CN101710229B - Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system - Google Patents
Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system Download PDFInfo
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- CN101710229B CN101710229B CN2009102290084A CN200910229008A CN101710229B CN 101710229 B CN101710229 B CN 101710229B CN 2009102290084 A CN2009102290084 A CN 2009102290084A CN 200910229008 A CN200910229008 A CN 200910229008A CN 101710229 B CN101710229 B CN 101710229B
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Abstract
The invention relates to a two-translation and one-rotation precision positioning workbench for a nanoimprint lithography system, which comprises a support and a base, wherein the middle of the base is connected with a movable platform through four flexible driving mechanisms; the flexible driving mechanisms comprise rigid moving blocks; left and right side walls of the front part of each rigid moving block are respectively provided with first and second groups of semicircular grooves to form front and back single degree of freedom flexible hinges which are in series connection sequentially; the rigid moving blocks are connected with the movable platform through the front single degree of freedom flexible hinge; the base is provided with a through hole; left and right flexible laminated spring structures are arranged in the base positioned at the left and right side walls of the back part of each rigid moving block in a symmetrically parallel mode; a mounting hole communicated with the through hole is reserved in the base; a piezoelectric ceramics actuator butted against the rigid moving blocks is arranged in the mounting hole; and the bottom wall of the movable platform and the top surface of the support are respectively provided with a plate electrode of each of three capacitive position sensors. The workbench has the advantages of high rigidity, high precision, low inertia, compact structure, no error accumulation and the like.
Description
Technical field
The invention belongs to a kind of micro OS, be specially a kind of three-degree-of-freedom precision-positioning workbench that can be applicable to imprint lithography system.
Background technology
Nano-device comprises nano electron device and nano photoelectric device, can be widely used in electronics, optics, micro-mechanical device, novel computer etc., being the most dynamic research field in current new material and the new unit research field, also is components and parts miniaturization, intellectuality, highly integrated etc. mainstream development direction.Nano-device is owing to have potential great market and national defence and be worth, and makes the method, approach, technology etc. of its design and manufacturing become the focus of numerous scientists, government and large enterprise's research and investment.At present, the design of nano-device and manufacturing are in develop rapidly period, and method is varied, and pattern technology is exactly one of them.
Nano imprint lithography is the pattern technology that people develop in the process of exploring more convenient, inexpensive design and preparation nano-device, is used for nano graph and duplicates and can be used to make 3-D nano, structure.Compare with other photoetching technique, nanometer embossing has resolution height, low, the advantage of high production efficiency of cost of manufacture, has become the gordian technique of 32 nanometer technologies of future generation.Have greatly potential competitive power and wide application prospect.In the nanometer embossing evolution at home and abroad, three big mainstream technologys have been formed gradually: soft stamping technique, hot press printing technology, ultraviolet stamping technology.Hot press printing technology can remedy the deficiency of elasticity mould material easy deformation in the soft imprint process; and working (machining) efficiency is than higher; but in the hot padding process; photoresist is through the change procedure of high temperature, high pressure, cooling; metaboly appears in the coining pattern regular meeting that produces after the demoulding, is difficult for carrying out repeatedly or the impression of three-dimensional structure.Compare with the above two, the ultraviolet stamping technology is lower to environmental requirement, only just can carry out under room temperature and low-pressure, has improved the impression precision.Simultaneously because mould material adopts transparency silica glass, be easy to realize aiming between template and the substrate, this makes the ultraviolet stamping technology be more suitable in multi-impression.In addition, the template life cycle is long and to be suitable for producing in batches also be the major advantage of ultraviolet stamping technology.These characteristics all make the ultraviolet stamping technology have irreplaceable superiority in IC manufacturing field.
Moulding process seems simply, but will obtain higher impression precision, then needs to take all factors into consideration from many aspects.To accomplish to guarantee as far as possible the parallel of template and substrate in the moulding process, make template can contact uniformly with substrate.If template and substrate are not parallel, the mould that stays of wedge will be obtained, even an end of template directly contacts substrate.If wedge stays the thickness of mould to surpass the height of impression feature, when follow-up dry method uniform thickness etching, feature will be etched away so.Lateral spread took place in the relative slippage of template and substrate when simultaneously template and substrate not parallel also will cause pressing down, and influenced to impress precision.In addition, when molding, also can damage the impression feature.Therefore must guarantee the depth of parallelism of template and substrate in the moulding process, i.e. the uniform contact of template and substrate.The imprint lithography system structure generally comprises following critical piece: 1. press mechanism; 2. plummer; 3. precise positioning work table; 4. be used to ultraviolet source that solidifies photoresist etc., wherein precise positioning work table is the key component of imprint lithography system, guarantee template and substrate parallel and can uniform contact by its, make relative slip as much as possible little, bearing accuracy between the two be could guarantee like this, impression precision and impression quality guaranteed.
Passive mode is adopted in the adjustment of end-effector in the existing nano-imprinting apparatus (template and the substrate bearing platform) depth of parallelism mostly, promptly is out of shape the depth of parallelism that guarantees between the two by the flexible link of substrate (or template) plummer.B.J.Choi etc. for example, the design of stepping flash imprint lithography locating platform, Precision Engineering, 25 3 phases of volume of calendar year 2001,192-199 (B.J.Choi, S.V.Sreenivasan, S.Jonhson, M.Colburn, C.G.Wilson, Designof orientation stage for step and flash imprint lithography, Precision Engineering, 2001,25 (3): 192-199.), Jae-Jong Lee etc., be used to prepare the design and analysis of the nano-imprint lithography equipment of 100nm live width feature, Current Applied Physics, 2006 the 6th phases, 1007-1011 (Jae-Jong Lee, Kee-Bong Choi, Gee-Hong Kim, Design and analysis of the single-step nanoimprintinglithography equipment for sub-100nm linewidth, Current Applied Physics 2006,6:1007-1011.), Jae-Jong Lee etc., be used to prepare the ultraviolet stamping photoetching bull nano impression unit of 50nm half slant characteristic, SICEICASE International Joint Conference, 2006,4902-4904 (Jae-Jong Lee, Kee-Bong Choi, Gee-Hong Kim et al, The UV-Nanoimprint Lithography with Multi-headnanoimprinting Unit for Sub-50nm Half-pitch Patterns, SICEICASE InternationalJoint Conference 2006 has just reported the equipment and the correlation technique of this type in 4902-4904.); Also some researcher adopts the mode that passive adaptation, active levelling and manual setting combine, such as: thin autumn of model etc., the development of the high alignment precision nano impression of wide region model machine, Chinese mechanical engineering, 2005,16 volume supplementary issues, 64-67, Yan Le etc., the development of cold blocking photoetching process precise positioning work table, China's mechanical engineering, 2004,15 1 phases of volume, this type of precise positioning work table design of reporting among the 75-78.; Other researchers then ward off new footpath in addition, such as, Dong Xiaowen etc., the design of air bag air-cylinder type ultraviolet nanometer impression system, semiconductor optoelectronic,, 28 5 phases of volume, the technology of introducing among the 676-684. in 2007.In these existing technology, though self-adaptation is adjusted simple in structure, the compact conformation, with low cost of Precision Position Location System, its bearing accuracy, especially the adjustment precision of the depth of parallelism is lower, thereby has limited the raising of machining precision and quality.Though by initiatively levelling and manual setting mechanism, can improve the depth of parallelism of impression block and substrate to a certain extent, can not compensate the template that causes owing to force of impression is inhomogeneous in the moulding process and the parallelism error of substrate.Air bag air-cylinder type impression system has overcome in the moulding process silica gel and has easily upheld distortion, the force of impression skewness, and template is easily broken etc. not enough but the expensive and impression overlong time of design cost of use its vacuum chamber.
Summary of the invention
The objective of the invention is at the deficiencies in the prior art, a kind of initiatively two-translation and one-rotation precision positioning workbench that is used for nano-imprint lithography system of adjustment capability of end-effector position that has is provided.
The technical scheme that the present invention deals with problems is:
The two-translation and one-rotation precision positioning workbench of nano-imprint lithography system, it comprises support and is connected the base of described top of the trellis, in the middle of described base, be connected with a rectangle moving platform by four flexible drive mechanisms, wherein two centre positions that are positioned at two relative sides along moving platform of described four flexible drive mechanisms are provided with, two other flexible drive mechanism is positioned at two other relative side of described moving platform and the setting of staggering mutually, each described flexible drive mechanism comprises that its forward part is inserted in the described moving platform and its rear section is inserted in the interior rigidity movable block of described base, at the front end of the forward part of described rigidity movable block be positioned on the left and right sides sidewall of end of position, four limits of moving platform and have first and second groups of semicircle grooves, coupling part between two semicircle cambered surfaces of every group of described semicircle groove forms the front and back single-freedom and flexible hinge of series connection successively, described rigidity movable block links to each other with described moving platform by preceding single-freedom and flexible hinge, be positioned on the base of rear section tail end sidewall locations of described rigidity movable block and have through hole, the base that is positioned at the wall place, the left and right sides, rear section of described rigidity movable block is provided with left and right sides flexible board spring structure to be symmetrical parallel way, the shape of cross section of each described flexible board spring structure is a comb teeth shape, along continuous straight runs has four mounting holes that connect with each described through hole in described base, level is equipped with four piezoelectric ceramic actuators in described four mounting holes, described piezoelectric ceramic actuator has globe joint, described globe joint withstands on the tail end sidewall of described rigidity movable block rear section, a battery lead plate of three capacitive position transducers is housed on described moving platform diapire, another battery lead plate of described three capacitive position transducers is housed on the end face of described support, and described three capacitive position transducers along the circumferential direction uniformly-spaced evenly distribute.
Compared with prior art, the present invention has following remarkable advantage:
The precise positioning work table of the present invention's design adopts the flexible parallel connection structure, has advantages such as high rigidity, high precision, low inertia, compact conformation, error free accumulation.
The precise positioning work table of the present invention's design adopts single-degree-of-freedom semicircle groove flexible hinge and flexible board spring structure as gear train, has and does not have machinery friction, gapless advantage.
The three-freedom degree precision positioning system of the present invention's design, its compliant mechanism adopt line cutting (WEDM) whole process technology, do not need assembling and adjustment, thereby have effectively improved bearing accuracy.
The active adjustment of relative position between template and substrate in four piezoelectric ceramic actuators promotions of precise positioning work table employing driving links realization imprint lithography processes of the present invention's design.Can be used as the nano-imprint lithography auxiliary positioning platform, combine, realize fast big process feeding and position adjustment and microfeed and precision positioning with original feed mechanism.
Description of drawings
Fig. 1 is a three-degree-of-freedom precision-positioning workbench compliant mechanism synoptic diagram of the present invention;
Fig. 2 is a three-degree-of-freedom precision-positioning workbench support synoptic diagram of the present invention;
Fig. 3 is a three-degree-of-freedom precision-positioning workbench one-piece construction synoptic diagram of the present invention;
Fig. 4 is the cross sectional representation of compliant mechanism shown in Figure 1;
Wherein: 1, rigidity movable block 2, base 3, moving platform 4, position transducer 5, flexible board spring structure 6, single-freedom and flexible hinge 7, support 8, globe joint 9, piezoelectric ceramic actuator
Embodiment
Below in conjunction with accompanying drawing and preferred embodiment,, be described in detail as follows according to embodiment provided by the invention, structure, feature and effect thereof.
See also Fig. 1～3, the two-translation and one-rotation precision positioning workbench of nano-imprint lithography system, it comprises support 7 and is connected the base 2 at described support 7 tops, in the middle of described base 2, be connected with a rectangle moving platform 3 by four flexible drive mechanisms, wherein two centre positions that are positioned at two relative sides along moving platform of described four flexible drive mechanisms of (profile line among the figure partly is the bore portion of opening on entity) are provided with as shown in Figure 4, two other flexible drive mechanism is positioned at two other relative side of described moving platform 3 and the setting of staggering mutually, each described flexible drive mechanism comprises that its forward part is inserted in the described moving platform and its rear section is inserted in rigidity movable block 1 in the described base 2, at the front end of the forward part of described rigidity movable block 1 be positioned on the left and right sides sidewall of end of position, four limits of moving platform and have first and second groups of semicircle grooves, coupling part between two semicircle cambered surfaces of every group of described semicircle groove forms two single-freedom and flexible hinges of connecting successively in front and back 6, described rigidity movable block links to each other with described moving platform by the single-freedom and flexible hinge, be positioned on the base of rear section tail end sidewall locations of described rigidity movable block and have through hole, the base that is positioned at the wall place, the left and right sides, rear section of described rigidity movable block is provided with left and right sides flexible board spring structure 5 to be symmetrical parallel way, the shape of cross section of each described flexible board spring structure is a comb teeth shape, along continuous straight runs has four mounting holes that connect with each described through hole in described base, the afterbody that four piezoelectric ceramic actuators 9 and piezoelectric ceramic actuator are housed of level is connected in by bolt on the described base 2 in described four mounting holes, described piezoelectric ceramic actuator has globe joint 8, described globe joint withstands on the tail end sidewall of described rigidity movable block rear section, a battery lead plate of three capacitive position transducers 4 is housed on described moving platform diapire, another battery lead plate of described three capacitive position transducers is housed on the end face of described support.Be spacedly distributed along circumference when three capacitive position transducers 4 are installed, angle is 120 ° in twos, and such distribution mode not only layout is attractive in appearance but also can guarantee the accuracy of position probing in three kinds of motion processes of moving platform.
In order to improve the control accuracy of this worktable, it also comprises a computing machine, described computing machine be used for output voltage signal give four piezoelectric ceramic actuators, read described three capacitive position transducers output displacement signal and with the setting value of computing machine institute established model relatively back output displacement bucking voltage control signal give described four piezoelectric ceramic actuators.
As Fig. 1 and 2, moving platform 3 is fixed in the top of support 7 by 4 holes 21 on it and 4 holes 71 on the support, and guarantees that three position transducers 4 align one by one, and piezoelectric ceramic actuator 9 is connected with base 2 bolts by 4 holes 22.
Compliant mechanism in this precise positioning work table comprises that base, flexible drive mechanism and moving platform utilize integrated the processing of line cutting (WEDM) whole process technology by whole block material.
The course of work of this device is as follows:
See also Fig. 1～3, the three-channel amplifier of computer control provides piezoelectric ceramic actuator 9 flexible required electric currents.Piezoelectric ceramic actuator extends (or shortening) and promotes movable block 1, movable block produces under the support of the flexible leaf spring in both sides and moves, and then make two single-freedom and flexible hinges 6 on the compliant mechanism produce to move and the distortion of the corresponding elasticity of flexure, thereby make moving platform 3 move according to the control signal that is provided.
It (is along the x direction in the surface level that this three-degree-of-freedom precision-positioning workbench has two translational degree of freedom, moving of y direction) and rotational freedom (promptly in surface level around the rotation of horizontal normal), here suppose that in the driving water plane along lower limb center line on the moving platform 3 be x axle (promptly the central axis of two soft drive side chains) up and down, moving platform 3 left and right edges center lines are the y axle, the z axle satisfies right-hand rule and vertical with plane, xy axle place, the implementation of precise positioning work table three motions that can realize is respectively so: (1) is along the translation of x direction: the three-channel amplifier of computer control provides forward drive current to the piezoelectric ceramic actuator that is arranged in moving platform 3 lower limb soft drive side chains, (for convenience, here be called the lower piezoelectric ceramic driver), simultaneously apply the reverse drive electric current to the piezoelectric ceramic actuator that is arranged in moving platform 3 coboundary soft drive side chains (being called the top piezoelectric ceramic actuator), two piezoelectric ceramic actuators that are positioned at the moving platform left and right edges do not drive, so described lower piezoelectric ceramic driver extends, and the top piezoelectric ceramic actuator shrinks, the movable block 1 that the lower piezoelectric ceramic driver of elongation promotes its front end take place along the x axle make progress move, transmission through movable block 1 and two single-freedom and flexible hinges 6, this translation action is passed to moving platform 3, it is taken place along the axial translation of x.Along the translation opposite of x axle with above-mentioned direction of motion then can by respectively on moving platform two piezoelectric ceramic actuators in the lower limb compliant mechanism apply the drive current opposite and realize with above-mentioned direction.(2) along the translation of y direction: the three-channel amplifier of computer control provides forward drive current to the piezoelectric ceramic actuator that is arranged in moving platform 3 left hand edge soft drive side chains, (for convenience, here be called the left part piezoelectric ceramic actuator), simultaneously apply the reverse drive electric current to the piezoelectric ceramic actuator that is arranged in moving platform 3 right hand edge soft drive side chains (being called the right part piezoelectric ceramic actuator), be positioned at that two piezoelectric ceramic actuators of lower limb do not drive on the moving platform, so described left part piezoelectric ceramic actuator extends, and the right part piezoelectric ceramic actuator shrinks, moving to the right along the y axle takes place in the movable block 1 that the left part piezoelectric ceramic actuator of elongation promotes its front end, transmission through movable block 1 and two single-freedom and flexible hinges 6, this translation action is passed to moving platform 3, it is taken place along the axial translation of y.Then can apply the drive current opposite with above-mentioned direction by two piezoelectric ceramic actuators in moving platform left and right edges compliant mechanism respectively along the translation opposite with above-mentioned direction of motion of y axle realizes.(3) around the rotation of z axle: the three-channel amplifier of computer control provides forward drive current to being positioned at moving platform 3 left sides simultaneously, two piezoelectric ceramic actuators in the right hand edge soft drive side chain, be positioned at that two piezoelectric ceramic actuators of lower limb do not drive on the moving platform, two piezoelectric ceramic actuators all extend about so described, moving to the right along the y axle takes place in the movable block 1 that the left part piezoelectric ceramic actuator of elongation promotes its front end, transmission through movable block 1 and two single-freedom and flexible hinges 6, this translation action is passed to moving platform 3, it is taken place along the axial translation to the right of y, and the right part piezoelectric ceramic actuator of elongation promotes the movable block 1 of its front end moving left along the y axle is taken place, transmission through movable block 1 and two single-freedom and flexible hinges 6, this translation action is passed to moving platform 3, it is taken place along the axial translation left of y, the segment distance because two soft drive side chains that are positioned at the moving platform left and right edges stagger up and down, form the arm of force, when two piezoelectric ceramic actuators in the moving platform left and right sides drive simultaneously like this, just on moving platform, form a effect, thereby make the rotation of its generation around the z axle around the couple of z axle.
For the influence of the hysteresis phenomenon that overcomes piezoelectric ceramic actuator, three high-precision capacitive position transducers 4 in the moving platform motion process, the actual output of real-time detection moving platform, and form closed-loop control system.Utilize the positioning error of the model of foundation, and the voltage of making up the difference is applied on the piezoelectric ceramic actuator 9 in real time at the line computation moving platform.One quick 16 hyperchannel D/A and A/D converter are used for realizing the conversion between simulating signal and the digital signal.
Claims (2)
1. the two-translation and one-rotation precision positioning workbench that is used for nano-imprint lithography system, it comprises support and is connected the base of described top of the trellis, in the middle of described base, be connected with a rectangle moving platform by four flexible drive mechanisms, wherein two centre positions that are positioned at two relative sides along moving platform of described four flexible drive mechanisms are provided with, two other flexible drive mechanism is positioned at two other relative side of described moving platform and the setting of staggering up and down mutually, each described flexible drive mechanism comprises that its forward part is inserted in the described moving platform and its rear section is inserted in the interior rigidity movable block of described base, at the front end of the forward part of described rigidity movable block be positioned on the left and right sides sidewall of end of forward part of rigidity movable block of position, four limits of moving platform and have first and second groups of semicircle grooves, coupling part between two semicircle cambered surfaces of every group of described semicircle groove forms the front and back single-freedom and flexible hinge of series connection successively, described rigidity movable block links to each other with described moving platform by preceding single-freedom and flexible hinge, be positioned on the base of rear section tail end sidewall locations of described rigidity movable block and have through hole, the base that is positioned at the wall place, the left and right sides, rear section of described rigidity movable block is provided with left and right sides flexible board spring structure to be symmetrical parallel way, the shape of cross section of each described flexible board spring structure is a comb teeth shape, along continuous straight runs has four mounting holes that connect with each described through hole in described base, level is equipped with four piezoelectric ceramic actuators in described four mounting holes, described piezoelectric ceramic actuator has globe joint, described globe joint withstands on the tail end sidewall of described rigidity movable block rear section, a battery lead plate of three capacitive position transducers is housed on described moving platform diapire, another battery lead plate of described three capacitive position transducers is housed on the end face of described support.
2. the two-translation and one-rotation precision positioning workbench that is used for nano-imprint lithography system according to claim 1, it is characterized in that: it also comprises a computing machine, described computing machine is used for output voltage signal and gives four piezoelectric ceramic actuators, reads the displacement signal of described three capacitive position transducers output and relatively exports displacement bucking voltage control signal to described four piezoelectric ceramic actuators in the back with the setting value in the computing machine.
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| CN2009102290084A CN101710229B (en) | 2009-12-07 | 2009-12-07 | Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system |
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| CN2009102290084A CN101710229B (en) | 2009-12-07 | 2009-12-07 | Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system |
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| CN101710229B true CN101710229B (en) | 2011-12-28 |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103226287B (en) * | 2013-04-25 | 2014-11-26 | 河北工业大学 | Two-in-parallel parallel decoupling flexible microposition mechanism |
| CN103714865B (en) * | 2014-01-03 | 2015-11-18 | 天津大学 | Precisely locating platform is rotated in a kind of Long Distances two translation one |
| CN106847346A (en) * | 2017-03-31 | 2017-06-13 | 西安交通大学 | The big distance high frequency sound precisely locating platform of XY θ Three Degree Of Freedoms |
| CN107357132A (en) * | 2017-08-29 | 2017-11-17 | 无锡英普林纳米科技有限公司 | A kind of nano marking press position-limit mechanism |
| CN108544472A (en) * | 2018-04-17 | 2018-09-18 | 山东理工大学 | A kind of combination soft hinge formula parallel connection Roberts mechanisms |
| CN109879245B (en) * | 2019-01-30 | 2021-05-07 | 宁波大学 | Two-translation one-rotation large-stroke coupling-free parallel piezoelectric micromotion platform |
| CN109879243B (en) * | 2019-01-30 | 2020-12-08 | 宁波大学 | Two-translation one-rotation large-stroke coupling-free large-hollow parallel piezoelectric micromotion platform |
| CN110696028B (en) * | 2019-10-30 | 2023-06-13 | 温州职业技术学院 | Ultra-precise micro-nano operating system controlled by artificial intelligence |
| CN113619268B (en) * | 2021-07-30 | 2022-07-05 | 江西华派光电科技有限公司 | Glass board production is with putting thing platform |
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| CN1597249A (en) * | 2004-07-15 | 2005-03-23 | 天津大学 | Trifreedom nanometer grade micro allocation working table |
| CN1645518A (en) * | 2004-12-28 | 2005-07-27 | 华南理工大学 | Planar three freedom meek precisively positioning platform |
| CN1775546A (en) * | 2005-12-02 | 2006-05-24 | 华中科技大学 | Nano marking press |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1597249A (en) * | 2004-07-15 | 2005-03-23 | 天津大学 | Trifreedom nanometer grade micro allocation working table |
| CN1645518A (en) * | 2004-12-28 | 2005-07-27 | 华南理工大学 | Planar three freedom meek precisively positioning platform |
| CN1775546A (en) * | 2005-12-02 | 2006-05-24 | 华中科技大学 | Nano marking press |
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