CN107357132A - A kind of nano marking press position-limit mechanism - Google Patents

A kind of nano marking press position-limit mechanism Download PDF

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Publication number
CN107357132A
CN107357132A CN201710755747.1A CN201710755747A CN107357132A CN 107357132 A CN107357132 A CN 107357132A CN 201710755747 A CN201710755747 A CN 201710755747A CN 107357132 A CN107357132 A CN 107357132A
Authority
CN
China
Prior art keywords
opening
limiting
platform
limit mechanism
marking press
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710755747.1A
Other languages
Chinese (zh)
Inventor
赵敏洁
杨彦涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuxi Imprint Nano Technology Co Ltd
Original Assignee
Wuxi Imprint Nano Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuxi Imprint Nano Technology Co Ltd filed Critical Wuxi Imprint Nano Technology Co Ltd
Priority to CN201710755747.1A priority Critical patent/CN107357132A/en
Publication of CN107357132A publication Critical patent/CN107357132A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Metal By Deep-Drawing, Or The Like (AREA)
  • Press Drives And Press Lines (AREA)

Abstract

The invention discloses a kind of nano marking press position-limit mechanism, including support platform, lower flattening bench, model pressure head and hydraulic lifting cylinder, limiting platform is fixedly installed in the support platform, the limiting platform is hollow-core construction, the first horizontal opening and the second opening of longitudinal direction are respectively arranged with the limiting platform, telescope motor is provided with the limiting platform, the telescope motor possesses four telescopic shafts, the both ends of first opening and the second opening are provided with limiting plate, four limiting plates are connected on four telescopic shafts by connection strap through the first opening and the second opening.The spacing fixation that the present invention can be refined to the position of the product to be imprinted in support platform, so as to greatly improve position precision of the product in support platform, therefore the position precision of impressing is greatly improved, the impressing quality of product is improved and ensured.

Description

A kind of nano marking press position-limit mechanism
Technical field
The invention belongs to nanometer embossing field, and in particular to a kind of nano marking press position-limit mechanism.
Background technology
Existing nano marking press mainly carries out imprinting moulding by model pressure head to product, but due to the rule of product Lattice and not of uniform size, product, which is positioned in support platform, is, position has certain error, so results in model pressure head and production There is error in the contact position of product, so that impressing is ineffective, product quality is poor.
The content of the invention
Goal of the invention:In order to overcome the deficiencies in the prior art, there is provided one kind being capable of automatic and accurateization adjustment product The nano marking press position-limit mechanism of position.
Technical scheme:To achieve the above object, the present invention provides a kind of nano marking press position-limit mechanism, including support is put down Platform, lower flattening bench, model pressure head and hydraulic lifting cylinder, limiting platform is fixedly installed in the support platform, it is described spacing flat Platform is hollow-core construction, and the first horizontal opening and the second opening of longitudinal direction are respectively arranged with the limiting platform, described spacing Telescope motor is provided with platform, the telescope motor possesses four telescopic shafts, the both ends of first opening and the second opening Limiting plate is provided with, four limiting plates are connected to four and stretched by connection strap through the first opening and the second opening On contracting axle.
Further, the length of first opening and the second opening is respectively equal to the length and width of limiting platform, this Sample causes the scope of activities of telescopic shaft to reach maximization.
Further, the overlapping region of first opening and the second opening is located at the center of limiting platform.
Further, the connection strap is connected to the center of limiting plate bottom.
Further, the model pressure head is located at the center of lower flattening bench lower end.
Beneficial effect:The present invention compared with prior art, by the location parameter of four telescopic shafts in telescope motor Set respectively, the position of four limiting plates can be adjusted, enabling the position of the product to be imprinted in support platform is entered The spacing fixation of row precision, so as to greatly improve position precision of the product in support platform, therefore is greatly improved The position precision of impressing, the impressing quality of product are improved and ensured.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention;
Fig. 2 is the top view of limiting platform.
Embodiment
Below in conjunction with the accompanying drawings and specific embodiment, the present invention is furture elucidated, it should be understood that these embodiments are merely to illustrate The present invention rather than limitation the scope of the present invention, after the present invention has been read, those skilled in the art are each to the present invention's The modification of the kind equivalent form of value falls within the application appended claims limited range.
As shown in figure 1, the present invention provides a kind of nano marking press position-limit mechanism, including support platform 1, lower flattening bench 3, mould Type pressure head 4 and hydraulic lifting cylinder 9, limiting platform 2 are fixedly installed in the support platform 1, the limiting platform 2 is hollow knot Structure, the first horizontal opening 21 and the second opening 22 of longitudinal direction, the limiting platform 2 are respectively arranged with the limiting platform 2 Inside it is provided with telescope motor 7, the telescope motor 7 possesses four telescopic shafts 8, and the two of the opening 22 of the first opening 21 and second End is provided with limiting plate 6, and four limiting plates 6 are connected respectively by connection strap 61 through the first opening 21 and the second opening 22 It is connected on four telescopic shafts 8, the length of the opening 22 of the first opening 21 and second is respectively equal to the length and width of limiting platform 2 Degree, the overlapping region of the opening 22 of the first opening 21 and second are located at the center of limiting platform 2, and the connection strap 61 connects The center of the bottom of limiting plate 6 is connected on, the model pressure head 4 is located at the center of the lower lower end of flattening bench 3.

Claims (5)

1. a kind of nano marking press position-limit mechanism, including support platform (1), lower flattening bench (3), model pressure head (4) and hydraulic pressure liter Cylinder (9) drops, it is characterised in that:Limiting platform (2) is fixedly installed on the support platform (1), the limiting platform (2) is sky Core structure, second that the first horizontal opening (21) and longitudinal direction are respectively arranged with the limiting platform (2) is open (22), described Telescope motor (7) is provided with limiting platform (2), the telescope motor (7) possesses four telescopic shafts (8), first opening (21) and the second both ends for being open (22) are provided with limiting plate (6), and four limiting plates (6) are passed through by connection strap (61) First opening (21) and the second opening (22) are connected on four telescopic shafts (8).
A kind of 2. nano marking press position-limit mechanism according to claim 1, it is characterised in that:It is described first opening (21) and The length of second opening (22) is respectively equal to the length and width of limiting platform (2).
A kind of 3. nano marking press position-limit mechanism according to claim 1 or 2, it is characterised in that:First opening (21) and the second overlapping region for being open (22) is located at the center of limiting platform (2).
A kind of 4. nano marking press position-limit mechanism according to claim 1, it is characterised in that:Connection strap (61) connection In the center of limiting plate (6) bottom.
A kind of 5. nano marking press position-limit mechanism according to claim 1, it is characterised in that:Model pressure head (4) position In the center of lower flattening bench (3) lower end.
CN201710755747.1A 2017-08-29 2017-08-29 A kind of nano marking press position-limit mechanism Pending CN107357132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710755747.1A CN107357132A (en) 2017-08-29 2017-08-29 A kind of nano marking press position-limit mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710755747.1A CN107357132A (en) 2017-08-29 2017-08-29 A kind of nano marking press position-limit mechanism

Publications (1)

Publication Number Publication Date
CN107357132A true CN107357132A (en) 2017-11-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710755747.1A Pending CN107357132A (en) 2017-08-29 2017-08-29 A kind of nano marking press position-limit mechanism

Country Status (1)

Country Link
CN (1) CN107357132A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107918252A (en) * 2017-11-20 2018-04-17 张家港奇点光电科技有限公司 A kind of follow-on exposure machine
CN108637120A (en) * 2018-04-27 2018-10-12 浙江老铁匠实业有限公司 A kind of forcing press material fixing device

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101710229A (en) * 2009-12-07 2010-05-19 天津大学 Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system
CN101776851A (en) * 2010-01-15 2010-07-14 天津大学 Three DOF micro-positioning workbench for nano-imprint lithography system
CN101840879A (en) * 2009-03-18 2010-09-22 住友重机械工业株式会社 Xy stage device, semiconductor checking device and semiconductor exposure device
CN202200759U (en) * 2011-09-02 2012-04-25 巨庭机械股份有限公司 Quickly replaceable work table of engraving machine
CN102707588A (en) * 2011-06-28 2012-10-03 清华大学 Positioning alignment apparatus of double-side driving workpiece platform without being connected by cross beam
CN106274211A (en) * 2016-11-04 2017-01-04 苏州亨达尔工业材料有限公司 A kind of anti-bits type engraving machine positioner
CN106547175A (en) * 2017-01-22 2017-03-29 青岛德微光纳科技有限公司 A kind of fine registration formula nano-imprinting apparatus
CN206186647U (en) * 2016-11-04 2017-05-24 苏州亨达尔工业材料有限公司 Engraver positioner

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101840879A (en) * 2009-03-18 2010-09-22 住友重机械工业株式会社 Xy stage device, semiconductor checking device and semiconductor exposure device
CN101710229A (en) * 2009-12-07 2010-05-19 天津大学 Two-translation and one-rotation precision positioning workbench for nanoimprint lithography system
CN101776851A (en) * 2010-01-15 2010-07-14 天津大学 Three DOF micro-positioning workbench for nano-imprint lithography system
CN102707588A (en) * 2011-06-28 2012-10-03 清华大学 Positioning alignment apparatus of double-side driving workpiece platform without being connected by cross beam
CN202200759U (en) * 2011-09-02 2012-04-25 巨庭机械股份有限公司 Quickly replaceable work table of engraving machine
CN106274211A (en) * 2016-11-04 2017-01-04 苏州亨达尔工业材料有限公司 A kind of anti-bits type engraving machine positioner
CN206186647U (en) * 2016-11-04 2017-05-24 苏州亨达尔工业材料有限公司 Engraver positioner
CN106547175A (en) * 2017-01-22 2017-03-29 青岛德微光纳科技有限公司 A kind of fine registration formula nano-imprinting apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107918252A (en) * 2017-11-20 2018-04-17 张家港奇点光电科技有限公司 A kind of follow-on exposure machine
CN108637120A (en) * 2018-04-27 2018-10-12 浙江老铁匠实业有限公司 A kind of forcing press material fixing device

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Application publication date: 20171117

RJ01 Rejection of invention patent application after publication