JP5682830B2 - 複数の多孔質材料を用いた多孔質材料における真空制御装置及び制御方法 - Google Patents

複数の多孔質材料を用いた多孔質材料における真空制御装置及び制御方法 Download PDF

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Publication number
JP5682830B2
JP5682830B2 JP2011533300A JP2011533300A JP5682830B2 JP 5682830 B2 JP5682830 B2 JP 5682830B2 JP 2011533300 A JP2011533300 A JP 2011533300A JP 2011533300 A JP2011533300 A JP 2011533300A JP 5682830 B2 JP5682830 B2 JP 5682830B2
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Japan
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permeable member
liquid permeable
liquid
chamber
immersion
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Japanese (ja)
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JP2012506641A5 (enExample
JP2012506641A (ja
Inventor
プーン アレックス
プーン アレックス
コー レオナルド
コー レオナルド
クーン デレク
クーン デレク
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2011533300A 2008-10-22 2009-10-21 複数の多孔質材料を用いた多孔質材料における真空制御装置及び制御方法 Expired - Fee Related JP5682830B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US19301908P 2008-10-22 2008-10-22
US61/193,019 2008-10-22
US27229209P 2009-09-09 2009-09-09
US61/272,292 2009-09-09
US12/573,356 2009-10-05
US12/573,356 US8477284B2 (en) 2008-10-22 2009-10-05 Apparatus and method to control vacuum at porous material using multiple porous materials
PCT/US2009/061499 WO2010048299A1 (en) 2008-10-22 2009-10-21 Apparatus and method to control vacuum at porous material using multiple porous materials

Publications (3)

Publication Number Publication Date
JP2012506641A JP2012506641A (ja) 2012-03-15
JP2012506641A5 JP2012506641A5 (enExample) 2012-12-20
JP5682830B2 true JP5682830B2 (ja) 2015-03-11

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JP2011533300A Expired - Fee Related JP5682830B2 (ja) 2008-10-22 2009-10-21 複数の多孔質材料を用いた多孔質材料における真空制御装置及び制御方法

Country Status (6)

Country Link
US (2) US8477284B2 (enExample)
JP (1) JP5682830B2 (enExample)
KR (1) KR101647859B1 (enExample)
CN (1) CN102257429B (enExample)
TW (1) TWI475329B (enExample)
WO (1) WO2010048299A1 (enExample)

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NL2003226A (en) * 2008-08-19 2010-03-09 Asml Netherlands Bv Lithographic apparatus, drying device, metrology apparatus and device manufacturing method.
US8634055B2 (en) * 2008-10-22 2014-01-21 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
US8477284B2 (en) 2008-10-22 2013-07-02 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
JP5001343B2 (ja) 2008-12-11 2012-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 流体抽出システム、液浸リソグラフィ装置、及び液浸リソグラフィ装置で使用される液浸液の圧力変動を低減する方法
US20110222031A1 (en) * 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013864A1 (en) * 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US8937703B2 (en) * 2010-07-14 2015-01-20 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013863A1 (en) * 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
TWI529380B (zh) * 2013-12-31 2016-04-11 玉晶光電股份有限公司 Optical auxiliary measuring device and measuring method for applying the same
JP6465900B2 (ja) * 2014-07-24 2019-02-06 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造、液浸リソグラフィ装置、及びデバイス製造方法
CN114402263A (zh) 2019-09-13 2022-04-26 Asml荷兰有限公司 流体处置系统和光刻设备
US11543754B1 (en) * 2021-06-16 2023-01-03 Taiwan Semiconductor Manufacturing Company, Ltd. Extractor piping on outermost sidewall of immersion hood apparatus

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JP3747958B2 (ja) 1995-04-07 2006-02-22 株式会社ニコン 反射屈折光学系
JPH08171054A (ja) 1994-12-16 1996-07-02 Nikon Corp 反射屈折光学系
JPH1020195A (ja) 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系
TWI232357B (en) * 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101713932B (zh) * 2002-11-12 2012-09-26 Asml荷兰有限公司 光刻装置和器件制造方法
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WO2004092833A2 (en) 2003-04-10 2004-10-28 Nikon Corporation Environmental system including a transport region for an immersion lithography apparatus
WO2004090633A2 (en) 2003-04-10 2004-10-21 Nikon Corporation An electro-osmotic element for an immersion lithography apparatus
KR20190007532A (ko) * 2003-04-11 2019-01-22 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
KR20060026446A (ko) 2003-07-15 2006-03-23 가부시키가이샤 에바라 세이사꾸쇼 전해처리장치 및 전해처리방법
US7738074B2 (en) * 2003-07-16 2010-06-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101748923B1 (ko) * 2003-09-03 2017-06-19 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4378136B2 (ja) * 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
JP4954444B2 (ja) * 2003-12-26 2012-06-13 株式会社ニコン 流路形成部材、露光装置及びデバイス製造方法
KR101162938B1 (ko) * 2004-04-19 2012-07-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8054448B2 (en) * 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
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US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
CN100541719C (zh) * 2005-04-25 2009-09-16 株式会社尼康 曝光方法和曝光装置、以及器件制造方法
WO2006130338A1 (en) * 2005-06-01 2006-12-07 Nikon Corporation Immersion fluid containment system and method for immersion lithography
US7751026B2 (en) 2005-08-25 2010-07-06 Nikon Corporation Apparatus and method for recovering fluid for immersion lithography
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US9477158B2 (en) * 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7532309B2 (en) 2006-06-06 2009-05-12 Nikon Corporation Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
JP2008034801A (ja) * 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法
US20080043211A1 (en) * 2006-08-21 2008-02-21 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US20080231823A1 (en) 2007-03-23 2008-09-25 Nikon Corporation Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US7576833B2 (en) 2007-06-28 2009-08-18 Nikon Corporation Gas curtain type immersion lithography tool using porous material for fluid removal
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
NL1036715A1 (nl) * 2008-04-16 2009-10-19 Asml Netherlands Bv Lithographic apparatus.
JP2009267235A (ja) * 2008-04-28 2009-11-12 Canon Inc 露光装置
NL2003226A (en) 2008-08-19 2010-03-09 Asml Netherlands Bv Lithographic apparatus, drying device, metrology apparatus and device manufacturing method.
JP2010098172A (ja) * 2008-10-17 2010-04-30 Canon Inc 液体回収装置、露光装置及びデバイス製造方法
US8477284B2 (en) 2008-10-22 2013-07-02 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
US8953143B2 (en) * 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member

Also Published As

Publication number Publication date
KR101647859B1 (ko) 2016-08-11
US20130286366A1 (en) 2013-10-31
KR20110087296A (ko) 2011-08-02
TWI475329B (zh) 2015-03-01
US20100097585A1 (en) 2010-04-22
US8477284B2 (en) 2013-07-02
CN102257429A (zh) 2011-11-23
WO2010048299A1 (en) 2010-04-29
CN102257429B (zh) 2014-04-30
TW201020694A (en) 2010-06-01
JP2012506641A (ja) 2012-03-15
US9329492B2 (en) 2016-05-03

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