CN106931884B - The measuring system and its measurement method of Micro and nano manipulation platform Three Degree Of Freedom - Google Patents
The measuring system and its measurement method of Micro and nano manipulation platform Three Degree Of Freedom Download PDFInfo
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- CN106931884B CN106931884B CN201710243558.6A CN201710243558A CN106931884B CN 106931884 B CN106931884 B CN 106931884B CN 201710243558 A CN201710243558 A CN 201710243558A CN 106931884 B CN106931884 B CN 106931884B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
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- Length Measuring Devices By Optical Means (AREA)
Abstract
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, disclose a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom, Micro and nano manipulation platform includes platform base and displacement platform, the measuring system includes: first laser interferometer and second laser interferometer on first axle, and be located on displacement platform and be configured to criss-cross optical module, which includes the first right angle optic portion and the second right angle optic portion；It further include the spectroscope in the optical path of imaging sensor and the emergent ray being arranged in after the reflection of the first right angle optic portion, the light splitting optical path reflected through spectroscope is vertical with the photosurface of described image sensor.The present invention also provides a kind of measurement methods of Micro and nano manipulation platform Three Degree Of Freedom.Measuring system and its measurement method provided by the invention can be realized the measurement of space three-freedom and measurement accuracy is high.
Description
Technical field
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, more particularly to a kind of Micro and nano manipulation platform three
The measuring system and its measurement method of freedom degree.
Background technique
With the development and application of Micro and nano manipulation technology, multiple degrees of freedom especially realizes that the Micro and nano manipulation of rotary freedom is flat
Platform is increasingly paid close attention to, and angular displacement and the accurate measurement of displacement of the lines are an important factor for influencing its development.
Laser interferometer because high resolution, it is non-contact, affected by environment it is small, be quick on the draw the advantages that be widely used in it is various
In precision measurement system.Laser interferometer be displacement measurement is carried out according to the interference between reference beam and measuring beam, if
When twice light beam optical path difference does not change, detector can find stable letter between mutually long property and the two poles of the earth of destructive interference
Number；If optical path difference changes, detector can be in change in optical path length each time, between mutually long property and the two poles of the earth of destructive interference
Variable signal is found, these variations can be calculated and be used to measure the change of divergence between two light paths.Presently, there are laser
Interferometer can only often survey individual translational motion or individual angular displacement.When there is optical path difference variation, laser interferometer can not
Judge that this variation is to be generated by translational motion or generated by the rotation of Micro and nano manipulation platform, therefore lead to Micro and nano manipulation platform
Translational motion and angular displacement can not be carried out when doing the i.e. existing translational motion of the non-rotary motion to center has rotary motion again
It decouples and measures simultaneously.
Summary of the invention
(1) technical problems to be solved
It is an object of the present invention to provide a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom, the measuring system energy
It is enough when Micro and nano manipulation platform, which does the i.e. existing translational motion of the non-rotary motion to center, has rotary motion again to translational motion with
Angular displacement is decoupled and is measured simultaneously, and measurement accuracy is high, structure is simple.
It is a further object to provide a kind of measurement methods of Micro and nano manipulation platform Three Degree Of Freedom.
(2) technical solution
In order to solve the above-mentioned technical problems, the present invention provides a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom,
The Micro and nano manipulation platform includes platform base and the displacement platform on the platform base characterized by comprising
First laser interferometer and second laser interferometer on first axle, the launch hole of first laser interferometer
Central axis it is conllinear with the central axis of the launch hole of second laser interferometer；And
It is located on displacement platform and is configured to criss-cross optical module, which includes and first laser interferometer pair
The the first right angle optic portion answered, the first right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and first
The incident ray and the incident ray of laser interferometer transmitting are straight through the first right angle mirror surface of the first right angle optic portion and second
Emergent ray after the mirror-reflection of angle is parallel, and optical module further includes the second right angle corresponding with second laser interferometer eyeglass portion
Point, the second right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and second laser interferometer transmitting enter
Penetrate light and outgoing of the incident ray after the first right angle mirror surface of the second right angle optic portion and the second right angle mirror-reflection
Light ray parallel；And
It further include in the optical path of imaging sensor and the emergent ray being arranged in after the reflection of the first right angle optic portion
Spectroscope, through spectroscope reflect light splitting optical path it is vertical with the photosurface of described image sensor.
Wherein, optical module includes the optical module pedestal being arranged on displacement platform, is arranged on optical module pedestal
Criss-cross four card slots are configured to, are provided with sheet glass in each card slot, wherein close to first laser interferometer
Two sheet glass form the first right angle optic portion, and two sheet glass close to second laser interferometer form the second right angle eyeglass
Part, wherein two sheet glass close to first laser interferometer are reflective towards being coated on one side for first laser interferometer
Film, two sheet glass close to second laser interferometer are coated with reflective membrane towards second laser interferometer on one side.
The present invention also provides a kind of measurement methods of Micro and nano manipulation platform Three Degree Of Freedom comprising:
S1: by the Kinematic Decomposition of displacement platform at the translational motion along first axle, edge vertical with first axle second
The translational motion of axis and rotary motion around Platform center point, if displacement platform is a along the translation distance of second axis1, edge
The translation distance of first axle is a2, and around Platform center point rotation angle be θ；
S2: the moving distance X of the emergent ray of the first right angle optic portion is measured by imaging sensor1, obtain along second
The translational motion distance a of axis1=X1/2；
S2: the first direction optical path difference Y on first axle is measured by first laser interferometer11；By second laser interferometer
Measure the second direction optical path difference Y on first axle22；It is calculated by the following formula and obtains first laser interferometer because of displacement platform
The optical path difference Y received along first axle translational motion1, first laser interferometer because displacement platform around Platform center point rotate transport
The dynamic optical path difference Y received2With the translation distance a along first axle2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4: described in being located in the rotary motion of Platform center point, displacement platform rotates preceding first right angle optic portion
The first of first right angle mirror surface of the first right angle optic portion after the first reflection point and the displacement platform rotation of first right angle mirror surface
The distance between reflection point is m, and displacement platform rotates the second reflection point of the second right angle mirror surface of preceding first right angle optic portion
The distance between the second reflection point of the second right angle mirror surface with the first right angle optic portion after displacement platform rotation is n, then enables α
=m/n, and known L0Do not moved for displacement platform between the incident ray and emergent ray of preceding first right angle optic portion away from
From being then calculate by the following formula the rotation angle, θ for obtaining displacement platform:
(3) beneficial effect
The measuring system of Micro and nano manipulation platform Three Degree Of Freedom provided by the invention realizes displacement platform by imaging sensor
Second axis direction displacement measurement, and realize by two laser interferometer on first axle the position in first axle direction
Shift measurement, and the rotation angle of Micro and nano manipulation platform is calculated indirectly, to realize the displacement and angle of space three-freedom
Measurement overcomes the limitation of existing detection device well, it is real-time with angular displacement to meet the displacement of space multivariant linear
Measurement feedback.In addition, the simple in measurement system structure, measurement accuracy are high.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of the measuring system of Micro and nano manipulation platform Three Degree Of Freedom according to the present invention；
Fig. 2 is the top view of one of Fig. 1 measuring system of Micro and nano manipulation platform Three Degree Of Freedom；
Fig. 3 is the structural schematic diagram of a preferred embodiment of the optical module of the measuring system in Fig. 1；
Fig. 4 is the schematic diagram of the displacement platform movement front and back in Fig. 1；
Fig. 5 is the Kinematic Decomposition schematic diagram of the displacement platform in Fig. 4, wherein (a) shows for the structure before displacement platform movement
It is intended to；(b) schematic diagram translated for the displacement platform after decomposition along X-axis；(c) it is translated for the displacement platform after decomposition along Y-axis
Schematic diagram；And the schematic diagram (d) rotated for the displacement platform after decomposition around displacement platform central point；
Fig. 6 is the schematic diagram that displacement platform translates front and back incident ray and emergent ray along X-axis in Fig. 5 (b)；
Fig. 7 is the schematic diagram that displacement platform translates front and back incident ray and emergent ray along Y-axis in Fig. 5 (c)；
Fig. 8 is the signal of incident ray and emergent ray of the displacement platform before and after the rotation of Platform center point in Fig. 5 (d)
Figure.
In figure, 1: first laser interferometer；2: second laser interferometer；3: imaging sensor；4: displacement platform；5: platform
Pedestal；6: optical module；601: optical module pedestal；602: sheet glass；603: fixed bracket；604: movable support；605: spiral shell
Bolt.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiments of the present invention will be described in further detail.Following instance
For illustrating the present invention, but it is not intended to limit the scope of the invention.
In the description of the present invention, it is to be understood that, term " center ", " longitudinal direction ", " transverse direction ", " length ", " width ",
" thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom" "inner", "outside", " up time
The orientation or positional relationship of the instructions such as needle ", " counterclockwise ", " axial direction ", " radial direction ", " circumferential direction ", " X-axis " " Y-axis " is based on attached drawing
Shown in orientation or positional relationship, be merely for convenience of description of the present invention and simplification of the description, rather than indication or suggestion is signified
Device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to of the invention
Limitation.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include at least one this feature.In the description of the present invention, the meaning of " plurality " is at least two, such as two, three
It is a etc., unless otherwise specifically defined.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " fixation " etc.
Term shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be mechanical connect
It connects, is also possible to be electrically connected or can communicate each other；It can be directly connected, can also indirectly connected through an intermediary, it can be with
It is the interaction relationship of the connection or two elements inside two elements, unless otherwise restricted clearly.For this field
For those of ordinary skill, the specific meanings of the above terms in the present invention can be understood according to specific conditions.
Figures 1 and 2 show that one of the measuring system of a kind of Micro and nano manipulation platform Three Degree Of Freedom according to the present invention is excellent
Select embodiment.As shown in Figure 1, Micro and nano manipulation platform includes platform base 5 and the displacement platform 4 on platform base 5, it is somebody's turn to do
Measuring system includes: first laser interferometer 1 and second laser interferometer 2 in first axle (Y-axis), and first laser is dry
The central axis of the launch hole of interferometer 1 is conllinear with the central axis of the launch hole of second laser interferometer 2；And it is located at displacement and puts down
Criss-cross optical module 6 is configured on platform 4, which includes first prism square corresponding with first laser interferometer 1
Piece part, which includes the first right angle mirror surface and the second right angle mirror surface, and first laser interferometer 1 emits
Incident ray and the incident ray after the first right angle mirror surface of the first right angle optic portion and the second right angle mirror-reflection
Emergent ray is parallel, and in this embodiment, the incident ray that first laser interferometer 1 emits is incident on the first right angle optic portion
The first right angle mirror surface initial incidence angle be 45 °.Optical module further includes second right angle corresponding with second laser interferometer 2
Optic portion, which includes the first right angle mirror surface and the second right angle mirror surface, and second laser interferometer is sent out
The incident ray and the incident ray penetrated are after the first right angle mirror surface of the second right angle optic portion and the second right angle mirror-reflection
Emergent ray it is parallel.In this embodiment, the incident ray that second laser interferometer 2 emits is incident on the second right angle eyeglass portion
The initial incidence angle of the first right angle mirror surface divided is 45 °.
In addition, the measuring system further includes imaging sensor 3 and is arranged in after the reflection of the first right angle optic portion
Spectroscope 7 in the optical path of emergent ray, the light splitting optical path reflected through spectroscope 7 are vertical with the photosurface of imaging sensor 3.
The measuring system of micro-nano report control platform Three Degree Of Freedom provided by the invention passes through imaging sensor 3 and spectroscope 7
It can be realized the displacement measurement on the second axis vertical with Y-axis (X-axis) direction, pass through two laser interferometer energy in Y-axis
It enough realizes the displacement measurement of Y-direction, and rotation angle (the circular general of Micro and nano manipulation platform can be calculated indirectly
It is described below), to realize the displacement and angle measurement of space three-freedom, the office of existing detection device is overcome well
It is sex-limited, meet the displacement of space multivariant linear and the real-time measurement of angular displacement is fed back.In addition, the simple in measurement system structure,
Measurement accuracy is high.
Specifically, as shown in figure 3, the optical module 6 includes the optical module pedestal 601 being arranged on displacement platform 1,
It is provided on optical module pedestal 601 and is configured to criss-cross four card slots, sheet glass 602 is provided in each card slot,
Wherein, close to two sheet glass 602 (the first sheet glass and the second sheet glass) face of first laser interferometer 1 in optical module 6
It is coated with reflective membrane on one side to first laser interferometer 1, close to two 602 (thirds of sheet glass of second laser interferometer 2
Sheet glass and the 4th sheet glass) towards second laser interferometer 2 it is coated with reflective membrane on one side.
Preferably, optical module further include two fixed brackets 603 on the optical module pedestal 601 and two can
In the mobile movable support 604 of X-direction, one of fixed bracket 603 is sticked on respectively close to first laser interferometer 1
On two sheet glass (the first sheet glass and the second sheet glass), another is fixed bracket 603 and sticks on respectively swashs close to second
On two sheet glass (third sheet glass and the 4th sheet glass) of optical interferometer 2, one of movable support 604 is connected to respectively
On second sheet glass and third sheet glass, another movable support 604 is connected to the first sheet glass and the 4th sheet glass respectively
On, the cross section of fixed bracket 603 and movable support 604 is all in isosceles rectangular shaped.It is provided in the outer end of movable support 604
Bolt 605 is provided with the threaded hole cooperated with bolt 605 on optical module pedestal 601, when twisting bolt head, shank of bolt
Portion is connected on movable support 604, so that movable support 604 slides in X direction, so that corresponding sheet glass is fixed on accordingly
Movable support 603 and fixed bracket 604 between.
In this embodiment, first laser interferometer 1, second laser interferometer 2 support with platform base 5 connect respectively.
The invention also discloses a kind of measurement methods of Micro and nano manipulation platform Three Degree Of Freedom comprising following steps:
S1: the movement (as shown in Figure 4) of Micro and nano manipulation platform is resolved into translational motion of the displacement platform 4 along X-axis (as schemed
Shown in 5 (b)), the translational motion (as shown in Fig. 5 (c)) along Y-axis and the rotary motion around Platform center point are (such as Fig. 5 (d) institute
Show), if displacement platform 4 is a along the translation distance of X-axis1, the translation distance along Y-axis is a2And the rotation angle around Platform center point
Degree is θ；
S2: the moving distance X of the emergent ray of the first right angle optic portion is measured by imaging sensor1, obtain the flat of X-axis
Shifting movement distance a1=X1/2；
Specifically, as shown in fig. 6, L0When not moved for displacement platform 4, the incident ray AB of the first right angle optic portion with
The distance between emergent ray CD；L1It is displacement platform 4 after X-axis translational motion, the incident ray of the first right angle optic portion
The distance between AE and emergent ray FG X1；a1For the distance that displacement platform 4 is translated along X-axis, L1-L0=DG=2 × a1, therefore pass through
The mobile distance of measurement emergent ray can obtain displacement a of the Micro and nano manipulation platform along X-axis1=X1/2。
When displacement platform 4 is moved along X-axis, the variation of the optical path difference of Y-direction is 0, i.e., when moving along X-axis, first laser
Interferometer 1 and second laser interferometer 2 export unchanged.
S3: the first optical path difference Y of Y-axis is measured by first laser interferometer 111；Y-axis is measured by second laser interferometer 2
Second optical path difference Y22, it is calculated by the following formula and obtains first laser interferometer 1 because displacement platform 4 is along Y-axis translational motion reception
The optical path difference Y arrived1, the optical path difference Y that is received by displacement platform around Platform center point rotary motion of first laser interferometer 12The edge and
The translation distance a of Y-axis2(as shown in Figure 7)；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4: described in being located in the rotary motion of Platform center point, as shown in figure 8, displacement platform 4 rotates preceding first right angle
The distance between the first reflection point E of first right angle optic portion after the first reflection point B and displacement platform 4 of optic portion rotate
For m, the first right angle eyeglass after the second reflection point C that displacement platform 4 rotates preceding first right angle optic portion is rotated with displacement platform 4
The distance between second partial reflection point F is n, then enables α=m/n, and known L0Preceding first right angle is not moved for displacement platform 4
The distance between the incident ray AB and emergent ray CD of optic portion (as shown in Figure 7), then be calculate by the following formula and obtain displacement
The rotation angle, θ of platform 4:
When displacement platform 4a is moved along Y-axis, first laser interferometer 1 is because displacement platform 4a is along Y-axis translational motion reception
The optical path difference Y arrived1, the optical path difference Y that is received by displacement platform around Platform center point rotary motion of first laser interferometer 12The edge and
The translation distance a of Y-axis2(as shown in Figure 8), then Y1、Y2And a2Meet following equation；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
Displacement platform 4b is before and after the rotary motion of Platform center point, when the direction of incident ray AB and constant position,
The direction and position of emergent ray CD does not also change.
In fig. 8, K point makees horizontal linear KN excessively, and the horizontal line for crossing extended line and K point excessively that F makees GF meets at point N.
(1) angle of the rotation of displacement platform 4 is set as θ, and when rotation angle θ is 0 °, incident ray AB, emergent ray is
CD, the incidence angle of incident ray are 45 °, and the angle of emergence of emergent ray CD is also 45 °, therefore EB//CG.
(2) when rotation angle θ is not 0 °, incident ray AE, emergent ray FG, the incidence angle of incident ray is 45 °+
θ, at this time ∠ KEF=45 °-θ, in right angle Δ EKF, ∠ KEF=45 °-θ, ∠ EKF=90 ° can obtain ∠ EFK=45 °+θ.
In Fig. 8, ∠ FKN=45 °-θ, ∠ GHM=∠ EFK=45 °+θ, ∠ KFN=∠ GFM=45 °+θ.So ∠ KNF
=180 ° of-∠ FKN- ∠ KFN=90 °.The extended line FN//EB of GF is parallel, so GF//EB.
The distance of AB to CD is BC=L1.The distance of FG to EB is EG, ∠ GEF=90 °-∠ BEK- ∠ KEF=2 θ, and EG
It is vertical with GF, so EG=EF × cos2 θ, wherein
EF=EK/cos (45 ° of-θ),
BK=BC × cos45 °,
EG=L can be obtained1。
So CD is parallel with FG and the distance of CD to AB and being equidistant for FG to AB, therefore straight line CD and straight line FG is overlapped.
Displacement platform 4 make rotating motion after optical path difference are as follows: Y2=EF+FC-EB-BC.By geometric knowledge it is found that △ EOB
≈ △ COF (two triangles i.e. in figure with shade are similar), if the likelihood ratio is
∠ GEF=2 × θ；
Following equation can get by conditions above:
In Δ FJK,∠ BEK=45 °-θ, ∠ EKB=θ, is known by sine:
Equation (1) and (2) joint solve the rotation angle, θ that can get Micro and nano manipulation platform.
The above is merely preferred embodiments of the present invention, be not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (2)
1. a kind of measuring system of Micro and nano manipulation platform Three Degree Of Freedom, the measuring system includes platform base and is located at described
Displacement platform on platform base characterized by comprising
First laser interferometer and second laser interferometer on first axle, in the launch hole of first laser interferometer
Mandrel line is conllinear with the central axis of the launch hole of second laser interferometer；
And be located on displacement platform and be configured to criss-cross optical module, which includes and first laser interferometer pair
The the first right angle optic portion answered, the first right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and first
The incident ray and the incident ray of laser interferometer transmitting are straight through the first right angle mirror surface of the first right angle optic portion and second
Emergent ray after the mirror-reflection of angle is parallel, and optical module further includes the second right angle corresponding with second laser interferometer eyeglass portion
Point, the second right angle optic portion include the first right angle mirror surface and the second right angle mirror surface, and second laser interferometer transmitting enter
Penetrate light and outgoing of the incident ray after the first right angle mirror surface of the second right angle optic portion and the second right angle mirror-reflection
Light ray parallel；
It further include point in the optical path of imaging sensor and the emergent ray being arranged in after the reflection of the first right angle optic portion
Light microscopic, the light splitting optical path reflected through spectroscope are vertical with the photosurface of described image sensor；
The application method of the measuring system includes:
S1: by the Kinematic Decomposition of displacement platform at the translational motion along first axle, the edge second axis vertical with first axle
Translational motion and rotary motion around Platform center point, if displacement platform is a along the translation distance of second axis1, along first
The translation distance of axis is a2And around Platform center point rotation angle be θ；
S2: the moving distance X of the emergent ray of the first right angle optic portion is measured by imaging sensor1, obtain along second axis
Translational motion distance a1=X1/2；
S2: the first direction optical path difference Y on first axle is measured by first laser interferometer11；It is measured by second laser interferometer
Second direction optical path difference Y on first axle22；It is calculated by the following formula and obtains first laser interferometer because displacement platform is along
The optical path difference Y that one axis translational motion receives1, first laser interferometer connects around Platform center point rotary motion because of displacement platform
The optical path difference Y received2With the translation distance a along first axle2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4: described in being located in the rotary motion of Platform center point, displacement platform rotates the first of preceding first right angle optic portion
First reflection of the first right angle mirror surface of the first right angle optic portion after the first reflection point and the displacement platform rotation of right angle mirror surface
The distance between point is m, and displacement platform rotates the second reflection point and the position of the second right angle mirror surface of preceding first right angle optic portion
The distance between the second reflection point of the second right angle mirror surface for moving the first right angle optic portion after platform rotates is n, then enables α=m/
N, and known L0The distance between incident ray and the emergent ray of preceding first right angle optic portion are not moved for displacement platform, then
It is calculate by the following formula the rotation angle, θ for obtaining displacement platform:
2. measuring system as described in claim 1, which is characterized in that optical module includes the optics being arranged on displacement platform
Unitized substructure is provided on optical module pedestal and is configured to criss-cross four card slots, is provided with glass in each card slot
Glass piece, wherein two sheet glass close to first laser interferometer form the first right angle optic portion, interfere close to second laser
Two sheet glass of instrument form the second right angle optic portion, wherein two sheet glass close to first laser interferometer are towards the
One laser interferometer is coated with reflective membrane on one side, and two sheet glass close to second laser interferometer are dry towards second laser
Interferometer is coated with reflective membrane on one side.
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| KR100479412B1 (en) * | 2002-11-13 | 2005-03-31 | 한국기계연구원 | Straightness measurement device |
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|---|---|---|---|---|
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
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