CN102482790A - 电解装置 - Google Patents

电解装置 Download PDF

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Publication number
CN102482790A
CN102482790A CN2010800397675A CN201080039767A CN102482790A CN 102482790 A CN102482790 A CN 102482790A CN 2010800397675 A CN2010800397675 A CN 2010800397675A CN 201080039767 A CN201080039767 A CN 201080039767A CN 102482790 A CN102482790 A CN 102482790A
Authority
CN
China
Prior art keywords
mentioned
electrolyzer
temperature
electrolytic
electrolytic cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010800397675A
Other languages
English (en)
Chinese (zh)
Inventor
吉本修
本宫诚
大久保博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tanso Co Ltd
Original Assignee
Toyo Tanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tanso Co Ltd filed Critical Toyo Tanso Co Ltd
Publication of CN102482790A publication Critical patent/CN102482790A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C25B15/021—Process control or regulation of heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F2213/00—Aspects of inhibiting corrosion of metals by anodic or cathodic protection
    • C23F2213/30—Anodic or cathodic protection specially adapted for a specific object

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
CN2010800397675A 2009-09-07 2010-09-02 电解装置 Pending CN102482790A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-205491 2009-09-07
JP2009205491A JP2011058015A (ja) 2009-09-07 2009-09-07 電解装置
PCT/JP2010/005419 WO2011027566A1 (ja) 2009-09-07 2010-09-02 電解装置

Publications (1)

Publication Number Publication Date
CN102482790A true CN102482790A (zh) 2012-05-30

Family

ID=43649121

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800397675A Pending CN102482790A (zh) 2009-09-07 2010-09-02 电解装置

Country Status (6)

Country Link
US (1) US20120160667A1 (https=)
EP (1) EP2476783A4 (https=)
JP (1) JP2011058015A (https=)
KR (1) KR20120083311A (https=)
CN (1) CN102482790A (https=)
WO (1) WO2011027566A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014021794A1 (en) * 2012-08-01 2014-02-06 Sukij Tridsadeerak Hpc2 hydrogen separation tank with liquid cooling system
CN108950594A (zh) * 2018-09-29 2018-12-07 青海铜业有限责任公司 电解槽和电解槽系统

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101077199B1 (ko) * 2011-03-14 2011-10-27 김경수 오픈셀 방식의 차아염소산나트륨 제조장치
JP5824256B2 (ja) * 2011-06-29 2015-11-25 東洋炭素株式会社 電解装置
WO2013054433A1 (ja) * 2011-10-14 2013-04-18 株式会社エスマック 水素-酸素ガス発生装置
JP5906742B2 (ja) * 2012-01-05 2016-04-20 セントラル硝子株式会社 フッ素ガス生成装置
US20230052850A1 (en) * 2019-12-10 2023-02-16 Sunfire Gmbh Solid oxide cell assembly

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040108199A1 (en) * 2002-07-26 2004-06-10 Heraeus Kulzer Gmbh & Co. Kg Device for electrodepositing metallic, prosthetic, molded, dental components
CN1510172A (zh) * 2002-12-21 2004-07-07 金相� 高效布朗气发生器
CN1517451A (zh) * 2003-01-22 2004-08-04 ����̿����ʽ���� 溶融盐电解装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB812817A (en) * 1954-05-21 1959-04-29 Solar Aircraft Co Electrolytic production of titanium
US2841544A (en) * 1956-04-24 1958-07-01 Minnesota Mining & Mfg Process for the production of fluorinecontaining compounds
US3645879A (en) * 1970-06-08 1972-02-29 Haskett Barry F Construction of electrolytic cell
IT1199898B (it) * 1985-07-22 1989-01-05 Ginatta Marco Elettrochim Impianto per la produzione elettrolitica in bagno di sali fusi di metalli reattivi
JPH0373899A (ja) * 1989-08-15 1991-03-28 Toshiba Corp 溶融塩電解精製装置
JP2000042555A (ja) * 1998-08-04 2000-02-15 Sanyo Electric Co Ltd 電解水冷却装置
AU2002349510A1 (en) * 2001-12-17 2003-06-30 Toyo Tanso Co., Ltd. Apparatus for generating f2 gas and method for generating f2 gas, and f2 gas
JP2004244724A (ja) * 2003-01-22 2004-09-02 Toyo Tanso Kk 溶融塩電解装置
JP3634858B2 (ja) * 2003-01-22 2005-03-30 東洋炭素株式会社 溶融塩電解装置
JP4842585B2 (ja) * 2005-08-10 2011-12-21 本田技研工業株式会社 水電解システムの運転方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040108199A1 (en) * 2002-07-26 2004-06-10 Heraeus Kulzer Gmbh & Co. Kg Device for electrodepositing metallic, prosthetic, molded, dental components
CN1510172A (zh) * 2002-12-21 2004-07-07 金相� 高效布朗气发生器
CN1517451A (zh) * 2003-01-22 2004-08-04 ����̿����ʽ���� 溶融盐电解装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014021794A1 (en) * 2012-08-01 2014-02-06 Sukij Tridsadeerak Hpc2 hydrogen separation tank with liquid cooling system
CN108950594A (zh) * 2018-09-29 2018-12-07 青海铜业有限责任公司 电解槽和电解槽系统

Also Published As

Publication number Publication date
EP2476783A1 (en) 2012-07-18
KR20120083311A (ko) 2012-07-25
US20120160667A1 (en) 2012-06-28
JP2011058015A (ja) 2011-03-24
EP2476783A4 (en) 2012-10-31
WO2011027566A1 (ja) 2011-03-10

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20120530