CN102985213B - 高通量太阳能电池烧蚀系统 - Google Patents
高通量太阳能电池烧蚀系统 Download PDFInfo
- Publication number
- CN102985213B CN102985213B CN201180032547.4A CN201180032547A CN102985213B CN 102985213 B CN102985213 B CN 102985213B CN 201180032547 A CN201180032547 A CN 201180032547A CN 102985213 B CN102985213 B CN 102985213B
- Authority
- CN
- China
- Prior art keywords
- wafer
- laser
- pattern
- laser beam
- station
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0823—Devices involving rotation of the workpiece
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
- H10F77/219—Arrangements for electrodes of back-contact photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Photovoltaic Devices (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Energy (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/829,275 | 2010-07-01 | ||
| US12/829,275 US8263899B2 (en) | 2010-07-01 | 2010-07-01 | High throughput solar cell ablation system |
| PCT/US2011/033764 WO2012003033A1 (en) | 2010-07-01 | 2011-04-25 | High throughput solar cell ablation system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102985213A CN102985213A (zh) | 2013-03-20 |
| CN102985213B true CN102985213B (zh) | 2015-12-02 |
Family
ID=45400014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180032547.4A Active CN102985213B (zh) | 2010-07-01 | 2011-04-25 | 高通量太阳能电池烧蚀系统 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US8263899B2 (https=) |
| EP (2) | EP3299109A1 (https=) |
| JP (2) | JP6318419B2 (https=) |
| KR (1) | KR101775491B1 (https=) |
| CN (1) | CN102985213B (https=) |
| WO (1) | WO2012003033A1 (https=) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8263899B2 (en) * | 2010-07-01 | 2012-09-11 | Sunpower Corporation | High throughput solar cell ablation system |
| US8692111B2 (en) * | 2011-08-23 | 2014-04-08 | Sunpower Corporation | High throughput laser ablation processes and structures for forming contact holes in solar cells |
| KR101466669B1 (ko) * | 2013-05-31 | 2014-12-01 | 주식회사 엘티에스 | 강화유리 셀의 관통홀 가공장치 |
| EP3065185A4 (en) * | 2013-10-30 | 2017-08-02 | Kyocera Corporation | Light reception/emission element and sensor device using same |
| CN106825932A (zh) * | 2014-06-10 | 2017-06-13 | 赵牧青 | 一种具有夹具的经济型激光标印系统 |
| US20160158890A1 (en) * | 2014-12-05 | 2016-06-09 | Solarcity Corporation | Systems and methods for scribing photovoltaic structures |
| US9899546B2 (en) | 2014-12-05 | 2018-02-20 | Tesla, Inc. | Photovoltaic cells with electrodes adapted to house conductive paste |
| US9786562B2 (en) * | 2015-04-21 | 2017-10-10 | Asm Technology Singapore Pte Ltd | Method and device for cutting wafers |
| JP6552948B2 (ja) * | 2015-11-27 | 2019-07-31 | 株式会社ディスコ | ウエーハの加工方法、及び加工装置 |
| US20170236972A1 (en) * | 2016-02-12 | 2017-08-17 | Lg Electronics Inc. | Solar cell and method of manufacturing the same |
| USD822890S1 (en) | 2016-09-07 | 2018-07-10 | Felxtronics Ap, Llc | Lighting apparatus |
| US10775030B2 (en) | 2017-05-05 | 2020-09-15 | Flex Ltd. | Light fixture device including rotatable light modules |
| USD833061S1 (en) | 2017-08-09 | 2018-11-06 | Flex Ltd. | Lighting module locking endcap |
| USD862777S1 (en) | 2017-08-09 | 2019-10-08 | Flex Ltd. | Lighting module wide distribution lens |
| USD846793S1 (en) | 2017-08-09 | 2019-04-23 | Flex Ltd. | Lighting module locking mechanism |
| USD872319S1 (en) | 2017-08-09 | 2020-01-07 | Flex Ltd. | Lighting module LED light board |
| USD877964S1 (en) | 2017-08-09 | 2020-03-10 | Flex Ltd. | Lighting module |
| USD832494S1 (en) | 2017-08-09 | 2018-10-30 | Flex Ltd. | Lighting module heatsink |
| USD832495S1 (en) | 2017-08-18 | 2018-10-30 | Flex Ltd. | Lighting module locking mechanism |
| USD862778S1 (en) | 2017-08-22 | 2019-10-08 | Flex Ltd | Lighting module lens |
| USD888323S1 (en) | 2017-09-07 | 2020-06-23 | Flex Ltd | Lighting module wire guard |
| KR20190133502A (ko) * | 2018-05-23 | 2019-12-03 | 한화정밀기계 주식회사 | 웨이퍼 가공 장치 |
| DE102018119313B4 (de) * | 2018-08-08 | 2023-03-30 | Rogers Germany Gmbh | Verfahren zum Bearbeiten eines Metall-Keramik-Substrats und Anlage zum Durchführen des Verfahrens |
| KR102674268B1 (ko) * | 2018-10-30 | 2024-06-12 | 하마마츠 포토닉스 가부시키가이샤 | 레이저 가공 장치 |
| JP7402814B2 (ja) * | 2018-10-30 | 2023-12-21 | 浜松ホトニクス株式会社 | レーザ加工ヘッド及びレーザ加工装置 |
| DE102019003028A1 (de) * | 2019-04-26 | 2020-10-29 | Mühlbauer Gmbh & Co. Kg | Vorrichtung und Verfahren zum Personalisieren von Sicherheits- oder Identifikationsgegenständen |
| FR3105045B1 (fr) * | 2019-12-20 | 2022-08-12 | Saint Gobain | Gravure de substrat revetu |
| US11964343B2 (en) * | 2020-03-09 | 2024-04-23 | Applied Materials, Inc. | Laser dicing system for filamenting and singulating optical devices |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0086666A2 (en) * | 1982-02-17 | 1983-08-24 | Westinghouse Electric Corporation | Arrangement for laser scribing of dendrite silicon cells |
| CN101185989A (zh) * | 2006-11-21 | 2008-05-28 | 帕洛阿尔托研究中心公司 | 多站式扫描位移恒定激光烧蚀装置 |
| CN101675531A (zh) * | 2007-02-16 | 2010-03-17 | 纳克公司 | 太阳能电池结构、光生伏打模块及对应的工艺 |
Family Cites Families (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4322571A (en) | 1980-07-17 | 1982-03-30 | The Boeing Company | Solar cells and methods for manufacture thereof |
| US4626613A (en) | 1983-12-23 | 1986-12-02 | Unisearch Limited | Laser grooved solar cell |
| US4796038A (en) * | 1985-07-24 | 1989-01-03 | Ateq Corporation | Laser pattern generation apparatus |
| US5011565A (en) | 1989-12-06 | 1991-04-30 | Mobil Solar Energy Corporation | Dotted contact solar cell and method of making same |
| JP2798769B2 (ja) | 1990-02-22 | 1998-09-17 | 三洋電機株式会社 | 薄膜トランジスタの製造方法 |
| US5258077A (en) | 1991-09-13 | 1993-11-02 | Solec International, Inc. | High efficiency silicon solar cells and method of fabrication |
| US5432015A (en) | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
| US5738731A (en) | 1993-11-19 | 1998-04-14 | Mega Chips Corporation | Photovoltaic device |
| US5456763A (en) | 1994-03-29 | 1995-10-10 | The Regents Of The University Of California | Solar cells utilizing pulsed-energy crystallized microcrystalline/polycrystalline silicon |
| KR0165423B1 (ko) | 1995-07-24 | 1998-12-15 | 김광호 | 반도체 장치의 접속구조 및 그 제조방법 |
| US5635086A (en) * | 1995-10-10 | 1997-06-03 | The Esab Group, Inc. | Laser-plasma arc metal cutting apparatus |
| US5916461A (en) * | 1997-02-19 | 1999-06-29 | Technolines, Llc | System and method for processing surfaces by a laser |
| DE19741832A1 (de) | 1997-09-23 | 1999-03-25 | Inst Solarenergieforschung | Verfahren zur Herstellung einer Solarzelle und Solarzelle |
| US6185030B1 (en) * | 1998-03-20 | 2001-02-06 | James W. Overbeck | Wide field of view and high speed scanning microscopy |
| US6924493B1 (en) * | 1999-08-17 | 2005-08-02 | The Regents Of The University Of California | Ion beam lithography system |
| US7838794B2 (en) | 1999-12-28 | 2010-11-23 | Gsi Group Corporation | Laser-based method and system for removing one or more target link structures |
| DE10046170A1 (de) | 2000-09-19 | 2002-04-04 | Fraunhofer Ges Forschung | Verfahren zur Herstellung eines Halbleiter-Metallkontaktes durch eine dielektrische Schicht |
| US20070128827A1 (en) * | 2001-09-12 | 2007-06-07 | Faris Sadeg M | Method and system for increasing yield of vertically integrated devices |
| US7420147B2 (en) * | 2001-09-12 | 2008-09-02 | Reveo, Inc. | Microchannel plate and method of manufacturing microchannel plate |
| US6697096B2 (en) * | 2001-11-16 | 2004-02-24 | Applied Materials, Inc. | Laser beam pattern generator having rotating scanner compensator and method |
| JP2004003989A (ja) * | 2002-03-15 | 2004-01-08 | Affymetrix Inc | 生物学的物質の走査のためのシステム、方法、および製品 |
| JP4363029B2 (ja) | 2002-11-06 | 2009-11-11 | ソニー株式会社 | 分割波長板フィルターの製造方法 |
| JP3872462B2 (ja) * | 2003-09-01 | 2007-01-24 | 住友重機械工業株式会社 | レーザ加工装置、及びレーザ加工方法 |
| US20060060238A1 (en) | 2004-02-05 | 2006-03-23 | Advent Solar, Inc. | Process and fabrication methods for emitter wrap through back contact solar cells |
| US20060000814A1 (en) * | 2004-06-30 | 2006-01-05 | Bo Gu | Laser-based method and system for processing targeted surface material and article produced thereby |
| US7164465B2 (en) * | 2004-07-13 | 2007-01-16 | Anvik Corporation | Versatile maskless lithography system with multiple resolutions |
| DE102004050269A1 (de) | 2004-10-14 | 2006-04-20 | Institut Für Solarenergieforschung Gmbh | Verfahren zur Kontakttrennung elektrisch leitfähiger Schichten auf rückkontaktierten Solarzellen und Solarzelle |
| US8129822B2 (en) | 2006-10-09 | 2012-03-06 | Solexel, Inc. | Template for three-dimensional thin-film solar cell manufacturing and methods of use |
| US8420435B2 (en) | 2009-05-05 | 2013-04-16 | Solexel, Inc. | Ion implantation fabrication process for thin-film crystalline silicon solar cells |
| US8399331B2 (en) | 2007-10-06 | 2013-03-19 | Solexel | Laser processing for high-efficiency thin crystalline silicon solar cell fabrication |
| US9508886B2 (en) * | 2007-10-06 | 2016-11-29 | Solexel, Inc. | Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam |
| US7554031B2 (en) | 2005-03-03 | 2009-06-30 | Sunpower Corporation | Preventing harmful polarization of solar cells |
| US20070169806A1 (en) | 2006-01-20 | 2007-07-26 | Palo Alto Research Center Incorporated | Solar cell production using non-contact patterning and direct-write metallization |
| US20070137692A1 (en) | 2005-12-16 | 2007-06-21 | Bp Corporation North America Inc. | Back-Contact Photovoltaic Cells |
| US7834293B2 (en) * | 2006-05-02 | 2010-11-16 | Electro Scientific Industries, Inc. | Method and apparatus for laser processing |
| DE102006028718B4 (de) | 2006-06-20 | 2008-11-13 | Infineon Technologies Ag | Verfahren zur Vereinzelung von Halbleiterwafern zu Halbleiterchips |
| EP2035180A2 (en) | 2006-06-20 | 2009-03-18 | CHISM, William, W., II | Method of direct coulomb explosion in laser ablation of semiconductor structures |
| TWI328877B (en) | 2006-07-20 | 2010-08-11 | Au Optronics Corp | Array substrate |
| WO2008038385A1 (fr) * | 2006-09-28 | 2008-04-03 | Mitsubishi Electric Corporation | Appareil d'usinage laser |
| US8035027B2 (en) | 2006-10-09 | 2011-10-11 | Solexel, Inc. | Solar module structures and assembly methods for pyramidal three-dimensional thin-film solar cells |
| US20080116183A1 (en) * | 2006-11-21 | 2008-05-22 | Palo Alto Research Center Incorporated | Light Scanning Mechanism For Scan Displacement Invariant Laser Ablation Apparatus |
| US7732104B2 (en) | 2007-01-18 | 2010-06-08 | International Business Machines Corporation | System and method for eliminating the structure and edge roughness produced during laser ablation of a material |
| TWI328861B (en) | 2007-03-13 | 2010-08-11 | Au Optronics Corp | Fabrication methods of thin film transistor substrate |
| JP2008227379A (ja) * | 2007-03-15 | 2008-09-25 | Keyence Corp | レーザ加工装置及び固体レーザ共振器 |
| US8536483B2 (en) * | 2007-03-22 | 2013-09-17 | General Lasertronics Corporation | Methods for stripping and modifying surfaces with laser-induced ablation |
| JP2008283023A (ja) | 2007-05-11 | 2008-11-20 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法 |
| US7838062B2 (en) | 2007-05-29 | 2010-11-23 | Sunpower Corporation | Array of small contacts for solar cell fabrication |
| JP4916392B2 (ja) * | 2007-06-26 | 2012-04-11 | パナソニック株式会社 | 三次元形状造形物の製造方法及び製造装置 |
| JP5230153B2 (ja) | 2007-09-18 | 2013-07-10 | 三菱重工業株式会社 | 光電変換装置の製造方法 |
| US8198528B2 (en) | 2007-12-14 | 2012-06-12 | Sunpower Corporation | Anti-reflective coating with high optical absorption layer for backside contact solar cells |
| US20090188553A1 (en) | 2008-01-25 | 2009-07-30 | Emat Technology, Llc | Methods of fabricating solar-cell structures and resulting solar-cell structures |
| US7989729B1 (en) * | 2008-03-11 | 2011-08-02 | Kla-Tencor Corporation | Detecting and repairing defects of photovoltaic devices |
| JP5247198B2 (ja) * | 2008-03-24 | 2013-07-24 | ミヤチテクノス株式会社 | スキャニング式レーザ加工装置 |
| US7833808B2 (en) | 2008-03-24 | 2010-11-16 | Palo Alto Research Center Incorporated | Methods for forming multiple-layer electrode structures for silicon photovoltaic cells |
| US7851698B2 (en) | 2008-06-12 | 2010-12-14 | Sunpower Corporation | Trench process and structure for backside contact solar cells with polysilicon doped regions |
| WO2009153792A2 (en) * | 2008-06-19 | 2009-12-23 | Utilight Ltd. | Light induced patterning |
| KR20110059724A (ko) * | 2008-08-26 | 2011-06-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 레이저 재료 제거 방법 및 장치 |
| US7855089B2 (en) | 2008-09-10 | 2010-12-21 | Stion Corporation | Application specific solar cell and method for manufacture using thin film photovoltaic materials |
| WO2010037346A1 (en) * | 2008-10-05 | 2010-04-08 | Changzhou Lasfocus Laser Equipment Co., Ltd. | Methods and systems of manufacturing photovoltaic devices |
| KR20110089356A (ko) * | 2008-11-19 | 2011-08-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 레이저-스크라이빙 도구 구조 |
| JP5381052B2 (ja) * | 2008-12-01 | 2014-01-08 | 富士通セミコンダクター株式会社 | 半導体装置及び半導体集積回路チップの製造方法 |
| JP5318545B2 (ja) * | 2008-12-01 | 2013-10-16 | 株式会社ディスコ | ウエーハ加工方法 |
| US20100147811A1 (en) * | 2008-12-11 | 2010-06-17 | Sobey Mark S | Apparatus for laser scribing of dielectric-coated semiconductor wafers |
| CN105023973A (zh) | 2009-04-21 | 2015-11-04 | 泰特拉桑有限公司 | 形成太阳能电池中的结构的方法 |
| EP2422377A4 (en) | 2009-04-22 | 2013-12-04 | Tetrasun Inc | Localized metal contacts by localized laser assisted conversion of functional films in solar cells |
| US8173473B2 (en) * | 2009-09-29 | 2012-05-08 | Applied Materials, Inc. | Laser system for processing solar wafers in a carrier |
| US20110216401A1 (en) * | 2010-03-03 | 2011-09-08 | Palo Alto Research Center Incorporated | Scanning System With Orbiting Objective |
| US8211731B2 (en) | 2010-06-07 | 2012-07-03 | Sunpower Corporation | Ablation of film stacks in solar cell fabrication processes |
| US8263899B2 (en) * | 2010-07-01 | 2012-09-11 | Sunpower Corporation | High throughput solar cell ablation system |
| EP2601687A4 (en) * | 2010-08-05 | 2018-03-07 | Solexel, Inc. | Backplane reinforcement and interconnects for solar cells |
-
2010
- 2010-07-01 US US12/829,275 patent/US8263899B2/en active Active
-
2011
- 2011-04-25 EP EP17197554.3A patent/EP3299109A1/en not_active Withdrawn
- 2011-04-25 CN CN201180032547.4A patent/CN102985213B/zh active Active
- 2011-04-25 JP JP2013518384A patent/JP6318419B2/ja active Active
- 2011-04-25 EP EP11801292.1A patent/EP2588267B1/en active Active
- 2011-04-25 KR KR1020137000215A patent/KR101775491B1/ko active Active
- 2011-04-25 WO PCT/US2011/033764 patent/WO2012003033A1/en not_active Ceased
-
2012
- 2012-08-13 US US13/584,613 patent/US8859933B2/en active Active
-
2014
- 2014-09-19 US US14/491,662 patent/US9527164B2/en active Active
-
2016
- 2016-05-02 JP JP2016092823A patent/JP6216407B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0086666A2 (en) * | 1982-02-17 | 1983-08-24 | Westinghouse Electric Corporation | Arrangement for laser scribing of dendrite silicon cells |
| CN101185989A (zh) * | 2006-11-21 | 2008-05-28 | 帕洛阿尔托研究中心公司 | 多站式扫描位移恒定激光烧蚀装置 |
| CN101675531A (zh) * | 2007-02-16 | 2010-03-17 | 纳克公司 | 太阳能电池结构、光生伏打模块及对应的工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20150108692A1 (en) | 2015-04-23 |
| EP3299109A1 (en) | 2018-03-28 |
| US20120312791A1 (en) | 2012-12-13 |
| EP2588267B1 (en) | 2017-12-13 |
| KR101775491B1 (ko) | 2017-09-06 |
| US8859933B2 (en) | 2014-10-14 |
| JP6318419B2 (ja) | 2018-05-09 |
| JP2013536080A (ja) | 2013-09-19 |
| EP2588267A1 (en) | 2013-05-08 |
| US20120003788A1 (en) | 2012-01-05 |
| CN102985213A (zh) | 2013-03-20 |
| WO2012003033A1 (en) | 2012-01-05 |
| JP6216407B2 (ja) | 2017-10-18 |
| JP2016165758A (ja) | 2016-09-15 |
| US9527164B2 (en) | 2016-12-27 |
| KR20130121073A (ko) | 2013-11-05 |
| EP2588267A4 (en) | 2015-12-02 |
| US8263899B2 (en) | 2012-09-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102985213B (zh) | 高通量太阳能电池烧蚀系统 | |
| US8197912B2 (en) | Precision separation of PV thin film stacks | |
| JP4921322B2 (ja) | 走査経路及び合焦状態が安定な多ステーション型レーザアブレーション装置及び光起電デバイス製造システム | |
| US8258426B2 (en) | Laser material removal methods and apparatus | |
| US8021913B2 (en) | Method and apparatus for forming the separating lines of a photovoltaic module with series-connected cells | |
| JP2013500867A (ja) | 緯度方向等値線スクライビング加工、ステッチング、ならびに簡易化されたレーザ制御およびスキャナ制御 | |
| JP4713100B2 (ja) | 光電変換装置の製造方法及び光電変換装置 | |
| JP2006041322A5 (https=) | ||
| JP5377086B2 (ja) | レーザ加工方法、レーザ加工装置及びソーラパネル製造方法 | |
| JP2010087041A (ja) | レーザービームによる薄膜の除去方法及び薄膜太陽電池パネルの製造方法 | |
| Hoppe et al. | Overcoming Throughput Limitations of Laser Systems in Solar Cell Manufacturing via On‐The‐Fly Processing Using Polygon Scanners | |
| JP5284299B2 (ja) | 薄膜太陽電池の製造方法、および薄膜太陽電池製造用のレーザ加工装置 | |
| JP5382502B2 (ja) | 薄膜太陽電池のレーザ加工装置および加工方法 | |
| Harley et al. | High throughput laser processing | |
| Harley et al. | High throughput solar cell ablation system | |
| KR20120001871A (ko) | 복수 파장의 레이저 빔을 이용한 다층기판 가공장치 및 다층기판 가공방법 | |
| TW201841380A (zh) | 用於處理在太陽能電池的製造中使用的基板的設備、用於太陽能電池製造的系統以及用於處理在太陽能電池的製造中使用的基板的方法 | |
| WO2017173129A1 (en) | Metrology system for substrate deformation measurement | |
| US20260114071A1 (en) | Tabbing device and tabbing method | |
| KR101290106B1 (ko) | 레이저를 이용한 태양전지 가공방법 | |
| KR20240036303A (ko) | 태빙 장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220824 Address after: Singapore, Singapore City Patentee after: Maikesheng solar energy Co.,Ltd. Address before: California, USA Patentee before: SUNPOWER Corp. |
|
| TR01 | Transfer of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: High throughput solar cell ablation system Granted publication date: 20151202 Pledgee: Deutsche Trust (Hong Kong) Ltd. Pledgor: Maikesheng solar energy Co.,Ltd. Registration number: Y2024990000329 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right |