CN103116250B - Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform - Google Patents
Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform Download PDFInfo
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- CN103116250B CN103116250B CN201310048743.1A CN201310048743A CN103116250B CN 103116250 B CN103116250 B CN 103116250B CN 201310048743 A CN201310048743 A CN 201310048743A CN 103116250 B CN103116250 B CN 103116250B
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Abstract
The invention discloses a masking platform system with laser interferometer measurement and a six-freedom-degree coarse movement platform, and the masking platform system is mainly applied to a mask aligner system. The masking platform system comprises the coarse movement platform, a fine movement platform and a rack, wherein the coarse movement platform comprises a coarse movement platform body, a drive device and a gravitational equilibrium component of the coarse movement platform, is arranged outside the fine movement platform and surrounds the fine movement platform. The masking platform system further comprises a laser interferometer measurement component which is used for measuring position feedback between a fine movement platform body and a measurement rack, consists of a laser source, a light path component, a laser interferometer and the measurement rack and can be used for performing measurement of six freedom degrees on the movement part of the masking platform system in real time. The masking platform system is simple and compact in structure; the movement part of the masking platform system is light, so that load is reduced, and speed, acceleration and control band width increase; and the movement precision of the masking platform system is greatly improved with the cooperation of the laser interferometer measurement system.
Description
Technical field
The present invention relates to mask aligner mask platform system, this system is mainly used in semiconductor lithography machine, belongs to semiconductor manufacturing equipment field.
Background technology
In the production run of integrated circuit (IC) chip, the exposure transfer printing (photoetching) of design configuration on silicon chip surface photoresist of chip is wherein one of most important operation, and this operation equipment used is called litho machine (exposure machine).The resolution of litho machine and exposure efficiency affect characteristic line breadth (resolution) and the throughput rate of integrated circuit (IC) chip greatly.And as the kinematic accuracy of the reticle stage system of litho machine critical system and work efficiency, determine again resolution and the exposure efficiency of litho machine to a great extent.
Advanced scanning projecting photoetching machine ultimate principle is: from light source deep UV (ultraviolet light) through the mask in mask platform, lens combination by a part of pattern imaging on mask on certain Chip of silicon chip.For carrying out the exposure of a chip on silicon chip, mask platform and silicon wafer stage need carry out accelerated motion respectively, and reach the speed of the 4:1 required by scan exposure when moving to exposure reference position simultaneously.After this, silicon wafer stage moves to scanning motion direction with uniform speed, mask platform does scanning motion with the speed being four times in silicon wafer stage sweep velocity to the opposite direction with silicon wafer stage scanning motion, both movement needs reach synchronously split hair, and the whole pattern imagings the most at last on mask are in the certain chip (Chip) of silicon chip.When after a chip end of scan, mask platform and silicon wafer stage carry out retarded motion respectively, and silicon wafer stage carries out step motion simultaneously, is moved to below projection objective by the chip that the next one will expose.After this, mask platform is accelerated to the direction contrary with last scan direction of motion, scan, slow down, and silicon wafer stage then accelerates according to the direction of planning, scanning, slow down, and completes the exposure of a chip in synchronous scanning process.So constantly repeat, mask platform comes and goes the rectilinear motion carrying out accelerating, scanning, slow down, and silicon wafer stage carries out stepping and scanning motion according to the track of planning, completes the exposure of whole silicon chip.
According to the movement needs to mask platform, mask platform mainly provides the function coming and going ultraprecise high-speed straight-line along direction of scanning and move.Its stroke should meet 4 times of chip length and add the distance of acceleration and deceleration; Its sweep velocity should be 4 times of silicon wafer stage sweep velocity, and most high acceleration also accordingly can higher than the most high acceleration of silicon wafer stage.According to the technical indicator of external typical litho machine commodity, the type that the stroke of mask platform has more than 100mm(reaches 200mm), sweep velocity reaches 1000mm/s, and most high acceleration reaches 20m/s
2, i.e. 2g.Improve sweep velocity and the acceleration (silicon wafer stage also synchronously improves) of mask platform, effectively can improve the throughput rate of litho machine.
Most importantly, mask platform must be able to realize and being synchronized with the movement of the superhigh precision of silicon wafer stage scanning motion, and for 45nm litho machine, its synchronization accuracy requires MA(moving average deviation) be less than 2.25nm, MSD(moves standard deviation) be less than 5.4nm.Wherein, the alignment precision of MA major effect exposure, MSD major effect exposure resolution ratio.
In order to meet mask platform Long Distances and high speed, high-precision rigors, traditional reticle stage system adopts the drives structure of thick smart fold layer usually.Reticle stage system is moved platform by coarse motion platform and superposition essence thereon and is formed.Wherein, coarse motion platform adopts the two-sided driving system of the high speed and large stroke of left linear electric motors and right linear electric motors composition to drive, and air-float guide rail supports; The dynamic platform of essence is then driven by the voice coil motor of X-direction and the voice coil motor of Y-direction, mask platform is carried out to the fine setting of real-time high-precision, meets the requirement of its kinematic accuracy.This lamination drives structure is when moving, and the bilateral drive structure of the reciprocating bottom linear electric motors of single-degree-of-freedom, adopts air-float guide rail supporting, complex structure, assembly precision requires high, thus limits the kinematic accuracy of mask platform, hampers the raising of its acceleration.
Summary of the invention
In order to improve the acceleration of mask aligner mask platform, speed and positioning precision, and then the raising of the throughput rate of promotion litho machine, alignment precision and resolution, reduce assembly precision requirement, the invention provides a kind of mask table system with six-degree-of-freedom coarse platform with laser interferometer measurement.
Technical scheme of the present invention is as follows:
With the mask table system with six-degree-of-freedom coarse platform of laser interferometer measurement, this system comprises essence dynamic platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body and drive unit, it is characterized in that: described coarse motion platform stage body is arranged on the outside of the dynamic platform of essence, essence is moved platform and is enclosed in centre; Described drive unit comprises Long Distances driver module and little stroke driver module two parts, Long Distances driver module is made up of the X-direction linear electric motors that two groups are arranged symmetrically in coarse motion platform stage body both sides about X-direction, little stroke driver module drives the two-freedom linear electric motors of Y-direction and Z-direction to form by four groups simultaneously, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body both sides about X-direction between two, and are positioned at below Long Distances driver module;
Described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, two described coarse motion platform gravitational equilibrium arrangement of components are above coarse motion platform stage body, coarse motion platform stage body both sides are arranged symmetrically in along X-direction, each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board and two coarse motion platform gravitational equilibrium permanent magnets, the permanent magnet array of coarse motion platform gravitational equilibrium magnetic conductive board and X-direction linear electric motors links together, coarse motion platform gravitational equilibrium permanent magnet is arranged in coarse motion platform stage body upper surface, side along X-direction is arranged symmetrically with about Y direction, and leave gap with coarse motion platform gravitational equilibrium magnetic conductive board,
This system also includes laser interferometer measurement assembly, described laser interferometer measurement assembly comprises LASER Light Source, optical path component, laser interferometer and measurement bay, move position feedback between platform stage body and measurement bay for measuring essence, described laser interferometer comprises a two-axis laser interferometer and two four axle laser interferometer; Described optical path component comprises laser beam splitter, curved smooth device and catoptron; Described LASER Light Source is fixed on measurement bay, and described laser beam splitter and curved smooth device are fixed on measurement bay; Described catoptron comprises the first plane mirror, the second plane mirror and 45 ° of catoptrons;
The laser sent from a LASER Light Source is through laser beam splitter, orthogonal two bundle laser are divided in the light splitting ratio of laser beam splitter, wherein beam of laser is through the two-axis laser interferometer described in curved smooth device arrival, and another Shu Jiguang directly injects one of them four axle laser interferometer; The laser that another one LASER Light Source sends directly injects another four axles laser interferometer through a curved smooth device; Described two-axis laser interferometer is arranged in mask table system central axis one end along Y direction, and is fixed on measurement bay; Two described four axle laser interferometer are arranged symmetrically in below coarse motion platform stage body along Y direction, and are fixed on measurement bay;
The a branch of measurement light and a branch of reference light that are parallel to each other is divided into from described two-axis laser interferometer light out, measure light and return two-axis laser interferometer after being fixed on the first plane mirror reflection on the dynamic platform of essence, reference light returns two-axis laser interferometer after being fixed on the second plane mirror reflection on measurement bay;
The measurement light that four bundles are parallel to each other is divided into from each four axle laser interferometer light out, this four bundle is measured light and is divided into laterally zygomorphic two rows, two bundles being positioned at a row are above measured light and are moved after the corresponding offside reflection of platform stage body through essence and return four axle laser interferometer, two bundles being positioned at a row below measure light through one be fixed on 45 ° of catoptrons on measurement bay by two-beam bending 90 degree after directive essence move platform stage body bottom surface this four axles laser interferometer of backspace again.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, is characterized in that: it is characterized in that: described each X-direction linear electric motors are made up of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are made up of one group of permanent magnet array and one group of coil array, and two two-freedom linear electric motors of homonymy share one group of permanent magnet array in X direction; Two groups of permanent magnet arrays of X-direction linear electric motors and four groups of permanent magnet arrays of two-freedom linear electric motors are all fixed on the surface level in frame; Two groups of coil arrays of X-direction linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on coarse motion platform stage body respectively.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, is characterized in that: it is characterized in that: described essence is moved platform and comprised essence dynamic platform stage body, Lorentz motors and essence and move platform gravity compensation assembly; Described Lorentz motors comprises three kinds of Lorentz motors, often kind of Lorentz motors is symmetrically distributed in the two sides of the dynamic platform stage body of essence along Y direction, wherein, the driving direction of the first Lorentz motors is along X-direction, be arranged symmetrically with about X-axis, at least two, every side, drives the dynamic platform stage body of essence to move in X direction and around Z axis sense of rotation; The driving direction of the second Lorentz motors along Y direction and by the dynamic platform barycenter of essence, every side at least one, drive the dynamic platform stage body of essence to move along Y-direction; On four angles being positioned at the dynamic platform stage body of essence of the third Lorentz motors, be arranged symmetrically with, two, every side about X-axis, its driving direction, along Z-direction, drives the dynamic platform stage body of essence along Z-direction, moves around X-axis sense of rotation and Y-axis sense of rotation simultaneously.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, is characterized in that: it is square structure that described essence moves platform stage body, and minute surface is all processed in its four lateral surfaces and bottom surface, for making laser interferometer reflects laser.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, it is characterized in that: described essence is moved platform gravity compensation assembly and comprised four essences and move platform gravity compensation unit, the dynamic platform gravity compensation unit of each essence moves platform gravitational equilibrium magnetic conductive board and an essence by an essence and moves platform gravitational equilibrium permanent magnet and form, four described essences are moved platform gravity compensation unit and are distributed in respectively on four angles of the dynamic platform stage body of essence, and wherein four essences are moved platform gravitational equilibrium magnetic conductive board and are separately fixed at coarse motion platform stage body) on; Four essences are moved platform gravitational equilibrium permanent magnet and are separately fixed on the dynamic platform stage body of essence, and to move the position of platform gravitational equilibrium magnetic conductive board corresponding with essence, simultaneously and essence move between platform gravitational equilibrium magnetic conductive board and leave gap.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, is characterized in that: described coarse motion platform stage body is thin-wall case, is made up of thyrite.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, is characterized in that: it is thin-wall case that described essence moves platform stage body, is made up of thyrite.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, is characterized in that: the one-dimensional array that the coil array of two groups of described X-direction linear electric motors and the coil array of four groups of two-freedom linear electric motors are all made up of iron-core-free square coil; The permanent magnet array of described two groups of X-direction linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention, have the following advantages and high-lighting effect: 1. compared with the traditional masks platform adopting air-float guide rail to support, mask platform of the present invention adopts magnetic suspension bearing, simplify system architecture, avoid the vibration & noise that air supporting is introduced, and the condition of high vacuum degree environment that can meet needed for extreme ultraviolet photolithographic, and the attractive force of magnetic levitation system balances mask platform and appendicular most gravity thereof.2. compared with the bilateral driving junction structure of traditional single-degree-of-freedom coarse motion platform, the structure of six-degree-of-freedom coarse platform of the present invention, add the flexibility of mover in system, both the matching requirements of system had been reduced, also improve the response speed of mask platform, acceleration and motion positions precision, thus improve the throughput rate of litho machine, alignment precision and resolution.3. laser interferometer measurement the measuring precision and measuring speed are all higher than traditional measurement means, can adapt to the high response speed of mask platform, high acceleration and high motion positions precision, finally substantially increase the throughput rate of litho machine, alignment precision and resolution.
Scheme attached explanation
Fig. 1 is the mask table system structural representation with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention.
Fig. 2 be band laser interferometer measurement of the present invention there is the mask table system of six-degree-of-freedom coarse platform look up structural representation.
Fig. 3 is two-axis laser interferometer structure schematic diagram of the present invention.
Fig. 4 is four axle laser interferometer structural representations of the present invention.
Fig. 5 is the structural representation of the dynamic platform gravitational equilibrium assembly of coarse motion platform gravitational equilibrium assembly of the present invention and essence.
Fig. 6 is the structural representation after the mask table system X-direction linear electric motors with six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention remove the first permanent magnet array.
Fig. 7 is the structural representation after the coil with the mask table system two-freedom linear electric motors of six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention removes side the 3rd permanent magnet array.
Fig. 8 a and Fig. 8 b is respectively the large coil one-dimensional array of iron-core-free square coil and the schematic three dimensional views of small coil one-dimensional array of the present invention's employing.
Fig. 9 is the schematic diagram with X-direction line motor permanent magnet array magnetizing direction in the mask table system of six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention.
Figure 10 is the schematic diagram with two-freedom line motor permanent magnet array magnetizing direction in the mask table system of six-degree-of-freedom coarse platform of band laser interferometer measurement of the present invention.
In figure: the dynamic platform stage body of 1-essence; 2-coarse motion platform stage body; 3-first X-direction linear electric motors; 4-second X-direction linear electric motors; 5-first two-freedom linear electric motors; 6-second two-freedom linear electric motors; 7-the 3rd two-freedom linear electric motors; 8-the 4th two-freedom linear electric motors; 9-pedestal; 10-measurement bay; 11-coarse motion platform gravitational equilibrium magnetic conductive board; 12-coarse motion platform gravitational equilibrium permanent magnet; The first coil array of 13-; The second largest coil array of 14-; 15-first small coil array; 16-second small coil array; 17-the 3rd small coil array; 18-the 4th small coil array; 21-first permanent magnet array; 22-second permanent magnet array; 23-the 3rd permanent magnet array; The dynamic platform gravitational equilibrium magnetic conductive board of 31-essence; The dynamic platform gravitational equilibrium permanent magnet of 32-essence; 41-two-axis laser interferometer; 42-the one or four axle laser interferometer; 43-the two or four axle laser interferometer; 44-first plane mirror; 45-second plane mirror; 46-45 ° of catoptron; 47-45 ° of mount pad; 48-laser beam splitter; 49-LASER Light Source; The curved smooth device of 50-.
Embodiment
Below in conjunction with accompanying drawing, concrete structure of the present invention, mechanism and the course of work are further described.
The mask table system with six-degree-of-freedom coarse platform of band laser interferometer measurement provided by the invention, as shown in Figure 1, this system comprises coarse motion platform, the dynamic platform of essence and frame, and coarse motion platform contains a coarse motion platform stage body 2, drive unit and two coarse motion platform gravitational equilibrium assemblies; Coarse motion platform stage body 2 is enclosed within the outside of the dynamic platform of essence, is thin-wall case, is sintered make by thyrite; Described drive unit comprises Long Distances driver module and little stroke driver module two parts, as shown in Figure 6 and Figure 7.Long Distances driver module is arranged symmetrically in the first X-direction linear electric motors 3 of coarse motion platform stage body 2 both sides by two groups about X-direction and the second X-direction linear electric motors 4 form, and is responsible for driving mask platform coarse motion platform to do Long Distances linear reciprocating motion in the X direction, little stroke driver module is then the first two-freedom linear electric motors 5 simultaneously driving Y-direction and Z-direction by four groups, second two-freedom linear electric motors 6, 3rd two-freedom linear electric motors 7 and the 4th two-freedom linear electric motors 8 form, these four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body 2 both sides between two about X-direction, and be positioned at below Long Distances driver module, four groups of described two-freedom linear electric motors are responsible for regulating mask platform coarse motion platform in the little travel displacement of Y-axis and Z-direction, and around X-axis, the rotation among a small circle of the anglec of rotation of the three degree of freedom that Y-axis and Z axis rotate, adopt the control algolithm of decomposing based on d-q, X-direction linear electric motors can be made only to provide the thrust of X-direction, and the thrust of Y and Z-direction is close to zero, Y and Z-direction linear electric motors only produce the thrust of Y-direction and Z-direction, and the thrust of X-direction is close to zero,
Two coarse motion platform gravitational equilibrium assemblies are arranged symmetrically in coarse motion platform stage body both sides about X-direction, and each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board 11 and two coarse motion platform gravitational equilibrium permanent magnets 12.Each coarse motion platform gravitational equilibrium magnetic conductive board 11 links together with the stationary part of the X-direction linear electric motors of the same side, two coarse motion platform gravitational equilibrium permanent magnets 12 are arranged on coarse motion platform stage body 2 respectively along on side two angles of X-direction, and retain certain gap with coarse motion platform gravitational equilibrium magnetic conductive board 11;
This system also includes laser interferometer measurement assembly, and described laser interferometer measurement assembly comprises LASER Light Source 49, optical path component, laser interferometer and measurement bay 10, moves position feedback between platform stage body 1 and measurement bay 10 for measuring essence.Laser interferometer of the present invention comprises a two-axis laser interferometer 41 and two four axle laser interferometer, is respectively the one or four axle laser interferometer the 42 and the 24 axle laser interferometer 43.Optical path component comprises laser beam splitter 48, curved smooth device 50 and catoptron.LASER Light Source 49 is fixed on measurement bay 10, and laser beam splitter 48 and curved smooth device 50 are also separately fixed on measurement bay 10; Described catoptron comprises the first plane mirror 44, second plane mirror 45 and 45 ° of catoptrons.The dynamic platform stage body 1 of essence is square structure, and minute surface is all processed in its four lateral surfaces and bottom surface, for making laser interferometer reflects laser;
The laser sent by a LASER Light Source 49, through a laser beam splitter 48, orthogonal two bundles are divided in the ratio of laser beam splitter 48, arrive described two-axis laser interferometer 41 through a curved smooth device 50, injecting the one or four axle laser interferometer 42 by laser beam splitter 48 another beam of laser out, and another LASER Light Source 49 sends laser through a curved smooth device 50 arrives the two or four axle laser interferometer 43; Two-axis laser interferometer 41 is arranged in mask table system central axis one end along Y direction, is fixed on measurement bay 10; Simultaneously, the one or four axle laser interferometer the 42 and the 24 axle laser interferometer 43 is arranged symmetrically in below coarse motion platform stage body 2 along Y direction, is also fixed on relevant position on measurement bay 10;
From two-axis laser interferometer 41 light out, be divided into a branch of measurement light and a branch of reference light that are parallel to each other, as shown in Figure 3, measure light and be reflected back laser interferometer through being fixed on the first plane mirror 44 on the dynamic platform stage body 1 of essence, reference light is reflected back laser interferometer through the second plane mirror 45 be fixed on measurement bay 10; In the present embodiment, what measure photo measure is the relative displacement along Y-direction of the dynamic platform stage body 1 of essence relative to measurement bay 10, reference light is the distance between the second plane mirror 45 and two-axis laser interferometer 41 measured, this value is fixed value, it can thus be appreciated that the dynamic platform stage body 1 of essence is relative to the absolute displacement along Y-direction of measurement bay 10, the measured value of upper and lower two-beam does difference, measures the angle rotated along X-axis; Meanwhile, the measuring error that the vibration that can reduce measurement frame by reference to light brings.
And from each described four axle laser interferometer out light be divided into the measurement light that four bundles are parallel to each other respectively, this four bundle is measured light and has been divided into, two rows of lower symmetry, in the present embodiment, as shown in Figure 4, for the one or four axle laser interferometer 42, two bundles being positioned at a row above measure light, the mirror surface of the corresponding side of platform stage body 1 is moved through essence, be reflected back the one or four axle laser interferometer 42, and two bundles being positioned at a row below measure light, then need the 45 ° of catoptrons 46 be fixed on measurement bay 10 through that two-beam is bent the mirror surface that 90 degree of backward upper directive essences move the bottom surface of platform stage bodies 1, Zai Yanyuan road is reflected back in the one or four axle laser interferometer 42, for the two or four axle laser interferometer 43, principle of work is identical.
According to the installation site of two four axle laser interferometer, all measure along X-direction.So, a row above of these two four axle laser interferometer measures light and moves to essence the measurement that platform carries out along X-direction displacement; And a row measures light to essence and moves the measurement that platform carries out along Z-direction displacement below; The measured value that two rows measure light does difference, measures the angle rotated along Y-axis; The measured value of the two bundle measurement light of a row does difference above, measures the angle rotated along Z axis;
Each X-direction linear electric motors is by first permanent magnet array 21, second permanent magnet array 22 and one group of large coil array composition; Each two-freedom linear electric motors is made up of the 3rd permanent magnet array 23 and one group of small coil array, and two two-freedom linear electric motors of homonymy share one group of the 3rd permanent magnet array 23 in X direction; Described all X-direction linear electric motors first permanent magnet arrays 21 and the 3rd permanent magnet array 23 of the second permanent magnet array 22 and all two-freedom linear electric motors are all fixed on the surface level in litho machine frame; Described all large coil array and small coil array are separately fixed on coarse motion platform stage body 2;
The large coil array of the X-direction linear electric motors of coarse motion of the present invention and the small coil array of two-freedom linear electric motors are all by the one-dimensional array adopting the iron-core-free square coil (as shown in Figure 8) of the concentric coiling of copper cash to form, and the support of coil adopts nonferromagnetic parts (as aluminium alloy) to make;
First permanent magnet array 21 of the X-direction linear electric motors of coarse motion of the present invention and the second permanent magnet array 22 are bonding one group of one dimension halbach type permanent magnet arrays adopting rectangular parallelepiped rare-earth permanent magnet to arrange on the square thin yoke of a block length, the volume of the permanent magnet that the first permanent magnet array 21 is parallel with array direction with magnetizing direction in the second permanent magnet array 22 is less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 6, " N " in figure, " S " represents N pole and the S pole of permanent magnet, and now the magnetizing direction of permanent magnet is perpendicular to paper.3rd permanent magnet array 23 of described two-freedom linear electric motors is also bonding one group of plane halbach type permanent magnet array adopting rectangular parallelepiped rare-earth permanent magnet to arrange on the square thin yoke of a block length, and in the 3rd permanent magnet array 23, the volume of the permanent magnet that magnetizing direction is parallel with array direction is also less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 9).
The dynamic platform of essence is six-freedom micro displacement worktable, comprises essence dynamic platform stage body 1, Lorentz motors and essence and moves platform gravity compensation assembly; Described Lorentz motors comprises three kinds of Lorentz motors, often kind of Lorentz motors is symmetrically distributed in the two sides of the dynamic platform stage body 1 of essence along Y direction, wherein, the driving direction of the first Lorentz motors is along X-direction, be arranged symmetrically with about X-axis, at least two, every side, drives the dynamic platform stage body 1 of essence to move in X direction and around Z axis sense of rotation; The driving direction of the second Lorentz motors along Y direction and by the dynamic platform barycenter of essence, every side at least one, drive the dynamic platform stage body 1 of essence to move along Y-direction; On four angles being positioned at the dynamic platform stage body of essence of the third Lorentz motors, be arranged symmetrically with, two, every side about X-axis, its driving direction, along Z-direction, drives the dynamic platform stage body of essence along Z-direction, moves around X-axis sense of rotation and Y-axis sense of rotation simultaneously;
The dynamic platform gravity compensation assembly of essence comprises four groups of dynamic platform gravity compensation unit of essence, as shown in Figure 5, the dynamic platform gravity compensation unit of each essence moves platform gravitational equilibrium magnetic conductive board 31 and an essence by an essence and moves platform gravitational equilibrium permanent magnet 32 and form, the described dynamic platform gravity compensation cell distribution of four groups of essences is moved on four angles of platform stage body 1 in essence, wherein all essences are moved platform gravitational equilibrium magnetic conductive board 31 and are fixed on coarse motion platform stage body 2, all essences are moved platform gravitational equilibrium permanent magnet 32 and are fixed on the position that the smart each essence moving correspondence on platform stage body 1 moves platform gravitational equilibrium magnetic conductive board 31, and move platform gravitational equilibrium magnetic conductive board with essence there is certain gap, the dynamic platform stage body 1 of essence is thin-wall case, be made up of thyrite,
Mask table system of the present invention, the unloading phase that its working stage being divided into, normal work stage and stop phase, altogether three phases.Unloading phase principle of work as follows: system electrification start before, the attractive force of gravity balance device is less than the gravity of mask stage coarse motion platform and the dynamic platform of essence, and mask stage stops at a little more than on the fixing station in the litho machine frame of the second permanent magnet array 22 upper surface.After system electrification starts, 4 two-freedom linear electric motors provide Z-direction thrust upwards, promote coarse motion platform subpart and move upward to working position, then in the mask stage course of work, regulate coarse motion platform subpart along the position of Z-direction on the one hand, and the attitude of the rotation around X-direction and these two degree of freedom of the rotation around Y-direction, coordinate gravity balance device balance coarse motion platform subpart to be also mask stage and appendicular gravity thereof on the other hand, make coarse motion platform subpart and the dynamic platform of essence be in suspended state all the time.Meanwhile, 4 two-freedom linear electric motors provide the thrust of Y-direction, the attitude of adjustment coarse motion platform subpart and the dynamic translation of platform along Y-axis of essence and two degree of freedom of the rotation around Z axis, make coarse motion platform subpart and the dynamic position required by Delta to work of essence and attitude, and aforementioned five degree of freedom are regulated in real time in the whole course of work, meet the positioning requirements of system to these five degree of freedom.Then, 2 X-direction linear electric motors adopt bilateral type of drive, drive coarse motion platform subpart to be also that coarse motion platform subpart and the dynamic platform of essence carry out acceleration, deceleration and at the uniform velocity to-and-fro movement in X direction, reach the operating rate of system requirements, the work unloading phase of completing.
After this, system enters normal work stage, and drive unit is finely tuned the speed of coarse motion platform subpart and the dynamic platform of essence and attitude in X-direction linear electric motors perform region, meets the speed of system to it and the requirement of position, simultaneously the energy dissipation of bucking-out system.When coarse motion platform subpart and the dynamic platform of essence move to the+latter end of X-direction stroke, X-direction linear electric motors decelerating operation is to stopping, then oppositely accelerate again, coarse motion platform subpart and the dynamic platform of essence is made to move to the latter end of the trip to-X-direction, X-direction linear electric motors decelerating operation, to stopping, circulating and so forth.
At stop phase, above coarse motion platform subpart and the dynamic static station of platform low-speed motion of essence, then all drive units coordinate deceleration to be parked on static station.
Mask table system of the present invention adopts magnetic suspension bearing, does not need air-flotation system, simplifies system architecture, avoids the vibration & noise that air supporting is introduced, and can meet the condition of high vacuum degree environment needed for extreme ultraviolet photolithographic.
On the other hand, compared with traditional thick smart fold Rotating fields, mask table system of the present invention provides a kind of coarse motion platform structure with six-freedom motion function, both ensure that the thrust of scanning motion and improve kinematic accuracy, again reduce the high precision matching requirements of coarse motion platform, under the condition not changing kinematic accuracy, enormously simplify the accuracy requirement of parts design and manufacture, improve the throughput rate of litho machine, alignment precision and resolution.
Claims (8)
1. be with the reticle stage system with six-degree-of-freedom coarse platform of laser interferometer measurement, this system comprises essence dynamic platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body (2) and drive unit, it is characterized in that: described coarse motion platform stage body (2) is arranged on the outside of the dynamic platform of essence, essence is moved platform and is enclosed in centre; Described drive unit comprises Long Distances driver module and little stroke driver module two parts, Long Distances driver module is made up of the X-direction linear electric motors that two groups are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction, little stroke driver module drives the two-freedom linear electric motors of Y-direction and Z-direction to form by four groups simultaneously, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction between two, and are positioned at below Long Distances driver module;
Described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, two described coarse motion platform gravitational equilibrium arrangement of components are in coarse motion platform stage body (2) top, coarse motion platform stage body (2) both sides are arranged symmetrically in along X-direction, each coarse motion platform gravitational equilibrium assembly comprises coarse motion platform gravitational equilibrium magnetic conductive board (11) and two coarse motion platform gravitational equilibriums permanent magnet (12), coarse motion platform gravitational equilibrium magnetic conductive board (11) links together with the permanent magnet array of X-direction linear electric motors, coarse motion platform gravitational equilibrium permanent magnet (12) is arranged in coarse motion platform stage body (2) upper surface, side along X-direction is arranged symmetrically with about Y direction, and leave gap with coarse motion platform gravitational equilibrium magnetic conductive board (11),
Described reticle stage system also includes laser interferometer measurement assembly, described laser interferometer measurement assembly comprises two LASER Light Source (49), optical path component, laser interferometer and measurement bay (10), and described laser interferometer comprises a two-axis laser interferometer (41) and two four axle laser interferometer (9); Described optical path component comprises laser beam splitter (48), curved smooth device (50) and catoptron; Described LASER Light Source (49) is fixed on measurement bay (10), and described laser beam splitter (48) and curved smooth device (50) are fixed on measurement bay (10); Described catoptron comprises the first plane mirror (44), the second plane mirror (45) and 45 ° of catoptrons;
The laser sent from a LASER Light Source (49) is through laser beam splitter (48), orthogonal two bundle laser are divided in the light splitting ratio of laser beam splitter (48), wherein beam of laser is through the two-axis laser interferometer (41) described in curved smooth device (50) arrival, and another Shu Jiguang directly injects one of them four axle laser interferometer; The laser that another one LASER Light Source (49) sends directly injects another four axles laser interferometer through a curved smooth device (50); Described two-axis laser interferometer (41) is arranged in reticle stage system central axis one end along Y direction, and is fixed on measurement bay (10); Two described four axle laser interferometer are arranged symmetrically in coarse motion platform stage body (2) below along Y direction, and are fixed on measurement bay (10);
The a branch of measurement light and a branch of reference light that are parallel to each other is divided into from described two-axis laser interferometer (41) light out, measure light and return two-axis laser interferometer after being fixed on the first plane mirror (44) reflection on the dynamic platform of essence, reference light returns two-axis laser interferometer after being fixed on the reflection of the second plane mirror (45) on measurement bay (10);
The measurement light that four bundles are parallel to each other is divided into from each four axle laser interferometer light out, this four bundle is measured light and is divided into laterally zygomorphic two rows, the two bundle measurement light being positioned at a row above return four axle laser interferometer after the offside reflection that smart dynamic platform stage body (1) is corresponding, are positioned at two bundle measurement light dynamic platform stage body (1) bottom surface of directive essence this four axles laser interferometer of backspace again after two-beam is bent 90 degree by 45 ° of catoptrons (46) that is fixed on measurement bay (10) of a row below.
2. according to the reticle stage system with six-degree-of-freedom coarse platform of band laser interferometer measurement according to claim 1, it is characterized in that: described each X-direction linear electric motors are made up of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are made up of one group of permanent magnet array and one group of coil array, and two two-freedom linear electric motors of homonymy share one group of permanent magnet array in X direction; Four groups of permanent magnet arrays of X-direction linear electric motors and two groups of permanent magnet arrays of two-freedom linear electric motors are all fixed on the surface level in frame; Two groups of coil arrays of X-direction linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on coarse motion platform stage body (2) respectively.
3. according to the reticle stage system with six-degree-of-freedom coarse platform of band laser interferometer measurement according to claim 1, it is characterized in that: described essence is moved platform and comprised essence dynamic platform stage body (1), Lorentz motors and essence and move platform gravity compensation assembly; Described Lorentz motors comprises three kinds of Lorentz motors, often kind of Lorentz motors is symmetrically distributed in the two sides of the dynamic platform stage body (1) of essence along Y direction, wherein, the driving direction of the first Lorentz motors is along X-direction, be arranged symmetrically with about X-axis, at least two, every side, drives the dynamic platform stage body (1) of essence to move in X direction and around Z axis sense of rotation; The driving direction of the second Lorentz motors along Y direction and by the dynamic platform barycenter of essence, every side at least one, drive the dynamic platform stage body (1) of essence to move along Y-direction; On four angles being positioned at the dynamic platform stage body of essence of the third Lorentz motors, be arranged symmetrically with, two, every side about X-axis, its driving direction, along Z-direction, drives the dynamic platform stage body of essence along Z-direction, moves around X-axis sense of rotation and Y-axis sense of rotation simultaneously.
4. according to the reticle stage system with six-degree-of-freedom coarse platform of band laser interferometer measurement according to claim 3, it is characterized in that: it is square structure that described essence moves platform stage body (1), minute surface is all processed in its four lateral surfaces and bottom surface, for making laser interferometer reflects laser.
5. according to the reticle stage system with six-degree-of-freedom coarse platform of band laser interferometer measurement according to claim 3, it is characterized in that: described essence is moved platform gravity compensation assembly and comprised four essences and move platform gravity compensation unit, the dynamic platform gravity compensation unit of each essence moves platform gravitational equilibrium magnetic conductive board (31) and an essence by an essence and moves platform gravitational equilibrium permanent magnet (32) and form, four described essences are moved platform gravity compensation unit and are distributed on four angles of the dynamic platform stage body (1) of essence respectively, wherein four essences are moved platform gravitational equilibrium magnetic conductive board (31) and are separately fixed on coarse motion platform stage body (2), four essences are moved platform gravitational equilibrium permanent magnet (32) and are separately fixed on the dynamic platform stage body (1) of essence, and with essence, to move the position of platform gravitational equilibrium magnetic conductive board (31) corresponding, simultaneously and essence move between platform gravitational equilibrium magnetic conductive board and leave gap.
6. according to the reticle stage system with six-degree-of-freedom coarse platform of band laser interferometer measurement according to claim 1, it is characterized in that: described coarse motion platform stage body (2) is thin-wall case, is made up of thyrite.
7. according to the reticle stage system with six-degree-of-freedom coarse platform of the band laser interferometer measurement described in claim 3 or 4, it is characterized in that: it is thin-wall case that described essence moves platform stage body (1), is made up of thyrite.
8. according to the reticle stage system with six-degree-of-freedom coarse platform of band laser interferometer measurement according to claim 2, it is characterized in that: the one-dimensional array that the coil array of two groups of described X-direction linear electric motors and the coil array of four groups of two-freedom linear electric motors are all made up of iron-core-free square coil; The permanent magnet array of described two groups of X-direction linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
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| CN106483778B (en) | 2015-08-31 | 2018-03-30 | 上海微电子装备（集团）股份有限公司 | Based on relative position measurement to Barebone, double-workpiece-table system and measuring system |
| CN106931884B (en) * | 2017-04-14 | 2019-05-21 | 北京航空航天大学 | The measuring system and its measurement method of Micro and nano manipulation platform Three Degree Of Freedom |
| CN106931890B (en) * | 2017-04-14 | 2019-05-17 | 北京航空航天大学 | The precision measurement system and its measurement method of Micro and nano manipulation platform displacement and rotation angle |
| CN110146011B (en) * | 2019-04-23 | 2021-01-19 | 中国科学院微电子研究所 | Multi-axis interferometer measuring device |
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