CN104118194A - Production process of emulsion-free solar screen - Google Patents
Production process of emulsion-free solar screen Download PDFInfo
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- CN104118194A CN104118194A CN201310154938.4A CN201310154938A CN104118194A CN 104118194 A CN104118194 A CN 104118194A CN 201310154938 A CN201310154938 A CN 201310154938A CN 104118194 A CN104118194 A CN 104118194A
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Abstract
The invention discloses a production process of an emulsion-free solar screen. The production process specifically comprises the following steps: (S1) primary treatment, namely performing mandrel pretreatment, primary lamination, primary exposure and primary development; (S2) primary electroforming; (S3) secondary treatment, namely performing secondary lamination on a mandrel after the primary electroforming process in the step (S2), and performing secondary exposure and secondary development; (S4) secondary electroforming; and (S5) aftertreatment, namely performing stripping on a second electroforming layer of the mandrel after the secondary electroforming in the step (S4), stripping and the like. The process can provide a new method for producing a solar screen and only needs one set of corresponding equipment; the two electroforming layers of the solar screen produced by adopting the process are integrally formed without warp-weft nodes of a woven screen, the slurry discharge is uniform, and thus the printing quality is improved.
Description
Technical field
The present invention relates to a kind of manufacture craft without emulsion solar energy web plate, be specifically related to a kind of manufacture craft that replaces the solar energy web plate of emulsion with metal level, belong to solar cell web plate and manufacture field.
Background technology
Along with economic fast development, the earth is populous in addition, and energy starved problem is day by day serious, and sufficiently and reasonably utilizing solar energy is a kind of effective means that solves energy shortage problem, and wherein solar cell is one of means of a few days ago extensively quoting.Make solar battery sheet and need to use the solar energy web plate of printing use, by this web plate, electrocondution slurry is bitten on the corresponding position of semi-conducting material (being main grid line, thin grid line position), pass through solar light irradiation, the semi-conducting material that is printed on electrocondution slurry produces photovoltaic effect, thereby natural light energy conversion is the electric energy that can utilize for people.
The solar energy web plate of tradition use is the silk screen of Weaving type, because of its longitude and latitude node with Weaving type, causes lower slurry inhomogeneous, thereby affect the printing quality of solar cell in electrode of solar battery printing process.
Chinese Patent Application No. is that the patent of 201220004001X discloses a kind of solar energy half tone with double-layer structure, described double-layer structure is respectively metal plain net layer and mask photopolymer layer, described mask photopolymer layer is combined on metal plain net layer by the mode that applies or overlay, in the process of solar energy web plate of making this structure, corresponding double-layer structure needs two complete equipments (being two complete equipments of respective production plain net layer and making mask photopolymer layer), also need photopolymer layer to expose by photopolymer coating or after attaching to metal plain net layer, the operations such as development, just need corresponding equipment, therefore be necessary to propose a kind of preparation method of new solar cell web plate.
Summary of the invention
In view of this, technical problem to be solved by this invention is to provide a kind of manufacture craft without emulsion solar energy web plate, this technique only needs the equipment of a set of correspondence, and the one-body molded longitude and latitude node without Weaving type of the two-layer electroformed layer of the solar energy web plate of making by this technique, lower slurry is even, thereby improves printing quality.
The present invention provides a kind of manufacture craft without emulsion solar energy web plate for addressing the above problem, and its concrete steps comprise:
S1, single treatment: pre-treatment core → mono-time pad pasting → single exposure → once develop, after the developing procedure of described single treatment, the described film once pasting forms default developing pattern one on described core, and described default developing pattern one adapts with the described spillage region without emulsion solar energy web plate;
S2, an electroforming: put the described core after described step S1 single treatment operation into electroforming solution and carry out electroforming, after electroforming, form the first electroformed layer, described the first electroformed layer and default developing pattern one complementation forming through developing procedure of described step S1; S3, after-treatment: the core after an electroforming process described in described step S2 is carried out to secondary pad pasting → re-expose → redevelopment, after described redevelopment operation, the film that described secondary pastes forms default developing pattern two on described the first electroformed layer surface;
S4, secondary electroforming: carry out secondary electroforming by putting into electrotyping bath solution through the core of described after-treatment operation, after described secondary electroforming process, form the second electroformed layer, described the second electroformed layer main body is network, described the first electroformed layer by described the second electroformed layer in conjunction with form an entirety;
S5, post processing: carry out second layer electroformed layer through the core of step S4 bis-electroforming and take off the operations such as film → peel off, after described stripping process, obtain described without emulsion solar energy web plate.
Manufacture craft without emulsion solar energy web plate provided by the present invention will be described in detail belows, and some additional technical characterictics also will display in narration below.
Further, the pre-treatment core operation described in described step S1, is described core to be carried out to the operations such as sandblast, washing, oven dry.
Further, a film process described in described step S1 is that described mould is pasted or is coated to the mandrel surface through described pre-treatment, and the thickness of described film thickness and described the first electroformed layer is suitable, is 8～30 μ m.
Preferably, the thickness of the film thickness described in a film process described in described step S1 and described ground floor electroformed layer is suitable, is 10～25 μ m.
Further, the single exposure operation described in step S1 is that the described core after a described pad pasting is exposed by exposure machine in the one side of posting described film, forms default exposing patterns one on described film.Described exposing patterns one comprises the exposing patterns of the rectangular opening of corresponding main grid line, thin grid line pattern, or comprises the exposing patterns of the rectangular opening of corresponding thin grid line.
Further, the developing pattern of the rectangular opening that default developing pattern one described in described step S1 comprises with main grid line, carefully grid line pattern is corresponding, or comprise the developing pattern of the rectangular opening corresponding with thin grid line pattern, wherein said default developing pattern one adapts with the described spillage region without emulsion solar energy web plate.
The first electroformed layer described in described step S2 and the default developing pattern complementation forming through developing procedure of described step S1, its specifically, the region equal electroforming last layer metal level beyond developing pattern one region.
Further, after an electroforming process described in described step S2, described in the thickness of described ground floor electroformed layer and a described film process, the consistency of thickness of film, is 8～30 μ m;
Preferably, after an electroforming process described in described step S2, described in the thickness of described ground floor electroformed layer and a described film process, the consistency of thickness of film, is 10～25 μ m.
Further, also comprise that the first electroformed layer takes off film → subsequent treatment operation before described step S3 after-treatment, described ground floor electroformed layer takes off membrane process and utilizes ultrasonic washing to take off film processing, and described subsequent treatment operation comprises sandblast, matting.
Described subsequent treatment operation can increase the adhesion of described ground floor electroformed layer and described second layer electroformed layer by sandblast operation.
Further, the secondary film process described in described step S3 is the surface of described mould being pasted or is coated to the described core after described subsequent treatment operation, and described film thickness is suitable with described the second electroformed layer thickness, is 10～45 μ m.
Preferably, the second electroformed layer thickness of the film thickness described in the secondary film process described in S3 and secondary electroforming is suitable, is 15～30 μ m.
Further, the re-expose operation described in described step S3 is that the core after described secondary pad pasting is exposed by exposure machine in the one side of posting described film, forms default exposing patterns two on described film.Described exposing patterns two comprises plate body grid exposing patterns, and the exposing patterns of described plate body grid comprises the exposing patterns of main grid line, thin grid line pattern, or comprises the exposing patterns of thin grid line pattern.
Described after re-expose operation, form comprise thin grid line pattern, or comprise that the exposing patterns of thin grid line, main grid line pattern is corresponding with the position of the corresponding rectangular opening on described the first electroformed layer forming by contraposition after an electroforming process.
Further, after described redevelopment operation, the film that described secondary pastes forms default developing pattern two on described the first electroformed layer surface.Described developing pattern two comprises the developing pattern of plate body grid, the developing pattern of described plate body grid
comprisethin grid line pattern, or comprise the developing pattern of thin grid line, main grid line pattern.Described developing pattern two is corresponding with described exposing patterns two.
Further, after the secondary electroforming process described in described step S4, the consistency of thickness of film described in the thickness of described the second electroformed layer and described secondary film process, is 10～45 μ m.
Preferably, after the secondary electroforming process described in described step S4, the thickness of described the second electroformed layer is consistent with film thickness described in described secondary film process, is 15～30 μ m.
Further, the electroforming parameter of a described electroforming process is as follows:
Nickel sulfamic acid 50～80g/L
Seven hydration nickel chlorides are 10～20g/L
Boric acid 30～50 g/L
Electroforming time 24～90min
Further, in described secondary electroforming process, electroforming parameter is as follows:
Nickel sulfamic acid 50～80g/L
Seven hydration nickel chlorides are 10～20g/L
Boric acid 30～50 g/L
Electroforming time 30～135min
Described in background technology of the present invention, the solar energy web plate of traditional use is the silk screen of Weaving type, in electrode of solar battery printing process, because of its longitude and latitude node with Weaving type, causes lower slurry inhomogeneous, thereby affects the printing quality of solar cell.Chinese Patent Application No. is the disclosed solar energy half tone with double-layer structure of the patent of 201220004001X, in its manufacturing process, need two corresponding complete equipments (being two complete equipments of respective production plain net layer and making mask photopolymer layer), photopolymer is applied or is attached to also need after metal plain net layer to photopolymer layer expose, the operation such as development, just need corresponding exposure, developing apparatus, thereby in whole manufacturing process, need two complete equipments.And the described manufacture craft without emulsion solar energy web plate provided by the invention, described single treatment, an electroforming and described after-treatment, secondary electroforming all belong to repetition production process, can be made into by a set of equipment, and the one-body molded longitude and latitude node without Weaving type of the two-layer electroformed layer without emulsion solar energy web plate that technique is made thus, printing at present slurry evenly, is conducive to improve the printing quality of solar cell.
The aspect that the present invention is additional and advantage in the following description part provide, and part will become obviously from the following description, or recognize by practice of the present invention.
Brief description of the drawings
Above-mentioned and/or additional aspect of the present invention and advantage will be understood becoming obviously and easily from the following description of the accompanying drawings of embodiments, wherein:
Figure 1 shows that the schematic cross-section after pad pasting one time;
Figure 2 shows that the schematic cross-section after single exposure;
Figure 3 shows that the schematic cross-section after once developing;
Figure 4 shows that the schematic cross-section after electroforming one time;
Figure 5 shows that the first electroformed layer takes off the schematic cross-section after film;
Figure 6 shows that the schematic cross-section after secondary pad pasting;
Figure 7 shows that schematic cross-section after secondary electroforming;
Figure 8 shows that the first electroformed layer planar structure schematic diagram;
Figure 9 shows that and peel off the rear schematic cross-section without emulsion solar energy web plate;
Figure 10 shows that the planar structure schematic diagram without emulsion solar energy web plate;
Figure 11～Figure 13 shows that 105 part enlarged diagrams in Figure 10;
Figure 14～Figure 16 shows that 106 part enlarged diagrams in Figure 10;
Figure 17 shows that a kind of flow chart without emulsion solar energy web plate manufacture craft;
In Fig. 1,11 is film, and 12 is core;
In Fig. 2,21 is the film (being developing pattern one) of exposure area;
In Fig. 4,41 is the first electroformed layer;
In Fig. 5,51 is rectangular opening (corresponding main grid line);
In Fig. 6,61 is film;
In Fig. 7,71 is the second electroformed layer;
In Fig. 8,81 is the rectangular opening corresponding with thin grid line;
In Figure 10,101 is main grid line pattern, and 102 is thin grid line pattern, and 103 is plate body, and 105 and 106 for treating magnification region;
Detailed description of the invention
Describe embodiments of the invention below in detail, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has the element of identical or similar functions from start to finish.Be exemplary below by the embodiment being described with reference to the drawings, only for explaining the present invention, and can not be interpreted as limitation of the present invention.In description of the invention, it will be appreciated that, term " on ", orientation or the position relationship of the instruction such as D score, 'fornt', 'back', " left side ", " right side " be based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, instead of indicate or imply that the device of indication or element must have specific orientation, construct and operation with specific orientation, therefore can not be interpreted as limitation of the present invention.
Inventive concept of the present invention is as follows, described in background technology of the present invention, Chinese Patent Application No. is the disclosed solar energy half tone with double-layer structure of the patent of 201220004001X, in its manufacturing process, need two corresponding complete equipments (being two complete equipments of respective production plain net layer and making mask photopolymer layer), also need photopolymer layer to expose by photopolymer coating or after attaching to metal plain net layer, the operations such as development, just need corresponding exposure, developing apparatus, thereby in whole manufacturing process, need two complete equipments, and traditional solar energy silk screen has the longitude and latitude node of Weaving type, cause lower slurry inhomogeneous, thereby affect the printing quality of solar cell.The described manufacture craft without emulsion solar energy web plate provided by the invention, can be made into by a set of equipment, and the one-body molded longitude and latitude node without Weaving type of the two-layer electroformed layer without emulsion solar energy web plate that technique is made thus, printing at present slurry evenly, is conducive to improve the printing quality of solar cell.
Manufacture craft without emulsion solar energy web plate of the present invention is described below with reference to accompanying drawings, shown in Fig. 1～Fig. 4, be respectively pad pasting one time, single exposure, once develop, schematic cross-section after an electroforming process, Figure 5 shows that ground floor electroformed layer takes off the schematic cross-section after film, shown in Fig. 6～Fig. 7, be respectively secondary pad pasting, schematic cross-section after secondary electroforming process, Figure 8 shows that ground floor electroformed layer planar structure schematic diagram, Figure 10 shows that the planar structure schematic diagram without emulsion solar energy web plate, Figure 17 shows that the flow chart without emulsion solar energy web plate manufacture craft.
According to embodiments of the invention, as shown in figure 17, for of the present invention, without the flow chart of emulsion solar energy web plate manufacture craft, a kind of manufacture craft without emulsion solar energy web plate, is characterized in that, comprises the steps:
S1, single treatment: pre-treatment core → mono-time pad pasting → single exposure → once develop, after the developing procedure of described single treatment, the described film 11 once pasting forms default developing pattern one on described core 12, and described default developing pattern one adapts with the described spillage region without emulsion solar energy web plate;
S2, an electroforming: put the described core after described step S1 single treatment operation into electroforming solution and carry out electroforming, after electroforming, form the first electroformed layer 41, described the first electroformed layer and 41 default developing pattern one complementations that form through developing procedure of described step S1;
S3, after-treatment: the core after an electroforming process described in described step S2 is carried out to secondary pad pasting → re-expose → redevelopment, after described redevelopment operation, the film 61 that described secondary pastes forms default developing pattern two on described the first electroformed layer surface;
S4, secondary electroforming: carry out secondary electroforming by putting into electrotyping bath solution through the core of described after-treatment operation, after described secondary electroforming process, form the second electroformed layer 71, described the second electroformed layer 71 main bodys are network, and described the first electroformed layer 41 forms an entirety by described the second electroformed layer 71 combinations;
S5, post processing: carry out second layer electroformed layer through the core of step S4 bis-electroforming and take off the operations such as film → peel off, after described stripping process, obtain described without emulsion solar energy web plate.
Manufacture craft without emulsion solar energy web plate provided by the present invention will be described in detail belows, and some additional technical characterictics also will display in narration below.
According to embodiments of the invention, the pre-treatment core operation described in described step S1, is that core 12 is carried out to the operations such as sandblast, washing, oven dry.
According to embodiments of the invention, a film process described in described step S1 is that film 11 is overlayed or be coated to core 12 surfaces through pre-treatment, be illustrated in figure 1 the schematic cross-section of a pad pasting, described film 11 thickness and described the first electroformed layer 41 thickness are suitable, are 8～30 μ m.
Preferably, film 11 thickness described in a film process described in described step S1 are suitable with ground floor electroformed layer 41 thickness, are 10～25 μ m.
According to embodiments of the invention, the single exposure operation described in described step S1 is that the core 12 after a film process is exposed by exposure machine in the one side of posting film 11, forms exposing patterns one on described film.Described exposing patterns one comprises the exposing patterns of the rectangular opening of corresponding main grid line (51), thin grid line pattern, or comprises the exposing patterns of the rectangular opening of corresponding thin grid line.
Described exposing patterns one can be designed to comprise the exposing patterns of the rectangular opening of corresponding thin grid line pattern, main grid line pattern respectively as required, also can only include the exposing patterns of the rectangular opening of corresponding thin grid line pattern.
Be illustrated in figure 2 the schematic cross-section after single exposure operation, described exposing patterns be in region 21(Fig. 2 of film exposure 21 for the exposing patterns of the corresponding rectangular opening of main grid line pattern), exposure area 21 is unexposed with the film 11 of exterior domain.
According to embodiments of the invention, developing pattern one default described in described step S1 is corresponding with exposing patterns one described above, the developing pattern of the rectangular opening that it comprises with main grid line, carefully grid line pattern is corresponding, or comprise the developing pattern of the rectangular opening corresponding with thin grid line pattern, wherein said default developing pattern one adapts with the described spillage region without emulsion solar energy web plate.
The first electroformed layer described in step S2 and the predetermined pattern complementation forming through developing procedure of described step S1, its specifically, the region equal electroforming last layer metal level on core beyond developing pattern one region, forms complementary form with developing pattern one.
Be illustrated in figure 3 the schematic cross-section after developing procedure one time, through a developing procedure, show developing pattern corresponding to the rectangular opening with on the first electroformed layer to be formed at the film 11 of core 12.After a developing procedure, unexposed film 11 reacts with developer solution and comes off, the film (being exposure area 21) of exposure does not react with developer solution and continues to retain, thereby form development schematic cross-section as shown in Figure 3, the film 21 of exposure area is the developing pattern of the rectangular opening corresponding with main grid line pattern.
According to embodiments of the invention, through an electroforming process described in step S2, the thickness of the film 11 in the thickness of the first electroformed layer 41 and a pad pasting is suitable, is 8～30 μ m;
Preferably, after an electroforming work described in described step S2, film 11 thickness in the thickness of described the first electroformed layer 41 and a pad pasting are suitable, are 10～25 μ m.
After an electroforming process, form ground floor electroformed layer, described ground floor electroformed layer comprises the rectangular opening described in step S1, Figure 4 shows that the schematic cross-section after electroforming one time, and the region beyond developing pattern one forms the first electroformed layer 41.
According to embodiments of the invention, before described step S3 after-treatment, also comprise that ground floor electroformed layer takes off film → subsequent treatment operation, described ground floor electroformed layer takes off membrane process and utilizes ultrasonic washing to take off film processing, and described subsequent treatment operation comprises sandblast, matting.
The described membrane process that takes off is to be developing pattern one through the film 21(of single exposure operation post-exposure) fade away.
Subsequent treatment operation can increase the adhesion of ground floor electroformed layer and second layer electroformed layer by sandblast operation.
Figure 5 shows that the schematic cross-section of the first electroformed layer after subsequent treatment, 51 is rectangular opening (the rectangular opening of corresponding main grid line), is also developing pattern one through taking off membrane process by the film 21(of exposure area) to remove the rectangular opening 51(51 forming on the first electroformed layer 41 be the rectangular opening of corresponding main grid line pattern).Figure 8 shows that the planar structure schematic diagram of the first electroformed layer 41, it comprises the rectangular opening 81 corresponding with thin grid line pattern, the rectangular opening 51 corresponding with main grid line pattern.
According to embodiments of the invention, secondary film process described in step S3, is illustrated in figure 6 the schematic cross-section after secondary pad pasting, is film 61 is overlayed or be coated to the mandrel surface after described subsequent treatment operation, described film thickness is suitable with the second electroformed layer 71 thickness, is 10～45 μ m.
Preferably, the film thickness described in the secondary film process described in S3 is suitable with the second electroformed layer 71 thickness, is 15～30 μ m.
According to embodiments of the invention, the re-expose operation described in step S3 is that the core after secondary pad pasting is passed through to exposure machine in the one side of posting film, forms exposing patterns two on film.Described exposing patterns two comprises plate body grid exposing patterns, and the exposing patterns of described plate body grid comprises the exposing patterns of main grid line, thin grid line pattern or comprises the exposing patterns of thin grid line pattern.
According to embodiments of the invention, described after re-expose operation, form comprise thin grid line pattern, or the exposing patterns that comprises thin grid line, main grid line pattern is corresponding by the position of contraposition and corresponding rectangular opening on described the first electroformed layer 41 (with rectangular opening 51 corresponding to main grid line pattern, the rectangular opening 81 corresponding with thin grid line pattern).
According to embodiments of the invention, after the redevelopment operation described in described step S3, show the developing pattern two of the second electroformed layer to be formed, described developing pattern two comprises the developing pattern of plate body grid, the developing pattern of described plate body grid
comprisethin grid line pattern, or comprise the developing pattern of thin grid line, main grid line pattern.Described developing pattern two is corresponding with described exposing patterns two.
According to embodiments of the invention, after the secondary electroforming process described in described step S4, film 61 consistency of thickness in the thickness of the second electroformed layer 71 and secondary film process, are 10～45 μ m.
Preferably, after the secondary electroforming process described in described step S4, film 61 consistency of thickness in the thickness of second layer electroformed layer 71 and secondary film process, are 15～30 μ m.
Figure 7 shows that the schematic cross-section after secondary electroforming, 71 is the second electroformed layer, Figure 9 shows that and peel off the rear schematic cross-section without emulsion solar energy web plate, Figure 10 shows that the planar structure schematic diagram without emulsion solar energy web plate, 101 is main grid line pattern, 102 is thin grid line pattern, 103 is plate body, 105 and 106 for treating magnification region, Figure 11～Figure 13 shows that 105 part enlarged diagrams in Figure 10, Figure 14～Figure 16 shows that 106 part enlarged diagrams in Figure 10, in figure, dash area is ground floor electroformed layer, grid is second layer electroformed layer.
The electroforming parameter of a described electroforming process is as follows:
Nickel sulfamic acid 50～80g/L
Seven hydration nickel chlorides are 10～20g/L
Boric acid 30～50 g/L
Electroforming time 24～90min
The electroforming parameter of described secondary electroforming process is as follows:
Nickel sulfamic acid 50～80g/L
Seven hydration nickel chlorides are 10～20g/L
Boric acid 30～50 g/L
Electroforming time 30～135min
According to one embodiment of present invention, film 11 thickness of a described pad pasting are 20 μ m, and described the first electroformed layer thickness is 20 μ m, and the thickness of the film 61 of described secondary pad pasting is 30 μ m, and described the second electroformed layer thickness is 30 μ m.
The electroforming parameter of a described electroforming process is as follows:
Nickel sulfamic acid 65g/L
Seven hydration nickel chlorides are 15g/L
Boric acid 45 g/L
Electroforming time 60min
The electroforming parameter of described secondary electroforming process is as follows:
Nickel sulfamic acid 65g/L
Seven hydration nickel chlorides are 15g/L
Boric acid 45 g/L
Electroforming time 90min
According to one embodiment of present invention, film 11 thickness of a described pad pasting are 15 μ m, and described the first electroformed layer thickness is 15 μ m, and the thickness of the film 61 of described secondary pad pasting is 30 μ m, and described the second electroformed layer thickness is 30 μ m.
The electroforming parameter of a described electroforming process is as follows:
Nickel sulfamic acid 65g/L
Seven hydration nickel chlorides are 15g/L
Boric acid 45 g/L
Electroforming time 45min
The electroforming parameter of described secondary electroforming process is as follows:
Nickel sulfamic acid 65g/L
Seven hydration nickel chlorides are 15g/L
Boric acid 45 g/L
Electroforming time 90min
According to one embodiment of present invention, film 11 thickness of a described pad pasting are 20 μ m, and described the first electroformed layer thickness is 20 μ m, and the thickness of the film 61 of described secondary pad pasting is 25 μ m, and described the second electroformed layer thickness is 25 μ m.
The electroforming parameter of a described electroforming process is as follows:
Nickel sulfamic acid 65g/L
Seven hydration nickel chlorides are 15g/L
Boric acid 45 g/L
Electroforming time 60min
The electroforming parameter of described secondary electroforming process is as follows:
Nickel sulfamic acid 65g/L
Seven hydration nickel chlorides are 15g/L
Boric acid 45 g/L
Electroforming time 75min
Although the specific embodiment of the present invention is described in detail with reference to multiple illustrative examples of the present invention, but it must be understood that, those skilled in the art can design multiple other improvement and embodiment, and these improve and within embodiment will drop on spirit and scope.Particularly, within the scope of aforementioned open, accompanying drawing and claim, can aspect the layout of parts and/or subordinate composite configuration, make rational modification and improvement, and can not depart from spirit of the present invention.Except modification and the improvement of parts and/or layout aspect, its scope is limited by claims and equivalent thereof.
Claims (9)
1. without a manufacture craft for emulsion solar energy web plate, it is characterized in that, comprise the steps:
S1, single treatment: pre-treatment core → mono-time pad pasting → single exposure → once develop, after the developing procedure of described single treatment, the described film once pasting forms default developing pattern one on described core, and described default developing pattern one adapts with the described spillage region without emulsion solar energy web plate;
S2, an electroforming: put the described core after described step S1 single treatment operation into electroforming solution and carry out electroforming, after electroforming, form the first electroformed layer, described the first electroformed layer and default developing pattern one complementation forming through developing procedure of described step S1;
S3, after-treatment: the core after an electroforming process described in described step S2 is carried out to secondary pad pasting → re-expose → redevelopment, after described redevelopment operation, the film that described secondary pastes forms default developing pattern two on described the first electroformed layer surface;
S4, secondary electroforming: carry out secondary electroforming by putting into electrotyping bath solution through the core of described after-treatment operation, after described secondary electroforming process, form the second electroformed layer, described the second electroformed layer main body is network, described the first electroformed layer by described the second electroformed layer in conjunction with form an entirety;
S5, post processing: carry out second layer electroformed layer through the core of step S4 bis-electroforming and take off the operations such as film → peel off, after described stripping process, obtain described without emulsion solar energy web plate.
2. the manufacture craft without emulsion solar energy web plate according to claim 1, it is characterized in that, before after-treatment described in described step S3, also comprise that the first electroformed layer takes off film → subsequent treatment operation, described the first electroformed layer takes off membrane process and utilizes ultrasonic washing to take off film processing, and described subsequent treatment operation comprises sandblast, matting.
3. according to the manufacture craft without emulsion solar energy web plate described in claim 1,2, it is characterized in that, a film process described in described step S1 is that the mandrel surface through described pre-treatment is pasted or be coated to described mould, the thickness of described film thickness and described the first electroformed layer is suitable, is 8～30 μ m; Secondary film process described in described step S3 is the surface of mould being pasted or is coated to core after described subsequent treatment operation, and the described film thickness of described secondary pad pasting is suitable with the thickness of described the second electroformed layer, is 10～45 μ m.
4. the manufacture craft without emulsion solar energy web plate according to claim 3, it is characterized in that, described in a film process described in described step S1, the thickness of film is 10～25 μ m, and the thickness of film described in the secondary film process described in described step S3 is 15～30 μ m.
5. the manufacture craft without emulsion solar energy web plate according to claim 1, it is characterized in that, single exposure operation described in described step S1 is that the core after a described pad pasting is exposed by exposure machine in the one side of posting described film, forms default exposing patterns one on described film; Re-expose operation described in described step S3 is that the core after described secondary pad pasting is exposed by exposure machine in the one side of posting described film, forms default exposing patterns two on described film.
6. the manufacture craft without emulsion solar energy web plate according to claim 1, it is characterized in that, after an electroforming process described in described step S2, described in the thickness of described the first electroformed layer and a described film process, the consistency of thickness of film, is 8～30 μ m; After the secondary electroforming process described in described step S4, the consistency of thickness of film described in the thickness of described the second electroformed layer and described secondary film process, is 10～45 μ m.
7. the manufacture craft without emulsion solar energy web plate according to claim 6, is characterized in that, the thickness of described the first electroformed layer is 10～25 μ m; The thickness of described the second electroformed layer is 15～30 μ m.
8. the manufacture craft without emulsion solar energy web plate according to claim 1, is characterized in that, the electroforming parameter of a described electroforming process is as follows:
Nickel sulfamic acid 50～80g/L
Seven hydration nickel chlorides are 10～20g/L
Boric acid 30～50 g/L
Electroforming time 24～90min.
9. the manufacture craft without emulsion solar energy web plate according to claim 1, is characterized in that, the electroforming parameter of described secondary electroforming process is:
Nickel sulfamic acid 50～80g/L
Seven hydration nickel chlorides are 10～20g/L
Boric acid 30～50 g/L
Electroforming time 30～135min.
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| CN201310154938.4A CN104118194A (en) | 2013-04-28 | 2013-04-28 | Production process of emulsion-free solar screen |
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| CN201310154938.4A CN104118194A (en) | 2013-04-28 | 2013-04-28 | Production process of emulsion-free solar screen |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105734617A (en) * | 2016-04-27 | 2016-07-06 | 昆山美微电子科技有限公司 | High-precision metal membrane composite nickel net and electroforming manufacturing method |
| CN112018197A (en) * | 2020-09-01 | 2020-12-01 | 深圳纳弘熠岦光学科技有限公司 | Method and apparatus for producing solar electrode mold, and computer-readable storage medium |
| CN112549740A (en) * | 2020-12-21 | 2021-03-26 | 上海新倬壮印刷科技有限公司 | Manufacturing process for efficiently preparing solar screen printing plate |
| CN112606544A (en) * | 2020-11-19 | 2021-04-06 | 浙江硕克科技有限公司 | Metal plate and processing technology thereof |
| CN113878979A (en) * | 2021-12-06 | 2022-01-04 | 杭州晶宝新能源科技有限公司 | Manufacturing method of precision template, precision template and application |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105734617A (en) * | 2016-04-27 | 2016-07-06 | 昆山美微电子科技有限公司 | High-precision metal membrane composite nickel net and electroforming manufacturing method |
| CN112018197A (en) * | 2020-09-01 | 2020-12-01 | 深圳纳弘熠岦光学科技有限公司 | Method and apparatus for producing solar electrode mold, and computer-readable storage medium |
| CN112018197B (en) * | 2020-09-01 | 2022-06-03 | 深圳纳弘熠岦光学科技有限公司 | Method and apparatus for producing solar electrode mold, and computer-readable storage medium |
| CN112606544A (en) * | 2020-11-19 | 2021-04-06 | 浙江硕克科技有限公司 | Metal plate and processing technology thereof |
| CN112549740A (en) * | 2020-12-21 | 2021-03-26 | 上海新倬壮印刷科技有限公司 | Manufacturing process for efficiently preparing solar screen printing plate |
| CN113878979A (en) * | 2021-12-06 | 2022-01-04 | 杭州晶宝新能源科技有限公司 | Manufacturing method of precision template, precision template and application |
| CN113878979B (en) * | 2021-12-06 | 2022-03-15 | 杭州晶宝新能源科技有限公司 | Manufacturing method of precision template, precision template and application |
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