CN103171246A - Manufacture method of silicon solar cell electrode screen board - Google Patents
Manufacture method of silicon solar cell electrode screen board Download PDFInfo
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- CN103171246A CN103171246A CN2011104361147A CN201110436114A CN103171246A CN 103171246 A CN103171246 A CN 103171246A CN 2011104361147 A CN2011104361147 A CN 2011104361147A CN 201110436114 A CN201110436114 A CN 201110436114A CN 103171246 A CN103171246 A CN 103171246A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a manufacture method of a silicon solar cell electrode screen board. The manufacturing method includes the following steps: S1: preprocessing, performing preprocessing to a stainless steel sheet to be etched; S2: pasting a dry film, uniformly coating a sensitive dry film on the obtained stainless steel sheet; S3: carrying out exposure, fixing a base plate in an exposure chamber of an exposure machine and performing exposure to the dry film on the base plate by ultraviolet rays; S4: developing, performing development to the base plate subjected to exposure, dissolving and cleaning the dry film which is not subjected to exposure, and leaving an electrode screen board graph of a solar cell; and S5: etching, performing etching to the developed steel sheet to etch a position at which an opening is needed. According to the manufacture method, the whole stainless steel sheet is adopted to be etched, when the steel sheet is selected, the steel sheet with proper roughness is chosen according to the requirement of the product surface roughness, so that the surface of a manufactured mask can well meet the printing requirement, the printing precision can be well improved and the conversion efficiency of the solar cell is improved.
Description
Technical field
The invention belongs to solar energy web plate manufacturing technology field, relate in particular to a kind of preparation method of silicon solar cell electrode Printing screen.
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Background technology
Current, along with the development of silicon solar cell technologies, to pursue cheaply simultaneously, industry is more and more higher to the performance requirement of solar cell, and the aspects such as solar cell transformation efficiency and silicon solar cell cost have all been proposed higher specification requirement.
Solar cell is made and is mainly comprised following step: the silicon chip cutting, and material is prepared; Remove the damage layer; Making herbs into wool; Diffusion system knot; Etching edge, cleaning; The deposition antireflection layer; The printing upper/lower electrode; Burn altogether and form Metal Contact; And cell slice test.Wherein, the printing of electrode has very large impact to the performance of solar cell, prints the electrode of high-quality (being that thin grid line depth-width ratio is large), can effectively improve the transformation efficiency of solar cell.
Traditional electrode of solar battery serigraphy, due to its some self restriction, its thin grid line fineness is difficult to further improve again.Because traditional silk screen plate is combined with sensitive emulsion layer by the stainless steel wire grenadine and forms, the size of stainless steel wire mesh has determined printed battery electrode width, if the stainless steel cloth mesh size is reduced, during printing, clogging easily appears in silk screen, thereby causes grid line void to print even silk screen fracture; In addition, there are many establishment longitude and latitude nodes in the stainless steel wire of silk screen plate, causes the silk screen overlapping establishment that interweaves, and these nodes have affected the planarization of the main body of silk screen plate to a certain extent, so that the electrocondution slurry skewness occurs when printing, be unfavorable for collection and the transmission of electric current.These factors cause requirement to adopt traditional silk screen plate printing, and the requirement that obtains " narrow and thick " thin grid line is difficult to further optimize again, and then the solar cell transformation efficiency is difficult to improve.Therefore be necessary to develop research, to propose a kind of defects that exists in prior art that solves, develop the more excellent silicon solar cell electrode Printing screen of performance, can satisfy the requirement of the large thin grid line of printing depth-width ratio, improve the transformation efficiency of solar cell.
Summary of the invention
For addressing the above problem, the object of the present invention is to provide a kind of preparation method of silicon solar cell electrode Printing screen, to solve the interweave problem of overlapping establishment of traditional silk screen, promote the transformation efficiency of solar cell.
For achieving the above object, technical scheme of the present invention is:
A kind of preparation method of silicon solar cell electrode Printing screen comprises the steps:
S1: pre-treatment
Get a stainless steel steel disc to be etched, it is carried out the pre-treatment of oil removing, rust cleaning;
S2: paste dry film
Evenly be coated with a kind of photosensitive dry film on the stainless steel steel disc of step S1 gained;
S3: exposure
Substrate is fixed in the exposure room of exposure machine, by ultraviolet ray, dry film on substrate is exposed, so that the figure of the electrode Printing screen of solar cell is transferred to above photosensitive dry film;
S4: develop
To the substrate after exposure develop, cleaning and baking operation, dry film dissolving in unexposed place is washed, stay the electrode web plate figure of solar cell;
S5: etching
To carry out etching through the steel disc after development treatment, and will need the place of opening to etch away.
Further, described step S2 comprises:
Dry film overlays on stainless steel substrates by film laminator, provides certain pressure and temperature by film laminator during press mold, makes dry film be close to the stainless steel substrates surface, wholely consists of substrate; Wherein, described photosensitive dry film is the negative photosensitive dry film.
Further, in described step S3, the zone of exposing is the mask position figure of electrode of solar battery printing mask plate, the i.e. non-open area of mask plate.
Further, described step S4 comprises:
Substrate after exposure is put into developing machine, through developer solution spray development treatment, develop complete by the warm water cleaning section of developing machine back segment, overflow washing section, baking operation processing in developing room.
Further, described step S5 comprises:
Substrate after development treatment is put into etching machine, and in etching machine, etching solution is to adopt acidic etching liquid, in etching chamber, etching solution is carried out etching by the mode of spray to steel disc, after etching is complete, stainless steel substrates is dried through washing
Another technical scheme of the present invention is: according to the silicon solar cell electrode Printing screen that above-mentioned method is made, wherein, Printing screen main grid line is the hair cross net form, and body width is 1mm-2.5mm; Thin grid line is that the mode with bridging connects, and body width is 35um-100um.
The invention solves the interweave problem of overlapping establishment of traditional silk screen, adopt the monoblock stainless steel substrates to carry out etching, when choosing steel disc, can choose the suitable steel disc of roughness according to the requirement of product surface roughness, the mask plate surface of producing can better meet print request, thereby can better promote printing precision, promote the transformation efficiency of solar cell.
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Description of drawings
Fig. 1 is the flow process diagram of preparation method of the present invention.
Fig. 2 is the structural diagrams that adopts the web plate that the present invention makes.
Fig. 3 is that in Fig. 2, the partial enlarged drawing of main grid line and thin grid line junction shows.
The specific embodiment
In order to make purpose of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, is not intended to limit the present invention.
The preparation method of silicon solar cell electrode Printing screen of the present invention is to adopt etch process to make stainless steel solar battery electrode mask plate, there is not the longitude and latitude node of traditional silk screen emulsion mask plate in the mask plate surface of producing, stainless steel substrates is done as a whole, its surface is Paint Gloss, during printing, its Surface Contact with the printing silicon chip is tightr, and the resolving power during printing is better.
Please refer to shown in Figure 1, the preparation method of silicon solar cell electrode Printing screen of the present invention, it comprises the steps:
S1: pre-treatment
Get a stainless steel steel disc to be etched, the surface requirements of stainless steel substrates is smooth smooth, it is carried out the pretreatment process such as oil removing, rust cleaning;
S2: paste dry film
Evenly be coated with a kind of photosensitive dry film on the stainless steel steel disc of step S1 gained, think that subsequent step provides photoactive substance; Wherein, dry film overlays on stainless steel substrates by film laminator, during press mold by film laminator provide certain pressure (0.6 ± 0.1Mpa) and temperature (110 ± 10 ℃), make dry film be close to the stainless steel substrates surface, wholely consist of substrate; In the present embodiment, described photosensitive dry film is the negative photosensitive dry film.
S3: exposure
By exposure machine, the figure of the electrode Printing screen of solar cell is transferred to above photosensitive dry film; Wherein, substrate is fixed in the exposure room of exposure machine, by ultraviolet ray, dry film on substrate is exposed, the exposure area is the mask position figure of electrode of solar battery printing mask plate, the i.e. non-open area of mask plate;
S4: develop
To the substrate after exposure develop, the operations such as cleaning and oven dry, dry film dissolving in unexposed place is washed, stay the electrode web plate figure of solar cell; Wherein, the substrate after exposure is put into developing machine, through developer solution spray development treatment, develop complete by series of processes processing such as the warm water cleaning section of developing machine back segment, overflow washing section, oven dry in developing room.
S5: etching
To carry out etching through the steel disc after development treatment, and will need the place of opening to etch away; Wherein, substrate after development treatment is put into etching machine, in etching machine, etching solution adopts acidic etching liquid, etching solution is by the mode of spray, steel disc to be carried out etching in etching chamber, and etching period is decided according to the relevant parameter of the spray pressure of concentration, temperature and the etching solution of the thickness of stainless steel steel disc, etching solution.In the present embodiment, described etching solution is certain density FeCl3 solution, as required can be toward wherein adding appropriate HCl.After etching is complete, stainless steel substrates is dried through washing.
Please refer to Fig. 2, shown in Figure 3, the Printing screen main grid line 31 that makes by the inventive method is the hair cross net form, and body width W1 is that 1mm is to 2.5mm; Thin grid line 32 is that the mode with bridging connects, and body width W2 is that 35um is to 100um.In the size of the thin grid line of solar cel electrode web plate master that employing the inventive method is made can be controlled in a big way, particularly can make the mask plate of the thin grid line of small size, be beneficial to print out the thin grid line of the little electrode of solar battery of width dimensions, can improve the transformation efficiency of solar cell when saving printing slurry.
The present invention adopts etch process to make stainless steel solar battery electrode mask plate, there is not the longitude and latitude node of traditional silk screen emulsion mask plate in the mask plate surface of producing, stainless steel substrates is done as a whole, its surface is Paint Gloss, during printing, its Surface Contact with the printing silicon chip is tightr, and the resolving power during printing is better
The above is only preferred embodiment of the present invention, not in order to limiting the present invention, all any modifications of doing within the spirit and principles in the present invention, is equal to and replaces and improvement etc., within all should being included in protection scope of the present invention.
Claims (8)
1. the preparation method of a silicon solar cell electrode Printing screen, is characterized in that, comprises the steps:
S1: pre-treatment
Get a stainless steel steel disc to be etched, it is carried out the pre-treatment of oil removing, rust cleaning;
S2: paste dry film
Evenly be coated with a kind of photosensitive dry film on the stainless steel steel disc of step S1 gained;
S3: exposure
Substrate is fixed in the exposure machine exposure room, by ultraviolet ray, dry film on substrate is exposed, so that the figure of the electrode Printing screen of solar cell is transferred to above photosensitive dry film;
S4: develop
To the substrate after exposure develop, cleaning and baking operation, dry film dissolving in unexposed place is washed, stay the electrode web plate figure of solar cell;
S5: etching
To carry out etching through the steel disc after development treatment, and will need the place of opening to etch away.
2. the preparation method of silicon solar cell electrode Printing screen as claimed in claim 1, it is characterized in that: described step S2 also comprises:
Dry film overlays on stainless steel substrates by film laminator, provides certain pressure and temperature by film laminator during press mold, makes dry film be close to the stainless steel substrates surface, wholely consists of substrate; Wherein, described photosensitive dry film is the negative photosensitive dry film.
3. the preparation method of silicon solar cell electrode Printing screen as claimed in claim 1 or 2 is characterized in that: in described step S3, the zone of exposing is the mask position figure of electrode of solar battery printing mask plate, the i.e. non-open area of mask plate.
4. the preparation method of silicon solar cell electrode Printing screen as claimed in claim 3, it is characterized in that: described step S4 comprises:
Substrate after exposure is put into developing machine, through developer solution spray development treatment, develop complete by the warm water cleaning section of developing machine back segment, overflow washing section, baking operation processing in developing room.
5. the preparation method of silicon solar cell electrode Printing screen as claimed in claim 4, it is characterized in that: described step S5 comprises:
Substrate after development treatment is put into etching machine, and in etching machine, etching solution is to adopt acidic etching liquid, in etching chamber, etching solution is carried out etching by the mode of spray to steel disc, after etching is complete, stainless steel substrates is dried through washing.
6. the preparation method of silicon solar cell electrode Printing screen as claimed in claim 5 is characterized in that: etching period is decided according to the relevant parameter of the spray pressure of concentration, temperature and the etching solution of the thickness of stainless steel steel disc, etching solution.
7. the preparation method of silicon solar cell electrode Printing screen as claimed in claim 6, it is characterized in that: the surface requirements of described stainless steel substrates is smooth smooth, described etching solution is certain density FeCl3 solution, as required can be toward wherein adding appropriate HCl.
8. the silicon solar cell electrode Printing screen made of method according to claim 1, it is characterized in that: Printing screen main grid line is the hair cross net form, body width is 1mm-2.5mm; Thin grid line is that the mode with bridging connects, and body width is 35um-100um.
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| CN2011104361147A CN103171246A (en) | 2011-12-23 | 2011-12-23 | Manufacture method of silicon solar cell electrode screen board |
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103668056A (en) * | 2013-12-31 | 2014-03-26 | 信利半导体有限公司 | Mask plate and manufacturing method thereof |
| CN104638053A (en) * | 2013-11-12 | 2015-05-20 | 泉州市博泰半导体科技有限公司 | Production method of grating electrode of solar cell |
| CN104743506A (en) * | 2015-03-09 | 2015-07-01 | 中南大学 | Manufacture method of compound mold of micro-fluidic chip and preparation method of micro-fluidic chip detection system |
| CN106274027A (en) * | 2016-08-15 | 2017-01-04 | 梅州市志浩电子科技有限公司 | A kind of silk-screen manufacturing method of screen |
| CN107310244A (en) * | 2017-06-22 | 2017-11-03 | 大连保税区金宝至电子有限公司 | The processing method of solar energy electrode printing screen plate |
| CN108528008A (en) * | 2018-04-27 | 2018-09-14 | 赫日光电（苏州）有限公司 | A kind of method for platemaking reducing printing weight in wet base |
| CN108538948A (en) * | 2018-06-14 | 2018-09-14 | 泰州隆基乐叶光伏科技有限公司 | Solar cell grid line structure, solar battery sheet and solar energy stacked wafer moudle |
| CN111770640A (en) * | 2020-07-09 | 2020-10-13 | 昆山乐邦印刷器材设备有限公司 | Etching and silk removing method for SE (selective emitter) non-mesh screen visual inspection |
| CN112423478A (en) * | 2020-10-30 | 2021-02-26 | 常州安泰诺特种印制板有限公司 | Manufacturing method of PCB screen printing type hole plugging air guide plate |
| CN113140654A (en) * | 2021-03-31 | 2021-07-20 | 扬州工业职业技术学院 | Preparation method of solar cell metal base |
| CN116555764A (en) * | 2023-07-12 | 2023-08-08 | 江苏乐萌精密科技有限公司 | Thin-sheet metal composite wet etching method |
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Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104638053A (en) * | 2013-11-12 | 2015-05-20 | 泉州市博泰半导体科技有限公司 | Production method of grating electrode of solar cell |
| CN103668056A (en) * | 2013-12-31 | 2014-03-26 | 信利半导体有限公司 | Mask plate and manufacturing method thereof |
| CN103668056B (en) * | 2013-12-31 | 2016-04-06 | 信利半导体有限公司 | A kind of mask plate and preparation method thereof |
| CN104743506A (en) * | 2015-03-09 | 2015-07-01 | 中南大学 | Manufacture method of compound mold of micro-fluidic chip and preparation method of micro-fluidic chip detection system |
| CN106274027A (en) * | 2016-08-15 | 2017-01-04 | 梅州市志浩电子科技有限公司 | A kind of silk-screen manufacturing method of screen |
| CN107310244A (en) * | 2017-06-22 | 2017-11-03 | 大连保税区金宝至电子有限公司 | The processing method of solar energy electrode printing screen plate |
| CN108528008A (en) * | 2018-04-27 | 2018-09-14 | 赫日光电（苏州）有限公司 | A kind of method for platemaking reducing printing weight in wet base |
| CN108538948A (en) * | 2018-06-14 | 2018-09-14 | 泰州隆基乐叶光伏科技有限公司 | Solar cell grid line structure, solar battery sheet and solar energy stacked wafer moudle |
| CN111770640A (en) * | 2020-07-09 | 2020-10-13 | 昆山乐邦印刷器材设备有限公司 | Etching and silk removing method for SE (selective emitter) non-mesh screen visual inspection |
| CN112423478A (en) * | 2020-10-30 | 2021-02-26 | 常州安泰诺特种印制板有限公司 | Manufacturing method of PCB screen printing type hole plugging air guide plate |
| CN112423478B (en) * | 2020-10-30 | 2023-09-15 | 常州安泰诺特种印制板有限公司 | Manufacturing method of PCB mesh type plug hole air guide plate |
| CN113140654A (en) * | 2021-03-31 | 2021-07-20 | 扬州工业职业技术学院 | Preparation method of solar cell metal base |
| CN116555764A (en) * | 2023-07-12 | 2023-08-08 | 江苏乐萌精密科技有限公司 | Thin-sheet metal composite wet etching method |
| CN116555764B (en) * | 2023-07-12 | 2023-09-12 | 江苏乐萌精密科技有限公司 | Thin-sheet metal composite wet etching method |
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Application publication date: 20130626 |