact, affected by environment it is small, be quick on the draw the advantages that be widely used in it is various
In precision measurement system.Laser interferometer be displacement measurement is carried out according to the interference between reference beam and measuring beam, if
When twice light beam optical path difference does not change, detector can find stable letter between mutually long property and the two poles of the earth of destructive interference
Number；If optical path difference changes, detector can be in change in optical path length each time, between mutually long property and the two poles of the earth of destructive interference
Variable signal is found, these variations can be calculated and be used to measure the change of divergence between two light paths.Presently, there are laser
Interferometer can only often survey individual translational motion or independent measurement angle, can not measurement angle and translation simultaneously, when there is light path
When difference variation, laser interferometer can not judge that this variation is to be generated by translational motion or rotated by Micro and nano manipulation platform to generate
, therefore cause Micro and nano manipulation platform displacement and the precision measurement system of rotation angle that can not measure to its angular displacement.
Summary of the invention
(1) technical problems to be solved
It is an object of the present invention to provide a kind of Micro and nano manipulation platform displacement and the precision measurement system of rotation angle, the surveys
Amount system can be when Micro and nano manipulation platform, which does the i.e. existing translational motion of the non-rotary motion to center, has rotary motion again to flat
Shifting movement and angular displacement are decoupled and are measured simultaneously, and measurement accuracy is high, structure is simple.
It is a further object to provide a kind of Micro and nano manipulation platform displacement and the measurement methods of rotation angle.
(2) technical solution
In order to solve the above-mentioned technical problems, the present invention provides a kind of Micro and nano manipulation platform displacements and the accurate of rotation angle to survey
Amount system, the Micro and nano manipulation platform include platform base and the displacement platform on the platform base, wherein packet
It includes:
First laser interferometer and second laser interferometer on first axle, the launch hole of first laser interferometer
Central axis it is conllinear with the central axis of the launch hole of second laser interferometer, positioned at the second axis vertical with first axle
On third laser interferometer, the third laser interferometer and first laser interferometer, second laser interferometer are located at same water
In plane, and the central axis of the launch hole of the central axis of the launch hole of third laser interferometer and first laser interferometer hangs down
Directly；And
It is located on displacement platform and is configured to criss-cross optical module, which includes and first laser interferometer pair
The the first right angle optic portion answered, the first right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and first
The incident ray and the incident ray of laser interferometer transmitting are straight through the first right angle mirror surface of the first right angle optic portion and second
Emergent ray after the mirror-reflection of angle is parallel, and optical module further includes the second right angle corresponding with second laser interferometer eyeglass portion
Point, the second right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and second laser interferometer transmitting enter
Penetrate light and outgoing of the incident ray after the first right angle mirror surface of the second right angle optic portion and the second right angle mirror-reflection
Light ray parallel；Optical module further includes third corresponding with third laser interferometer right angle optic portion, the third right angle eyeglass
Part includes the first right angle mirror surface and the second right angle mirror surface, and the incident ray and the incident ray of the transmitting of third laser interferometer
Emergent ray after the first right angle mirror surface of third right angle optic portion and the second right angle mirror-reflection is parallel.
Wherein, optical module includes the optical module pedestal being arranged on displacement platform, is arranged on optical module pedestal
Criss-cross four card slots are configured to, are provided with sheet glass in each card slot, wherein close to first laser interferometer
Two sheet glass form the first right angle optic portion, and two sheet glass close to second laser interferometer form the second right angle eyeglass
Part forms third right angle optic portion close to two sheet glass of third laser interferometer, and close to third laser interferometer
The two sides of two sheet glass be coated with reflective membrane, far from third laser interferometer and close to the glass of first laser interferometer
Piece is coated with reflective membrane towards the one side of first laser interferometer, far from third laser interferometer and close to second laser interferometer
Sheet glass towards second laser interferometer one side be coated with reflective membrane.
The present invention also provides a kind of Micro and nano manipulation platform displacement and the measurement methods of rotation angle comprising:
S1: by the Kinematic Decomposition of displacement platform at along the translational motion of first axle, the translational motion of second axis and around
The rotary motion of Platform center point, if displacement platform is a along the translation distance of second axis1, along the translation distance of first axle
For a2, and around Platform center point rotation angle be θ；
S2: the first optical path difference Y on first axle is measured by first laser interferometer11；It is measured by second laser interferometer
The second optical path difference Y on first axle22；The optical path difference X in second axis is measured by third laser interferometer11；
S3: it is calculated by the following formula and obtains first laser interferometer because displacement platform is along first axle translational motion reception
The optical path difference Y arrived1, the optical path difference Y that is received by displacement platform around Platform center point rotary motion of first laser interferometer2The edge and
The translation distance a of first axle2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4: being located in the rotary motion of Platform center point, and displacement platform rotates the first of preceding first right angle optic portion
First reflection of the first right angle mirror surface of the first right angle optic portion after the first reflection point and the displacement platform rotation of right angle mirror surface
The distance between point is m, and displacement platform rotates the second reflection point and the position of the second right angle mirror surface of preceding first right angle optic portion
The distance between the second reflection point of the second right angle mirror surface for moving the first right angle optic portion after platform rotates is n, then enables α=m/
N, and known L0The distance between incident ray and the emergent ray of preceding first right angle optic portion are not moved for displacement platform, then
It is calculate by the following formula the rotation angle, θ for obtaining displacement platform:
S5: it is calculate by the following formula the translation distance a for obtaining displacement platform in second axis1:
X11=X1+X2,
X1=2a1,
In formula, X1The optical path difference received by displacement platform along first axle translational motion for third laser interferometer；X2For
The optical path difference that third laser interferometer is received by displacement platform around Platform center point rotary motion, X2=Y2。
(3) beneficial effect
Micro and nano manipulation platform displacement provided by the invention and the precision measurement system of rotation angle pass through two on first axle
A laser interferometer can be realized the displacement measurement in first axle direction, and the rotation of Micro and nano manipulation platform can be calculated indirectly
Gyration realizes the displacement in second axis direction by the third laser interferometer in the second axis vertical with first axle
Measurement, therefore the measuring system can be realized first axle, the displacement of second axis both direction and rotation angle three certainly
By the measurement spent, the limitation of existing detection device is overcome well, meets the displacement of space multivariant linear and angular displacement
Real-time measurement feedback.In addition, the simple in measurement system structure, measurement accuracy are high.
Detailed description of the invention
Fig. 1 is the structural representation of the precision measurement system of a kind of Micro and nano manipulation platform displacement according to the present invention and rotation angle
Figure；
Fig. 2 is the top view of the precision measurement system of one of Fig. 1 Micro and nano manipulation platform displacement and rotation angle；
Fig. 3 is the structural schematic diagram of a preferred embodiment of the optical module in Fig. 1；
Fig. 4 is the schematic diagram of the displacement platform movement front and back in Fig. 1；
Fig. 5 is the Kinematic Decomposition schematic diagram of the displacement platform in Fig. 4, and wherein the upper left Fig. 5 is the knot before displacement platform movement
Structure schematic diagram；Fig. 5 upper right is the schematic diagram that the displacement platform after decomposing is translated along X-axis；The bottom right Fig. 5 is the displacement platform after decomposing
Along the schematic diagram of Y-axis translation；And the lower-left Fig. 5 is the schematic diagram that the displacement platform after decomposing is rotated around displacement platform central point；
Fig. 6 is the schematic diagram that displacement platform shown in Fig. 5 upper right translates front and back incident ray and emergent ray along X-axis；
Fig. 7 is the schematic diagram that displacement platform shown in the bottom right Fig. 5 translates front and back incident ray and emergent ray along Y-axis；
Fig. 8 is displacement platform shown in the lower-left Fig. 5 around the incident ray of Platform center point rotation front and back and showing for emergent ray
It is intended to.
In figure, 1: first laser interferometer；2: second laser interferometer；3: third laser interferometer；4: displacement platform；5:
Platform base；6: optical module；601: optical module pedestal；602: sheet glass；603: fixed bracket；604: movable support；
605: bolt.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiments of the present invention will be described in further detail.Following instance
For illustrating the present invention, but it is not intended to limit the scope of the invention.
In the description of the present invention, it is to be understood that, term " center ", " longitudinal direction ", " transverse direction ", " length ", " width ",
" thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom" "inner", "outside", " up time
The orientation or positional relationship of the instructions such as needle ", " counterclockwise ", " axial direction ", " radial direction ", " circumferential direction ", " X-axis " " Y-axis " is based on attached drawing
Shown in orientation or positional relationship, be merely for convenience of description of the present invention and simplification of the description, rather than indication or suggestion is signified
Device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to of the invention
Limitation.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include at least one this feature.In the description of the present invention, the meaning of " plurality " is at least two, such as two, three
It is a etc., unless otherwise specifically defined.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " fixation " etc.
Term shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be mechanical connect
It connects, is also possible to be electrically connected or can communicate each other；It can be directly connected, can also indirectly connected through an intermediary, it can be with
It is the interaction relationship of the connection or two elements inside two elements, unless otherwise restricted clearly.For this field
For those of ordinary skill, the specific meanings of the above terms in the present invention can be understood according to specific conditions.
Figures 1 and 2 show that the one of the measuring system of a kind of Micro and nano manipulation platform displacement according to the present invention and rotation angle
A preferred embodiment.As shown in Figure 1, Micro and nano manipulation platform includes platform base 5 and the displacement platform on platform base 5
4, which includes: first laser interferometer 1 and second laser interferometer 2 in first axle (that is, Y-axis), and
The central axis of the launch hole of one laser interferometer 1 is conllinear with the central axis of the launch hole of second laser interferometer 2.The measurement
System further includes the third laser interferometer 3 in the second axis (that is, X-axis) vertical with first axle, the third laser
Interferometer 3 is located in the same horizontal plane with first laser interferometer 1, second laser interferometer 2, and third laser interferometer 3
The central axis upright of the launch hole of the central axis and first laser interferometer 1 of launch hole.The measuring system further includes being located at
Criss-cross optical module 6 is configured on displacement platform 4, which includes corresponding with first laser interferometer 1 first
Right angle optic portion, which includes the first right angle mirror surface and the second right angle mirror surface, and first laser is interfered
First right angle mirror surface and second right angle mirror surface of the incident ray that instrument 1 emits with the incident ray through the first right angle optic portion are anti-
Emergent ray after penetrating is parallel.In this embodiment, the incident ray that first laser interferometer 1 emits is incident on the first prism square
The initial incidence angle of first right angle mirror surface of piece part is 45 °.Optical module further includes corresponding with second laser interferometer 2
Two right angle optic portions, which includes the first right angle mirror surface and the second right angle mirror surface, and second laser is dry
The incident ray and first right angle mirror surface and second right angle mirror surface of the incident ray through the second right angle optic portion that interferometer 2 emits
In parallel in this embodiment, the incident ray that second laser interferometer 2 emits is incident on the second right angle to emergent ray after reflection
The initial incidence angle of first right angle mirror surface of optic portion is 45 °.Optical module further includes corresponding with third laser interferometer 3
Third right angle optic portion, the third right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and third laser
The incident ray and the incident ray that interferometer 3 emits are through the first right angle mirror surface of third right angle optic portion and the second prism square
Emergent ray after the reflection of face is parallel.In this embodiment, it is straight that the incident ray that second laser interferometer 3 emits is incident on third
The initial incidence angle of first right angle mirror surface of angle optic portion is 45 °.
The measuring system of Micro and nano manipulation platform displacement provided by the invention and rotation angle passes through two laser interferences in Y-axis
Instrument can be realized the displacement measurement of Y-direction, and rotation angle (the specific calculating side of Micro and nano manipulation platform can be calculated indirectly
Method will be described below), by the third laser interferometer on X-axis line, the displacement measurement of X-direction is realized, so that the measurement system
System can be realized the multivariant displacement in space and angle measurement, overcomes the limitation of existing detection device well, meets
The displacement of space multivariant linear and the real-time measurement of angular displacement are fed back.In addition, the simple in measurement system structure, measurement accuracy
It is high.
Specifically, as shown in figure 3, the optical module 6 includes the optical module pedestal 601 being arranged on displacement platform 1,
It is provided on optical module pedestal 601 and is configured to criss-cross four card slots, sheet glass 602 is provided in each card slot,
Wherein, the two sides close to two sheet glass 602 of third laser interferometer 3 is each coated with reflective membrane, far from third laser interference
The sheet glass 602 of instrument 3 and close first laser interferometer 1 is coated with reflective membrane towards the one side of first laser interferometer 1, separate
The sheet glass 602 of third laser interferometer 3 and close second laser interferometer 2 is coated towards the one side of second laser interferometer 2
There is reflective membrane.Wherein, it is configured to the first right angle optic portion close to two sheet glass of first laser interferometer 1, close to second
Two sheet glass of laser interferometer 2 are configured to the second right angle optic portion, close to two glass of third laser interferometer 13
Piece is configured to third right angle optic portion.
Preferably, optical module further include two fixed brackets 603 on the optical module pedestal 601 and two can
In the mobile movable support 604 of X-direction, one of fixed bracket 603 sticks on two close to first laser interferometer 1 respectively
On a sheet glass, another is fixed bracket 603 and is sticked on two sheet glass of second laser interferometer 2 respectively,
In a movable support 604 be connected on two sheet glass close to third laser interferometer 3 respectively, another movable support
604 are connected to respectively on two sheet glass far from third laser interferometer 3, fixed bracket 603 and movable support 604 it is transversal
Face is all in isosceles rectangular shaped.The outer end of movable support 604 is provided with bolt 605, is provided on optical module pedestal 601
The threaded hole cooperated with bolt 605, when twisting bolt head, bolt shank is connected on movable support 604, so that movable support
604 slide in X direction, so that corresponding sheet glass is fixed between corresponding movable support 603 and fixed bracket 604.
The invention also discloses a kind of Micro and nano manipulation platform displacement and the measurement methods of rotation angle comprising following steps:
S1: the movement (as shown in Figure 5) of Micro and nano manipulation platform is resolved into translational motion of the displacement platform 4 along X-axis (as schemed
Shown in 6), the translational motion (as shown in Figure 7) along Y-axis and the rotary motion (as shown in Figure 8) around Platform center point, if displacement is flat
Platform 4 is a along the translation distance of X-axis1, the translation distance along Y-axis is a2And around Platform center point rotation angle be θ；
S2: the first optical path difference Y of Y-axis is measured by first laser interferometer 111；Y-axis is measured by second laser interferometer 2
Second optical path difference Y22；The optical path difference X of X-axis is measured by third laser interferometer 311；
S3: it is calculated by the following formula and obtains first laser interferometer 1 because displacement platform 4 connects along first axle translational motion
The optical path difference Y received1, the optical path difference Y that is received by displacement platform around Platform center point rotary motion of first laser interferometer 12With
Along the translation distance a of Y-axis2(as shown in Figure 8)；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4: being located in the rotary motion of Platform center point, as shown in figure 8, displacement platform 4 rotates preceding first right angle eyeglass
The distance between the first reflection point E of the first right angle optic portion is m after partial the first reflection point B and displacement platform 4 rotates,
First right angle optic portion after the second reflection point C that displacement platform 4 rotates preceding first right angle optic portion is rotated with displacement platform 4
The distance between the second reflection point F be n, then enable α=m/n, and known L0Preceding first right angle eyeglass is not moved for displacement platform 4
The distance between partial incident ray AB and emergent ray CD (as shown in Figure 7), then be calculate by the following formula and obtain displacement platform 4
Rotation angle, θ:
In Fig. 7, L0When not moved for displacement platform 4, the incident ray AB and emergent ray of the first right angle optic portion
The distance between CD；L1It is displacement platform 4 after X-axis translational motion, the incident ray AE of the first right angle optic portion and outgoing
The distance between light FG；a1For the distance that displacement platform 4 is translated along X-axis, L1-L0=DG=2 × a1, therefore pass through measurement outgoing
The mobile distance of light can obtain Micro and nano manipulation platform along the displacement of X-axis.
When displacement platform 4 is moved along Y-axis, the variation of the optical path difference of X-direction is 0, i.e., when moving along Y-axis, first laser
Interferometer 1 and second laser interferometer 2 export unchanged.
When displacement platform 4a is moved along Y-axis, first laser interferometer 1 is because displacement platform 4a is along Y-axis translational motion reception
The optical path difference Y arrived1, the optical path difference Y that is received by displacement platform around Platform center point rotary motion of first laser interferometer 12The edge and
The translation distance a of Y-axis2(as shown in Figure 8), then Y1、Y2And a2Meet following equation；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
Displacement platform 4b is before and after the rotary motion of Platform center point, when the direction of incident ray AB and constant position,
The direction and position of emergent ray CD does not also change.
In fig. 8, K point makees horizontal linear KN excessively, and the horizontal line for crossing extended line and K point excessively that F makees GF meets at point N.
(1) angle of the rotation of displacement platform 4 is set as θ, and when rotation angle θ is 0 °, incident ray AB, emergent ray is
CD, the incidence angle of incident ray are 45 °, and the angle of emergence of emergent ray CD is also 45 °, therefore EB//CG.
(2) when rotation angle θ is not 0 °, incident ray AE, emergent ray FG, the incidence angle of incident ray is 45 °+
θ, at this time ∠ KEF=45 °-θ, in right angle Δ EKF, ∠ KEF=45 °-θ, ∠ EKF=90 ° can obtain ∠ EFK=45 °+θ.
In Fig. 8, ∠ FKN=45 °-θ, ∠ GHM=∠ EFK=45 °+θ, ∠ KFN=∠ GFM=45 °+θ.So ∠ KNF
=180 ° of-∠ FKN- ∠ KFN=90 °.The extended line FN//EB of GF is parallel, so GF//EB.
The distance of AB to CD is BC=L1.The distance of FG to EB is EG, ∠ GEF=90 °-∠ BEK- ∠ KEF=2 θ, and EG
It is vertical with GF, so EG=EF × cos2 θ, wherein
EF=EK/cos (45 ° of-θ),
BK=BC × cos45 °,
EG=L can be obtained1。
So CD is parallel with FG and the distance of CD to AB and being equidistant for FG to AB, therefore straight line CD and straight line FG is overlapped.
Displacement platform 4 make rotating motion after optical path difference are as follows: Y2=EF+FC-EB-BC.By geometric knowledge it is found that △ EOB
≈ △ COF (two triangles i.e. in figure with shade are similar), if the likelihood ratio is
∠ GEF=2 × θ；
Following equation can get by conditions above:
In Δ FJK,∠ BEK=45 °-θ, ∠ EKB=θ, is known by sine:
Equation (1) and (2) joint solve the rotation angle, θ that can get Micro and nano manipulation platform.
Preferably, which further comprises the steps of:
S5: it is calculate by the following formula the translational motion distance a for obtaining displacement platform along second axis1:
X11=X1+X2,
X1=2a1,
In formula, X1The optical path difference received by displacement platform along second axis translational motion for third laser interferometer 3；X2
For the optical path difference that third laser interferometer 3 is received by displacement platform around Platform center point rotary motion, X2=Y2。
The above is merely preferred embodiments of the present invention, be not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (2)
1. the precision measurement system of a kind of Micro and nano manipulation platform displacement and rotation angle, the measuring system include platform base and
Displacement platform on the platform base characterized by comprising
First laser interferometer and second laser interferometer on first axle, in the launch hole of first laser interferometer
Mandrel line is conllinear with the central axis of the launch hole of second laser interferometer；And positioned at the second axis vertical with first axle
On third laser interferometer, the third laser interferometer and first laser interferometer, second laser interferometer are located at same water
In plane, and the central axis of the launch hole of the central axis of the launch hole of third laser interferometer and first laser interferometer hangs down
Directly；
And be located on displacement platform and be configured to criss-cross optical module, which includes and first laser interferometer pair
The the first right angle optic portion answered, the first right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and first
The incident ray and the incident ray of laser interferometer transmitting are straight through the first right angle mirror surface of the first right angle optic portion and second
Emergent ray after the mirror-reflection of angle is parallel, and optical module further includes the second right angle corresponding with second laser interferometer eyeglass portion
Point, the second right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and second laser interferometer transmitting enter
Penetrate light and outgoing of the incident ray after the first right angle mirror surface of the second right angle optic portion and the second right angle mirror-reflection
Light ray parallel；Optical module further includes third corresponding with third laser interferometer right angle optic portion, the third right angle eyeglass
Part includes the first right angle mirror surface and the second right angle mirror surface, and the incident ray and the incident ray of the transmitting of third laser interferometer
Emergent ray after the first right angle mirror surface of third right angle optic portion and the second right angle mirror-reflection is parallel；
The application method of the measuring system includes:
S1: by the Kinematic Decomposition of displacement platform at along the translational motion of first axle, the translational motion of second axis and around flat
The rotary motion of platform central point, if displacement platform is a along the translation distance of second axis1, the translation distance along first axle is
a2, and around Platform center point rotation angle be θ；
S2: the first optical path difference Y on first axle is measured by first laser interferometer11；First is measured by second laser interferometer
The second optical path difference Y on axis22；The optical path difference X in second axis is measured by third laser interferometer11；
S3: it is calculated by the following formula and obtains what first laser interferometer was received by displacement platform along first axle translational motion
Optical path difference Y1, the optical path difference Y that is received by displacement platform around Platform center point rotary motion of first laser interferometer2With along first
The translation distance a of axis2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4: being located in the rotary motion of Platform center point, and displacement platform rotates the first right angle of preceding first right angle optic portion
After first reflection point of mirror surface and displacement platform rotation the first reflection point of the first right angle mirror surface of the first right angle optic portion it
Between distance be m, displacement platform rotate preceding first right angle optic portion the second right angle mirror surface the second reflection point and displacement put down
The distance between the second reflection point of the second right angle mirror surface of the first right angle optic portion is n after platform rotation, then enables α=m/n, and
Known L0The distance between incident ray and the emergent ray for not moving preceding first right angle optic portion for displacement platform, then pass through
The rotation angle, θ of displacement platform is calculated in following formula:
S5: it is calculate by the following formula the translation distance a for obtaining displacement platform in second axis1:
X11=X1+X2,
X1=2a1,
In formula, X1The optical path difference received by displacement platform along first axle translational motion for third laser interferometer；X2For third
The optical path difference that laser interferometer is received by displacement platform around Platform center point rotary motion, X2=Y2。
2. measuring system as described in claim 1, which is characterized in that optical module includes the optics being arranged on displacement platform
Unitized substructure is provided on optical module pedestal and is configured to criss-cross four card slots, is provided with glass in each card slot
Glass piece, wherein two sheet glass close to first laser interferometer form the first right angle optic portion, interfere close to second laser
Two sheet glass of instrument form the second right angle optic portion, and two sheet glass close to third laser interferometer form third right angle
Optic portion, and the two sides of two sheet glass close to third laser interferometer is coated with reflective membrane, it is dry far from third laser
The sheet glass of interferometer and close first laser interferometer is coated with reflective membrane towards the one side of first laser interferometer, far from third
The sheet glass of laser interferometer and close second laser interferometer is coated with reflective membrane towards the one side of second laser interferometer.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
| CN102042804A (en) * | 2009-10-13 | 2011-05-04 | 上海微电子装备有限公司 | Measuring device and method of laser interferometer |
| CN102445854A (en) * | 2010-10-15 | 2012-05-09 | 上海微电子装备有限公司 | Workpiece stage vertical position measuring system |
| CN103116250A (en) * | 2013-02-06 | 2013-05-22 | 清华大学 | Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform |
| CN105180842A (en) * | 2015-05-26 | 2015-12-23 | 张白 | Novel optical arm amplified high-precision angle sensor and measurement method |
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| KR100479412B1 (en) * | 2002-11-13 | 2005-03-31 | 한국기계연구원 | Straightness measurement device |
| FR2934366B1 (en) * | 2008-07-24 | 2010-11-12 | Commissariat Energie Atomique | OPTICAL DEVICE AND METHOD FOR ROTATING MEASUREMENT OF AN OBJECT |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
| CN102042804A (en) * | 2009-10-13 | 2011-05-04 | 上海微电子装备有限公司 | Measuring device and method of laser interferometer |
| CN102445854A (en) * | 2010-10-15 | 2012-05-09 | 上海微电子装备有限公司 | Workpiece stage vertical position measuring system |
| CN103116250A (en) * | 2013-02-06 | 2013-05-22 | 清华大学 | Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform |
| CN105180842A (en) * | 2015-05-26 | 2015-12-23 | 张白 | Novel optical arm amplified high-precision angle sensor and measurement method |
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