CN102257429B - 使用多种多孔性材料来控制在多孔性材料的真空的装置和方法 - Google Patents

使用多种多孔性材料来控制在多孔性材料的真空的装置和方法 Download PDF

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Publication number
CN102257429B
CN102257429B CN200980151106.9A CN200980151106A CN102257429B CN 102257429 B CN102257429 B CN 102257429B CN 200980151106 A CN200980151106 A CN 200980151106A CN 102257429 B CN102257429 B CN 102257429B
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CN
China
Prior art keywords
permeable members
liquid permeable
liquid
chamber
immersion
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Expired - Fee Related
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CN200980151106.9A
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English (en)
Chinese (zh)
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CN102257429A (zh
Inventor
潘家田
许伟峰
戴瑞克·库恩
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN200980151106.9A 2008-10-22 2009-10-21 使用多种多孔性材料来控制在多孔性材料的真空的装置和方法 Expired - Fee Related CN102257429B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US19301908P 2008-10-22 2008-10-22
US61/193,019 2008-10-22
US27229209P 2009-09-09 2009-09-09
US61/272,292 2009-09-09
US12/573,356 2009-10-05
US12/573,356 US8477284B2 (en) 2008-10-22 2009-10-05 Apparatus and method to control vacuum at porous material using multiple porous materials
PCT/US2009/061499 WO2010048299A1 (en) 2008-10-22 2009-10-21 Apparatus and method to control vacuum at porous material using multiple porous materials

Publications (2)

Publication Number Publication Date
CN102257429A CN102257429A (zh) 2011-11-23
CN102257429B true CN102257429B (zh) 2014-04-30

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CN200980151106.9A Expired - Fee Related CN102257429B (zh) 2008-10-22 2009-10-21 使用多种多孔性材料来控制在多孔性材料的真空的装置和方法

Country Status (6)

Country Link
US (2) US8477284B2 (enExample)
JP (1) JP5682830B2 (enExample)
KR (1) KR101647859B1 (enExample)
CN (1) CN102257429B (enExample)
TW (1) TWI475329B (enExample)
WO (1) WO2010048299A1 (enExample)

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US8477284B2 (en) 2008-10-22 2013-07-02 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
JP5001343B2 (ja) 2008-12-11 2012-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 流体抽出システム、液浸リソグラフィ装置、及び液浸リソグラフィ装置で使用される液浸液の圧力変動を低減する方法
US20110222031A1 (en) * 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013864A1 (en) * 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US8937703B2 (en) * 2010-07-14 2015-01-20 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013863A1 (en) * 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
TWI529380B (zh) * 2013-12-31 2016-04-11 玉晶光電股份有限公司 Optical auxiliary measuring device and measuring method for applying the same
JP6465900B2 (ja) * 2014-07-24 2019-02-06 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造、液浸リソグラフィ装置、及びデバイス製造方法
CN114402263A (zh) 2019-09-13 2022-04-26 Asml荷兰有限公司 流体处置系统和光刻设备
US11543754B1 (en) * 2021-06-16 2023-01-03 Taiwan Semiconductor Manufacturing Company, Ltd. Extractor piping on outermost sidewall of immersion hood apparatus

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WO2004093130A3 (en) * 2003-04-11 2005-11-03 Nippon Kogaku Kk Cleanup method for optics in immersion lithography
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US20080043211A1 (en) * 2006-08-21 2008-02-21 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
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US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US7576833B2 (en) 2007-06-28 2009-08-18 Nikon Corporation Gas curtain type immersion lithography tool using porous material for fluid removal
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JP2009267235A (ja) * 2008-04-28 2009-11-12 Canon Inc 露光装置
NL2003226A (en) 2008-08-19 2010-03-09 Asml Netherlands Bv Lithographic apparatus, drying device, metrology apparatus and device manufacturing method.
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US8477284B2 (en) 2008-10-22 2013-07-02 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
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CN1723540A (zh) * 2002-12-10 2006-01-18 株式会社尼康 曝光装置和器件制造方法
WO2004093130A3 (en) * 2003-04-11 2005-11-03 Nippon Kogaku Kk Cleanup method for optics in immersion lithography
CN1577106A (zh) * 2003-07-16 2005-02-09 Asml荷兰有限公司 光刻装置以及器件制造方法
CN101099224A (zh) * 2005-04-25 2008-01-02 株式会社尼康 曝光方法和曝光装置、以及器件制造方法
WO2006130338A1 (en) * 2005-06-01 2006-12-07 Nikon Corporation Immersion fluid containment system and method for immersion lithography

Also Published As

Publication number Publication date
KR101647859B1 (ko) 2016-08-11
US20130286366A1 (en) 2013-10-31
KR20110087296A (ko) 2011-08-02
TWI475329B (zh) 2015-03-01
US20100097585A1 (en) 2010-04-22
US8477284B2 (en) 2013-07-02
CN102257429A (zh) 2011-11-23
WO2010048299A1 (en) 2010-04-29
TW201020694A (en) 2010-06-01
JP2012506641A (ja) 2012-03-15
JP5682830B2 (ja) 2015-03-11
US9329492B2 (en) 2016-05-03

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