CN102438389A - 单一匹配网络、其构建方法和该匹配网络射频功率源系统 - Google Patents
单一匹配网络、其构建方法和该匹配网络射频功率源系统 Download PDFInfo
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- CN102438389A CN102438389A CN2010102966418A CN201010296641A CN102438389A CN 102438389 A CN102438389 A CN 102438389A CN 2010102966418 A CN2010102966418 A CN 2010102966418A CN 201010296641 A CN201010296641 A CN 201010296641A CN 102438389 A CN102438389 A CN 102438389A
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- frequency
- matching network
- inductance
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
- H03H2007/386—Multiple band impedance matching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Amplifiers (AREA)
Abstract
Description
Claims (28)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010102966418A CN102438389B (zh) | 2010-09-29 | 2010-09-29 | 单一匹配网络、其构建方法和该匹配网络射频功率源系统 |
JP2011178331A JP2012074361A (ja) | 2010-09-29 | 2011-08-17 | マルチ周波数マッチングのための単一マッチングネットワーク、その構築方法及び当該マッチングネットワークを使用するrfパワーサプライヤーシステム |
KR1020110089872A KR101239225B1 (ko) | 2010-09-29 | 2011-09-05 | 다중 주파수 정합을 위한 단일 정합 회로망 및 이를 이용한 무선 주파수 전력원 시스템 |
US13/239,316 US20120075033A1 (en) | 2010-09-29 | 2011-09-21 | Single matching network for matching multi-frequency and method of constructuring the same and radio frequency power source system using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010102966418A CN102438389B (zh) | 2010-09-29 | 2010-09-29 | 单一匹配网络、其构建方法和该匹配网络射频功率源系统 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102438389A true CN102438389A (zh) | 2012-05-02 |
CN102438389B CN102438389B (zh) | 2013-06-05 |
Family
ID=45870042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010102966418A Active CN102438389B (zh) | 2010-09-29 | 2010-09-29 | 单一匹配网络、其构建方法和该匹配网络射频功率源系统 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20120075033A1 (zh) |
JP (1) | JP2012074361A (zh) |
KR (1) | KR101239225B1 (zh) |
CN (1) | CN102438389B (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104754851A (zh) * | 2013-12-31 | 2015-07-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 多频匹配器及等离子体装置 |
CN104934340A (zh) * | 2014-03-21 | 2015-09-23 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种射频传感器及阻抗匹配装置 |
CN105228330A (zh) * | 2015-09-01 | 2016-01-06 | 沈阳拓荆科技有限公司 | 一种射频等离子体设备匹配器 |
CN107684007A (zh) * | 2016-08-05 | 2018-02-13 | 恩智浦美国有限公司 | 具有集总电感式匹配网络的解冻设备及其操作方法 |
CN112290967A (zh) * | 2019-07-09 | 2021-01-29 | 硅实验室公司 | 用于射频(rf)通信的片上谐波滤波 |
CN114245560A (zh) * | 2021-12-15 | 2022-03-25 | 北京北方华创微电子装备有限公司 | 匹配器测试系统及其射频阻抗变换装置 |
US11349448B2 (en) | 2019-09-27 | 2022-05-31 | Silicon Laboratories Inc. | Harmonic filtering for high power radio frequency (RF) communications |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103632913B (zh) * | 2012-08-28 | 2016-06-22 | 中微半导体设备(上海)有限公司 | 等离子体处理装置 |
US10699880B2 (en) * | 2015-06-29 | 2020-06-30 | Reno Technologies, Inc. | Voltage reduction circuit |
CN104102135A (zh) * | 2014-08-01 | 2014-10-15 | 王少夫 | 一种自适应控制匹配网络 |
KR102201881B1 (ko) * | 2015-08-13 | 2021-01-13 | 세메스 주식회사 | Rf 신호 생성기 및 그를 포함하는 기판 처리 장치 |
EP3280224A1 (en) | 2016-08-05 | 2018-02-07 | NXP USA, Inc. | Apparatus and methods for detecting defrosting operation completion |
CN106231772B (zh) * | 2016-08-19 | 2020-07-17 | 西安电子科技大学 | 基于调制射频的动态等离子体产生装置 |
FR3058602B1 (fr) * | 2016-11-08 | 2021-02-12 | Centre Nat Rech Scient | Circuit d'adaptation d'impedance entre un generateur et une charge a des frequences multiples, ensemble comportant un tel circuit et utlisation liee. |
EP3503679B1 (en) | 2017-12-20 | 2022-07-20 | NXP USA, Inc. | Defrosting apparatus and methods of operation thereof |
EP3547801B1 (en) | 2018-03-29 | 2022-06-08 | NXP USA, Inc. | Defrosting apparatus and methods of operation thereof |
US11800608B2 (en) | 2018-09-14 | 2023-10-24 | Nxp Usa, Inc. | Defrosting apparatus with arc detection and methods of operation thereof |
CN111092008A (zh) * | 2018-10-24 | 2020-05-01 | 江苏鲁汶仪器有限公司 | 一种感应耦合等离子体刻蚀设备及刻蚀方法 |
US11166352B2 (en) | 2018-12-19 | 2021-11-02 | Nxp Usa, Inc. | Method for performing a defrosting operation using a defrosting apparatus |
US11039511B2 (en) | 2018-12-21 | 2021-06-15 | Nxp Usa, Inc. | Defrosting apparatus with two-factor mass estimation and methods of operation thereof |
WO2024072496A1 (en) * | 2022-09-28 | 2024-04-04 | Applied Materials, Inc. | Broadband supply circuitry for a plasma processing system |
Citations (8)
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US5493311A (en) * | 1993-02-26 | 1996-02-20 | Nec Corporation | Two-frequency impedance matching circuit for an antenna |
US6642149B2 (en) * | 1998-09-16 | 2003-11-04 | Tokyo Electron Limited | Plasma processing method |
CN1581445A (zh) * | 2003-08-01 | 2005-02-16 | 东京毅力科创株式会社 | 等离子体蚀刻方法和等离子体处理装置 |
CN1909184A (zh) * | 2005-08-05 | 2007-02-07 | 中微半导体设备(上海)有限公司 | 真空反应室的射频匹配耦合网络及其配置方法 |
US20070257743A1 (en) * | 2004-04-28 | 2007-11-08 | Shannon Steven C | Method for testing plasma reactor multi-frequency impedance match networks |
CN101287327A (zh) * | 2007-04-13 | 2008-10-15 | 中微半导体设备(上海)有限公司 | 射频功率源系统及使用该射频功率源系统的等离子体反应腔室 |
CN101325837A (zh) * | 2008-06-20 | 2008-12-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 等离子体处理设备及其射频匹配网络 |
CN101630624A (zh) * | 2003-12-18 | 2010-01-20 | 应用材料公司 | 双频rf匹配 |
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JPH05198389A (ja) * | 1992-01-22 | 1993-08-06 | Jeol Ltd | 高周波装置 |
JP2000040933A (ja) * | 1998-07-23 | 2000-02-08 | Jeol Ltd | 高周波装置のマッチング方法 |
JP3883707B2 (ja) * | 1998-08-28 | 2007-02-21 | 三菱電機株式会社 | 2周波整合回路 |
US6424232B1 (en) * | 1999-11-30 | 2002-07-23 | Advanced Energy's Voorhees Operations | Method and apparatus for matching a variable load impedance with an RF power generator impedance |
JP3897582B2 (ja) * | 2000-12-12 | 2007-03-28 | キヤノン株式会社 | 真空処理方法、真空処理装置、半導体装置の製造方法および半導体装置 |
JP2002313785A (ja) * | 2001-04-17 | 2002-10-25 | Anelva Corp | 高周波プラズマ処理装置 |
KR100986023B1 (ko) * | 2003-07-23 | 2010-10-07 | 주성엔지니어링(주) | 바이어스 제어 장치 |
US7405521B2 (en) * | 2003-08-22 | 2008-07-29 | Lam Research Corporation | Multiple frequency plasma processor method and apparatus |
DE102005008372B4 (de) * | 2005-02-23 | 2016-08-18 | Intel Deutschland Gmbh | Steuerbarer Verstärker und dessen Verwendung |
CN100452945C (zh) * | 2007-06-20 | 2009-01-14 | 中微半导体设备(上海)有限公司 | 包含多个处理平台的去耦合反应离子刻蚀室 |
KR20070048422A (ko) * | 2005-11-04 | 2007-05-09 | 삼성전자주식회사 | 고주파 증폭기의 바이어스 최적화 장치 및 방법 |
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EP2151921B1 (en) * | 2008-08-07 | 2013-10-02 | Epcos AG | Dynamic impedance matching network and method for matching an impedance between a source and a load |
KR20100029464A (ko) * | 2008-09-08 | 2010-03-17 | 삼성전자주식회사 | 플라즈마 처리 장치 |
-
2010
- 2010-09-29 CN CN2010102966418A patent/CN102438389B/zh active Active
-
2011
- 2011-08-17 JP JP2011178331A patent/JP2012074361A/ja active Pending
- 2011-09-05 KR KR1020110089872A patent/KR101239225B1/ko active IP Right Grant
- 2011-09-21 US US13/239,316 patent/US20120075033A1/en not_active Abandoned
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US5493311A (en) * | 1993-02-26 | 1996-02-20 | Nec Corporation | Two-frequency impedance matching circuit for an antenna |
US6642149B2 (en) * | 1998-09-16 | 2003-11-04 | Tokyo Electron Limited | Plasma processing method |
CN1581445A (zh) * | 2003-08-01 | 2005-02-16 | 东京毅力科创株式会社 | 等离子体蚀刻方法和等离子体处理装置 |
CN101630624A (zh) * | 2003-12-18 | 2010-01-20 | 应用材料公司 | 双频rf匹配 |
US20070257743A1 (en) * | 2004-04-28 | 2007-11-08 | Shannon Steven C | Method for testing plasma reactor multi-frequency impedance match networks |
CN1909184A (zh) * | 2005-08-05 | 2007-02-07 | 中微半导体设备(上海)有限公司 | 真空反应室的射频匹配耦合网络及其配置方法 |
CN101287327A (zh) * | 2007-04-13 | 2008-10-15 | 中微半导体设备(上海)有限公司 | 射频功率源系统及使用该射频功率源系统的等离子体反应腔室 |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104754851A (zh) * | 2013-12-31 | 2015-07-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 多频匹配器及等离子体装置 |
CN104754851B (zh) * | 2013-12-31 | 2017-10-20 | 北京北方华创微电子装备有限公司 | 多频匹配器及等离子体装置 |
CN104934340A (zh) * | 2014-03-21 | 2015-09-23 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种射频传感器及阻抗匹配装置 |
CN104934340B (zh) * | 2014-03-21 | 2017-10-20 | 北京北方华创微电子装备有限公司 | 一种射频传感器及阻抗匹配装置 |
CN105228330A (zh) * | 2015-09-01 | 2016-01-06 | 沈阳拓荆科技有限公司 | 一种射频等离子体设备匹配器 |
WO2017035926A1 (zh) * | 2015-09-01 | 2017-03-09 | 沈阳拓荆科技有限公司 | 一种射频等离子体设备匹配器 |
CN105228330B (zh) * | 2015-09-01 | 2018-09-14 | 沈阳拓荆科技有限公司 | 一种射频等离子体设备匹配器 |
CN107684007A (zh) * | 2016-08-05 | 2018-02-13 | 恩智浦美国有限公司 | 具有集总电感式匹配网络的解冻设备及其操作方法 |
CN112290967A (zh) * | 2019-07-09 | 2021-01-29 | 硅实验室公司 | 用于射频(rf)通信的片上谐波滤波 |
US11349448B2 (en) | 2019-09-27 | 2022-05-31 | Silicon Laboratories Inc. | Harmonic filtering for high power radio frequency (RF) communications |
CN114245560A (zh) * | 2021-12-15 | 2022-03-25 | 北京北方华创微电子装备有限公司 | 匹配器测试系统及其射频阻抗变换装置 |
Also Published As
Publication number | Publication date |
---|---|
CN102438389B (zh) | 2013-06-05 |
KR20120033239A (ko) | 2012-04-06 |
JP2012074361A (ja) | 2012-04-12 |
US20120075033A1 (en) | 2012-03-29 |
KR101239225B1 (ko) | 2013-03-06 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Simplex matching network, and construction method and radio-frequency power source system thereof Effective date of registration: 20150202 Granted publication date: 20130605 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
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Date of cancellation: 20170809 Granted publication date: 20130605 Pledgee: China Development Bank Co Pledgor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Registration number: 2009310000663 |
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Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |