CN102520590A - 一种遮光板的制作方法 - Google Patents
一种遮光板的制作方法 Download PDFInfo
- Publication number
- CN102520590A CN102520590A CN2011103866322A CN201110386632A CN102520590A CN 102520590 A CN102520590 A CN 102520590A CN 2011103866322 A CN2011103866322 A CN 2011103866322A CN 201110386632 A CN201110386632 A CN 201110386632A CN 102520590 A CN102520590 A CN 102520590A
- Authority
- CN
- China
- Prior art keywords
- exposure
- baffle plate
- glass substrate
- metallic diaphragm
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 239000011521 glass Substances 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims description 20
- 239000004973 liquid crystal related substance Substances 0.000 claims description 11
- 210000002858 crystal cell Anatomy 0.000 claims description 8
- 239000003292 glue Substances 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 4
- 101100377706 Escherichia phage T5 A2.2 gene Proteins 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims description 2
- 239000012528 membrane Substances 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (6)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110386632.2A CN102520590B (zh) | 2011-11-29 | 2011-11-29 | 一种遮光板的制作方法 |
PCT/CN2011/083428 WO2013078695A1 (zh) | 2011-11-29 | 2011-12-04 | 一种遮光板的制作方法 |
US13/380,191 US8802359B2 (en) | 2011-11-29 | 2011-12-04 | UV glass production method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110386632.2A CN102520590B (zh) | 2011-11-29 | 2011-11-29 | 一种遮光板的制作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102520590A true CN102520590A (zh) | 2012-06-27 |
CN102520590B CN102520590B (zh) | 2015-05-20 |
Family
ID=46291551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110386632.2A Expired - Fee Related CN102520590B (zh) | 2011-11-29 | 2011-11-29 | 一种遮光板的制作方法 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN102520590B (zh) |
WO (1) | WO2013078695A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103553362A (zh) * | 2013-10-15 | 2014-02-05 | 深圳市华星光电技术有限公司 | 固化框胶用遮光罩的制作方法 |
CN104503203A (zh) * | 2015-01-15 | 2015-04-08 | 京东方科技集团股份有限公司 | 掩膜板及其制备方法和显示面板中封框胶的固化方法 |
CN104614948A (zh) * | 2015-02-02 | 2015-05-13 | 京东方科技集团股份有限公司 | 一种紫外线固化掩膜板及其制作方法和显示装置 |
CN106338892A (zh) * | 2016-11-01 | 2017-01-18 | 合肥京东方光电科技有限公司 | 一种曝光机、曝光的方法以及透明对位件的移位控制方法 |
CN112612178A (zh) * | 2020-12-21 | 2021-04-06 | 上海华力微电子有限公司 | 一种监控光刻机遮光片开口精度的标记及其使用方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113290316B (zh) * | 2021-05-20 | 2023-07-21 | 安徽熙泰智能科技有限公司 | 一种硅基oled微显示器件膜层去除工艺 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101196690A (zh) * | 2006-12-05 | 2008-06-11 | 上海广电Nec液晶显示器有限公司 | 一种遮光掩膜板的制造方法及其应用 |
CN101520599A (zh) * | 2008-02-26 | 2009-09-02 | 上海天马微电子有限公司 | 掩模及其设计方法、和使用该掩模制造阵列基板的方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0144082B1 (ko) * | 1994-04-01 | 1998-08-17 | 김주용 | 레티클 및 그 레티클을 사용한 가림막 세팅 방법 |
JP3211079B2 (ja) * | 1997-11-20 | 2001-09-25 | 株式会社オーク製作所 | 周辺露光装置およびその方法 |
JP3056206B1 (ja) * | 1999-03-18 | 2000-06-26 | 広島日本電気株式会社 | ダミーパターン形成方法及び半導体製造方法 |
US7362407B2 (en) * | 2002-02-01 | 2008-04-22 | Lg.Philips Lcd Co., Ltd. | Method of fabricating liquid crystal display device |
JP2004310063A (ja) * | 2003-03-25 | 2004-11-04 | Sharp Corp | 露光用マスク、露光装置、露光方法および液晶表示装置の製造方法 |
JP2006040915A (ja) * | 2004-07-22 | 2006-02-09 | Seiko Epson Corp | 半導体装置の製造方法、及びその製造装置、並びに電気光学装置の製造方法 |
JP2009141263A (ja) * | 2007-12-10 | 2009-06-25 | Toshiba Corp | 露光方法、フォトマスクおよびレチクルステージ |
JP2010039360A (ja) * | 2008-08-07 | 2010-02-18 | Fujinon Corp | 液晶封止装置 |
JP2010249963A (ja) * | 2009-04-13 | 2010-11-04 | Ushio Inc | 基板貼り合わせ装置 |
CN101986206B (zh) * | 2010-07-30 | 2012-08-08 | 南京中电熊猫液晶显示科技有限公司 | 利用功能掩膜板制造封接胶固化用掩膜基板的方法 |
-
2011
- 2011-11-29 CN CN201110386632.2A patent/CN102520590B/zh not_active Expired - Fee Related
- 2011-12-04 WO PCT/CN2011/083428 patent/WO2013078695A1/zh active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101196690A (zh) * | 2006-12-05 | 2008-06-11 | 上海广电Nec液晶显示器有限公司 | 一种遮光掩膜板的制造方法及其应用 |
CN101520599A (zh) * | 2008-02-26 | 2009-09-02 | 上海天马微电子有限公司 | 掩模及其设计方法、和使用该掩模制造阵列基板的方法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103553362A (zh) * | 2013-10-15 | 2014-02-05 | 深圳市华星光电技术有限公司 | 固化框胶用遮光罩的制作方法 |
WO2015054905A1 (zh) * | 2013-10-15 | 2015-04-23 | 深圳市华星光电技术有限公司 | 固化框胶用遮光罩的制作方法 |
CN103553362B (zh) * | 2013-10-15 | 2015-07-29 | 深圳市华星光电技术有限公司 | 固化框胶用遮光罩的制作方法 |
US9256130B2 (en) | 2013-10-15 | 2016-02-09 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Method for manufacturing light-shielding mask for curing cell sealant |
CN104503203A (zh) * | 2015-01-15 | 2015-04-08 | 京东方科技集团股份有限公司 | 掩膜板及其制备方法和显示面板中封框胶的固化方法 |
CN104614948A (zh) * | 2015-02-02 | 2015-05-13 | 京东方科技集团股份有限公司 | 一种紫外线固化掩膜板及其制作方法和显示装置 |
CN104614948B (zh) * | 2015-02-02 | 2018-01-23 | 京东方科技集团股份有限公司 | 一种紫外线固化掩膜板及其制作方法和显示装置 |
US10209573B2 (en) | 2015-02-02 | 2019-02-19 | Boe Technology Group Co., Ltd. | UV curing mask plate and a fabricating method thereof and a display device |
CN106338892A (zh) * | 2016-11-01 | 2017-01-18 | 合肥京东方光电科技有限公司 | 一种曝光机、曝光的方法以及透明对位件的移位控制方法 |
CN106338892B (zh) * | 2016-11-01 | 2018-05-08 | 合肥京东方光电科技有限公司 | 一种曝光机、曝光的方法以及透明对位件的移位控制方法 |
CN112612178A (zh) * | 2020-12-21 | 2021-04-06 | 上海华力微电子有限公司 | 一种监控光刻机遮光片开口精度的标记及其使用方法 |
Also Published As
Publication number | Publication date |
---|---|
CN102520590B (zh) | 2015-05-20 |
WO2013078695A1 (zh) | 2013-06-06 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Production method of light shield Effective date of registration: 20190426 Granted publication date: 20150520 Pledgee: Bank of Beijing Limited by Share Ltd. Shenzhen branch Pledgor: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY Co.,Ltd. Registration number: 2019440020032 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20201016 Granted publication date: 20150520 Pledgee: Bank of Beijing Limited by Share Ltd. Shenzhen branch Pledgor: Shenzhen China Star Optoelectronics Technology Co.,Ltd. Registration number: 2019440020032 |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150520 |